CN209894139U - Parallelism measuring device and parallelism measuring system of pressing machine - Google Patents
Parallelism measuring device and parallelism measuring system of pressing machine Download PDFInfo
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- CN209894139U CN209894139U CN201920985495.6U CN201920985495U CN209894139U CN 209894139 U CN209894139 U CN 209894139U CN 201920985495 U CN201920985495 U CN 201920985495U CN 209894139 U CN209894139 U CN 209894139U
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Abstract
An embodiment of the utility model provides a depth of parallelism measuring device and punch press depth of parallelism measuring system, depth of parallelism measuring device are used for measuring the depth of parallelism on first surface and second surface, include: a collimator that emits a measuring beam; a first optical element parallel to the first surface, reflecting part of the measuring beam to the collimator, and transmitting part of the measuring beam; and the second optical element is parallel to the second surface, is positioned on one side of the first optical element, which is far away from the collimator, and reflects the measuring beam transmitted through the first optical element to the collimator. An embodiment of the utility model provides a depth of parallelism measuring device and punch press depth of parallelism measurement system to realize simplifying the depth of parallelism measuring process, improve the measured precision of depth of parallelism.
Description
Technical Field
The embodiment of the utility model provides a plane parallelism measurement technique especially relates to parallelism measuring device and punch press parallelism measurement system is related to.
Background
Along with the popularization of security monitoring facilities, the security lens has higher and higher requirements on the definition of monitoring pictures. The lens is one of main components influencing imaging quality, and the parallelism between the lens and the lens cone is a key factor influencing imaging quality in the installation process. In order to avoid the bad lens caused by artificial installation errors, a press machine is generally used for assembling the lens in the installation process; therefore, the parallelism between the pressing head and the pressing base on the pressing machine becomes the primary consideration.
The parallelism of the existing pressing head and the pressing base can be finished only by measuring at least twice, the measuring process is complicated, and the measuring precision is difficult to guarantee. Furthermore, the parallelism measurement of any two existing first surfaces can be completed only by at least two times of measurement, the measurement process is complicated, and the measurement precision is difficult to guarantee.
SUMMERY OF THE UTILITY MODEL
An embodiment of the utility model provides a depth of parallelism measuring device and punch press depth of parallelism measurement system to realize simplifying the depth of parallelism measuring process, improve the measured precision of depth of parallelism.
In a first aspect, an embodiment of the present invention provides a parallelism measuring apparatus for measuring parallelism of a first surface and a second surface, including:
a collimator that emits a measuring beam;
a first optical element parallel to the first surface, reflecting part of the measuring beam to the collimator, and transmitting part of the measuring beam;
and the second optical element is parallel to the second surface, is positioned on one side of the first optical element, which is far away from the collimator, and reflects the measuring beam transmitted through the first optical element to the collimator.
Optionally, the first optical element comprises a first parallel plate and a transflective film on the first parallel plate.
Optionally, the second optical element comprises a second parallel flat plate and a total reflection film on the second parallel flat plate, or the second optical element comprises a mirror.
In a second aspect, an embodiment of the present invention provides a parallelism measuring system for a pressing machine, where the pressing machine includes a pressing head and a pressing base, and includes the parallelism measuring device of the first aspect;
the first optical element is fixed with the pressing head, the second optical element is fixed with the pressing base, so that the first optical element is parallel to the surface of the pressing head facing one side of the pressing base, and the second optical element is parallel to the surface of the pressing base facing one side of the pressing head; alternatively, the first and second electrodes may be,
the second optical element is fixed with the pressing head, the first optical element is fixed with the pressing base, so that the second optical element is parallel to the surface of the pressing head facing one side of the pressing base, and the first optical element is parallel to the surface of the pressing base facing one side of the pressing head.
Optionally, a spacer is further included, the spacer being located between the first optical element and the second optical element.
Optionally, the spacer is a rubber pad.
Optionally, the system further comprises a display connected to the collimator and configured to display the light beam received by the receiving surface of the collimator;
the measuring beam reflected by the first optical element forms a point A in the receiving surface, the measuring beam reflected by the second optical element forms a point B in the receiving surface, and an inclined included angle delta between the pressing head and the pressing base satisfies the following conditions:
wherein Δ X is a distance between the point a and the point B in the receiving surface along the X direction, Δ Y is a distance between the point a and the point B in the receiving surface along the Y direction, and t is a conversion coefficient of the scale value and the inclination angle displayed on the display.
The embodiment of the utility model provides a depth of parallelism measuring device includes first optical element and second optical element, and first optical element is located between collimator and the second optical element, and the measuring beam that the collimator was launched shines first optical element and second optical element in same time measuring to obtain first optical element and second optical element's depth of parallelism according to the light beam by first optical element and second optical element reflection, thereby realize the measurement to first surface and second surface depth of parallelism. The embodiment of the utility model provides a parallelism measuring device can realize measuring the parallelism on first surface and second surface in a measurement, has left out the process of zeroing to realize simplifying the measured process of parallelism, improve the measuring precision of parallelism.
Drawings
Fig. 1 is a schematic structural diagram of a parallelism measuring apparatus according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a parallelism measuring apparatus according to an embodiment of the present invention;
fig. 3 is a schematic structural diagram of a system for measuring parallelism of a press according to an embodiment of the present invention;
fig. 4 is a schematic diagram of a light beam received by a receiving surface of a collimator according to an embodiment of the present invention;
fig. 5 is a top view of the pressing base seat according to the embodiment of the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
For the parallelism measurement of the first surface and the second surface (wherein the first surface and the second surface may be two surfaces of one object or two surfaces of two objects, the parallelism of the first surface and the second surface may be represented by an included angle between the first surface and the second surface, for example, the parallelism of the first surface and the second surface is worse when the included angle between the first surface and the second surface is larger, the parallelism of the first surface and the second surface is better when the included angle between the first surface and the second surface is smaller, and the parallelism of the first surface and the second surface is better when the included angle between the first surface and the second surface is 0 °, the first surface is parallel to the second surface), in the prior art, the matching of a collimator and a reflecting mirror is usually used and is implemented by two measurements. Specifically, in a first step, the mirror is set to be parallel to the first surface, a first measurement is performed using the collimator, and the position and inclination angle of the collimator are adjusted so that the collimator is irradiated perpendicularly to the mirror while the light beam reflected by the mirror is located at the center of the receiving surface of the collimator (referred to as a zeroing process). In a second step, the mirror is set parallel to the second surface and a second measurement is taken using a collimator. In the prior art, the parallelism of the first surface and the second surface can be measured at least twice, the measurement process is complicated, and the measurement precision is difficult to ensure due to the accumulation of errors caused by multiple measurements.
Fig. 1 is a schematic structural diagram of a parallelism measuring apparatus provided by an embodiment of the present invention, and referring to fig. 1, the parallelism measuring apparatus is used for measuring parallelism of a first surface 101 and a second surface 102, and the parallelism measuring apparatus includes a collimator 1, a first optical element 2, and a second optical element 4. The collimator 1 emits a measuring beam. The first optical element 2 is parallel to the first surface 101, the first optical element 2 reflecting part of the measuring beam to the collimator 1 and transmitting part of the measuring beam. The measuring beam impinging on the first optical element 2 is partially transmitted and partially reflected. The second optical element 4 is parallel to the second surface 102, and the second optical element 4 is located on a side of the first optical element 2 away from the collimator 1, and reflects the measuring beam transmitted through the first optical element 2 to the collimator 1.
The embodiment of the utility model provides a depth of parallelism measuring device includes first optical element and second optical element, and first optical element is located between collimator and the second optical element, and the measuring beam that the collimator was launched shines first optical element and second optical element in same time measuring to obtain first optical element and second optical element's depth of parallelism according to the light beam by first optical element and second optical element reflection, thereby realize the measurement to first surface and second surface depth of parallelism. The embodiment of the utility model provides a parallelism measuring device can realize measuring the parallelism on first surface and second surface in a measurement, has left out the process of zeroing to realize simplifying the measured process of parallelism, improve the measuring precision of parallelism.
Alternatively, referring to fig. 1, the first optical element 2 includes a first parallel plate 22 and a first transflective film 21 on the first parallel plate 22. The first transflective film 21 may be disposed between the first parallel plate 22 and the second optical element 4. In other embodiments, the first transflective film 21 may be disposed between the first parallel plate 22 and the collimator 1.
Exemplarily, referring to fig. 1, the first transflective film 21 may be disposed between the first parallel plate 22 and the second optical element 4, and the first transflective film 21 may be plated on a surface of the first parallel plate 22 on a side away from the collimator 1. The first parallel plate 22 is a parallel glass plate, and the parallelism of the upper and lower surfaces of the parallel glass plate is within 5 ".
Alternatively, referring to fig. 1, the second optical element 4 includes a second parallel flat plate 42 and a total reflection film 41 on the second parallel flat plate 42. The total reflection film 41 may be disposed on the side of the second parallel plate 42 remote from the collimator 1. In other embodiments, the total reflection film 41 may be disposed between the second parallel flat plate 42 and the collimator 1.
Exemplarily, referring to fig. 1, the total reflection film 41 may be disposed at a side of the second parallel plate 42 away from the collimator 1. The total reflection film 41 may be plated on the surface of the second parallel plate 42 on the side away from the collimator 1. The second parallel plate 42 is a parallel glass plate with the parallelism of the upper and lower surfaces within 5 ".
Fig. 2 is a schematic structural diagram of a parallelism measuring apparatus according to an embodiment of the present invention, and referring to fig. 2, the second optical element 4 includes a mirror. Because second optical element 4 only needs to reflect at least part measuring beam, and need not to transmit measuring beam, consequently the utility model discloses in the embodiment, include the speculum through setting up second optical element 4, the speculum is conventional reflection device, and the price is lower, and the speculum has higher reflectivity, can improve the light energy that collimator 1 received to improve the measurement accuracy of first surface 101 and second surface 102 depth of parallelism.
Illustratively, referring to FIG. 2, the first parallel plate 22 is a parallel glass plate with upper and lower surfaces within 5 "of parallelism. The first transflective film 21 may be plated on a surface of the first parallel plate 22 on a side remote from the collimator 1.
The embodiment of the utility model provides a still provide a press parallelism measurement system, fig. 3 is the utility model provides a pair of press parallelism measurement system's that embodiment provides structural schematic diagram refers to fig. 1-fig. 3, and press 5 is including the head of suppressing 6 and suppressing base 7, and press parallelism measurement system includes the parallelism measuring device in the above-mentioned embodiment. The first optical element 2 is fixed with the pressing head 6, and the second optical element 4 is fixed with the pressing base 7, so that the first optical element 2 is parallel to the surface of the pressing head 6 facing to the pressing base 7, and the second optical element 4 is parallel to the surface of the pressing base 7 facing to the pressing head 6. In other embodiments, the second optical element 4 may be fixed to the pressing head 6, and the first optical element 2 may be fixed to the pressing base 7, so that the second optical element 4 is parallel to the surface of the pressing head 6 facing the pressing base 7, and the first optical element 2 is parallel to the surface of the pressing base 7 facing the pressing head 6.
The embodiment of the utility model provides a press depth of parallelism measurement system, including depth of parallelism measuring device and the press in the above-mentioned embodiment, the press is including the pressure head and the base of suppressing. The surface of the pressing head facing to the pressing base can be a first surface or a second surface, and the surface of the pressing base facing to the pressing head can be a second surface or a first surface. The parallelism of the pressing machine refers to the parallelism between the pressing head and the pressing base. The embodiment of the utility model provides a ramming machine depth of parallelism measurement system can measure the ramming head in the ramming machine and the depth of parallelism of ramming the base, has simplified the ramming head and has rammed the depth of parallelism measuring process of base, has improved the ramming head and has rammed the depth of parallelism measuring precision of base.
Optionally, referring to fig. 3, the press parallelism measurement system further comprises a spacer 3, the spacer 3 being located between the first optical element 2 and the second optical element 4, the spacer 3 being located between the press head 6 and the press base 7. The embodiment of the utility model provides an in, presser parallelism measurement system still includes spacer 3, and when the base 7 compressed tightly first optical element 2 and second optical element 4 was suppressed towards the pressure head 6 orientation, spacer 3 had prevented first optical element 2 and 4 direct contact of second optical element, had avoided first optical element 2 and second optical element 4 to interfere with each other in the measurement process. On the other hand, when the pressing head 6 presses the first optical element 2 and the second optical element 4 toward the pressing base 7, the pressing head 6 and the first optical element 2 are fixed by pressure so that the first optical element 2 is parallel to the surface of the pressing head 6 on the side toward the pressing base 7. The mount 7 and the second optical element 4 are fixed by pressure so that the second optical element 4 is parallel to the surface of the mount 7 on the side facing the indenter 6. In other embodiments, the first optical element 2 may be fixed to the surface of the pressing head 6 facing the pressing base 7 by bonding, and the second optical element 4 may be fixed to the surface of the pressing base 7 facing the pressing head 6 by bonding, or the second optical element 4 may be fixed to the surface of the pressing head 6 facing the pressing base 7 by bonding, and the first optical element 2 may be fixed to the surface of the pressing base 7 facing the pressing head 6 by bonding.
Alternatively, referring to fig. 3, the spacer 3 is a rubber pad. The rubber pad has good elasticity and resilience in the use temperature range, can adapt to the change of pressure, and is well attached to the contact surface, so that the inclination angle of the pressing head 6 can be really fed back to the first optical element 2, and the inclination angle of the pressing base 7 can be really fed back to the second optical element 4, thereby improving the accuracy of measuring the parallelism of the pressing head 6 and the pressing base 7.
Optionally, referring to fig. 3, the system for measuring parallelism of a press further comprises a display 9, and the display 9 is connected to the collimator 1 and is used for displaying the light beam received by the receiving surface of the collimator 1. Fig. 4 is a schematic diagram of a light beam received by a receiving surface of a collimator, referring to fig. 3 and 4, a measuring light beam reflected by a first optical element 2 forms a point a in the receiving surface, a measuring light beam reflected by a second optical element 4 forms a point B in the receiving surface, and an inclined included angle Δ between a pressing head 6 and a pressing base 7 satisfies:
wherein, Δ X is the distance between the point A and the point B in the receiving surface along the X direction, Δ Y is the distance between the point A and the point B in the receiving surface along the Y direction, and t is the conversion coefficient of the scale value and the inclination angle displayed on the display.
It can be understood that the closer the distance between the point a and the point B, the smaller the value of Δ, the better the parallelism of the pressing head 6 and the pressing base 7; the farther the distance between the point a and the point B is, the larger the value of Δ, the worse the parallelism of the pressing head 6 and the pressing base 7.
Optionally, referring to fig. 3, the pressing machine 5 further includes a pressing base rest 8, and the pressing base 7 is fixed on the pressing base rest 8.
Fig. 5 is a top view of the pressing base seat according to the embodiment of the present invention, and referring to fig. 3 and 5, the pressing base seat 8 further includes at least three inclination degree adjusting members 81. Since the pressing base 7 is fixed to the pressing base rest base 8, the pressing base 7 is inclined with the inclination of the pressing base rest base 8. The embodiment of the utility model provides an in, suppress the base through adjusting inclination regulating part 81 with the adjustment and lean on the degree of inclination of seat 8, and then adjust the base 7 degree of inclination of suppressing to finally make the pressure head 6 orientation suppress the surface of base 7 one side and suppress the surface of base 7 orientation suppress 6 one side and be parallel to each other.
Illustratively, referring to fig. 3 and 5, the pressing base rest 8 further includes four inclination degree adjusting pieces 81, and the inclination degree adjusting pieces 81 include screw holes and screws disposed in the screw holes, so as to adjust the inclination degree of the pressing base rest 8 by adjusting the lengths of the screws in the screw holes.
It should be noted that the foregoing is only a preferred embodiment of the present invention and the technical principles applied. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious modifications, rearrangements, combinations and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail with reference to the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the scope of the present invention.
Claims (7)
1. A parallelism measuring apparatus for measuring parallelism of a first surface and a second surface, comprising:
a collimator that emits a measuring beam;
a first optical element parallel to the first surface, reflecting part of the measuring beam to the collimator, and transmitting part of the measuring beam;
and the second optical element is parallel to the second surface, is positioned on one side of the first optical element, which is far away from the collimator, and reflects the measuring beam transmitted through the first optical element to the collimator.
2. The parallelism measuring apparatus according to claim 1, wherein the first optical element comprises a first flat plate and a first transflective film on the first flat plate.
3. The parallelism measuring apparatus according to claim 1, wherein the second optical element comprises a second parallel flat plate and a total reflection film on the second parallel flat plate, or the second optical element comprises a mirror.
4. A parallelism measuring system of a press machine, the press machine comprising a press head and a press base, characterized by comprising the parallelism measuring apparatus of any one of claims 1-3;
the first optical element is fixed with the pressing head, the second optical element is fixed with the pressing base, so that the first optical element is parallel to the surface of the pressing head facing one side of the pressing base, and the second optical element is parallel to the surface of the pressing base facing one side of the pressing head; alternatively, the first and second electrodes may be,
the second optical element is fixed with the pressing head, the first optical element is fixed with the pressing base, so that the second optical element is parallel to the surface of the pressing head facing one side of the pressing base, and the first optical element is parallel to the surface of the pressing base facing one side of the pressing head.
5. The press parallelism measurement system according to claim 4, further comprising a spacer located between the first optical element and the second optical element.
6. The press parallelism measurement system according to claim 5, wherein the spacer is a rubber pad.
7. The system for measuring parallelism of a press according to claim 4, further comprising a display connected to the collimator for displaying the light beam received by the receiving face of the collimator;
the measuring beam reflected by the first optical element forms a point A in the receiving surface, the measuring beam reflected by the second optical element forms a point B in the receiving surface, and an inclined included angle delta between the pressing head and the pressing base satisfies the following conditions:
wherein Δ X is a distance between the point a and the point B in the receiving surface along the X direction, Δ Y is a distance between the point a and the point B in the receiving surface along the Y direction, and t is a conversion coefficient between a scale value and an inclination angle displayed on the display.
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| CN201920985495.6U CN209894139U (en) | 2019-06-27 | 2019-06-27 | Parallelism measuring device and parallelism measuring system of pressing machine |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110207623A (en) * | 2019-06-27 | 2019-09-06 | 东莞市宇瞳光学科技股份有限公司 | Parallelism measuring apparatus and method, stamper measurement of paralleism system and method |
| CN110360960A (en) * | 2019-08-01 | 2019-10-22 | 东莞市宇瞳光学科技股份有限公司 | A kind of verticality measuring method and device |
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2019
- 2019-06-27 CN CN201920985495.6U patent/CN209894139U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110207623A (en) * | 2019-06-27 | 2019-09-06 | 东莞市宇瞳光学科技股份有限公司 | Parallelism measuring apparatus and method, stamper measurement of paralleism system and method |
| CN110360960A (en) * | 2019-08-01 | 2019-10-22 | 东莞市宇瞳光学科技股份有限公司 | A kind of verticality measuring method and device |
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