CN209722280U - A kind of mask plate component and evaporation coating device - Google Patents
A kind of mask plate component and evaporation coating device Download PDFInfo
- Publication number
- CN209722280U CN209722280U CN201920190060.2U CN201920190060U CN209722280U CN 209722280 U CN209722280 U CN 209722280U CN 201920190060 U CN201920190060 U CN 201920190060U CN 209722280 U CN209722280 U CN 209722280U
- Authority
- CN
- China
- Prior art keywords
- mask plate
- area
- shielding plate
- mask
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The utility model discloses a kind of mask plate component and evaporation coating devices.The mask plate component includes frame, shielding plate and mask plate, side of the frame close to mask plate is arranged in shielding plate, shielding plate includes at least one shielded area, at least one equilibrium area and bonding pad, shielded area and equilibrium area are divided into the opposite two sides in bonding pad, and the center of gravity of shielding plate is overlapped with the symmetrical centre of bonding pad, mask plate includes multiple first open regions, first open region includes effectively vapor deposition area and in vain vapor deposition area, upright projection of the shielded area of shielding plate on mask plate is overlapped with invalid vapor deposition area, wherein, the invalid vapor deposition area of first open region of mask plate and the shielded area of shielding plate correspond.The technical solution of the utility model can reduce mask plate cost of manufacture, reduce colour mixture or scarce color risk during vapor deposition, improve vapor deposition yield.
Description
Technical field
The utility model embodiment is related to field of display technology more particularly to a kind of mask plate component and evaporation coating device.
Background technique
In recent years, with Organic Light Emitting Diode (Organic Light-Emitting Diode, OLED) display technology
Development, comprehensively screen display increasingly has been favored by people.It is of different shapes in order to realize that bigger display area accounts for screen ratio
Special-shaped display screen comes out one by one.
In the prior art, in special-shaped display screen vapor deposition processing procedure, people, which use, has shape corresponding with special-shaped display screen
Metal mask version, still, for the metallic mask of polymorphic structure, not only cost of manufacture is higher, but also in corresponding abnormity
Region has been easy fold during throwing the net, and then increases colour mixture or the risk of scarce color during vapor deposition, reduces display
Shield the yield of production.
Utility model content
The utility model provides a kind of mask plate component and evaporation coating device, reduces cost to realize, improves vapor deposition yield.
In a first aspect, the utility model embodiment provides a kind of mask plate component, comprising: frame, shielding plate and cover
Film version；
Side of the frame close to mask plate is arranged in shielding plate；
Shielding plate includes at least one shielded area, at least one equilibrium area and bonding pad, and shielded area and balance are distinguished
The two sides opposite set on bonding pad, and the center of gravity of shielding plate is overlapped with the symmetrical centre of bonding pad；
Mask plate includes multiple first open regions, and the first open region includes effectively vapor deposition area and in vain vapor deposition area, shielding plate
Upright projection of the shielded area on mask plate be overlapped with invalid vapor deposition area；Wherein, the invalid steaming of the first open region of mask plate
The shielded area for plating area and shielding plate corresponds.
Optionally, shielding plate is set between frame and mask plate, is used to support mask plate.
Optionally, mask plate includes multiple sub- mask plates, and multiple sub- mask plates extend in a first direction, in a second direction according to
Secondary arrangement；
Shielding plate is symmetrical about second direction, and first direction is vertical with second direction.
It optionally, further include support chip, support chip is set between frame and mask plate, is used to support mask plate.
Optionally, support chip is provided at least one second open region, shielding plate close to the side of the equilibrium area of shielding plate
Equilibrium area insertion support chip the second open region.
Optionally, the one-to-one correspondence with the equilibrium area of shielding plate of the second open region of support chip.
Optionally, the length of the second open region in a second direction is greater than the length of equilibrium area in a second direction.
Optionally, multiple first open regions are arranged in array, and array column direction is first direction, and array line direction is second
Direction；The septal area in the ranks extended in a second direction, adjacent the first open region of two column are provided between the first open region of adjacent rows
Between be provided with the column spacer region extended in a first direction；
Mask plate component includes a plurality of support chip extended in a second direction, and upright projection of the support chip on mask plate is fallen
It is expert in spacer region；
Mask plate component includes a plurality of shielding plate extended in a second direction, and each shielding plate includes multiple shielded areas, one
A bonding pad and multiple equilibrium areas, the upright projection of bonding pad and multiple equilibrium areas on mask plate are fallen in septal area in the ranks.
Optionally, side of the sideline and the first open region that bonding pad is connected with shielded area in the second direction of shielded area
Line is overlapped.
Second aspect, the utility model embodiment additionally provide a kind of evaporation coating device, comprising: exposure mask described in first aspect
Version component, evaporation source and magnetic sheet；
Evaporation source is set to side of the frame far from shielding plate of mask plate component；It is separate that magnetic sheet is set to substrate to be deposited
The side of mask plate component.
The utility model by the way that shielded area is arranged in shielding plate, and make upright projection of the shielded area on mask plate with
Invalid vapor deposition area in first open region of mask plate is overlapped, to obtain effective vapor deposition area of abnormity, so that the opening of mask plate
Area need not be set as shaped openings corresponding with special-shaped display screen, solve the mask plate with polymorphic structure in the prior art and make
At high cost, the low problem of vapor deposition yield, realizing reduces mask plate cost of manufacture, improves the effect of vapor deposition yield.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram for metal mask version component that the prior art provides；
Fig. 2 is a kind of structural schematic diagram of mask plate component provided by the utility model；
Fig. 3 is a kind of structural schematic diagram of first open region provided by the utility model；
Fig. 4 is a kind of top view of shielding plate provided by the utility model；
Fig. 5 is the top view of another shielding plate provided by the utility model；
Fig. 6 is the structural schematic diagram of another mask plate component provided by the utility model；
Fig. 7 is a kind of top view of support chip provided by the utility model；
Fig. 8 is the structural schematic diagram of a kind of support chip provided by the utility model and shielding plate cooperation；
Fig. 9 is the structural schematic diagram of another mask plate component provided by the utility model；
Figure 10 is the top view of another shielding plate provided by the utility model.
Specific embodiment
The utility model is described in further detail with reference to the accompanying drawings and examples.It is understood that herein
Described specific embodiment is used only for explaining the utility model, rather than the restriction to the utility model.It further needs exist for
It is bright, part relevant to the utility model is illustrated only for ease of description, in attached drawing rather than entire infrastructure.
Fig. 1 is a kind of structural schematic diagram for metal mask version component that the prior art provides.Referring to Fig. 1, such as background technique
It is described, show in vapor deposition processing procedure that existing metal mask version component includes metal framework 110, metal support chip in special-shaped OLED
120 and metal mask version 130, support chip 122 is arranged between metal framework 110 and metal mask version 130, metal mask version
130 include shaped openings area 131.During vapor deposition, shaped openings area 131 allows evaporation material to pass through, aobvious with display screen
Show that region is corresponding.But the polymorphic structure of metal mask plate 130 is in and has been easy fold during throwing the net, and then is being deposited
During be easy to cause the risk of colour mixture or scarce color.In addition, the manufacture craft of the metal mask plate 130 with polymorphic structure is multiple
It is miscellaneous expensive.
In view of this, the embodiment of the invention provides a kind of mask plate components.Fig. 2 is that one kind provided by the utility model is covered
The structural schematic diagram of film version component.Fig. 3 is a kind of structural schematic diagram of first open region provided by the utility model.Fig. 4 is this
A kind of top view for shielding plate that utility model provides.- Fig. 4 referring to fig. 2, the mask plate component include: frame 210, shielding plate
220 and mask plate 230, frame 210 is arranged in close to the side of mask plate 230 in shielding plate 220, and shielding plate 220 includes at least
One shielded area 221, at least one equilibrium area 222 and bonding pad, shielded area 221 and equilibrium area 222 are divided into bonding pad
Opposite two sides, and the center of gravity of shielding plate 220 is overlapped with the symmetrical centre of bonding pad, mask plate 230 includes multiple first openings
Area, the first open region include effectively vapor deposition area 231 and in vain vapor deposition area 232, and the shielded area 221 of shielding plate 220 is in mask plate 230
On upright projection is overlapped with invalid vapor deposition area 232, wherein the invalid vapor deposition area 232 of the first open region of mask plate 230 and screening
The shielded area 221 for covering piece 220 corresponds.
Fig. 5 is the top view of another shielding plate provided by the utility model.Referring to fig. 4 and Fig. 5, wherein shielding plate 220
The effect of equilibrium area 222 be to avoid shielding plate 220 since what the setting bring center of gravity of shielded area 221 offseted to one side asks
Topic.Specifically, if the not set equilibrium area 222 of shielding plate 220, the center of gravity of shielding plate 220 can be biased to be provided with shielded area 221
Side is embodied in shielding plate 220 easily towards the side rollover for being provided with shielded area 221, the i.e. shielded area of shielding plate 220
221 generate under big-eared phenomenon, this will lead to upright projection of the shielded area 221 on substrate to be deposited on shielding plate 220 cannot be with
The non-display area exactitude position of display screen, and then vapor deposition accuracy is caused to decline.It can be seen that by being set in shielding plate 220
Setting equilibrium area 222 can avoid the rollover of shielding plate 220, to improve vapor deposition accuracy.It should be noted that Fig. 4 and Fig. 5 are merely exemplary
The shape for showing equilibrium area 222 and position relative to bonding pad, in other technical solutions, as long as equilibrium area 222
The center of gravity of shielding plate 220 can be returned to and be overlapped with the center of gravity of bonding pad, so that rollover will not occur for shielding plate 220 i.e.
Can, the shape to equilibrium area 222 and equilibrium area 222 are not defined the application relative to the position of bonding pad.
Specifically, the specific location of shielding plate 220 can be with are as follows: shielding plate 220 be set to frame 210 and mask plate 230 it
Between or mask plate 230 be arranged between frame 210 and shielding plate 220.It is understood that when shielding plate 220 is set to frame
When between 210 and mask plate 230, shielding plate 220 can not only need blocking for vapor deposition region to substrate to be deposited, moreover it is possible to
It plays a supporting role to mask plate 230.
The utility model in shielding plate by being arranged shielded area, equilibrium area and bonding pad, and the center of gravity of shielding plate
It is overlapped with the symmetrical centre of bonding pad, so that shielding plate is not susceptible to turn on one's side；The shielded area of shielding plate is vertical on mask plate
Projection be overlapped with the invalid vapor deposition area in the open region of mask plate so that the first open region of mask plate need not be set as with it is different
The corresponding shaped openings of shape display screen.It solves the mask plate cost of manufacture height with polymorphic structure in the prior art, is deposited good
The low problem of rate has reached reduction mask plate cost of manufacture, improves the effect of vapor deposition yield.
Based on the above technical solution, with continued reference to 2, optionally, mask plate 230 includes multiple sub- mask plates, more
A sub- mask plate extends along first direction 10,20 is arranged successively in a second direction, and shielding plate 220 is symmetrical about second direction 20,
First direction 10 is vertical with second direction 20.Setting is easy to process so that equilibrium area is identical with shielded area in this way, and in frame
Shielded area need not be first distinguished when welding shielding plate 230 on frame 210 and equilibrium area is welded again, convenient for the group of mask plate component
Dress.
Fig. 6 is the structural schematic diagram of another mask plate component provided by the utility model.Fig. 7 is that the utility model provides
A kind of support chip top view.Referring to Fig. 6 and Fig. 7, based on the above technical solution, which is also wrapped
Support chip 240 is included, support chip 240 is set between frame 210 and mask plate 230, is used to support mask plate 230.
Optionally, with continued reference to Fig. 7, support chip 240 is provided at least one close to the side of the equilibrium area of shielding plate 220
Second open region 241, the second open region 241 of the equilibrium area insertion support chip 240 of shielding plate 220.Setting is so that support in this way
Piece 240 can provide space for the equilibrium area of shielding plate 220, so that support chip 240 and shielding plate 220 can relatively closely match
Altogether, increase the supporting surface of support chip 240, and then better support can be provided to mask plate 230.
Specifically, with continued reference to Fig. 6, when the length of the second open region of support chip 240 in a second direction is than equilibrium area edge
Big 100um of the length of second direction or so, the one-to-one correspondence of the equilibrium area of the second open region and shielding plate 220 of support chip 240
When, support chip 240 and shielding plate 220 can cooperate as closely as possible, farthest increase the support of support chip 240
Face.
Specifically, Fig. 8 is the structural schematic diagram of a kind of support chip provided by the utility model and shielding plate cooperation.Referring to figure
8, when the second open region of support chip 240 is larger, when can accommodate the equilibrium area of multiple shielding plates 220, the second open region is along second
The length in direction is greater than the length of equilibrium area in a second direction, and support chip 240 can be with the screening with various sizes of shielded area
The cooperation of piece 220 is covered, is conducive to realize that support chip 240 is shared, and then reduce the cost of mask plate component.
Based on the above technical solution, optionally, the sideline and exposure mask that the bonding pad with shielded area of shielding plate are connected
Sideline of the first open region of version in the second direction of shielded area is overlapped.Setting enables shielding plate and mask plate in this way
It is accurately positioned, avoids vapor deposition accuracy decline caused by misplacing due to shielded area and invalid vapor deposition area.In other technologies scheme,
The bonding pad of shielding plate and the sideline that shielded area is connected be can be set to than the first open region of mask plate close to the second of shielded area
Sideline on direction high 50um or so in a first direction, i.e. the first open region of mask plate is in the second direction of shielded area
Sideline is fallen in the shielded area of shielding plate.
Optionally, multiple first open regions of mask plate component are arranged in array, and array column direction is first direction, array
Line direction is second direction, is provided with the septal area in the ranks extended in a second direction between the first open region of adjacent rows, adjacent two
It is provided with the column spacer region extended in a first direction between the first open region of column, mask plate component includes a plurality of prolonging in a second direction
The support chip stretched, upright projection of the support chip on mask plate are fallen in septal area in the ranks；Mask plate component includes a plurality of along second
The shielding plate that direction extends, each shielding plate include multiple shielded areas, a bonding pad and multiple equilibrium areas, bonding pad and multiple
Upright projection of the equilibrium area on mask plate is fallen in septal area in the ranks.The advantages of this arrangement are as follows can wait for simultaneously muti-piece
Vapor deposition substrate is deposited, and vapor deposition efficiency is improved.
There are many specific setting methods of above-mentioned technical proposal, is described in detail below with regard to typical case, but do not constitute
Limitation to the application.
Fig. 9 is the structural schematic diagram of another mask plate component provided by the utility model.Figure 10 is that the utility model mentions
The top view of another shielding plate supplied.Referring to Fig. 9 and Figure 10, mask plate component includes 210, ten sub- mask plates, two of frame
A shielding plate 220 and two support chips 240, shielding plate 220 and support chip 240 are arranged between frame 210 and mask plate.
Every sub- mask plate includes two along the first open region that first direction 10 arranges, and ten sub- mask plates are in a second direction 20 successively
Arrangement, multiple first open regions are arranged in array, and array column direction is first direction 10, and array line direction is second direction 20,
20 septal area in the ranks extended in a second direction is provided between the first open region of adjacent rows, between adjacent the first open region of two column
It is provided with the column spacer region extended along first direction 10, upright projection of the support chip 240 on mask plate is fallen in septal area in the ranks,
Upright projection of the bonding pad 221 and equilibrium area 222 of shielding plate 220 on mask plate is fallen in septal area in the ranks, shielding plate 220
Shielded area 221 includes two polymorphic structures, and same the second of two polymorphic structures insertion support chip 240 of shielded area 221 opens
Mouth region, and two polymorphic structures are slightly less than length of second open region in second direction 20 in the length L in second direction 20.
It should be noted that mask plate component neutron mask plate, branch can be arranged in those skilled in the art according to the actual situation
The quantity of blade and shielding plate, the shape and size of the first open region, the shape and size of shielded area and the second open region, this
Application is to this without limiting.
Specifically, can be carried out in accordance with the following steps when being installed to mask plate component shown in Fig. 9: firstly, will hide
It covers piece 220 and carries out contraposition of throwing the net, be then welded on frame 210.Secondly, support chip 240 is carried out contraposition of throwing the net, make its second
Open region and the shielded area of shielding plate 220 correspond, and then support chip 240 is welded on frame 210.Finally, by exposure mask
Version 230 carries out contraposition of throwing the net.Ensure that shielding plate 220 and mask 230 in specification of throwing the net, and then ensure to cover during throwing the net
Upright projection of the shielded area of piece 220 on mask plate 230 and the invalid vapor deposition area of mask plate 230 are completely coincident.
The utility model embodiment additionally provides a kind of evaporation coating device, comprising: exposure mask described in above-mentioned any technical solution
Version component, evaporation source and magnetic sheet, evaporation source are set to side of the frame far from shielding plate of mask plate component, and magnetic sheet is set to
Side of the substrate to be deposited far from mask plate component.
The evaporation coating device includes any mask plate component described above, thus the evaporation coating device has corresponding function
And beneficial effect.
Note that above are only the preferred embodiment and institute's application technology principle of the utility model.Those skilled in the art's meeting
Understand, the utility model is not limited to specific embodiment described here, is able to carry out for a person skilled in the art various bright
Aobvious variation, readjustment and substitution is without departing from the protection scope of the utility model.Therefore, although passing through above embodiments
The utility model is described in further detail, but the utility model is not limited only to above embodiments, is not departing from
It can also include more other equivalent embodiments in the case that the utility model is conceived, and the scope of the utility model is by appended
Scope of the claims determine.
Claims (10)
1. a kind of mask plate component characterized by comprising frame, shielding plate and mask plate；
The frame is arranged in close to the side of the mask plate in the shielding plate；
The shielding plate includes at least one shielded area, at least one equilibrium area and bonding pad, the shielded area and described
Equilibrium area is divided into the opposite two sides in the bonding pad, and the symmetrical centre weight of the center of gravity of the shielding plate and the bonding pad
It closes；
The mask plate includes multiple first open regions, and first open region includes effectively vapor deposition area and in vain vapor deposition area, institute
Upright projection of the shielded area of shielding plate on the mask plate is stated to be overlapped with the invalid vapor deposition area；Wherein, the mask plate
The first open region invalid vapor deposition area and the shielding plate shielded area correspond.
2. mask plate component according to claim 1, which is characterized in that the shielding plate is set to the frame and described
Between mask plate, it is used to support the mask plate.
3. mask plate component according to claim 2, which is characterized in that the mask plate includes multiple sub- mask plates, institute
It states multiple sub- mask plates to extend in a first direction, be arranged successively in a second direction；
The shielding plate is symmetrical about the second direction, and the first direction is vertical with the second direction.
4. mask plate component according to claim 2 or 3, which is characterized in that it further include support chip, the support chip setting
Between the frame and the mask plate, it is used to support the mask plate.
5. mask plate component according to claim 4, which is characterized in that balance of the support chip close to the shielding plate
The side in area is provided at least one second open region, and the equilibrium area of the shielding plate is inserted into the second opening of the support chip
Area.
6. mask plate component according to claim 5, which is characterized in that the second open region of the support chip with it is described
The one-to-one correspondence of the equilibrium area of shielding plate.
7. mask plate component according to claim 5, which is characterized in that the length of second open region in a second direction
Greater than the length of the equilibrium area in a second direction.
8. mask plate component according to claim 3, which is characterized in that multiple first open regions are arranged in array,
Array column direction is the first direction, and array line direction is the second direction；Between first open region described in adjacent rows
It is provided with along the septal area in the ranks that the second direction extends, adjacent two column are provided between first open region along described first
The column spacer region that direction extends；
The mask plate component includes a plurality of support chip extended along the second direction, and the support chip is on the mask plate
Upright projection fall in the septal area in the ranks；
The mask plate component includes a plurality of shielding plate extended along the second direction, and each shielding plate includes multiple screenings
Cover area, a bonding pad and multiple equilibrium areas, the vertical throwing of the bonding pad and the multiple equilibrium area on the mask plate
Shadow is fallen in the septal area in the ranks.
9. mask plate component according to claim 4, which is characterized in that the side that the bonding pad is connected with the shielded area
The sideline of line and first open region in the second direction of the shielded area is overlapped.
10. a kind of evaporation coating device, which is characterized in that including the described in any item mask plate components of claim 1-9, evaporation source with
And magnetic sheet；
The evaporation source is set to the frame of the mask plate component far from the side of the shielding plate；The magnetic sheet setting
In side of the substrate to be deposited far from the mask plate component.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920190060.2U CN209722280U (en) | 2019-02-11 | 2019-02-11 | A kind of mask plate component and evaporation coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920190060.2U CN209722280U (en) | 2019-02-11 | 2019-02-11 | A kind of mask plate component and evaporation coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209722280U true CN209722280U (en) | 2019-12-03 |
Family
ID=68682723
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920190060.2U Active CN209722280U (en) | 2019-02-11 | 2019-02-11 | A kind of mask plate component and evaporation coating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209722280U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111509016A (en) * | 2020-04-28 | 2020-08-07 | 武汉华星光电半导体显示技术有限公司 | Mask plate and manufacturing method thereof |
| CN113265616A (en) * | 2021-05-28 | 2021-08-17 | 昆山国显光电有限公司 | Mask support member and mask structure |
| CN116288148A (en) * | 2023-03-30 | 2023-06-23 | 季华实验室 | Mask assembly, evaporation equipment and evaporation method |
-
2019
- 2019-02-11 CN CN201920190060.2U patent/CN209722280U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111509016A (en) * | 2020-04-28 | 2020-08-07 | 武汉华星光电半导体显示技术有限公司 | Mask plate and manufacturing method thereof |
| CN113265616A (en) * | 2021-05-28 | 2021-08-17 | 昆山国显光电有限公司 | Mask support member and mask structure |
| CN116288148A (en) * | 2023-03-30 | 2023-06-23 | 季华实验室 | Mask assembly, evaporation equipment and evaporation method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN209722280U (en) | A kind of mask plate component and evaporation coating device | |
| CN107699854B (en) | Mask assembly and its manufacturing method | |
| CN209722271U (en) | A kind of mask plate component and evaporation coating device | |
| CN106048521B (en) | A kind of preparation method and metal mask plate of metal mask plate | |
| US11552271B2 (en) | Mask plate for fabricating display panel and application thereof | |
| CN108559946B (en) | Mask assembly, main mask plate and cooperation mask plate | |
| US20230079712A1 (en) | Mask frame and evaporation mask assembly | |
| CN109487206A (en) | Mask plate and the mask device for using the mask plate | |
| US20210336147A1 (en) | Mask | |
| CN109713162A (en) | Display panel and display device | |
| CN109321880A (en) | A kind of mask plate | |
| CN107815649B (en) | Evaporation coating device and evaporation coating method | |
| CN109166976A (en) | The production method and display device of display panel, mask plate, display panel | |
| US11566323B2 (en) | Fine metal mask and method for manufacturing the same, mask assembly and display substrate | |
| CN108517490A (en) | Mask plate and its manufacturing method | |
| US20180216220A1 (en) | Mask | |
| US10067417B2 (en) | Mask plate, mask exposure device and mask exposure method | |
| CN107653437B (en) | The compound mask plate of vapor deposition | |
| CN207109080U (en) | Mask plate | |
| WO2019019427A1 (en) | Metal mesh plate and deposition mask device | |
| CN107507915B (en) | A kind of substrate and evaporation coating device manufacturing organic light emitting display panel | |
| CN206721352U (en) | A kind of mask plate | |
| CN113302330A (en) | Mask device, manufacturing method thereof, evaporation method and display device | |
| CN108193168B (en) | Mask plate and preparation method thereof | |
| WO2019100609A1 (en) | Mask and film encapsulation method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201506 No. nine, No. 1568 engineering road, Shanghai, Jinshan District Patentee after: Shanghai Hehui optoelectronic Co., Ltd Address before: 201506 No. nine, No. 1568 engineering road, Shanghai, Jinshan District Patentee before: EverDisplay Optronics (Shanghai) Ltd. |
|
| CP01 | Change in the name or title of a patent holder |