CN112452928A - Automatic dust collector of silicon chip - Google Patents
Automatic dust collector of silicon chip Download PDFInfo
- Publication number
- CN112452928A CN112452928A CN202011202541.4A CN202011202541A CN112452928A CN 112452928 A CN112452928 A CN 112452928A CN 202011202541 A CN202011202541 A CN 202011202541A CN 112452928 A CN112452928 A CN 112452928A
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- CN
- China
- Prior art keywords
- silicon wafer
- dust
- dust removing
- workbench
- base plate
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
- B08B15/04—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area from a small area, e.g. a tool
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0028—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by adhesive surfaces
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
Abstract
The invention relates to the technical field of silicon wafer dust removal, and discloses an automatic silicon wafer dust removal device which comprises a workbench, wherein a silicon wafer positioning area is arranged on the top surface of the workbench, a base plate is arranged on the upper side of the workbench, slide rails are arranged on two sides of the workbench, side plates in sliding connection with the slide rails are fixed on two sides of the lower end of the base plate, and a driving mechanism is arranged between each side plate and the workbench; the bottom surface of the base plate is fixedly provided with an air blowing assembly, the air blowing assembly is connected with an air blowing pipe, the front end and the rear end of the inner side surface of the side plate are fixedly provided with air suction assemblies, and the air suction assemblies are connected with air suction pipes. The invention has the advantages of high dust removal efficiency and good dust removal effect.
Description
Technical Field
The invention relates to the technical field of silicon wafer dust removal, in particular to an automatic silicon wafer dust removal device.
Background
The silicon wafer is a semiconductor material, can be used for manufacturing important materials of integrated circuits, and is also an important material of photovoltaic cells. Various semiconductor devices can be manufactured by carrying out processes such as photoetching, ion implantation and the like on a silicon wafer. In various processing processes, the silicon wafer is affected by equipment and surrounding space environment, the surface of the silicon wafer is easy to be stained with some dust, the surface of the silicon wafer needs to be kept clean in the subsequent processing and using processes, for example, the silicon wafer can be used after the dust on the surface is cleaned when an integrated circuit is manufactured, a reflecting film needs to be prepared on the surface of the silicon wafer when a photovoltaic cell is manufactured, and if the dust exists on the surface of the silicon wafer, the reflecting film is uneven or the surface is uneven, and the reflecting film at the dust position is easy to separate. At present, the silicon wafer is generally dedusted in a dust-free workshop by manually blowing with an air gun or manually dedusting with a dust-collecting stick, the dedusting efficiency is low, and dust on the surface of the silicon wafer is difficult to clean.
Disclosure of Invention
The automatic silicon wafer dust removal device provided by the invention aims to solve the problems of low dust removal efficiency and unclean dust removal of the silicon wafer in the prior art, and is high in dust removal efficiency and good in dust removal effect.
In order to achieve the purpose, the invention adopts the following technical scheme:
an automatic silicon wafer dust removal device comprises a workbench, wherein a silicon wafer positioning area is arranged on the top surface of the workbench, a base plate is arranged on the upper side of the workbench, slide rails are arranged on two sides of the workbench, side plates in sliding connection with the slide rails are fixed on two sides of the lower end of the base plate, and a driving mechanism is arranged between each side plate and the workbench; the bottom surface of the base plate is fixedly provided with an air blowing assembly, the air blowing assembly is connected with an air blowing pipe, the front end and the rear end of the inner side surface of the side plate are fixedly provided with air suction assemblies, and the air suction assemblies are connected with air suction pipes. The silicon chip is placed and is fixed a position at silicon chip locating area, the base plate is along slide rail horizontal migration under actuating mechanism's effect, the subassembly of blowing is located the silicon chip directly over, the subassembly of breathing in is located the both sides of silicon chip, the base plate is at the in-process that removes, the subassembly of blowing is blown to the silicon chip, the subassembly of breathing in simultaneously breathes in, thereby blow the dust on silicon chip surface and suck away through the subassembly of breathing in, realize the quick automatic dust removal on silicon chip surface, high dust removal efficiency, the dust removal effect is good, the dust that blows up is sucked away, thereby avoid secondary pollution.
Preferably, filters are arranged on the outer side surfaces of the side plates, the air blowing pipe is connected with one filter, and the air suction pipe is connected with the other filter. The air flow in the air blowing pipe enters the blowing-up assembly after being filtered by the filter, so that the air flow blown out by the blowing-up assembly is ensured to be cleaner.
Preferably, the driving mechanism comprises a driving motor, a gear and a rack, the rack is fixed on the side surface of the workbench and is distributed in parallel with the sliding rail, the driving motor is fixed on the side plate, the gear is fixed at the shaft end of the driving motor, and the gear is meshed with the rack; and two ends of the rack are provided with limiting blocks. The driving motor drives the gear to rotate, the gear moves along the rack to realize the movement of the base plate, and the whole structure is compact and stable.
Preferably, both ends all are equipped with the dust removal roller around the downside of base plate, the outside of dust removal roller is equipped with the silica gel cover, the connecting axle at dust removal roller both ends passes through coupling assembling and is connected with the base plate. The silica gel cover is attached to the surface of the silicon wafer, and when the substrate moves, the silica gel cover rolls on the surface of the silicon wafer, so that dust which is difficult to be blown away by air flow on the surface of the silicon wafer is adhered to the surface of the silica gel cover and is taken away, and the dust removal effect is further improved.
Preferably, the circumferential surface of the silica gel sleeve extends to form a plurality of dust adhering pieces. The contact area of the dust sticking sheet and the silicon wafer is larger, and dust on the surface of the silicon wafer can be better stuck off.
Preferably, coupling assembling includes connecting rod, sliding seat, the sliding seat is fixed with the lower extreme of connecting rod, be equipped with the spout in the sliding seat, be equipped with the slider in the spout, the connecting axle rotates with the slider to be connected, the upper end department that lies in the slider in the spout is equipped with the pressure spring. Under the action of the pressure spring and the slide block, the silica gel sleeve is always in elastic contact with the silicon wafer, so that the silica gel sleeve and the dust adhering piece can be ensured to be in stable contact with the silicon wafer, and the silicon wafer can be prevented from being damaged due to overlarge pressure.
Preferably, the upper side of base plate is equipped with the connecting plate, the upper end of connecting rod passes base plate and connecting plate fixed connection, connecting rod and base plate sliding connection, the upside of connecting plate is equipped with linking bridge, linking bridge's both ends and base plate fixed connection, be fixed with elevator motor on the linking bridge, elevator motor's axle head is equipped with the screw rod that passes the connecting plate, threaded connection between screw rod and the connecting plate. The lifting of the connecting plate can be controlled through the lifting motor and the screw rod, so that the lifting of the dust removing roller is controlled, and the elastic pressure between the dust removing roller and the silicon wafer is changed.
Preferably, the inner side of the silicon wafer positioning area on the workbench is provided with a dust removal roller cleaning area, the dust removal roller cleaning area is provided with two long groove holes in one-to-one correspondence with the dust removal rollers, and the bottom of the dust removal roller cleaning area is located at the lowest part of the long groove holes and is provided with a dust removal roller cleaning assembly. When the base plate moves to the cleaning area of the dust removal roller, the lifting motor drives the dust removal roller to descend through the screw rod, the dust removal roller moves downwards to penetrate through the long slotted hole to enter the cleaning assembly of the dust removal roller, and the cleaning assembly of the dust removal roller cleans dust on the silica gel sleeve and the dust sticking piece.
Preferably, the cleaning assembly of the dust removing roller comprises water tanks, water spray nozzles and hot air nozzles, wherein the water tanks are fixed at the bottom of the cleaning area of the dust removing roller, two groups of water spray nozzles are arranged, the two groups of water spray nozzles are fixed on the front side and the rear side of the water tanks in a one-to-one correspondence manner, and the open ends of the water spray nozzles face the dust sticking sheets; the hot air nozzles are two groups, the two groups of hot air nozzles are fixed at the bottom of the cleaning area of the dust removing roller through a fixing support, and the opening ends of the hot air nozzles face the dust adhering sheets. The dust removing roller enters the dust removing roller cleaning assembly, the water spray nozzle sprays water to the silica gel sleeve for washing, and water flow is sprayed on the dust adhering sheet to drive the dust removing roller to rotate, so that dust on the surfaces of the silica gel sleeve and the dust adhering sheet is washed away; then, hot air flow is blown to the silica gel sleeve through a hot air nozzle, so that the silica gel sleeve is dried quickly; and then the lifting motor drives the dust removal roller to ascend, and the substrate moves to the position above the silicon wafer to continue dust removal.
Preferably, the number of the silicon wafer positioning areas on the workbench is two, the two silicon wafer positioning areas are distributed at two ends of the workbench, and the dust removing roller cleaning area is located between the two silicon wafer positioning areas. Two silicon chips are prevented at two ends of the workbench, the two silicon chips remove dust alternately, and after each silicon chip removes dust, the dust removal roller can enter the dust removal roller cleaning assembly to be cleaned once when passing through the dust removal roller cleaning area, so that the good dust sticking effect of the dust removal roller is ensured.
Therefore, the invention has the advantages of high dust removal efficiency, good dust removal effect and automatic cleaning and sustainable use of the dust removal roller.
Drawings
FIG. 1 is a schematic diagram of a structure of the present invention.
Fig. 2 is a front view of fig. 1.
Fig. 3 is a right side view of fig. 1.
FIG. 4 is a schematic view showing the connection of the substrate, the blow-up module and the suction module.
Fig. 5 is a bottom view of fig. 4.
Fig. 6 is a schematic structural view of a dusting roller.
Fig. 7 is an exploded view of the connection assembly.
FIG. 8 is a schematic view of a dusting roller entering a dusting roller cleaning assembly.
In the figure: the silicon wafer cleaning device comprises a workbench 1, a silicon wafer positioning area 2, a dust removing roller cleaning area 3, a long slotted hole 300, a substrate 4, a side plate 40, a slide rail 5, a driving mechanism 6, a driving motor 60, a gear 61, a rack 62, a limiting block 63, an air blowing assembly 7, an air blowing pipe 8, an air suction assembly 9, an air suction pipe 10, a filter 11, a dust removing roller 12, a silica gel sleeve 13, a dust sticking sheet 130, a connecting shaft 14, a connecting assembly 15, a connecting rod 150, a sliding seat 151, a sliding groove 152, a sliding block 153, a pressure spring 154, a connecting plate 16, a connecting support 17, a lifting motor 18, a screw 19, a dust removing roller cleaning assembly 20, a water tank 200, a.
Detailed Description
The invention is further described with reference to the accompanying drawings and the detailed description below:
the automatic silicon wafer dust removal device shown in fig. 1, 2, 3, 4 and 5 comprises a workbench 1, wherein the top surface of the workbench 1 is provided with two silicon wafer positioning areas 2, the two silicon wafer positioning areas on the workbench are distributed at two ends of the workbench, and a dust removal roller cleaning area 3 is arranged between the two silicon wafer positioning areas 2; a base plate 4 is arranged on the upper side of the workbench 1, slide rails 5 are arranged on two sides of the workbench 1, side plates 40 connected with the slide rails in a sliding manner are fixed on two sides of the lower end of the base plate 4, and a driving mechanism 6 is arranged between the side plates 40 and the workbench; the driving mechanism 6 comprises a driving motor 60, a gear 61 and a rack 62, the rack 62 is fixed on the side face of the workbench 1 and is parallel to the sliding rail 5, the driving motor 60 is fixed on the side plate 40 through a motor base, the gear is fixed at the shaft end of the driving motor and meshed with the rack, and the two ends of the rack 62 are provided with limit blocks 63.
The bottom surface of base plate 4 is fixed with the subassembly 7 of blowing, is connected with gas blow pipe 8 on the subassembly of blowing, and the gas blow pipe is connected with outside air supply system, and both ends all are fixed with the subassembly 9 of breathing in around the medial surface of curb plate 40, connect breathing pipe 10 on the subassembly of breathing in, and four subassemblies of breathing in are connected with same breathing pipe, and the lateral surface of curb plate 40 all is equipped with filter 11, and the gas blow pipe is connected with a filter, and the breathing pipe is connected with another filter.
As shown in fig. 3, 4, 6 and 7, the front end and the rear end of the lower side of the substrate 4 are provided with dust removing rollers 12, the outer side of the dust removing rollers is provided with a silica gel sleeve 13, the connecting shafts 14 at the two ends of the dust removing rollers are connected with the substrate through connecting components 15, and the circumferential surface of the silica gel sleeve 13 extends to form a plurality of dust sticking pieces 130; coupling assembling 15 includes connecting rod 150, sliding seat 151, and sliding seat 151 is fixed with the lower extreme of connecting rod, is equipped with spout 152 in the sliding seat, is equipped with slider 153 in the spout, and connecting axle 14 rotates with slider 153 to be connected, and the upper end department that lies in the slider in the spout is equipped with pressure spring 154.
The upside of base plate 1 is equipped with connecting plate 16, and base plate and connecting plate fixed connection are passed to the upper end of connecting rod 150, and connecting rod 150 and base plate sliding connection, the upside of connecting plate 16 are equipped with linking bridge 17, and linking bridge's both ends and base plate fixed connection are fixed with elevator motor 18 on linking bridge 17, and elevator motor's axle head is equipped with the screw rod 19 that passes the connecting plate, threaded connection between screw rod and the connecting plate.
As shown in fig. 1 and 8, two slotted holes 300 corresponding to the dust removing rollers one by one are arranged on the dust removing roller cleaning area 3, and the dust removing roller cleaning assembly 20 is arranged at the bottom of the dust removing roller cleaning area 3 and is positioned at the lowest part of the slotted holes; the dust removing roller cleaning assembly 20 comprises water tanks 200, water spray nozzles 201 and hot air spray nozzles 202, wherein the water tanks are fixed at the bottom of the dust removing roller cleaning area 3, the water spray nozzles are divided into two groups, the two groups of water spray nozzles are fixed on the front side and the rear side of the water tanks in a one-to-one correspondence manner, and the open ends of the water spray nozzles face the dust sticking sheets; the hot air nozzles are two groups, two groups of hot air nozzles 202 are fixed at the bottom of the cleaning area of the dust removing roller through a fixing support 203, and the opening ends of the hot air nozzles face the dust adhering sheet.
The principle of the invention is as follows with reference to the attached drawings: as shown in fig. 1, two silicon wafers are respectively positioned in silicon wafer positioning areas 2 at two ends of a worktable, the initial position of a substrate is positioned in a cleaning area 3 of a dust removal roller, the substrate moves rightwards under the action of a driving mechanism, an air blowing component blows air and the air suction component sucks air in the moving process, the dust removal roller and the surface of the silicon wafer are elastically pressed to move along the surface of the silicon wafer, the air blowing component blows dust on the surface of the silicon wafer and sucks the dust through the air suction component, a dust suction piece on the dust removal roller is in contact with the surface of the silicon wafer to stick away some dust which is difficult to blow away, the substrate moves rightwards to an extreme position and then moves leftwards to the cleaning area of the dust removal roller, and at the moment, the front; the lifting motor drives the connecting plate to descend, so that the dust removing roller descends to penetrate through the long slotted hole and then enters the dust removing roller cleaning assembly 20, then the dust removing roller is cleaned and dried through the water spray nozzles 201 and the hot air spray nozzles 202 in sequence, the lifting motor drives the lifting plate to ascend and reset, and the dust removing roller is used for carrying out reverse side treatment on two silicon wafers through a mechanical arm or manpower during cleaning; then the substrate repeats the actions once to realize the reverse dust removal of the two silicon wafers; when the dust removal roller is cleaned again, the silicon wafer is replaced through a mechanical arm or a manual work, so that efficient dust removal of the silicon wafer is achieved, the area of a silicon wafer positioning area on the workbench can be increased according to actual needs, more silicon wafers are positioned, and synchronous dust removal of the silicon wafers is achieved. And will blow in this structure, breathe in and remove dust and the dust removal roller binding dust and combine together, dust removal effect is better, and the dust removal roller can all clear up after the reciprocating binding dust once on the workstation, and clearance latency just in time is used for the reverse side of silicon chip or goes up unloading, and the whole availability factor of equipment is very high.
The above is only a specific embodiment of the present invention, but the technical features of the present invention are not limited thereto. Any simple changes, equivalent substitutions or modifications made based on the present invention to solve the same technical problems and achieve the same technical effects are within the scope of the present invention.
Claims (10)
1. An automatic silicon wafer dust removal device comprises a workbench, wherein a silicon wafer positioning area is arranged on the top surface of the workbench, and the automatic silicon wafer dust removal device is characterized in that a base plate is arranged on the upper side of the workbench, slide rails are arranged on two sides of the workbench, side plates in sliding connection with the slide rails are fixed on two sides of the lower end of the base plate, and a driving mechanism is arranged between each side plate and the workbench; the bottom surface of the base plate is fixedly provided with an air blowing assembly, the air blowing assembly is connected with an air blowing pipe, the front end and the rear end of the inner side surface of the side plate are fixedly provided with air suction assemblies, and the air suction assemblies are connected with air suction pipes.
2. The automatic silicon wafer dedusting device as claimed in claim 1, wherein the outer side surfaces of the side plates are respectively provided with a filter, the air blowing pipe is connected with one filter, and the air suction pipe is connected with the other filter.
3. The automatic silicon wafer dust removal device as claimed in claim 1, wherein the driving mechanism comprises a driving motor, a gear and a rack, the rack is fixed on the side surface of the workbench and distributed in parallel with the slide rail, the driving motor is fixed on the side plate, the gear is fixed at the shaft end of the driving motor, and the gear is meshed with the rack; and two ends of the rack are provided with limiting blocks.
4. The automatic silicon wafer dust removing device according to claim 1, wherein dust removing rollers are arranged at the front end and the rear end of the lower side of the base plate, a silica gel sleeve is arranged on the outer side of each dust removing roller, and connecting shafts at the two ends of each dust removing roller are connected with the base plate through connecting components.
5. The automatic silicon wafer dust removing device as claimed in claim 4, wherein the silica gel sleeve extends from the circumferential surface thereof to form a plurality of dust-sticking pieces.
6. The automatic silicon wafer dust removing device according to claim 4 or 5, wherein the connecting assembly comprises a connecting rod and a sliding seat, the sliding seat is fixed to the lower end of the connecting rod, a sliding groove is formed in the sliding seat, a sliding block is arranged in the sliding groove, the connecting shaft is rotatably connected with the sliding block, and a pressure spring is arranged at the upper end of the sliding block in the sliding groove.
7. The automatic dust removing device for the silicon wafers as claimed in claim 6, wherein the upper side of the base plate is provided with a connecting plate, the upper end of the connecting rod penetrates through the base plate and is fixedly connected with the connecting plate, the connecting rod is slidably connected with the base plate, the upper side of the connecting plate is provided with a connecting bracket, two ends of the connecting bracket are fixedly connected with the base plate, the connecting bracket is fixed with a lifting motor, the shaft end of the lifting motor is provided with a screw penetrating through the connecting plate, and the screw is in threaded connection with the connecting plate.
8. The automatic silicon wafer dust removing device according to claim 7, wherein a dust removing roller cleaning area is arranged on the workbench at the inner side of the silicon wafer positioning area, two slotted holes corresponding to the dust removing rollers in a one-to-one mode are formed in the dust removing roller cleaning area, and a dust removing roller cleaning assembly is arranged at the lowest position of the slotted holes at the bottom of the dust removing roller cleaning area.
9. The automatic silicon wafer dust removal device according to claim 8, wherein the dust removal roller cleaning assembly comprises a water tank, two groups of water spray nozzles and hot air nozzles, the water tank is fixed at the bottom of the dust removal roller cleaning area, the two groups of water spray nozzles are fixed on the front side and the rear side of the water tank in a one-to-one correspondence manner, and the open ends of the water spray nozzles face the dust-sticking sheet; the hot air nozzles are two groups, the two groups of hot air nozzles are fixed at the bottom of the cleaning area of the dust removing roller through a fixing support, and the opening ends of the hot air nozzles face the dust adhering sheets.
10. The automatic silicon wafer dedusting device as claimed in claim 7, wherein the number of the silicon wafer positioning areas on the worktable is two, the two silicon wafer positioning areas are distributed at two ends of the worktable, and the dedusting roller cleaning area is located between the two silicon wafer positioning areas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011202541.4A CN112452928A (en) | 2020-11-02 | 2020-11-02 | Automatic dust collector of silicon chip |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011202541.4A CN112452928A (en) | 2020-11-02 | 2020-11-02 | Automatic dust collector of silicon chip |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112452928A true CN112452928A (en) | 2021-03-09 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011202541.4A Pending CN112452928A (en) | 2020-11-02 | 2020-11-02 | Automatic dust collector of silicon chip |
Country Status (1)
| Country | Link |
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| CN (1) | CN112452928A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114226351A (en) * | 2021-08-16 | 2022-03-25 | 重庆大学 | Complex multi-working-condition self-adaptive dust removal device for dry cutting processing of composite material |
| CN114378048A (en) * | 2021-12-30 | 2022-04-22 | 重庆金美新材料科技有限公司 | End face dust removal system |
| CN115213141A (en) * | 2021-12-31 | 2022-10-21 | 湖南凯地众能科技有限公司 | New energy automobile waste battery recovery unit with anticreep protect function |
| CN116372900A (en) * | 2023-06-07 | 2023-07-04 | 深圳市腾阁机电实业有限公司 | Mechanical arm for hardware part machining |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114226351A (en) * | 2021-08-16 | 2022-03-25 | 重庆大学 | Complex multi-working-condition self-adaptive dust removal device for dry cutting processing of composite material |
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| CN114378048A (en) * | 2021-12-30 | 2022-04-22 | 重庆金美新材料科技有限公司 | End face dust removal system |
| CN114378048B (en) * | 2021-12-30 | 2023-02-28 | 重庆金美新材料科技有限公司 | End face dust removal system |
| CN115213141A (en) * | 2021-12-31 | 2022-10-21 | 湖南凯地众能科技有限公司 | New energy automobile waste battery recovery unit with anticreep protect function |
| CN116372900A (en) * | 2023-06-07 | 2023-07-04 | 深圳市腾阁机电实业有限公司 | Mechanical arm for hardware part machining |
| CN116372900B (en) * | 2023-06-07 | 2023-08-15 | 深圳市腾阁机电实业有限公司 | Mechanical arm for hardware part machining |
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Application publication date: 20210309 |