CN109943801B - Gas arc discharge device, coupling system with vacuum cavity and ion nitriding process - Google Patents
Gas arc discharge device, coupling system with vacuum cavity and ion nitriding process Download PDFInfo
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- 238000010891 electric arc Methods 0.000 title claims abstract description 118
- 238000005121 nitriding Methods 0.000 title claims abstract description 76
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- 238000010168 coupling process Methods 0.000 title claims abstract description 27
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- 229910000963 austenitic stainless steel Inorganic materials 0.000 claims abstract description 6
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- 239000000463 material Substances 0.000 claims description 15
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 11
- 229910052750 molybdenum Inorganic materials 0.000 claims description 11
- 239000011733 molybdenum Substances 0.000 claims description 11
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- 239000010935 stainless steel Substances 0.000 claims description 11
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- 229910001182 Mo alloy Inorganic materials 0.000 claims description 8
- MGRWKWACZDFZJT-UHFFFAOYSA-N molybdenum tungsten Chemical compound [Mo].[W] MGRWKWACZDFZJT-UHFFFAOYSA-N 0.000 claims description 8
- 238000000605 extraction Methods 0.000 claims description 7
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Abstract
本发明提供一种气体弧光放电装置、与真空腔体的耦合系统及离子渗氮工艺，利用热阴极电子发射原理与辅助阴极进行配合产生等离子体，通过该装置的磁场模块与腔体轴向磁场模块耦合进行等离子体渗氮。通过控制气体弧光放电装置与腔体轴向磁场的参数进行耦合，选取最佳磁场参数，增加真空腔体内等离子体能量及密度，获得最佳的渗氮效果。利用本发明的装置和方法，对316L奥氏体不锈钢进行60min等离子体渗氮处理，渗氮层的硬度可以达到1100HV0.05,渗氮深度可以达到50μm上，渗氮层中无氮化物析出，且渗氮层为单一的γN相，保证了渗氮工件的高硬度和高耐磨损性能。
The invention provides a gas arc discharge device, a coupling system with a vacuum cavity and an ion nitriding process. The hot cathode electron emission principle is used to cooperate with an auxiliary cathode to generate plasma. The magnetic field module of the device and the axial magnetic field of the cavity Module coupling for plasma nitriding. By controlling the coupling of the parameters of the gas arc discharge device and the axial magnetic field of the cavity, the optimal magnetic field parameters are selected to increase the energy and density of the plasma in the vacuum cavity to obtain the best nitriding effect. Using the device and method of the present invention, 316L austenitic stainless steel is subjected to plasma nitriding treatment for 60 minutes. The hardness of the nitriding layer can reach 1100HV 0.05 , the nitriding depth can reach more than 50 μm, and there is no nitride precipitation in the nitriding layer, and The nitriding layer is a single γ N phase, which ensures the high hardness and high wear resistance of the nitrided workpiece.
Description
技术领域Technical field
本发明属于金属材料表面处理技术领域，尤其涉及一种气体弧光放电装置、与真空腔体的耦合系统及离子渗氮工艺。The invention belongs to the technical field of metal material surface treatment, and in particular relates to a gas arc discharge device, a coupling system with a vacuum cavity and an ion nitriding process.
背景技术Background technique
传统的离子渗氮工艺的使用会产生对环境或者人身安全具有一定危害的含N元素的气体或者N2与H2的混合气体。在传统辉光离子渗氮技术中，有的使用纯氮气作为工作气体，但传统的辉光渗氮工艺普遍渗氮效率非常低，并且得到的渗氮层厚度比较薄；并且随着渗氮时间的增加会在工件表面形成一层氮化物的析出层，会影响材料本身的机械性能或者耐腐蚀性能；在传统的辉光离子渗氮中，工件作为放电阴极而存在，如果工件上存在小孔、缝隙，或者零件之间的间隙太小，会在上述部位产生空心阴极放电现象，造成工件局部烧伤。活性屏离子渗氮、空心阴极离子渗氮技术虽然解决了传统辉光渗氮作为放电阴极这一缺陷，但是仍然存在渗氮效率低，随着渗氮层深度的增加工件表面有氮化物析出层出现的问题。The use of traditional ion nitriding process will produce N-containing gas or a mixed gas of N 2 and H 2 that is harmful to the environment or personal safety. In traditional glow ion nitriding technology, some use pure nitrogen as the working gas. However, the traditional glow nitriding process generally has very low nitriding efficiency, and the thickness of the nitrided layer obtained is relatively thin; and as the nitriding time increases, The increase will form a layer of nitride precipitation on the surface of the workpiece, which will affect the mechanical properties or corrosion resistance of the material itself; in traditional glow ion nitriding, the workpiece exists as a discharge cathode. If there are small holes on the workpiece , gaps, or the gap between parts is too small, hollow cathode discharge will occur in the above parts, causing local burns on the workpiece. Although active screen ion nitriding and hollow cathode ion nitriding technologies solve the shortcoming of traditional glow nitriding as a discharge cathode, they still have low nitriding efficiency. As the depth of the nitriding layer increases, a nitride precipitate layer appears on the surface of the workpiece. problems arise.
发明专利(CN102134706A)公开了一种等离子体弧光氮化装置，该公开发明专利将等离子弧光氮化装置放置于真空室上面。在该公开发明专利中阴极筒与热丝分别由两个独立的电源供电。上述装置中的结构会导致附图中2热丝与空心阴极筒18的电位不同，在剧烈的弧光放电中因为两电极之间的电位不同导致两者之间发生放电现象，这在弧光放电中极易造成2(热丝)与18(空心阴极筒)的损伤，在实际生产过程中是应该避免的。并且将弧光放电装置放置于真空室的上面，因为靠近弧光氮化装置越近等离子体能量、等离子体密度、弧光对工件的辐射热量越高，则会导致工件转台9上的上下不同位置的被处理工件8的处理效果不同。The invention patent (CN102134706A) discloses a plasma arc nitriding device. The disclosed invention patent places the plasma arc nitriding device above a vacuum chamber. In this disclosed invention patent, the cathode cylinder and the heating wire are powered by two independent power supplies. The structure in the above device will cause the potential of the hot wire 2 and the hollow cathode cylinder 18 in the attached figure to be different. In a violent arc discharge, the potential difference between the two electrodes will cause a discharge phenomenon between the two. This will occur in the arc discharge. It is very easy to cause damage to 2 (hot wire) and 18 (hollow cathode cylinder), which should be avoided in the actual production process. And the arc discharge device is placed above the vacuum chamber, because the closer to the arc nitriding device, the higher the plasma energy, plasma density, and arc radiation heat to the workpiece, which will cause the upper and lower positions on the workpiece turntable 9 to be The processing effects of the workpiece 8 are different.
实用新型专利(CN205088299U)公开了一种弧光放电型离子源装置，在该公开实用新型专利中电弧电源6的正极与金属电极的正极相连接，负极与密封圆筒12相连接；密封圆通作为弧光放电型离子源装置的阴极，而空心圆筒13属于零电位悬浮在密封圆筒12内部；金属电极2放置于空心圆筒内部。在该实用新型专利中电弧电源的负极所连接的密封圆筒12与热丝即金属电极2之间会产生电压差，在长时间的弧光放电工作中会导致密封圆筒12或者金属电极2被击穿，导致整个真空系统暴露在大气压下，这对真空设备的损伤是非常大的；并且由于密封圆筒12在工作过程中作为阴极存在，所以会产生辉光放电现象，导致密封圆筒在长时间的使用过程中被损耗，同时金属电极2也存在上述情况。在该实用新型专利中没有辅助阳极引出系统，单纯的靠聚焦线圈的作用只是对电子有一定的作用，聚焦线圈很难将弧光离子源中的离子引出。The utility model patent (CN205088299U) discloses an arc discharge type ion source device. In the utility model patent, the positive electrode of the arc power supply 6 is connected to the positive electrode of the metal electrode, and the negative electrode is connected to the sealed cylinder 12; the sealed circular tube serves as the arc light The cathode of the discharge type ion source device, and the hollow cylinder 13 is suspended inside the sealed cylinder 12 at zero potential; the metal electrode 2 is placed inside the hollow cylinder. In this utility model patent, a voltage difference will occur between the sealing cylinder 12 connected to the negative electrode of the arc power supply and the hot wire, that is, the metal electrode 2. During long-term arc discharge operation, the sealing cylinder 12 or the metal electrode 2 will be damaged. Breakdown causes the entire vacuum system to be exposed to atmospheric pressure, which causes great damage to the vacuum equipment; and because the sealing cylinder 12 exists as a cathode during the working process, a glow discharge phenomenon will occur, causing the sealing cylinder to It is worn out during long-term use. At the same time, the metal electrode 2 also has the above situation. There is no auxiliary anode extraction system in this utility model patent. The focusing coil only has a certain effect on electrons. It is difficult for the focusing coil to extract ions from the arc ion source.
针对上述弧光放电装置及辉光及弧光离子不锈钢渗氮工艺中存在的缺陷，亟需一种高效、改善渗氮层质量的方法。In view of the defects existing in the above-mentioned arc discharge device and glow and arc ion stainless steel nitriding process, there is an urgent need for an efficient method to improve the quality of the nitriding layer.
发明内容Contents of the invention
本发明的目的在于提供一种气体弧光放电装置及通过该装置产生的弧光放电进行渗氮的方法。弧光放电对工作气体的离化率明显高于辉光放电，并且弧光放电比辉光放电剧烈。通过该方法制备的渗氮层，均匀性好，渗氮效率高，渗氮层深，克服了传统辉光渗氮因空心阴极效应引起的工件烧伤，渗氮层有氮化物析出，渗氮层薄，渗氮效率低等问题。The object of the present invention is to provide a gas arc discharge device and a method for nitriding through the arc discharge generated by the device. The ionization rate of the working gas by arc discharge is significantly higher than that of glow discharge, and arc discharge is more violent than glow discharge. The nitriding layer prepared by this method has good uniformity, high nitriding efficiency, and deep nitriding layer, which overcomes the burn of the workpiece caused by the hollow cathode effect of traditional glow nitriding. Nitrides precipitate in the nitriding layer, and the nitriding layer Thin, low nitriding efficiency and other problems.
本发明提供的一种气体弧光放电装置，通过该装置，与真空腔体上的轴向磁场及辅助阳极耦合来提高等离子体能量及密度的结构，用于弧光等离子体渗氮。具体技术方案如下所述：The invention provides a gas arc discharge device, which is coupled with the axial magnetic field and the auxiliary anode on the vacuum chamber to increase the plasma energy and density, and is used for arc plasma nitriding. The specific technical solutions are as follows:
一种气体弧光放电装置，包括金属筒模块、第一电磁线圈模块、热丝电极模块、真空壁和绝缘体；A gas arc discharge device, including a metal cylinder module, a first electromagnetic coil module, a hot wire electrode module, a vacuum wall and an insulator;
所述金属筒模块包括辅助阳极、金属筒、金属筒模块电源，金属筒模块电源阳极连接至辅助阳极，金属筒模块电源阴极连接至金属筒侧壁的底端；The metal cylinder module includes an auxiliary anode, a metal cylinder, and a metal cylinder module power supply. The metal cylinder module power supply anode is connected to the auxiliary anode, and the metal cylinder module power supply cathode is connected to the bottom end of the metal cylinder side wall;
所述第一电磁线圈模块包括第一电磁线圈和第一电磁线圈控制模块，所述第一电磁线圈控制模块包括第一电磁线圈控制集合和第一电磁线圈电源，第一电磁线圈控制集合和第一电磁线圈电源连接，第一电磁线圈控制集合控制第一电磁线圈电源的电流，第一电磁线圈电源与第一电磁线圈连接。The first electromagnetic coil module includes a first electromagnetic coil and a first electromagnetic coil control module, the first electromagnetic coil control module includes a first electromagnetic coil control set and a first electromagnetic coil power supply, the first electromagnetic coil control set and a first electromagnetic coil power supply. An electromagnetic coil power supply is connected, a first electromagnetic coil control set controls the current of the first electromagnetic coil power supply, and the first electromagnetic coil power supply is connected to the first electromagnetic coil.
所述热丝电极模块包括热丝电极、热丝电极模块电源和两个金属电极，所述两个金属电极中的一个金属电极一端连接在热丝电极模块电源的阳极上，另一个金属电极的一端连接在热丝电极模块电源的阴极上，所述热丝电极连接在所述两个金属电极的另一端；The hot wire electrode module includes a hot wire electrode, a hot wire electrode module power supply and two metal electrodes. One end of one of the two metal electrodes is connected to the anode of the hot wire electrode module power supply, and the other metal electrode is connected to the anode of the hot wire electrode module power supply. One end is connected to the cathode of the hot wire electrode module power supply, and the hot wire electrode is connected to the other end of the two metal electrodes;
热丝电极通电后，在热丝电极附近位置为弧光产生区；After the hot wire electrode is energized, the area near the hot wire electrode is the arc generation area;
所述真空壁包括真空壁侧壁和真空壁顶盖，所述绝缘体包括第一绝缘体、第二绝缘体和第三绝缘体；所述真空壁侧壁的顶端和底部分别设置第二绝缘体和第三绝缘体，真空壁顶盖和真空壁侧壁之间通过第二绝缘体绝缘；The vacuum wall includes a vacuum wall side wall and a vacuum wall top cover, and the insulator includes a first insulator, a second insulator and a third insulator; the top and bottom of the vacuum wall side wall are respectively provided with a second insulator and a third insulator. , the vacuum wall top cover and the vacuum wall sidewall are insulated by a second insulator;
所述两个金属电极通过第一绝缘体悬浮在真空壁顶盖上；真空壁顶盖中心设置进气孔；The two metal electrodes are suspended on the top cover of the vacuum wall through the first insulator; an air inlet hole is provided in the center of the top cover of the vacuum wall;
所述金属筒悬浮固定在真空壁顶盖上；The metal cylinder is suspended and fixed on the top cover of the vacuum wall;
真空壁侧壁围绕在金属筒外围；所述第一电磁线圈围绕在真空壁侧壁外围；The side wall of the vacuum wall surrounds the periphery of the metal cylinder; the first electromagnetic coil surrounds the periphery of the side wall of the vacuum wall;
真空壁侧壁和真空壁顶盖围成真空室，真空室下部为开放式，以与真空腔体对接，所述气体弧光放电装置安装在真空腔体上预留的法兰上。The side walls of the vacuum wall and the top cover of the vacuum wall form a vacuum chamber. The lower part of the vacuum chamber is open to connect with the vacuum chamber. The gas arc discharge device is installed on the flange reserved on the vacuum chamber.
利用第一绝缘体和第二绝缘体确保真空壁顶盖、金属筒处于悬浮位置。The first insulator and the second insulator are used to ensure that the vacuum wall top cover and the metal cylinder are in a suspended position.
所述热丝电极选用高熔点、耐高温、稳定性好的材料，热丝由独立的电源热丝电源供电。所述热丝电极的材料选自金属钼、金属钨和钨钼合金。优选的，所述热丝电极的材料为钨丝。The hot wire electrode is made of materials with high melting point, high temperature resistance and good stability, and the hot wire is powered by an independent power supply. The material of the hot wire electrode is selected from metal molybdenum, metal tungsten and tungsten-molybdenum alloy. Preferably, the material of the hot wire electrode is tungsten wire.
金属筒作为偏压电源的阴极，将金属筒的偏压电源的阴极与热丝电机并联，使金属筒与热丝电极处于同一电位。The metal cylinder serves as the cathode of the bias power supply, and the cathode of the bias power supply of the metal cylinder is connected in parallel with the hot wire motor, so that the metal cylinder and the hot wire electrode are at the same potential.
所述金属筒选用金属钼，但不局限于金属钼，金属筒的材料可以选择钨钼合金，钛合金等一切导电性好的，耐高温的金属材料。The metal cylinder is made of metal molybdenum, but is not limited to metal molybdenum. The material of the metal cylinder can be tungsten-molybdenum alloy, titanium alloy and any other metal material with good conductivity and high temperature resistance.
热丝电极选择钨丝，但不局限于钨丝，可以为耐高温，稳定性，导电性能好的金属材料，包括钨钼合金，纯金属钼等一切金属。The hot wire electrode chooses tungsten wire, but it is not limited to tungsten wire. It can be a metal material with high temperature resistance, stability and good conductivity, including tungsten-molybdenum alloy, pure metal molybdenum and other metals.
第一电磁线圈通过第一电磁线圈电源这一独立电源供电。第一电磁线圈中作用在弧光产生区，电磁场模块包括第一电磁线圈和第一电磁线圈电源，电磁线圈根据控制模块输入信号的不同而改变电磁场的强度和方向。The first solenoid coil is powered by an independent power source, the first solenoid coil power supply. The first electromagnetic coil acts in the arc generation area. The electromagnetic field module includes a first electromagnetic coil and a first electromagnetic coil power supply. The electromagnetic coil changes the intensity and direction of the electromagnetic field according to different input signals from the control module.
本发明提供的气体弧光放电装置设计了可以改变磁场强度的结构第一电磁线圈模块，通过改变第一电磁线圈产生的电磁场的输入信号，可以降低弧光放电的条件，改变气体弧光放电装置产生的等离子体的密度及能量，实现更好的控制等离子体能量与密度的效果。The gas arc discharge device provided by the present invention is designed with a first electromagnetic coil module that can change the magnetic field intensity. By changing the input signal of the electromagnetic field generated by the first electromagnetic coil, the conditions of arc discharge can be reduced and the plasma generated by the gas arc discharge device can be changed. The density and energy of the plasma can be better controlled to achieve better control of the plasma energy and density.
本发明还提供了所述气体弧光放电装置与真空腔体的耦合系统，所述真空腔体为封闭的抽真空容器，所述气体弧光放电装置安装于真空腔体内，所述真空腔体内还设置工件架模块、第二电磁场模块、第三电磁场模块、热电偶和抽气系统；The invention also provides a coupling system between the gas arc discharge device and the vacuum cavity. The vacuum cavity is a closed vacuum container. The gas arc discharge device is installed in the vacuum cavity. The vacuum cavity is also provided with Workpiece rack module, second electromagnetic field module, third electromagnetic field module, thermocouple and air extraction system;
所述工件架模块包括工件架和偏压电源，偏压电源的负极与工件架连接，偏压电源的正极与真空腔体的腔体壁连接，真空腔体是用于放置气体弧光放电装置的容器；The workpiece rack module includes a workpiece rack and a bias power supply. The negative electrode of the bias power supply is connected to the workpiece rack. The positive electrode of the bias power supply is connected to the cavity wall of the vacuum chamber. The vacuum chamber is used to place the gas arc discharge device. container;
所述工件架、气体弧光放电装置的辅助阳极、热电偶位于真空腔体的内部；所述电源和电磁线圈均位于真空腔体外侧。The workpiece frame, the auxiliary anode of the gas arc discharge device, and the thermocouple are located inside the vacuum chamber; the power supply and the electromagnetic coil are located outside the vacuum chamber.
所述第二电磁场模块包括第二电磁线圈和第二电磁线圈控制模块，所述第二电磁线圈控制模块包括第二电磁线圈控制集合和第二电磁线圈电源，所述第三电磁场模块包括第三电磁线圈和第三电磁线圈控制模块，所述第三电磁线圈控制模块包括第三电磁线圈控制集合和第三电磁线圈电源；所述第二电磁线圈控制集合和第三电磁线圈控制集合分别与第二电磁线圈电源和第三电磁线圈电源连接，控制电磁线圈电源的电流方向、电流大小和波形，电磁线圈电源分别与电磁线圈连接，电磁线圈根据控制模块的电流方向、大小和波形这些输入信号的不同而改变磁场的强度和方向；The second electromagnetic field module includes a second electromagnetic coil and a second electromagnetic coil control module. The second electromagnetic coil control module includes a second electromagnetic coil control set and a second electromagnetic coil power supply. The third electromagnetic field module includes a third Electromagnetic coil and a third electromagnetic coil control module, the third electromagnetic coil control module includes a third electromagnetic coil control set and a third electromagnetic coil power supply; the second electromagnetic coil control set and the third electromagnetic coil control set are respectively connected with the third electromagnetic coil control set. The second electromagnetic coil power supply is connected to the third electromagnetic coil power supply to control the current direction, current size and waveform of the electromagnetic coil power supply. The electromagnetic coil power supply is connected to the electromagnetic coil respectively. The electromagnetic coil is controlled according to the current direction, size and waveform of the input signals of the module. Differently changing the intensity and direction of the magnetic field;
所述热电偶包括位于真空腔体内部顶端和底端的两个用于测量真空室内温度的热电偶；The thermocouples include two thermocouples located at the top and bottom of the vacuum chamber for measuring the temperature in the vacuum chamber;
在真空腔体上设置法兰口，抽气系统通过法兰结构与真空腔连接。A flange port is provided on the vacuum chamber, and the air extraction system is connected to the vacuum chamber through the flange structure.
所述气体弧光放电装置至少为一个，也可以是多个，考虑到被改性工件的均匀性，可以根据需要增加。位于真空腔体的一侧，与工件架相互垂直；There is at least one gas arc discharge device, and there may be multiple gas arc discharge devices. Considering the uniformity of the workpiece to be modified, the number may be increased as needed. Located on one side of the vacuum chamber, perpendicular to the workpiece frame;
辅助阳极安装在气体弧光放电装置的对侧；The auxiliary anode is installed on the opposite side of the gas arc discharge device;
所述第二电磁线圈和第三电磁线圈位于气体弧光放电装置与辅助阳极之间；The second electromagnetic coil and the third electromagnetic coil are located between the gas arc discharge device and the auxiliary anode;
所述工件架位于第二电磁线圈和第三电磁线圈之间，整个工件架被包裹在第二电磁线圈和第三电磁线圈产生的磁场内；The workpiece holder is located between the second electromagnetic coil and the third electromagnetic coil, and the entire workpiece holder is wrapped in the magnetic field generated by the second electromagnetic coil and the third electromagnetic coil;
通过这种设置，真空腔体内第二电磁线圈、第三电磁线圈与气体弧光放电装置中的第一电磁线圈产生的磁场耦合，通过调节三组电磁线圈的参数来控制整个真空腔体内的等离子体密度及能量。Through this arrangement, the second electromagnetic coil and the third electromagnetic coil in the vacuum chamber are coupled with the magnetic field generated by the first electromagnetic coil in the gas arc discharge device, and the plasma in the entire vacuum chamber is controlled by adjusting the parameters of the three sets of electromagnetic coils. Density and energy.
本发明基于上述气体弧光放电装置与真空腔体结构，公开一种利用气体弧光放电等离子体渗氮的工艺方法，是一种利用气体弧光放电产生等离子体的装置与真空腔体轴向磁场耦合产生对材料或者机械零部件不锈钢进行渗氮的工艺方法。该方法主要通过向上述气体弧光放电装置及真空腔体的所有电源模块输送控制信号来控制等离子体的能量及密度。根据需要工作气体的类型及所要改性材料的属性，对各电源模块输送一定的信号，以达到最佳的表面改性效果。所述控制信号包括控制电源的电流方向、大小和波形。Based on the above-mentioned gas arc discharge device and vacuum cavity structure, the present invention discloses a process method for utilizing gas arc discharge plasma nitriding. It is a device that utilizes gas arc discharge to generate plasma and is coupled with the axial magnetic field of the vacuum cavity to generate plasma. A process for nitriding stainless steel materials or mechanical parts. This method mainly controls the energy and density of the plasma by transmitting control signals to all power modules of the gas arc discharge device and the vacuum chamber. According to the type of working gas required and the properties of the material to be modified, a certain signal is sent to each power module to achieve the best surface modification effect. The control signal includes controlling the current direction, magnitude and waveform of the power supply.
本发明的气体弧光放电装置及真空腔体上的磁场结构与辅助阳极结构，放电过程中不会出现各电极之间发生击穿现象，并且金属筒作为辅助阴极与热丝电极(热阴极)并联，可以不断地输送电子，保证热电子发射稳定，从而能够保证弧光放电的稳定。气体弧光放电装置的各电极之间不会发生放电击穿现象，渗氮的效率会显著提升。The magnetic field structure and auxiliary anode structure on the gas arc discharge device and the vacuum cavity of the present invention will not cause breakdown between the electrodes during the discharge process, and the metal cylinder serves as the auxiliary cathode and is connected in parallel with the hot wire electrode (hot cathode) , can continuously transport electrons to ensure stable thermal electron emission, thereby ensuring the stability of arc discharge. There will be no discharge breakdown between the electrodes of the gas arc discharge device, and the efficiency of nitriding will be significantly improved.
所述真空腔体内采用铠装加热器加热。The vacuum chamber is heated by an armored heater.
本申请提供的气体弧光放电装置中，在辅助阳极、所有电磁场的耦合作用下，弧光由金属筒进入到真空腔体中，从而发生作用。In the gas arc discharge device provided by this application, under the coupling action of the auxiliary anode and all electromagnetic fields, the arc light enters the vacuum cavity from the metal cylinder and acts.
本发明还提供了一种离子渗氮工艺，具体步骤如下所述：The invention also provides an ion nitriding process, the specific steps are as follows:
步骤一、工件经除油、研磨、镜面抛光、超声清洗等处理后，将其放置于真空腔体内带负偏压的工件架上，并且在工件架的不同高度处每间隔10mm放置一个工件，工件距离等离子体出口距离约270mm；Step 1. After the workpiece has been degreased, ground, mirror polished, ultrasonic cleaned, etc., place it on a workpiece holder with a negative bias in the vacuum chamber, and place a workpiece at 10mm intervals at different heights of the workpiece holder. The distance between the workpiece and the plasma exit is about 270mm;
步骤二、对工件进行渗氮处理之前，首先将真空腔体的本底真空抽至0.5×10-4Pa，预先将真空腔体内温度加热至380℃，然后通入氩气，腔体内压力控制在0.8Pa，对工件施加-600V、占空60％、频率为42KHz的脉冲负偏压，对工件进行等离子清洗；Step 2: Before nitriding the workpiece, first pump the background vacuum of the vacuum chamber to 0.5×10 -4 Pa, preheat the temperature inside the vacuum chamber to 380°C, then introduce argon gas, and control the pressure in the chamber. At 0.8Pa, apply a pulse negative bias voltage of -600V, 60% duty, and 42KHz frequency to the workpiece, and perform plasma cleaning on the workpiece;
步骤三、开启气体弧光放电装置后，通过轰击将腔体内温度加热到400℃；向真空腔体内通入工作气体氮气，使真空腔室内气压稳定在0.8Pa，待气压稳定后调整腔体上两组磁场的耦合后的磁场强度，在不同的磁场强度下对奥氏体不锈钢进行渗氮处理60min，磁场强度范围为0～120Gs。Step 3: After turning on the gas arc discharge device, heat the temperature in the cavity to 400°C through bombardment; introduce the working gas nitrogen into the vacuum chamber to stabilize the air pressure in the vacuum chamber at 0.8Pa. After the air pressure stabilizes, adjust the two pressures on the cavity. The magnetic field intensity after coupling of the set of magnetic fields, the austenitic stainless steel was nitrided for 60 minutes under different magnetic field intensities, and the magnetic field intensity range was 0~120Gs.
与现有技术相比，本发明的有益效果是：Compared with the prior art, the beneficial effects of the present invention are:
1.本发明提供了中气体弧光放电装置以及联合耦合磁场的离子渗氮工艺，装置中的第一电磁线圈模块、第二电磁线圈模块和第三电磁线圈模块分别设置独立电源供电；通过精确调整输入信号，对三套电磁线圈产生的磁场的强度进行调控，从而精确控制等离子体的能量和密度；1. The present invention provides a medium gas arc discharge device and an ion nitriding process combined with a coupled magnetic field. The first electromagnetic coil module, the second electromagnetic coil module and the third electromagnetic coil module in the device are respectively provided with independent power supplies; through precise adjustment Input signals to regulate the intensity of the magnetic field generated by three sets of electromagnetic coils, thereby accurately controlling the energy and density of the plasma;
2.与辉光放电渗氮工艺相比，弧光放电更剧烈，本发明提供的弧光放电原理的离子渗氮工艺制备的渗氮层均匀性好，渗氮效率高，渗氮层深，克服了传统辉光渗氮因空心阴极效应引起的工件烧伤，渗氮层有氮化物析出，渗氮层薄，渗氮效率低等问题；2. Compared with the glow discharge nitriding process, arc discharge is more severe. The nitriding layer prepared by the ion nitriding process based on the arc discharge principle provided by the present invention has good uniformity, high nitriding efficiency, and deep nitriding layer, which overcomes the problem of Traditional glow nitriding causes burns on the workpiece due to the hollow cathode effect, nitride precipitation in the nitriding layer, thin nitriding layer, and low nitriding efficiency;
3.本发明提供的气体弧光放电装置中金属筒与热丝电极(热阴极)处于同一电位，金属筒的作用是为了提供电子，使更多的电子逸出轰击工作气体产生更多的等离子体，提高了弧光放电装置对气体的离化率及维持弧光放电；3. In the gas arc discharge device provided by the present invention, the metal cylinder and the hot wire electrode (hot cathode) are at the same potential. The function of the metal cylinder is to provide electrons so that more electrons can escape and bombard the working gas to generate more plasma. , which improves the gas ionization rate of the arc discharge device and maintains arc discharge;
4.真空壁处于零电位悬浮状态，金属筒处于悬浮位置，作用是避免产生的等离子体轰击真空壁；金属筒作为辅助阴极与热丝电极(热阴极)并联，必须保持绝缘状态。4. The vacuum wall is in a zero-potential suspended state, and the metal cylinder is in a suspended position to prevent the generated plasma from bombarding the vacuum wall; the metal cylinder serves as an auxiliary cathode and is connected in parallel with the hot wire electrode (hot cathode) and must be maintained in an insulated state.
5.本发明提供的热丝电极可以承受高温，并且整个热阴极与弧光等离子体源的其它带电模块处于同一电位，两电极之间不会发生放电；金属筒电极模块在加上电压后，金属筒壁上不会产生辉光等离子体；真空壁模块在工作状态时处于悬浮电位。5. The hot wire electrode provided by the present invention can withstand high temperatures, and the entire hot cathode is at the same potential as other charged modules of the arc plasma source, and no discharge will occur between the two electrodes; after voltage is applied to the metal cylinder electrode module, the metal No glow plasma will be generated on the cylinder wall; the vacuum wall module is at a floating potential when in working condition.
6通过电磁线圈模块可以将装置内的等离子体引出；并且通过改变电磁线圈电源的输入信号，实现轴向电磁线圈的串联、并联或者串并联配合使用，实现改变弧光等离子体源产生的等离子体的能量及密度分布；6. The plasma in the device can be drawn out through the electromagnetic coil module; and by changing the input signal of the electromagnetic coil power supply, the axial electromagnetic coils can be connected in series, parallel or in series and parallel to realize changing the plasma generated by the arc plasma source. energy and density distribution;
利用多组电磁线圈模块及电磁线圈电源模块，该装置可以通过调节电磁线圈电源模块的信号参数，对腔体内等离子体的能量及密度进行控制，Utilizing multiple sets of electromagnetic coil modules and electromagnetic coil power modules, the device can control the energy and density of plasma in the cavity by adjusting the signal parameters of the electromagnetic coil power module.
设计的轴向磁场是有多阶梯、多组电磁线圈组合而成，根据不同的工艺需求开启不同的电磁线圈，并使多组电磁线圈进行耦合工作。The designed axial magnetic field is composed of multiple steps and multiple groups of electromagnetic coils. Different electromagnetic coils are turned on according to different process requirements, and multiple groups of electromagnetic coils are coupled to work.
附图说明Description of the drawings
构成本发明的一部分的说明书附图用来提供对本发明的进一步理解，本发明的示意性实施例及其说明用于解释本发明，并不构成对本发明的不当限定。The description and drawings that constitute a part of the present invention are used to provide a further understanding of the present invention. The illustrative embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention.
图1为本发明的气体弧光放电装置的结构示意图；Figure 1 is a schematic structural diagram of the gas arc discharge device of the present invention;
图2为本发明的真空室内部结构示意图。Figure 2 is a schematic diagram of the internal structure of the vacuum chamber of the present invention.
图3为经本发明气体弧光放电装置在纯氮气氛围下的放电状态；Figure 3 shows the discharge state of the gas arc discharge device of the present invention in a pure nitrogen atmosphere;
图4为气体弧光放电装置与真空腔体上的电磁场耦合作用下在纯氮气氛围下的放电状态；Figure 4 shows the discharge state in a pure nitrogen atmosphere under the coupling effect of the gas arc discharge device and the electromagnetic field on the vacuum cavity;
图5为气体弧光放电装置与真空腔体上的电磁场耦合后在磁场强度为0、40、80、120、160Gs磁场强度下等离子体光发射谱图。Figure 5 shows the plasma light emission spectrum under magnetic field strengths of 0, 40, 80, 120 and 160Gs after the gas arc discharge device is coupled with the electromagnetic field on the vacuum cavity.
图6为气体弧光放电装置与真空腔体上的电磁场耦合前后等离子体光谱中各种离子谱线相对强度的变化。Figure 6 shows the changes in the relative intensity of various ion spectral lines in the plasma spectrum before and after the electromagnetic field coupling between the gas arc discharge device and the vacuum cavity.
图7(a)与(b)分别为气体弧光放电装置与真空腔体上的电磁场耦合前后，渗氮不锈钢表面形貌的变化。Figures 7(a) and (b) show the changes in surface morphology of nitrided stainless steel before and after coupling the gas arc discharge device with the electromagnetic field on the vacuum chamber respectively.
图8为不锈钢基体及气体弧光放电装置与真空腔体上的电磁场耦合前后不锈钢表面的XRD谱图。Figure 8 shows the XRD spectra of the stainless steel surface before and after coupling the electromagnetic field between the stainless steel substrate and the gas arc discharge device and the vacuum chamber.
图9为气体弧光放电装置与真空腔体上的电磁场耦合前后，不同磁场强度下渗氮层深度的变化。Figure 9 shows the changes in the depth of the nitriding layer under different magnetic field strengths before and after coupling the gas arc discharge device with the electromagnetic field on the vacuum cavity.
其中(a)为0Gs，(b)为40Gs，(c)为80Gs，(d)为120Gs，(e)为160Gs，(f)为渗氮层深度变化曲线图。Among them (a) is 0Gs, (b) is 40Gs, (c) is 80Gs, (d) is 120Gs, (e) is 160Gs, and (f) is the nitriding layer depth change curve.
图10为气体弧光放电装置与真空腔体上的电磁场耦合前后，0～160Gs时渗氮层的显微硬度。Figure 10 shows the microhardness of the nitrided layer at 0-160Gs before and after coupling the gas arc discharge device with the electromagnetic field on the vacuum cavity.
图11为气体弧光放电装置与真空腔体上的电磁场耦合前后，0～160Gs时不锈钢表面的耐磨损性能。Figure 11 shows the wear resistance of the stainless steel surface at 0~160Gs before and after coupling the electromagnetic field between the gas arc discharge device and the vacuum cavity.
其中1、金属筒模块，2、第一电磁线圈，3、气体弧光放电装置的辅助阳极，4、真空壁，5、弧光产生区，6、金属电极，7、热阴极，8、金属筒模块电源，9、进气孔，10、第一绝缘体，11、热阴极模块电源，12、热阴极模块，13、真空壁，14、第二绝缘体，15、金属筒，16、第一电磁线圈模块，17、第一电磁线圈电源，18、第三绝缘体，19、工件架模块，20、偏压电源，21、气体弧光放电装置，22、真空腔体，23、热电偶，24、第二电磁线圈电源，25、第二电磁场模块，26、第二电磁线圈，27、金属筒模块电源阳极，28、磁感线，29、真空腔体辅助阳极，30、抽气系统，31、工件架，32、第三电磁线圈，33、第三电磁线圈模块，34、第三电磁线圈电源。Among them, 1. Metal cylinder module, 2. First electromagnetic coil, 3. Auxiliary anode of gas arc discharge device, 4. Vacuum wall, 5. Arc generation area, 6. Metal electrode, 7. Hot cathode, 8. Metal cylinder module Power supply, 9. Air inlet, 10. First insulator, 11. Hot cathode module power supply, 12. Hot cathode module, 13. Vacuum wall, 14. Second insulator, 15. Metal cylinder, 16. First electromagnetic coil module , 17. First electromagnetic coil power supply, 18. Third insulator, 19. Workpiece holder module, 20. Bias power supply, 21. Gas arc discharge device, 22. Vacuum cavity, 23. Thermocouple, 24. Second electromagnetic Coil power supply, 25. Second electromagnetic field module, 26. Second electromagnetic coil, 27. Metal cylinder module power anode, 28. Magnetic induction line, 29. Vacuum cavity auxiliary anode, 30. Exhaust system, 31. Workpiece rack, 32. The third electromagnetic coil, 33. The third electromagnetic coil module, 34. The third electromagnetic coil power supply.
具体实施方式Detailed ways
应该指出，以下详细说明都是示例性的，旨在对本发明提供进一步的说明。除非另有指明，本文使用的所有技术和科学术语具有与本发明所属技术领域的普通技术人员通常理解的相同含义。It should be noted that the following detailed description is exemplary and is intended to provide further explanation of the present invention. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs.
需要注意的是，这里所使用的术语仅是为了描述具体实施方式，而非意图限制根据本发明的示例性实施方式。如在这里所使用的，除非上下文另外明确指出，否则单数形式也意图包括复数形式，此外，还应当理解的是，当在本说明书中使用术语“包含”和/或“包括”时，其指明存在特征、步骤、操作、器件、组件和/或它们的组合。It should be noted that the terms used herein are for the purpose of describing specific embodiments only, and are not intended to limit the exemplary embodiments according to the present invention. As used herein, the singular forms are also intended to include the plural forms unless the context clearly indicates otherwise. Furthermore, it will be understood that when the terms "comprises" and/or "includes" are used in this specification, they indicate There are features, steps, operations, means, components and/or combinations thereof.
实施例1：一种气体弧光放电装置Embodiment 1: A gas arc discharge device
一种气体弧光放电装置，如图1所示，包括金属筒模块1、第一电磁线圈模块16、热丝电极模块12、真空壁和绝缘体；A gas arc discharge device, as shown in Figure 1, includes a metal cylinder module 1, a first electromagnetic coil module 16, a hot wire electrode module 12, a vacuum wall and an insulator;
所述金属筒模块1包括辅助阳极3、金属筒15、金属筒模块电源8，金属筒模块电源8阳极连接至辅助阳极3，金属筒模块电源8阴极连接至金属筒15侧壁的底端；The metal cylinder module 1 includes an auxiliary anode 3, a metal cylinder 15, and a metal cylinder module power supply 8. The anode of the metal cylinder module power supply 8 is connected to the auxiliary anode 3, and the cathode of the metal cylinder module power supply 8 is connected to the bottom end of the side wall of the metal cylinder 15;
所述第一电磁线圈模块16包括第一电磁线圈2和第一电磁线圈控制模块，所述第一电磁线圈控制模块包括第一电磁线圈控制集合和第一电磁线圈电源17，第一电磁线圈控制集合和第一电磁线圈电源17连接，第一电磁线圈控制集合控制第一电磁线圈电源17的电流，第一电磁线圈电源17与第一电磁线圈2连接。The first electromagnetic coil module 16 includes a first electromagnetic coil 2 and a first electromagnetic coil control module. The first electromagnetic coil control module includes a first electromagnetic coil control set and a first electromagnetic coil power supply 17. The first electromagnetic coil control module The set is connected to the first electromagnetic coil power supply 17 , the first electromagnetic coil control set controls the current of the first electromagnetic coil power supply 17 , and the first electromagnetic coil power supply 17 is connected to the first electromagnetic coil 2 .
在本实施例中，所述第一电磁线圈控制模块采用第一电磁线圈电源17和第一电磁线圈控制集合一体式结构，采用ITECH Auto Range DC电源，型号为IT6932A。In this embodiment, the first electromagnetic coil control module adopts an integrated structure of the first electromagnetic coil power supply 17 and the first electromagnetic coil control set, and adopts an ITECH Auto Range DC power supply with model number IT6932A.
所述热丝电极模块12包括热丝电极7、热丝电极模块电源11和两个金属电极6，所述两个金属电极6中的一个金属电极一端连接在热丝电极模块电源11的阳极上，另一个金属电极的一端连接在热丝电极模块电源11的阴极上，所述热丝电极7连接在所述两个金属电极6的另一端；The hot wire electrode module 12 includes a hot wire electrode 7, a hot wire electrode module power supply 11 and two metal electrodes 6. One end of one of the two metal electrodes 6 is connected to the anode of the hot wire electrode module power supply 11. , one end of another metal electrode is connected to the cathode of the hot wire electrode module power supply 11, and the hot wire electrode 7 is connected to the other ends of the two metal electrodes 6;
热丝电极7通电后，在热丝电极附近位置为弧光产生区5；After the hot wire electrode 7 is energized, the arc generating area 5 is located near the hot wire electrode;
所述真空壁包括真空壁侧壁4和真空壁顶盖13，所述绝缘体包括第一绝缘体10、第二绝缘体14和第三绝缘体18；所述真空壁侧壁4的顶端和底部分别设置第二绝缘体14和第三绝缘体18，真空壁顶盖13和真空壁侧壁4之间通过第二绝缘体14绝缘；The vacuum wall includes a vacuum wall side wall 4 and a vacuum wall top cover 13, and the insulators include a first insulator 10, a second insulator 14 and a third insulator 18; the top and bottom of the vacuum wall side wall 4 are respectively provided with a third insulator. The second insulator 14 and the third insulator 18, the vacuum wall top cover 13 and the vacuum wall sidewall 4 are insulated by the second insulator 14;
所述两个金属电极6通过第一绝缘体10悬浮在真空壁顶盖13上；真空壁顶盖13中心设置进气孔9；The two metal electrodes 6 are suspended on the vacuum wall top cover 13 through the first insulator 10; an air inlet 9 is provided in the center of the vacuum wall top cover 13;
所述金属筒15悬浮固定在真空壁顶盖13上；The metal cylinder 15 is suspended and fixed on the vacuum wall top cover 13;
真空壁侧壁4围绕在金属筒15外围；所述第一电磁线圈2围绕在真空壁侧壁4外围；The vacuum wall sidewall 4 surrounds the periphery of the metal cylinder 15; the first electromagnetic coil 2 surrounds the vacuum wall sidewall 4;
真空壁侧壁4和真空壁顶盖13围成真空室，真空室下部为开放式，以与真空腔体对接，所述气体弧光放电装置安装在真空腔体上预留的法兰上。The vacuum wall side walls 4 and the vacuum wall top cover 13 form a vacuum chamber. The lower part of the vacuum chamber is open to connect with the vacuum chamber. The gas arc discharge device is installed on the flange reserved on the vacuum chamber.
所述热丝电极7选用高熔点、耐高温、稳定性好的材料，热丝由独立的电源热丝电源11供电。所述热丝电极的材料选自金属钼、金属钨和钨钼合金。优选的，所述热丝电极的材料为钨丝。The hot wire electrode 7 is made of materials with high melting point, high temperature resistance and good stability, and the hot wire is powered by an independent power supply hot wire power supply 11 . The material of the hot wire electrode is selected from metal molybdenum, metal tungsten and tungsten-molybdenum alloy. Preferably, the material of the hot wire electrode is tungsten wire.
金属筒15作为偏压电源8的阴极，将金属筒15的偏压电源的阴极与热丝电机7并联，使金属筒15与热丝电极7处于同一电位。The metal cylinder 15 serves as the cathode of the bias power supply 8. The cathode of the bias power supply of the metal cylinder 15 is connected in parallel with the hot wire motor 7, so that the metal cylinder 15 and the hot wire electrode 7 are at the same potential.
所述金属筒选用金属钼，但不局限于金属钼，金属筒的材料可以选择钨钼合金，钛合金等一切导电性好的，耐高温的金属材料。The metal cylinder is made of metal molybdenum, but is not limited to metal molybdenum. The material of the metal cylinder can be tungsten-molybdenum alloy, titanium alloy and any other metal material with good conductivity and high temperature resistance.
热丝电极选择钨丝，但不局限于钨丝，可以为耐高温，稳定性，导电性能好的金属材料，包括钨钼合金，纯金属钼等一切金属。The hot wire electrode chooses tungsten wire, but it is not limited to tungsten wire. It can be a metal material with high temperature resistance, stability and good conductivity, including tungsten-molybdenum alloy, pure metal molybdenum and other metals.
本发明实施的过程中，利用第一绝缘体10和第二绝缘体14确保真空壁顶盖13、金属筒15处于悬浮位置。During the implementation of the present invention, the first insulator 10 and the second insulator 14 are used to ensure that the vacuum wall top cover 13 and the metal cylinder 15 are in a suspended position.
第一电磁线圈2通过第一电磁线圈电源17这一独立电源供电。第一电磁线圈中2作用在弧光产生区5，电磁场模块16包括第一电磁线圈2和第一电磁线圈电源17，电磁线圈根据控制模块输入信号的不同而改变电磁场的强度和方向。The first solenoid coil 2 is powered by an independent power source, the first solenoid coil power supply 17 . The first electromagnetic coil 2 acts in the arc generating area 5. The electromagnetic field module 16 includes the first electromagnetic coil 2 and the first electromagnetic coil power supply 17. The electromagnetic coil changes the intensity and direction of the electromagnetic field according to different input signals from the control module.
本发明提供的气体弧光放电装置设计了可以改变磁场强度的结构第一电磁线圈模块16，通过改变第一电磁线圈2产生的电磁场的输入信号，可以降低弧光放电的条件，改变气体弧光放电装置产生的等离子体的密度及能量，实现更好的控制等离子体能量与密度的效果。The gas arc discharge device provided by the present invention is designed with a structure of the first electromagnetic coil module 16 that can change the intensity of the magnetic field. By changing the input signal of the electromagnetic field generated by the first electromagnetic coil 2, the conditions of arc discharge can be reduced and the generation of the gas arc discharge device can be changed. The density and energy of the plasma can be better controlled to achieve better control of the plasma energy and density.
实施例2：所述气体弧光放电装置与真空腔体的耦合系统：Embodiment 2: Coupling system of the gas arc discharge device and the vacuum cavity:
本发明还提供了所述气体弧光放电装置与真空腔体的耦合系统，如图2所示，左侧为气体弧光放电装置21在真空腔体22中的设置示意，右侧为真空腔体22内结构的详细剖视图，所述真空腔体22为封闭的抽真空容器，所述气体弧光放电装置21安装于真空腔体22内，所述真空腔体22内还设置工件架模块、第二电磁场模块25、第三电磁场模块33、热电偶23、抽气系统30；The present invention also provides a coupling system between the gas arc discharge device and the vacuum cavity. As shown in Figure 2, the left side shows the arrangement of the gas arc discharge device 21 in the vacuum cavity 22, and the right side shows the vacuum cavity 22. Detailed cross-sectional view of the internal structure. The vacuum chamber 22 is a closed vacuum container. The gas arc discharge device 21 is installed in the vacuum chamber 22. A workpiece rack module and a second electromagnetic field are also provided in the vacuum chamber 22. Module 25, third electromagnetic field module 33, thermocouple 23, air extraction system 30;
在图2中，所述气体弧光放电装置的辅助阳极3和金属筒模块电源阳极27以辅助阳极模块29标记；In Figure 2, the auxiliary anode 3 of the gas arc discharge device and the metal cylinder module power anode 27 are marked with the auxiliary anode module 29;
所述工件架模块包括工件架31和偏压电源20，偏压电源20的负极与工件架31连接，偏压电源20的正极与真空腔体22的腔体壁连接，真空腔体22是用于放置气体弧光放电装置的容器；The workpiece rack module includes a workpiece rack 31 and a bias power supply 20. The negative electrode of the bias power supply 20 is connected to the workpiece rack 31, and the positive electrode of the bias power supply 20 is connected to the cavity wall of the vacuum chamber 22. The vacuum chamber 22 is Containers containing gas arc discharge devices;
在本实施例中，所述金属筒模块电源8和偏压电源20采用ADL系列直流电源。In this embodiment, the metal cylinder module power supply 8 and the bias power supply 20 adopt ADL series DC power supplies.
所述工件架31、气体弧光放电装置的辅助阳极3、热电偶23位于真空腔体的内部；所述电源和电磁线圈均位于真空腔体22外侧；The workpiece frame 31, the auxiliary anode 3 of the gas arc discharge device, and the thermocouple 23 are located inside the vacuum chamber; the power supply and the electromagnetic coil are located outside the vacuum chamber 22;
所述第二电磁场模块25包括第二电磁线圈26和第二电磁线圈控制模块，所述第二电磁线圈控制模块包括第二电磁线圈控制集合和第二电磁线圈电源24，所述第三电磁场模块33包括第三电磁线圈32和第三电磁线圈控制模块，所述第三电磁线圈控制模块包括第三电磁线圈控制集合和第三电磁线圈电源34；所述第二电磁线圈控制集合和第三电磁线圈控制集合分别与第二电磁线圈电源24和第三电磁线圈电源34连接，控制电磁线圈电源的电流方向、电流大小和波形，电磁线圈电源分别与电磁线圈连接，电磁线圈根据控制模块的电流方向、大小和波形这些输入信号的不同而改变磁场的强度和方向；The second electromagnetic field module 25 includes a second electromagnetic coil 26 and a second electromagnetic coil control module. The second electromagnetic coil control module includes a second electromagnetic coil control set and a second electromagnetic coil power supply 24. The third electromagnetic field module 33 includes a third electromagnetic coil 32 and a third electromagnetic coil control module. The third electromagnetic coil control module includes a third electromagnetic coil control set and a third electromagnetic coil power supply 34; the second electromagnetic coil control set and the third electromagnetic coil power supply 34. The coil control set is respectively connected to the second electromagnetic coil power supply 24 and the third electromagnetic coil power supply 34 to control the current direction, current size and waveform of the electromagnetic coil power supply. The electromagnetic coil power supply is respectively connected to the electromagnetic coil. The electromagnetic coil is controlled according to the current direction of the control module. , size and waveform of these input signals change the intensity and direction of the magnetic field;
在本实施例中，所述第二电磁线圈控制模块和第三电磁线圈控制模块均采用电磁线圈电源和电磁线圈控制集合一体式结构，采用ITECH Auto Range DC电源，型号为IT6932A。In this embodiment, the second electromagnetic coil control module and the third electromagnetic coil control module both adopt an integrated structure of electromagnetic coil power supply and electromagnetic coil control, and adopt ITECH Auto Range DC power supply, model number is IT6932A.
所述热电偶23包括位于真空腔体内部顶端和底端的两个用于测量真空室内温度的热电偶；The thermocouple 23 includes two thermocouples located at the top and bottom ends of the vacuum chamber for measuring the temperature in the vacuum chamber;
在真空腔体上设置法兰口，抽气系统30通过法兰结构与真空腔连接。A flange port is provided on the vacuum chamber, and the air extraction system 30 is connected to the vacuum chamber through the flange structure.
所述气体弧光放电装置21至少为一个，也可以是多个，图中表示的是四个，考虑到被改性工件的均匀性，可以根据需要增加。位于真空腔体的一侧，与工件架31相互垂直；There is at least one gas arc discharge device 21 , and there can also be multiple gas arc discharge devices. Four are shown in the figure. Considering the uniformity of the workpiece to be modified, more can be added as needed. Located on one side of the vacuum chamber, perpendicular to the workpiece frame 31;
辅助阳极3安装在气体弧光放电装置21的对侧；The auxiliary anode 3 is installed on the opposite side of the gas arc discharge device 21;
所述第二电磁线圈26和第三电磁线圈32位于气体弧光放电装置21与辅助阳极3之间；The second electromagnetic coil 26 and the third electromagnetic coil 32 are located between the gas arc discharge device 21 and the auxiliary anode 3;
所述工件架31位于第二电磁线圈26和第三电磁线圈32之间，整个工件架31被包裹在第二电磁线圈26和第三电磁线圈32产生的磁场内；The workpiece frame 31 is located between the second electromagnetic coil 26 and the third electromagnetic coil 32, and the entire workpiece frame 31 is wrapped in the magnetic field generated by the second electromagnetic coil 26 and the third electromagnetic coil 32;
通过这种设置，真空腔体内第二电磁线圈、第三电磁线圈与气体弧光放电装置中的第一电磁线圈产生的磁场耦合，通过调节三组电磁线圈的参数来控制整个真空腔体内的等离子体密度及能量。Through this arrangement, the second electromagnetic coil and the third electromagnetic coil in the vacuum chamber are coupled with the magnetic field generated by the first electromagnetic coil in the gas arc discharge device, and the plasma in the entire vacuum chamber is controlled by adjusting the parameters of the three sets of electromagnetic coils. Density and energy.
本发明基于上述气体弧光放电装置与真空腔体结构，公开一种利用气体弧光放电等离子体渗氮的工艺方法，是一种利用气体弧光放电产生等离子体的装置与真空腔体轴向磁场耦合产生对材料或者机械零部件不锈钢进行渗氮的工艺方法。该方法主要通过向上述气体弧光放电装置及真空腔体的所有电源模块输送控制信号来控制等离子体的能量及密度。根据需要工作气体的类型及所要改性材料的属性，对各电源模块输送一定的信号，以达到最佳的表面改性效果。所述控制信号包括控制电源的电流方向、大小和波形。Based on the above-mentioned gas arc discharge device and vacuum cavity structure, the present invention discloses a process method for utilizing gas arc discharge plasma nitriding. It is a device that utilizes gas arc discharge to generate plasma and is coupled with the axial magnetic field of the vacuum cavity to generate plasma. A process for nitriding stainless steel materials or mechanical parts. This method mainly controls the energy and density of the plasma by transmitting control signals to all power modules of the gas arc discharge device and the vacuum chamber. According to the type of working gas required and the properties of the material to be modified, a certain signal is sent to each power module to achieve the best surface modification effect. The control signal includes controlling the current direction, magnitude and waveform of the power supply.
本发明的气体弧光放电装置及真空腔体上的磁场结构与辅助阳极结构，放电过程中不会出现各电极之间发生击穿现象，并且金属筒15作为辅助阴极与热丝电极7(热阴极)并联，可以不断地输送电子，保证热电子发射稳定，从而能够保证弧光放电的稳定。气体弧光放电装置的各电极之间不会发生放电击穿现象，渗氮的效率会显著提升。In the gas arc discharge device of the present invention and the magnetic field structure and auxiliary anode structure on the vacuum cavity, there will be no breakdown between the electrodes during the discharge process, and the metal cylinder 15 serves as the auxiliary cathode and the hot wire electrode 7 (hot cathode ) are connected in parallel, which can continuously transport electrons to ensure stable hot electron emission, thereby ensuring the stability of arc discharge. There will be no discharge breakdown between the electrodes of the gas arc discharge device, and the efficiency of nitriding will be significantly improved.
所述真空腔体内采用铠装加热器加热。The vacuum chamber is heated by an armored heater.
本申请提供的气体弧光放电装置中，在辅助阳极、所有电磁场的耦合作用下，弧光由金属筒15进入到真空腔体中，从而发生作用。In the gas arc discharge device provided by the present application, under the coupling action of the auxiliary anode and all electromagnetic fields, the arc light enters the vacuum cavity from the metal cylinder 15 and acts.
实施例3：本发明的气体弧光放电装置在产生弧光放电方面的实例；Embodiment 3: Examples of the gas arc discharge device of the present invention in generating arc discharge;
按照本专利要求安装调试好弧光放电等离子体源装置，热丝选用钨丝。通过观察弧光放电的情况，检查弧光放电的稳定性，确定起弧过程是否安全可靠。The arc discharge plasma source device is installed and debugged according to the requirements of this patent, and tungsten wire is used as the hot wire. By observing the arc discharge situation, check the stability of the arc discharge and determine whether the arc starting process is safe and reliable.
实验过程：首先将真空室抽至0.5×10-4Pa以下，然后向真空室通入氩气，调节质量流量控制器及插板阀，使真空室压力保持在0.8Pa。开启热丝电源，此时其它电源处于待机状态。当热丝电流达到120A时，慢慢开启偏压电源，当等离子体源内有弧光出现后停止调节偏压电源，观察真空腔体中的放电情况，此时真空腔体内有少量的等离子体。在真空室压力为0.8Pa时，弧光等离子体源可以稳定放电，保证稳定放电的时间在100小时以上，此时等离子体放电主要集中在等离子体源内部(图1中5所示位置)。Experimental process: First, pump the vacuum chamber to below 0.5×10 -4 Pa, then introduce argon gas into the vacuum chamber, and adjust the mass flow controller and gate valve to keep the vacuum chamber pressure at 0.8 Pa. Turn on the hot wire power supply, while other power supplies are in standby mode. When the hot wire current reaches 120A, slowly turn on the bias power supply. When arc light appears in the plasma source, stop adjusting the bias power supply and observe the discharge situation in the vacuum chamber. At this time, there is a small amount of plasma in the vacuum chamber. When the vacuum chamber pressure is 0.8Pa, the arc plasma source can discharge stably, ensuring a stable discharge time of more than 100 hours. At this time, the plasma discharge is mainly concentrated inside the plasma source (position shown as 5 in Figure 1).
实施例4：本发明的气体弧光放电装置使用气体弧光放电装置上的第一电磁线圈模块16方面的实例：Embodiment 4: An example of using the first electromagnetic coil module 16 on the gas arc discharge device of the present invention:
在实施例1的基础上，对弧光放电离子源装置施加引出第一电磁线圈16，展示电磁线圈对气体弧光放电装置在产生的等离子体的影响。On the basis of Embodiment 1, the first electromagnetic coil 16 is applied to the arc discharge ion source device to demonstrate the influence of the electromagnetic coil on the plasma generated by the gas arc discharge device.
实验过程：按照实施例1开启气体弧光放电装置，待气体弧光放电装置放电稳定后，观察腔体内的等离子体放电情况，然后开启引出电磁线圈，观察腔体内开启电磁线圈前(图3)后(图4)的放电状态图。可以看到腔体内等离子体放电明显增强；等离子体主要集中在弧光放电装置的出口处，腔体内有少量等离子体，而实施例1中的等离子主要集中在热丝弧光区5。Experimental process: Turn on the gas arc discharge device according to Embodiment 1. After the discharge of the gas arc discharge device is stable, observe the plasma discharge situation in the cavity, then turn on the lead-out electromagnetic coil, and observe the before and after opening of the electromagnetic coil in the cavity (Figure 3). The discharge state diagram of Figure 4). It can be seen that the plasma discharge in the cavity is significantly enhanced; the plasma is mainly concentrated at the exit of the arc discharge device, and there is a small amount of plasma in the cavity, while the plasma in Example 1 is mainly concentrated in the hot wire arc zone 5.
实施例5：本发明在气体弧光放电装置在耦合部真空腔体上的布置及腔体内部辅助阳极方面的实施例。Embodiment 5: An embodiment of the present invention in terms of the arrangement of the gas arc discharge device on the coupling part vacuum cavity and the auxiliary anode inside the cavity.
在实施例2的基础上，对真空腔体施加两组轴向电磁线圈第二电磁线圈26和第三电磁线圈32，如图2所示，两组电磁线圈安装在气体弧光放电装置与辅助阳极之间，分别靠近气体弧光放电装置及辅助阳极。两组电磁线圈展示轴向电磁线圈对真空腔体内等离子体输运过程的影响。并在腔体内部设置水冷辅助阳极如图2中3所示，安装在气体弧光放电装置的另一侧。并且辅助阳极与图1中的3为同一阳极。On the basis of Embodiment 2, two sets of axial electromagnetic coils, the second electromagnetic coil 26 and the third electromagnetic coil 32 are applied to the vacuum chamber. As shown in Figure 2, the two sets of electromagnetic coils are installed on the gas arc discharge device and the auxiliary anode. between them, respectively close to the gas arc discharge device and the auxiliary anode. Two sets of electromagnetic coils demonstrate the influence of axial electromagnetic coils on the plasma transport process in the vacuum chamber. A water-cooled auxiliary anode is installed inside the cavity as shown in 3 in Figure 2, and is installed on the other side of the gas arc discharge device. And the auxiliary anode is the same anode as 3 in Figure 1.
实验过程：按照实施例1、2的顺序，开启离子源后，待弧光离子源放电稳定后，开启外加轴向电磁线圈(第二电磁线圈26和第三电磁线圈32)。在不同的磁场参数下对真空腔体内的等离子体进行等离子发射光谱诊断，从图5和图6的诊断结果可以发现，随着磁场强度的增加，等离子发射光谱的相对强度出现增加的趋势。Experimental process: According to the sequence of Examples 1 and 2, after turning on the ion source, after the discharge of the arc ion source is stable, turn on the external axial electromagnetic coil (the second electromagnetic coil 26 and the third electromagnetic coil 32). The plasma emission spectrum diagnosis was performed on the plasma in the vacuum chamber under different magnetic field parameters. From the diagnostic results in Figures 5 and 6, it can be found that as the magnetic field intensity increases, the relative intensity of the plasma emission spectrum shows an increasing trend.
实施例6：本发明在气体弧光放电装置所加第一电磁线圈模块(图1中17)与真空腔体上两组电磁线圈模块(图2中26与32)耦合方面的实施例：Embodiment 6: Embodiment of the present invention in terms of coupling the first electromagnetic coil module (17 in Figure 1) added to the gas arc discharge device and the two sets of electromagnetic coil modules (26 and 32 in Figure 2) on the vacuum chamber:
在实施例3的基础上，开启三组电磁场模块，并且通过电磁线圈模块供电电源(图1中17，图2中24、34)输出的电流信号的正负极，使三组电磁场的正负极耦合，并且使磁场耦合后的磁场方向在气体弧光放电装置的一侧为N极，在辅助阳极一侧的为S极。如图2中磁感线28所示。通过调节供电电源的电流大小及波形对耦合后的电磁场的强度的大小进行控制，使耦合后的磁场强度在0～160Gs可调。On the basis of Embodiment 3, three sets of electromagnetic field modules are turned on, and the positive and negative poles of the current signals output by the electromagnetic coil module power supply (17 in Figure 1, 24 and 34 in Figure 2) are used to make the positive and negative poles of the three sets of electromagnetic fields The poles are coupled, and the magnetic field direction after magnetic field coupling is the N pole on the side of the gas arc discharge device, and the S pole on the auxiliary anode side. As shown in Figure 2, the magnetic field lines 28. By adjusting the current size and waveform of the power supply, the intensity of the coupled electromagnetic field is controlled, so that the intensity of the coupled magnetic field is adjustable from 0 to 160Gs.
实施例7：本发明在等离子体渗氮方面的实施例：Example 7: Examples of the present invention in terms of plasma nitriding:
利用本发明的气体弧光放电装置及真空腔体对奥氏体不锈钢进行了等离子体渗氮表面强化处理。The gas arc discharge device and vacuum chamber of the present invention are used to perform plasma nitriding surface strengthening treatment on austenitic stainless steel.
实验过程：工件经除油、研磨、镜面抛光、超声清洗等处理后，将其放置于腔体内带负偏压的工件架上，并且在工件架的不同高度处每间隔10mm放置一个工件，工件距离等离子体出口距离约270mm。对工件进行渗氮处理之前，首先将真空腔体的本底真空抽至0.5×10-4Pa。为了避免有氮化物析出而造成耐腐蚀性能的下降，且保证有一定的渗氮速率，奥氏体不锈钢渗氮处理的温度确定为400℃左右，渗氮实验开始前，预先将真空腔体内温度加热至380℃，然后通入氩气，腔体内压力控制在0.8Pa，对试样施加-600V、占空60％、频率为42KHz的脉冲负偏压，对工件进行等离子清洗。开启气体弧光放电装置后，通过轰击将腔体内温度加热到400℃。向真空腔体内通入工作气体氮气，使真空腔室内气压稳定在0.8Pa，待气压稳定后调整腔体上两组磁场的耦合后的磁场强度，在不同的磁场强度下(0～120Gs)对奥氏体不锈钢进行渗氮处理60min。Experimental process: After the workpiece is degreased, ground, mirror polished, ultrasonic cleaned, etc., it is placed on a workpiece holder with a negative bias in the cavity, and a workpiece is placed at 10mm intervals at different heights of the workpiece holder. The distance from the plasma exit is about 270mm. Before nitriding the workpiece, first pump the background vacuum of the vacuum chamber to 0.5×10 -4 Pa. In order to avoid the decrease in corrosion resistance caused by the precipitation of nitrides and ensure a certain nitriding rate, the temperature of the nitriding treatment of austenitic stainless steel is determined to be about 400°C. Before starting the nitriding experiment, the temperature inside the vacuum chamber must be adjusted in advance. Heated to 380°C, then argon gas was introduced, the pressure in the chamber was controlled at 0.8Pa, a pulse negative bias voltage of -600V, duty cycle 60%, and frequency 42KHz was applied to the sample, and the workpiece was plasma cleaned. After turning on the gas arc discharge device, the temperature in the cavity is heated to 400°C through bombardment. Introduce the working gas nitrogen into the vacuum chamber to stabilize the air pressure in the vacuum chamber at 0.8Pa. After the air pressure stabilizes, adjust the coupled magnetic field intensity of the two sets of magnetic fields on the chamber. Under different magnetic field intensities (0~120Gs) Austenitic stainless steel is nitrided for 60 minutes.
本工艺通过调节轴向磁场电磁线圈电源模块的信号参数，使轴向磁场与气体弧光放电装置的磁场耦合。通过耦合磁场调节腔体内等离子体密度与能量，以进行高效渗氮。可以选择不同的轴向磁场强度，与气体弧光放电装置源进行耦合，开展等离子体渗氮、表面强化处理研究与应用。This process couples the axial magnetic field with the magnetic field of the gas arc discharge device by adjusting the signal parameters of the axial magnetic field electromagnetic coil power module. The plasma density and energy in the cavity are adjusted by coupling the magnetic field to perform efficient nitriding. Different axial magnetic field strengths can be selected and coupled with the gas arc discharge device source to carry out research and application of plasma nitriding and surface strengthening treatment.
实验结束后，对采用本发明的渗氮效果做表征检测和对比分析。对比图7中a与b，可以看到表面形貌没有明显的变化。对施加耦合轴向磁场前后的渗氮试样进行XRD分析(如图8所示)，可以得到当磁场强度小于80Gs时，渗氮层为单一的γN相；在磁场强度由0Gs增加到80Gs的过程中，工件渗氮层的γN峰的相对强度变大。渗氮效率是评定渗氮工艺的一项重要指标，对渗氮工件进行渗氮层深度检测(结果如图9中f所示)，可以看到：经磁场耦合后当磁场强度为80Gs时渗氮效率提高到原先的6倍，在本发明中对不锈钢渗氮60min可以得到50μm无氮化物析出的渗氮层。而传统的活性屏等离子对不锈钢进行渗氮20h仅可以得到10μm无氮化物析出的渗氮层；空心阴极等离子渗氮1h仅可以得到12μm无氮化物析出的渗氮层。机械特性测试结果表明：利用气体弧光放电装置与腔体轴向磁场耦合技术，渗氮后不锈钢的显微硬度是未渗氮试样的5倍(如图10所示)，而渗氮试样的耐磨损性能与未渗氮试样相比较可以提高12倍(如图11所示)。After the experiment is completed, the nitriding effect using the present invention is characterized, tested and comparatively analyzed. Comparing a and b in Figure 7, it can be seen that there is no obvious change in the surface morphology. XRD analysis of the nitrided samples before and after applying the coupled axial magnetic field (as shown in Figure 8) shows that when the magnetic field intensity is less than 80Gs, the nitrided layer is a single γN phase; when the magnetic field intensity increases from 0Gs to 80Gs During the process, the relative intensity of the γN peak of the nitrided layer of the workpiece becomes larger. Nitriding efficiency is an important indicator for evaluating the nitriding process. The nitriding layer depth of the nitrided workpiece is detected (the results are shown in f in Figure 9). It can be seen that after magnetic field coupling, when the magnetic field intensity is 80Gs, the nitriding layer The nitrogen efficiency is increased to 6 times of the original. In the present invention, a 50 μm nitriding layer without nitride precipitation can be obtained by nitriding stainless steel for 60 minutes. However, traditional active screen plasma nitriding of stainless steel for 20 hours can only obtain a 10 μm nitride layer without nitride precipitation; hollow cathode plasma nitriding for 1 hour can only obtain a 12 μm nitride layer without nitride precipitation. The mechanical properties test results show that: using gas arc discharge device and cavity axial magnetic field coupling technology, the microhardness of the nitrided stainless steel is 5 times that of the non-nitrided sample (as shown in Figure 10), while the nitrided sample The wear resistance can be improved by 12 times compared with the non-nitrided sample (as shown in Figure 11).
以上所述仅为本发明的优选实施例而已，并不用于限制本发明，对于本领域的技术人员来说，本发明可以有各种更改和变化。凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。The above descriptions are only preferred embodiments of the present invention and are not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and changes. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention shall be included in the protection scope of the present invention.
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