CN209722271U - A kind of mask plate component and evaporation coating device - Google Patents
A kind of mask plate component and evaporation coating device Download PDFInfo
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- CN209722271U CN209722271U CN201920182080.5U CN201920182080U CN209722271U CN 209722271 U CN209722271 U CN 209722271U CN 201920182080 U CN201920182080 U CN 201920182080U CN 209722271 U CN209722271 U CN 209722271U
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- mask plate
- area
- shielding plate
- support chip
- mask
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Abstract
The utility model discloses a kind of mask plate component and evaporation coating devices.The mask plate component includes: frame, support chip, mask plate and shielding plate, side of the frame close to mask plate is arranged in support chip, side of the support chip far from frame is arranged in shielding plate, support chip is used to support mask plate and shielding plate, mask plate includes at least one opening area, open region includes effectively vapor deposition area and in vain vapor deposition area, shielding plate includes at least one effective shielded area, effective upright projection of the shielded area on mask plate is overlapped with invalid vapor deposition area, wherein, the invalid vapor deposition area of the open region of mask plate and effective shielded area of shielding plate correspond.Technical solution provided by the utility model can reduce shielding plate due to gravity bring sag of chain, and then alleviate the shadow effect during vapor deposition, improve vapor deposition accuracy.
Description
Technical field
The utility model embodiment is related to field of display technology more particularly to a kind of mask plate component and evaporation coating device.
Background technique
In recent years, with Organic Light Emitting Diode (Organic Light-Emitting Diode, OLED) display technology
Development, comprehensively screen display increasingly has been favored by people.It is of different shapes in order to realize that bigger display area accounts for screen ratio
Special-shaped display screen comes out one by one.
In the prior art, in special-shaped display screen vapor deposition processing procedure, people, which use, has shape corresponding with special-shaped display screen
Metal mask version, but be easy to appear fold during the throwing the net of this metal mask version and difficulty of throwing the net is larger.To solve
Difficulty of throwing the net and the problem of be also easy to produce fold, people use the metal mask version with traditional rectangular aperture, and will branch
Blade is made into the shape of abnormity, enables during vapor deposition the polymorphic structure of support chip to shelter from and is not required in special-shaped display screen
The part to be deposited.
But support chip will appear serious shade due to being had certain sag of chain by gravity during vapor deposition
Effect causes vapor deposition accuracy to be greatly reduced.
Utility model content
The utility model provides a kind of mask plate component and evaporation coating device, to realize the shade effect during alleviating vapor deposition
It answers, improves vapor deposition accuracy.
In a first aspect, the utility model embodiment provides a kind of mask plate, comprising: frame, support chip, mask plate and
Shielding plate；
Side of the frame close to mask plate is arranged in support chip；Side of the support chip far from frame is arranged in shielding plate；
Support chip is used to support mask plate and shielding plate；
Mask plate includes at least one opening area, and open region includes that effectively vapor deposition area and invalid vapor deposition area, shielding plate includes
At least one effective shielded area, upright projection of effective shielded area on mask plate are overlapped with invalid vapor deposition area；
Wherein, the invalid vapor deposition area of the open region of mask plate and effective shielded area of shielding plate correspond.
Optionally, side of the mask plate far from support chip is arranged in shielding plate.
Optionally, the longitudinal section of shielding plate is trapezoidal in class, and a trapezoidal bevel edge extends to open region；The longitudinal section of shielding plate
Perpendicular to plane where mask plate；
Trapezoidal upper bottom edge is contacted with mask plate, and trapezoidal upper bottom edge is less than trapezoidal bottom；
Upper bottom edge and the junction for the bevel edge for extending to open region are formed with chamfering.
Optionally, trapezoidal height be less than 20um, upper bottom edge with extend to open region bevel edge angle less than 20 °.
Optionally, side of the mask plate close to support chip is arranged in shielding plate.
Optionally, the longitudinal section of shielding plate is rectangle；The longitudinal section of shielding plate is perpendicular to plane where mask plate.
Optionally, shielding plate is magnetic metal shielding plate.
Optionally, mask plate includes multiple rectangular aperture areas, and multiple rectangular aperture areas are arranged in array, adjacent rows rectangle
It is provided with to be provided between the septal area in the ranks that line direction extends, adjacent Liang Lie rectangular aperture area between open region and prolong along column direction
The column spacer region stretched；
Mask plate component include it is a plurality of along line direction extend row support chip and it is a plurality of along column direction extend blade of being disbursed from the cost and expenses,
Upright projection of the row support chip on mask plate is fallen in septal area in the ranks, and upright projection of the blade of being disbursed from the cost and expenses on mask plate falls in column
In spacer region；
Mask plate component includes a plurality of shielding plate extended along line direction, and each shielding plate includes multiple shielded areas and one
Non-obstructing area, upright projection of the non-obstructing area on mask plate are fallen in septal area in the ranks.
Optionally, sideline weight of the sideline and open region that non-obstructing area is connected with shielded area on the line direction of shielded area
It closes.
Second aspect, the utility model embodiment additionally provide a kind of evaporation coating device, which includes: described in first aspect
Mask plate component, evaporation source and magnetic sheet；Evaporation source is set to side of the frame far from support chip of mask plate component；Magnetic sheet
It is set to side of the substrate to be deposited far from mask plate component.
The utility model makes effective shielded area of shielding plate in exposure mask by adding shielding plate in mask plate component
Upright projection in version is overlapped with the invalid vapor deposition area in the open region of mask plate, to obtain effective vapor deposition area of abnormity.Masking
Supporting role of the piece due to being supported piece can reduce due to self gravity bring sag of chain, solve vapor deposition process
The problem of middle appearance serious shadow effect, is realized and alleviates shadow effect, improves the effect of vapor deposition accuracy.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram for mask plate component that the prior art provides；
Fig. 2 is a kind of structural schematic diagram of mask plate component provided by the utility model；
Fig. 3 is a kind of top view of shielding plate provided by the utility model；
Fig. 4 is a kind of structural schematic diagram of the shielding plate provided by the utility model along Fig. 3 section line A-A '；
Fig. 5 is the structural schematic diagram of another mask plate component provided by the utility model；
Fig. 6 is a kind of structural schematic diagram of shielding plate longitudinal section provided by the utility model；
Fig. 7 is a kind of top view of mask plate component provided by the utility model.
Specific embodiment
The utility model is described in further detail with reference to the accompanying drawings and examples.It is understood that herein
Described specific embodiment is used only for explaining the utility model, rather than the restriction to the utility model.It further needs exist for
It is bright, part relevant to the utility model is illustrated only for ease of description, in attached drawing rather than entire infrastructure.
Fig. 1 is a kind of structural schematic diagram for metal mask version component that the prior art provides.Referring to Fig. 1, such as background technique
It is described, show in vapor deposition processing procedure that existing metal mask version component includes metal framework 110, the first metal branch in special-shaped OLED
Blade 121, the second metal support chip 122 and metal mask version 130, the first metal support chip 121 and the second metal support chip 122
It is arranged between metal framework 110 and metal mask version 130, the first metal support chip 121 is in rectangle, the second metal support chip
Polymorphic structure is provided on 122.Metal mask version 130 includes rectangular aperture area, and rectangular aperture area includes effectively vapor deposition Qu Hewu
Effect vapor deposition area, the second metal support chip 122 include effective shielded area (dashed rectangle outlines) and invalid shielded area, the second metal branch
Upright projection of the effective shielded area of blade 122 on mask plate 122 is overlapped with the invalid vapor deposition area of metal mask version 130, with
Keep effective vapor deposition area (dotted ellipse outlines) of metal mask version 130 corresponding with the effective display area of screen, metal mask version 130
Invalid vapor deposition area it is corresponding with the non-display area of screen.But using this mask plate described in the prior art to be deposited
When substrate is deposited, it may appear that serious shadow effect, and then vapor deposition accuracy is caused to decline.
Those skilled in the art have found that causing the basic reason of the above problem is second after analyzing the above problem
Metal support chip 122 can generate certain sagging in the effect of self gravity, i.e. the second metal support chip 122 generates deformation, leads
Cause the non-display area of upright projection and screen of the effective shielded area on the second metal support chip 122 on substrate to be deposited not
It can be completely coincident, so generating serious shadow effect, vapor deposition accuracy be caused to decline.
In view of this, the embodiment of the invention provides a kind of mask plate components.Fig. 2 is that one kind provided by the utility model is covered
The structural schematic diagram of film version component.Fig. 3 is a kind of top view of shielding plate provided by the utility model.Referring to figs. 2 and 3, should
Mask plate component includes: frame 210, support chip 220, mask plate 230 and shielding plate 240, and support chip 220 is arranged in frame
210 close to the side of mask plate 230；Side of the support chip 220 far from frame 210 is arranged in shielding plate 240, and support chip 220 is used
In support mask plate 230 and shielding plate 240, mask plate 230 includes at least one opening area, open region include effectively vapor deposition area and
Invalid vapor deposition area, shielding plate 240 include at least one effective shielded area 241, effective shielded area 241 hanging down on mask plate 230
It delivers directly shadow to be overlapped with invalid vapor deposition area, wherein the invalid vapor deposition area of the open region of mask plate 230 and effective screening of shielding plate 240
Cover the one-to-one correspondence of area 241.
The utility model makes effective shielded area of shielding plate 240 by adding shielding plate 240 in mask plate component
241 are overlapped in the upright projection on mask plate 230 with the invalid vapor deposition area in the open region of mask plate 230, to obtain abnormity
Effectively vapor deposition area.Supporting role of the shielding plate 240 due to being supported piece 220, can reduce since self gravity is brought
Sag of chain, solve the problems, such as serious shadow effect occur during vapor deposition, realize and alleviate shadow effect, improve vapor deposition accuracy
Effect.
It should be noted that Fig. 2, which exemplarily only shows shielding plate 240, is arranged in mask plate 230 far from support chip 220
Mask plate 230 can also be arranged in close to the side of support chip 220 in side, shielding plate 240.
The case where side of the mask plate 230 far from support chip 220 is arranged in shielding plate 240 below is described in detail.
Fig. 4 is a kind of structural schematic diagram of the shielding plate provided by the utility model along Fig. 3 section line A-A '.Referring to fig. 4, shielding plate
Longitudinal section is trapezoidal in class, and a trapezoidal bevel edge extends to open region；The longitudinal section of shielding plate is perpendicular to plane where mask plate, ladder
The upper bottom edge of shape is contacted with mask plate, trapezoidal upper bottom edge be less than trapezoidal bottom, upper bottom edge with extend to the oblique of open region
The junction on side is formed with chamfering.Optionally, trapezoidal high H is less than 20um, the folder of upper bottom edge and the bevel edge for extending to open region
Angle α is less than 20 °.
It should be noted that under normal conditions, the material of mask plate is magnetic material (such as invar), mask plate is being utilized
During substrate to be deposited is deposited, magnetic sheet is arranged far from the side of mask plate component in substrate to be deposited, to exposure mask
Version generates magneticaction to make mask plate be bonded with substrate to be deposited.It is arranged in mask plate using shielding plate far from support chip one
When substrate to be deposited is deposited in the mask plate component of side, there will be gap between mask plate and substrate to be deposited, if exposure mask
Version be fine mask version, i.e., be provided with network in the open region of mask plate, then mask plate under magneticaction with it is to be deposited
When substrate is bonded, the network of mask plate will generate right angle close to the edge of open region in shielding plate and bend, easy to damage to cover
Film version.However, the one side far from mask plate is plane when shielding plate glossily switchs to inclined-plane close to the one side of mask plate for plane
When, the longitudinal section of shielding plate as shown in figure 4, mask plate network by under magneticaction along the inclined-plane of shielding plate slowly
Close to substrate to be deposited, can be bent to avoid the right angle of mask plate, to protect mask plate.In addition, at this stage using etching system
It is larger less than 20 ° of shielding plate difficulty less than 20um and angle α to make high H, electroforming process can be used.
It is understood that side of the mask plate far from support chip is arranged in shielding plate, support chip and mask plate are equal
Supporting role is generated to shielding plate, to reduce shielding plate due to self gravity bring sag of chain, also, when mask plate is fine
When mask plate, then fine mask version can also play direct supporting role to effective shielded area of shielding plate, further to delay
The sagging of shielding plate is solved, vapor deposition accuracy is improved.
In addition, shielding plate is readily replaceable when side of the mask plate far from support chip is arranged in shielding plate, for different maskings
It is required that substrate to be deposited, only need to change shielding plate can change vapor deposition region size and shape, be conducive to realize mask plate
It is shared, and then reduce the cost of mask plate component.
The case where side of the mask plate far from support chip is arranged in shielding plate below is described in detail.Fig. 5 is this reality
With the structural schematic diagram of another mask plate component of novel offer.Fig. 6, which is that a kind of shielding plate provided by the utility model is vertical, to be cut
The structural schematic diagram in face.Referring to Fig. 5, mask plate 230 is arranged in close to the side of support chip 210 in shielding plate 240.Referring to Fig. 6, hide
The longitudinal section for covering piece 240 is rectangle；The longitudinal section of shielding plate is perpendicular to plane where mask plate.Optionally, the high H of rectangle is less than
20um。
It is understood that using shielding plate be arranged in mask plate close to support chip side mask plate component to be deposited
When substrate is deposited, mask plate and substrate to be deposited are directly contacted, contact of the shielding plate to mask plate and substrate film to be deposited
Do not have an impact, therefore, face of the shielding plate close to mask plate and the face close to support chip all can be plane, and shielding plate leans on
The face of nearly support chip is that plane makes the contact area of shielding plate and support chip larger, and support chip can preferably support shielding plate.
Based on the above technical solution, optionally, shielding plate is magnetic metal shielding plate.Setting is so that masking in this way
Piece is further alleviated under the action of the magnetic force opposite with gravity direction that magnetic sheet generates it since sagging caused shade is imitated
It answers, to improve vapor deposition accuracy.
Optionally, sideline weight of the sideline and open region that non-obstructing area is connected with shielded area on the line direction of shielded area
It closes.Setting enables shielding plate and mask plate to be accurately positioned in this way, avoids leading due to shielded area and the dislocation of invalid vapor deposition area
The vapor deposition accuracy of cause declines.
Optionally, mask plate includes multiple rectangular aperture areas, and multiple rectangular aperture areas are arranged in array, adjacent rows rectangle
It is provided with to be provided between the septal area in the ranks that line direction extends, adjacent Liang Lie rectangular aperture area between open region and prolong along column direction
The column spacer region stretched；Mask plate component includes a plurality of row support chip extended along line direction and a plurality of being disbursed from the cost and expenses along column direction extension
Blade, upright projection of the row support chip on mask plate are fallen in septal area in the ranks, upright projection of the blade of being disbursed from the cost and expenses on mask plate
It falls in column spacer region；Mask plate component includes a plurality of shielding plate extended along line direction, and each shielding plate includes multiple maskings
Area and a non-obstructing area, upright projection of the non-obstructing area on mask plate are fallen in septal area in the ranks.
There are many specific setting methods of above-mentioned technical proposal, is described in detail below with regard to typical case, but do not constitute
Limitation to the application.
Fig. 7 is a kind of top view of mask plate component provided by the utility model.Referring to Fig. 7, by support chip 220, exposure mask
Version 230 and shielding plate 240 are successively thrown the net on frame 210.Mask plate component includes four mask plates 230, and three along row side
To 221, six be disbursed from the cost and expenses blade 221 and two shielding plates extended along line direction extended along column direction of row support chip of extension
240.Along line direction close-packed arrays, each mask plate 230 includes two and arranges rectangular aperture along column direction four mask plates 230
Area, eight rectangular aperture areas arrange in two rows four column, and the row extended along line direction is provided between adjacent rows rectangular aperture area
Spacer region (diagonal line hatches region) is provided with the column spacer region (oblique line extended along column direction between adjacent Liang Lie rectangular aperture area
Shadow region), upright projection of the row support chip 221 on mask plate is fallen in septal area in the ranks, and blade of being disbursed from the cost and expenses 222 is on mask plate
Upright projection fall in column spacer region, each shielding plate includes multiple shielded areas and a non-obstructing area, and non-obstructing area is covering
Upright projection in film version is fallen in septal area in the ranks.
It should be noted that mask plate in mask plate component, support can be arranged in those skilled in the art according to the actual situation
The quantity of piece and shielding plate, the shape and size of open region, the shape and size of effective shielded area, the application to this without
It limits.
The utility model embodiment additionally provides a kind of evaporation coating device, which includes: described in above-mentioned any technical solution
Mask plate component, evaporation source and magnetic sheet, evaporation source is set to side of the frame far from support chip of mask plate component, magnetic sheet
It is set to side of the substrate to be deposited far from mask plate component.
The evaporation coating device includes any mask plate component described above, thus the evaporation coating device has corresponding function
And beneficial effect.
Note that above are only the preferred embodiment and institute's application technology principle of the utility model.Those skilled in the art's meeting
Understand, the utility model is not limited to specific embodiment described here, is able to carry out for a person skilled in the art various bright
Aobvious variation, readjustment and substitution is without departing from the protection scope of the utility model.Therefore, although passing through above embodiments
The utility model is described in further detail, but the utility model is not limited only to above embodiments, is not departing from
It can also include more other equivalent embodiments in the case that the utility model is conceived, and the scope of the utility model is by appended
Scope of the claims determine.
Claims (10)
1. a kind of mask plate component characterized by comprising frame, support chip, mask plate and shielding plate；
The frame is arranged in close to the side of the mask plate in the support chip；The shielding plate setting is remote in the support chip
Side from the frame；
The support chip is used to support the mask plate and the shielding plate；
The mask plate includes at least one opening area, and the open region includes effectively vapor deposition area and in vain vapor deposition area, the screening
Covering piece includes at least one effective shielded area, upright projection of the effective shielded area on the mask plate and the invalid steaming
Area is plated to be overlapped；
Wherein, the invalid vapor deposition area of the open region of the mask plate and effective shielded area of the shielding plate correspond.
2. mask plate component according to claim 1, which is characterized in that the shielding plate setting is separate in the mask plate
The side of the support chip.
3. mask plate component according to claim 2, which is characterized in that the longitudinal section of the shielding plate is trapezoidal in class, institute
It states a trapezoidal bevel edge and extends to the open region；The longitudinal section of the shielding plate is perpendicular to plane where the mask plate；
The trapezoidal upper bottom edge is contacted with the mask plate, and the trapezoidal upper bottom edge is less than the trapezoidal bottom；
The upper bottom edge and the junction for the bevel edge for extending to the open region are formed with chamfering.
4. mask plate component according to claim 3, which is characterized in that the trapezoidal height is less than 20um, the upper bottom
Side with extend to the open region the bevel edge angle less than 20 °.
5. mask plate component according to claim 1, which is characterized in that the shielding plate setting is close in the mask plate
The side of the support chip.
6. mask plate component according to claim 5, which is characterized in that the longitudinal section of the shielding plate is rectangle；It is described
The longitudinal section of shielding plate is perpendicular to plane where the mask plate.
7. mask plate component according to claim 1-6, which is characterized in that the shielding plate is magnetic metal screening
Cover piece.
8. mask plate component according to claim 7, which is characterized in that the mask plate includes multiple rectangular aperture areas,
The multiple rectangular aperture area is arranged in array, and the row interval extended along line direction is provided between adjacent rows rectangular aperture area
Area is provided with the column spacer region extended along column direction between adjacent Liang Lie rectangular aperture area；
The mask plate component include it is a plurality of along line direction extend row support chip and it is a plurality of along column direction extend blade of being disbursed from the cost and expenses,
The row support chip is fallen in the septal area in the ranks in the upright projection on the mask plate, and the blade of being disbursed from the cost and expenses is in the exposure mask
Upright projection in version is fallen in the column spacer region；
The mask plate component include it is a plurality of along line direction extend shielding plate, each shielding plate include multiple shielded areas and
One non-obstructing area, the non-obstructing area are fallen in the septal area in the ranks in the upright projection on the mask plate.
9. mask plate component according to claim 8, which is characterized in that the non-obstructing area was connected with the shielded area
The sideline of sideline and the open region on the line direction of the shielded area is overlapped.
10. a kind of evaporation coating device, which is characterized in that including the described in any item mask plate components of claim 1-9, evaporation source with
And magnetic sheet；
The evaporation source is set to the frame of the mask plate component far from the side of the support chip；The magnetic sheet setting
In side of the substrate to be deposited far from the mask plate component.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920182080.5U CN209722271U (en) | 2019-02-01 | 2019-02-01 | A kind of mask plate component and evaporation coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920182080.5U CN209722271U (en) | 2019-02-01 | 2019-02-01 | A kind of mask plate component and evaporation coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209722271U true CN209722271U (en) | 2019-12-03 |
Family
ID=68682536
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920182080.5U Active CN209722271U (en) | 2019-02-01 | 2019-02-01 | A kind of mask plate component and evaporation coating device |
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| Country | Link |
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| CN (1) | CN209722271U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111996488A (en) * | 2020-07-31 | 2020-11-27 | 云谷（固安）科技有限公司 | Mask plate, preparation method thereof and evaporation system |
| CN112981317A (en) * | 2021-02-09 | 2021-06-18 | 京东方科技集团股份有限公司 | Evaporation mask, evaporation device and evaporation method |
| CN113684444A (en) * | 2021-08-06 | 2021-11-23 | 昆山国显光电有限公司 | Supporting strip and net tensioning method |
| CN115110029A (en) * | 2022-06-30 | 2022-09-27 | 昆山国显光电有限公司 | Mask and manufacturing method thereof |
-
2019
- 2019-02-01 CN CN201920182080.5U patent/CN209722271U/en active Active
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111996488A (en) * | 2020-07-31 | 2020-11-27 | 云谷（固安）科技有限公司 | Mask plate, preparation method thereof and evaporation system |
| CN111996488B (en) * | 2020-07-31 | 2022-09-30 | 云谷（固安）科技有限公司 | Mask plate, preparation method thereof and evaporation system |
| CN112981317A (en) * | 2021-02-09 | 2021-06-18 | 京东方科技集团股份有限公司 | Evaporation mask, evaporation device and evaporation method |
| CN112981317B (en) * | 2021-02-09 | 2022-10-25 | 京东方科技集团股份有限公司 | Evaporation mask, evaporation device and evaporation method |
| CN113684444A (en) * | 2021-08-06 | 2021-11-23 | 昆山国显光电有限公司 | Supporting strip and net tensioning method |
| CN113684444B (en) * | 2021-08-06 | 2023-08-04 | 昆山国显光电有限公司 | Support bar and net stretching method |
| CN115110029A (en) * | 2022-06-30 | 2022-09-27 | 昆山国显光电有限公司 | Mask and manufacturing method thereof |
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Address after: 201506 No. nine, No. 1568 engineering road, Shanghai, Jinshan District Patentee after: Shanghai Hehui optoelectronic Co., Ltd Address before: 201506 No. nine, No. 1568 engineering road, Shanghai, Jinshan District Patentee before: EverDisplay Optronics (Shanghai) Ltd. |
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