CN113265616A - Mask support member and mask structure - Google Patents

Mask support member and mask structure Download PDF

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Publication number
CN113265616A
CN113265616A CN202110589856.7A CN202110589856A CN113265616A CN 113265616 A CN113265616 A CN 113265616A CN 202110589856 A CN202110589856 A CN 202110589856A CN 113265616 A CN113265616 A CN 113265616A
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CN
China
Prior art keywords
mask
supporting
support
area
mask support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202110589856.7A
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Chinese (zh)
Inventor
付佳
赵晶晶
刘明星
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kunshan Govisionox Optoelectronics Co Ltd
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Kunshan Govisionox Optoelectronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kunshan Govisionox Optoelectronics Co Ltd filed Critical Kunshan Govisionox Optoelectronics Co Ltd
Priority to CN202110589856.7A priority Critical patent/CN113265616A/en
Publication of CN113265616A publication Critical patent/CN113265616A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

Abstract

The embodiment of the application provides a mask support piece and a mask structure, and relates to the technical field of display. Can be through setting up balanced portion, balance the counter weight of mask support piece in its extending direction both sides to make mask support piece in the process of opening the net, can not lead to mask support piece off normal or even overturn because of the counter weight inequality of its extending direction both sides, and then can ensure to adopt the display panel that carries out the coating by vaporization and obtain including above-mentioned mask support piece's mask structure to have the higher special-shaped region of precision. And the poor evaporation caused by shadow effect (such as color mixing of organic light-emitting materials of adjacent sub-pixels) at the periphery of the special-shaped area due to deviation or turnover of the mask supporting piece can be avoided, and the display quality of the display panel is ensured.

Description

Mask support member and mask structure
Technical Field
The application relates to the technical field of display, in particular to a mask support piece and a mask structure.
Background
Display panels (e.g., OLED display panels) often reserve special-shaped areas (e.g., bang areas or water drop areas, etc.) for setting devices (e.g., front-facing cameras, face recognition sensors, distance sensors, etc.) under the screen. In the manufacturing process of such a display panel, when the organic light emitting material layer of the pixel is evaporated, a shielding portion for shielding the organic light emitting material layer needs to be designed on the mask supporting bar to form an irregular area on the display panel. The inventor finds that when the conventional mask supporting bar is used for evaporation, the problem that the position accuracy of an irregular area formed after evaporation is not high easily exists, so that an off-screen device which should be located below the irregular area originally may not be located below the irregular area completely, and the performance of electronic equipment adopting the display panel is affected.
Disclosure of Invention
In order to overcome the technical problems mentioned in the background, embodiments of the present application provide a mask support and a mask structure.
In a first aspect of the present application, there is provided a mask support comprising:
a supporting strip;
the at least one shielding part is positioned on the first side of the extending direction of the supporting bar;
the balance part is used for balancing the balance weights on two sides of the extending direction of the supporting bar.
Based on the structure, the balance weights of the mask supporting piece on the two sides of the extending direction of the mask supporting piece can be balanced through the balance part, so that the mask supporting piece cannot deviate or even turn over due to uneven balance weights on the two sides of the extending direction in the screen expanding process, and a display panel obtained by evaporation through adopting the mask structure comprising the mask supporting piece can be ensured to have a special-shaped area with high precision. And the poor evaporation caused by shadow effect (such as color mixing of organic light-emitting materials of adjacent sub-pixels) at the periphery of the special-shaped area due to deviation or turnover of the mask supporting piece can be avoided, and the display quality of the display panel is ensured.
In a possible embodiment of the present application, the at least one balance portion is located on a second side opposite to the first side in the extending direction of the supporting bar;
the at least one shielding part extends from the supporting strip to a direction far away from the second side, and the at least one balancing part extends from the supporting strip to a direction far away from the first side.
In a possible embodiment of the present application, the balance portion and the shielding portion have the same structure, and the balance portion and the shielding portion are symmetrically distributed on two opposite sides of the supporting bar by taking a center line of the supporting bar in the extending direction thereof as an axis of symmetry.
In a possible embodiment of the present application, the mask supporting member further includes a plurality of corner shielding areas located on the second side and extending from the supporting bar in a direction away from the first side, and an orthographic projection of the shielding portion on the supporting bar is located between orthographic projections of two adjacent corner shielding areas on the supporting bar; the balance part is located the corner shelters from the district and keeps away from one side of support bar, and shelters from the district from the corner and toward keeping away from the direction of first side extends.
In one possible embodiment of the present application, the mask supporting member further includes a plurality of corner shielding areas located on two opposite sides of the extending direction of the supporting bar and extending from the supporting bar to a direction away from the opposite side, and the corner shielding areas are symmetrically distributed on two opposite sides of the supporting bar with a central line of the supporting bar in the extending direction as a symmetry axis;
the orthographic projections of the shielding parts on the supporting bars are positioned between the orthographic projections of the adjacent corner shielding areas on the supporting bars;
the balance part is located the corner shelters from the district and keeps away from one side of support bar of second side, and shelters from the district from the corner and toward keeping away from the direction of first side extends.
In a possible embodiment of the present application, the at least one balance portion is a thinned area of the shielding portion, and a thickness of the thinned area is smaller than a thickness of the supporting bar in a direction perpendicular to a plane of the shielding portion.
In a possible embodiment of the present application, the thickness of the thinned area is 20% to 30% of the thickness of the supporting bar in a direction perpendicular to the plane of the shielding portion.
In a second aspect of the present application, there is also provided a mask support, comprising:
a supporting strip;
the at least one shielding part is positioned on a first side of the extending direction of the supporting bar and extends in a direction away from a second side opposite to the first side;
the shielding part comprises a thinning area, and the thickness of the thinning area is smaller than that of the supporting strip in the direction perpendicular to the plane of the shielding part.
In a third aspect of the present application, there is provided a mask structure, including:
a support frame, the support frame including a plurality of first mask supporting members arranged at intervals along a first direction and a plurality of second mask supporting members arranged at intervals along a second direction, the first direction intersecting the second direction, the plurality of first mask supporting members and the plurality of second mask supporting members defining at least one evaporation region, the first mask supporting members or the second mask supporting members being the mask supporting members of the first aspect;
the mask plate unit is fixed on the supporting frame and comprises at least one grid area, and each evaporation plating area corresponds to one grid area.
In a possible embodiment of the present application, the support strip of at least one mask support member among the plurality of mask support members for defining the evaporation area includes a thinning region and a full-thickness region, the thinning region is disposed at a side of the support member close to an edge of the evaporation area and located at the mask support member facing the mask unit, and a thickness of the thinning region is smaller than a thickness of the full-thickness region in a direction perpendicular to the evaporation area.
In one possible embodiment of the present application, the first mask support is provided with a first groove facing the second mask support at an overlapping position with the second mask support; and/or the presence of a gas in the gas,
the second mask support is provided with a second groove facing the first mask support at an overlapping position with the first mask support.
Compared with the prior art, the mask support and the mask structure provided by the embodiment of the application are provided. The balance weights of the mask supporting piece on the two sides of the extending direction of the mask supporting piece can be balanced through the balance part, so that the mask supporting piece cannot deviate or even turn over due to uneven balance weights on the two sides of the extending direction in the screen opening process, and the display panel obtained by evaporation through the mask structure comprising the mask supporting piece can be ensured to have a special-shaped area with high precision. And the poor evaporation caused by shadow effect (such as color mixing of organic light-emitting materials of adjacent sub-pixels) at the periphery of the special-shaped area due to deviation or turnover of the mask supporting piece can be avoided, and the display quality of the display panel is ensured.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present application and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained from the drawings without inventive effort.
FIG. 1 is a schematic view of a mask support according to an embodiment of the present disclosure;
FIG. 2 is a second schematic structural view of a mask support according to an embodiment of the present disclosure;
FIG. 3 is a third schematic view illustrating a mask support according to an embodiment of the present disclosure;
FIG. 4 is a fourth illustration of a mask support according to an embodiment of the present disclosure;
FIG. 5 is a fifth schematic view illustrating a structure of a mask support according to an embodiment of the present disclosure;
fig. 6 is a schematic structural diagram of a mask structure provided in an embodiment of the present application;
FIG. 7 is a schematic structural view of an overlapping position of a first mask support and a second mask support according to an embodiment of the present disclosure.
Reference numbers:
1-a mask structure; 10-a support frame; 11-a first mask support; 12-a second mask support; 13-evaporation area; 14-a main frame; 20-a mask unit; 21-a grid area; 1201, 11 a-thinning zone; 11 b-full thick region; 111-a first recess; 121-a second groove; 100-a mask support; 110-a support strip; 120-a shield; 130-a balancing section; 1101-a first side; 1102 — second side.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some embodiments of the present application, but not all embodiments. The components of the embodiments of the present application, generally described and illustrated in the figures herein, can be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present application, presented in the accompanying drawings, is not intended to limit the scope of the claimed application, but is merely representative of selected embodiments of the application. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the description of the present application, it should be noted that the terms "upper", "lower", and the like refer to orientations or positional relationships based on orientations or positional relationships shown in the drawings or orientations or positional relationships that the products of the application usually place when using, are only used for convenience of description and simplification of description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus should not be construed as limiting the present application.
It should be noted that, in case of conflict, different features in the embodiments of the present application may be combined with each other.
In view of the above-mentioned technical problems in the background art, the inventor of the present invention finds, after research, that since the shielding portion protrudes outward relative to one side of the mask supporting member in the extending direction thereof, the counter weights on the two sides of the mask supporting member in the extending direction thereof are not uniform, when the mask supporting member is tensioned, the mask supporting bar may be deviated or even turned over due to the uneven counter weights, which may affect the forming precision of the irregular area in the display panel, and may cause an obvious shadow effect to exist at a position close to the irregular area in the display panel due to the deviation or turning, which may affect the normal display on the display panel.
In order to solve the above technical problem, the inventors provide the following solutions.
Referring to fig. 1, fig. 1 illustrates a schematic structural view of a mask supporting member according to an embodiment of the present disclosure, and as shown in the figure, the mask supporting member 100 may include a supporting bar 110, at least one blocking portion 120, and at least one balancing portion 130.
At least one shielding part 120 is located on a first side 1101 of the extending direction of the supporting bar 110, at least one balancing part 130 is located on a second side 1102 of the extending direction of the supporting bar 110 opposite to the first side 1101, and also located on the first side 1101 of the extending direction of the supporting bar 110, and the balancing part 130 is used for balancing weights on both sides of the extending direction of the supporting bar 110, so that the gravitational moments on both sides of the extending direction of the supporting bar 110 are equivalent.
The mask supporting member 100 provided above can balance the weights of the mask supporting member 100 at both sides of the extending direction thereof by providing the balancing portion 130, so that the mask supporting member 100 does not deviate or even turn over due to the uneven weights at both sides of the extending direction thereof in the process of screen-tensioning, and further, it can be ensured that the display panel obtained by vapor deposition using the mask structure including the mask supporting member 100 has a special-shaped area with high position precision, and poor vapor deposition (for example, color mixing of organic light emitting materials of adjacent sub-pixels) due to shadow effect does not occur at the periphery of the special-shaped area, thereby ensuring the display quality of the display panel.
The following description will take as an example that at least one balance part 130 is located on a second side 1102 opposite to the first side 1101 in the extending direction of the supporting bar 110.
In the first embodiment of the present embodiment, as shown in fig. 1, the structures of the balancing portion 130 and the shielding portion 120 may be the same, and the same structure means that the shapes and mass distributions of the balancing portion 130 and the shielding portion 120 are the same or substantially the same (for example, the shape dimension error and the mass error are both within a set error range). The balance portion 130 and the shielding portion 120 may be symmetrically distributed on two opposite sides of the supporting bar 110 with a central line L of the supporting bar 110 in the extending direction thereof as a symmetry axis. Based on such a structure, the balance portion 130 can also be used to manufacture the irregular area of the display panel, and the display panel manufactured by the balance portion 130 in the irregular area and the display panel manufactured by the shielding portion 120 in the irregular area are arranged in a manner of being aligned to each other (i.e., the two display panels are symmetrically distributed on two sides of the supporting bar 110 by using the center line L of the supporting bar 110 as the symmetry axis). For example, in a mask structure including a plurality of evaporation regions, the shielding portions 120 and the balancing portions 130 on both sides of the mask supporting bar 110 may achieve a balance weight with respect to each other. The shielding part 120 can be used to form an irregular area of one display panel in the corresponding evaporation area, and the balancing part 130 can be used to form an irregular area of another display panel in the corresponding evaporation area. In this case, both the shielding part 120 and the balancing part 130 at both sides of the mask supporting bar 110 may function as a shielding and balancing weight. In this embodiment, the gravity moments at both sides of the mask support member 100 in the extending direction can be equalized (balanced by the weight) by the blocking portion 120 and the balancing portion 130 at the opposite sides, so that the mask support member 100 can be prevented from being deviated or even turned over due to the unbalanced weight at both sides when the mask support member 100 is stretched.
In a second implementation manner of the embodiment of the present application, as shown in fig. 2, the mask supporting member 100 may further include a plurality of (two or more) corner shielding areas 140 located on the second side 1102 and extending from the supporting bars 110 to a direction away from the first side 1101, where the corner shielding areas 140 are used for shielding corner areas of the display panel to form arc corners at corner area positions of the display panel obtained by evaporation, where the corner areas of the display panel are areas corresponding to intersection positions of two adjacent sides of the display panel, and the corner angles may be right angles. In this case, the orthographic projection of the shielding part 120 on the supporting bar 110 is located between the orthographic projections of the adjacent two corner shielding areas 140 on the supporting bar 110. The balancing part 130 is located on a side of the corner shielding area 140 away from the supporting bar 110, and extends from the corner shielding area 140 toward a direction away from the first side 1101. In this embodiment, the gravity moments at the two sides of the mask support member 100 in the extending direction can be substantially the same or substantially the same (weight balancing) by the shielding portion 120 at the first side 1101, the corner shielding region 140 at the second side 1102 and the balancing portion 130, and the mask support member 100 can be prevented from being deviated or even turned over due to the unbalance of the weights at the two sides when the mask support member 100 is stretched.
In a third implementation manner of the embodiment of the present application, as shown in fig. 3, the mask supporting member 100 may further include a plurality of corner shielding regions 140 located on two opposite sides (a first side 1101 and a second side 1102) of the extending direction of the supporting bar 110 and extending from the supporting bar 110 to a direction away from the opposite side thereof, for example, the corner shielding region 140 located on the first side 1101 extends to a direction away from the second side 1102, and the corner shielding region 140 located on the second side 1102 extends to a direction away from the first side 1101. The corner shielding areas 140 are symmetrically distributed on two opposite sides of the supporting bar 110 by taking a central line L of the supporting bar 110 in the extending direction thereof as a symmetry axis, and the corner shielding areas 140 located on different sides may have the same or different structures. The orthographic projection of the shielding part 120 on the supporting bar 110 is positioned between the orthographic projections of the adjacent two corner shielding areas 140 on the supporting bar 110. The balancing part 130 is located on a side of the corner shielding area 140 of the second side 1102 far away from the supporting bar 110, and extends from the corner shielding area 140 to a direction far away from the first side 1101. In this embodiment, the gravity moment on both sides of the mask support member 100 in the extending direction can be substantially the same or substantially the same (weight balance) by the blocking portion 120 and the corner blocking area 140 on the first side 1101, and the corner blocking area 140 and the balancing portion 130 on the second side 1102, so that the mask support member 10 can be prevented from being deviated or even turned over due to the unbalance of the weights on both sides when the mask support member 100 is stretched.
The following description will take as an example that at least one balance part 130 is located on the first side 1101 in the extending direction of the supporting bar 110.
The present embodiment also provides a mask supporting member 100, as shown in fig. 4, the mask supporting member 100 may include a supporting bar 110 and at least one blocking portion 120. At least one shielding part 120 is located on a first side 1101 of the extending direction of the supporting bar 110 and extends relative to a direction away from the second side 1102, and the first side 1101 and the second side 1102 are opposite sides of the extending direction of the supporting bar 110.
The balance part 130 can be a thinned area 1201 of the shielding part 120, and the thickness of the thinned area 1201 is smaller than that of the support bar 11 in the direction perpendicular to the plane of the shielding part 120. Unlike the above-mentioned balance weights for balancing the opposite sides of the mask supporting member 100 by the balance portion 130, in the present embodiment, the shielding portion 120 may form the thinning region 1201 on the whole area or a part area of the shielding portion 120 by etching to reduce the overall gravity of the shielding portion 120. In the direction perpendicular to the plane of the shielding portion 120, the thickness of the thinned area 1201 may be 20% to 30% of the thickness of the supporting bar 110, so that the weight of the thinned area 1201 is much lighter than that of the supporting bar 110, so as to reduce the gravity moment of the side where the shielding portion 120 is located, and the mask supporting bar 100 is not prone to deviation or even overturning due to the gravity moment of the shielding portion 120 when being tensioned. In this embodiment, the area where the shielding portion 120 is located may be entirely provided with the thinning area 1201, or may be partially provided with the thinning area 1201, as a preferred embodiment, the area where the shielding portion 120 is located may be entirely provided with the thinning area 1201.
It is understood that, in other embodiments of the present application, the three embodiments of balancing weights provided above for two sides of the extending direction of the supporting bar 110 can be combined with the embodiment of reducing the weight of the shielding portion 110, for example, the first embodiment is combined with the embodiment of reducing the weight of the shielding portion 110, and as shown in fig. 5, the shielding portion 120 and the balancing portion 130 located at two opposite sides of the extending direction of the supporting bar 110 can be provided with the thinned region 1201.
The embodiment of the present application further provides a mask structure, as shown in fig. 6, the mask structure 1 may include a support frame 10 and at least one mask unit 20.
The support frame 10 may include a plurality of first mask supports 11 spaced apart in a first direction (Y direction in the drawing) and a plurality of second mask supports 12 spaced apart in a second direction (X direction in the drawing), the first direction intersecting the second direction. In a preferred embodiment, the first direction and the second direction may be perpendicular. The plurality of first mask supporting members 11 and the plurality of second mask supporting members 12 define at least one evaporation region 13, and the first mask supporting members 11 or the second mask supporting members 12 may be the mask supporting members 100 described in the above embodiments.
At least one reticle cell 20 may be fixed on the support frame 10, and each reticle cell 20 may include at least one mesh region 21, and each mesh region 21 may correspond to one evaporation region 13, respectively.
It can be understood that the mask structure 1 provided in the embodiment of the present application is generally used to form a display mother board (or called a display large board) on a substrate, and after the display mother board is manufactured, the display mother board is cut to obtain a plurality of display panels, wherein one evaporation region 13 of the mask structure 1 may correspond to an effective display region of one display panel, and one grid in the grid region 21 may correspond to one sub-pixel opening in the effective display region.
In the mask structure 1, the first mask support 11 or the second mask support 12 adopts the mask support 100 provided in the embodiment of the present application, so that when the mask structure 1 is expanded, the first mask support 11 or the second mask support 12 can be accurately fixed. The display panel manufactured by the mask structure 1 has an irregular area with high position precision, poor evaporation caused by shadow effect (such as color mixing of organic light-emitting materials of adjacent sub-pixels) can not occur at the periphery of the irregular area, and the display quality of the display panel is ensured.
As shown in fig. 6, the supporting frame 10 may further include a main frame 14 for fixing the first mask supporting member 11 and the second mask supporting member 12, and the first mask supporting member 11, the second mask supporting member 12 and the reticle unit 20 are respectively fixed to the main frame 14. Illustratively, the fixed order may be: first, a plurality of first mask supports 11 are welded to a main frame 14 at equal intervals in a first direction; then, welding a plurality of second mask supporting pieces 12 on the main frame 14 at equal intervals along a second direction; finally, at least one reticle cell 20 is welded to the mainframe 14 in a first direction. In the above-described structure of the support frame 10, the second mask support 12 supports the mask units 20, and the first mask support 11 can block the other regions of the mask units 20 in the first direction except for the vapor deposition region 13, for example, when there are a plurality of mask units 20, a gap between two adjacent mask units 20 in the first direction can be blocked.
Referring to fig. 6 again, at least one of the first mask support 11 and the second mask support 12 for defining the evaporation region 13 includes a thinning region 11a and a full-thickness region 11b, and the thinning region 11a is disposed at an edge of the mask support close to the evaporation region 13 and at a side of the mask support facing the mask unit 12. The thickness of the thinned region 11a is smaller than that of the full-thickness region 11b in the direction perpendicular to the vapor deposition region 13. In the embodiment of the present application, the thickness of the thinned area 11a (1201) at different supporting members and shielding portions 120 may be the same or different, and is not particularly limited herein.
With such a design, poor bonding due to wrinkles generated in the mesh region 21 at the edge of the vapor deposition region 13 can be reduced or avoided. Therefore, in the subsequent evaporation process, the edge of the effective display area of the display panel cannot generate organic light-emitting material color mixing due to the shadow effect caused by poor lamination, the poor display caused by the organic light-emitting material color mixing at the edge of the effective display area is avoided, and the display quality of the display panel is improved.
In a preferred embodiment of the present invention, the thickness of the thinning-out region 11a may decrease in sequence in a direction close to the evaporation region 13 in a direction perpendicular to the evaporation region 13, that is, the thinner the thinning-out region 11a has at a position closer to the evaporation region 13. By such design, the wrinkles generated in the grid region 21 can be better extended in the thinning-out region 11 a.
Furthermore, the inventor also finds that at the position where the first mask support 11 and the second mask support 12 overlap, in the direction perpendicular to the evaporation region 13, the gap between the first mask support 11 and the mask plate unit 12 is large, which may make the shadow effect generated by evaporation at the position obvious, and affect the display effect of the manufactured display panel.
Referring to fig. 7, the first mask support 11 is provided with a first groove 111 facing the second mask support 12 at an overlapping position with the second mask support 12. Further, the second mask support 12 is provided with a second groove 121 facing the first mask support 11 at a position overlapping the first mask support 11. At the overlapping position, the first groove 111 is engaged with the second groove 121. In other embodiments, the first recess 111 may be selectively provided only in the first mask support 11, or the second recess 121 may be selectively provided only in the second mask support 12.
When the first mask support 11 includes the first groove 111, the depth of the first groove 111 is 1/3-1/2 of the thickness of the first mask support 11 in the direction perpendicular to the deposition region 13. When the second mask support member 12 includes the second grooves 121, the depth of the second grooves 121 is 1/3-1/2 of the thickness of the second mask support member 12 in the direction perpendicular to the evaporation region 13.
In a preferred embodiment of the present invention, a first groove 111 may be formed in the first mask supporting member 11 and a second groove 121 may be formed in the second mask supporting member 12, wherein the first groove 111 is 1/2 of the thickness of the first mask supporting member 11, and the second groove 121 is 1/2 of the thickness of the second mask supporting member 12.
Based on the above structural design, the height of the first mask support 11 and the second mask support 12 at the overlapping position can be reduced in the direction perpendicular to the evaporation region 13, so that the gap between the first mask support 11 and the mask unit 12 can be reduced, the shadow effect generated by evaporation at the overlapping position can be weakened, and the display effect of the manufactured display panel can be improved.
The embodiment of the application provides a mask support and a mask structure. Can be through setting up balanced portion, balance the counter weight of mask support piece in its extending direction both sides to make mask support piece in the process of opening the net, can not lead to mask support piece off normal or even overturn because of the counter weight inequality of its extending direction both sides, and then can ensure to adopt the display panel that carries out the coating by vaporization and obtain including above-mentioned mask support piece's mask structure to have the higher special-shaped region of precision. And the poor evaporation caused by shadow effect (such as color mixing of organic light-emitting materials of adjacent sub-pixels) at the periphery of the special-shaped area due to deviation or turnover of the mask supporting piece can be avoided, and the display quality of the display panel is ensured.
The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims (10)

1. A mask support, comprising:
a supporting strip;
the at least one shielding part is positioned on the first side of the extending direction of the supporting bar;
the balance part is used for balancing the balance weights on two sides of the extending direction of the supporting bar.
2. The mask support of claim 1,
the at least one balance part is positioned on a second side opposite to the first side in the extending direction of the supporting strip;
the at least one shielding part extends from the supporting strip to a direction far away from the second side, and the at least one balancing part extends from the supporting strip to a direction far away from the first side.
3. The mask supporting member according to claim 2, wherein the balancing portion and the shielding portion have the same structure, and are symmetrically distributed on two opposite sides of the supporting bar with a central line of the supporting bar in the extending direction as a symmetry axis.
4. The mask support of claim 2, further comprising a plurality of corner shadow areas located on the second side and extending away from the support bar, wherein an orthographic projection of the shadow portion on the support bar is located between orthographic projections of adjacent two of the corner shadow areas on the support bar; the balance part is located the corner shelters from the district and keeps away from one side of support bar, and shelters from the district from the corner and toward keeping away from the direction of first side extends.
5. The mask support of claim 2, further comprising a plurality of corner shielding regions located at opposite sides of the extending direction of the supporting bar and extending away from the supporting bar, the corner shielding regions being symmetrically distributed at opposite sides of the supporting bar about a central line of the supporting bar in the extending direction;
the orthographic projections of the shielding parts on the supporting bars are positioned between the orthographic projections of the adjacent corner shielding areas on the supporting bars;
the balance part is located the corner shelters from the district and keeps away from one side of support bar of second side, and shelters from the district from the corner and toward keeping away from the direction of first side extends.
6. The mask support member of claim 1, wherein the at least one balance portion is a thinned region of the shielding portion, and the thickness of the thinned region is smaller than that of the support bar in a direction perpendicular to a plane in which the shielding portion is located.
7. The mask support member of claim 6, wherein the thickness of the thinned area is 20% to 30% of the thickness of the support bar in a direction perpendicular to the plane of the blocking portion.
8. A mask structure, comprising:
a support frame, the support frame comprising a plurality of first mask supporting members arranged at intervals along a first direction and a plurality of second mask supporting members arranged at intervals along a second direction, the first direction intersecting the second direction, the plurality of first mask supporting members and the plurality of second mask supporting members defining at least one evaporation region, the first mask supporting members or the second mask supporting members being the mask supporting members according to any one of claims 1 to 7;
the mask plate unit is fixed on the supporting frame and comprises at least one grid area, and each evaporation plating area corresponds to one grid area.
9. The mask structure of claim 8,
the support strip used for limiting at least one mask support member in the plurality of mask support members of the evaporation area comprises a thinning area and a full-thickness area, the thinning area is arranged on the edge of the support member close to the evaporation area and located on one side of the mask support member facing the mask plate unit, and the thickness of the thinning area is smaller than that of the full-thickness area in the direction perpendicular to the evaporation area.
10. The mask structure of claim 8 or 9,
the first mask support is provided with a first groove facing the second mask support at an overlapping position with the second mask support; and/or the presence of a gas in the gas,
the second mask support is provided with a second groove facing the first mask support at an overlapping position with the first mask support.
CN202110589856.7A 2021-05-28 2021-05-28 Mask support member and mask structure Pending CN113265616A (en)

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Application Number Priority Date Filing Date Title
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN206270648U (en) * 2016-11-23 2017-06-20 信利(惠州)智能显示有限公司 Mask supporting construction
CN108517490A (en) * 2018-05-11 2018-09-11 云谷(固安)科技有限公司 Mask plate and its manufacturing method
CN109321880A (en) * 2018-10-18 2019-02-12 京东方科技集团股份有限公司 A kind of mask plate
WO2019038861A1 (en) * 2017-08-23 2019-02-28 シャープ株式会社 Vapor deposition mask, display panel production method, and display panel
CN209722280U (en) * 2019-02-11 2019-12-03 上海和辉光电有限公司 A kind of mask plate component and evaporation coating device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN206270648U (en) * 2016-11-23 2017-06-20 信利(惠州)智能显示有限公司 Mask supporting construction
WO2019038861A1 (en) * 2017-08-23 2019-02-28 シャープ株式会社 Vapor deposition mask, display panel production method, and display panel
CN108517490A (en) * 2018-05-11 2018-09-11 云谷(固安)科技有限公司 Mask plate and its manufacturing method
CN109321880A (en) * 2018-10-18 2019-02-12 京东方科技集团股份有限公司 A kind of mask plate
CN209722280U (en) * 2019-02-11 2019-12-03 上海和辉光电有限公司 A kind of mask plate component and evaporation coating device

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