CN208923107U - DFN integrated circuit package device - Google Patents

DFN integrated circuit package device Download PDF

Info

Publication number
CN208923107U
CN208923107U CN201821959434.4U CN201821959434U CN208923107U CN 208923107 U CN208923107 U CN 208923107U CN 201821959434 U CN201821959434 U CN 201821959434U CN 208923107 U CN208923107 U CN 208923107U
Authority
CN
China
Prior art keywords
chip
heat dissipation
bonding pad
dissipation bonding
deep gouge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201821959434.4U
Other languages
Chinese (zh)
Inventor
马磊
党鹏
杨光
彭小虎
王新刚
庞朋涛
任斌
王妙妙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xi'an Hangsi Semiconductor Co Ltd
Original Assignee
Xi'an Hangsi Semiconductor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xi'an Hangsi Semiconductor Co Ltd filed Critical Xi'an Hangsi Semiconductor Co Ltd
Priority to CN201821959434.4U priority Critical patent/CN208923107U/en
Application granted granted Critical
Publication of CN208923107U publication Critical patent/CN208923107U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8338Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/83385Shape, e.g. interlocking features
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

The utility model discloses a kind of DFN integrated circuit package device, including the heat dissipation bonding pad being located in epoxy insulator, chip and conductive welding disk, the chip is located on heat dissipation bonding pad, several conductive welding disks are equipped with positioned at heat dissipation bonding pad periphery, the conductive welding disk is connected with chip by a lead, the central area of the heat dissipation bonding pad is provided with a deep gouge being embedded in for chip, to form a cofferdam in the marginal zone of heat dissipation bonding pad, silver slurry layer is provided between the bottom of the deep gouge and the lower surface and side wall of cofferdam and chip, the bottom of the deep gouge is provided with several heat exchange blind holes extended in heat dissipation bonding pad, there is silver paste filling part in the heat exchange blind hole.The utility model increases the contact area of chip and silver paste, silver paste and heat dissipation bonding pad, to increase the heat dissipation capacity in the unit time, and then improves the heat dissipation effect of encapsulating structure by the setting of deep gouge and the blind hole that exchanges heat.

Description

DFN integrated circuit package device
Technical field
The utility model relates to DFN integrated circuit package devices, belong to leadless packages technical field.
Background technique
DFN is a kind of leadless packages, is in square or rectangular, and there is the exposed weldering of large area in package bottom central location Disk has the conductive welding disk for realizing electrical connection around the encapsulation periphery of big pad for thermally conductive.Since DFN encapsulation is unlike passing SOIC and the TSOP encapsulation of system have gull wing lead like that, and the conductive path between internal pin and pad is short, electrodynamic capacity And routing resistance is very low in packaging body, so it can provide brilliant electrical property, and is used widely.
It in encapsulation process, needs that chip is bonded on thermal land using silver paste, here, silver paste functions not only as bonding Agent uses, and the heat transfer that superior heating conduction can generate chip is to thermal land, to reduce under working condition Chip temperature, protect chip;But since chip is connected by way of attaching with silver paste, contact area is less, leads Cause the heat dissipation effect of DFN encapsulation semiconductor devices to be improved.
Utility model content
The purpose of the utility model is to provide DFN integrated circuit package devices to be increased by the setting of deep gouge and heat exchange blind hole The contact area of chip and silver paste, silver paste and heat dissipation bonding pad is added, to increase the heat dissipation capacity in the unit time, and then has improved The heat dissipation effect of encapsulating structure.
In order to achieve the above objectives, the technical solution adopted in the utility model is: a kind of DFN integrated circuit package device, packet Heat dissipation bonding pad, chip and the conductive welding disk being located in epoxy insulator are included, the chip is located on heat dissipation bonding pad, is located at heatsink welding Disk periphery is equipped with several conductive welding disks, and the conductive welding disk is connected with chip by a lead, the center of the heat dissipation bonding pad Area be provided with one for chip insertion deep gouge, thus heat dissipation bonding pad marginal zone formed a cofferdam, the bottom of the deep gouge and Be provided with silver slurry layer between cofferdam and the lower surface and side wall of chip, the bottom of the deep gouge be provided with several extend to it is scattered Heat exchange blind hole in hot weld disk has silver paste filling part in the heat exchange blind hole.
Further improved scheme is as follows in above-mentioned technical proposal:
1. in above scheme, the deep gouge depth is arranged no more than chip thickness.
2. in above scheme, the heat exchange blind hole is tapered blind hole, hole of the heat exchange blind hole close to chip one end port Diameter is greater than heat exchange aperture of the blind hole far from chip one end port.
3. in above scheme, the heat exchange blind hole extends to heat dissipation bonding pad middle and lower part.
4. in above scheme, being provided with stepped part on the cofferdam inside.
Due to the application of the above technical scheme, the utility model has the advantage that compared with prior art
1, the utility model DFN integrated circuit package device, it is matched heavy with chip to open up in the middle part of heat dissipation bonding pad Corresponding chip so that silver paste is placed in deep gouge by staff in pasting chip, and is installed into deep gouge i.e. by slot It can;At this point, chip lower part, in deep gouge, not only its bottom can pass through the silver slurry layer and deep gouge bottom adhesive of formation, chip The side wall of lower part also can mutually be bonded with the inner wall of the cofferdam outside deep gouge by silver slurry layer, and not only chip and silver slurry layer connect Contacting surface product increased, and the contact area of silver slurry layer and heat dissipation bonding pad also increased, so that in the unit time, more More heats conducts between chip and silver slurry layer, between silver slurry layer and heat dissipation bonding pad, and then improves DFN and encapsulate semiconductor devices Heat dissipation effect.
2, the utility model DFN integrated circuit package device opens up heat exchange blind hole in deep gouge bottom, and the blind hole that will exchange heat Be set as tapered blind hole, on the one hand, the setting for the blind hole that exchanges heat can accommodating portion silver paste, avoid extra silver paste from overflowing deep gouge, On the other hand, after having silver paste filling part in the blind hole that exchanges heat, the contact area of silver paste and heat dissipation bonding pad is further increased, encapsulation Heat dissipation effect is further promoted, also, with the raising of heat exchange blind hole quantity, encapsulating structure heat dissipation effect is gradually mentioned It is high.
3, upper deep gouge is arranged in the central area of heat dissipation bonding pad, moreover it is possible to convenient in the utility model DFN integrated circuit package device The installation site of staff's calibration chip realizes the accurate installation of chip, improves chip package quality;Meanwhile it is chip is embedding Loaded in deep gouge, can positioning chip position, cooperate silver paste setting protection chip and the lead that connect with chip, improves and encapsulates Quality.
4, the utility model DFN integrated circuit package device, after upper stepped part is opened up on the inside of cofferdam, chip insertion is heavy When slot, extra part silver paste is able to enter stepped part between cofferdam inner wall and chip lower sides, thus avoid it is extra Silver paste spreads to chip upper surface in extrusion process, and influences the normal work of chip.
Detailed description of the invention
Attached drawing 1 is the structural schematic diagram of the DFN integrated circuit package device of the utility model embodiment 1;
Attached drawing 2 is the structural schematic diagram of the DFN integrated circuit package device of the utility model embodiment 2.
In the figures above: 1, heat dissipation bonding pad;11, deep gouge;12, cofferdam;121, stepped part;13, exchange heat blind hole;2, silver paste Layer;21, silver paste filling part;3, chip;4, conductive welding disk;5, lead;6, epoxy insulator.
Specific embodiment
Embodiment 1:DFN integrated circuit package device, referring to attached drawing 1, including the heat dissipation bonding pad being located in epoxy insulator 6 1, chip 3 and conductive welding disk 4, the chip 3 are located on heat dissipation bonding pad 1, are located at 1 periphery of heat dissipation bonding pad and are equipped with several conduction welderings Disk 4, the conductive welding disk 4 and chip 3 are connected by a lead 5, and it is embedding for chip 3 that the central area of the heat dissipation bonding pad 1 is provided with one The deep gouge 11 entered, to form a cofferdam 12 in the marginal zone of heat dissipation bonding pad 1, the bottom of the deep gouge 11 and cofferdam 12 with Silver slurry layer 2 is provided between the lower surface and side wall of chip 3, the bottom of the deep gouge 11 is provided with several and extends to heatsink welding Heat exchange blind hole 13 in disk 1 has silver paste filling part 21 in the heat exchange blind hole 13.
Above-mentioned 11 depth of deep gouge is arranged no more than 3 thickness of chip;
Above-mentioned heat exchange blind hole 13 is tapered blind hole, and above-mentioned heat exchange blind hole 13 is greater than close to the aperture of 3 one end port of chip changes Aperture of the hot blind hole 13 far from 3 one end port of chip;
Above-mentioned heat exchange blind hole 13 extends to 1 middle and lower part of heat dissipation bonding pad;
Stepped part 121 is provided on above-mentioned 12 inside of cofferdam.
Embodiment 2:DFN integrated circuit package device, referring to attached drawing 2, including the heat dissipation bonding pad being located in epoxy insulator 6 1, chip 3 and conductive welding disk 4, the chip 3 are located on heat dissipation bonding pad 1, are located at 1 periphery of heat dissipation bonding pad and are equipped with several conduction welderings Disk 4, the conductive welding disk 4 and chip 3 are connected by a lead 5, and it is embedding for chip 3 that the central area of the heat dissipation bonding pad 1 is provided with one The deep gouge 11 entered, to form a cofferdam 12 in the marginal zone of heat dissipation bonding pad 1, the bottom of the deep gouge 11 and cofferdam 12 with Silver slurry layer 2 is provided between the lower surface and side wall of chip 3, the bottom of the deep gouge 11 is provided with several and extends to heatsink welding Heat exchange blind hole 13 in disk 1 has silver paste filling part 21 in the heat exchange blind hole 13.
Above-mentioned 11 depth of deep gouge is arranged no more than 3 thickness of chip;
Above-mentioned heat exchange blind hole 13 is tapered blind hole, and above-mentioned heat exchange blind hole 13 is greater than close to the aperture of 3 one end port of chip changes Aperture of the hot blind hole 13 far from 3 one end port of chip;
Above-mentioned heat exchange blind hole 13 extends to 1 middle and lower part of heat dissipation bonding pad.
When encapsulating semiconductor devices using above-mentioned DFN, by the setting of deep gouge 11 and the blind hole 13 that exchanges heat, increasing chip 3 and while silver paste contact area, increase the contact area of silver paste and heat dissipation bonding pad 1, to increase in the unit time, chip 3 With the heat exchange amount of silver paste, silver paste and heat dissipation bonding pad 1, the heat dissipation effect of semiconductor devices is encapsulated so as to improve DFN;In addition, deep gouge 11 setting can also facilitate the accurate chip 3 of staff, and silver paste is cooperated to stablize the chip 3 of insertion deep gouge 11, improve core The stability that piece 3 is installed, to improve 3 package quality of chip.
The above embodiments are only for explaining the technical ideas and features of the present invention, and its object is to allow be familiar with technique Personage can understand the content of the utility model and implement accordingly, do not limit the protection scope of the present invention. All equivalent change or modifications according to made by the spirit of the present invention essence, should all cover the protection scope of the utility model it It is interior.

Claims (5)

1. a kind of DFN integrated circuit package device, including be located in epoxy insulator (6) heat dissipation bonding pad (1), chip (3) and Conductive welding disk (4), the chip (3) are located on heat dissipation bonding pad (1), are located at heat dissipation bonding pad (1) periphery and are equipped with several conduction welderings Disk (4), the conductive welding disk (4) and chip (3) are connected by a lead (5), it is characterised in that: the heat dissipation bonding pad (1) Central area is provided with a deep gouge (11) being embedded in for chip (3), to form a cofferdam in the marginal zone of heat dissipation bonding pad (1) (12), silver slurry layer is provided between the bottom and cofferdam (12) and the lower surface and side wall of chip (3) of the deep gouge (11) (2), the bottom of the deep gouge (11) is provided with several heat exchange blind holes (13) extended in heat dissipation bonding pad (1), and the heat exchange is blind There are silver paste filling part (21) in hole (13).
2. DFN integrated circuit package device according to claim 1, it is characterised in that: deep gouge (11) depth is little It is arranged in chip (3) thickness.
3. DFN integrated circuit package device according to claim 1, it is characterised in that: the heat exchange blind hole (13) is cone Shape blind hole, heat exchange blind hole (13) are greater than heat exchange blind hole (13) far from chip (3) one close to the aperture of chip (3) one end port Hold the aperture of port.
4. DFN integrated circuit package device according to claim 3, it is characterised in that: the heat exchange blind hole (13) extends To heat dissipation bonding pad (1) middle and lower part.
5. DFN integrated circuit package device according to claim 1, it is characterised in that: on cofferdam (12) inside It is provided with stepped part (121).
CN201821959434.4U 2018-11-27 2018-11-27 DFN integrated circuit package device Active CN208923107U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201821959434.4U CN208923107U (en) 2018-11-27 2018-11-27 DFN integrated circuit package device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201821959434.4U CN208923107U (en) 2018-11-27 2018-11-27 DFN integrated circuit package device

Publications (1)

Publication Number Publication Date
CN208923107U true CN208923107U (en) 2019-05-31

Family

ID=66712430

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201821959434.4U Active CN208923107U (en) 2018-11-27 2018-11-27 DFN integrated circuit package device

Country Status (1)

Country Link
CN (1) CN208923107U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113690195A (en) * 2021-09-16 2021-11-23 珠海零边界集成电路有限公司 Packaging frame, packaging structure and preparation method of packaging frame

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113690195A (en) * 2021-09-16 2021-11-23 珠海零边界集成电路有限公司 Packaging frame, packaging structure and preparation method of packaging frame

Similar Documents

Publication Publication Date Title
CN108573936A (en) Semiconductor packages
CN103489845B (en) Electric device package and the method for making electric device package
CN105244347B (en) A kind of embedded encapsulation and packaging method
CN207765435U (en) A kind of encapsulating structure of upside-down mounting welding core
CN208111434U (en) Power module
CN208923107U (en) DFN integrated circuit package device
CN208923104U (en) Chip-packaging structure based on QFN
CN101091247B (en) Dual flat non-leaded semiconductor package
CN215377395U (en) Packaging structure for semiconductor chip
CN104064532A (en) Device packaging structure with heat dissipation structure and manufacturing method
CN101882606B (en) Heat-dissipation semiconductor encapsulation structure and manufacturing method thereof
CN206532771U (en) Cooling type semiconductor device
CN219435850U (en) MOSFET chip packaging structure
CN104900612B (en) A kind of packaging body with umbilicate type cooling fin fin base stacks radiator structure and preparation method thereof
CN209104141U (en) A kind of chip exposed type encapsulating structure
CN109950158A (en) The preparation method of high thermal conductivity DFN packaging
CN206595249U (en) Carry the SOP device encapsulation structures of high current
CN209000902U (en) A kind of encapsulating structure of frame clsss product enhancing heat dissipation
CN112563226B (en) DFN packaging device convenient for heat dissipation
CN210200717U (en) Silicon controlled rectifier adopting insulation encapsulation
CN209298116U (en) The solar energy of base island separate type bypasses core component frame
CN208923108U (en) The anti-short circuit DFN device encapsulation structure of SMT
CN206742221U (en) Electrode for chip package and the chip-packaging structure using the electrode
CN207690783U (en) A kind of new type integrated circuit encapsulating structure
CN107808872B (en) A kind of ball grid array Plastic Package preparation method that cavity is downward

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant