CN210765491U - Energy-saving improved double-silver hollow glass magnetron sputtering silver target spacing adjusting mechanism - Google Patents
Energy-saving improved double-silver hollow glass magnetron sputtering silver target spacing adjusting mechanism Download PDFInfo
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- CN210765491U CN210765491U CN201921201249.3U CN201921201249U CN210765491U CN 210765491 U CN210765491 U CN 210765491U CN 201921201249 U CN201921201249 U CN 201921201249U CN 210765491 U CN210765491 U CN 210765491U
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Abstract
The utility model discloses an energy-conserving two silver cavity glass magnetron sputtering silver target interval adjustment mechanism of improved generation, including setting up at the regulation fixed plate and the regulation movable plate of its vacuum chamber below of magnetron sputtering coating machine, adjust fixed plate and regulation movable plate and be the annular slab, adjust fixed plate and adjust between the movable plate and fixedly set up annular bellows, be located to adjust and set up at least two sets of adjusting part between fixed plate and the regulation movable plate, the adjusting part is located the outside of bellows. The utility model discloses an adjusting part and cooperation bellows can realize the interval according to the condition rational regulation magnetron sputtering silver target of different vacuum chambers and substrate, the reduction edge effect of maximize to because the condition of every vacuum chamber is different, can be better than the metal cushion who prepares alone in the past decide thick according to the condition spacing.
Description
Technical Field
The utility model relates to an energy-conserving improved generation double silver cavity glass magnetron sputtering silver target interval adjustment mechanism.
Background
The double-silver LowE glass highlights the sun-shading effect of the glass on solar thermal radiation, the high light transmittance of the glass and the low transmittance of the solar thermal radiation are ingeniously combined together, the visible light transmittance is high, and outdoor background thermal radiation in summer can be effectively limited from entering the indoor space.
Coated glass (Reflective glass) is also known as Reflective glass. The coated glass is prepared by coating one or more layers of metal, alloy or metal compound films on the surface of glass to change the optical performance of the glass and meet certain specific requirements. The coated glass can be divided into the following types according to different characteristics of products: heat reflective glass, Low emissivity glass (Low-E), conductive film glass, and the like.
The production methods of coated glass are many, and mainly include a vacuum magnetron sputtering method, a vacuum evaporation method, a chemical vapor deposition method, a sol-gel method and the like. The magnetron sputtering coated glass can be designed and manufactured into a multilayer complex film system by utilizing a magnetron sputtering technology, can be coated with various colors on a white glass substrate, has better corrosion resistance and wear resistance of a film layer, and is one of the most products produced and used at present. The variety and quality of vacuum evaporation coated glass have certain differences compared with magnetron sputtering coated glass, and the vacuum evaporation coated glass is gradually replaced by a vacuum sputtering method. The chemical vapor deposition method is to introduce reaction gas into float glass production line to decompose on the surface of glowing glass and to deposit on the surface of glass uniformly to form coated glass. The method has the characteristics of less equipment investment, easy regulation, low product cost, good chemical stability, and capability of carrying out hot processing, and is one of the most promising production methods at present. The sol-gel method for producing the coated glass has simple process and good stability, and has the defects of high light transmittance and poor decoration of the product. Magnetron sputtering is the most applied method at present, and improper setting of the distance between the magnetron sputtering silver target and the substrate can cause edge effect.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to overcome the defect that exists among the prior art, provide an energy-conserving two silver cavity glass magnetron sputtering silver target interval adjustment mechanism of improved generation, can realize the interval of the silver target of magnetron sputtering and substrate according to the condition rational regulation of different vacuum chambers, the reduction edge effect of maximize to because the condition of every vacuum chamber is different, can be better than the metal cushion who prepares alone in the past and decide thick according to the condition spacing.
In order to realize the above object, the technical scheme of the utility model design an energy-conserving improved generation double silver cavity glass magnetron sputtering silver target interval adjustment mechanism, including setting up at the regulation fixed plate and the regulation movable plate of its vacuum chamber below of magnetron sputtering coating machine, adjust fixed plate and adjust the movable plate and be the annular plate, adjust fixed plate and adjust between the movable plate and fixedly set up annular bellows, lie in and adjust fixed plate and adjust and set up at least two sets of adjusting part between the movable plate, adjusting part is located the outside of bellows. The annular adjusting fixed plate and the adjusting movable plate avoid the space of vacuum sputtering in the middle, and the adjusting part is arranged outside the corrugated pipe, so that the inside cannot be influenced when the distance between the silver target and the substrate is adjusted, and the inside target or the substrate to be coated is interfered or touched when the adjusting part is adjusted.
A further technical scheme is, it is located the below of adjusting the movable plate to adjust the fixed plate, adjust movable plate fixed connection at the lower surface of vacuum chamber, adjust the upper surface of fixing board fixed connection at the board that supports vacuum chamber, adjusting part includes that one is fixed at the support column of adjusting the movable plate lower surface and one is fixed at the stay tube of adjusting the movable plate lower surface, the support column acts as the cushion of adjusting the silver target interval of sputtering, the stay tube is located one side of support column, it sets up the U-shaped hole to adjust on the fixed plate, the position in its two orifices in U-shaped hole is corresponding with stay tube and support column respectively, the adaptation in the U.
A further technical scheme is that, the one end fixed connection of rubber stick is under the support column, the other end slides and sets up in its lumen of stay tube, the diameter of support column is the same with the external diameter of stay tube, the size in its two drill ways in U-shaped hole is greater than the diameter of support column, set up two waist shape holes on the stay tube, two waist shape holes set up relatively and are located the same high department of stay tube, be equipped with the regulation double-screw bolt with waist shape hole adaptation, be equipped with two nuts with the regulation double-screw bolt adaptation, the nut internal diameter is greater than its semicircular diameter in waist shape hole, its semicircular diameter in waist shape hole is less. The size of the U-shaped hole and the selection of the height of the supporting column determine the adjustable range of the silver target distance, the position of the adjusting stud at the waist-shaped hole is set to determine the silver target distance, the rubber rod can only abut against the side face of the adjusting stud after the adjusting stud is fixed, and the adjusting stud is adjusted to be located at different positions of the waist-shaped hole according to the conditions of different vacuum chambers so as to adjust the optimal silver target distance and reduce the edge effect to the maximum.
The further technical proposal is that one end of the corrugated pipe which is respectively connected with the adjusting fixed plate and the adjusting movable plate is provided with a sealing ring which is fixedly connected on the adjusting fixed plate or the adjusting movable plate. Thus, the vacuum condition of the vacuum chamber is not influenced by the existence of the adjusting process, and the required vacuum degree can be still ensured.
The utility model has the advantages and the beneficial effects that: the distance between the magnetron sputtering silver target and the substrate can be reasonably adjusted according to the conditions of different vacuum chambers by the adjusting part and the corrugated pipe, so that the edge effect is maximally reduced, and the distance can be adjusted according to the conditions better than that of a conventional metal cushion block with a fixed thickness prepared independently due to different conditions of each vacuum chamber; the annular adjusting fixed plate and the adjusting movable plate avoid the space of vacuum sputtering in the middle, and the adjusting part is arranged outside the corrugated pipe, so that the inside cannot be influenced when the distance between the silver target and the substrate is adjusted, and the inside target or the substrate to be coated is interfered or touched when the adjusting part is adjusted. The size of the U-shaped hole and the selection of the height of the supporting column determine the adjustable range of the silver target distance, the position of the adjusting stud at the waist-shaped hole is set to determine the silver target distance, the rubber rod can only abut against the side face of the adjusting stud after the adjusting stud is fixed, and the adjusting stud is adjusted to be located at different positions of the waist-shaped hole according to the conditions of different vacuum chambers so as to adjust the optimal silver target distance and reduce the edge effect to the maximum. The vacuum condition of the vacuum chamber is not influenced by the existence of the adjusting process, and the required vacuum degree can be still ensured.
Drawings
FIG. 1 is a schematic diagram of an energy-saving improved double-silver hollow glass magnetron sputtering silver target spacing adjusting mechanism of the utility model;
FIG. 2 is a front view of the adjustable stationary plate and adjustable movable plate portions of FIG. 1;
FIG. 3 is an enlarged schematic view of the adjustment plate, support column and support tube portion of FIG. 1;
fig. 4 is a left side view of the support tube of fig. 3.
In the figure: 1. adjusting the fixed plate; 2. adjusting the movable plate; 3. a bellows; 4. a machine platform; 5. a support pillar; 6. supporting a tube; 7. a U-shaped hole; 8. a rubber rod; 9. a waist-shaped hole; 10. adjusting the stud; 11. and a nut.
Detailed Description
The following description will further describe embodiments of the present invention with reference to the accompanying drawings and examples. The following examples are only for illustrating the technical solutions of the present invention more clearly, and the protection scope of the present invention is not limited thereby.
As shown in fig. 1 to 4 (for convenience of illustration, only waist shape hole is shown on the supporting tube in fig. 3, adjusting stud and nut are not shown), the utility model relates to an energy-saving improved double-silver hollow glass magnetron sputtering silver target spacing adjusting mechanism, including adjusting fixed plate 1 and adjusting movable plate 2 that set up below its vacuum chamber of magnetron sputtering coating machine, adjusting fixed plate 1 and adjusting movable plate 2 are the annular plate, adjust and fix and set up annular bellows 3 between fixed plate 1 and the adjusting movable plate 2, lie in and set up at least two sets of regulating part between adjusting fixed plate 1 and the adjusting movable plate 2, the regulating part is located the outside of bellows 3. Adjust and decide board 1 to be located the below of adjusting movable plate 2, adjust the lower surface of movable plate 2 fixed connection at the vacuum chamber, adjust and decide the upper surface of board 1 fixed connection at the board 4 that supports the vacuum chamber, adjusting part includes that one is fixed at the support column 5 of adjusting the 2 lower surfaces of movable plate and one is fixed at the stay tube 6 of adjusting the 2 lower surfaces of movable plate, the cushion of adjusting the silver target interval of sputtering is acted as to support column 5, stay tube 6 is located one side of support column 5, it sets up U-shaped hole 7 on the board 1 to adjust, the position in its two orifices in U-shaped hole 7 is corresponding with stay tube 6 and support column 5 respectively, the adaptation is equipped with rubber. One end fixed connection of rubber stick 8 is under support column 5, the other end slides and sets up in its lumen of stay tube 6, the diameter of support column 5 is the same with the external diameter of stay tube 6, the size in its two drill ways in U-shaped hole 7 is greater than the diameter of support column 5, set up two waist shape holes 9 on the stay tube 6, two waist shape holes 9 set up relatively and are located 6 same high departments of stay tube, be equipped with adjusting stud 10 with waist shape hole 9 adaptation, be equipped with two nuts 11 with adjusting stud 10 adaptation, nut 11 internal diameter is greater than its semicircular diameter in waist shape hole 9, its semicircular diameter in waist shape hole 9 is less than the diameter of rubber stick 8. And a sealing ring fixedly connected to the fixed adjusting plate 1 or the movable adjusting plate 2 is arranged at one end of the corrugated pipe 3 respectively connected with the fixed adjusting plate 1 and the movable adjusting plate 2.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, a plurality of improvements and decorations can be made without departing from the technical principle of the present invention, and these improvements and decorations should also be regarded as the protection scope of the present invention.
Claims (4)
1. The energy-saving improved double-silver hollow glass magnetron sputtering silver target spacing adjusting mechanism is characterized by comprising an adjusting fixed plate and an adjusting movable plate which are arranged below a vacuum chamber of a magnetron sputtering film plating machine, wherein the adjusting fixed plate and the adjusting movable plate are both annular plates, an annular corrugated pipe is fixedly arranged between the adjusting fixed plate and the adjusting movable plate, at least two groups of adjusting parts are arranged between the adjusting fixed plate and the adjusting movable plate, and the adjusting parts are positioned on the outer side of the corrugated pipe.
2. The energy-saving improved double-silver hollow glass magnetron sputtering silver target spacing adjusting mechanism is characterized in that the adjusting fixed plate is positioned below the adjusting movable plate, the adjusting movable plate is fixedly connected to the lower surface of the vacuum chamber, the adjusting fixed plate is fixedly connected to the upper surface of a machine table for supporting the vacuum chamber, the adjusting component comprises a supporting column fixed to the lower surface of the adjusting movable plate and a supporting tube fixed to the lower surface of the adjusting movable plate, the supporting column serves as a cushion block for adjusting the sputtering silver target spacing, the supporting tube is positioned on one side of the supporting column, a U-shaped hole is formed in the adjusting fixed plate, the positions of two orifices of the U-shaped hole correspond to the supporting tube and the supporting column respectively, and a rubber rod is arranged in.
3. The energy-saving improved double-silver hollow glass magnetron sputtering silver target spacing adjusting mechanism according to claim 2, wherein one end of the rubber rod is fixedly connected below the supporting column, the other end of the rubber rod is slidably arranged in a tube cavity of the supporting tube, the diameter of the supporting column is the same as the outer diameter of the supporting tube, the sizes of two orifices of the U-shaped hole are larger than the diameter of the supporting column, two waist-shaped holes are arranged on the supporting tube, the two waist-shaped holes are oppositely arranged and are located at the same height position of the supporting tube, an adjusting stud is arranged in a manner of being matched with the waist-shaped holes, two nuts are arranged in a manner of being matched with the adjusting stud, the inner diameter of each nut is larger than the diameter.
4. The energy-saving improved double-silver hollow glass magnetron sputtering silver target spacing adjusting mechanism is characterized in that one end of the corrugated pipe, which is connected with the adjusting fixed plate and the adjusting movable plate respectively, is provided with a sealing ring fixedly connected to the adjusting fixed plate or the adjusting movable plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921201249.3U CN210765491U (en) | 2019-07-29 | 2019-07-29 | Energy-saving improved double-silver hollow glass magnetron sputtering silver target spacing adjusting mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921201249.3U CN210765491U (en) | 2019-07-29 | 2019-07-29 | Energy-saving improved double-silver hollow glass magnetron sputtering silver target spacing adjusting mechanism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210765491U true CN210765491U (en) | 2020-06-16 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921201249.3U Active CN210765491U (en) | 2019-07-29 | 2019-07-29 | Energy-saving improved double-silver hollow glass magnetron sputtering silver target spacing adjusting mechanism |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210765491U (en) |
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2019
- 2019-07-29 CN CN201921201249.3U patent/CN210765491U/en active Active
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Address after: 214400 No.9 Xizhang Road, Gushan Town, Jiangyin City, Wuxi City, Jiangsu Province Patentee after: Jiangyin Muxiang Precision Technology Co.,Ltd. Address before: 214400 No.9 Xizhang Road, Gushan Town, Jiangyin City, Wuxi City, Jiangsu Province Patentee before: JIANGYIN MUXIANG ENERGY SAVING DECORATION MATER Co.,Ltd. |
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| CP01 | Change in the name or title of a patent holder |