CN209957888U

CN209957888U - Evaporation plating mechanism

Info

Publication number: CN209957888U
Application number: CN201920536734.XU
Authority: CN
Inventors: 不公告发明人
Original assignee: Fujian Huajiacai Co Ltd
Current assignee: Fujian Huajiacai Co Ltd
Priority date: 2019-04-19
Filing date: 2019-04-19
Publication date: 2020-01-17
Anticipated expiration: 2029-04-19

Abstract

The utility model provides an evaporation plating mechanism, including magnetic sheet, fixed bolster, evaporation plating crucible unit, magnetic film and vacuum cavity, magnetic sheet and vertical face are provided with the contained angle, and the mode that adopts the evaporation plating on the back of the base plate of evaporation plating earlier attaches one deck magnetic film, can pass through the principle of magnetism with the magnetic sheet through the magnetic film, with the base plate attached completely and the magnetic sheet on, avoid the base plate to take place crooked phenomenon. The evaporation crucible unit is arranged on the fixed support, and the fixed support and the magnetic plate are parallel to each other, so that the same distance between the substrate on the magnetic plate and the fixed support is ensured, the quality of substrate evaporation can be improved when evaporation is carried out through the evaporation crucible unit, and the problem of bending of the substrate is solved.

Description

Evaporation plating mechanism

Technical Field

The utility model relates to a crucible coating by vaporization field especially relates to an evaporation coating machine constructs.

Background

Since the invention of Organic Light-Emitting diodes (abbreviated as OLEDs), OLEDs have been developed in a great deal in the field of applications, and are now widely used in mobile phones, TVs and tablet computers, becoming a new generation of display technology with great development prospects.

Organic light-emitting materials are the core part of the OLED light-emitting device, and the mainstream method for preparing the OLED device is physical vapor deposition: namely heating in a vacuum cavity to enable the material to be gasified or sublimated and deposited on a substrate with a lower temperature, and forming the OLED device structure with multiple layers of films.

Specifically, the crucible is placed at the bottom of the vacuum chamber, the substrate is positioned at the upper part of the vacuum chamber, the coating surface of the substrate faces the discharge hole of the crucible, and after the organic material is heated and gasified in the crucible, the organic material is deposited on the substrate in the vacuum chamber, so that coating is realized. However, the thickness of the substrate is generally within 1mm, so that the substrate positioned at the upper part of the cavity is easy to bend due to no support in the middle, so that the substrate is a cambered surface. The existence of the cambered surface causes the following adverse effects on evaporation: (1) the alignment precision of the evaporation equipment is influenced; (2) the thickness of the substrate directly affects the bending amount, so that the thickness of the substrate has strict requirements; (3) the curved substrate may also have some effect on the transfer of the substrate.

SUMMERY OF THE UTILITY MODEL

Therefore, it is necessary to provide an evaporation mechanism to solve the problems that the substrate in the existing evaporation equipment has a bending amount and the quality of the substrate evaporation is affected.

In order to achieve the above object, the inventor provides an evaporation mechanism, comprising a magnetic plate, a fixed bracket, an evaporation crucible unit, a magnetic film and a vacuum cavity; the magnetic film is used for being arranged on the back face of the substrate, an included angle is formed between the magnetic plate and the vertical face, the plate face of the magnetic plate and the fixing support are arranged in the vacuum cavity in parallel, the evaporation crucible unit is arranged on the fixing support, and the evaporation crucible unit is used for spraying evaporation gas to coat a film on the substrate.

Further, still include fixed panel, a face of fixed panel is provided with the standing groove, another face of fixed panel sets up on the magnetic sheet.

Further, the included angle is a, and the angle value of the included angle is more than or equal to 0 degree and less than or equal to 15 degrees.

Further, a sliding rail is arranged on the fixed support, and the sliding rail and the magnetic plate are arranged in parallel.

Further, the evaporation crucible unit comprises a crucible and a sliding block, the sliding block is arranged on a bottom frame body of the crucible, and the sliding rail is arranged on the sliding rail.

Further, the evaporation crucible unit is provided with a planar crucible, the planar crucible is provided with a plurality of discharging holes, and the discharging holes are arranged on the top surface of the planar crucible in a rectangular array mode.

Be different from prior art, adopt the mode of coating by vaporization to attach one deck magnetic film on the back of above-mentioned technical scheme's the base plate that needs the coating by vaporization, can pass through the principle of magnetism through magnetic film and magnetic plate, with the base plate attached completely and magnetic plate on, avoid the base plate to take place crooked phenomenon. The evaporation crucible unit is arranged on the fixed support, and the fixed support and the magnetic plate are parallel to each other, so that the same distance between the substrate on the magnetic plate and the fixed support is ensured, the quality of substrate evaporation can be improved when evaporation is carried out through the evaporation crucible unit, and the problem of bending of the substrate is solved.

Drawings

FIG. 1 is a schematic view of a deposition mechanism according to an embodiment when the deposition mechanism is a flat crucible;

FIG. 2 is a schematic view of a deposition mechanism according to an embodiment when the deposition mechanism is a crucible;

fig. 3 is a schematic view of a substrate of the vapor deposition mechanism according to the embodiment.

Description of reference numerals:

1. a substrate;

10. a magnetic plate; 11. an included angle; 12. fixing the panel; 121 placing a groove;

20. fixing a bracket;

30. a vaporization crucible unit; 31. a crucible; 32. a slide rail; 33. a slider;

40. a magnetic thin film; 50. a vacuum chamber;

Detailed Description

To explain technical contents, structural features, and objects and effects of the technical solutions in detail, the following detailed description is given with reference to the accompanying drawings in conjunction with the embodiments.

Referring to fig. 1, 2 and 3, the present embodiment provides an evaporation mechanism, which includes a magnetic plate 10, a fixing bracket 20, an evaporation crucible unit 30, a magnetic thin film 40 and a vacuum chamber 50, wherein the magnetic thin film is disposed on the back surface of a substrate 1, an included angle 11 is formed between the magnetic plate and a vertical surface, the plate surface of the magnetic plate and the fixing bracket are disposed in the vacuum chamber in parallel, the evaporation crucible unit is disposed on the fixing bracket, and the evaporation crucible unit is used for spraying evaporation gas to coat a film on the substrate.

When the evaporation mechanism of this embodiment is used, the substrate needs to be pretreated, that is, a layer of magnetic thin film is attached to the back surface of the substrate by using an evaporation method, and the structure of the magnetic thin film may also be different according to different shapes or sizes of the substrate, for example, a grid structure, a planar structure, or a frame structure with a space, and further, the evaporation mechanism is suitable for evaporation of magnetic thin films on different substrates. The substrate is adsorbed through the magnetic plate, so that the substrate is adsorbed on the magnetic plate smoothly, and the magnetic plate can adopt an electromagnetic plate or a magnetic plate. The substrate is magnetically spread by the magnetic plate, so that the problem of bending phenomenon when the substrate is fixed is completely eliminated.

In the embodiment, the magnetic plate and the fixed support are arranged in parallel, an included angle is formed between the magnetic plate and the vertical plane, the included angle is a, and the included angle is more than or equal to 0 degree and less than or equal to 15 degrees. Therefore, the substrate on the magnetic plate has a downward gravity, in order to eliminate the problem that the gravity may drive the substrate to slide, in the embodiment, a fixing panel 12 is installed on the magnetic plate, the fixing panel can also be an electromagnetic plate or a magnet plate, a placing groove 121 is formed in the surface of the fixing panel, the substrate is clamped through the placing groove, or the substrate is supported, the substrate is prevented from sliding, the positioning of the substrate is completed, and the practicability and the reliability of the evaporation mechanism are improved.

When the substrate is completely fixed, the substrate can be coated. Specifically, the interval between the evaporation crucible unit on the fixed bolster and the magnetic sheet is certain, and magnetic sheet, fixed bolster and evaporation crucible unit all are located the vacuum chamber, consequently through the evacuation processing for the evaporation material that evaporation crucible unit jetted attaches on the front of base plate. The evaporation crucible unit has two kinds of mounting means in this embodiment, and the first kind is provided with the crucible 31 of line source formula for the evaporation crucible unit to horizontal installation installs slide rail 32 on the fixed bolster, through slider 33 with the crucible fixed with the slide rail on, through the crucible of line source formula can slide scanning evaporation coating from top to bottom in vertical direction along the slide rail. And because the fixed support and the magnetic plate are parallel to each other and the substrate does not bend, the distance between the crucible and the substrate is not changed when the crucible moves, thereby achieving the purpose of uniformly attaching the film. And the other is that a line source type crucible is vertically arranged on a slide rail, so that the line source type crucible slides along the horizontal line direction, and the substrate is moved in the horizontal direction for scanning evaporation. Through these two kinds of different mounting means, can adapt to the coating by vaporization of the base plate of different shape sizes, improve the adaptability of coating by vaporization mechanism. Because the height of each discharge port of the linear source type crucible is the same, the distance between each discharge port and the substrate is consistent, so that each part of the substrate is simultaneously evaporated, and the problem of uneven evaporation when the area of the substrate is large is solved. Therefore, the distance between the substrate on the magnetic plate and the fixed support is ensured to be the same, the problem of bending of the substrate is solved, and the quality of the coating of the substrate is improved.

It should be noted that, although the above embodiments have been described herein, the scope of the present invention is not limited thereby. Therefore, based on the innovative concept of the present invention, the changes and modifications of the embodiments described herein, or the equivalent structure or equivalent process changes made by the contents of the specification and the drawings of the present invention, directly or indirectly apply the above technical solutions to other related technical fields, all included in the protection scope of the present invention.

Claims

1. An evaporation coating mechanism, its characterized in that: comprises a magnetic plate, a fixed bracket, an evaporation crucible unit, a magnetic film and a vacuum cavity;

the magnetic film is arranged on the back surface of the substrate, an included angle is formed between the magnetic plate and the vertical surface,

the surface of the magnetic plate and the fixed support are arranged in the vacuum cavity in parallel, the evaporation crucible unit is arranged on the fixed support, and the evaporation crucible unit is used for spraying evaporation gas to coat a film on the substrate.

2. A vapor deposition mechanism according to claim 1, wherein: still include fixed panel, a face of fixed panel is provided with the standing groove, another face setting of fixed panel is on the magnetic sheet.

3. A vapor deposition mechanism according to claim 1, wherein: the included angle is set to be a, and the angle value of the included angle is more than or equal to 0 degree and less than or equal to 15 degrees.

4. A vapor deposition mechanism according to claim 1, wherein: the fixed support is provided with a slide rail, and the slide rail and the magnetic plate are arranged in parallel.

5. A vapor deposition mechanism according to claim 4, wherein: the evaporation crucible unit comprises a crucible and a sliding block, the sliding block is arranged on a bottom surface frame body of the crucible, and the sliding rail is arranged on the sliding rail.