CN204989751U - A focusing device for having system is directly write to mask lithography - Google Patents
A focusing device for having system is directly write to mask lithography Download PDFInfo
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- CN204989751U CN204989751U CN201520693468.3U CN201520693468U CN204989751U CN 204989751 U CN204989751 U CN 204989751U CN 201520693468 U CN201520693468 U CN 201520693468U CN 204989751 U CN204989751 U CN 204989751U
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Abstract
The utility model provides a focusing device for having system is directly write to mask lithography, including set up the photoetching objective with undertake the printing of between the material continuous focusing group with fix the focusing and organize, focusing group is including first sharp driving motor, first right angle prism wedge and second right angle prism wedge in succession, fixed focusing group is including second straight line driving motor and step prism. The utility model discloses synthesize the characteristics that continuous focusing was organized and was fixed focusing group, mix both and use, can realize interior continuous focusing on a large scale, reasonable in design, convenient and fast easily realizes, can improve production efficiency greatly.
Description
Technical field
The utility model relates to optical technical field, specifically a kind of focus control for mask-free photolithography straight-writing system.
Background technology
In mask-free photolithography straight-writing system, the focal plane of lithographic objective regulates the quality directly affecting photofabricated product.The lithographic objective depth of focus that resolution is higher is less, and the thickness of slab difference of printed-wiring board (PWB) is usually far beyond focal depth range.Focus control in current mask-free photolithography straight-writing system only realizes focusing function mostly among a small circle, select different backing plate to adjust focal plane when thickness of slab gap is larger, printed-wiring board (PWB) so aborning for different size thickness of slab repeatedly will change backing plate, reduce production capacity, directly affect productivity effect.
Utility model content
The purpose of this utility model is to provide a kind of focus control for mask-free photolithography straight-writing system, when selecting the larger printable fabric of thickness difference without the need to changing backing plate, realizes focusing continuously of mask-free photolithography straight-writing system on a large scale.
The technical solution of the utility model is:
A kind of focus control for mask-free photolithography straight-writing system, this device comprises and is arranged on continuous focusing group between lithographic objective and printable fabric and fixing focusing group, described continuous focusing group comprises the first linear drive motor, the first right-angle wedge prism and the second right-angle wedge prism, and described fixing focusing group comprises the second linear drive motor and step prism;
The inclined-plane of described first right-angle wedge prism and the second right-angle wedge prism fits together, and both are inverted and coordinate formation parallel flat; The upper surface of described step prism is plane, and lower surface is the cascaded surface be formed by connecting by some planes being parallel to upper surface, and the thickness making described step prism is stepped change;
Described first linear drive motor, for driving at least one bevel direction along both in described first right-angle wedge prism and the second right-angle wedge prism to move, the thickness and then the change light path that change described parallel flat on exposure optical axis direction are focused continuously;
Described second linear drive motor, for driving described step prism to move to certain position, the thickness area and then the change light path that adjust described step prism on exposure optical axis direction are fixed focusing.
The described focus control for mask-free photolithography straight-writing system, the upper surface of described parallel flat and step prism is all perpendicular to exposure optical axis.
The described focus control for mask-free photolithography straight-writing system, the angle of wedge of described first right-angle wedge prism and the second right-angle wedge prism is equal.
The described focus control for mask-free photolithography straight-writing system, the thickness difference of the adjacent thickness area of described step prism is equal.
As shown from the above technical solution, the utility model is focusing group continuously and the feature of fixing focusing group comprehensively, and both are used in combination, can realize the continuous focusing on a large scale, reasonable in design, convenient and swift, is easy to realize, can greatly enhances productivity.
Accompanying drawing explanation
Fig. 1 is apparatus structure schematic diagram of the present utility model;
Fig. 2 is two prism wedge structural representations of the present utility model;
Fig. 3 is step prism structure schematic diagram of the present utility model.
Embodiment
The utility model is further illustrated below in conjunction with the drawings and specific embodiments.
As shown in Figure 1, a kind of focus control for mask-free photolithography straight-writing system, comprise and be arranged on continuous focusing group between lithographic objective 1 and printable fabric 7 and fixing focusing group, continuous focusing group comprises the first linear drive motor 2, first right-angle wedge prism 3 and the second right-angle wedge prism 4, and fixing focusing group comprises the second linear drive motor 5 and step prism 6.The overlying relation of continuous focusing group and fixing focusing group is interchangeable.
As shown in Figure 2, the first right-angle wedge prism 3 is identical with the size and shape of the second right-angle wedge prism 4, and both inclined-planes can fit together, and is inverted and coordinates formation parallel flat.The upper and lower surface of parallel flat is all perpendicular to exposure optical axis.
As shown in Figure 3, the upper surface 61 of step prism 6 be plane and perpendicular to exposure optical axis, lower surface 62 is the cascaded surface be formed by connecting by some planes being parallel to upper surface 61, make the thickness of step prism 6 be stepped change, and the thickness difference of adjacent thickness area is equal.
The power output shaft of the first linear drive motor 2 is connected with the first right-angle wedge prism 3 by web member, second right-angle wedge prism 4 is fixed on support, first linear drive motor 2 drives the first right-angle wedge prism 3 to move along its bevel direction, thus changes the thickness of parallel flat on exposure optical axis direction and then change light path realization focusing continuously.
The power output shaft of the second linear drive motor 5 is connected with step prism 6 by web member, drives step prism 6 to move to certain position, thus adjustment exposure optical axis direction is topped bar prism 6 thickness area so that change light path and realize fixing focusing.
Principle of work of the present utility model:
When the variation in thickness of printable fabric 7 is less, in selected fixing focusing group, a specific thicknesses region of step prism 6 remains unchanged, first right-angle wedge prism 3 moves along inclined-plane under the drive of the first linear drive motor 2, the exposure focal plane of system can change along optical axis direction continuous micro, and the system that realizes is in interior focusing among a small circle.When the variation in thickness of printable fabric 7 is larger, continuous focusing group is by the restriction of the first linear drive motor 2 stroke, cannot printable fabric 7 surface be adjusted in the exposure focal depth range of system, now under the drive of the second linear drive motor 5, the step prism 6 in fixing focusing group is moved to suitable thickness area, the exposure focal plane of system can along optical axis direction correspondence change one fixed amount, and feasible system is in interior focusing in a big way.
The utility model utilizes continuous focusing group and fixing focusing group feature separately, namely continuous focusing group can realize focusing continuously among a small circle, fixing focusing group can, in the focusing of internal fixtion change on a large scale amount, can realize after both are used in combination focusing continuously on a large scale.
The above embodiment is only be described preferred implementation of the present utility model; not scope of the present utility model is limited; under the prerequisite not departing from the utility model design spirit; the various distortion that those of ordinary skill in the art make the technical solution of the utility model and improvement, all should fall in protection domain that claims of the present utility model determine.
Claims (4)
1. the focus control for mask-free photolithography straight-writing system, it is characterized in that: this device comprises and is arranged on continuous focusing group between lithographic objective and printable fabric and fixing focusing group, described continuous focusing group comprises the first linear drive motor, the first right-angle wedge prism and the second right-angle wedge prism, and described fixing focusing group comprises the second linear drive motor and step prism;
The inclined-plane of described first right-angle wedge prism and the second right-angle wedge prism fits together, and both are inverted and coordinate formation parallel flat; The upper surface of described step prism is plane, and lower surface is the cascaded surface be formed by connecting by some planes being parallel to upper surface, and the thickness making described step prism is stepped change;
Described first linear drive motor, for driving at least one bevel direction along both in described first right-angle wedge prism and the second right-angle wedge prism to move, the thickness and then the change light path that change described parallel flat on exposure optical axis direction are focused continuously;
Described second linear drive motor, for driving described step prism to move to certain position, the thickness area and then the change light path that adjust described step prism on exposure optical axis direction are fixed focusing.
2. the focus control for mask-free photolithography straight-writing system according to claim 1, is characterized in that: the upper surface of described parallel flat and step prism is all perpendicular to exposure optical axis.
3. the focus control for mask-free photolithography straight-writing system according to claim 1, is characterized in that: the angle of wedge of described first right-angle wedge prism and the second right-angle wedge prism is equal.
4. the focus control for mask-free photolithography straight-writing system according to claim 1, is characterized in that: the thickness difference of the adjacent thickness area of described step prism is equal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520693468.3U CN204989751U (en) | 2015-09-09 | 2015-09-09 | A focusing device for having system is directly write to mask lithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520693468.3U CN204989751U (en) | 2015-09-09 | 2015-09-09 | A focusing device for having system is directly write to mask lithography |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204989751U true CN204989751U (en) | 2016-01-20 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520693468.3U Active CN204989751U (en) | 2015-09-09 | 2015-09-09 | A focusing device for having system is directly write to mask lithography |
Country Status (1)
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| CN (1) | CN204989751U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105093860A (en) * | 2015-09-09 | 2015-11-25 | 合肥芯碁微电子装备有限公司 | Focusing device for maskless lithography direct writing system and focusing method of focusing device |
| CN108279470A (en) * | 2018-03-19 | 2018-07-13 | 合肥芯碁微电子装备有限公司 | A kind of high-precision focusing device encapsulated for direct-write photoetching in type |
-
2015
- 2015-09-09 CN CN201520693468.3U patent/CN204989751U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105093860A (en) * | 2015-09-09 | 2015-11-25 | 合肥芯碁微电子装备有限公司 | Focusing device for maskless lithography direct writing system and focusing method of focusing device |
| CN105093860B (en) * | 2015-09-09 | 2017-06-06 | 合肥芯碁微电子装备有限公司 | A kind of focus control and its focus adjustment method for mask-free photolithography straight-writing system |
| CN108279470A (en) * | 2018-03-19 | 2018-07-13 | 合肥芯碁微电子装备有限公司 | A kind of high-precision focusing device encapsulated for direct-write photoetching in type |
| CN108279470B (en) * | 2018-03-19 | 2024-06-14 | 合肥芯碁微电子装备股份有限公司 | High-precision focusing device for direct-writing photoetching packaging machine type |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: 230088 the 11 level of F3 two, two innovation industrial park, No. 2800, innovation Avenue, Hi-tech Zone, Hefei, Anhui. Patentee after: Hefei Xinqi microelectronics equipment Co., Ltd Address before: 230088, Hefei province high tech Zone, 2800 innovation Avenue, 533 innovation industry park, H2 building, room two, Anhui Patentee before: HEFEI XINQI MICROELECTRONIC EQUIPMENT CO., LTD. |
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| CP03 | Change of name, title or address |