CN209551724U - Mechanical arm and manipulator and polissoir with it - Google Patents
Mechanical arm and manipulator and polissoir with it Download PDFInfo
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- CN209551724U CN209551724U CN201822267240.4U CN201822267240U CN209551724U CN 209551724 U CN209551724 U CN 209551724U CN 201822267240 U CN201822267240 U CN 201822267240U CN 209551724 U CN209551724 U CN 209551724U
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- mechanical arm
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- potsherd
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Abstract
The utility model discloses a kind of mechanical arm and with its manipulator and polissoir.Wherein, the mechanical arm includes: robot body, and perforative vacuum pneumatic channel along its length is equipped in the robot body；Aperture, the aperture run through along the short transverse of the robot body and are connected to the vacuum pneumatic channel；Potsherd, the potsherd are detachably arranged in the aperture, and potsherd runs through through-hole equipped with multiple.Using the mechanical arm it is possible to prevente effectively from polishing disk carries the residual with spray liquid on mechanical arm in switching process after cleaning, thus avoiding raffinate from improving product yield while polluting other devices.
Description
Technical field
The utility model belongs to field of semiconductor processing, and in particular to mechanical arm and manipulator with it and polishing are set
It is standby.
Background technique
U.S.'s MEMC electronic material invents a kind of polissoir (patent No.: ZL95193037.0, grant number 1073907C),
Defect existing for the conveying robot in patch region in the polissoir: the polishing disk placed at the 4th spray equipment (attaches
Silicon wafer has already passed through third step polishing), conveying robot clamps polishing disk in the 4th station spray equipment, afterwards turns over and allows partly
Conductor silicon wafer is upward.Since semiconductor chip is polished by third step, semiconductor wafer surface is hydrophily, and semiconductor chip passes through the 4th
Station spray equipment, semiconductor surface have a water membrane, and when overturning, the water of semiconductor wafer surface can flow to mechanical arm, water
Mechanical arm can be remained.Since mechanical arm is stainless steel material, mechanical arm is stained with water, in patch region (1 grade of clean area
Domain) it is often difficult to drying for a long time, in the handling process, the water on mechanical arm can drip to silicon wafer sending device, Wax applyor, add
In thermal, paster apparatus, while water droplet drips to the wax layer of silicon wafer second surface, poliss surface, during the polishing process, makes half
Conductor piece generates pit, and (pit is a kind of shallow depression of wafer surface, has a concave surface, like spherical extraterrestrial and inclined side
Face.Under illumination condition appropriate, naked eyes are visible.In the polishing initial stage, floating throw of chip may induce this Surface Texture),
Influence the machined parameters of semiconductor chip.
Utility model content
The utility model is intended to solve at least some of the technical problems in related technologies.For this purpose, this reality
It is to propose a kind of mechanical arm with a novel purpose and with its manipulator and polissoir, using the mechanical arm
It is possible to prevente effectively from polishing disk carries the residual with spray liquid on mechanical arm in switching process after cleaning, thus avoiding raffinate
Product yield is improved while polluting other devices.
In the one aspect of the utility model, the utility model proposes a kind of mechanical arms.It is according to the present utility model
Embodiment, the mechanical arm include:
Robot body, the robot body is interior to be equipped with perforative vacuum pneumatic channel along its length；
Aperture, the aperture run through along the short transverse of the robot body and connect with the vacuum pneumatic channel
It is logical；
Potsherd, the potsherd are detachably arranged in the aperture, and potsherd runs through through-hole equipped with multiple.
According to the mechanical arm of the utility model embodiment by being equipped with perforative vacuum pneumatic channel inside it and opening
Hole, and setting has the potsherd of through-hole in aperture, and mechanical arm is during polishing disk after carrying and overturning cleaning, drop
Falling in the spray liquid on mechanical arm can be as the through-hole on potsherd be inhaled under the vacuum suction effect in vacuum pneumatic channel
It walks, achievees the effect that mechanical arm is dry, thus raising while effectively avoiding that raffinate pollutes other devices on mechanical arm
Product yield, while by being equipped with dismountable potsherd in aperture, it can be convenient and it is replaced and cleaned, avoid on potsherd
The blocking of through-hole, to further increase the removal rate of raffinate on mechanical arm.
In addition, can also have the following additional technical features: according to the mechanical arm of the utility model above-described embodiment
Further, the area of section in the vacuum pneumatic channel account for the robot body area of section 1/16~
1/8.Thus, it is possible to significantly improve the removal rate of raffinate on mechanical arm.
Further, the diameter of the aperture is 1~15mm.Thus, it is possible to significantly improve going for raffinate on mechanical arm
Except rate.
Further, the mechanical arm includes multiple apertures and multiple potsherds, the multiple aperture with
The multiple potsherd is arranged in a one-to-one correspondence.Thus, it is possible to significantly improve the removal rate of raffinate on mechanical arm.
Further, length direction arranged for interval of the multiple aperture along the robot body.Thus, it is possible to aobvious
Write the removal rate for improving raffinate on mechanical arm.
Further, the spacing distance of the two neighboring aperture is 5~10mm.Thus, it is possible to significantly improve manipulator
The removal rate of raffinate thereon is improved while arm intensity.
Further, the robot body includes: mechanical arm matrix；Hydrophobic coating, the hydrophobic coating
It is located at least part surface of the mechanical arm matrix.
Further, the hydrophobic coating with a thickness of 40 microns~4000 microns.
In the second aspect of the utility model, the utility model proposes a kind of manipulators.It is according to the present utility model
Embodiment, the manipulator have mechanical arm described above.As a result, using the Manipulator Transportation or overturning ceramic disk mistake
It is possible to prevente effectively from remaining in pollution of the raffinate on mechanical arm to follow up device in journey, and it can guarantee gained silicon wafer tool
There is higher product yield.
In terms of the third of the utility model, the utility model proposes a kind of polissoirs.According to the utility model
Embodiment, the polissoir have above-mentioned mechanical arm.Above-mentioned manipulator is used on the polissoir as a result,
Product yield can be improved while avoiding residual mechanical arm raffinate from polluting follow up device.
The additional aspect and advantage of the utility model will be set forth in part in the description, partially will be from following description
In become obvious, or recognized by the practice of the utility model.
Detailed description of the invention
The above-mentioned and/or additional aspect and advantage of the utility model from the description of the embodiment in conjunction with the following figures will
Become obvious and be readily appreciated that, in which:
Fig. 1 is the structural schematic diagram according to the mechanical arm of the utility model one embodiment；
Fig. 2 is the vertical section structure figure of robot body on the mechanical arm according to the utility model one embodiment；
Fig. 3 is the structural schematic diagram according to the mechanical arm of the utility model further embodiment；
Fig. 4 is the structural schematic diagram of potsherd on the mechanical arm according to another embodiment of the utility model.
Specific embodiment
The embodiments of the present invention are described below in detail, examples of the embodiments are shown in the accompanying drawings, wherein from beginning
Same or similar element or element with the same or similar functions are indicated to same or similar label eventually.Below by ginseng
The embodiment for examining attached drawing description is exemplary, it is intended to for explaining the utility model, and should not be understood as to the utility model
Limitation.
In the description of the present invention, it should be understood that term " center ", " longitudinal direction ", " transverse direction ", " length ", " width
Degree ", " thickness ", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outside",
The orientation or positional relationship of the instructions such as " clockwise ", " counterclockwise ", " axial direction ", " radial direction ", " circumferential direction " is based on the figure
Orientation or positional relationship is merely for convenience of describing the present invention and simplifying the description, rather than the dress of indication or suggestion meaning
It sets or element must have a particular orientation, be constructed and operated in a specific orientation, therefore should not be understood as to the utility model
Limitation.
In the present invention unless specifically defined or limited otherwise, term " installation ", " connected ", " connection ", " Gu
It is fixed " etc. terms shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integral；It can be
Mechanical connection, is also possible to be electrically connected；It can be directly connected, two can also be can be indirectly connected through an intermediary
The interaction relationship of connection or two elements inside element, unless otherwise restricted clearly.For the common skill of this field
For art personnel, the concrete meaning of above-mentioned term in the present invention can be understood as the case may be.
In the present invention unless specifically defined or limited otherwise, fisrt feature is in the second feature " on " or " down "
It can be that the first and second features directly contact or the first and second features are by intermediary mediate contact.Moreover, first is special
Sign can be fisrt feature above the second feature " above ", " above " and " above " and be directly above or diagonally above the second feature, or only
Indicate that first feature horizontal height is higher than second feature.Fisrt feature under the second feature " below ", " below " and " below " can be with
It is that fisrt feature is directly under or diagonally below the second feature, or is merely representative of first feature horizontal height less than second feature.
In the one aspect of the utility model, the utility model proposes a kind of mechanical arms.It is according to the present utility model
Embodiment, with reference to Fig. 1, mechanical arm includes robot body 100, aperture 200 and potsherd 300.
Embodiment according to the present utility model is equipped in robot body 100 and runs through along its length with reference to Fig. 1
Vacuum pneumatic channel 10.Specifically, vacuum pneumatic channel end connection vacuum means are set to vacuum pneumatic channel offer
Vacuum adsorption force, so that the leacheate remained on mechanical arm sucks very under the action of adsorption capacity through the through-hole on potsherd
Airflow path and be removed, achieve the effect that drying machinery arm.Preferably, with reference to Fig. 1, robot body 100 is arc
Shape, and the length direction of robot body is the circumferential direction of arc robot body.
A specific embodiment according to the present utility model, the area of section in vacuum pneumatic channel 10 account for robot body
The 1/16~1/8 of 100 areas of section, such as 1/16,1/15,1/14,1/13,1/12,1/11,1/10,1/9 or 1/8.As a result,
Enough adsorption capacities can be provided while avoiding vacuum pneumatic channel blockage, to improve going for leacheate on mechanical arm
Except effect.
Further, with reference to Fig. 2, robot body 100 includes mechanical arm matrix 11 and hydrophobic coating 12,
In, hydrophobic coating 12 is located at least part surface of mechanical arm matrix 11, such as hydrophobic coating 12 is located at machinery
In the whole surface of arm matrix 11.As a result, infiltration and wall built-up do not occur for the leacheate remained on mechanical arm, thus
It is removed rapidly under the action of adsorption capacity through the through-hole sucking vacuum pneumatic channel on potsherd.Specifically, mechanical arm
Matrix 11 be stainless steel material, to provide intensity for mechanical arm, it is preferred that hydrophobic coating 12 with a thickness of 40 microns~
4000 microns.For example, hydrophobic coating 12 with a thickness of 40 microns, 100 microns, 200 microns, 300 microns, 400 microns, 500
Micron, 600 microns, 700 microns, 800 microns, 900 microns, 1000 microns, 1500 microns, 2000 microns, 2500 microns, 3000
Micron, 3500 microns, 4000 microns.A specific embodiment according to the present utility model, hydrophilic coating 12 be glass powder or
Fluoride for non-stick pan is made.
Embodiment according to the present utility model, with reference to Fig. 1, aperture 200 runs through along the short transverse of robot body 100
And be connected to vacuum pneumatic channel 10, so that the leacheate remained on mechanical arm surface is adsorbed through aperture into true
It is removed in airflow path.Preferably, the diameter of aperture 200 is 1~15mm.Inventors have found that if opening diameter is too small
It is easy to cause blocking, and if aperture is larger so that adsorption capacity is lower, to reduce the removal rate of leacheate on mechanical arm.As a result,
Using the aperture of the application diameter range, the removal of leacheate on mechanical arm can be improved while avoiding aperture from blocking
Rate.For example, the diameter of aperture 200 be 1mm, 2mm, 3mm, 4mm, 5mm, 6mm, 7mm, 8mm, 9mm, 10mm, 11mm, 12mm,
13mm,14mm,15mm.Further, with reference to Fig. 3, robot body 100 is equipped with multiple apertures 200, and multiple apertures
200 along robot body 100 length direction arranged for interval, perfectly even arranged for interval, to significantly improve mechanical arm
The removal rate of upper residual leacheate, that is, improve its drying efficiency.A specific embodiment according to the present utility model, it is two neighboring
The spacing distance of aperture 200 is 5~10mm.Inventors have found that if adjacent apertures apart from too small, lead to the intensity mistake of mechanical arm
It is low, and if adjacent apertures apart from excessive so that the leacheate remained on mechanical arm can not remove in time.As a result, using this
The spacing range of application not only guarantees mechanical arm intensity with higher, but also improves and remain going for leacheate on mechanical arm
Except rate.For example, the spacing distance of two neighboring aperture 200 is 5mm, 6mm, 7mm, 8mm, 9mm, 10mm.
Embodiment according to the present utility model, with reference to Fig. 1 and 4, potsherd 300 is detachably arranged in aperture 200, and
Potsherd 300 is equipped with multiple through through-hole 30.Specifically, by being equipped with potsherd in aperture, and set on potsherd
Multiple through-holes are set, so that remaining in the leacheate on mechanical arm absorbs into vacuum under the effect of vacuum pneumatic passage adsorbent power
Airflow channel and be removed, and be removably disposed potsherd, can be convenient and it is replaced and cleaned, avoid through-hole on potsherd
Blocking, to improve the removal rate of raffinate on mechanical arm.Preferably, with reference to Fig. 3, robot body 100 is equipped with more
A potsherd 300, and multiple potsherds 300 and multiple apertures 200 are corresponded and are arranged.It should be noted that " one is a pair of
Answer " to can be understood as potsherd identical as the quantity of aperture, i.e. and an aperture is equipped with a potsherd.
According to the mechanical arm of the utility model embodiment by being equipped with perforative vacuum pneumatic channel inside it and opening
Hole, and setting has the potsherd of through-hole in aperture, and mechanical arm is during polishing disk after carrying and overturning cleaning, drop
Falling in the spray liquid on mechanical arm can be as the through-hole on potsherd be inhaled under the vacuum suction effect in vacuum pneumatic channel
It walks, achievees the effect that mechanical arm is dry, thus raising while effectively avoiding that raffinate pollutes other devices on mechanical arm
Product yield, while by being equipped with dismountable potsherd in aperture, it can be convenient and it is replaced and cleaned, avoid on potsherd
The blocking of through-hole, to further increase the removal rate of raffinate on mechanical arm.
In the second aspect of the utility model, the utility model proposes a kind of manipulators.It is according to the present utility model
Embodiment, the manipulator have mechanical arm described above.As a result, using the Manipulator Transportation or overturning ceramic disk mistake
It is possible to prevente effectively from remaining in pollution of the raffinate on mechanical arm to follow up device in journey, and it can guarantee gained silicon wafer tool
There is higher product yield.It should be noted that above-mentioned be equally applicable to this for feature and advantage described in mechanical arm
Manipulator, details are not described herein again.
In terms of the third of the utility model, the utility model proposes a kind of polissoirs.According to the utility model
Embodiment, the polissoir have above-mentioned mechanical arm.Above-mentioned manipulator is used on the polissoir as a result,
Product yield can be improved while avoiding residual mechanical arm raffinate from polluting follow up device.It should be noted that above-mentioned
It is equally applicable to the polissoir for feature and advantage described in manipulator, details are not described herein again.
In the description of this specification, reference term " one embodiment ", " some embodiments ", " example ", " specifically show
The description of example " or " some examples " etc. means specific features, structure, material or spy described in conjunction with this embodiment or example
Point is contained at least one embodiment or example of the utility model.In the present specification, to the schematic table of above-mentioned term
It states and is necessarily directed to identical embodiment or example.Moreover, particular features, structures, materials, or characteristics described can be with
It can be combined in any suitable manner in any one or more of the embodiments or examples.In addition, without conflicting with each other, this field
Technical staff can by the feature of different embodiments or examples described in this specification and different embodiments or examples into
Row combination and combination.
Although the embodiments of the present invention have been shown and described above, it is to be understood that above-described embodiment is
Illustratively, it should not be understood as limiting the present invention, those skilled in the art are in the scope of the utility model
Inside it can make changes, modifications, alterations, and variations to the above described embodiments.
Claims (10)
1. a kind of mechanical arm characterized by comprising
Robot body, the robot body is interior to be equipped with perforative vacuum pneumatic channel along its length；
Aperture, the aperture run through along the short transverse of the robot body and are connected to the vacuum pneumatic channel；
Potsherd, the potsherd are detachably arranged in the aperture, and potsherd runs through through-hole equipped with multiple.
2. mechanical arm according to claim 1, which is characterized in that the area of section in the vacuum pneumatic channel accounts for described
The 1/16~1/8 of robot body area of section.
3. mechanical arm according to claim 1, which is characterized in that the diameter of the aperture is 1~15mm.
4. mechanical arm according to claim 1, which is characterized in that including multiple apertures and multiple ceramics
Piece, the multiple aperture are arranged in a one-to-one correspondence with the multiple potsherd.
5. mechanical arm according to claim 4, which is characterized in that the multiple aperture is along the robot body
Length direction arranged for interval.
6. mechanical arm according to claim 5, which is characterized in that the spacing distance of the two neighboring aperture be 5~
10mm。
7. mechanical arm according to claim 1, which is characterized in that the robot body includes:
Mechanical arm matrix；
Hydrophobic coating, the hydrophobic coating are located at least part surface of the mechanical arm matrix.
8. mechanical arm according to claim 7, which is characterized in that the hydrophobic coating with a thickness of 40 microns~
4000 microns.
9. a kind of manipulator, which is characterized in that the manipulator has mechanical arm of any of claims 1-8.
10. a kind of polissoir, which is characterized in that the polissoir has manipulator as claimed in claim 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822267240.4U CN209551724U (en) | 2018-12-29 | 2018-12-29 | Mechanical arm and manipulator and polissoir with it |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822267240.4U CN209551724U (en) | 2018-12-29 | 2018-12-29 | Mechanical arm and manipulator and polissoir with it |
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| Publication Number | Publication Date |
|---|---|
| CN209551724U true CN209551724U (en) | 2019-10-29 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201822267240.4U Active CN209551724U (en) | 2018-12-29 | 2018-12-29 | Mechanical arm and manipulator and polissoir with it |
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| CN (1) | CN209551724U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111554595A (en) * | 2020-05-11 | 2020-08-18 | 上海果纳半导体技术有限公司 | Semiconductor chip preparation device |
-
2018
- 2018-12-29 CN CN201822267240.4U patent/CN209551724U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111554595A (en) * | 2020-05-11 | 2020-08-18 | 上海果纳半导体技术有限公司 | Semiconductor chip preparation device |
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Legal Events
| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 221004 No.66, Yangshan Road, Xuzhou Economic Development Zone, Xuzhou City, Jiangsu Province Patentee after: Zhonghuan Leading (Xuzhou) Semiconductor Materials Co.,Ltd. Address before: 221004 No.66, Yangshan Road, Xuzhou Economic Development Zone, Xuzhou City, Jiangsu Province Patentee before: XUZHOU XINJING SEMICONDUCTOR TECHNOLOGY Co.,Ltd. |
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| CP01 | Change in the name or title of a patent holder | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20230523 Address after: 221004 No.1 Xinxin Road, Xuzhou Economic and Technological Development Zone, Jiangsu Province Patentee after: Zhonghuan Leading (Xuzhou) Semiconductor Materials Co.,Ltd. Patentee after: Zhonghuan leading semiconductor materials Co.,Ltd. Address before: 221004 No.66, Yangshan Road, Xuzhou Economic Development Zone, Xuzhou City, Jiangsu Province Patentee before: Zhonghuan Leading (Xuzhou) Semiconductor Materials Co.,Ltd. |
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| TR01 | Transfer of patent right |