CN210379094U

CN210379094U - Simple water film device for wet etching of photovoltaic solar cell

Info

Publication number: CN210379094U
Application number: CN201921893024.9U
Authority: CN
Inventors: 曾德栋; 鲍亚平; 陈议文; 崔红云; 韩锦明
Original assignee: Hainan Yingli New Energy Resources Co ltd
Current assignee: Hainan Yingli New Energy Resources Co ltd
Priority date: 2019-11-05
Filing date: 2019-11-05
Publication date: 2020-04-21
Anticipated expiration: 2029-11-05

Abstract

The utility model provides a simple and easy water film device of photovoltaic solar cell wet etching, including the gyro wheel, silicon chip import position department is equipped with the water film device, the water film device is including setting up the spray pipe of gyro wheel top, and with the inlet tube of spray pipe intercommunication, and a plurality of hole for water sprayings that set up on the spray pipe, the hole for water sprayings is just right the silicon chip that the gyro wheel top passes through sprays. This device reforms transform on current etching equipment's basis, reforms transform with low costsly, can effectively improve the A grade product rate of etching process, reduces manufacturing cost for the enterprise.

Description

Simple water film device for wet etching of photovoltaic solar cell

Technical Field

The utility model relates to a photovoltaic cell preparation technical field especially relates to a simple and easy water film device of photovoltaic solar cell wet etching.

Background

Solar cells are receiving wide attention all over the world as a new green and environmentally friendly energy source. The development of the global photovoltaic industry is very rapid, and the domestic photovoltaic industry is continuously developed and strengthened.

With the continuous development of the industry, the appearance requirement of the battery piece for customers is higher and higher. The wet etching is a key step in the process of a battery production link, and the surface of an etched edge can be generated and the appearance of a battery piece is influenced due to poor control of the wet etching process. At present, two devices, namely Schmid and Rena, are commonly used in the wet etching in the industry, and the Schmid wet etching device is designed and provided with a water film device, so that the surface appearance of a silicon wafer is well protected, and the stability is higher, but the device is more expensive, the acid consumption is high, the production cost is relatively higher, and many manufacturers do not want to select the device for production; rena wet etching equipment is not provided with a water film device, is relatively cheap, consumes less acid, and is easy to generate a large amount of etched edge surfaces due to the absence of the water film device, so that the appearance of the cell is seriously influenced. The manufacturer also develops and designs a water film device subsequently, but the price is expensive, and the water film device is not suitable for small and medium-sized enterprises.

Therefore, it is urgently needed for technicians in the field to develop a simple water film device for wet etching of a photovoltaic solar cell aiming at the existing RENA etching equipment, so as to solve the problems in the prior art.

SUMMERY OF THE UTILITY MODEL

In view of this, the utility model provides a simple and easy water film device of photovoltaic solar cell wet etching solves the problem that exists among the prior art, and concrete scheme is as follows:

the utility model provides a simple and easy water film device of photovoltaic solar cell wet etching, includes the gyro wheel, and silicon chip import position department is equipped with the water film device, the water film device is including setting up the spray pipe of gyro wheel top, and with the inlet tube of spray pipe intercommunication, and a plurality of hole for water sprayings that set up on the spray pipe, the hole for water sprayings is just right the silicon chip that the gyro wheel top passes through sprays.

Specifically, the water inlet pipe is also connected with a flow control device and a pressure control device.

Specifically, the water spray pipe is further connected with a power rotating device, and the power rotating device can control the water spray pipe to rotate so as to control water sprayed from the water spray holes to be sprayed to the upper surface of the silicon wafer.

Specifically, the silicon wafer drying device further comprises a water squeezing roller arranged behind the water spraying pipe along the feeding direction of the silicon wafer.

Specifically, the difference between the diameter D2 of the middle part of the wringing roller and the diameter D1 of the two ends is not less than the thickness of the silicon wafer.

Specifically, wringing roller middle part diameter D2 is 30.92mm, wringing roller both ends diameter D1 is 32mm, wringing roller transmission shaft diameter D is 9mm, the length L of wringing roller both ends diameter D1 is 25 mm.

Specifically, the distance between the water spraying pipe and the water squeezing roller is 20-40 cm.

Specifically, a baffle is further arranged at the position of the silicon wafer outlet, and the distance D from the baffle to the position above the passing silicon wafer is 0.8-1.2 cm.

Specifically, the aperture of the water spraying holes is 1mm, and the hole spacing is 1-2 mm.

In particular, the device is suitable for RENA etching equipment.

The utility model provides a simple and easy water film device of photovoltaic solar cell wet etching has following beneficial effect: the improved etching equipment is transformed on the basis of the existing etching equipment, the transformation cost is low, the A-grade product rate in the etching process can be effectively improved, and the production cost is reduced for enterprises.

Drawings

In order to illustrate the embodiments of the present invention or the technical solutions in the prior art more clearly, the drawings required in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.

Fig. 1 the present invention provides a water film apparatus.

Fig. 2 is a schematic view of the working state of the pressure plate.

Fig. 3 is a schematic structural view of the wringing roller.

In the figure: 10. the device comprises a roller 20, a water spray pipe 21, a water inlet pipe 22, a water spray hole 30, a water squeezing roller 40, a silicon wafer 50 and a baffle.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Fig. 1 is a schematic view of the water film apparatus provided by the present invention, fig. 2 is a schematic view of a working state of a pressing plate, and fig. 3 is a schematic view of a water squeezing roller. Referring to fig. 1-3, the present invention

A simple water film device for wet etching of a photovoltaic solar cell comprises a roller 10, wherein a water film device is arranged at the position of a silicon wafer inlet (the feeding direction of a silicon wafer is shown by an arrow in figures 1 and 2), the water film device comprises a water spray pipe 20 arranged above the roller 10, a water inlet pipe 21 communicated with the water spray pipe 20 and a plurality of water spray holes 22 arranged on the water spray pipe 20, and the water spray holes 22 are directly opposite to a silicon wafer 40 passing above the roller 10 for spraying.

Specifically, the water inlet pipe 21 is also connected to a flow rate control device (not shown) and a pressure control device (not shown) for controlling the water spray rate and the water spray pressure of the water spray pipe 20, which are part of the prior art and are not shown in the drawing.

Specifically, the water spraying pipe 20 is further connected with a power rotating device, and the power rotating device can control the water spraying pipe 20 to rotate, so as to control the spraying angle of the water sprayed from the water spraying holes 22, and ensure that the water can be sprayed onto the upper surface of the silicon wafer 40.

Specifically, the silicon wafer drying device further comprises a water squeezing roller 30 arranged behind the water spraying pipe 20 along the feeding direction of the silicon wafer 40, and after the silicon wafer passes through the water squeezing roller, water drops on the surface of the silicon wafer can be uniformly attached by the water squeezing roller 30.

Specifically, the difference between the diameter D2 of the middle part of the wringing roller 30 and the diameter D1 of the two ends is not less than the thickness of the silicon wafer 40.

Specifically, the diameter D2 in the middle of the wringing roller 30 is 30.92mm, the diameters D1 at the two ends of the wringing roller 30 are 32mm, the diameter D of the transmission shaft of the wringing roller 30 is 9mm, and the length L of the diameter D1 at the two ends of the wringing roller 30 is 25 mm.

Specifically, the distance between the water spraying pipe 20 and the water squeezing roller 30 is 20-40 cm.

Specifically, a baffle 50 is further arranged at the outlet of the silicon wafer 40, and the vertical distance D between the baffle 50 and the passing silicon wafer 40 is 0.8-1.2 cm.

Specifically, the diameter of the water spray holes 22 is 1mm, and the hole distance is 1-2 mm.

In particular, the device is suitable for RENA etching equipment.

While the embodiments of the present invention have been described with reference to the accompanying drawings, the present invention is not limited to the above-described embodiments, which are merely illustrative and not restrictive, and many modifications may be made by one skilled in the art without departing from the spirit and scope of the present invention as defined in the appended claims.

Claims

1. The utility model provides a simple and easy water film device of photovoltaic solar cell wet etching, includes gyro wheel (10), its characterized in that: the silicon wafer inlet position is provided with a water film device, the water film device comprises a water spray pipe (20) arranged above the roller (10), a water inlet pipe (21) communicated with the water spray pipe (20), and a plurality of water spray holes (22) arranged on the water spray pipe (20), and the water spray holes (22) are opposite to the silicon wafer (40) passing above the roller (10) to spray.

2. The simple water film device for wet etching of the photovoltaic solar cell according to claim 1, wherein: the water inlet pipe (21) is also connected with a flow control device and a pressure control device.

3. The simple water film device for wet etching of the photovoltaic solar cell according to claim 2, wherein: the water spray pipe (20) is also connected with a power rotating device, and the power rotating device can control the water spray pipe (20) to rotate so as to control the water sprayed from the water spray holes (22) to spray on the upper surface of the silicon wafer (40).

4. The simple water film device for wet etching of the photovoltaic solar cell according to claim 3, wherein: the silicon wafer drying device also comprises a water squeezing roller (30) which is arranged behind the water spraying pipe (20) along the feeding direction of the silicon wafer (40).

5. The simple water film device for wet etching of the photovoltaic solar cell according to claim 4, wherein: the difference between the diameter D2 of the middle part of the wringing roller (30) and the diameter D1 of the two ends is not less than the thickness of the silicon slice (40).

6. The simple water film device for wet etching of the photovoltaic solar cell according to claim 5, wherein: wringing roller (30) middle part diameter D2 is 30.92mm, wringing roller (30) both ends diameter D1 is 32mm, wringing roller (30) transmission shaft diameter D is 9mm, wringing roller (30) both ends diameter D1's length L is 25 mm.

7. The simple water film device for wet etching of the photovoltaic solar cell according to claim 6, wherein: the distance between the water spraying pipe (20) and the water squeezing roller (30) is 20-40 cm.

8. The simple water film device for wet etching of photovoltaic solar cells according to any one of claims 1 to 7, wherein: the outlet of the silicon wafer (40) is also provided with a baffle (50), and the vertical distance D between the baffle (50) and the passing upper part of the silicon wafer (40) is 0.8-1.2 cm.

9. The simple water film device for wet etching of photovoltaic solar cells according to claim 8, wherein: the aperture of the water spray holes (22) is 1mm, and the hole spacing is 1-2 mm.

10. The simple water film device for wet etching of the photovoltaic solar cell according to claim 9, wherein: the method is suitable for the RENA etching equipment.