CN208917290U - A kind of magnetic-control sputtering continuous plating equipment - Google Patents
A kind of magnetic-control sputtering continuous plating equipment Download PDFInfo
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- CN208917290U CN208917290U CN201820643134.9U CN201820643134U CN208917290U CN 208917290 U CN208917290 U CN 208917290U CN 201820643134 U CN201820643134 U CN 201820643134U CN 208917290 U CN208917290 U CN 208917290U
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Abstract
The utility model is a kind of magnetic-control sputtering continuous plating equipment, and for preparing terbium film on neodymium iron boron magnetic body surface, the magnetic-control sputtering continuous plating equipment includes feeding device, transmission device, coating apparatus, cooling chamber and discharging device；Wherein, the cooling chamber is for cooling down to the workpiece after the coating apparatus plated film；The transmission device is for driving workpiece mobile according to processing route.The terbium film quality that the magnetic-control sputtering continuous plating equipment of the application is not only prepared has very big promotion, but also meets the needs of enterprise's bulk production, improves the production efficiency of plated film.
Description
Technical field
The utility model relates to continuous coating fields, more particularly to one kind is for preparing terbium film on neodymium iron boron magnetic body surface
Magnetic-control sputtering continuous plating equipment.
Background technique
One layer of heavy rare earth element terbium film is prepared in sintering type Nd iron boron magnet surface, it is dilute to can be further improved neodymium iron boron
The performance of native permanent-magnet material.At present for the surface treatment of Nd-Fe-B magnet steel semi-finished product mainly using the side of artificial coating terbium powder
Formula.This mode coats uniformity, the density of film layer, coat surface adhesion force for the thickness control of coating film layer, surface
Etc. techniques require to be difficult to control, not only waste rare earth terbium raw material, and paint-on technique can not be used in actual production, be not able to satisfy
The requirement of the mass production of production enterprise.
Although having there is the technology for carrying out plated film using magnetron sputtering, it is directed to using magnetron sputtering in Neodymium iron boron magnetic
The surface of material matrix forms terbium film and may be only available for experimental life there are no solving the problems, such as how to realize batch production
It produces, it cannot be guaranteed that the purity of batch production and uniformity controlling film.
The information for being disclosed in the utility model background technology part is merely intended to deepen to the utility model general background skill
The understanding of art, and be not construed as recognizing or implying in any form that information composition is known to those skilled in the art
The prior art.
Utility model content
The purpose of this utility model is that at least solving one of above-mentioned technical problem, the utility model provides a kind of magnetic thus
Control sputtering continuous coating device, the terbium film quality not only prepared has very big promotion, but also meets the need of the bulk production of enterprise
It asks, improves the production efficiency of plated film.
Purpose of the utility model is realized as follows: a kind of magnetic-control sputtering continuous plating equipment, in neodymium-iron-boron
Body surface wheat flour includes feeding device, transmission device, coating apparatus, cooling for terbium film, the magnetic-control sputtering continuous plating equipment
Chamber and discharging device；
Wherein, the cooling chamber is for cooling down to the workpiece after the coating apparatus plated film；The transmission device
For driving workpiece mobile according to processing route.
In a preferred embodiment of the utility model, the inner space of the cooling chamber is provided with blower and heat exchange
Device；
The heat exchanger forms cold air for cooling down to the hot gas for flowing through the heat exchanger；
The blower is for making the cold air flow through the workpiece, shape after the cold air cools down to the workpiece
At the hot gas.
In a preferred embodiment of the utility model, the inner space of the cooling chamber is additionally provided with diversion division
Part；
The diversion component is used to form the circulating path of gas flowing in the cooling chamber interior volume；
The blower and the heat exchanger are arranged on the circulating path, for making the cold air and the hot gas
Body is circulated along the circulating path in the cooling chamber interior.
In a preferred embodiment of the utility model, the feeding device, the coating apparatus, the cooling chamber
And the discharging device is set gradually according to processing route in pipeline-type；The transmission device includes:
Charging tray, for holding workpiece；
Transmission wheel is successively spaced setting along the processing route, is used to support and drives the charging tray along the technique
It persistently moves in path；With
Driving device is transmitted, for driving the transmission wheel to rotate.
In a preferred embodiment of the utility model, the coating apparatus includes more cathode continuous coating chambers, institute
Stating more cathode continuous coating chambers includes multiple cathode assemblies and at least one cooling component, the cathode assembly and the cooling
Component is successively arranged alternately along the processing route in the top of workpiece；The conveyor belt starts building part along the technique road
Diameter is in more cathode continuous coating chamber indoor movings, alternately to sputter and cool down to the workpiece.
In a preferred embodiment of the utility model, the feeding device includes setting gradually according to processing route
Loading bay and Sample Room；
The inside of the loading bay is in atmospheric environment, for placing the charging tray for having workpiece；The Sample Room connection is true
Sky pump, the vacuum pump form vacuum environment for making in the Sample Room.
In a preferred embodiment of the utility model, the coating apparatus includes setting gradually according to processing route
Wash chamber, more cathode continuous coating chambers and surge chamber；
The wash chamber is used to carry out Ion Cleaning to the workpiece；The surge chamber connects for accepting more cathodes
The charging tray sent out in continuous coating chamber, to coordinate the workpiece transmission between the technique of front and back.
In a preferred embodiment of the utility model, in the coating apparatus, on the technique road of the wash chamber
Diameter upstream also sets up another surge chamber.
In a preferred embodiment of the utility model, the discharging device includes setting gradually according to processing route
Specimen chamber and discharging platform out；
The specimen chamber out connects vacuum pump, and the vacuum pump is for making the specimen chamber out is interior to form vacuum environment；It is described go out
The inside of material platform is in atmospheric environment, for placing the charging tray for having workpiece.
In a preferred embodiment of the utility model, the transmission device includes transmission chamber, the transmission chamber
Interior to be equipped with transmission manipulator, the side wall of the transmission chamber is provided with carry interface；
The feeding device, the coating apparatus, the cooling chamber and the discharging device pass through the extension respectively
Interface carry is carried in the side wall of the transmission chamber；
The transmission manipulator is used to take out workpiece from the feeding device, then by the workpiece successively in the plated film
It is transmitted between device, the cooling chamber and the discharging device.
Compared with prior art, the utility model has the beneficial effects that
Pass through the coordinating operation between feeding device, coating apparatus, cooling chamber and discharging device, the technology of the application
Scheme, which is able to achieve, prepares the batch production of terbium film on neodymium iron boron magnetic body surface.Wherein, cooling chamber is by blower and cooling-part
The inside of cooling chamber is set, and the circulation path of gas flowing is formed in the inside of the cooling chamber by diversion component
Diameter.To which the cold air formed by cooling-part flows through workpiece, hot gas is formed after cooling down to workpiece, hot gas passes through
Circulating path flows at cooling-part again, forms cold air again after cooling, loops back and forth like this.With magnetic-controlled sputtering coating equipment
Match, can prevent from being nitrogenized in an atmosphere when matrix high temperature, meanwhile, because blower, cooling-part and cold air and
The entire circulating path that hot gas is formed is arranged at the inside of cooling chamber, and cooling efficiency is high, meets magnetron sputtering plating
Requirement when equipment is produced in batches to cooling efficiency.
In the attached drawing for being included in this paper and then it is used to illustrate the specific reality of the certain principles of the utility model together with attached drawing
It applies in scheme, other feature possessed by the device of the utility model and advantage will be apparent or more specifically explained
It is bright.
Detailed description of the invention
Fig. 1 is the schematic diagram of the exemplary implementation scheme of the application magnetic-control sputtering continuous plating equipment；
Fig. 2 is the Longitudinal cross section schematic of the exemplary implementation scheme of cooling chamber in the application；
Fig. 3 is the Longitudinal cross section schematic of the exemplary implementation scheme of more cathode continuous coating chambers in the application；
Fig. 4 is the schematic diagram of the another exemplary embodiment of the application magnetic-control sputtering continuous plating equipment.
It is to be appreciated that appended attached drawing is not proportionally drawn, it is shown that illustrate each of the basic principle of the utility model
The slightly simplified technique of painting of kind feature.The utility model disclosed herein specific design feature (including such as specific size,
Direction, location and shape) it will partly be determined by the specific application and use environment.
Specific embodiment
It will be detailed with reference to each embodiment of the utility model, the example of these embodiments is displayed on attached drawing
In and be described as follows.Although the utility model will be combined with an exemplary implementation and be described, it should be understood that this specification
It is not intended to for the utility model to be limited to those exemplary implementation schemes.On the contrary, the utility model is intended to not only cover these
Exemplary implementation scheme, and covering can be included in the spirit and model of the utility model being defined by the appended claims
Various selection forms, modification, equivalent form and other embodiments within enclosing.
Used technical term is merely to the purpose of description specific embodiment is not intended to pair in the following description
The utility model is limited.
In the following, different to technical scheme reasons for its use, technical solution design and some of them in conjunction with attached drawing
Alternative embodiment is illustrated.
It is main for the processing of neodymium iron boron (NdFeB) magnet steel surface of semi-finished by the way of manually coating terbium powder at present, only
It can be suitably used for experimentally producing, it cannot be guaranteed that the purity of batch production uniformity controlling film, surface adhesion force are also not achieved
Technique requirement.In consideration of it, inventor needs to carry out the spy of high-volume pipeline system production according to Nd-Fe-B magnet steel production enterprise
Point, and the characteristics of combine magnetron sputtering technology and the physical characteristic of neodymium iron boron product and the physics of rare metal terbium it is special
Property, have developed it is a set of can adapt to enterprise's batch production requirements, and the continuous magnetron sputtering plated film of terbium film quality can be promoted
Equipment.Also, it finds in further research, is produced in batches using continuous magnetron sputtering filming equipment, workpiece edge
Processing route after multiple targets for being continuously arranged carry out magnetron sputtering platings, workpiece can have certain temperature, to make
Workpiece cooling, needs to be arranged a kind of cooling chamber, and workpiece is transmitted in cooling chamber and is cooled down, is reduced to centainly to workpiece
After temperature, sample chamber is entered back into out, is come out from sample chamber out, enters back into subsequent processing.
With reference to Fig. 1 and exemplary implementation scheme shown in Fig. 4, this application provides a kind of magnetic-control sputtering continuous platings to set
Standby, for preparing terbium film on neodymium iron boron magnetic body surface, the magnetic-control sputtering continuous plating equipment includes feeding device, transmission dress
It sets, coating apparatus, cool down chamber 7 and discharging device.Feeding device is used for the charging of workpiece and makes environment locating for workpiece
It is changed into the vacuum environment for meeting technique requirement from atmospheric environment.Coating apparatus is used to carry out the workpiece under vacuum environment
Magnetic-control sputtering continuous plating.Workpiece temperature after plated film is higher, if being sent directly into discharging device, needs in discharging device
Room temperature is naturally cooled to, subsequent processing is then entered back into.Workpiece is low using natural cooling one side cooling efficiency, reduces whole set
Standby production efficiency；Another aspect workpiece surface is easy to be influenced the quality of plated film by nitridation.Therefore, in coating apparatus and discharging
Special cooling chamber 7 is set between device, the cooling chamber 7 dedicated for the workpiece after the coating apparatus plated film into
Row cooling；Discharging device is re-fed into after workpiece temperature meets the requirements.The transmission device is for driving workpiece according to technique road
Diameter is mobile.Specifically, conveyor belt is started building, and part sequentially enters feeding device, coating apparatus, cool down chamber 7 and discharging dress
It sets.
By the coordinating operation between above-mentioned each device, the technical solution of the application is able to achieve on neodymium iron boron magnetic body surface
Prepare the batch production of terbium film.Wherein, feeding device, transmission device, coating apparatus, cooling chamber 7 and discharging device
Specific constructive form is not specifically limited, and the existing device in this field and equipment that can complete corresponding function can use.
If the cooling efficiency of cooling chamber 7 does not reach requirement, productive temp can be reduced.By increasing cooling chamber 7
Capacity not only increases cost to improve cooling efficiency, and will increase the volume and maintenance difficulties of equipment.Therefore, how limited
Cooling chamber space in improve cooling chamber 7 in cooling efficiency, be improve continuous magnetron sputtering filming equipment batch production
The big principal element of the one of efficiency.
In a preferred embodiment, as shown in Fig. 2, the inner space of the cooling chamber 7 is provided with blower 71 and changes
Hot device 72.The heat exchanger 72 forms cold air for cooling down to the hot gas for flowing through the heat exchanger 72.The blower 71
For making the cold air flow through the workpiece, the cold air forms the hot gas after cooling down to the workpiece.It will
The inner space of cooling chamber 7 is arranged in blower 71 and heat exchanger 72, is cooling down relative to by blower 71 and the setting of heat exchanger 72
This conventional arrangement mode in the outside of chamber 7, does not need that connecting pipe is arranged outside chamber, shortens following for cold air and hot gas
The length of endless path avoids the heat exchange between exterior thereto room temperature environment, reduces thermal loss.
In a preferred embodiment, the inner space of the cooling chamber 7 is additionally provided with diversion component.The diversion division
Part is used to form the circulating path r of gas flowing in cooling 7 inner space of chamber, the gas flowing for making to cool down in chamber 7
It is environmentally isolated with exterior thereto.The blower 71 and the heat exchanger 72 are arranged on the circulating path r, and blower 71 is main
Play promotion source, for making the gas inside the cooling chamber 7 generate circulating along the circulating path r.
When hot gas stream is through the heat exchanger 72, hot gas is carried out to be cooled into cold air.Workpiece is sent to inside cooling chamber 7
Afterwards, workpiece also can be on circulating path r, and the cold air flows through the workpiece along circulating path r, carries out to the workpiece
The heat that workpiece is absorbed after cooling forms the hot gas；Hot gas continue on circulating path r flow through heat exchanger 72 formed it is cold
Gas so circulates in the inner space of cooling chamber 7, forms internal hot and cold gas circulating path r.In cooling chamber
The length also hot and cold gas circulating path r than being formed by the external pipe of chamber for the hot and cold gas circulating path r that 7 inside are formed
Length it is short very much.Diversion component makes hot and cold gas carry out forced circulation cooling by the path of setting, will not be in chamber interior shape
It is flowed at irregular air-flow.The above factor all plays positive effect to the cooling efficiency for improving heat exchanger 72, so,
Cooling chamber 7 can satisfy the requirement produced in batches to cooling efficiency.
In a preferred embodiment, as shown in Figure 1, the feeding device, the coating apparatus, the cooling chamber 7
And the discharging device is set gradually according to processing route in pipeline-type, that is to say, that the path of workpiece transmission is straight line,
It is successively moved to discharging device from feeding device and completes plated film processing.Transmission device includes that charging tray 76, transmission wheel 77 and transmission are driven
Dynamic device.Charging tray 76 realizes the transmission of workpiece by making charging tray 76 along the movement of processing route for holding workpiece.Transmission
Wheel 77 is successively spaced setting along the processing route, is used to support and the charging tray 76 is driven persistently to move along the processing route
It is dynamic.Since the process time between each device is different, transmission device uses segmentation independent control corresponding with each device
Setting form, i.e., feeding device, coating apparatus, cooling chamber 7 and discharging device in be respectively arranged with above structure
Transmission device, and run independently of each other between the transmission device in each device, work is uniformly coordinated by control device.With plating
The set-up mode of transmission device is illustrated for film device.Coating chamber is equipped in coating apparatus, at the bottom of coating chamber
Multiple rows of transmission wheel 77 is arranged in parallel along direction from the inlet to the outlet above wall, the spacing phase between adjacent two rows transmission wheel 77
Deng, it is each drain into it is few there are two transmission wheels 77, form the matrix form of multiple rows of multiple row.The transmission wheel 77 of each row is both secured to together
On one wheel shaft, multiple wheel shafts pass through the bottom wall that supporting element is pivotally supported at coating chamber respectively.One of wheel shaft conduct
Primary input wheel shaft, other wheel shafts are follower shaft.Transmission driving device can use chain for driving the transmission wheel 77 to rotate
The form of transmission or V belt translation.Chain conveyer and the mode that toothed belt transmission combines can also be used.Such as from motor output shaft to master
It is transmitted between input wheel shaft using synchronous belt, using chain conveyer between primary input wheel shaft and each follower shaft, specifically
, the same side of each wheel shaft is fixed with sprocket wheel, is connected the sprocket wheel on each wheel shaft by transmission chain (not shown), main
The rotation for inputting wheel shaft drives follower shaft rotation by transmission chain, so that each transmission wheel 77 be made to rotate synchronously.76 quilt of charging tray
It is placed in transmission wheel 77, is supported by transmission wheel 77 and charging tray 76 is driven to move.This mode of transmission wheel 77 is added using charging tray 76,
Can adapt to various forms of workpiece, such as workpiece can be bulk, strip etc., if charging tray 76 be arranged to it is matched
Form.
In a preferred embodiment, as shown in figure 3, the coating apparatus may include more cathode continuous coating chambers 5,
More cathode continuous coating chambers 5 include multiple cathode assemblies 51 and at least one cooling component 52, the cathode assembly 51
It is successively arranged alternately along the processing route in the top of workpiece with the cooling component 52.Wherein, cathode assembly 51 is magnetic
The conventional component of control sputtering, including target fixing seat and target, target are mounted in target fixing seat, and target fixing seat is mounted on
The roof of chamber.Chamber wall connects the anode of DC power supply, and target connects the cathode of DC power supply, from 51 introducing technology gas of cathode assembly
Body (usually Ar), process gas generate ionization under the action of electric field, form plasma, the Ar+ bombardment in plasma
Target forms sputtering particle and carries out plating to the work piece of lower section.Three cathode assemblies 51 are arranged in present embodiment and two cold
But component 52；The cathode assembly 51 and the cooling component 52 are successively alternately set along the processing route in the top of workpiece
It sets, i.e., the processing route passed through along workpiece, cathode assembly 51- cooling component 52- yin is set gradually at the top of coating chamber
Pole component 51- cooling component 52- cathode assembly 51.When transmission device drives work piece to pass through coating chamber, successively splashed
- sputtering-cooling-sputtering alternation procedure is penetrated-cooled down, is realized during continuous coating, each cathode assembly 51 splashes matrix
It penetrates after plated film and goes to 52 lower part of cooling component and cool down to it, next cathode assembly 51 is again to its sputter coating after cooling, then
Cool down again, the purpose of side plating membrane edge cooling may be implemented.
In a preferred embodiment, the feeding device may include the loading bay 12 set gradually according to processing route
With Sample Room 1.The effect of loading bay 12 is to place the charging tray with workpiece sent by process upstream.The loading bay 12
Inside be in atmospheric environment.
The Sample Room 1 connects vacuum pump 13, and the pipeline of connection vacuum pump 13 is equipped with vacuum valve 14, the vacuum pump
13 form vacuum environment in the Sample Room 1 for making.The effect of Sample Room 1 is adapter cavity of the pallet before entering coating apparatus
Room, workpiece is in Sample Room 1 by 13 groups of acquisition vacuum degrees of vacuum pump, ultimate pressure 0.1Pa.Sample Room 1 be provided with Pirani gauge and
Vacuum table, to detection chambers internal pressure.Transmission device, transmission device two sides are each provided in loading bay 12 and Sample Room 1
Equipped with photoelectric sensor as charging tray positioning device.Vacuum isolating valve 2 is arranged in junction between loading bay 12 and Sample Room 1,
After pallet is transmitted into Sample Room 1, the vacuum isolating valve 2 between loading bay 12 and Sample Room 1 is closed, and starts 13 groups of pumpings of vacuum pump
Vacuum can enter coating apparatus when pressure is reduced to preset value.
In a preferred embodiment, the coating apparatus may include the wash chamber set gradually according to processing route
4, more cathode continuous coating chambers 5 and surge chamber 3.Wash chamber 4 is equipped with anode layer ion source 8, for carrying out ion to workpiece
Cleaning.Ion Cleaning is a step more important in technique, before workpiece plated film, needs to carry out the pre- coated surface of workpiece thorough
Cleaning.The energetic ion that anode layer ion source 8 is launched, which bombards the impurity such as the oxide, greasy dirt, particle of workpiece surface, to be removed,
The effect of cleaning sample can be played and by workpiece surface " feather plucking ", increase the roughness of workpiece surface, make plated film film layer with
The firmness of workpiece is promoted.
The surge chamber 3 is for accepting the charging tray sent out in more cathode continuous coating chambers 5, to coordinate front and back technique
Between workpiece transmission, be charging tray complete plated film after, enter cool down chamber 7 before transition chamber thereof.
In a preferred embodiment, the processing route upstream of the wash chamber 4 in coating apparatus also sets up another
The surge chamber (not shown) is the chamber that charging tray is stopped before entering wash chamber 4, can enter to avoid charging tray
Vacuum and pollution coating chamber are influenced when coating chamber.
In a preferred embodiment, the discharging device includes the specimen chamber 6 out set gradually according to processing route and goes out
Expect platform 10.The specimen chamber 6 out connects vacuum pump 13, and the pipeline of connection vacuum pump 13 is equipped with vacuum valve 14, the vacuum pump
13 form vacuum environment in the specimen chamber 6 out for making.Specimen chamber 6 can be identical as the structure of Sample Room 1 out.Specimen chamber 6 is support out
Transition chamber thereof of the disk after spreading out of cooling chamber, makes the environment of workpiece be converted into atmospheric environment from vacuum environment, with subsequent chamber
Room docking.
The inside of the discharging platform 10 is in atmospheric environment, for placing the charging tray for having workpiece, in case subsequent technique makes
With.Discharging platform 10 can be identical as the structure of loading bay 12, and details are not described herein.
Between loading bay 12 and Sample Room 1, go out that be all made of between specimen chamber 6 and discharging platform 10 is gate valve 11, Sample Room 1 with
Between wash chamber 4, between surge chamber 3 and cooling chamber 7 and cooling chamber 7 and what is be all made of between specimen chamber 6 out is vacuum
Partition apparatus 2.
In a preferred embodiment, as shown in figure 4, the transmission device includes transmission chamber 20, the transmission chamber
Transmission manipulator 21 is equipped in 20, the inside of transmission chamber 20 is vacuum environment, and transmission manipulator 21 is among vacuum environment,
Vacuum mechanical-arm can be used.The side wall of the transmission chamber 20 is provided with multiple carry interfaces；It can be hung by carry interface
Carry the processing chamber of different processing functions.In present embodiment, Sample Room 1, wash chamber 4, coating chamber 22, surge chamber 3, drop
Warm chamber 7 and out specimen chamber 6 pass through the carry interface carry in the side wall of the transmission chamber 20 respectively.The transmission machine
Hand 21 takes out workpiece from Sample Room 1, and the workpiece is then sequentially transmitted wash chamber 4, coating chamber according to processing route
22, surge chamber 3, cooling chamber 7 and the completion of specimen chamber 6 plated film processing out.In the present embodiment, can also with wash chamber
One surge chamber 3 of carry, effect are identical as embodiments mentioned above again for 4 adjacent positions.
In addition, magnetic-control sputtering continuous plating equipment is additionally provided with corresponding vacuum acquiring system, water gas system and control system.
13 groups of vacuum pump of vacuum acquiring system are connected to corresponding chamber by attachmentes such as pipeline, bellows, vacuum valves 14 or divide
On son pump.It is equipped with resistance in pipeline to regulate, the vacuum degree for measuring system.Water gas system provides cooling water, CDA for equipment
And Ar gas.Control system is broadly divided into hardware and software, is controlled by PLC and industrial personal computer equipment, realize automation and
Production manually.
In conclusion the magnetic-control sputtering continuous plating equipment of the application mainly has the advantage that
Pass through the coordinating operation between feeding device, coating apparatus, cooling chamber 7 and discharging device, the skill of the application
Art scheme, which is able to achieve, prepares the batch production of terbium film on neodymium iron boron magnetic body surface.Wherein, cooling chamber 7 by blower 71 and cools down
The inside of cooling chamber 7 is arranged in component, and forms following for gas flowing in the inside of the cooling chamber 7 by diversion component
Endless path r.To which the cold air formed by cooling-part flows through workpiece, hot gas, hot gas are formed after cooling down to workpiece
Body is flowed at cooling-part again by circulating path r, is formed cold air again after cooling, is looped back and forth like this.With magnetron sputtering
Filming equipment matches, and can prevent from being nitrogenized in an atmosphere when matrix high temperature, meanwhile, because blower 71, cooling-part with
And cold air and the entire circulating path r of hot gas formation are arranged at the inside of cooling chamber 7, cooling efficiency is high, meets
Requirement when magnetic-controlled sputtering coating equipment is produced in batches to cooling efficiency.
It successively carries out sputtering-cooling down-sputtering-cooling-sputtering alternation procedure using more cathode continuous coating chambers 5, it is real
During present continuous coating, each cathode assembly 51 cools down to it to 52 lower part of cooling component is gone to after matrix sputter coating,
After cooling then next cathode assembly 51 cools down again again to its sputter coating, and the purpose of side plating membrane edge cooling may be implemented.
The description that the utility model specific exemplary embodiment is presented in front is for the purpose of illustration and description.
The description of front is not intended to exhaustive, or the utility model is strictly limited to disclosed concrete form, it is clear that according to upper
Stating introduction may carry out many change and variations.It selects exemplary implementation scheme and is described to be to explain the utility model
Certain principles and practical application so that others skilled in the art can be realized and utilize the utility model
Various exemplary implementation schemes and its different selection forms and modification.The scope of the utility model is intended to be wanted by appended right
Book and its equivalent form is asked to be limited.
Claims (10)
1. a kind of magnetic-control sputtering continuous plating equipment, for preparing terbium film on neodymium iron boron magnetic body surface, which is characterized in that described
Magnetic-control sputtering continuous plating equipment includes feeding device, transmission device, coating apparatus, cool down chamber and discharging device, described
Feeding device, the coating apparatus, the cooling chamber and the discharging device according to processing route in pipeline-type successively
Setting；
Wherein, the feeding device is used to the charging of workpiece and is changed into environment locating for workpiece from atmospheric environment meet work
The vacuum environment that skill requires；
The coating apparatus is used to carry out magnetic-control sputtering continuous plating to the workpiece under vacuum environment；
The cooling chamber is for cooling down to the workpiece after the coating apparatus plated film；The transmission device is started building for band
Part is mobile according to the processing route.
2. magnetic-control sputtering continuous plating equipment as described in claim 1, which is characterized in that the inner space of the cooling chamber
It is provided with blower and heat exchanger；
The heat exchanger forms cold air for cooling down to the hot gas for flowing through the heat exchanger；
For the blower for making the cold air flow through the workpiece, the cold air forms institute after cooling down to the workpiece
State hot gas.
3. magnetic-control sputtering continuous plating equipment as claimed in claim 2, which is characterized in that the inner space of the cooling chamber
It is additionally provided with diversion component；
The diversion component is used to form the circulating path of gas flowing in the cooling chamber interior volume；
The blower and the heat exchanger are arranged on the circulating path, for making the cold air and the hot gas edge
The circulating path circulated in the cooling chamber interior.
4. magnetic-control sputtering continuous plating equipment as described in claim 1, which is characterized in that the transmission device includes:
Charging tray, for holding workpiece；
Transmission wheel is successively spaced setting along the processing route, is used to support and drives the charging tray along the processing route
It is lasting mobile；With
Driving device is transmitted, for driving the transmission wheel to rotate.
5. magnetic-control sputtering continuous plating equipment as claimed in claim 4, which is characterized in that the coating apparatus includes more cathodes
Continuous coating chamber, more cathode continuous coating chambers include multiple cathode assemblies and at least one cooling component, the yin
Pole component and the cooling component are successively arranged alternately along the processing route in the top of workpiece；The transmission device drives
Workpiece along the processing route in more cathode continuous coating chamber indoor movings, alternately to be sputtered to the workpiece and cold
But.
6. magnetic-control sputtering continuous plating equipment as claimed in claim 4, which is characterized in that the feeding device includes according to work
The loading bay and Sample Room that skill path is set gradually；
The inside of the loading bay is in atmospheric environment, for placing the charging tray for having workpiece；The Sample Room connects vacuum pump,
The vacuum pump forms vacuum environment for making in the Sample Room.
7. magnetic-control sputtering continuous plating equipment as claimed in claim 5, which is characterized in that the coating apparatus includes according to work
Wash chamber, more cathode continuous coating chambers and the surge chamber that skill path is set gradually；
The wash chamber is used to carry out Ion Cleaning to the workpiece；The surge chamber is continuously plated for accepting more cathodes
The charging tray sent out in membrane cavity room, to coordinate the workpiece transmission between the technique of front and back.
8. magnetic-control sputtering continuous plating equipment as claimed in claim 7, which is characterized in that in the coating apparatus, described
The processing route upstream of wash chamber also sets up another surge chamber.
9. magnetic-control sputtering continuous plating equipment as claimed in claim 4, which is characterized in that the discharging device includes according to work
What skill path was set gradually goes out specimen chamber and discharging platform；
The specimen chamber out connects vacuum pump, and the vacuum pump is for making the specimen chamber out is interior to form vacuum environment；The discharging platform
Inside be in atmospheric environment, for place have workpiece charging tray.
10. magnetic-control sputtering continuous plating equipment as described in claim 1, which is characterized in that the transmission device includes transmission
Chamber, the transmission chamber is interior to be equipped with transmission manipulator, and the side wall of the transmission chamber is provided with carry interface；
The feeding device, the coating apparatus, the cooling chamber and the discharging device pass through the carry respectively and connect
Side wall of the mouth carry in the transmission chamber；
The transmission manipulator is used to take out workpiece from the feeding device, then successively fills the workpiece in the plated film
It sets, transmitted between the cooling chamber and the discharging device.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201820643134.9U CN208917290U (en) | 2018-05-02 | 2018-05-02 | A kind of magnetic-control sputtering continuous plating equipment |
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| CN201820643134.9U CN208917290U (en) | 2018-05-02 | 2018-05-02 | A kind of magnetic-control sputtering continuous plating equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110629178A (en) * | 2019-09-24 | 2019-12-31 | 武汉长利新材料科技有限公司 | Energy-saving cathode cooling water utilization system for coated glass production line |
| CN110629186A (en) * | 2019-09-25 | 2019-12-31 | 李湘裔 | Continuous deposition device for electrochromic functional thin film device |
| CN110983334A (en) * | 2019-12-18 | 2020-04-10 | 宁波韵升股份有限公司 | Neodymium-iron-boron magnet composite nickel plating method |
| CN112575299A (en) * | 2019-09-27 | 2021-03-30 | 中国电子科技集团公司第四十八研究所 | Magnetron sputtering system suitable for infrared passivation film layer |
| CN112708866A (en) * | 2020-12-23 | 2021-04-27 | 青岛大学 | Flexible substrate continuous coating machine based on magnetron sputtering technology and coating method thereof |
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2018
- 2018-05-02 CN CN201820643134.9U patent/CN208917290U/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110629178A (en) * | 2019-09-24 | 2019-12-31 | 武汉长利新材料科技有限公司 | Energy-saving cathode cooling water utilization system for coated glass production line |
| CN110629186A (en) * | 2019-09-25 | 2019-12-31 | 李湘裔 | Continuous deposition device for electrochromic functional thin film device |
| CN112575299A (en) * | 2019-09-27 | 2021-03-30 | 中国电子科技集团公司第四十八研究所 | Magnetron sputtering system suitable for infrared passivation film layer |
| CN110983334A (en) * | 2019-12-18 | 2020-04-10 | 宁波韵升股份有限公司 | Neodymium-iron-boron magnet composite nickel plating method |
| CN112708866A (en) * | 2020-12-23 | 2021-04-27 | 青岛大学 | Flexible substrate continuous coating machine based on magnetron sputtering technology and coating method thereof |
| CN112708866B (en) * | 2020-12-23 | 2023-03-28 | 青岛大学 | Flexible substrate continuous coating machine based on magnetron sputtering technology and coating method thereof |
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