CN110207623A - Parallelism measuring apparatus and method, stamper measurement of paralleism system and method - Google Patents
Parallelism measuring apparatus and method, stamper measurement of paralleism system and method Download PDFInfo
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- CN110207623A CN110207623A CN201910568937.1A CN201910568937A CN110207623A CN 110207623 A CN110207623 A CN 110207623A CN 201910568937 A CN201910568937 A CN 201910568937A CN 110207623 A CN110207623 A CN 110207623A
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- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000005259 measurement Methods 0.000 title claims abstract description 33
- 230000003287 optical effect Effects 0.000 claims abstract description 208
- 125000006850 spacer group Chemical group 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 238000002834 transmittance Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 2
- 238000011900 installation process Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
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- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The embodiment of the present invention provides a kind of parallelism measuring apparatus and method, stamper measurement of paralleism system and method, and parallelism measuring apparatus is used to measure the depth of parallelism of first surface and second surface, comprising: collimator, emission measurement light beam；First optical element, reflective portion described in measuring beam to the collimator parallel with the first surface, and measuring beam described in transmissive portion；Second optical element, it is parallel with the second surface, it is located at first optical element far from the collimator side, the measuring beam of the first optical element described in reflectance-transmittance to the collimator.The embodiment of the present invention provides a kind of parallelism measuring apparatus and method, stamper measurement of paralleism system and method, to realize the process for simplifying the measurement of paralleism, improves the precision of the measurement of paralleism.
Description
Technical Field
The embodiment of the invention relates to a plane parallelism measuring technology, in particular to a parallelism measuring device and method and a parallelism measuring system and method of a pressing machine.
Background
Along with the popularization of security monitoring facilities, the security lens has higher and higher requirements on the definition of monitoring pictures. The lens is one of main components influencing imaging quality, and the parallelism between the lens and the lens cone is a key factor influencing imaging quality in the installation process. In order to avoid the bad lens caused by artificial installation errors, a press machine is generally used for assembling the lens in the installation process; therefore, the parallelism between the pressing head and the pressing base on the pressing machine becomes the primary consideration.
The parallelism of the existing pressing head and the pressing base can be finished only by measuring at least twice, the measuring process is complicated, and the measuring precision is difficult to guarantee. Furthermore, the parallelism measurement of any two existing first surfaces can be completed only by at least two times of measurement, the measurement process is complicated, and the measurement precision is difficult to guarantee.
Disclosure of Invention
The embodiment of the invention provides a parallelism measuring device and method and a parallelism measuring system and method of a presser, which are used for simplifying the parallelism measuring process and improving the parallelism measuring precision.
In a first aspect, an embodiment of the present invention provides a parallelism measuring apparatus for measuring parallelism of a first surface and a second surface, including:
a collimator that emits a measuring beam;
a first optical element parallel to the first surface, reflecting part of the measuring beam to the collimator, and transmitting part of the measuring beam;
and the second optical element is parallel to the second surface, is positioned on one side of the first optical element, which is far away from the collimator, and reflects the measuring beam transmitted through the first optical element to the collimator.
Optionally, the first optical element includes a first parallel plate and a first transflective film on the first parallel plate.
Optionally, the second optical element includes a second parallel flat plate and a total reflection film on the second parallel flat plate, or the second optical element is a mirror.
In a second aspect, an embodiment of the present invention provides a parallelism measuring system for a pressing machine, where the pressing machine includes a pressing head and a pressing base, and includes the parallelism measuring device of the first aspect;
the first optical element is fixed with the pressing head, the second optical element is fixed with the pressing base, so that the first optical element is parallel to the surface of the pressing head facing one side of the pressing base, and the second optical element is parallel to the surface of the pressing base facing one side of the pressing head; or,
the second optical element is fixed with the pressing head, the first optical element is fixed with the pressing base, so that the second optical element is parallel to the surface of the pressing head facing one side of the pressing base, and the first optical element is parallel to the surface of the pressing base facing one side of the pressing head.
Optionally, a spacer is further included, the spacer being located between the first optical element and the second optical element.
Optionally, the spacer is a rubber pad.
Optionally, the system further comprises a display connected to the collimator and configured to display the light beam received by the receiving surface of the collimator;
the measuring beam reflected by the first optical element forms a point A in the receiving surface, the measuring beam reflected by the second optical element forms a point B in the receiving surface, and an inclined included angle delta between the pressing head and the pressing base satisfies the following conditions:
wherein Δ X is a distance between the point a and the point B in the receiving surface along the X direction, Δ Y is a distance between the point a and the point B in the receiving surface along the Y direction, and t is a conversion coefficient of the scale value and the inclination angle displayed on the display.
In a third aspect, an embodiment of the present invention provides a measuring method of a parallelism measuring apparatus, for measuring parallelism of a first surface and a second surface, including:
controlling a collimator to emit a measuring beam, wherein the measuring beam sequentially irradiates a first optical element and a second optical element;
measuring the parallelism of the first surface and the second surface according to the measuring beams received by the collimator and reflected by the first optical element and the second optical element;
wherein the first optical element is parallel to the first surface, the first optical element reflecting a portion of the measuring beam to the collimator and transmitting a portion of the measuring beam; the second optical element is parallel to the second surface, is located on a side of the first optical element away from the collimator, and reflects the measuring beam transmitted through the first optical element to the collimator.
In a fourth aspect, an embodiment of the present invention provides a measuring method for a parallelism measuring system of a press, where the press includes a press head and a press base, and the measuring method includes the measuring method of the parallelism measuring apparatus of the third aspect;
before controlling the collimator to emit a measuring beam, and the measuring beam sequentially irradiates the first optical element and the second optical element, the measuring method of the parallelism measuring system of the presser further comprises the following steps:
fixing the first optical element and the pressing head, and fixing the second optical element and the pressing base; or,
and fixing the second optical element with the pressing head, and fixing the first optical element with the pressing base.
Optionally, the press parallelism-measuring system further comprises a spacer located between the first optical element and the second optical element;
fixing the first optical element and the pressing head, and fixing the second optical element and the pressing base, wherein the fixing device comprises:
controlling the pressing head to move towards the pressing base, enabling the pressing head to press and fix the first optical element, and enabling the pressing base to press and fix the second optical element;
fixing the second optical element with the pressing head, and fixing the first optical element with the pressing base, including:
and controlling the pressing head to move towards the pressing base, and enabling the pressing head to press and fix the second optical element, wherein the pressing base presses and fixes the first optical element.
The parallelism measuring device provided by the embodiment of the invention comprises a first optical element and a second optical element, wherein the first optical element is positioned between a collimator and the second optical element, a measuring light beam emitted by the collimator is irradiated to the first optical element and the second optical element in the same measurement, and the parallelism of the first optical element and the second optical element is obtained according to the light beams reflected by the first optical element and the second optical element, so that the measurement of the parallelism of a first surface and a second surface is realized. The parallelism measuring device provided by the embodiment of the invention can realize the parallelism measurement of the first surface and the second surface in one measurement, and omits a zeroing process, so that the parallelism measuring process is simplified, and the parallelism measuring precision is improved.
Drawings
Fig. 1 is a schematic structural diagram of a parallelism measuring apparatus according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a parallelism measuring apparatus according to an embodiment of the present invention;
fig. 3 is a schematic structural diagram of a system for measuring parallelism of a press according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of a light beam received by a receiving surface of a collimator provided in an embodiment of the invention;
FIG. 5 is a top view of a pressing base bearing seat provided in an embodiment of the present invention;
fig. 6 is a flowchart of a measuring method of a parallelism measuring apparatus according to an embodiment of the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
For the parallelism measurement of the first surface and the second surface (wherein the first surface and the second surface may be two surfaces of one object or two surfaces of two objects, the parallelism of the first surface and the second surface may be represented by an included angle between the first surface and the second surface, for example, the parallelism of the first surface and the second surface is worse when the included angle between the first surface and the second surface is larger, the parallelism of the first surface and the second surface is better when the included angle between the first surface and the second surface is smaller, and the parallelism of the first surface and the second surface is better when the included angle between the first surface and the second surface is 0 °, the first surface is parallel to the second surface), in the prior art, the matching of a collimator and a reflecting mirror is usually used and is implemented by two measurements. Specifically, in a first step, the mirror is set to be parallel to the first surface, a first measurement is performed using the collimator, and the position and inclination angle of the collimator are adjusted so that the collimator is irradiated perpendicularly to the mirror while the light beam reflected by the mirror is located at the center of the receiving surface of the collimator (referred to as a zeroing process). In a second step, the mirror is set parallel to the second surface and a second measurement is taken using a collimator. In the prior art, the parallelism of the first surface and the second surface can be measured at least twice, the measurement process is complicated, and the measurement precision is difficult to ensure due to the accumulation of errors caused by multiple measurements.
Fig. 1 is a schematic structural diagram of a parallelism measuring apparatus according to an embodiment of the present invention, and referring to fig. 1, the parallelism measuring apparatus is used for measuring parallelism of a first surface 101 and a second surface 102, and includes a collimator 1, a first optical element 2, and a second optical element 4. The collimator 1 emits a measuring beam. The first optical element 2 is parallel to the first surface 101, the first optical element 2 reflecting part of the measuring beam to the collimator 1 and transmitting part of the measuring beam. The measuring beam impinging on the first optical element 2 is partially transmitted and partially reflected. The second optical element 4 is parallel to the second surface 102, and the second optical element 4 is located on a side of the first optical element 2 away from the collimator 1, and reflects the measuring beam transmitted through the first optical element 2 to the collimator 1.
The parallelism measuring device provided by the embodiment of the invention comprises a first optical element and a second optical element, wherein the first optical element is positioned between a collimator and the second optical element, a measuring light beam emitted by the collimator is irradiated to the first optical element and the second optical element in the same measurement, and the parallelism of the first optical element and the second optical element is obtained according to the light beams reflected by the first optical element and the second optical element, so that the measurement of the parallelism of a first surface and a second surface is realized. The parallelism measuring device provided by the embodiment of the invention can realize the parallelism measurement of the first surface and the second surface in one measurement, and omits a zeroing process, so that the parallelism measuring process is simplified, and the parallelism measuring precision is improved.
Alternatively, referring to fig. 1, the first optical element 2 includes a first parallel plate 22 and a first transflective film 21 on the first parallel plate 22. The first transflective film 21 may be disposed between the first parallel plate 22 and the second optical element 4. In other embodiments, the first transflective film 21 may be disposed between the first parallel plate 22 and the collimator 1. Exemplarily, referring to fig. 1, the first transflective film 21 may be disposed between the first parallel plate 22 and the second optical element 4, and the first transflective film 21 may be plated on a surface of the first parallel plate 22 on a side away from the collimator 1. The first parallel plate 22 is a parallel glass plate, and the parallelism of the upper and lower surfaces of the parallel glass plate is within 5 ".
Alternatively, referring to fig. 1, the second optical element 4 includes a second parallel flat plate 42 and a total reflection film 41 on the second parallel flat plate 42. The total reflection film 41 may be disposed on the side of the second parallel plate 42 remote from the collimator 1. In other embodiments, the total reflection film 41 may be disposed between the second parallel flat plate 42 and the collimator 1.
Exemplarily, referring to fig. 1, the total reflection film 41 may be disposed at a side of the second parallel plate 42 away from the collimator 1. The total reflection film 41 may be plated on the surface of the second parallel plate 42 on the side away from the collimator 1. The second parallel plate 42 is a parallel glass plate with the parallelism of the upper and lower surfaces within 5 ".
Fig. 2 is a schematic structural diagram of a parallelism measuring apparatus according to an embodiment of the present invention, and referring to fig. 2, the second optical element 4 includes a mirror. Since the second optical element 4 only needs to reflect at least part of the measuring beam, and does not need to transmit the measuring beam, in the embodiment of the present invention, by providing the second optical element 4 including a mirror, the mirror is a conventional reflecting device, the price is low, and the mirror has higher reflectivity, the light energy received by the collimator 1 can be increased, so as to improve the measuring accuracy of the parallelism between the first surface 101 and the second surface 102.
Illustratively, referring to FIG. 2, the first parallel plate 22 is a parallel glass plate with upper and lower surfaces within 5 "of parallelism. The first transflective film 21 may be plated on a surface of the first parallel plate 22 on a side remote from the collimator 1.
Fig. 3 is a schematic structural diagram of a system for measuring parallelism of a press according to an embodiment of the present invention, and referring to fig. 1 to 3, a press 5 includes a press head 6 and a press base 7, and the system for measuring parallelism of a press includes the device for measuring parallelism according to the above embodiment. The first optical element 2 is fixed with the pressing head 6, and the second optical element 4 is fixed with the pressing base 7, so that the first optical element 2 is parallel to the surface of the pressing head 6 facing to the pressing base 7, and the second optical element 4 is parallel to the surface of the pressing base 7 facing to the pressing head 6. In other embodiments, the second optical element 4 may be fixed to the pressing head 6, and the first optical element 2 may be fixed to the pressing base 7, so that the second optical element 4 is parallel to the surface of the pressing head 6 facing the pressing base 7, and the first optical element 2 is parallel to the surface of the pressing base 7 facing the pressing head 6.
The system for measuring the parallelism of the pressing machine comprises the parallelism measuring device and the pressing machine, wherein the pressing machine comprises a pressing head and a pressing base. The surface of the pressing head facing to the pressing base can be a first surface or a second surface, and the surface of the pressing base facing to the pressing head can be a second surface or a first surface. The parallelism of the pressing machine refers to the parallelism between the pressing head and the pressing base. The parallelism measuring system of the pressing machine, provided by the embodiment of the invention, can measure the parallelism of the pressing head and the pressing base in the pressing machine, simplifies the parallelism measuring process of the pressing head and the pressing base, and improves the parallelism measuring precision of the pressing head and the pressing base.
Optionally, referring to fig. 3, the press parallelism measurement system further comprises a spacer 3, the spacer 3 being located between the first optical element 2 and the second optical element 4, the spacer 3 being located between the press head 6 and the press base 7. In the embodiment of the invention, the parallelism measuring system of the pressing machine further comprises a spacer 3, and when the pressing head 6 presses the first optical element 2 and the second optical element 4 towards the pressing base 7, the spacer 3 prevents the first optical element 2 and the second optical element 4 from being in direct contact, so that the first optical element 2 and the second optical element 4 are prevented from interfering with each other in the measuring process. On the other hand, when the pressing head 6 presses the first optical element 2 and the second optical element 4 toward the pressing base 7, the pressing head 6 and the first optical element 2 are fixed by pressure so that the first optical element 2 is parallel to the surface of the pressing head 6 on the side toward the pressing base 7. The mount 7 and the second optical element 4 are fixed by pressure so that the second optical element 4 is parallel to the surface of the mount 7 on the side facing the indenter 6. In other embodiments, the first optical element 2 may be fixed to the surface of the pressing head 6 facing the pressing base 7 by bonding, and the second optical element 4 may be fixed to the surface of the pressing base 7 facing the pressing head 6 by bonding, or the second optical element 4 may be fixed to the surface of the pressing head 6 facing the pressing base 7 by bonding, and the first optical element 2 may be fixed to the surface of the pressing base 7 facing the pressing head 6 by bonding.
Alternatively, referring to fig. 3, the spacer 3 is a rubber pad. The rubber pad has good elasticity and resilience in the use temperature range, can adapt to the change of pressure, and is well attached to the contact surface, so that the inclination angle of the pressing head 6 can be really fed back to the first optical element 2, and the inclination angle of the pressing base 7 can be really fed back to the second optical element 4, thereby improving the accuracy of measuring the parallelism of the pressing head 6 and the pressing base 7.
Optionally, referring to fig. 3, the system for measuring parallelism of a press further comprises a display 9, and the display 9 is connected to the collimator 1 and is used for displaying the light beam received by the receiving surface of the collimator 1. Fig. 4 is a schematic diagram of a light beam received by a receiving surface of a collimator according to an embodiment of the present invention, and referring to fig. 3 and 4, a measuring light beam reflected by the first optical element 2 forms a point a in the receiving surface, a measuring light beam reflected by the second optical element 4 forms a point B in the receiving surface, and an inclined included angle Δ between the pressing head 6 and the pressing base 7 satisfies:
wherein, Δ X is the distance between the point A and the point B in the receiving surface along the X direction, Δ Y is the distance between the point A and the point B in the receiving surface along the Y direction, and t is the conversion coefficient of the scale value and the inclination angle displayed on the display.
It can be understood that the closer the distance between the point a and the point B, the smaller the value of Δ, the better the parallelism of the pressing head 6 and the pressing base 7; the farther the distance between the point a and the point B is, the larger the value of Δ, the worse the parallelism of the pressing head 6 and the pressing base 7.
Optionally, referring to fig. 3, the pressing machine 5 further includes a pressing base rest 8, and the pressing base 7 is fixed on the pressing base rest 8.
Fig. 5 is a plan view of the pressing base seat according to the embodiment of the present invention, and referring to fig. 3 and 5, the pressing base seat 8 further includes at least three inclination degree adjusting pieces 81. Since the pressing base 7 is fixed to the pressing base rest base 8, the pressing base 7 is inclined with the inclination of the pressing base rest base 8. In the embodiment of the invention, the inclination degree of the pressing base bearing seat 8 is adjusted by adjusting the inclination degree adjusting piece 81, so that the inclination degree of the pressing base 7 is adjusted, and finally, the surface of the pressing head 6 facing one side of the pressing base 7 is parallel to the surface of the pressing base 7 facing one side of the pressing head 6.
Illustratively, referring to fig. 3 and 5, the pressing base rest 8 further includes four inclination degree adjusting pieces 81, and the inclination degree adjusting pieces 81 include screw holes and screws disposed in the screw holes, so as to adjust the inclination degree of the pressing base rest 8 by adjusting the lengths of the screws in the screw holes.
Fig. 6 is a flowchart of a measuring method of a parallelism measuring apparatus according to an embodiment of the present invention, and referring to fig. 1, fig. 2, and fig. 6, the measuring method of the parallelism measuring apparatus is used for measuring the parallelism of the first surface 101 and the second surface 102, and the measuring method of the parallelism measuring apparatus includes the following steps:
and S110, controlling the collimator 1 to emit measuring beams, and sequentially irradiating the first optical element 2 and the second optical element 4 with the measuring beams.
And S120, measuring the parallelism of the first surface 101 and the second surface 102 according to the measuring beams reflected by the first optical element 2 and the second optical element 4 and received by the collimator 1.
Wherein the first optical element 2 is parallel to the first surface 101, the first optical element 2 reflecting part of the measuring beam to the collimator 1 and transmitting part of the measuring beam. The second optical element 4 is parallel to the second surface 102, and the second optical element 4 is located on a side of the first optical element 2 away from the collimator 1, and reflects the measuring beam transmitted through the first optical element 2 to the collimator 1.
The measuring method of the parallelism measuring device provided by the embodiment of the invention can be executed by the parallelism measuring device provided by the embodiment of the invention, can realize the parallelism measurement of the first surface and the second surface in one measurement, omits the zeroing process, simplifies the parallelism measuring process and improves the parallelism measuring precision.
The embodiment of the invention also provides a measuring method of the parallelism measuring system of the pressing machine, referring to fig. 1-6, the pressing machine 5 comprises a pressing head 6 and a pressing base 7, and the measuring method of the parallelism measuring system of the pressing machine comprises the measuring method of the parallelism measuring device in the embodiment.
Before controlling the collimator 1 to emit the measuring beam, and the measuring beam sequentially irradiates the first optical element 2 and the second optical element 4 (i.e., step S110), the measuring method of the parallelism measuring system of the presser further includes:
s111, fixing the first optical element 2 and the pressing head 6, and fixing the second optical element 4 and the pressing base 7; or,
and S112, fixing the second optical element 4 and the pressing head 6, and fixing the first optical element 2 and the pressing base 7.
In the embodiment of the present invention, the first optical element 2 is fixed to the pressing head 6, and the second optical element 4 is fixed to the pressing base 7, so that the surface of the pressing head 6 facing the pressing base 7 is parallel to the first optical element 2, and the surface of the pressing base 7 facing the pressing head 6 is parallel to the second optical element 4. The second optical element 4 is fixed with the pressing head 6, the first optical element 2 is fixed with the pressing base 7, so that the surface of the pressing head 6 facing the pressing base 7 is parallel to the second optical element 4, and the surface of the pressing base 7 facing the pressing head 6 is parallel to the first optical element 2.
The measuring method of the parallelism measuring system of the pressing machine provided by the embodiment of the invention can be executed by the parallelism measuring system of the pressing machine in the embodiment, simplifies the parallelism measuring process of the pressing head and the pressing base, and improves the parallelism measuring precision of the pressing head and the pressing base.
Optionally, the press parallelism measuring system further comprises a spacer 3, the spacer 3 is located between the first optical element 2 and the second optical element 4, and the spacer 3 is located between the press head 6 and the press base 7.
Fixing the first optical element 2 and the pressing head 6, and fixing the second optical element 4 and the pressing base 7 (i.e., step S111), includes:
s1111, controlling the pressing head 6 to move towards the pressing base 7, and enabling the pressing head 6 to press and fix the first optical element 2 and the pressing base 7 to press and fix the second optical element 4.
Fixing the second optical element 4 and the pressing head 6, and fixing the first optical element 2 and the pressing base 7 (i.e., step S112), includes:
and S1121, controlling the pressing head 6 to move towards the pressing base 7, pressing the pressing head 6 to fix the second optical element 4, and pressing the pressing base 7 to fix the first optical element 2.
In the embodiment of the invention, the spacer 3 prevents the first optical element 2 and the second optical element 4 from directly contacting, and avoids mutual interference in the measurement process of the first optical element 2 and the second optical element 4. In step S1111, when the pressing head 6 presses the first optical element 2 and the second optical element 4 toward the pressing base 7, the pressing head 6 and the first optical element 2 are fixed by the pressing force so that the first optical element 2 is parallel to the surface of the pressing head 6 on the side toward the pressing base 7. The mount 7 and the second optical element 4 are fixed by pressure so that the second optical element 4 is parallel to the surface of the mount 7 on the side facing the indenter 6. In step S1121, when the pressing head 6 presses the first optical element 2 and the second optical element 4 toward the pressing base 7, the pressing head 6 and the second optical element 4 are fixed by the pressing force so that the second optical element 4 is parallel to the surface of the pressing head 6 on the side toward the pressing base 7. The mount 7 and the first optical element 2 are fixed by pressure so that the first optical element 2 is parallel to the surface of the mount 7 on the side facing the indenter 6.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious modifications, rearrangements, combinations and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (10)
1. A parallelism measuring apparatus for measuring parallelism of a first surface and a second surface, comprising:
a collimator that emits a measuring beam;
a first optical element parallel to the first surface, reflecting part of the measuring beam to the collimator, and transmitting part of the measuring beam;
and the second optical element is parallel to the second surface, is positioned on one side of the first optical element, which is far away from the collimator, and reflects the measuring beam transmitted through the first optical element to the collimator.
2. The parallelism measuring apparatus according to claim 1, wherein the first optical element comprises a first flat plate and a first transflective film on the first flat plate.
3. The parallelism measuring apparatus according to claim 1, wherein the second optical element comprises a second parallel flat plate and a total reflection film on the second parallel flat plate, or the second optical element comprises a mirror.
4. A parallelism measuring system of a press machine, the press machine comprising a press head and a press base, characterized by comprising the parallelism measuring apparatus of any one of claims 1-3;
the first optical element is fixed with the pressing head, the second optical element is fixed with the pressing base, so that the first optical element is parallel to the surface of the pressing head facing one side of the pressing base, and the second optical element is parallel to the surface of the pressing base facing one side of the pressing head; or,
the second optical element is fixed with the pressing head, the first optical element is fixed with the pressing base, so that the second optical element is parallel to the surface of the pressing head facing one side of the pressing base, and the first optical element is parallel to the surface of the pressing base facing one side of the pressing head.
5. The press parallelism measurement system according to claim 4, further comprising a spacer located between the first optical element and the second optical element.
6. The press parallelism measurement system according to claim 5, wherein the spacer is a rubber pad.
7. The system for measuring parallelism of a press according to claim 4, further comprising a display connected to the collimator for displaying the light beam received by the receiving face of the collimator;
the measuring beam reflected by the first optical element forms a point A in the receiving surface, the measuring beam reflected by the second optical element forms a point B in the receiving surface, and an inclined included angle delta between the pressing head and the pressing base satisfies the following conditions:
wherein Δ X is a distance between the point a and the point B in the receiving surface along the X direction, Δ Y is a distance between the point a and the point B in the receiving surface along the Y direction, and t is a conversion coefficient between a scale value and an inclination angle displayed on the display.
8. A measuring method of a parallelism measuring apparatus for measuring parallelism of a first surface and a second surface, comprising:
controlling a collimator to emit a measuring beam, wherein the measuring beam sequentially irradiates a first optical element and a second optical element;
measuring the parallelism of the first surface and the second surface according to the measuring beams received by the collimator and reflected by the first optical element and the second optical element;
wherein the first optical element is parallel to the first surface, the first optical element reflecting a portion of the measuring beam to the collimator and transmitting a portion of the measuring beam; the second optical element is parallel to the second surface, is located on a side of the first optical element away from the collimator, and reflects the measuring beam transmitted through the first optical element to the collimator.
9. A measuring method of a parallelism measuring system of a press machine, the press machine comprising a press head and a press base, characterized by comprising the measuring method of the parallelism measuring apparatus according to claim 8;
before controlling the collimator to emit a measuring beam, and the measuring beam sequentially irradiates the first optical element and the second optical element, the measuring method of the parallelism measuring system of the presser further comprises the following steps:
fixing the first optical element and the pressing head, and fixing the second optical element and the pressing base; or,
and fixing the second optical element with the pressing head, and fixing the first optical element with the pressing base.
10. The method of measuring a press parallelism measurement system according to claim 9, characterized in that the press parallelism measurement system further comprises a spacer located between the first optical element and the second optical element;
fixing the first optical element and the pressing head, and fixing the second optical element and the pressing base, wherein the fixing device comprises:
controlling the pressing head to move towards the pressing base, enabling the pressing head to press and fix the first optical element, and enabling the pressing base to press and fix the second optical element;
fixing the second optical element with the pressing head, and fixing the first optical element with the pressing base, including:
and controlling the pressing head to move towards the pressing base, and enabling the pressing head to press and fix the second optical element, wherein the pressing base presses and fixes the first optical element.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910568937.1A CN110207623A (en) | 2019-06-27 | 2019-06-27 | Parallelism measuring apparatus and method, stamper measurement of paralleism system and method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910568937.1A CN110207623A (en) | 2019-06-27 | 2019-06-27 | Parallelism measuring apparatus and method, stamper measurement of paralleism system and method |
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Inventor after: Zhang Pinguang Inventor after: Wang Danyi Inventor after: He Jianwei Inventor after: Ma Yuguo Inventor after: Zhang Lei Inventor before: Zhang Pinguang Inventor before: Wang Danyi Inventor before: He Jianwei |