CN209759580U - CVD deposition furnace with splitter plate - Google Patents
CVD deposition furnace with splitter plate Download PDFInfo
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- CN209759580U CN209759580U CN201920285249.XU CN201920285249U CN209759580U CN 209759580 U CN209759580 U CN 209759580U CN 201920285249 U CN201920285249 U CN 201920285249U CN 209759580 U CN209759580 U CN 209759580U
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- diverter tray
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Abstract
The utility model provides a take CVD sedimentation stove device of flow distribution disc, the induction cooker comprises a cooker bod, air inlet unit, flow distribution disc and deposit room, the flow distribution disc is equipped with a plurality of hole, the source gas is after air inlet unit reachs the gas mixing chamber, will get into the deposit room through the hole on the flow distribution disc, because the hole internal diameter that is close to the flow distribution disc axis is thinner, the inclination is great, consequently, the gas concentration who is close to flow distribution disc axis local space in the deposit room is too big, meanwhile, the hole internal diameter of keeping away from the flow distribution disc axis is thicker, the inclination is less, consequently, the gas concentration undersize that is close to flow distribution disc axis local space in the deposit room has been avoided, generally, it tends evenly to get into the interior gas concentration of deposit room, the utilization efficiency of source gas.
Description
Technical Field
The utility model relates to a semiconductor industry field, in particular to take CVD deposition furnace of flow distribution plate.
Background
As one of the widely used techniques in the semiconductor industry, Chemical Vapor Deposition (CVD) is a process in which a source gas containing raw material components is introduced into a high temperature deposition furnace, and a solid film is deposited on a preform by diffusion, convection, and the like, to form a finished product. In the CVD process, the structure of the deposition furnace has a great influence on the deposition efficiency and the deposition quality.
The conventional deposition furnace is generally divided into a gas mixing chamber and a deposition chamber by a planar splitter plate, and source gas firstly enters the gas mixing chamber after passing through a gas inlet pipe. In the gas mixing chamber, because the air inlet device is close to the central axis of the splitter plate, the gas concentration close to the local area of the central axis of the splitter plate is higher, otherwise, the gas concentration far away from the local area of the central axis of the splitter plate is lower, so that the gas concentration in the gas mixing chamber is uneven. Because the size and the shape of the holes of the existing deposition furnace are all equal to the set positions, the phenomenon of uneven gas concentration still exists after the gas enters the deposition chamber through the holes on the flow distribution plate, and the deposition efficiency and the deposition quality are influenced.
SUMMERY OF THE UTILITY MODEL
an object of the utility model is to provide a take CVD deposition furnace device of flow distribution disc, aim at solving among the prior art source gas loss too big, the uneven technical problem that distributes in the deposit chamber, the technical scheme of adoption as follows:
A CVD deposition furnace device with a diverter disc comprises a furnace body, an air inlet device, an air mixing chamber, a diverter disc and a deposition chamber, wherein the air inlet device, the air mixing chamber, the diverter disc and the deposition chamber are sequentially distributed and are all connected with the furnace body;
The shunt plate is provided with a plurality of holes, the cross section of each hole is circular or oval, and the holes penetrate through the top surface and the bottom surface of the shunt plate;
The distance from the intersection point of the central axis of the hole and the top surface of the diverter tray to the central axis of the diverter tray is the hole top distance, the distance from the intersection point of the central axis of the hole and the bottom surface of the diverter tray to the central axis of the diverter tray is the hole bottom distance, and the hole top distance is smaller than the hole bottom distance;
The included angle between the central axis of the hole and the central axis of the flow distribution disc is a hole inclination angle, the hole inclination angle is in negative correlation with the hole jacking distance, and the inner diameter and the perimeter of the cross section of the hole are in positive correlation with the hole jacking distance.
Furthermore, the diameter of the top surface of the diverter disc is 500 mm-1200 mm, the diameter of the bottom surface of the diverter disc is 500 mm-1200 mm, and the thickness of the diverter disc is 10 mm-30 mm.
Furthermore, the perimeter of the inner diameter of the cross section of the hole is 45-120 mm.
Furthermore, the inclination angle of the holes is 0-35 degrees.
Further, the distance between the central axis of the hole and the central axis of the diverter tray is less than 10 mm.
Furthermore, the number of the holes is 20-50.
Furthermore, the material of the flow distribution plate is graphite or C/C composite material.
The utility model provides a pyrolysis furnace device's beneficial effect lies in:
Along with the increase of the distance from the hole to the central axis of the flow distribution disc, the perimeter of the inner diameter of the cross section of the hole is increased, and the inclination angle of the hole is reduced, so that the gas entering the deposition chamber through the hole can be uniformly distributed, the uneven concentration of the gas in the deposition chamber is avoided, the utilization efficiency of the source gas is greatly improved, and the deposition quality is obviously improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments described in the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a structural view of a pyrolysis furnace apparatus according to an embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the invention.
it is to be understood that the terms "upper", "lower", "left", "right", and the like, as used herein, refer to an orientation or positional relationship based on that shown in the drawings, which is for convenience of description only, and do not indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be considered limiting of this patent. The terms "first", "second" and "first" are used merely for descriptive purposes and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features. The meaning of "plurality" is two or more unless specifically limited otherwise.
It should also be noted that, unless expressly stated or limited otherwise, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly and may for example be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In order to explain the technical solution of the present invention, the following detailed description is made with reference to the specific drawings and examples.
As shown in fig. 1, the embodiment of the utility model provides a take CVD deposition furnace device of reposition of redundant personnel dish, its characterized in that, including furnace body 1, air inlet unit 2, gas mixing chamber 3 and reposition of redundant personnel dish 4 and deposit room 5, air inlet unit 2, gas mixing chamber 3, reposition of redundant personnel dish 4 and deposit room 5 distribute in proper order, all are connected with furnace body 1, the top surface of reposition of redundant personnel dish 4 is close to air inlet unit 2, the bottom surface of reposition of redundant personnel dish 4 is close to deposit room 5, top surface and bottom surface of reposition of redundant personnel dish 4 are circular, top surface radius and bottom surface radius are all greater than the thickness of reposition of redundant personnel;
The flow distribution plate 4 is provided with a plurality of holes 6, the cross section of each hole 6 is circular or oval, and the holes 6 penetrate through the top surface and the bottom surface of the flow distribution plate 4;
The distance from the intersection point of the central axis of the hole 6 and the top surface of the diverter tray 4 to the central axis of the diverter tray 4 is the hole top distance, the distance from the intersection point of the central axis of the hole and the bottom surface of the diverter tray 4 to the central axis of the diverter tray 4 is the hole bottom distance, and the hole top distance is smaller than the hole bottom distance;
the included angle between the central axis of the hole 6 and the central axis of the flow distribution disc 4 is a hole inclination angle, the hole inclination angle is in negative correlation with the hole jacking distance, and the inner diameter and the perimeter of the cross section of the hole 6 are in positive correlation with the hole jacking distance.
In a further preferred embodiment, the diverter tray 4 has a top surface with a diameter of 500mm to 1200mm, a bottom surface with a diameter of 500mm to 1200mm, and a thickness of 10mm to 30 mm.
in a further preferred embodiment, the inner diameter and the circumferential length of the cross section of the hole 6 are 45mm to 120 mm.
In a further preferred embodiment of the present invention, the hole inclination angle is 0 ° to 35 °.
As a further preferred embodiment, the distance between the central axis of the hole 6 and the central axis of the diverter tray 4 is less than 10 mm.
In this embodiment, the number of the holes 6 is preferably 20 to 50.
In the present embodiment, the material of the diverter tray 4 is preferably graphite or a C/C composite material.
The working principle of the embodiment is as follows:
the source gas reaches the gas mixing chamber through the gas inlet device 2, and reaches the deposition chamber 5 through the holes 6 on the diverter plate 4, because the inner diameter of the hole close to the central axis of the diverter plate is small, and the inclination angle is large, the gas concentration in the local space close to the central axis of the diverter plate in the deposition chamber is avoided being too large, meanwhile, the inner diameter of the hole far away from the central axis of the diverter plate is large, and the inclination angle is small, so that the gas concentration in the local space close to the central axis of the diverter plate in the deposition chamber is avoided being too small, and in general, the concentration of the gas entering the deposition chamber tends to be uniform, the utilization efficiency.
It should be noted that, in this document, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
the principles and embodiments of the present invention have been explained herein using specific examples, which are presented only to assist in understanding the methods and their core concepts. It should be noted that there are infinite specific structures due to the limited character expressions, and it will be apparent to those skilled in the art that various improvements, decorations or changes can be made without departing from the principles of the present invention, and the technical features can be combined in a suitable manner; the application of these modifications, variations or combinations, or the application of the concepts and solutions of the present invention in other contexts without modification, is not intended to be considered as a limitation of the present invention.
Claims (7)
1. The CVD deposition furnace device with the splitter disc is characterized by comprising a furnace body (1), an air inlet device (2), a gas mixing chamber (3), the splitter disc (4) and a deposition chamber (5), wherein the air inlet device (2), the gas mixing chamber (3), the splitter disc (4) and the deposition chamber (5) are sequentially distributed and are all connected with the furnace body (1), the top surface of the splitter disc (4) is close to the air inlet device (2), the bottom surface of the splitter disc (4) is close to the deposition chamber (5), the top surface and the bottom surface of the splitter disc (4) are circular, and the radius of the top surface and the radius of the bottom surface are both larger than the thickness of the splitter disc (4);
The flow distribution disc (4) is provided with a plurality of holes (6), the cross section of each hole (6) is circular or oval, and the holes (6) penetrate through the top surface and the bottom surface of the flow distribution disc (4);
The distance from the intersection point of the central axis of the hole (6) and the top surface of the diverter tray (4) to the central axis of the diverter tray (4) is the hole top distance, the distance from the intersection point of the central axis of the hole and the bottom surface of the diverter tray (4) to the central axis of the diverter tray (4) is the hole bottom distance, and the hole top distance is smaller than the hole bottom distance;
The hole (6) axis with the contained angle of flow distribution disc (4) axis does the hole inclination, the hole inclination with the hole gauge height is the negative correlation, hole (6) cross section internal diameter girth with the hole gauge height is positive correlation.
2. The CVD deposition furnace apparatus having a diverter tray according to claim 1, wherein the diverter tray (4) has a top surface diameter of 500mm to 1200mm, a bottom surface diameter of 500mm to 1200mm and a thickness of 10mm to 30 mm.
3. The CVD deposition furnace device with the diverter tray according to claim 1, wherein the inner diameter and the circumference of the cross section of the hole (6) are 45 mm-120 mm.
4. the CVD deposition furnace apparatus with a diverter tray according to claim 1, wherein the inclination angle of the holes is 0 ° to 35 °.
5. the CVD deposition furnace device with diverter tray according to claim 1, characterized in that the distance between the central axis of the hole (6) and the central axis of the diverter tray (4) is less than 10 mm.
6. the CVD deposition furnace device with a diverter tray according to claim 1, wherein the number of the holes (6) is 20-50.
7. The CVD deposition furnace device with the diverter tray according to claim 1, wherein the diverter tray (4) is made of graphite or C/C composite material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920285249.XU CN209759580U (en) | 2019-03-06 | 2019-03-06 | CVD deposition furnace with splitter plate |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920285249.XU CN209759580U (en) | 2019-03-06 | 2019-03-06 | CVD deposition furnace with splitter plate |
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| CN209759580U true CN209759580U (en) | 2019-12-10 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111394714A (en) * | 2020-04-21 | 2020-07-10 | 重庆臻宝实业有限公司 | Chemical deposition gas distribution structure and device thereof |
| CN113235068A (en) * | 2021-04-07 | 2021-08-10 | 深圳市华星光电半导体显示技术有限公司 | Chemical vapor deposition device |
| CN115508291A (en) * | 2022-11-08 | 2022-12-23 | 浙江浙大鸣泉科技有限公司 | Optical gas detection device |
-
2019
- 2019-03-06 CN CN201920285249.XU patent/CN209759580U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111394714A (en) * | 2020-04-21 | 2020-07-10 | 重庆臻宝实业有限公司 | Chemical deposition gas distribution structure and device thereof |
| CN113235068A (en) * | 2021-04-07 | 2021-08-10 | 深圳市华星光电半导体显示技术有限公司 | Chemical vapor deposition device |
| CN113235068B (en) * | 2021-04-07 | 2023-09-01 | 深圳市华星光电半导体显示技术有限公司 | Chemical vapor deposition device |
| CN115508291A (en) * | 2022-11-08 | 2022-12-23 | 浙江浙大鸣泉科技有限公司 | Optical gas detection device |
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