CN208980793U - Pellumina preparation facilities - Google Patents
Pellumina preparation facilities Download PDFInfo
- Publication number
- CN208980793U CN208980793U CN201821734827.5U CN201821734827U CN208980793U CN 208980793 U CN208980793 U CN 208980793U CN 201821734827 U CN201821734827 U CN 201821734827U CN 208980793 U CN208980793 U CN 208980793U
- Authority
- CN
- China
- Prior art keywords
- gas
- air inlet
- air
- cylinder
- pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn - After Issue
Links
Landscapes
- Jet Pumps And Other Pumps (AREA)
Abstract
The utility model discloses one kind can be directly using liquid trimethyl aluminium as the pellumina preparation facilities of raw material supply.The device includes vacuum deposition chamber, graphite boat is equipped in vacuum deposition room, vacuum deposition chamber is equipped with air inlet and exhaust outlet, air inlet supervisor and exhaust manifold are provided in vacuum deposition room, the inlet duct for being passed through process gas is connected on air inlet, by being improved to inlet duct, increase evaporator, first by the trimethyl aluminium of liquid flash to after gaseous state again with argon gas wrap up in gaseous trimethyl aluminium and and nitrous oxide mix after into vacuum deposition chamber, without carrying out gaseous state words to the trimethyl aluminium of liquid in advance before carrying out plated film, reduce the storage and transport problem of gaseous state trimethyl aluminium, it is used while converting directly in vacuum deposition process, its safety greatly improves, and reduce process and the workload of worker, improve plating membrane efficiency.It is suitble to promote and apply in silicon chip of solar cell processing equipment field.
Description
Technical field
The utility model relates to silicon chip of solar cell processing equipment field, especially a kind of pellumina preparation facilities.
Background technique
In order to improve the transfer efficiency of crystal silicon cell, the surface recombination for reducing cell piece is a kind of effective method, this
Kind effect, which is referred to as, to be passivated.In the front of cell piece, antireflection film plays the role of good surface passivation；In the back of cell piece
Face, the analysis and test of personnel after study, there are also very big rooms for promotion for the passivation effect of Al-BSF.Researcher from this
Angle develops back passivated battery, i.e., promoting passivation effect in such a way that passivating film is plated at the cell piece back side.Back passivation electricity
Pond reduces the Carrier recombination at the cell piece back side, enhances the response of the long glistening light of waves, improves the open-circuit voltage of battery, final electricity
The efficiency in pond will also get a promotion.SiO2, amorphous silicon and aluminium oxide all can serve as back passivating film, and current back passivated battery is normal
Using aluminium oxide as back passivating film.
In crystal silicon solar energy battery manufacturing process, prepares pellumina and generally use plasma enhanced chemical vapor
Sedimentation, referred to as PECVD (Plasma Enhanced Chemical Vapor Deposition), PECVD are to utilize forceful electric power
Field makes required gas source molecular ionize generation plasma, and many very high chemical groups of activity are contained in plasma, this
A little groups pass through through a series of chemistry and plasma reaction, form solid film in silicon chip surface.
Currently, the device for being used to prepare pellumina mainly includes setting in crystal silicon solar energy battery manufacturing process
There is the vacuum deposition chamber of fire door, is equipped with graphite boat in vacuum deposition room, silicon wafer is placed on graphite boat, and vacuum deposition chamber is equipped with
Air inlet and exhaust outlet, air inlet supervisor and exhaust manifold are provided in the vacuum deposition room, and the air inlet supervisor is horizontally disposed
Above graphite boat, the air inlet supervisor is connected to air inlet, be connected on the air inlet for be passed through process gas into
Device of air, the exhaust manifold are horizontally set below graphite boat, and the exhaust manifold is connected to exhaust outlet, on the exhaust outlet
It is connected with vacuum pump, the import of vacuum pump is connected to exhaust outlet, and the outlet of vacuum pump is connected with last row pipe, and the process gas is
Refer to the gas in pellumina preparation process for reaction, under normal circumstances, used in pellumina preparation process
Process gas mainly has following three kinds: argon gas, gaseous state trimethyl aluminium, nitrous oxide, the work of the pellumina preparation facilities
Process is as follows: three process gas being each led into vacuum deposition room, after different process gas mixes in vacuum deposition room
And it is ionized into ion in vacuum deposition room, a large amount of active group is generated by multiple impacts, is gradually attached to solar-electricity
The surface of pond silicon wafer forms one layer of aluminum oxide film.This pellumina preparation facilities exists following in actual use
Problem: firstly, since what is desired is that being all gaseous molecular, argon gas and nitrous oxide are in normal temperature and pressure in vacuum deposition process
Under be all gaseous state, and chemical state is stablized, and does not have harm, but trimethyl aluminium is liquid at normal temperature, therefore, is being carried out
It is all to need to be atomized into gaseous state, and trimethyl aluminium meets water and air and is all extremely easy to happen explosion before vacuum deposition, because
This, gaseous trimethyl aluminium whether transport and save it is all very inconvenient, secondly, pellumina preparation facilities work mistake
Cheng Zhong, three kinds of process gas mixing in vacuum deposition room it is more uniform, the pellumina that silicon chip surface is formed just can more
Even, three kinds of process gas are all first to be passed through after vacuum deposition chamber just to carry out nature mixing in existing vacuum deposition process, are mixed
It is excessively poor to close the uniformity, frequently results in uneven with a batch of silicon chip surface aluminum oxide film thickness level, seriously affects plated film
Quality；Furthermore during the work of pellumina preparation facilities, the temperature in vacuum deposition room need to be maintained at one it is stable
In range, since existing pellumina preparation facilities is all the mixing directly by argon gas, gaseous state trimethyl aluminium, nitrous oxide
Gas is passed directly into vacuum deposition room, since the temperature of argon gas, nitrous oxide is lower, normally close to room temperature, when the two enters
After temperature is up to 400 degrees Celsius of hot environment, large effect will certainly be caused to the temperature in vacuum deposition room, such as truly
Sky deposition fluctuations in indoor temperature changes greatly that the pellumina levels of audit quality that will lead to and eventually form is uneven, influences turning for cell piece
Change efficiency；In addition, the tail gas that existing pellumina preparation facilities generates during the deposition process be all under the action of vacuum pump,
Successively be discharged into the external world along exhaust manifold, vacuum pump, last row pipe, due in deposition process trimethyl aluminium some cannot be complete
Reaction, responseless trimethyl aluminium and tail gas mix discharge, and trimethylaluminum gas encounters air and will explode, due to
Tail gas will not all encounter air in delivery pipe and vacuum pump, would not also explode, once but tail gas enters last row
Guan Hou, since last row pipe is connected to outside air, it is easy into the trimethyl aluminium contained in the tail gas of last row pipe quick-fried
It is fried, so that last row pipe often explodes, production accident is caused, safety is poor；Finally, into the mixing system in vacuum deposition room
How journey gas is evenly distributed in the coating quality that silicon chip surface is directly affected in vacuum deposition room, at present for how to make into
Entering the mixing process gas in vacuum deposition room to be evenly distributed in is always a urgent problem to be solved in vacuum deposition room.
Utility model content
The technical problem to be solved by the utility model is to provide one kind can be directly using liquid trimethyl aluminium as raw material
The pellumina preparation facilities of supply.
The technical scheme adopted by the utility model to solve the technical problem is as follows: the pellumina preparation facilities, including set
It is equipped with the vacuum deposition chamber of fire door, is equipped with graphite boat in vacuum deposition room, silicon wafer is placed on graphite boat, sets in vacuum deposition chamber
There are air inlet and exhaust outlet, air inlet supervisor and exhaust manifold are provided in the vacuum deposition room, the air inlet supervisor level is set
It sets above graphite boat, the air inlet supervisor is connected to air inlet, is connected on the air inlet for being passed through process gas
Inlet duct, the exhaust manifold are horizontally set below graphite boat, and the exhaust manifold is connected to exhaust outlet, the exhaust outlet
On be connected with vacuum pump, the import of vacuum pump is connected to exhaust outlet, and the outlet of vacuum pump is connected with last row pipe, the inlet duct
Including nitrous oxide gas-guide tube, argon gas gas-guide tube, trimethyl aluminium catheter, the nitrous oxide air guide pipe end and air inlet
Mouth is connected to, and is provided with nitrous oxide gas flowmeter on the nitrous oxide gas-guide tube, the trimethyl aluminium catheter
End is connected with evaporator, and trimethyl aluminium fluid flowmeter, the argon gas gas-guide tube are provided on the trimethyl aluminium catheter
It is connected to evaporator, argon gas flow meter is provided on the argon gas gas-guide tube, the outlet of the evaporator and air inlet connect
It is logical.
Further, gas mixer is provided between the inlet duct and air inlet, the gas mixing dress
It sets including level-one gas mixer and secondary gas mixing arrangement, the level-one gas mixer includes conical shell, converges
Flow tube and closed cylindrical shell, the left side center of the cylindrical shell offer gas port, the gas port respectively with
The outlet of evaporator, nitrous oxide gas-guide tube are connected to, and are provided with circular fixed plate, the fixed plate in the cylindrical shell
A side surface face gas port, and the center of the center alignment and fixation plate of gas port, the fixed plate towards gas port one
Side surface is provided with spoiler, and the angle of the spoiler and fixed plate surface is less than 90 degree, and spoiler is to gas port side
To inclination, the flow-disturbing plate surface offers multiple ventholes, and the bigger diameter end of the conical shell is fixed on the right side of cylindrical shell
It is connected on end face and inside the bigger diameter end of conical shell and cylindrical shell, the miner diameter end of the conical shell and the left end of collecting pipe
It is fixedly linked and the two interconnects, the right end of the collecting pipe is connected with secondary gas mixing arrangement, and the secondary gas is mixed
It attaches together and sets including gas compressor, the import of the gas compressor is connected to the right end of collecting pipe, the gas compressor
Outlet is connected with gas nozzle, and the decompression tube of taper, the miner diameter end and gas of the decompression tube are connected on the gas nozzle
Nozzle is connected, and the bigger diameter end of the decompression tube is connected to air inlet.
Further, preheating device is provided between the gas mixer and air inlet, the preheating device packet
Include thermal-insulating body, be provided with heat exchanger tube in the thermal-insulating body, the left end of the heat exchanger tube stretch out thermal-insulating body and with decompression
The bigger diameter end of pipe is connected to, and the right end of the heat exchanger tube stretches out thermal-insulating body and is connected to air inlet, and the right end of the thermal-insulating body connects
It is connected to gas-guide tube A, the end of the gas-guide tube A and the outlet of vacuum pump, the left end of the thermal-insulating body is connected with air guide
Pipe B, the end of the gas-guide tube B are connected to the entrance of last row pipe.
Further, the heat exchanger tube is coil pipe.
Further, exhaust gas processing device is provided between the end and last row pipe of the gas-guide tube B, at the tail gas
Managing device includes the gas explosion room being sequentially connected, water shot room, methyl hydride combustion room, is connected with air conduit on the gas explosion room, described
The end of air conduit is provided with air blower, and the first Non-return air valve is provided on the air conduit, is contained in the water shot room
There is water, is provided with the second Non-return air valve on the gas-guide tube B.
Further, it is 150mm-300mm stainless steel cylinder that the methyl hydride combustion room, which is internal diameter,.
Further, the outer surface of the cylinder is provided with multiple tight loops, pass through metal between adjacent tight loop
Item links together.
Further, being provided with inlet air distribution device, the exhaust outlet and row between the air inlet and air inlet supervisor
Exhaust distribution device is provided between gas supervisor；The inlet air distribution device includes M grades of air distribution structures, M >=2, the first order
Air distribution structure includes the first air inlet pipe, and the front end of first air inlet pipe is connected with air inlet, the end connection of the first air inlet pipe
There is first order steam separator, the first order steam separator includes the first cylinder being arranged in the first air inlet pipe, described the first cylinder
Outer diameter it is identical as the internal diameter of the first air inlet pipe, be provided with N in described the first cylinder1A first demarcation plate, the N1>=2, it is described
N1The inner passage of the first cylinder is divided into N by a first demarcation plate1A first subchannel, the cross section of each first subchannel
Area is all the same, and the end seal of each first subchannel is connected with second air inlet pipe, and second level air distribution structure includes setting
The second level steam separator in the end of the second air inlet pipe is set, the second level steam separator includes be arranged in the second air inlet pipe
Two cylinders, the outer diameter of described the second cylinder is identical as the internal diameter of the second air inlet pipe, is provided with N in described the second cylinder2A second
Demarcation plate, the N2>=2, the N2The inner passage of the second cylinder is divided into N by a second demarcation plate2A second subchannel,
The cross-sectional area of each second subchannel is all the same, and the end seal of each second subchannel is connected with a third air inlet
Pipe, and so on, M grades of air distribution structures include the M grades of steam separators that M air inlet pipe end is arranged in, the M fraction gas
Device includes the M cylinder being arranged in M air inlet pipe, and the outer diameter of the M cylinder is identical as the internal diameter of M air inlet pipe, described
N is provided in M cylinderMA M demarcation plate, the NM>=2, the NMA M demarcation plate divides the inner passage of M cylinder
It is cut into NMThe cross-sectional area of a M subchannel, each M subchannel is all the same, the end seal connection of each M subchannel
There is a M+1 air inlet pipe；The air inlet supervisor's is closed at both ends, its axis direction is provided with a row on air inlet supervisor's side wall
A through-hole A and exhausting hole B, the through-hole A is identical with the quantity of through-hole B, and the through-hole A is located above through-hole B, and through-hole A and
The position of through-hole B up and down correspond, the quantity of the through-hole A is identical with the quantity of M+1 air inlet pipe, and each M+1 into
The end of tracheae is connected to a through-hole A, and the through-hole B is towards graphite boat；The exhaust distribution device includes M grades of bleed knots
Structure, M >=2, first order bleed structure includes downtake pipe, and the front end of the downtake pipe is connected with exhaust outlet, the
The end of one exhaust pipe is connected with first order air entraining device, and the first order air entraining device includes first be arranged in downtake pipe
The outer diameter of cylinder, first cylinder is identical as the internal diameter of downtake pipe, is provided with N in first cylinder1A first every
Plate, the N1>=2, the N1The inner passage of first cylinder is divided into N by a first partition1A first sub- air entraining passage, Mei Ge
The cross-sectional area of one sub- air entraining passage is all the same, and the end seal of each first sub- air entraining passage is connected with a second exhaust pipe,
Second level bleed structure includes the second level air entraining device that the end of second exhaust pipe is arranged in, and the second level air entraining device includes setting
The second cylinder in second exhaust pipe is set, the outer diameter of second cylinder is identical as the internal diameter of second exhaust pipe, and described second
N is provided in cylinder2A second partition, the N2>=2, the N2A second partition divides the inside air entraining passage of the second cylinder
At N2The cross-sectional area of a second sub- air entraining passage, each second sub- air entraining passage is all the same, the end of each second sub- air entraining passage
It is sealedly connected with a third exhaust pipe, and so on, M grades of bleed structures include M grades that M exhaust pipe end is arranged in
Air entraining device, the M grades of air entraining devices include the M cylinder being arranged in M exhaust pipe, outer diameter and the M row of the M cylinder
The internal diameter of tracheae is identical, is provided with N in the M cylinderMA M partition, the NM>=2, the NMA M partition is by M
The inside air entraining passage of body is divided into NMThe cross-sectional area of a sub- air entraining passage of M, each sub- air entraining passage of M is all the same, each M
The end seal of sub- air entraining passage is connected with a M+1 exhaust pipe；Closed at both ends, the exhaust manifold side wall of the exhaust manifold
On its axis direction is provided with an exhausting hole C and an exhausting hole D, the through-hole C is identical with the quantity of through-hole D, the through-hole C
Above through-hole D, and the position of through-hole C and through-hole D correspond up and down, the quantity of the through-hole D and M+1 exhaust pipe
Quantity is identical, and the end of each M+1 exhaust pipe is connected to a through-hole D, and the through-hole C is towards graphite boat.
Further, the M=4, the N1=2, the N2=3, the N3=3, the N4=3.
The beneficial effects of the utility model are: the pellumina preparation facilities is passed through by improving to inlet duct
Increase evaporator, is wrapped up in again with argon gas with gaseous trimethyl aluminium and an and oxidation after the trimethyl aluminium of liquid is first flashed to gaseous state
Enter vacuum deposition chamber after phenodiazine mixing, in this way without carrying out gas to the trimethyl aluminium of liquid in advance before carrying out plated film
State words reduce the storage and transport problem of gaseous state trimethyl aluminium, use while converting directly in vacuum deposition process,
Its safety greatly improves, and reduces process and the workload of worker, improves plating membrane efficiency.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the utility model pellumina preparation facilities；
Fig. 2 is the A partial enlarged view of Fig. 1；
Fig. 3 is the B partial enlarged view of Fig. 1；
In the figure, it is marked as fire door 1, vacuum deposition chamber 2, graphite boat 3, air inlet 4, exhaust outlet 5, air inlet supervisor 6, exhaust master
Pipe 7, inlet duct 8, nitrous oxide gas-guide tube 801, argon gas gas-guide tube 802, trimethyl aluminium catheter 803, nitrous oxide
Gas flowmeter 804, evaporator 805, trimethyl aluminium fluid flowmeter 806, argon gas flow meter 807, vacuum pump 9, last row
Pipe 10, gas mixer 11, conical shell 1101, collecting pipe 1102, cylindrical shell 1103, gas port 1104, fixed plate
1105, spoiler 1106, venthole 1107, gas compressor 1108, gas nozzle 1109, decompression tube 1110, preheating device
12, thermal-insulating body 1201, heat exchanger tube 1202, gas-guide tube A 1203, gas-guide tube B 1204, exhaust gas processing device 13, gas explosion room
1301, water shot room 1302, methyl hydride combustion room 1303, air conduit 1304, air blower 1305, the first Non-return air valve 1306, second
Non-return air valve 1307, inlet air distribution device 14, the first air inlet pipe 1401, first order steam separator 1402, the first cylinder 140201,
First demarcation plate 140202, the first subchannel 140203, the second air inlet pipe 1403, second level steam separator 1404, the second cylinder
140401, the second demarcation plate 140402, the second subchannel 140403, third air inlet pipe 1405, through-hole A 1406, through-hole B
1407, distribution device 15, downtake pipe 1501, first order air entraining device 1502, the first cylinder 150201, first partition are vented
150202, the first sub- air entraining passage 150203, second exhaust pipe 1503, second level air entraining device 1504, the second cylinder 150401, second
Partition 150402, the second sub- air entraining passage 150403, third exhaust pipe 1505, through-hole C 1506, through-hole D 1507.
Specific embodiment
The present invention will be further described with reference to the accompanying drawing.
As shown in Figures 1 to 3, the pellumina preparation facilities, the vacuum deposition chamber 2 including being provided with fire door 1, vacuum deposition
Graphite boat 3 is equipped in room 2, silicon wafer is placed on graphite boat 3, and vacuum deposition chamber 2 is equipped with air inlet 4 and exhaust outlet 5, described true
Air inlet supervisor 6 and exhaust manifold 7 are provided in empty settling chamber 2, the air inlet supervisor 6 is horizontally set on 3 top of graphite boat, described
Air inlet supervisor 6 is connected to air inlet 4, and the inlet duct 8 for being passed through process gas, the row are connected on the air inlet 4
Gas supervisor 7 is horizontally set on 3 lower section of graphite boat, and the exhaust manifold 7 is connected to exhaust outlet 5, is connected on the exhaust outlet 5
The import of vacuum pump 9, vacuum pump 9 is connected to exhaust outlet 5, and the outlet of vacuum pump 9 is connected with last row pipe 10, the inlet duct 8
Including nitrous oxide gas-guide tube 801, argon gas gas-guide tube 802, trimethyl aluminium catheter 803, the nitrous oxide gas-guide tube
801 ends are connected to air inlet 4, are provided with nitrous oxide gas flowmeter 804 on the nitrous oxide gas-guide tube 801,
The end of the trimethyl aluminium catheter 803 is connected with evaporator 805, is provided with front three on the trimethyl aluminium catheter 803
Base molten aluminum flowmeter body 806, the argon gas gas-guide tube 802 are connected to evaporator 805, are provided on the argon gas gas-guide tube 802
The outlet of argon gas flow meter 807, the evaporator 805 is connected to air inlet 4.The pellumina preparation facilities by into
Device of air 8 improves, and by increasing evaporator 805, wraps up in band with argon gas again after the trimethyl aluminium of liquid is first flashed to gaseous state
Gaseous trimethyl aluminium simultaneously and after nitrous oxide mixing enters vacuum deposition chamber 2, in this way without before carrying out plated film
Gaseous state words are carried out to the trimethyl aluminium of liquid in advance, reduce the storage and transport problem of gaseous state trimethyl aluminium, directly in vacuum
It is used while converting in deposition process, safety greatly improves, and reduces process and the workload of worker, improves
Plating membrane efficiency.
During above embodiment, it is provided with gas mixer 11 between the inlet duct 8 and air inlet 4,
The gas mixer 11 includes level-one gas mixer 11 and secondary gas mixing arrangement 11, the level-one gas mixing
Device 11 includes conical shell 1101, collecting pipe 1102 and closed cylindrical shell 1103, a left side for the cylindrical shell 1103
End face center offers gas port 1104, the gas port 1104 respectively with the outlet of evaporator 805, nitrous oxide gas-guide tube
801 are connected to, and are provided with circular fixed plate 1105 in the cylindrical shell 1103, a side surface of the fixed plate 1105 is just
To gas port 1104, and the center of the center alignment and fixation plate 1105 of gas port 1104, the fixed plate 1105 is towards gas port
1104 side surface is provided with spoiler 1106, and the angle on the spoiler 1106 and 1105 surface of fixed plate is less than 90
Degree, and spoiler 1106 is tilted to 1104 direction of gas port, 1106 surface of spoiler offers multiple ventholes 1107, institute
The bigger diameter end for stating conical shell 1101 is fixed on the right side of cylindrical shell 1103 and the bigger diameter end and column of conical shell 1101
It is connected to inside shape shell 1103, the miner diameter end of the conical shell 1101 is fixedly linked with the left end of collecting pipe 1102 and the two
It interconnects, the right end of the collecting pipe 1102 is connected with secondary gas mixing arrangement 11, the secondary gas mixing arrangement 11
Including gas compressor 1108, the import of the gas compressor 1108 is connected to the right end of collecting pipe 1102, the gas pressure
The outlet of contracting machine 1108 is connected with gas nozzle 1109, and the decompression tube 1110 of taper, institute are connected on the gas nozzle 1109
The miner diameter end for stating decompression tube 1110 is connected with gas nozzle 1109, and the bigger diameter end of the decompression tube 1110 is connected to air inlet 4.
By the way that gas mixer 11 is arranged between inlet duct 8 and air inlet 4, so that three kinds of process gas first pass through fixed plate
1105, upset the flow direction of mixed gas after the interference of spoiler 1106, so that three kinds of process gas are tentatively mixed, it is preliminary mixed
Mixed gas after conjunction sprays after being compressed by gas compressor 1108 from gas nozzle 1109, can so that three kinds of processing procedures
Gas mixing is more uniform, and due to compressing by gas compressor 1108, the pressure of gas is larger, it is therefore desirable to by taper
Decompression tube 1110 be passed through again after being depressured in vacuum deposition chamber 2 in reacted, in such vacuum deposition chamber 2 everywhere three
Kind process gas concentration is all identical, and the pellumina uniformity that the silicon wafer of different places in vacuum deposition chamber 2 can be made to be formed is big
It is big to improve, product quality can be greatly improved.
Further, preheating device 12 is provided between the gas mixer 11 and air inlet 4, the pre- hot charging
Setting 12 includes thermal-insulating body 1201, is provided with heat exchanger tube 1202, the left end of the heat exchanger tube 1202 in the thermal-insulating body 1201
It stretches out thermal-insulating body 1201 and is connected to the bigger diameter end of decompression tube 1110, the right end of the heat exchanger tube 1202 stretches out thermal-insulating body
1201 are connected to air inlet 4, and the right end of the thermal-insulating body 1201 is connected with gas-guide tube A1203, the gas-guide tube A1203's
The outlet of end and vacuum pump 9, the left end of the thermal-insulating body 1201 are connected with gas-guide tube B1204, the gas-guide tube
The end of B1204 is connected to the entrance of last row pipe 10.Due to being provided with pre- hot charging between gas mixer 11 and air inlet 4
12 are set, preheating device 12 can heat the mixed gas of three kinds of process gas, avoid the lower process gas pair of temperature
Temperature in vacuum deposition chamber 2 causes large effect, during the work of pellumina preparation facilities, it is ensured that vacuum
Temperature in settling chamber 2 is maintained in a stable range, so that the pellumina uniform quality eventually formed is consistent, is kept
The transfer efficiency of cell piece, and preheat using the higher tail gas of temperature, increase heating equipment without additional, accomplishes exhaust gas
It utilizes, it is energy saving.
In order to improve heat exchange efficiency, the heat exchanger tube 1202 can be designed as coil pipe.To increase heat exchange area, raising is changed
The thermal efficiency.
Furthermore exhaust gas processing device 13, the tail gas are provided between the end and last row pipe 10 of the gas-guide tube B1204
Processing unit 13 includes gas explosion room 1301, water shot room 1302, the methyl hydride combustion room 1303 being sequentially connected, the gas explosion room 1301
On be connected with air conduit 1304, the end of the air conduit 1304 is provided with air blower 1305, the air conduit 1304
On be provided with the first Non-return air valve 1306, water is loaded in the water shot room 1302, is provided with second on the gas-guide tube B1204
Non-return air valve 1307.The exhaust gas of end of reaction is under the action of vacuum pump 9 in vacuum deposition chamber 2, successively along exhaust manifold, vacuum
Pump 9, preheating device 12, gas explosion room 1301, water shot room 1302, methyl hydride combustion room 1303, last row pipe 10 are discharged into the external world, due to tail
Gas will not all encounter air in exhaust manifold, vacuum pump 9 and preheating device 12, would not also explode, thus, tail gas
Entering gas explosion room 1301 after gas-guide tube B1204 discharge will contact with air, and the trimethyl aluminium contained in tail gas will be in gas
Air reacts in shot room 1301, and in order to keep reaction more complete, air conduit 1304 is connected on gas explosion room 1301, described
The end of air conduit 1304 is provided with air blower 1305, after the trimethyl aluminium reaction that tail gas is contained in gas explosion room 1301
It enters back into water shot room 1302 and reacts away trimethyl aluminium remaining in tail gas, after trimethyl aluminium and the reaction of air and water
Methane can be generated, therefore, the methyl hydride combustion of generation is totally entered back into last row pipe 10 afterwards when tail gas enters back into methyl hydride combustion, is entered
The tail gas of last row pipe 10 avoids what last row pipe 10 exploded frequent occurrence due to would not also explode without containing trimethyl aluminium
Dangerous situation occurs, and safety greatly improves, and the pernicious gas of tail gas is mostly disposed off, and the tail gas of discharge will not be right
Environment affects greatly, more environmentally-friendly.
The methyl hydride combustion room 1303 can be made of the biggish cylinder of structural strength, and have sufficiently large space,
Preferably, it is 150mm-300mm stainless steel cylinder that the methyl hydride combustion room 1303, which is internal diameter,.Which structure is simple, changes
It makes conveniently, easy to process and maintenance.
In order to further increase the structural strength of cylinder, the outer surface of the cylinder is provided with multiple tight loops, adjacent
It is linked together between tight loop by metal strip.
In addition, being provided with inlet air distribution device 14, the exhaust outlet and exhaust between the air inlet 4 and air inlet supervisor 6
Exhaust distribution device 15 is provided between supervisor 7；The inlet air distribution device 14 includes M grades of air distribution structures, the M >=2, and the
Level-one air distribution structure includes the first air inlet pipe 1401, and the front end of first air inlet pipe 1401 is connected with air inlet 4, the first air inlet
The end of pipe 1401 is connected with first order steam separator 1402, and the first order steam separator 1402 includes being arranged in the first air inlet pipe
The first cylinder 140201 in 1401, the outer diameter of described the first cylinder 140201 is identical as the internal diameter of the first air inlet pipe 1401, institute
It states in the first cylinder 140201 and is provided with N1A first demarcation plate 140202, the N1>=2, the N1A first demarcation plate
The inner passage of the first cylinder 140201 is divided into N by 1402021A first subchannel 140203, each first subchannel
140203 cross-sectional area is all the same, and the end seal of each first subchannel 140203 is connected with second air inlet pipe
1403, second level air distribution structure includes the second level steam separator 1404 that the end of the second air inlet pipe 1403 is arranged in, and described second
Grade steam separator 1404 includes the second cylinder 140401 for being arranged in the second air inlet pipe 1403, described the second cylinder 140401 it is outer
Diameter is identical as the internal diameter of the second air inlet pipe 1403, is provided with N in described the second cylinder 1404012A second demarcation plate 140402,
The N2>=2, the N2The inner passage of the second cylinder 140401 is divided into N by a second demarcation plate 1404022A second son is logical
The cross-sectional area in road 140403, each second subchannel 140403 is all the same, and the end of each second subchannel 140403 is close
Envelope is connected with a third air inlet pipe 1405, and so on, M grades of air distribution structures include the M that M air inlet pipe end is arranged in
Grade steam separator, the M grades of steam separators include the M cylinder being arranged in M air inlet pipe, the outer diameter of the M cylinder and the
The internal diameter of M air inlet pipe is identical, is provided with N in the M cylinderMA M demarcation plate, the NM>=2, the NMA M demarcation plate
The inner passage of M cylinder is divided into NMThe cross-sectional area of a M subchannel, each M subchannel is all the same, Mei Ge
The end seal of M subchannel is connected with a M+1 air inlet pipe；The air inlet supervisor's 6 is closed at both ends, and 6 side walls are responsible in air inlet
On its axis direction is provided with an exhausting hole A1406's and exhausting hole a B1407, the through-hole A1406 and through-hole B1407
Quantity is identical, and the through-hole A1406 is located above through-hole B1407, and the position of through-hole A1406 and through-hole B1407 are up and down one by one
Corresponding, the quantity of the through-hole A1406 is identical with the quantity of M+1 air inlet pipe, and the end of each M+1 air inlet pipe is with one
A through-hole A1406 connection, the through-hole B1407 is towards graphite boat 3；The exhaust distribution device 15 includes M grades of bleed structures, institute
M >=2 are stated, first order bleed structure includes downtake pipe 1501, front end and 5 phase of exhaust outlet of the downtake pipe 1501
Even, the end of downtake pipe 1501 is connected with first order air entraining device 1502, and the first order air entraining device 1502 includes that setting exists
The first cylinder 150201 in downtake pipe 1501, outer diameter and the downtake pipe 1501 of first cylinder 150201
Internal diameter is identical, is provided with N in first cylinder 1502011A first partition 150202, the N1>=2, the N1A first
The inner passage of first cylinder 150201 is divided into N by partition 1502021A first sub- air entraining passage 150203, each first son
The cross-sectional area of air entraining passage 150203 is all the same, and the end seal of each first sub- air entraining passage 150203 is connected with one second
Exhaust pipe 1503, second level bleed structure include the second level air entraining device 1504 that the end of second exhaust pipe 1503 is arranged in, institute
Stating second level air entraining device 1504 includes the second cylinder 150401 being arranged in second exhaust pipe 1503, second cylinder
150401 outer diameter is identical as the internal diameter of second exhaust pipe 1503, is provided with N in second cylinder 1504012A second every
Plate, the N2>=2, the N2The inside air entraining passage of second cylinder 150401 is divided into N by a second partition2A second sub- bleed
The cross-sectional area in road 150403, each second sub- air entraining passage 150403 is all the same, the end of each second sub- air entraining passage 150403
End is sealedly connected with a third exhaust pipe 1505, and so on, M grades of bleed structures include setting in M exhaust pipe end
M grades of air entraining devices, the M grades of air entraining devices include the M cylinder being arranged in M exhaust pipe, the M cylinder it is outer
Diameter is identical as the internal diameter of M exhaust pipe, is provided with N in the M cylinderMA M partition, the NM>=2, the NMA M every
The inside air entraining passage of M cylinder is divided into N by plateMThe cross-sectional area of a sub- air entraining passage of M, each sub- air entraining passage of M is homogeneous
Together, the end seal of each sub- air entraining passage of M is connected with a M+1 exhaust pipe；Closed at both ends, the row of the exhaust manifold 7
Gas, which is responsible on 7 side walls, to be provided with an exhausting hole C1506 and exhausting hole a D1507, the through-hole C1506 along its axis direction and leads to
The quantity of hole D1507 is identical, and the through-hole C1506 is located above through-hole D1507, and the position of through-hole C1506 and through-hole D1507
One-to-one correspondence up and down is set, the quantity of the through-hole D1507 is identical with the quantity of M+1 exhaust pipe, and each M+1 exhaust pipe
End be connected to a through-hole D1507, the through-hole C1506 is towards graphite boat 3.By in air inlet 4 and air inlet supervisor 6
Between be provided with inlet air distribution device 14, be provided between the exhaust outlet and exhaust manifold 7 exhaust distribution device 15, pass through
Inlet air distribution device 14 by the mixing process gas for being passed through vacuum deposition chamber 2 be evenly distributed to air inlet supervisor 6 in, then again from into
Gas supervisor 6 flows to graphite boat 3, can guarantee mixing process gas amount near often a piece of silicon wafer all to the greatest extent in this way
It is very nearly the same, at the same by exhaust distribution device 15, tail gas is uniformly sucked in exhaust manifold 7, is then then exhausted from, in this way from
Inlet air distribution and two aspect of exhaust gas distribution control flowing into and out for process gas simultaneously, can guarantee each silicon to greatest extent
The concentration of mixing process gas near piece is all approximate consistent with amount, the aluminum oxide film thickness that silicon chip surface each in this way is formed
Can be more uniform, silicon chip film-coated quality and efficiency can be greatly improved.Further, the M=4, the N1=2, institute
State N2=3, the N3=3, the N4=3.
Claims (9)
1. pellumina preparation facilities, the vacuum deposition chamber (2) including being provided with fire door (1), vacuum deposition chamber (2) is interior to be equipped with stone
Mo Zhou (3), silicon wafer are placed on graphite boat (3), and vacuum deposition chamber (2) is equipped with air inlet (4) and exhaust outlet (5), described true
Air inlet supervisor (6) and exhaust manifold (7) are provided in empty settling chamber (2), the air inlet supervisor (6) is horizontally set on graphite boat
(3) top, the air inlet supervisor (6) are connected to air inlet (4), are connected on the air inlet (4) for being passed through process gas
Inlet duct (8), the exhaust manifold (7) is horizontally set below graphite boat (3), the exhaust manifold (7) and exhaust outlet
(5) it is connected to, is connected with vacuum pump (9) on the exhaust outlet (5), the import of vacuum pump (9) is connected to exhaust outlet (5), vacuum pump
(9) outlet is connected with last row pipe (10), it is characterised in that: the inlet duct (8) includes nitrous oxide gas-guide tube
(801), argon gas gas-guide tube (802), trimethyl aluminium catheter (803), nitrous oxide gas-guide tube (801) end and air inlet
Mouth (4) is connected to, and is provided with nitrous oxide gas flowmeter (804), the front three on the nitrous oxide gas-guide tube (801)
The end of base aluminium catheter (803) is connected with evaporator (805), is provided with trimethyl on the trimethyl aluminium catheter (803)
Molten aluminum flowmeter body (806), the argon gas gas-guide tube (802) are connected to evaporator (805), on the argon gas gas-guide tube (802)
It is provided with argon gas flow meter (807), the outlet of the evaporator (805) is connected to air inlet (4).
2. pellumina preparation facilities as described in claim 1, it is characterised in that: the inlet duct (8) and air inlet (4)
Between be provided with gas mixer (11), the gas mixer (11) includes level-one gas mixer (11) and second level
Gas mixer (11), the level-one gas mixer (11) include conical shell (1101), collecting pipe (1102) and
The left side center of closed cylindrical shell (1103), the cylindrical shell (1103) offers gas port (1104), described to lead
Stomata (1104) is connected to the outlet of evaporator (805), nitrous oxide gas-guide tube (801) respectively, the cylindrical shell
(1103) it is provided with circular fixed plate (1105) in, a side surface face gas port (1104) of the fixed plate (1105),
And the center of the center alignment and fixation plate (1105) of gas port (1104), the fixed plate (1105) is towards gas port (1104)
One side surface is provided with spoiler (1106), and the angle on the spoiler (1106) and fixed plate (1105) surface is less than 90
Degree, and spoiler (1106) is tilted to gas port (1104) direction, spoiler (1106) surface offers multiple ventholes
(1107), the bigger diameter end of the conical shell (1101) is fixed on the right side of cylindrical shell (1103) and conical shell
(1101) it is connected to inside bigger diameter end and cylindrical shell (1103), the miner diameter end and collecting pipe of the conical shell (1101)
(1102) left end is fixedly linked and the two interconnects, and the right end of the collecting pipe (1102) is connected with secondary gas mixing dress
Set (11), the secondary gas mixing arrangement (11) includes gas compressor (1108), the gas compressor (1108) into
Mouth is connected to the right end of collecting pipe (1102), and the outlet of the gas compressor (1108) is connected with gas nozzle (1109), institute
State the decompression tube (1110) that taper is connected on gas nozzle (1109), the miner diameter end and gas nozzle of the decompression tube (1110)
(1109) it is connected, the bigger diameter end of the decompression tube (1110) is connected to air inlet (4).
3. pellumina preparation facilities as claimed in claim 2, it is characterised in that: the gas mixer (11) and air inlet
It is provided with preheating device (12) between mouth (4), the preheating device (12) includes thermal-insulating body (1201), the thermal-insulating body
(1201) be provided with heat exchanger tube (1202) in, the left end of the heat exchanger tube (1202) stretch out thermal-insulating body (1201) and with decompression
The bigger diameter end connection of (1110) is managed, the right end of the heat exchanger tube (1202) stretches out thermal-insulating body (1201) and is connected to air inlet (4),
The right end of the thermal-insulating body (1201) is connected with gas-guide tube A (1203), the end of the gas-guide tube A (1203) and vacuum pump
(9) left end of outlet, the thermal-insulating body (1201) is connected with gas-guide tube B (1204), the gas-guide tube B (1204)
End is connected to the entrance of last row pipe (10).
4. pellumina preparation facilities as claimed in claim 3, it is characterised in that: the heat exchanger tube (1202) is coil pipe.
5. pellumina preparation facilities as claimed in claim 4, it is characterised in that: the end of the gas-guide tube B (1204) with
It is provided between last row pipe (10) exhaust gas processing device (13), the exhaust gas processing device (13) includes the gas explosion room being sequentially connected
(1301), water shot room (1302), methyl hydride combustion room (1303) are connected with air conduit (1304) on the gas explosion room (1301),
The end of the air conduit (1304) is provided with air blower (1305), and it is unidirectional that first is provided on the air conduit (1304)
Air valve (1306), the water shot room (1302) is interior to be loaded with water, is provided with the second Non-return air valve on the gas-guide tube B (1204)
(1307)。
6. pellumina preparation facilities as claimed in claim 5, it is characterised in that: the methyl hydride combustion room (1303) is internal diameter
For 150mm-300mm stainless steel cylinder.
7. pellumina preparation facilities as claimed in claim 6, it is characterised in that: the outer surface of the cylinder is provided with multiple
Tight loop is linked together by metal strip between adjacent tight loop.
8. pellumina preparation facilities as claimed in claim 7, it is characterised in that: the air inlet (4) and air inlet supervisor (6)
Between be provided with inlet air distribution device (14), be provided between the exhaust outlet and exhaust manifold (7) exhaust distribution device (15)；
The inlet air distribution device (14) includes M grades of air distribution structures, and M >=2, first order air distribution structure includes the first air inlet pipe
(1401), the front end of first air inlet pipe (1401) is connected with air inlet (4), and the end of the first air inlet pipe (1401) is connected with
First order steam separator (1402), the first order steam separator (1402) include the first circle being arranged in the first air inlet pipe (1401)
Cylinder (140201), the outer diameter of the first cylinder (140201) is identical as the internal diameter of the first air inlet pipe (1401), first circle
N is provided in cylinder (140201)1A first demarcation plate (140202), the N1>=2, the N1A first demarcation plate (140202)
The inner passage of the first cylinder (140201) is divided into N1A first subchannel (140203), each first subchannel
(140203) cross-sectional area is all the same, and the end seal of each first subchannel (140203) is connected with second air inlet
It manages (1403), second level air distribution structure includes second level steam separator (1404) of the setting in the end of the second air inlet pipe (1403),
The second cylinder (140401) of the second level steam separator (1404) including setting in the second air inlet pipe (1403), described second
The outer diameter of cylinder (140401) is identical as the internal diameter of the second air inlet pipe (1403), is provided with N in the second cylinder (140401)2
A second demarcation plate (140402), the N2>=2, the N2A second demarcation plate (140402) is by the second cylinder (140401)
Inner passage is divided into N2The cross-sectional area of a second subchannel (140403), each second subchannel (140403) is homogeneous
Together, the end seal of each second subchannel (140403) is connected with a third air inlet pipe (1405), and so on, M grades
Air distribution structure includes the M grades of steam separators that M air inlet pipe end is arranged in, and the M grades of steam separators include being arranged in M air inlet
The outer diameter of M cylinder in pipe, the M cylinder is identical as the internal diameter of M air inlet pipe, is provided with N in the M cylinderMIt is a
M demarcation plate, the NM>=2, the NMThe inner passage of M cylinder is divided into N by a M demarcation plateMA M subchannel, often
The cross-sectional area of a M subchannel is all the same, and the end seal of each M subchannel is connected with a M+1 air inlet pipe；Institute
State air inlet supervisor (6) it is closed at both ends, air inlet supervisor (6) side wall on along its axis direction be provided with an exhausting hole A (1406) and
One exhausting hole B (1407), the through-hole A (1406) is identical with the quantity of through-hole B (1407), and the through-hole A (1406) is located at logical
Above hole B (1407), and the position of through-hole A (1406) and through-hole B (1407) correspond up and down, the through-hole A (1406)
Quantity is identical with the quantity of M+1 air inlet pipe, and the end of each M+1 air inlet pipe is connected to a through-hole A (1406), institute
Through-hole B (1407) is stated towards graphite boat (3)；The exhaust distribution device (15) includes M grades of bleed structures, the M >=2, and first
Grade bleed structure includes downtake pipe (1501), and the front end of the downtake pipe (1501) is connected with exhaust outlet (5), and first
The end of exhaust pipe (1501) is connected with first order air entraining device (1502), and the first order air entraining device (1502) includes setting the
The first cylinder (150201) in one exhaust pipe (1501), the outer diameter and downtake pipe of first cylinder (150201)
(1501) internal diameter is identical, is provided with N in first cylinder (150201)1A first partition (150202), the N1>=2, institute
State N1The inner passage of first cylinder (150201) is divided into N by a first partition (150202)1A first sub- air entraining passage
(150203), the cross-sectional area of each first sub- air entraining passage (150203) is all the same, each first sub- air entraining passage (150203)
End seal be connected with a second exhaust pipe (1503), bleed structure in the second level includes being arranged in second exhaust pipe (1503)
End second level air entraining device (1504), the second level air entraining device (1504) includes setting in the second exhaust pipe (1503)
The second cylinder (150401), the outer diameter of second cylinder (150401) is identical as the internal diameter of second exhaust pipe (1503), institute
It states in the second cylinder (150401) and is provided with N2A second partition (150402), the N2>=2, the N2A second partition
(150402) the inside air entraining passage of the second cylinder (150401) is divided into N2A second sub- air entraining passage (150403), each second
The cross-sectional area of sub- air entraining passage (150403) is all the same, and the end seal of each second sub- air entraining passage (150403) is connected with one
A third exhaust pipe (1505), and so on, M grades of bleed structures include that M grades of bleeds of M exhaust pipe end are arranged in
Device, the M grades of air entraining devices include the M cylinder being arranged in M exhaust pipe, the outer diameter and M exhaust pipe of the M cylinder
Internal diameter it is identical, be provided with N in the M cylinderMA M partition, the NM>=2, the NMA M partition is by M cylinder
Internal air entraining passage is divided into NMThe cross-sectional area of a sub- air entraining passage of M, each sub- air entraining passage of M is all the same, and each M draws
The end seal of air flue is connected with a M+1 exhaust pipe；Closed at both ends, exhaust manifold (7) side wall of the exhaust manifold (7)
On its axis direction is provided with an exhausting hole C (1506) and an exhausting hole D (1507), the through-hole C (1506) and through-hole D
(1507) quantity is identical, and the through-hole C (1506) is located above through-hole D (1507), and through-hole C (1506) and through-hole D
(1507) position corresponds up and down, and the quantity of the through-hole D (1507) is identical with the quantity of M+1 exhaust pipe, and each
The end of M+1 exhaust pipe is connected to a through-hole D (1507), and the through-hole C (1506) is towards graphite boat (3).
9. pellumina preparation facilities as claimed in claim 8, it is characterised in that: the M=4, the N1=2, the N2=
3, the N3=3, the N4=3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821734827.5U CN208980793U (en) | 2018-10-24 | 2018-10-24 | Pellumina preparation facilities |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821734827.5U CN208980793U (en) | 2018-10-24 | 2018-10-24 | Pellumina preparation facilities |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208980793U true CN208980793U (en) | 2019-06-14 |
Family
ID=66788910
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821734827.5U Withdrawn - After Issue CN208980793U (en) | 2018-10-24 | 2018-10-24 | Pellumina preparation facilities |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208980793U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109023301A (en) * | 2018-10-24 | 2018-12-18 | 乐山新天源太阳能科技有限公司 | Pellumina preparation facilities |
-
2018
- 2018-10-24 CN CN201821734827.5U patent/CN208980793U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109023301A (en) * | 2018-10-24 | 2018-12-18 | 乐山新天源太阳能科技有限公司 | Pellumina preparation facilities |
| CN109023301B (en) * | 2018-10-24 | 2023-10-13 | 乐山新天源太阳能科技有限公司 | Alumina film preparation facilities |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN109023301A (en) | Pellumina preparation facilities | |
| CN208980793U (en) | Pellumina preparation facilities | |
| CN106435740B (en) | A kind of vertical solar silicon chip diffusion furnace | |
| CN110124596A (en) | A kind of uniform mixed distribution device of gas for vapor phase growing apparatus | |
| CN201362594Y (en) | High-temperature vertical continuous induction heating furnace for graphite purification and graphitization | |
| CN101255993B (en) | Silicone hydride combustion tower | |
| CN210163522U (en) | Furnace tube and LPCVD (low pressure chemical vapor deposition) equipment | |
| CN209098806U (en) | Preparation facilities for pellumina | |
| CN208980792U (en) | It is used to prepare the PECVD device of pellumina | |
| CN208980794U (en) | It is used to prepare the device of silicon chip surface pellumina | |
| CN206673041U (en) | Lithium ion power cell pole flakes edge foil gluing membrane module | |
| CN201105991Y (en) | Polycrystalline silicon hydrogen reducing furnace | |
| CN209005699U (en) | A kind of methanol decomposition reactor | |
| CN105289214A (en) | Ammonia gas and silane mixed exhaust gas comprehensive treatment device | |
| CN208933468U (en) | A kind of pellumina preparation facilities | |
| CN102556669B (en) | Gas-solid mixing accelerating chamber | |
| CN210104072U (en) | TMA medium supply system | |
| CN205235701U (en) | Processing apparatus is synthesized to mixed waste gas of ammonia and silane | |
| CN204211819U (en) | For the Silicon nitride film preparation device of solar battery sheet | |
| CN206219721U (en) | A kind of vertical silicon chip diffusion furnace | |
| CN107055543A (en) | A kind of continuous volume production silicon nanowires group or the device of silicon flocculence cluster of grains | |
| CN104112866B (en) | The burning of a kind of fuel cell system is reformed and is premixed integrated apparatus | |
| CN104372308B (en) | Silicon nitride film preparation device | |
| CN220827459U (en) | Photovoltaic cell coating reaction furnace | |
| CN216604689U (en) | Organic waste gas treatment system for resin production workshop |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20190614 Effective date of abandoning: 20231013 |
|
| AV01 | Patent right actively abandoned |
Granted publication date: 20190614 Effective date of abandoning: 20231013 |
|
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |