CN208933464U - A kind of cathode construction with infrared heating device - Google Patents
A kind of cathode construction with infrared heating device Download PDFInfo
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- CN208933464U CN208933464U CN201821746449.2U CN201821746449U CN208933464U CN 208933464 U CN208933464 U CN 208933464U CN 201821746449 U CN201821746449 U CN 201821746449U CN 208933464 U CN208933464 U CN 208933464U
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- heating device
- infrared heating
- pedestal
- cathode
- shell
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Abstract
The utility model relates to a kind of cathode constructions with infrared heating device, including target platform, the target platform includes substantially in the shell of cuboid and the target being arranged in the shell, the shell is equipped with the infrared heating device for promoting cathode temperature, the infrared heating device includes pedestal and heating member, the pedestal and the cage connection, the heating member are installed in the pedestal.The utility model is by being arranged infrared heating device in the target platform two sides of cathode, when plated film, the temperature of cathode plated film area (target surrounding) can be promoted, so as to shorten the time of cathode pre-sputtering, high-quality thin film is prepared under the premise of not wasting target, it realizes and economizes on resources, reduce experimental cost, the purpose improved efficiency.
Description
Technical field
The utility model relates to plastic film production technical fields, have infrared heating in particular to one kind
The cathode construction of device.
Background technique
It, can be energy transmission to the original on surface when charged particle or neutral collisions body surface with enough energy
Son.As long as the energy that surface atom obtains is greater than the ionization energy of itself, the constraint of neighboring atom can be got rid of and leave object table
Face, this phenomenon are known as sputtering.
Magnetron sputtering method is to be filled with suitable argon gas in high vacuum, in cathode (Style Columu Talget or flat target) and anode (plated film
Locular wall) between apply several hundred K DC voltages, magnet controlled abnormal glow discharge is generated in coating chamber, ionizes argon gas.Argon
Ion by cathode accelerate and bombarding cathode target surface, by target material surface atom sputtering come out deposit formed on the surface of the substrate it is thin
Film.By replacing the target sputtering time different with control of unlike material, the thin of unlike material and different-thickness can be obtained
Film.Magnetron sputtering method has many advantages, such as that film plating layer and the binding force of substrate are strong, film plating layer is fine and close, uniform.Therefore, magnetron sputtering
Film is one of most important technology in industrial plated film production.
The problem of plated film manufacturer general concern is how to obtain the film layer that adhesive force is strong, compactness is good and the uniformity is high.
In sputtering process, the height of the size of vacuum degree in vacuum chamber (i.e. process gas pressure), temperature, the distance of target surface to substrate,
The factors such as the selection of sputtering power (i.e. voltage, electric current) can all influence the quality of film layer.Therefore, before formal sputtering
It can take some measures, such as pre-sputtering is for a period of time, for removing adsorbed gas, various pollutants and the oxidation on target surface
Object will cause influence to the adhesive force of film layer and substrate and compactness because the nuclear energy being at this moment detached from from target surface is unstable；
If target surface is contaminated, the atom of disengaging is also not merely cathode target atom, destroys the ingredient of film layer.It is reached in each technological parameter
After to stable state can just plated film be carried out to substrate.
Under normal conditions, the temperature that entire cathodic region is improved by way of cathode pre-sputtering needs the long period, right
The effective use of target and production efficiency have a certain impact.
Summary of the invention
The purpose of this utility model is to provide a kind of cathode constructions with infrared heating device, can promote cathode plating
The temperature in film area shortens the time of cathode pre-sputtering, to economize on resources, reduce cost, improve efficiency.
A kind of cathode construction with infrared heating device, including target platform, the target platform include substantially in the outer of cuboid
Shell and the target being arranged in the shell, the shell are equipped with the infrared heating device for promoting cathode temperature, institute
Stating infrared heating device includes pedestal and heating member, and the pedestal and the cage connection, the heating member are installed in the seat
In vivo.
Further, the pedestal includes connecting pin and open end, and the connecting pin is connect with the side of the shell, institute
It states pedestal gradually to broaden from connecting pin to open end, the open end is formed with opening.
Preferably, the heating member is infrared lamp.
Further, the infrared lamp be two, be arranged in parallel in the pedestal, the both ends of infrared lamp with
The both ends of pedestal are detachably connectable.
Further, the quantity of the infrared heating device is two, is separately positioned on the longer one group of opposite side of the shell
Outside.
Compared with prior art, the utility model has the beneficial effects that by the way that infrared add is arranged in the target platform two sides of cathode
Thermal when plated film, can promote the temperature of cathode plated film area (target surrounding), so as to shorten the time of cathode pre-sputtering, not
High-quality thin film is prepared under the premise of waste target, realizes and economizes on resources, reduces experimental cost, the purpose improved efficiency.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the cathode construction with infrared heating device of the utility model.
Fig. 2 is the structural schematic diagram of infrared heating device in Fig. 1.
Specific embodiment
The utility model is more fully retouched below with reference to relevant drawings for the ease of understanding the utility model,
It states.The better embodiment of the utility model is given in attached drawing.But the utility model can come in many different forms
It realizes, however it is not limited to embodiments described herein.
As shown in Figure 1, the cathode construction with infrared heating device of the utility model mainly wraps in a preferred embodiment
Target platform 1 is included, which includes substantially in the shell 11 of cuboid and the target 12 being arranged in shell 11.It is set on shell 11
There is the infrared heating device 2 for promoting cathode temperature.
As shown in Fig. 2, infrared heating device 2 includes pedestal 21 and heating member 22.Pedestal 21 includes connecting pin 211 and opening
End 212, the connecting pin 211 are connect by welding or bolt with the side of shell 11, and pedestal 21 is from connecting pin 211 to open end
212 gradually broaden, and open end 212 is formed with opening.Heating member 22 is installed in pedestal 21, and in the present embodiment, heating member 22 is excellent
Choosing uses infrared lamp, and is equipped with two infrared lamps, the both ends of the infrared lamp and seat in each pedestal 21 in parallel
The both ends of body 21 are detachably connectable.
In order to further increase the efficiency of heating, in the present embodiment, the quantity of infrared heating device 2 is two, is set respectively
It sets in the outside of 11 longer one groups of opposite side of shell.
The utility model is by that can promote cathode plating in 1 two sides of target platform of cathode setting infrared heating device 2, plated film
The temperature in film area (12 surrounding of target) is prepared under the premise of not wasting target 12 so as to shorten the time of cathode pre-sputtering
High-quality thin film is realized and is economized on resources, and reduces experimental cost, the purpose improved efficiency.
Although the description combination embodiments above to the utility model carries out, it is familiar with the art
Personnel can carry out many replacements based on the above contents, modifications and variations, be obvious.Therefore, all such
Substitution, improvements and changes are included in the spirit and scope of appended claims.
Claims (5)
1. a kind of cathode construction with infrared heating device, including target platform, the target platform include substantially in the shell of cuboid,
And the target in the shell is set, which is characterized in that the shell is equipped with to be added for promoting the infrared of cathode temperature
Thermal, the infrared heating device include pedestal and heating member, and the pedestal and the cage connection, the heating member are fixed
In the pedestal.
2. the cathode construction according to claim 1 with infrared heating device, which is characterized in that the pedestal includes connecting
End and open end are connect, the connecting pin is connect with the side of the shell, and the pedestal gradually broadens from connecting pin to open end,
The open end is formed with opening.
3. the cathode construction according to claim 1 with infrared heating device, which is characterized in that the heating member is red
Outside line fluorescent tube.
4. the cathode construction according to claim 3 with infrared heating device, which is characterized in that the infrared lamp
It is two, is arranged in parallel in the pedestal, the both ends of infrared lamp and the both ends of pedestal is detachably connectable.
5. the cathode construction according to claim 1 with infrared heating device, which is characterized in that the infrared heating dress
The quantity set is two, is separately positioned on the outside of the longer one group of opposite side of the shell.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821746449.2U CN208933464U (en) | 2018-10-26 | 2018-10-26 | A kind of cathode construction with infrared heating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821746449.2U CN208933464U (en) | 2018-10-26 | 2018-10-26 | A kind of cathode construction with infrared heating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208933464U true CN208933464U (en) | 2019-06-04 |
Family
ID=66726133
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821746449.2U Active CN208933464U (en) | 2018-10-26 | 2018-10-26 | A kind of cathode construction with infrared heating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208933464U (en) |
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2018
- 2018-10-26 CN CN201821746449.2U patent/CN208933464U/en active Active
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