CN208848875U - Mechanical arm and transmission device - Google Patents
Mechanical arm and transmission device Download PDFInfo
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- CN208848875U CN208848875U CN201821849450.8U CN201821849450U CN208848875U CN 208848875 U CN208848875 U CN 208848875U CN 201821849450 U CN201821849450 U CN 201821849450U CN 208848875 U CN208848875 U CN 208848875U
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- mechanical arm
- vacuum
- cleaning
- robot body
- mouth
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The utility model provides a kind of mechanical arm and transmission device.Mechanical arm includes robot body and multiple vacuum chucks, wherein a plurality of vacuum line and a plurality of cleaning-drying pipeline are provided in robot body；Multiple vacuum chucks are located on robot body, and upper surface is higher than the upper surface of robot body, and vacuum suction mouth is equipped in vacuum chuck and is cleaned and dried mouth, and vacuum suction mouth is connected with vacuum line, is cleaned and dried mouth and is connected with pipeline is cleaned and dried.The utility model can greatly reduce the contact area of mechanical arm and wafer, vacuum chuck can be cleaned simultaneously to improve its cleannes by being cleaned and dried pipeline, it avoids then polluting wafer because mechanical arm is contaminated, ensure the accuracy to the metals content impurity measurement result of crystal column surface, facilitate the improvement of process yields, and the service life of mechanical arm and transmission device can effectively extend, and help to reduce production cost.
Description
Technical field
The utility model relates to field of semiconductor manufacture, more particularly to a kind of mechanical arm and transmission device.
Background technique
Chemical gaseous phase decomposition method (Vapor Phase Decomposition, abbreviation VPD) is wide in semiconductor manufacturing factory
General use is mainly used for carrying out the pre-treatment of crystal column surface metals content impurity, in order to the measurement of metals content impurity.Cause
And it is the accuracy for guaranteeing measurement result, used various equipment and instruments are both needed to keep height clear in chemical gaseous phase decomposable process
It is clean.In the preparation of chemical gaseous phase apportioned effort, wafer to be detected is usually to pass through mechanical arm to be transmitted to chemical gas
Phase decomposition is indoor, therefore mechanical arm very likely contacts contaminated wafer, and metallic pollution is passed to lower wafer.
Existing mechanical arm is usually flush, and the contact area of wafer and mechanical arm is very big in transmit process, thus one
Denier wafer is contaminated, then the contaminated probability in mechanical arm surface also sharply increases, so that mechanical arm is transmitting next platelet
The risk that bowlder pollutes increases.In addition, existing mechanical arm corrosion resistance is poor, once and mechanical arm is rotten
Erosion, it is not only possible to cause the pollution of wafer, and may cause wafer and dislocation occurs in transmit process or even falls.These are asked
Topic all can cause severe jamming to the measurement of metal impurities, will bring to later processing operation without accurate measurement result many
Hidden danger.
Utility model content
In view of the foregoing deficiencies of prior art, the purpose of this utility model is to provide a kind of mechanical arm and transmission
Device, the area for solving mechanical arm and wafer contacts in the prior art is excessive, causes mechanical arm by wafer contamination
A possibility that increase and pollution be transferred to subsequent wafer and existing mechanical arm is easy to be corroded, cause wafer to pass
Occur misplacing and introducing new pollution during sending, severe jamming is caused to the measurement of metal impurities or even to later processing operation band
The problems such as carrying out many hidden danger.
In order to achieve the above objects and other related objects, the utility model provides a kind of mechanical arm, the mechanical arm
Including robot body and multiple vacuum chucks, wherein be provided with a plurality of vacuum line and more in the robot body
Item is cleaned and dried pipeline；Multiple vacuum chucks are located on the robot body, and the upper surface of the vacuum chuck is high
In the upper surface of the robot body；It is equipped with vacuum suction mouth in the vacuum chuck and is cleaned and dried mouth, the vacuum
Adsorption orifice is connected with the vacuum line, and the cleaning-drying mouth is connected with the cleaning-drying pipeline.
Optionally, described to be cleaned and dried the annular through-hole that mouth includes the upper and lower surface through the vacuum chuck, the ring
Shape through-hole has interval around the vacuum suction mouth and with the vacuum suction mouth.
Optionally, the vacuum suction mouth is located at the center of the vacuum chuck；The cleaning-drying mouth be it is multiple, it is multiple
The circumferentially-spaced arrangement of vacuum suction mouth described in the cleaning-drying opening's edge, and there is interval with the vacuum suction mouth.
Optionally, the vacuum line, the vacuum chuck and the quantity for being cleaned and dried pipeline respectively include 3.
Optionally, the robot body surface is covered with corrosion-resistant coating.
Optionally, the robot body include the first noumenon part and be connected with the first noumenon part two
A yoke, two yokes extend outwardly from the first noumenon part and are in semi-circular shape between two yokes,
In, at least one described vacuum chuck is equipped on two yokes.
Optionally, the sum of top surface area of multiple vacuum chucks is less than the top surface area of the robot body.
Optionally, the vacuum chuck and the robot body are detachably connected.
More optionally, the vacuum chuck includes first part and the second part of upper and lower integrally connected, and described first
The vertical sectional shape divided is rectangle, and the cross-sectional shape of the second part is inverted trapezoidal；Multiple vacuum suction mouths and more
A cleaning-drying mouth first part and the second part up and down.
The utility model also provides a kind of transmission device, including the mechanical arm as described in above-mentioned either a program and
Transmission shaft and drive module, one end of the transmission shaft are connected with the mechanical arm, the drive module and the transmission
The other end of axis is connected.
As described above, the mechanical arm and transmission device of the utility model, have the advantages that the utility model
Mechanical arm and transmission device can greatly reduce the contact area of mechanical arm and wafer, reduce mechanical arm by wafer contamination
Area and may, thus reduce the metallic pollution caused by subsequent wafer, and can pass through periodic replacement vacuum chuck extend
The service life of mechanical arm reduces production cost；Meanwhile pipeline is cleaned and dried by setting, vacuum chuck is cleaned,
It can ensure that mechanical arm keeps cleaning, avoid polluting wafer, it is ensured that knot is measured to the metals content impurity of crystal column surface
The accuracy of fruit facilitates the raising of process yields so that subsequent specific aim of making according to testing result improves.
Detailed description of the invention
Fig. 1 is shown as the main view of the mechanical arm of the utility model.
Fig. 2 is shown as an illustration structural schematic diagram of the vacuum chuck of the mechanical arm of the utility model
Fig. 3 is shown as the connection of the vacuum chuck and vacuum line and cleaning-drying pipeline of the mechanical arm of the utility model
Schematic diagram.
Fig. 4 is shown as the vacuum chuck of the mechanical arm of the utility model and the one of robot body illustrates connection type
Schematic diagram.
Fig. 5 is shown as the structural schematic diagram of the transmission device of the utility model.
Component label instructions
1 mechanical arm
11 robot bodies
111 the first noumenon parts
112 yokes
12 vacuum lines
13 vacuum chucks
The first part of 13a vacuum chuck
The second part of 13b vacuum chuck
131 inner rings
132 outer rings
133 vacuum suction mouths
134 are cleaned and dried mouth
14 are cleaned and dried pipeline
21 transmission shafts
22 drive modules
Specific embodiment
The embodiments of the present invention is illustrated by particular specific embodiment below, those skilled in the art can be by this
Content disclosed by specification understands other advantages and effect of the utility model easily.
Fig. 1 is please referred to Fig. 5.It should be clear that this specification structure depicted in this specification institute accompanying drawings, ratio, size etc., only to
Cooperate the revealed content of specification, so that those skilled in the art understands and reads, is not intended to limit the utility model
Enforceable qualifications, therefore do not have technical essential meaning, the modification of any structure, the change of proportionate relationship or size
Adjustment, in the case where not influencing the effect of the utility model can be generated and the purpose that can reach, should all still fall in the utility model
In the range of revealed technology contents can be covered.Meanwhile in this specification it is cited as "upper", "lower", " left side ",
The term on " right side ", " centre " and " one " etc. is merely convenient to being illustrated for narration, rather than enforceable to limit the utility model
Range, relativeness are altered or modified, implementable when being also considered as the utility model under the change of no substantial technological content
Scope.And for the purpose for making simplified form, in diagram described in this specification repeating label is not done to same structure generally.
As shown in Figures 1 to 4, the utility model provides a kind of mechanical arm 1, and the mechanical arm 1 includes mechanical arm
Ontology 11 and multiple vacuum chucks 13, wherein a plurality of vacuum line 12 and a plurality of clear is provided in the robot body 11
Wash drying pipeline 14；Multiple vacuum chucks 13 are located on the robot body 11, the upper table of the vacuum chuck 13
Face is higher than the upper surface of the robot body 11, and vacuum suction mouth 133 is equipped in the vacuum chuck 13 and is cleaned and dried
Mouth 134, the vacuum suction mouth 133 is connected with the vacuum line 12, the cleaning-drying mouth 134 and the cleaning-drying
Pipeline 14 is connected.It is fixed brilliant by the vacuum chuck 13 for the multiple protrusions being arranged on the robot body 11
Circle, greatly to reduce the contact area of mechanical arm 1 and wafer, reduce mechanical arm 1 by the area of wafer contamination and may, from
And reduce the metallic pollution caused by subsequent wafer；Meanwhile by the way that the cleaning-drying pipeline 14 is arranged to the vacuum chuck
13 are cleaned, it can be ensured that mechanical arm 1 keeps cleaning, avoids polluting wafer, it is ensured that miscellaneous to the metal of crystal column surface
The accuracy of matter content measurement result facilitates mentioning for process yields so that subsequent specific aim of making according to testing result improves
It is high.
As an example, in the present embodiment, the vacuum line 12, the vacuum chuck 13 and the cleaning-drying pipeline 14
Quantity it is consistent, particular number can according to need setting, but multiple vacuum chucks 13 are preferably not on the same line,
In favor of fixed wafer.In the present embodiment, the vacuum line 12, the vacuum chuck 13 and described it is cleaned and dried pipeline 14
Quantity respectively includes 3.3 vacuum chucks 13 not on the same line, can be by wafer by 3 vacuum chucks 13
Firmly it is adsorbed on the surface of the mechanical arm 1.Certainly, the mechanical arm 1 during the work time, i.e., transmission wafer mistake
Cheng Zhongxu is connected to vacuum absorption device (not shown), such as vacuum pump, to provide adsorption capacity to the vacuum chuck 13.It is multiple
The vacuum chuck 13 can connect to the same vacuum absorption device, can also be respectively connected to different vacuum suction dresses
It sets, specifically with no restrictions.It is considered from the angle of cost, multiple vacuum chucks 13 is preferably connected to the same vacuum suction and are filled
It sets, and multiple vacuum lines 12 can be connected and then be convergeed to and same vacuum line 12 and be ultimately connected to same
A vacuum absorption device, in favor of the simplification of 1 internal structure of mechanical arm, convenient for the machining of the mechanical arm 1.
It is cleaned and dried pipeline 14 likewise, the cleaning-drying pipeline 14 can also be interconnected and then converge to same and is cleaning
It is connected to same cleaning liquid/gas feed line during drying operation, in favor of the simplification of operation.
Fig. 2 illustrates a structural schematic diagram of the vacuum chuck 13.As shown in Fig. 2, being equipped in the vacuum chuck 13
The vacuum suction mouth 133 and the cleaning-drying mouth 134, the vacuum suction mouth 133 are located in the vacuum chuck 13
The heart, it is described to be cleaned and dried the annular through-hole that mouth 134 includes the upper and lower surface through the vacuum chuck 13, the annular through-hole ring
There is interval around the vacuum suction mouth 133 and with the vacuum suction mouth 133, i.e., the described vacuum chuck 13 is inhaled by the vacuum
Attached mouth 133 and the cleaning-drying mouth 134 interval form inner ring 131 and outer ring 132, and the cleaning-drying mouth 134 is located at institute
It states between inner ring 131 and the outer ring 132.Certainly, in other examples, the cleaning on the single vacuum chuck 13 is dry
Dry mouth 134 can be multiple, multiple mouths 134 that are cleaned and dried along the circumferentially-spaced arrangement of the vacuum suction mouth 133, and with
The vacuum suction mouth 133 has interval or multiple sizes for being cleaned and dried mouth 134, including height and/or lateral ruler
It is very little can be different, do not do stringent limitation in the present embodiment.Usually height is consistent and has with the outer ring 132 for the inner ring 131
There is certain thickness, so that the vacuum chuck 13 has the surface area of certain carrying wafer, but multiple vacuum chucks 13
Upper face product much smaller than the robot body 11 upper face product so that the vacuum chuck 13 transmits wafer
When and the contact area of wafer greatly reduce, thus the wafer that can greatly reduce 1 pair of mechanical arm transmission pollutes
Possibility, and the cleaning-drying pipeline 14 is connected to the inner ring 131 and the outer ring from the bottom of the vacuum chuck 13
The cleaning-drying mouth 134 between 132.The vacuum suction mouth 133 of the vacuum chuck 13 is located at the inner ring 131
Interior, diameter can according to need setting, such as between 0.5~2cm, and the height of the vacuum chuck 13 can also basis
Need to be arranged, for example, make the vacuum chuck 13 upper surface be higher than the robot body 11 0.1~1cm of upper surface it
Between.The design parameter setting of each structure can also have other selections, not do stringent limitation in the present embodiment.Certainly, at other
In example, the structure of the vacuum chuck 13 can also have other selections, not do stringent limitation in the present embodiment, such as described true
The cross section along longitudinal direction of suction disk 13 can be trapezoidal, and the upper opening of vacuum suction mouth 133 is less than lower openings, in this way
Structure design be conducive to improve the vacuum adsorption force of the vacuum chuck 13, advantageously reduce the power consumption of vacuum absorption device.
And in the present embodiment, the silicon rubber suction cup of the 13 preferably clear material of vacuum chuck, because of the patch between silicon rubber suction cup and wafer
Attached property is relatively good, and transparent material whether there is deformation and/or pollution convenient for finding the vacuum chuck 13 in time, so as to timely
Cleaning is remedied, and avoids polluting wafer and influencing detection effect.The specification and material of the vacuum chuck 13 can also have
Other are selected, and do not do stringent limitation in the present embodiment.
Fig. 3 illustrates the connection of vacuum chuck 13 and the vacuum line 12 and the cleaning-drying pipeline 14 in Fig. 2
Schematic diagram.As shown in figure 3, the pipeline 14 that is cleaned and dried is connected to the inner ring 131 of the vacuum chuck 13 and described outer
The cleaning-drying mouth 134 between circle 132, and the lateral dimension for being cleaned and dried pipeline 14 is less than the cleaning-drying mouth
134 lateral dimension, to ensure the stable structure of the vacuum chuck 13.The cleaning-drying pipeline 14 can be only along described interior
The circumferential portion distribution of circle 131；The cleaning-drying pipeline 14 is also segmented into several segments, as long as ensuring to be cleaned and dried range energy
The all areas of the vacuum chuck 13 are covered, do not do stringent limitation in the present embodiment.The vacuum of the vacuum chuck 13
Adsorption orifice 133 is connected with the vacuum line 12.It is described true during carrying out washing and cleaning operation to the mechanical arm 1
Direction shown in arrow is continually fed into gas, such as nitrogen along Fig. 3 in blank pipe road 12, to avoid the liquid in cleaning process into
The gas for entering in the vacuum line 12, while being passed through also can be to the surface of the inner ring 131 of the vacuum chuck 13
It is cleaned, this will be continued to introduce in subsequent content.
The material of main part of the robot body 11 can be the non-metallic materials such as ceramics, silicon carbide or quartz, but be
Enhance the Corrosion Protection of the mechanical arm 1, is caused during transmitting wafer to wafer to avoid the mechanical arm 1
It pollutes and the mechanical arm 1 is avoided to be corroded in the process of cleaning, as an example, 11 surface of the robot body covers
Have corrosion-resistant coating, such as a Teflon layer or other epoxy resin material layers etc., and thickness can between 1~10mm it
Between.The corrosion-resistant coating can also improve the cushion performance on 1 surface of mechanical arm in addition to playing corrosion-resisting function, with
Wafer is also unlikely to crash when touching robot body 11.In addition, the corrosion-resistant coating can be processed
Vacuum chuck 13 described in Cheng Zhonghe preferably combines, thus the vacuum chuck 13 can more securely be located at the mechanical arm sheet
On body 11, the stability of the mechanical arm 1 is improved.The vacuum chuck 13 can be material same with the corrosion-resistant coating
Matter, thus the vacuum chuck 13 can be integrally machined molding with the corrosion-resistant coating, if reserved in processing with it is described
It is cleaned and dried the position that pipeline 14 is connected.In the present embodiment, as an example, the vacuum chuck 13 and the manipulator
Arm body 11 is detachably connected, thus the vacuum chuck 13 can use the material different with the corrosion-resistant coating.Show one
In example, as shown in figure 4, the first part 13a of the vacuum chuck 13 including upper and lower integrally connected and second part 13b, described
The vertical sectional shape of first part 13a is rectangle, and the cross-sectional shape of the second part 13b is inverted trapezoidal；It is multiple described true
Empty adsorption orifice 133 and multiple cleaning-drying mouths 134 the first part 13a and second part 13b up and down.Institute
The robot body 11 can be stretched to by stating second part 13b, for example extend into the described of the robot body 11
In corrosion-resistant coating, in the case where the extruding of the corrosion-resistant coating is fixed, the corrosion-resistant coating is for example same to be buckled the vacuum chuck 13
Fixed, the region in Fig. 4 where dotted line is also the region of the robot body 11 simultaneously.It is detachably connected so that described
When vacuum chuck 13 breakage occurs or needs to change specification and result in the need for replacing the vacuum chuck 13, by the vacuum chuck 13
It is dismantled from the robot body 11, it is very easy to use, it is possible thereby to greatly extend making for the mechanical arm 1
With the service life, production cost is reduced.Certainly, the vacuum chuck 13 and the robot body 11 can also have other connections
Mode, such as can be in setting groove on the robot body 11 to be used to fix the vacuum chuck 13, or pass through
Other retaining elements fix the two, and considered critical is not done in the present embodiment.
The robot body 11 can be any shape, as long as the vacuum chuck 13 for being located at its surface being capable of jail
Jail absorption wafer.As an example, in the present embodiment, the robot body 11 include the first noumenon part 111 and with
Two yokes 112 that the first noumenon part 111 is connected, two yokes 112 from the first noumenon part 111 to
It is in semi-circular shape between outer extension and two yokes 112, wherein be equipped at least one institute on two yokes 112
Vacuum chuck 13 is stated, and further, the first noumenon part 111 and two yokes 112 are integrally formed, thus institute
It states and has no substantive line of demarcation between robot body 11 and the yoke 112.Certainly, in other examples, the yoke
112 can also be flexibly connected with the first noumenon part 111, to replace the yoke 112 as needed or in the yoke
112 replace in time when damaging, and do not do stringent limitation in the present embodiment.Hollow semi-cylindrical between two yokes 112
The specification of diameter and the entire mechanical arm 1 matches, but is less than and need to transmit brilliant diameter of a circle, on each yoke 112
With vacuum chuck 13 described at least one, and end of the vacuum chuck 13 apart from the yoke 112, i.e., far from described
Still there is certain distance in one end of one body part 111, for example is greater than 2cm, and 2 vacuum on two yokes 112
Sucker 13 is preferably equal with the spacing of the first noumenon part 111.Such structure can make wafer and the manipulator
The contact area of arm 1 still is able to firmly adsorb wafer in the case where further decreasing, and passes through to avoid contaminated wafer described
Mechanical arm 1 reaches subsequent wafer, avoids introducing new pollution sources to interfere to testing result.The machinery of the utility model
Arm is particularly suitable for transmitting in operation the very high wafer of purity requirements, for example wafer to be detected is sent to gas-phase decomposition
Room carries out in the transmission operation of metallic pollution detection.Wafer is transmitted using the mechanical arm of the utility model, it can be to avoid to crystalline substance
Circle pollutes, it is ensured that the accuracy of the metals content impurity measurement result of crystal column surface, so as to it is subsequent according to testing result
Specific aim improvement is made, the raising of process yields is facilitated.
For the cleanliness for keeping the mechanical arm 1 as far as possible, usually it is every transmitted wafer after all need to the machine
Tool arm 1 carries out cleaning-drying operation, can be readily accomplished this using the cleaning-drying pipeline 14 on the mechanical arm 1
Washing and cleaning operation process.For example, the mechanical arm 1 moves to individually clear after the mechanical arm 1 has transported wafer
Cavity is washed, and closes the cavity.Then the cleaning-drying pipeline 14 is connected to liquid rinse pipeline, such as hydrofluoric acid pipeline
It is cleaned；The vacuum line 12 is connected to a gas source, such as a source nitrogen, liquid rinse water pipe line spraying cleaning liquid
It is into the cleaning-drying mouth 134 between the inner ring 131 and the outer ring 132 of the vacuum chuck 13 and described
The upper surface of vacuum chuck 13 is to clean the vacuum chuck 13, i.e., cleaning liquid passes through the cleaning-drying pipeline 14
Into the outside of the inner ring 131 for being cleaned and dried 134 pairs of the mouth vacuum chucks 13, the outer ring 132 inside into
Row cleaning, while also spilling into the upper surface of the inner ring 131 and the upper surface of the outer ring 132 and outside and the machinery
The surface of arm ontology 11 is cleaned comprehensively, and the vacuum line 12 is persistently sprayed along the direction of the vacuum suction mouth 133
It emanates body, to prevent cleaning liquid in cleaning process from entering in the vacuum line 12, and gas sprinkling process is preferably always
Being extended to entire cleaning-drying operation terminates, and the process of gas sprinkling is also the vacuum suction mouth to the vacuum chuck
The 133 i.e. inside of the inner ring 131 carries out clean process.After a predetermined time stop hydrofluoric acid supply and will it is described clearly
It washes drying pipeline 14 and is connected to deionized water (DIW) pipeline to remove acid liquor residue, be next then connected to dry gas
Pipeline, such as nitrogen pipeline are dried.UV lamp is opened in last cavity to dry the surface of the mechanical arm 1, and is recycled
Waste liquid and exhaust gas.Certainly, there can also be other selections according to need to the cleaning-drying operation of the mechanical arm 1, such as can be with
It selects other acidic cleaning solutions to clean or only cleaned with deionized water, does not do stringent limitation in the present embodiment.
As shown in figure 5, the utility model also provides a kind of transmission device, it can be used for transmitting wafer and other substrates.It is described
Transmission device includes the mechanical arm 1 as described in above-mentioned either a program and transmission shaft 21 and drive module 22, the transmission
One end of axis 21 is connected with the mechanical arm 1, and the other end of the transmission shaft 21 is connected with the drive module 22.Institute
Transmission shaft 21 and the mechanical arm 1 are stated to be detachably connected, such as can be by the machine when cleaning to the mechanical arm 1
Tool arm 1 disassembles individually cleaning or replacement, and the other parts to the transmission device is avoided to impact.The transmission shaft
21 and the mechanical arm 1 can be and be fixed by screws, when being fixed by screws, the mechanical arm 1 can
Customization screw hole in advance；The transmission shaft 21 can be connected with the mechanical arm 1 with nested type, i.e., the described transmission shaft 21 with
One end that the mechanical arm 1 is connected has bayonet, the mechanical arm 1 can be entangled, the transmission shaft 21 and described
Mechanical arm 1 can also have other connection types, specifically with no restrictions.
As an example, the transmission shaft 21 can be single shaft, i.e., only one section, it is also possible to be interconnected by multistage fulcrum
It forms, for example by 2 sections, 3 sections or more of fulcrum is connected in sequence, and is flexibly connected between multiple fulcrums, it can be according to need
It moves to adjust the length of the transmission shaft 21, it is possible thereby to adjust the transmittable distance of the mechanical arm 1.
The drive module 22 may include cylinder and servo motor, adjustable by the movement of cylinder in above-below direction
Thus the height of the transmission shaft 21 adjusts the transmission height of the mechanical arm 1.Other structures of the transmission device and existing
Have that technology is identical, it is specifically not reinflated.The transmission that wafer is carried out using the transmission device of the utility model, can greatly reduce crystalline substance
Round and mechanical arm contact area reduces the possibility that transmission device pollutes wafer, facilitates the raising of production yield,
And because the service life of mechanical arm is effectively extended the service life extension so that entire transmission device, help to reduce being produced into
This.
In conclusion the utility model provides a kind of mechanical arm and transmission device.The mechanical arm includes manipulator
Arm body and multiple vacuum chucks, wherein a plurality of vacuum line and a plurality of cleaning-drying are provided in the robot body
Pipeline；Multiple vacuum chucks are located on the robot body, and the upper surface of the vacuum chuck is higher than the machinery
The upper surface of arm ontology；It is equipped with vacuum suction mouth in the vacuum chuck and is cleaned and dried mouth, the vacuum suction mouth and institute
It states vacuum line to be connected, the cleaning-drying mouth is connected with the cleaning-drying pipeline.The mechanical arm of the utility model
Can greatly reduce the contact area of mechanical arm and wafer with transmission device, reduce mechanical arm by the area of wafer contamination and
May, to reduce the metallic pollution caused by subsequent wafer；Meanwhile pipeline is cleaned and dried by setting, vacuum chuck is carried out
Cleaning, it can be ensured that mechanical arm keeps cleaning, avoids polluting wafer, it is ensured that the metals content impurity of crystal column surface is surveyed
The accuracy of result is measured, so that subsequent specific aim of making according to testing result improves, facilitates the raising of process yields, in addition,
Vacuum chuck can be replaced as needed, and the mechanical arm of the utility model and the service life of transmission device are shown
It writes and extends, greatly reduction production cost.So the utility model effectively overcomes various shortcoming in the prior art and has height
Value of industrial utilization.
The above embodiments are only illustrative of the principle and efficacy of the utility model, and not for limitation, this is practical new
Type.Any person skilled in the art can all carry out above-described embodiment under the spirit and scope without prejudice to the utility model
Modifications and changes.Therefore, such as those of ordinary skill in the art without departing from the revealed essence of the utility model
All equivalent modifications or change completed under mind and technical idea, should be covered by the claim of the utility model.
Claims (10)
1. a kind of mechanical arm characterized by comprising
Robot body is provided with a plurality of vacuum line and a plurality of cleaning-drying pipeline in the robot body；
Multiple vacuum chucks are located on the robot body, and the upper surface of the vacuum chuck is higher than the mechanical arm
The upper surface of ontology；It is equipped with vacuum suction mouth in the vacuum chuck and is cleaned and dried mouth, the vacuum suction mouth and described true
Blank pipe road is connected, and the cleaning-drying mouth is connected with the cleaning-drying pipeline.
2. mechanical arm according to claim 1, it is characterised in that: the cleaning-drying mouth includes inhaling through the vacuum
The annular through-hole of the upper and lower surface of disk, between the annular through-hole has around the vacuum suction mouth and with the vacuum suction mouth
Every.
3. mechanical arm according to claim 1, it is characterised in that: the vacuum suction mouth is located at the vacuum chuck
Center；The cleaning-drying mouth is multiple, multiple circumferentially-spaced arrangements for being cleaned and dried vacuum suction mouth described in opening's edge, and
There is interval with the vacuum suction mouth.
4. mechanical arm according to claim 1, it is characterised in that: the vacuum line, the vacuum chuck and described
The quantity for being cleaned and dried pipeline respectively includes 3.
5. mechanical arm according to claim 1, it is characterised in that: the robot body surface is covered with anticorrosion
Layer.
6. mechanical arm according to claim 1, it is characterised in that: the robot body includes the first noumenon part
Two yokes being connected with the first noumenon part, two yokes extend outwardly from the first noumenon part and
Two yokes are in semi-circular shape, wherein at least one described vacuum chuck is equipped on two yokes.
7. mechanical arm according to claim 1, it is characterised in that: the sum of top surface area of multiple vacuum chucks is small
In the top surface area of the robot body.
8. mechanical arm according to claim 1, it is characterised in that: the vacuum chuck and the robot body can
Dismantling connection.
9. mechanical arm according to claim 8, it is characterised in that: the vacuum chuck includes the of upper and lower integrally connected
A part and second part, the vertical sectional shape of the first part are rectangle, and the cross-sectional shape of the second part is to fall
It is trapezoidal；Multiple vacuum suction mouths and multiple cleaning-drying mouths first part and second described up and down
Point.
10. a kind of transmission device characterized by comprising
Mechanical arm as described in any one of claim 1 to 9；
Transmission shaft, one end of the transmission shaft are connected with the mechanical arm；And
Drive module is connected with the other end of the transmission shaft.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821849450.8U CN208848875U (en) | 2018-11-09 | 2018-11-09 | Mechanical arm and transmission device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821849450.8U CN208848875U (en) | 2018-11-09 | 2018-11-09 | Mechanical arm and transmission device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208848875U true CN208848875U (en) | 2019-05-10 |
Family
ID=66376825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821849450.8U Expired - Fee Related CN208848875U (en) | 2018-11-09 | 2018-11-09 | Mechanical arm and transmission device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208848875U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111554595A (en) * | 2020-05-11 | 2020-08-18 | 上海果纳半导体技术有限公司 | Semiconductor chip preparation device |
| TWI828351B (en) * | 2022-01-28 | 2024-01-01 | 大陸商西安奕斯偉材料科技股份有限公司 | Wafer sorting equipment and wafer sorting method |
-
2018
- 2018-11-09 CN CN201821849450.8U patent/CN208848875U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111554595A (en) * | 2020-05-11 | 2020-08-18 | 上海果纳半导体技术有限公司 | Semiconductor chip preparation device |
| CN111554595B (en) * | 2020-05-11 | 2021-03-23 | 上海果纳半导体技术有限公司 | Semiconductor chip preparation device |
| TWI828351B (en) * | 2022-01-28 | 2024-01-01 | 大陸商西安奕斯偉材料科技股份有限公司 | Wafer sorting equipment and wafer sorting method |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190510 |