CN106435740B - A kind of vertical solar silicon chip diffusion furnace - Google Patents
A kind of vertical solar silicon chip diffusion furnace Download PDFInfo
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- CN106435740B CN106435740B CN201610992437.7A CN201610992437A CN106435740B CN 106435740 B CN106435740 B CN 106435740B CN 201610992437 A CN201610992437 A CN 201610992437A CN 106435740 B CN106435740 B CN 106435740B
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/10—Reaction chambers; Selection of materials therefor
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/14—Substrate holders or susceptors
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/16—Feed and outlet means for the gases; Modifying the flow of the gases
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/18—Controlling or regulating
Abstract
The present invention discloses a kind of vertical solar silicon chip diffusion furnace, belongs to manufacture of solar cells technical field.Including vertical furnace, fire door, quartz boat group, inlet duct and exhaust emission device, quartz boat group is vertically stacked successively by quartz boat, be equipped among quartz boat vertically through guide hole, be uniformly provided with the boat slot for placing silicon chip in radioactivity centered on quartz boat by the guide hole central axis；Inlet duct includes air inlet helix tube and gas mixer, and air inlet helix tube is arranged between quartz boat group and furnace body cavity wall, and air inlet helix tube is evenly equipped with air admission hole towards quartz boat group side；Air inlet helix tube connects gas mixer；Exhaust emission device includes exhaust pipe and exhaust gas savings device, and exhaust pipe is vertically arranged along furnace furnace chamber central axis, and is correspondingly arranged in the guide hole of quartz boat；Exhaust outlet is evenly equipped on exhaust pipe, bottom connects exhaust gas and saves device.The present invention can effectively improve diffusion uniformity, while improve single furnace output.
Description
Technical field
The present invention relates to manufacture of solar cells technical field, especially a kind of vertical solar silicon chip diffusion furnace.
Background technology
Solar cell needs the PN junction of a large area to realize conversion of the luminous energy to electric energy, and diffusion furnace is to manufacture
The special equipment of solar cell PN junction.The PN junction that diffusion makes is the core and solar cell of crystal-silicon solar cell
One of key of quality.For diffusing procedure, greatest problem is how to ensure the uniformity of diffusion.The uniform electricity of diffusion
Pond, follow-up technological parameter controllability are high, it is ensured that the stability of silicon solar cell unit for electrical property parameters.And industrial metaplasia
Single furnace output of production demand is higher and higher, it is desirable that the silicon chip quantity of One Diffusion Process is up to 400~500.
CN203674241U discloses a kind of device promoting silicon chip diffused sheet resistance uniformity comprising inlet duct, stone
Ying Guan, waste pipe, even flow plate and quartz boat, inlet duct is installed on the quartz ampoule, and the bottom of quartz ampoule is equipped with waste discharge
The top of pipe, waste pipe is equipped with even flow plate, and the right part of even flow plate is equipped with quartz boat, although the even flow plate that the device is equipped with is by changing
Silicon chip sheet resistance uniformity after kind diffusion, improves uniformity in the piece of diffused sheet resistance, but since single furnace output is higher and higher, silicon chip
It is distributed in quartz pushrod in longer range, the nitrogen being on the one hand blown into this way from stove tail is difficult to be evenly dispersed in diffusion source
In diffusion furnace, and fluctuation is easy tod produce, causes diffusion uniformity poor, it is difficult to meet expected technology and requires on the other hand,
In silicon chip diffusion process in a longer range, needs to consume a large amount of diffusion sources and nitrogen, considerably increase production cost.
CN201020263438.6 discloses a kind of " silicon chip of solar cell diffusion furnace ", and air inlet pipe is passed directly into furnace body
It is interior, it is provided with the venthole of orientation setting in air inlet pipe, does not carry out the gas being sufficiently mixed and passes through the even cloth of venthole to silicon chip
Surface appears to be on surface gas being evenly distributed on silicon chip surface, essence due to enter in furnace body it is preceding it is unmixed uniformly, cause
The gas component ratio deviation that each venthole comes out is larger, and silicon chip surface is still unevenly distributed.
Invention content
The goal of the invention of the present invention is, in view of the above-mentioned problems, providing a kind of vertical solar silicon chip diffusion furnace, to pass through setting
Air inlet helix tube is simultaneously uniformly distributed air admission hole on the inside of it, and exhaust pipe is arranged in furnace body center, also uniformly right on exhaust pipe
The exhaust outlet answered, air inlet helix tube mutually map corresponding with exhaust pipe；It fully ensures the uniformity of air inlet diffusion, and is vented suitable
Freely；It can effectively improve diffusion uniformity, while improve single furnace output.
In order to achieve the above objectives, the technical solution adopted in the present invention is：A kind of vertical solar silicon chip diffusion furnace, including
Vertical furnace, fire door, quartz boat group, inlet duct and exhaust emission device, the fire door are arranged at the top of furnace body, are used to open
Or it is closed furnace furnace chamber, the inlet duct and exhaust emission device are respectively communicated with furnace furnace chamber；The quartz boat group is by quartz
Boat is vertically stacked successively, and is placed among furnace furnace chamber vertically, be equipped among the quartz boat vertically through guide hole,
Centered on quartz boat by the guide hole central axis boat slot for placing silicon chip is uniformly provided in radioactivity；The air inlet dress
It sets including air inlet helix tube and gas mixer, the air inlet helix tube is arranged between quartz boat group and furnace body cavity wall, into
Gas helix tube is evenly equipped with air admission hole towards quartz boat group side；Air inlet helix tube connects gas mixer；The exhaust gas discharge
Device includes exhaust pipe and exhaust gas savings device, and the exhaust pipe is vertically arranged along furnace furnace chamber central axis, and is correspondingly arranged
In the guide hole of the quartz boat；Exhaust outlet is evenly equipped on the exhaust pipe, bottom connects exhaust gas and saves device.
By the way that vertical furnace body is arranged in this programme, quartz boat group can be superimposed the stone of different number according to different needs
Ying Zhou, quartz boat is arranged centered on the guide hole among it in radioactivity, and most boats for placing silicon chip can be arranged
Slot.Guide hole is set among quartz boat in other words among the quartz boat group, the guide hole is to the exhaust pipe applied to exhaust；And in quartz
On the outside of boat group, the air inlet helix tube of spiral setting can along quartz boat group surrounding by uniformly broadcasting diffusion source and nitrogen within outer,
The diffusion source and nitrogen are discharged in time when being diffused among quartz boat group, by exhaust pipe.Here air inlet helix tube into
Stomata mutually maps corresponding with the exhaust outlet of exhaust pipe so that nitrogen is in horizontal proliferation from outside to inside, and uniformity is had
Effect ensures, while being conducive to the timely and efficiency of exhaust, and avoid exhaust gas forms siltation in furnace body.Quartz boat group in this programme
Can be a quartz boat can also be multiple quartz boats, quartz boat quantity stacks as needed, simple and convenient.
Further, the quartz boat includes central tube, support plate and quartz pushrod, and the central tube is set along center axis
There is the guide hole, and at least three support plates are set on central tube lateral surface, the both ends of the surface pair of the support plate and central tube
It answers concordant and is in same plane with central tube central axis；More quartz pushrods, the stone are equipped between the adjacent support plate
It is arranged in parallel between English stick and the lower curved for corresponding to silicon chip is alternatively arranged, the quartz pushrod is uniformly arranged multiple towards silicon chip side
Cutting, the cutting between quartz pushrod correspond and collectively form the boat slot, boat slot phase centered on central tube axial line
To being in radioactivity setting；The exhaust outlet for penetrating through the guide hole is provided on the central tube, the exhaust outlet is located at two adjacent branch
Between fagging.
Here the rack of corresponding silicon chip profile, i.e. stone are formed between same support plate formation sector between multiple quartz pushrods
It is U-shaped rack that a section can be formed between English stick, is provided with one to three quartz pushrod and is located at support plate lower part to right
Silicon chip lower part is answered, then the quartz pushrod of two side profile of corresponding silicon chip is set in the middle part of support plate, setting cutting one is a pair of on quartz pushrod
Should and form the boat slot, and silicon chip placed and radioactivity is uniformly arranged in vertical, maximally utilize quartz boat use it is empty
Between.When quartz boat is superimposed, central tube end face is corresponding in turn to fitting, and at this moment the exhaust outlet on centrally disposed cylinder corresponds to exhaust pipe
Channel ensures the diffusion source entered and nitrogen along the sector horizontal proliferation from outside to inside for placing silicon chip.
Further, the quartz boat further includes circular bottom plate, and the bottom plate corresponds to coaxial arrangement central tube bottom, and
The through-hole of setting and central tube inner diameter size among the bottom plate；The bottom plate lower face is arranged boss, between the support plate on
End face is concordant, and groove corresponding with the boss is arranged, and the groove floor is concordant with the upper surface of central tube；The support
Plate lower end connecting bottom board upper surface.It should be clear that the vertical range positioned at quartz pushrod to the raised upper surface of extreme lower position should
More than the placing height of silicon chip, bottom plate and protrusion, which is arranged, can make freely be superimposed between quartz boat.
Further, circular groove concentric with it is arranged in the upper surface of the bottom plate, and the diameter of the circular groove is big
Small corresponding boat well width；The bottom groove of the size of corresponding central tube upper end is also set up on the boss of the bottom plate lower face；Branch
Upper surface is concordant with the upper surface of central tube between fagging, and annular groove corresponding with boss is arranged in support plate.
Further, the inlet duct further includes intake valve, and the intake valve setting is located at furnace body in lower portion of furnace body
Interior one end connects air inlet helix tube, is located at the outer one end of furnace body and connects gas mixer；The air inlet helix tube outside and stove
Internal wall fitting, air inlet helix tube inside are evenly equipped with air admission hole, and air admission hole center is perpendicularly oriented to exhaust pipe central axis.Gas
Diffusion source and nitrogen can be uniformly mixed by mixing arrangement, and intake valve can will be turned on and off air inlet, air inlet helix tube air inlet
Hole is perpendicularly oriented to the gas directive property injection that exhaust pipe central axis can be such that it releases, i.e., horizontal to spread from outside to inside, ensures
Source is spread after mixing and nitrogen targetedly corresponds to silicon chip and is discharged in time after forming exhaust gas, is avoided the formation of turbulent flow and is occurred and expand
Dissipate it is uneven happen, the processing effect of such silicon chip is well ensured.
Further, the gas mixer is right angle L-type structure, and the spiral of a connection intake valve is equipped in one end
Venthole, the other end are evenly distributed with multiple spirally inlet air holes, and the spirally inlet air hole is connected to spiral venthole.Diffusion source and nitrogen exist
By forming spiral cyclone behind spirally inlet air hole, multiple spiral cyclones can form vortex when bout is in spiral venthole so that
Diffusion source and nitrogen can be quickly uniformly mixed.Its is simple in structure for gas mixer, is conducive to manufacture, is ensureing mixed effect
Reduce the volume of device simultaneously, and effectively reduces manufacturing cost.
Further, the exhaust emission device further includes air bleeding valve and exhaust fan, and the air bleeding valve is arranged at valve body bottom
Among portion, it is located at connection exhaust pipe bottom end in one end in valve body, is located at valve body outer one end and exhaust gas savings are connected by exhaust fan
Device.Here air bleeding valve can be turned on and off exhaust, and exhausting function provides efficient exhausting effect, ensured exhaust pipe in this way
Exhaust effect.
Further, the exhaust pipe exhaust outlet corresponds to central tube vent position in quartz boat group and is arranged, and along exhaust
Pipe is circumferentially uniformly arranged；The exhaust pipe top is closed structure.Here exhaust pipe setting be in order to ensure gas level spread,
It avoids top from being formed to suck, damage spreading direction and uniformity.
Further, exhaust pipe guardrail is installed on the outside of the exhaust pipe, the guardrail surrounds region and is less than described lead
Bore region.Exhaust pipe guardrail has guide function, is quick and precisely stacked for quartz boat, while playing the work(of protection exhaust pipe
Can, prevent exhaust pipe to be knocked damage.
Further, further include pressure sensor and temperature sensor, the pressure sensor and temperature sensor are arranged
On fire door, and corresponding furnace furnace chamber setting.The furnace furnace chamber is in cylindrical type, and the cross section of the quartz boat is circle.
Due to the adoption of the above technical scheme, the invention has the advantages that：
1. gas mixer of the present invention is mounted on furnace body side, after so that various gases is sufficiently mixed to scale,
Again by air inlet helix tube uniform discharge to furnace interior, this keeps the ingredient of the gas of furnace interior each section identical, can be with
Be the solar power silicon sheet resistance of every stove substantially completely.
2. air inlet helix tube of the present invention is sought connections in cylindrical furnace inner wall, air inlet is evenly distributed on the inside of air inlet helix tube
Hole, and exhaust pipe is arranged in furnace body center, exhaust outlet is also evenly distributed on exhaust pipe, and each stomata axis is directed to
Furnace body axis, while air inlet helix tube is mutually mapped with exhaust pipe, fully ensures the uniformity of diffusion.
It is vertically arranged 3. quartz boat group of the present invention is inlayed by multiple sections for circular quartz boat from beginning to end successively, then by arranging
Tracheae sequentially passes through each quartz boat, and quartz boat group is placed on furnace body middle position, and 100 or so can be processed with single quartz boat
Solar silicon wafers calculate, and stackable 7~9 quartz boats of a furnace interior substantially increase single stove of solar silicon wafers in this way
Yield, 9 reduce cost.
4. exhaust pipe guardrail distribution of the present invention is around exhaust pipe, can adequately protect exhaust pipe and air inlet helix tube,
The purpose is to when each quartz boat passes in and out furnace body, play the role of a track, prevents quartz boat from deviateing furnace body center, collide
To air inlet helix tube and exhaust pipe.There is dedicated triangle claw clip to have when in addition placing and take out quartz boat.
5. the present invention places solar silicon wafers diffusion furnace vertically, traditional horizontal mode is changed, is constructed a kind of new
Type vertical solar silicon chip diffusion furnace；The characteristics of according to vertical diffusion furnace, do not have new meaning utilizes superimposed type quartz boat group, and profit
Quartz boat is wrapped up wherein with the air inlet-outlet pipe mutually correlated.
6. furnace interior of the present invention is equipped with temperature sensor and pressure sensor, reaction process can be monitored in real time.
Description of the drawings
Fig. 1 is schematic structural view of the invention；
Fig. 2 is diffusion furnace sectional view of the present invention without quartz boat；
Fig. 3 is Fig. 2 locally big figures of hair；
Fig. 4 is gas mixer structural schematic diagram of the present invention；
Fig. 5 is air inlet helix tube schematic diagram of the present invention；
Fig. 6 is quartz boat group structural schematic diagram of the present invention；
Fig. 7 is single quartz boat structure schematic diagram of the invention.
In attached drawing, 1- air inlets helix tube, 2- exhaust pipes, 3- quartz boats, 4- quartz boats group, 5- gas mixers, 6- stoves
Door, 7- pressure sensors, 8- temperature sensors, 9- furnace bodies, 10- intake valves, 11- air bleeding valves, 12- exhaust fans, 13- hoses, 14-
Exhaust gas saves device, 15- exhaust pipes guardrail, 31- support plates, 32- quartz pushrods, 33- cuttings, 34- central tubes, 35- bottom plates, 36-
Guide hole, 37- exhaust outlets, 51- spirally inlet airs hole, 52- spiral ventholes.
Specific implementation mode
The specific implementation of invention is further illustrated below in conjunction with attached drawing.
As shown in figs. 1-7, vertical solar silicon chip diffusion furnace includes vertical furnace 9, fire door 6, quartz boat group 4, air inlet dress
It sets and exhaust emission device.Fire door 6 is hinged on 9 top of furnace body, can be flipped up and open 9 furnace chamber of furnace body, or downwardly turn over and close
Close 9 furnace chamber of furnace body；9 furnace chamber side of the correspondence furnace body of fire door 6, which sets ash, temperature sensor 8 and pressure sensor 7, corresponds at work
Monitor the temperature and pressure condition of 9 furnace chamber of furnace body.Inlet duct and exhaust emission device are respectively communicated with 9 furnace chamber of furnace body；Air inlet fills
It sets for providing uniformly mixed diffusion source and nitrogen；Exhaust emission device is used to collect the exhaust gas or tail gas generated in the process,
Avoid exhaust gas effect of reservoir siltation diffusion effect.Wherein, quartz boat group 4 is arranged among 9 furnace chamber of furnace body, quartz boat group 4 by single or
Head and the tail superposition is constituted multiple quartz boat groups 4 successively, and the boat slot for placing silicon chip is arranged on quartz boat 3.
As shown in Figs. 1-3, it is 9 structural schematic diagram of diffusion furnace overall structure and furnace body.Furnace body 9 is in cylinder type, interior furnace chamber
For cylindrical structure, fire door 6 is hinged on 9 top of furnace body；9 bottom of furnace body is provided with chassis, is placed on vertically with then furnace body 9
On horizontal plane.
Exhaust emission device includes exhaust pipe 2, air bleeding valve 11, exhaust fan 12 and exhaust gas savings device 14, and exhaust pipe 2 is along stove
9 furnace chamber central axis of body is vertically arranged, and the upper end is less than 9 upper surface of furnace body, and 2 upper surface of exhaust pipe is closing structure；Exhaust
Exhaust outlet is evenly equipped on pipe 2, exhaust outlet is perpendicularly oriented to 2 central axis of exhaust pipe, and bottom connects air bleeding valve 11.Air bleeding valve 11
It is arranged among body base, is located at connection exhaust pipe 2 bottom end in one end in valve body, is located at the outer one end of valve body and passes through exhaust fan
12 connection exhaust gas save device 14.
As shown in figure 3, being equipped with exhaust pipe guardrail 15 along 2 outside of the exhaust pipe, guardrail surrounds region and is less than described lead
36 region of hole.Exhaust pipe guardrail 15 has guide function, is quick and precisely stacked for quartz boat 3, while playing protection exhaust pipe 2
Function, prevent exhaust pipe 2 to be knocked damage.
As shown in Figs. 1-5, inlet duct includes air inlet helix tube 1, intake valve 10 and gas mixer 5, air inlet spiral
Pipe 1 is arranged between 9 cavity wall of quartz boat group 4 and furnace body, and 1 outside of air inlet helix tube is bonded with 9 inner wall of furnace body, and inside is evenly equipped with
Air admission hole, air admission hole center are perpendicularly oriented to 2 central axis of exhaust pipe.Air inlet helix tube 1 connects gas by intake valve 10 and mixes
It attaches together and sets 5, the setting of intake valve 10 is located at one end connection air inlet helix tube 1 in furnace body 9, is located at furnace body 9 in 9 lower part of furnace body
Outer one end connects gas mixer 5.Intake valve 10, which can be opened, makes air inlet helix tube 1 be connected to gas mixer 5, or closes
Conjunction makes air inlet helix tube 1 be connected to closing with gas mixer 5.
As shown in figure 4, gas mixer 5 is right angle L-type structure, the spiral of a connection intake valve 10 is equipped in one end
Venthole 52, the other end are evenly distributed with multiple spirally inlet air holes 51, and spirally inlet air hole 51 is connected to spiral venthole 52.Diffusion source and nitrogen
Gas forms spiral cyclone after by spirally inlet air hole 51, and multiple spiral cyclones can form whirlpool when bout is in spiral venthole 52
Stream so that diffusion source and nitrogen can be quickly uniformly mixed.Its is simple in structure for gas mixer 5, is conducive to manufacture, mixed ensureing
Reduce the volume of device while closing effect, and effectively reduces manufacturing cost.
As shown in figure 5, air inlet helix tube 1 is helically arranged, air inlet helix tube 1 is arranged in quartz boat group 4 and 9 cavity wall of furnace body
Between, air inlet helix tube 1 is evenly equipped with air admission hole towards 4 side of quartz boat group.
Diffusion source and nitrogen can be uniformly mixed by gas mixer 5, and intake valve 10 can will be turned on and off air inlet,
1 air admission hole of air inlet helix tube is perpendicularly oriented to gas directive property injection that 2 central axis of exhaust pipe can be such that it releases, i.e., it is horizontal by
Outer extremely interior diffusion spreads source after ensureing mixing and nitrogen targetedly corresponds to silicon chip and is discharged in time after forming exhaust gas, avoids
Formed turbulent flow occur and spread it is uneven happen, the processing effect of such silicon chip is well ensured.
As shown in Figure 6 and Figure 7, it is 3 structural schematic diagram of quartz boat group 4 and quartz boat.Quartz boat group 4 by quartz boat 3 successively
Be vertically stacked, and be placed on vertically among 9 furnace chamber of furnace body, be equipped among quartz boat 3 vertically through guide hole 36, in quartz
On boat 3 the boat slot for placing silicon chip is uniformly provided in radioactivity centered on 36 central axis of guide hole.Here, guide hole 36 is right
It answers exhaust pipe guardrail 15 to be arranged, when installation, quartz boat 3 is put into 9 furnace chamber of furnace body by guide hole 36 along exhaust pipe guardrail 15 one by one.
Specifically, quartz boat 3 includes a central tube 34, four support plates 31 and multiple quartz pushrods 32, central tube 34 is hollow structure, center
Cylinder 34 is equipped with the guide hole 36, the exhaust structure for being connected in diffusion furnace along center axis；Support plate 31 is along central tube 34
It is circumferentially uniformly arranged on 34 lateral surface of central tube and 34 centerline axis parallel of opposite central tube, support plate 31 is used to support quartz
Stick 32；Quartz pushrod 32 is by its boat slot for placing silicon chip.Four quartz pushrods 32, quartz pushrod 32 are equipped between adjacent support plate 31
Between be arranged in parallel and correspond to the lower curved of silicon chip and be alternatively arranged；Quartz pushrod 32 is uniformly arranged multiple cuttings towards silicon chip side
33, the cutting 33 between four quartz pushrods 32 corresponds and collectively forms the boat slot, during boat slot is with 34 axial line of central tube
The heart is opposite to be arranged in radioactivity.Central tube 34 is provided with the exhaust of 34 inner cavity of perforation central tube between two adjacent shore plates 31
Mouth 37.
Quartz pushrod 32 is arc structure and circumferentially disposed along central tube 34 between support plate 31.The end of quartz pushrod 32
In fixed support plate 31, the lower curved that quartz pushrod 32 corresponds to silicon chip is alternatively arranged；Specifically, quartz pushrod 32 is a quarter
Circular arc is located at symmetrical two in the middle part of the fan section most inner side and the correspondence silicon chip of outermost quartz pushrod 32 that adjacent shore plates 31 are formed
Side, the quartz pushrod 32 for being located at fan section bottom correspond to silicon chip bottom symmetrical both sides.Quartz pushrod 32 is uniformly arranged towards silicon chip side
Cutting 33, the cutting 33 between four quartz pushrods 32 correspond and collectively form the boat slot, and boat slot is with 34 axial line of central tube
Centered on it is opposite be arranged in radioactivity, can preferably improve boat slot number amount in this way, improve the utilization rate of quartz boat.
Here the rack of corresponding silicon chip profile is formed between the formation of same support plate 31 sector between multiple quartz pushrods 32,
It is U-shaped rack that a section can be formed between quartz pushrod 32, is provided with two quartz pushrods 32 and is located at 31 lower part of support plate
To corresponding silicon chip lower part, then set on the quartz pushrod 32 of 31 middle part setting two side profile of corresponding silicon chip of support plate, quartz pushrod 32
It sets cutting 33 and corresponds and form the boat slot, and silicon chip is uniformly arranged in vertical placement and radioactivity, maximize profit
With 3 use space of quartz boat.When quartz boat 3 is superimposed, 34 end face of central tube is corresponding in turn to fitting, at this moment on centrally disposed cylinder 34
Exhaust outlet 37 correspond to the channel of exhaust pipe 2, ensure the diffusion source entered and nitrogen along the sector water from outside to inside for placing silicon chip
Flat diffusion.
As the optimization to said program, it is correspondingly arranged circular bottom plate 35 in the bottom of quartz boat, bottom plate 35 corresponds to together
34 bottom of central tube is arranged in axis, and the through-hole with 34 inner diameter size of central tube is arranged among bottom plate 35；31 lower end of support plate connects
Connect 35 upper surface of bottom plate.Coaxial round boss is set in 35 lower face of bottom plate, 31 upper surfaces of support plate are concordant and high
In the upper surface of central tube 34, groove corresponding with boss, the upper surface of the groove floor and central tube 34 is arranged in support plate 31
Concordantly, to ensure to form channel between quartz boat stacks rear center's cylinder 34.Bottom plate 35 can preferably realize the heap between quartz boat
It is folded, quartz boat group is formed, while avoiding in quartz boat group, upper layer silicon chip or sundries are fallen down.
To increase the stability stacked between quartz boat, coaxial round boss is arranged in 35 lower face of bottom plate, the bottom of at
The bottom groove of the size of 34 upper end of corresponding central tube is also set up on the round boss of 35 lower face of plate；31 upper surfaces of support plate
It is concordant with the upper surface of central tube 34, in support plate 31, annular groove corresponding with boss is set；When stacking, bottom plate 35 and branch
It is mutually plugged together between fagging 31, bottom groove and the central tube 34 of bottom plate 35 mutually plug together.
Here, the outboard end of support plate 31 corresponds to the excircle configuration of bottom plate 35, and the upper surface setting of bottom plate 35 is concentric with it
Circular groove, the diameter of the circular groove corresponds to boat well width, or is slightly less than boat well width.
Here, to another concomitant regimen of above-mentioned offer, i.e. quartz pushrod 32 is substituted by quartz ring；Quartz ring is in central tube 34
It is arranged concentrically, and the card slot of corresponding quartz ring fixed placement is equipped in support plate 31.Quartz ring facilitates machine-shaping, circularity can
To obtain effective guarantee, 32 installation error of quartz pushrod and foozle are reduced in this way, reduce manufacture difficulty.
Here, 2 exhaust outlet of exhaust pipe corresponds to 34 exhaust outlet of central tube, 37 position in quartz boat group 4 and is arranged, and along exhaust pipe 2
Circumferentially it is uniformly arranged；2 top of exhaust pipe is closed structure.Here the setting of exhaust pipe 2 is to ensure that gas level is spread, avoid
Top, which is formed, sucks, damage spreading direction and uniformity.
Said program is provided founds furnace body 9 by setting, and quartz boat group 4 can be superimposed quartz boat 3 according to different needs, stone
English boat 3 is arranged centered on the guide hole 36 among it in radioactivity, and most boat slots for placing silicon chip can be arranged.?
Guide hole 36 is arranged in 3 centre of quartz boat in other words among quartz boat group 4, and the guide hole 36 is to the exhaust pipe 2 applied to exhaust；And in stone
The outside of Ying Zhou groups 4, the air inlet helix tube 1 of spiral setting can along 4 surrounding of quartz boat group by uniformly broadcast within outer diffusion source and
Nitrogen, diffusion source and nitrogen be diffused into quartz boat group 4 it is intermediate when, pass through exhaust pipe 2 in time be discharged.Here air inlet helix tube 1
Air admission hole mutually mapped with the exhaust outlet of exhaust pipe 2 it is corresponding so that nitrogen is in from outside to inside horizontal proliferation, and uniformity obtains
Effective guarantee, while being conducive to the timely and efficiency of exhaust, avoid exhaust gas forms siltation in furnace body 9.Stone in this programme
Ying Zhou groups 4 can be that a quartz boat 3 can also be multiple quartz boats 3, and 3 quantity of quartz boat stacks as needed, simply
It is convenient.
Above description is the detailed description for the present invention preferably possible embodiments, but embodiment is not limited to this hair
Bright patent claim, it is all the present invention suggested by technical spirit under completed same changes or modifications change, should all belong to
In the covered the scope of the claims of the present invention.
Claims (10)
1. a kind of vertical solar silicon chip diffusion furnace, including vertical furnace, fire door, quartz boat group, inlet duct and exhaust gas discharge
Device, the fire door are arranged at the top of furnace body, are used to open or are closed furnace furnace chamber, the inlet duct and exhaust emission device
It is respectively communicated with furnace furnace chamber；It is characterized in that：The quartz boat group is vertically stacked successively by quartz boat, and is placed on vertically
Be equipped among furnace furnace chamber, among the quartz boat vertically through guide hole, in being with the guide hole central axis on quartz boat
The heart is uniformly provided with the boat slot for placing silicon chip in radioactivity；The inlet duct includes air inlet helix tube and gas mixing dress
It sets, the air inlet helix tube is arranged between quartz boat group and furnace body cavity wall, and air inlet helix tube is uniformly distributed towards quartz boat group side
There is air admission hole；Air inlet helix tube connects gas mixer；The exhaust emission device includes that exhaust pipe and exhaust gas save device,
The exhaust pipe is vertically arranged along furnace furnace chamber central axis, and is correspondingly arranged in the guide hole of the quartz boat；The exhaust
Exhaust outlet is evenly equipped on pipe, bottom connects exhaust gas and saves device.
2. a kind of vertical solar silicon chip diffusion furnace according to claim 1, it is characterised in that：During the quartz boat includes
Heart cylinder, support plate and quartz pushrod, the central tube is equipped with the guide hole along center axis, and is arranged on central tube lateral surface
At least three support plates, the support plate is corresponding with the both ends of the surface of central tube concordant and is in same flat with central tube central axis
Face；More quartz pushrods are equipped between the adjacent support plate, the quartz pushrod is set in parallel and corresponds to the lower curved of silicon chip
It is alternatively arranged, the quartz pushrod is uniformly arranged multiple cuttings towards silicon chip side, and the cutting one-to-one correspondence between quartz pushrod is simultaneously common
The boat slot is constituted, the boat slot is opposite centered on central tube axial line to be arranged in radioactivity；It is provided on the central tube
The exhaust outlet of the guide hole is penetrated through, the exhaust outlet is between two adjacent shore plates.
3. a kind of vertical solar silicon chip diffusion furnace according to claim 2, it is characterised in that：The quartz boat further includes
Circular bottom plate, the bottom plate correspond to coaxial arrangement central tube bottom, and setting and central tube inner diameter size among the bottom plate
Through-hole；Boss is arranged in the bottom plate lower face, and upper surface is concordant between the support plate, and is arranged corresponding with the boss recessed
Slot, the groove floor are concordant with the upper surface of central tube；The support plate lower end connecting bottom board upper surface.
4. a kind of vertical solar silicon chip diffusion furnace according to claim 3, it is characterised in that：The upper surface of the bottom plate
Circular groove concentric with it is set, and the diameter of the circular groove corresponds to boat well width；The bottom plate lower face it is convex
The bottom groove of the size of corresponding central tube upper end is also set up on platform；Upper surface is concordant with the upper surface of central tube between support plate,
In support plate, annular groove corresponding with boss is set.
5. a kind of vertical solar silicon chip diffusion furnace according to claim 1, it is characterised in that：The inlet duct also wraps
Intake valve is included, the intake valve setting is located at one end in furnace body and connects air inlet helix tube, be located at outside furnace body in lower portion of furnace body
One end connects gas mixer；Be bonded with inboard wall of furnace body on the outside of the air inlet helix tube, air inlet helix tube inside be evenly equipped with into
Stomata, air admission hole center are perpendicularly oriented to exhaust pipe central axis.
6. a kind of vertical solar silicon chip diffusion furnace according to claim 1 or 4, it is characterised in that：The gas mixing
Device is right angle L-type structure, and the spiral venthole of a connection intake valve is equipped in one end, and the other end is evenly distributed with multiple spirally inlet airs
Hole, the spirally inlet air hole are connected to spiral venthole.
7. a kind of vertical solar silicon chip diffusion furnace according to claim 1, it is characterised in that：The exhaust emission device
Further include air bleeding valve and exhaust fan, the air bleeding valve is arranged among body base, is located at one end in valve body and connects exhaust pipe
Bottom end is located at the outer one end of valve body and connects exhaust gas savings device by exhaust fan.
8. a kind of vertical solar silicon chip diffusion furnace according to claim 2, it is characterised in that：The exhaust pipe exhaust outlet
Central tube vent position setting in corresponding quartz boat group, and be circumferentially uniformly arranged along exhaust pipe；The exhaust pipe top is close
Close structure.
9. a kind of vertical solar silicon chip diffusion furnace according to claim 1, it is characterised in that：On the outside of the exhaust pipe
Exhaust pipe guardrail is installed, the guardrail surrounds region and is less than the guide hole region.
10. a kind of vertical solar silicon chip diffusion furnace according to claim 1, it is characterised in that：It further include pressure sensing
Device and temperature sensor, the pressure sensor and temperature sensor are arranged on fire door, and corresponding furnace furnace chamber setting；It is described
Furnace furnace chamber is in cylindrical type, and the cross section of the quartz boat is circle.
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| CN201610992437.7A CN106435740B (en) | 2016-11-11 | 2016-11-11 | A kind of vertical solar silicon chip diffusion furnace |
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| Application Number | Priority Date | Filing Date | Title |
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| CN106960785A (en) * | 2017-05-09 | 2017-07-18 | 无锡赛晶太阳能有限公司 | It is a kind of to improve the boiler tube of diffusion uniformity |
| CN107527971A (en) * | 2017-08-14 | 2017-12-29 | 深圳市拉普拉斯能源技术有限公司 | A kind of silicon chip disperser and silicon chip inserted sheet method |
| CN107338479B (en) * | 2017-08-31 | 2018-07-06 | 长江存储科技有限责任公司 | A kind of inlet duct and method of vertical diffusion furnace |
| CN110010530A (en) * | 2019-04-25 | 2019-07-12 | 通威太阳能（成都）有限公司 | A kind of uniform diffusion-sintering furnace of diffusion |
| CN112144121B (en) * | 2020-09-23 | 2022-12-13 | 江苏悦阳光伏科技有限公司 | Diffusion furnace tube for manufacturing solar cell |
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| CN201556614U (en) * | 2009-12-16 | 2010-08-18 | 北京凯德石英塑料制品有限公司 | Vertical quartz boat |
| CN202881452U (en) * | 2012-07-25 | 2013-04-17 | 浙江贝盛光伏股份有限公司 | Gas inlet pipe structure of solar battery silicon slice diffusion furnace |
| CN203159745U (en) * | 2013-02-01 | 2013-08-28 | 中国电子科技集团公司第四十八研究所 | Diffusion furnace |
| CN203674241U (en) * | 2013-11-29 | 2014-06-25 | 奥特斯维能源（太仓）有限公司 | Device for improving diffusion sheet resistance uniformity of silicon wafer |
| CN203976978U (en) * | 2014-07-28 | 2014-12-03 | 浙江德西瑞光电科技有限公司 | A kind of novel diffusion furnace |
| CN205282456U (en) * | 2015-12-10 | 2016-06-01 | 杭州力云科技有限公司 | Solar energy silicon chip diffusion equipment |
| CN206219721U (en) * | 2016-11-11 | 2017-06-06 | 桂林电子科技大学 | A kind of vertical silicon chip diffusion furnace |
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