CN207418857U - A kind of chemical deposition device with protection baffle - Google Patents
A kind of chemical deposition device with protection baffle Download PDFInfo
- Publication number
- CN207418857U CN207418857U CN201721351345.7U CN201721351345U CN207418857U CN 207418857 U CN207418857 U CN 207418857U CN 201721351345 U CN201721351345 U CN 201721351345U CN 207418857 U CN207418857 U CN 207418857U
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- CN
- China
- Prior art keywords
- funnel
- baffle
- chamber
- chemical deposition
- wall
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
The utility model discloses a kind of chemical deposition devices with protection baffle, each reaction chamber includes cylindrical chamber and the truncated cone-shaped chamber directly over cylindrical chamber, the cylindrical chamber and truncated cone-shaped chamber, the clamp assemblies for clamping sample and the funnel-form baffle for recycling sedimentary particle are provided in the cylindrical cavity room, the funnel-form baffle is located at the top of clamp assemblies, the funnel-form baffle is fixedly connected by fixing piece with the inner wall of cylindrical chamber, the diversion trench of gas flow guiding after promising reaction is set on the outer wall of the funnel-form baffle.The chemical deposition device that there is protection baffle of the utility model; the complete gas of unreacted deposits on the inner wall of funnel-form baffle and forms particle; and it recycles in funnel-form baffle, effectively avoids particle and be scattered and be adhered on exemplar, ensure that the quality that chemical deposition is carried out on exemplar.
Description
Technical field
The utility model belongs to technical field of optical device manufacturing, and in particular to a kind of chemical deposition with protection baffle
Device.
Background technology
Chemical vapor deposition is the production technology for depositing one layer of special material in substrate material surface.In chemical deposition
In the process, generally using lower air inlet, upper outlet mode.It to be asked at this into producing chemical deposition product under outlet mode there are one
Topic, the i.e. complete reaction gas of unreacted still can generate sedimentary particle near gas outlet, but due to can not find attachment
Body can fall back to cavity bottom, in dropping process, have partial particulate that can be sticked to product surface, form surface defect, Jin Erying
Ring the effect to subsequent deposition.
Utility model content
The purpose of this utility model is that：In view of the above problems, a kind of chemical vapor deposition unit is provided,
Funnel-form baffle is provided in reaction chamber, the gas after reaction is imported into truncated cone-shaped chamber by diversion trench, gas is passing through
The baffling effect of truncated cone-shaped chamber is crossed, deposition forms particle on the inner wall of funnel-form baffle, and recycles in funnel-form baffle
It is interior, it effectively avoids particle and is scattered and is adhered on exemplar, ensure that the quality that chemical deposition is carried out on exemplar.
To achieve these goals, the technical solution adopted in the utility model is：The utility model discloses one kind to have
Protect the chemical deposition device of baffle, include cylindrical reacting furnace, the reacting furnace include from inside to outside cylindrical heater body,
Four reaction chambers, circular ring shape calandria and shell, each reaction chamber include cylindrical chamber and positioned at cylindrical chamber
The truncated cone-shaped chamber of surface, the cylindrical chamber and truncated cone-shaped chamber are provided in the cylindrical cavity room and are used for
The clamp assemblies of sample and the funnel-form baffle for recycling sedimentary particle are clamped, the funnel-form baffle is located at clamp assemblies
Top, the funnel-form baffle is fixedly connected by fixing piece with the inner wall of cylindrical chamber, the funnel-form baffle it is outer
The diversion trench of gas flow guiding after promising reaction on wall is set, discharge sedimentary particle is additionally provided in the funnel-form baffle
Outlet.
Preferably, the diversion trench is the circular groove being distributed along the generatrix direction of funnel-form baffle.
Preferably, it is coated with one layer of silverskin on the outer wall of the funnel-form baffle.
Preferably, the circular metal net that multiple diameters differ is provided in the funnel-form baffle.
Preferably, molecular sieve adsorption layer is provided in the truncated cone-shaped chamber, the molecular sieve adsorption layer includes passing through
Screw is fixed on the double layer of metal net on truncated cone-shaped chamber inner wall and the activated alumina belonged to positioned at two layers between net.
Preferably, the fixing piece is metal chain, the both ends of the metal chain respectively with funnel-form baffle and circle
The inner wall connection of cylindrical chamber.
Preferably, the clamp assemblies include two fixed plates being fixed in cylindrical cavity chamber interior walls, each described
The fixing groove of fixed exemplar is provided in fixed plate, fixing glue is provided in the fixing groove.
By adopting the above-described technical solution, the beneficial effects of the utility model are：
Reaction chamber is divided into cylindrical chamber and truncated cone-shaped by the chemical deposition device for having protection baffle of the utility model
Chamber is provided with funnel-form baffle above the clamping device in cylindrical cavity room, and is provided with water conservancy diversion on the baffle
Slot, the gas after chemical deposition are flowed along diversion trench, are made after flowing out diversion trench by the baffling of truncated cone-shaped chamber inner wall
The surface of funnel-form baffle is entered with, gas, and the complete gas of unreacted is deposited on the inner wall of funnel-form baffle
Grain, finally particle recycling avoid particles drop back and are adhered on exemplar, ensure that the deposition matter of exemplar in funnel-form baffle
Amount.
Description of the drawings
Fig. 1 is the structure diagram of the chemical deposition device with protection baffle of the utility model；
Fig. 2 is the vertical direction sectional view of the chemical deposition device with protection baffle of the utility model；
Fig. 3 is the structure diagram of the funnel-form baffle of the chemical deposition device with protection baffle of the utility model；
Fig. 4 is the structure diagram of the fixed plate of the chemical deposition device with protection baffle of the utility model；
Reference numeral：1- reaction chambers, 11- cylindrical chamber, 12- truncated cone-shaped chambers, 2- cylindrical heater bodies, 3- circular ring shapes
Calandria, 4- shells, 5- funnel-form baffles, 58- diversion trenches, 6- fixing pieces, 7- clamp assemblies, 70- fixed plates, 71- fixing grooves.
Specific embodiment
The utility model is described in further detail below in conjunction with the accompanying drawings, to make those skilled in the art with reference to explanation
Book word can be implemented according to this.
As shown in Figure 1-Figure 3, the utility model provides a kind of chemical deposition device with protection baffle, including cylinder
The reacting furnace of shape, the reacting furnace include 2, four reaction chambers 1 of cylindrical heater body, circular ring shape calandria 3 and outer from inside to outside
Shell 4, each reaction chamber 1 include cylindrical chamber 11 and the truncated cone-shaped chamber 12 directly over cylindrical chamber 11,
The cylindrical chamber 11 connects with truncated cone-shaped chamber 12, is provided with to clamp the clamping of sample in the cylindrical chamber 11
Component 7 and the funnel-form baffle 5 for recycling sedimentary particle, the funnel-form baffle 5 are located at the top of clamp assemblies 7, institute
It states funnel-form baffle 5 to be fixedly connected with the inner wall of cylindrical chamber 11 by fixing piece 6, on the outer wall of the funnel-form baffle 5
The diversion trench 58 of gas flow guiding after promising reaction is set, discharge sedimentary particle is additionally provided in the funnel-form baffle 5
Outlet.
The course of work of the chemical deposition device for having protection baffle of the utility model is as follows, and exemplar is fixed on clamping
On component 7, the gas of reaction then is being passed through, and is passing through circular ring shape calandria 3 and cylindrical heater body 2 to adding in reaction chamber 1
Heat, after gas carries out chemical deposition on the surface of exemplar, the gas after reaction will be along the diversion trench on funnel-form baffle 5
58 flowings, the gas after reaction under the baffling effect of the inner wall of truncated cone-shaped chamber 12, are entered in funnel-form baffle 5, not again
The gas that the reaction was complete deposits on the inner wall of funnel-form baffle 5, deposited particles and recycling in funnel-form baffle 5, when
After exemplar is handled well, exemplar is taken out, deposited particles are being discharged by the outlet of funnel-form baffle 5, are effectively avoiding unreacted
The influence that the particle of complete gas aggradation handles exemplar.
In another example, the diversion trench 58 is the circular groove being distributed along the generatrix direction of funnel-form baffle 5.
Reduce disturbance of the gas during water conservancy diversion, generatrix direction of the diversion trench 58 along funnel-form baffle 5 facilitates gas from cylinder
11 water conservancy diversion of shape chamber is in truncated cone-shaped chamber 12.
In another example, one layer of silverskin is coated on the outer wall of the funnel-form baffle 5.Prevent gas from being kept off in funnel-form
It is deposited on the outer wall of plate 5, avoids influence of the deposited particles to exemplar deposition quality.
In another example, the circular metal net that multiple diameters differ is provided in the funnel-form baffle 5.Increase
Big depositional area of the complete gas of unreacted in funnel-form baffle 5.
In another example, molecular sieve adsorption layer, the molecular sieve adsorption layer are provided in the truncated cone-shaped chamber 12
Including the double layer of metal net being fixed by screws on 12 inner wall of truncated cone-shaped chamber and the active oxidation belonged to positioned at two layers between net
Aluminium.By porous active oxidation aluminium layer, the complete gas of unreacted deposits completely, prevents the gas of discharge from sinking in pipeline
Product avoids the influence to whole device normal work.
In another example, the fixing piece 6 is metal chain, and the both ends of the metal chain are kept off respectively with funnel-form
Plate 5 is connected with the inner wall of cylindrical chamber 11.Play the role of fixed funnel shape partition plate.
In another example, the clamp assemblies 7 include two fixed plates being fixed on 11 inner wall of cylindrical chamber
70, the fixing groove 71 of fixed exemplar is each provided in the fixed plate 70, fixing glue is provided in the fixing groove 71.By sample
Part is fixed in the fixing glue in fixing groove 71, reduces exemplar and the contact area of fixed plate 70 so that the deposition of exemplar is more preferable.
Although the embodiment of the utility model is disclosed as above, it is not restricted in specification and embodiment
Listed utilization, it can be applied to the field of various suitable the utility model completely, for those skilled in the art,
Other modification is easily achieved, therefore without departing from the general concept defined in the claims and the equivalent scope, this reality
Specific details is not limited to new and shown here as the legend with description.
Claims (7)
1. a kind of chemical deposition device with protection baffle, which is characterized in that including cylindrical reacting furnace, the reacting furnace
Include cylindrical heater body (2), four reaction chambers (1), circular ring shape calandria (3) and shell (4) from inside to outside, it is each described anti-
Chamber (1) is answered to include cylindrical chamber (11) and the truncated cone-shaped chamber (12) directly over cylindrical chamber (11), the circle
Cylindrical chamber (11) is connected with truncated cone-shaped chamber (12), is provided with to clamp the clamping of sample in the cylindrical chamber (11)
Component (7) and the funnel-form baffle (5) for recycling sedimentary particle, the funnel-form baffle (5) are located at clamp assemblies (7)
Top, the funnel-form baffle (5) are fixedly connected by fixing piece (6) with the inner wall of cylindrical chamber (11), the funnel-form
The diversion trench (58) of gas flow guiding after promising reaction on the outer wall of baffle (5) is set, is also set up in the funnel-form baffle (5)
There is the outlet of discharge sedimentary particle.
2. the chemical deposition device with protection baffle as described in claim 1, which is characterized in that the diversion trench (58) is
The circular groove being distributed along the generatrix direction of funnel-form baffle (5).
3. the chemical deposition device with protection baffle as described in claim 1, which is characterized in that the funnel-form baffle
(5) one layer of silverskin is coated on outer wall.
4. the chemical deposition device with protection baffle as described in claim 1, which is characterized in that the funnel-form baffle
(5) the circular metal net that multiple diameters differ is provided in.
5. the chemical deposition device with protection baffle as described in claim 1, which is characterized in that the truncated cone-shaped chamber
(12) molecular sieve adsorption layer is provided in, the molecular sieve adsorption layer includes being fixed by screws in truncated cone-shaped chamber (12) inner wall
On double layer of metal net and positioned at two layers belong to net between activated alumina.
6. the chemical deposition device with protection baffle as described in claim 1, which is characterized in that the fixing piece (6) is
Metal chain, the inner wall of the both ends of the metal chain respectively with funnel-form baffle (5) and cylindrical chamber (11) are connected.
7. the chemical deposition device with protection baffle as described in claim 1, which is characterized in that the clamp assemblies (7)
Including two fixed plates (70) being fixed on cylindrical chamber (11) inner wall, fixation is provided on each fixed plate (70)
The fixing groove (71) of exemplar, the fixing groove (71) is interior to be provided with fixing glue.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721351345.7U CN207418857U (en) | 2017-10-19 | 2017-10-19 | A kind of chemical deposition device with protection baffle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721351345.7U CN207418857U (en) | 2017-10-19 | 2017-10-19 | A kind of chemical deposition device with protection baffle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207418857U true CN207418857U (en) | 2018-05-29 |
Family
ID=62312106
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721351345.7U Expired - Fee Related CN207418857U (en) | 2017-10-19 | 2017-10-19 | A kind of chemical deposition device with protection baffle |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207418857U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109182968A (en) * | 2018-07-23 | 2019-01-11 | 北京铂阳顶荣光伏科技有限公司 | Attachment recovery method and device, vacuum film forming system |
-
2017
- 2017-10-19 CN CN201721351345.7U patent/CN207418857U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109182968A (en) * | 2018-07-23 | 2019-01-11 | 北京铂阳顶荣光伏科技有限公司 | Attachment recovery method and device, vacuum film forming system |
| WO2020020181A1 (en) * | 2018-07-23 | 2020-01-30 | 北京铂阳顶荣光伏科技有限公司 | Conveying device and imaging detection equipment having same |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180529 Termination date: 20181019 |