CN208752392U - A kind of double-sided exposure digital laser direct write equipment - Google Patents

A kind of double-sided exposure digital laser direct write equipment Download PDF

Info

Publication number
CN208752392U
CN208752392U CN201821604570.1U CN201821604570U CN208752392U CN 208752392 U CN208752392 U CN 208752392U CN 201821604570 U CN201821604570 U CN 201821604570U CN 208752392 U CN208752392 U CN 208752392U
Authority
CN
China
Prior art keywords
exposure
double
workpiece
exposure system
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201821604570.1U
Other languages
Chinese (zh)
Inventor
朱道龙
刘金武
张雷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yuanzhuo Micro Nano Technology Suzhou Co ltd
Original Assignee
Suzhou Source Photoelectric Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suzhou Source Photoelectric Technology Co Ltd filed Critical Suzhou Source Photoelectric Technology Co Ltd
Priority to CN201821604570.1U priority Critical patent/CN208752392U/en
Application granted granted Critical
Publication of CN208752392U publication Critical patent/CN208752392U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The utility model discloses a kind of double-sided exposure digital laser direct write equipment, including exposure system A, exposure system B, workpiece and equipment platform to be exposed, exposure system A and exposure system B are respectively arranged on the left side and the right side on equipment platform, exposure system A and exposure system B middle position are equipped with workpiece to be exposed, a kind of double-sided exposure digital laser direct write equipment of the utility model, exposure aligning component A and exposure aligning component B are moved under the drive of respective kinematic axis, when workpiece to be exposed needs double-sided exposure, can contraposition exposure task be completed from two sides simultaneously, since exposure process only needs clamped one time and contraposition, production efficiency significantly improves, solve the prior art exposure machine can only single single side exposure Existing Defects and impossible task, there are clear superiorities on double-sided exposure.

Description

A kind of double-sided exposure digital laser direct write equipment
Technical field:
The utility model relates to exposure sources technical field more particularly to a kind of double-sided exposure digital laser direct write equipment.
Background technique:
Currently, screen printing technology has extensively in industries such as PCB industry, FPD industry, integrated antenna package, photovoltaics General application.Traditional halftone production is the problem of using film technique, will print and figure is made on film egative film, then uses Text, pattern exposure, are replicated in by traditional parallel exposing machine and are coated with by mask plate of the film egative film as text and pattern On the silk screen of photoresists, then by techniques such as development, cleanings, the text and pattern of printing mother matrix are formed on silk screen.It is very aobvious So, there are complex process and the not easy to control, inherent defects such as film higher cost, production capacity are low for traditional production method.It is close Nian Lai has been shaped on optics and mechanical structure substantially based on the laser direct writing system that digital micro-mirror is core component, and Traditional film technique is just gradually being substituted with its cheap cost and the efficient clearly advantages such as printing effect.However, existing Laser direct-writing formula exposure machine still remains the disadvantages of working efficiency is low, system suitability is not strong.
Utility model content:
In view of the above-mentioned problems, the technical problem to be solved by the present invention is to provide a kind of double-sided exposure digital laser direct writes Equipment, including exposure system A, exposure system B, workpiece to be exposed and equipment platform, the left and right sides is respectively on the equipment platform It is equipped with equipped with exposure system A and exposure system B, the exposure system A and exposure system B middle position and is fixed on equipment platform On workpiece to be exposed, the exposure system A be equipped with the first exposure aligning component, the first kinematic axis and second motion shaft, institute Exposure system B is stated equipped with the second exposure aligning component, third motion shaft and the 4th kinematic axis, the first exposure aligning component It moves under the driving of the first kinematic axis along Y-direction, is moved in X direction under the driving of second motion shaft, second exposure Contraposition component moves under the driving of third motion shaft along Y-direction, moves in X direction under the driving of the 4th kinematic axis.
Preferably, the workpiece to be exposed is fixed on equipment platform by workpiece sucker.
Preferably, the workpiece to be exposed is fixed on equipment platform by fixture.
The utility model the utility model has the advantages that the utility model a kind of double-sided exposure digital laser direct write equipment, exposure aligning Component A and exposure aligning component B are moved under the drive of respective kinematic axis, and equipment components are carried out in the case where being uniformly controlled and cooperating Respectively movement, and then exposure task is completed, exposure system A is identical but mutually independent structural system, the two with exposure system B It can work interference-free each other, improve work efficiency from two sides simultaneously.It, can be simultaneously when workpiece to be exposed needs double-sided exposure Contraposition exposure task is completed from two sides, since exposure process only needs clamped one time and contraposition, exposure process is succinct, production efficiency is bright Aobvious raising, film speed are accelerated, and the position precision of exposure figure can reach a quite high level, and product yield substantially mentions Rise, solve the prior art exposure machine can only single single side exposure Existing Defects and impossible task, in two-sided exposure There are clear superiorities on light.
Detailed description of the invention:
The present invention is described in detail by the following detailed description and drawings for ease of explanation,.
Fig. 1 is the utility model of the whole structure diagram;
Fig. 2 is exposure aligning component B structure schematic diagram;
Fig. 3 is original laser direct-writing formula exposure machine structure schematic diagram.
In figure: 1- exposure system A;2- exposure system B;3- workpiece to be exposed;4- equipment platform;5- the first exposure aligning group Part;The first kinematic axis of 6-;7- second motion shaft;8- the second exposure aligning component;9- third motion shaft;The 4th kinematic axis of 10-; 11- workpiece sucker.
Specific embodiment:
To make the objectives, technical solutions and advantages of the present invention clearer, below by shown in the accompanying drawings Specific embodiment describes the utility model.However, it should be understood that these descriptions are merely illustrative, and it is not intended to limit this reality With novel range.In addition, in the following description, descriptions of well-known structures and technologies are omitted, to avoid unnecessarily mixing Confuse the concept of the utility model.
As shown in Figure 1-3, a kind of double-sided exposure digital laser direct write equipment of the utility model, including exposure system A1, Exposure system B2, workpiece to be exposed 3 and equipment platform 4, be respectively arranged on the left side and the right side on the equipment platform 4 exposure system A1 and Exposure system B2, the exposure system A1 and exposure system B2 middle position are to be exposed on equipment platform 4 equipped with being fixed on Workpiece 3, the exposure system A1 are equipped with the first exposure aligning component 5, the first kinematic axis 6 and second motion shaft 7, the exposure System B2 is equipped with the second exposure aligning component 8, third motion shaft 9 and the 4th kinematic axis 10, the first exposure aligning component 5 It moves under the driving of the first kinematic axis 6 along Y-direction, is moved in X direction under the driving of second motion shaft 7, described second exposes Light contraposition component 8 moves under the driving of third motion shaft 9 along Y-direction, moves in X direction under the driving of the 4th kinematic axis 10 It is dynamic.
Specifically, workpiece 3 to be exposed is fixed on equipment platform by workpiece sucker 11 or fixture.
Existing laser direct-writing formula exposure machine, structure as shown in figure 3, mainly include exposure aligning component, transverse movement axis, The major parts such as longitudinal movement axis, workpiece to be exposed and equipment platform, exposure aligning component are moved down in the drive of transverse movement axis Dynamic, workpiece to be exposed moves under the drive of longitudinal movement axis, and equipment components are respectively acted in the case where being uniformly controlled and cooperating, And then complete exposure task.But when workpiece to be exposed needs double-sided exposure, workpiece especially to be exposed is transparent materials, is used This equipment process is bound to extremely complex, it is necessary to after completing wherein one side exposure work, manual or automatic overturning workpiece to be exposed, and warp Its in addition one side is exposed after secondary clamping, secondary contraposition again.It is clear that there are exposure process is cumbersome, production for this production process Low efficiency, the disadvantages of exposure figure position precision is low, product rejection rate is high, in addition to the products of certain high-precision requirements without Method normally completes production task.
As shown in Figs. 1-2, a kind of double-sided exposure digital laser direct write equipment of the utility model, exposure aligning component A1 and Exposure aligning component B2 is moved under the drive of respective kinematic axis, and workpiece 3 to be exposed is fixed by workpiece sucker 11, equipment components It is respectively acted in the case where being uniformly controlled and cooperating, and then completes exposure task, exposure system A1 is identical with exposure system B2 But mutually independent structural system, the two can be interference-free each other from two sides work simultaneously, improve work efficiency.
When workpiece to be exposed needs double-sided exposure, exposure aligning component A1, exposure aligning component B2 are respectively simultaneously Under the control and cooperation of system, contraposition exposure task is completed from two sides, since exposure process only needs clamped one time and contraposition, exposes work Sequence is succinct, production efficiency significantly improves, and film speed is accelerated, and the position precision of exposure figure can reach a quite high water Flat, product yield is substantially improved.
Using the technical program, solve the prior art exposure machine can only the exposure of single single side Existing Defects and can not The task of completion, there are clear superiorities on double-sided exposure.
The basic principles and main features of the present invention and the advantages of the present invention have been shown and described above.Current row The technical staff of industry is described in above embodiments and description it should be appreciated that the present utility model is not limited to the above embodiments Only illustrate the principles of the present invention, on the premise of not departing from the spirit and scope of the utility model, the utility model is also It will have various changes and improvements, these various changes and improvements fall within the scope of the claimed invention.The utility model Claimed range is defined by the appending claims and its equivalent thereof.

Claims (3)

1. a kind of double-sided exposure digital laser direct write equipment, which is characterized in that including exposure system A, exposure system B, to be exposed Workpiece and equipment platform are respectively arranged on the left side and the right side exposure system A and exposure system B, the exposure system on the equipment platform System A and exposure system B middle position are equipped with the workpiece to be exposed being fixed on equipment platform, and the exposure system A is equipped with First exposure aligning component, the first kinematic axis and second motion shaft, the exposure system B be equipped with the second exposure aligning component, Third motion shaft and the 4th kinematic axis, the first exposure aligning component move under the driving of the first kinematic axis along Y-direction, It is moved in X direction under the driving of second motion shaft, the second exposure aligning component is under the driving of third motion shaft along Y-direction It is mobile, it is moved in X direction under the driving of the 4th kinematic axis.
2. a kind of double-sided exposure digital laser direct write equipment according to claim 1, it is characterised in that: the work to be exposed Part is fixed on equipment platform by workpiece sucker.
3. a kind of double-sided exposure digital laser direct write equipment according to claim 1, it is characterised in that: the work to be exposed Part is fixed on equipment platform by fixture.
CN201821604570.1U 2018-09-29 2018-09-29 A kind of double-sided exposure digital laser direct write equipment Active CN208752392U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201821604570.1U CN208752392U (en) 2018-09-29 2018-09-29 A kind of double-sided exposure digital laser direct write equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201821604570.1U CN208752392U (en) 2018-09-29 2018-09-29 A kind of double-sided exposure digital laser direct write equipment

Publications (1)

Publication Number Publication Date
CN208752392U true CN208752392U (en) 2019-04-16

Family

ID=66085422

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201821604570.1U Active CN208752392U (en) 2018-09-29 2018-09-29 A kind of double-sided exposure digital laser direct write equipment

Country Status (1)

Country Link
CN (1) CN208752392U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111176080A (en) * 2020-02-26 2020-05-19 深圳市欣光辉科技有限公司 CCD line automatic exposure machine
CN112631087A (en) * 2021-01-25 2021-04-09 苏州源卓光电科技有限公司 Double-face processing system and processing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111176080A (en) * 2020-02-26 2020-05-19 深圳市欣光辉科技有限公司 CCD line automatic exposure machine
CN112631087A (en) * 2021-01-25 2021-04-09 苏州源卓光电科技有限公司 Double-face processing system and processing method
CN112631087B (en) * 2021-01-25 2022-04-22 苏州源卓光电科技有限公司 Double-face processing system and processing method

Similar Documents

Publication Publication Date Title
CN208752392U (en) A kind of double-sided exposure digital laser direct write equipment
JP2012074729A5 (en) Immersion exposure apparatus, immersion exposure method, and device manufacturing method
WO2017059745A1 (en) Large-area micro-nano patterning apparatus and method
CN103406246A (en) Parallel light curing equipment with staggered area array light sources and curing method thereof
CN204529949U (en) Mask plate
CN104865800A (en) Synchronous pulse exposure method for maskless lithography equipment and digital laser direct-writing system
CN103119706A (en) Exposure apparatus, exchange method of object, exposure method, and device manufacturing method
CN104749874A (en) Mask plate, mask exposure apparatus and mask exposure method
CN104166315A (en) Exposure method and exposure machine
CN103207529B (en) Exposure method and exposure apparatus
CN105892156A (en) Method for exposing transparent substrate
CN109143797A (en) A kind of dual stage face write-through exposure machine and its exposure method
CN106873314A (en) The digitlization made for high accuracy half tone is two-sided while direct write exposure sources
CN101661221A (en) Mask plate for exposure of the same layer and multi-exposure method thereof
CN108983556A (en) Sided exposure machine and double-faced exposure method
CN101551597B (en) A self-imaging double-sided overlay aligning method
CN105629679A (en) Edge exposure machine and edge exposure region coding method
CN206573852U (en) The digitlization made for high-precision half tone is two-sided while direct write exposure sources
CN108170007B (en) High-precision 3D printing device and printing method
CN103777364B (en) A kind of manufacture method of graticle
CN206523740U (en) A kind of write-through screen printing equipment
CN209433179U (en) A kind of dual stage face write-through exposure machine
CN204989751U (en) A focusing device for having system is directly write to mask lithography
CN209962089U (en) Direct-writing type exposure machine
CN209150151U (en) Brilliant loop device

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant
CP01 Change in the name or title of a patent holder
CP01 Change in the name or title of a patent holder

Address after: 215000 Room 102, building C5, Ting LAN lane, Suzhou Industrial Park, Jiangsu, China, 192

Patentee after: Yuanzhuo Micro Nano Technology (Suzhou) Co.,Ltd.

Address before: 215000 Room 102, building C5, Ting LAN lane, Suzhou Industrial Park, Jiangsu, China, 192

Patentee before: ADVANCED MICRO OPTICS.INC