CN210605358U - Platform for three-switching exposure - Google Patents

Platform for three-switching exposure Download PDF

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Publication number
CN210605358U
CN210605358U CN201921812090.9U CN201921812090U CN210605358U CN 210605358 U CN210605358 U CN 210605358U CN 201921812090 U CN201921812090 U CN 201921812090U CN 210605358 U CN210605358 U CN 210605358U
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frame module
module
work frame
work
working
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CN201921812090.9U
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Chinese (zh)
Inventor
陈志特
王�华
何增灿
黄海浩
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Guangdong Keshi Optical Technology Co.,Ltd.
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Cst Automation Technology Co ltd
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Abstract

The utility model discloses a platform for three-switch exposure, which comprises a frame, a first working frame module, a second working frame module, a third working frame module and a guide module, wherein the first working frame module, the second working frame module and the third working frame module are tiled and arranged on the frame, and the guide module is respectively connected with the first working frame module, the second working frame module and the third working frame module so as to realize the mutual switch among the first working frame module, the second working frame module and the third working frame module; wherein, first work frame module, second work frame module and third work frame module all include regulating plate and work frame, the regulating plate sets up in the work frame, the work frame with the direction module is connected. The utility model discloses the automatic exposure equipment who makes this platform of using can counterpoint exposure and advance/ejection of compact simultaneously, or counterpoint, expose and advance/ejection of compact simultaneously, has improved this automatic alignment exposure equipment's productivity greatly.

Description

Platform for three-switching exposure
Technical Field
The utility model relates to an automatic exposure technical field specifically is a platform is used in exposure is switched to three.
Background
With the rapid development of electronic technology in recent years, the demand of the PCB industry for improving productivity is dramatically increased. The capacity of the traditional full-automatic exposure machine on the solder mask exposure process can only achieve 3-3.5 sheets per minute, and the design of single-side exposure and single-frame operation is usually adopted; in the last two years, some enterprises change the traditional design mode, adopt the design of single-side exposure and double-frame operation, and the capacity can reach 5-6 sheets per minute. Even so, the increasing demand still cannot meet the demand of the current circuit board manufacturing industry.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a platform is used in exposure is switched to three, realizes the seamless switching of material loading and counterpoint exposure process, improves the efficiency and the productivity of automatic counterpoint exposure.
In order to achieve the above object, the utility model provides a following technical scheme:
the utility model provides a platform is used in exposure is switched to three, includes frame, first work frame module, second work frame module, third work frame module and direction module, first work frame module, second work frame module and third work frame module tiling are arranged in the frame, the direction module respectively with first work frame module, second work frame module and third work frame module are connected, in order to realize the mutual switch-over between first work frame module, second work frame module and the third work frame module.
Wherein, first work frame module, second work frame module and third work frame module all include regulating plate and work frame, the regulating plate sets up in the work frame, the work frame with the direction module is connected.
In one embodiment, the guide module comprises three guide mechanisms arranged in parallel, and the three guide mechanisms are respectively connected with the first working frame module, the second working frame module and the third working frame module correspondingly.
In one embodiment, the guide mechanism comprises slide rails and a driving device, the driving device is connected with the slide rails, and the slide rails of the three guide mechanisms are respectively connected with the first working frame module, the second working frame module and the third working frame module correspondingly.
In one embodiment, the slide rails are double slide rails, and the double slide rails of the three guide mechanisms are respectively arranged on two sides of the first working frame module, the second working frame module and the third working frame module.
In one embodiment, the first work frame module, the second work frame module and the third work frame module are arranged in parallel.
In one embodiment, the frame further comprises a first lifting mechanism and a second lifting mechanism, wherein the first lifting mechanism and the second lifting mechanism are arranged on the frame, are positioned on two sides of the frame and respectively correspond to two of the first working frame module, the second working frame module and the third working frame module.
In one embodiment, the first lifting mechanism and the second lifting mechanism are respectively provided with an alignment platform, and the two alignment platforms are respectively correspondingly connected with two of the first working frame module, the second working frame module or the third working frame module.
In one embodiment, the frame further comprises a third lifting mechanism, the third lifting mechanism is arranged on the frame and located in the middle of the frame, and the first lifting mechanism, the second lifting mechanism and the third lifting mechanism are respectively connected with the first working frame module, the second working frame module and the third working frame module correspondingly.
The utility model discloses a platform is used in exposure is switched to three, is provided with 3 work frame modules that can freely switch over, and the automatic exposure equipment who makes to use this platform can counterpoint exposure and advance/the ejection of compact simultaneously, or counterpoint, expose and advance/the ejection of compact simultaneously, has improved this automatic alignment exposure equipment's productivity greatly.
Drawings
Fig. 1 is a schematic structural view of a stage for triple-switch exposure in one embodiment.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Fig. 1 is a schematic structural diagram of a three-switch exposure platform in an embodiment, the three-switch exposure platform includes a rack 100, a first work frame module 210, a second work frame module 220, a third work frame module 230, and guide modules (410, 420, 430), the first work frame module 210, the second work frame module 220, and the third work frame module 230 are tiled on the rack 100, and the guide modules are respectively connected to the first work frame module 210, the second work frame module 220, and the third work frame module 230, so as to implement mutual switching among the first work frame module 210, the second work frame module 220, and the third work frame module 230. Preferably, in order not to affect the mutual switching among the three work frame modules, the first work frame module 210, the second work frame module 220 and the third work frame module 230 are arranged in parallel. Wherein, first work frame module 210, second work frame module 220 and third work frame module 230 all include regulating plate and work frame, as shown in fig. 1 to first work frame module 210 group is the example, regulating plate 211 sets up in the work frame 212, work frame 211 with the direction module is connected, and regulating plate 211 can be used to accomplish the automatic alignment of product.
In the three-switching exposure platform in this embodiment, three stations are preset, and the three stations respectively correspond to the initial positions of the first working frame module 210, the second working frame module 220, and the third working frame module 230, and the three stations are a first exposure station, a second exposure station, and a third exposure station in sequence. Placing a product to be exposed on the third working frame module 230, switching the positions of the third working frame module 230 and the first working frame module 210 through the guide module, so that the third working frame module 230 and the product are positioned at the first exposure station 110, and performing alignment exposure processing on the product to be exposed on the third working frame module 230; at this time, the first working frame module 210 is located at the feeding and discharging station, and can be used for feeding a second product to be exposed, and then the positions of the first working frame module 210 and the second working frame module 220 are switched through the guide module, so that the first working frame module 210 and the product are located at the second exposure station, and the second product to be exposed is subjected to alignment exposure treatment; after the processing of the product on the first exposure station 110 is completed, the third working frame module 230 is switched to the feeding and discharging station through the guide module to discharge, and the second working frame module 220 on the feeding and discharging station with the newly-loaded third product to be exposed is switched to the first exposure station through the guide module to perform the alignment exposure processing; the above operation is then repeated. Three work frame modules that can freely switch make the automatic alignment exposure equipment who uses this platform carry out a plurality of processes simultaneously, and accomplish seamless joint between every process, very big improvement this automatic alignment exposure equipment's work efficiency and productivity.
In one embodiment, the guide module includes three guide mechanisms disposed in parallel, the three guide mechanisms are a first guide mechanism 310, a second guide mechanism 320, and a third guide mechanism 330, respectively, and the first guide mechanism 310, the second guide mechanism 320, and the third guide mechanism 330 are correspondingly connected to the first work frame module 210, the second work frame module 220, and the third work frame module 230, respectively. Specifically, the guiding mechanism includes a slide rail and a driving device, for example, the second driving mechanism 320, the driving device 322 is connected to the slide rail 321, and the driving device may be a driving member such as a motor; three guiding mechanism's slide rail respectively with first work frame module 210, second work frame module 220 and third work frame module 230 correspond and are connected, wherein, in order to improve the stability of work frame module when taking place the horizontal motion, the slide rail is two slide rails, and is three guiding mechanism's two slide rails are equallyd divide and are do not set up first work frame module 210, second work frame module 220 and third work frame module 230's both sides.
In one embodiment, the three-switch platform further includes a first lifting mechanism 410 and a second lifting mechanism 420, where the first lifting mechanism 410 and the second lifting mechanism 420 are disposed on the rack 100, located at two sides of the rack 100, and respectively correspond to two of the first work frame module 210, the second work frame module 220, and the third work frame module 230. Specifically, the first lifting mechanism 410 and the second lifting mechanism 420 are both provided with alignment platforms, and the two alignment platforms are respectively connected to two of the first work frame module 210, the second work frame module 220, or the third work frame module 230.
In the preset three stations, the first lifting mechanism 410 and the second lifting mechanism 420 are respectively located at the first exposure station and the second exposure station, and in the initial state, the first work frame module 210 is connected with the first lifting mechanism 410, and the second work frame module 220 is connected with the second lifting mechanism 420; when the three work frame modules are switched, the first lifting mechanism 410 and the second lifting mechanism 420 are respectively connected with the work frame module located at the first exposure station and the work frame module located at the second exposure station. Taking the first lifting mechanism 410 as an example, the alignment platform 411 of the first lifting mechanism 410 is connected to the adjustment plate 211 of the work frame module 210 located at the same station, and is used for performing lifting and alignment processing on the adjustment plate 211.
The platform for exposure is switched to three in this embodiment, and drive arrangement work makes the working frame module be the horizontal direction motion on the slide rail, and the regulating plate in the working frame module can be vertical direction motion under elevating system's effort on the working frame to counterpoint the processing on counterpointing the platform.
In an embodiment, the three-switching platform further includes a third lifting mechanism 430, the third lifting mechanism 430 is disposed on the rack 100 and located in the middle of the rack 100, the first lifting mechanism 410, the second lifting mechanism 420, and the third lifting mechanism 430 are correspondingly connected to the first work frame module 210, the second work frame module 220, and the third work frame module 230, respectively, that is, in preset three stations, the third lifting mechanism 430 is located at a feeding and discharging station, in an initial state, the first work frame module 210 is connected to the first lifting mechanism 410, the second work frame module 220 is connected to the second lifting mechanism 420, and the third work frame module 230 is connected to the third lifting mechanism 430. Specifically, the third lifting mechanism 430 can lift the adjusting plate of the working frame module located on the same station, so that the discharging device can discharge the working frame module conveniently.
The utility model discloses a platform is used in exposure is switched to three, is provided with 3 work frame modules that can freely switch over, makes the automatic exposure equipment who uses this platform is used in exposure of three switches can carry out counterpoint exposure and advance/the ejection of compact simultaneously, or counterpoint, expose and advance/the ejection of compact simultaneously, has improved this automatic counterpoint exposure equipment's productivity greatly.
The foregoing examples, while indicating preferred embodiments of the invention, are given by way of illustration and description, it is to be understood that the invention is not limited to the disclosed forms herein but is not intended to be exhaustive or to exclude other examples and may be used in various other combinations, modifications, and environments and is capable of changes within the scope of the inventive concept as expressed herein, commensurate with the above teachings or the skill or knowledge of the relevant art, and not to limit the scope of the invention. It should be noted that, for those skilled in the art, various changes and modifications can be made without departing from the spirit and scope of the present invention, and these changes and modifications can be made by those skilled in the art without departing from the spirit and scope of the present invention, which is to be construed as being limited only by the appended claims. Therefore, the protection scope of the present invention should be subject to the appended claims.

Claims (8)

1. A platform for three-switch exposure is characterized by comprising a rack, a first working frame module, a second working frame module, a third working frame module and a guide module, wherein the first working frame module, the second working frame module and the third working frame module are tiled and arranged on the rack;
wherein, first work frame module, second work frame module and third work frame module all include regulating plate and work frame, the regulating plate sets up in the work frame, the work frame with the direction module is connected.
2. The stage according to claim 1, wherein the guide module comprises three guide mechanisms disposed in parallel, and the three guide mechanisms are respectively connected to the first frame module, the second frame module, and the third frame module.
3. The stage according to claim 2, wherein the guide mechanism includes a slide rail and a driving device, the driving device is connected to the slide rail, and the slide rails of the three guide mechanisms are respectively connected to the first work frame module, the second work frame module, and the third work frame module.
4. The stage according to claim 3, wherein the slide rails are double slide rails, and the double slide rails of the three guide mechanisms are respectively disposed on both sides of the first work frame module, the second work frame module, and the third work frame module.
5. The stage for triple-switch exposure according to claim 1, wherein the first work frame module, the second work frame module, and the third work frame module are disposed in parallel with each other.
6. The stage according to claim 1, further comprising a first elevating mechanism and a second elevating mechanism, wherein the first elevating mechanism and the second elevating mechanism are provided on the frame, are located on both sides of the frame, and respectively correspond to two of the first work frame module, the second work frame module, and the third work frame module.
7. The stage for triple-shift exposure according to claim 6, wherein each of the first and second elevating mechanisms has an alignment stage, and the two alignment stages are respectively connected to two of the first, second, or third work frame modules.
8. The stage according to claim 6, further comprising a third elevating mechanism disposed on the frame at a middle portion of the frame, wherein the first, second, and third elevating mechanisms are respectively connected to the first, second, and third work frame modules.
CN201921812090.9U 2019-10-26 2019-10-26 Platform for three-switching exposure Active CN210605358U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201921812090.9U CN210605358U (en) 2019-10-26 2019-10-26 Platform for three-switching exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201921812090.9U CN210605358U (en) 2019-10-26 2019-10-26 Platform for three-switching exposure

Publications (1)

Publication Number Publication Date
CN210605358U true CN210605358U (en) 2020-05-22

Family

ID=70696126

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201921812090.9U Active CN210605358U (en) 2019-10-26 2019-10-26 Platform for three-switching exposure

Country Status (1)

Country Link
CN (1) CN210605358U (en)

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Address after: No. 333, Zhushan Zhenxing Road, Dongcheng District, Dongguan City, Guangdong Province

Patentee after: Guangdong Keshi Optical Technology Co.,Ltd.

Address before: No. 333, Zhushan Zhenxing Road, Dongcheng District, Dongguan City, Guangdong Province

Patentee before: CST AUTOMATION TECHNOLOGY Co.,Ltd.