CN103777364B - A kind of manufacture method of graticle - Google Patents
A kind of manufacture method of graticle Download PDFInfo
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- CN103777364B CN103777364B CN201310684808.1A CN201310684808A CN103777364B CN 103777364 B CN103777364 B CN 103777364B CN 201310684808 A CN201310684808 A CN 201310684808A CN 103777364 B CN103777364 B CN 103777364B
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- optical element
- graticle
- photoresist
- manufacture method
- motherboard
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Abstract
The invention discloses a kind of manufacture method of graticle, comprise the following steps：The uniform coating photoresist on optical element, and bake film forming；Hollow out register guide is made on the photoresist on optical element using plotter；The motherboard with solid register guide pattern and the hollow out register guide on optical element are carried out into contraposition by microscope alignment system to fit, and the optical element after laminating is exposed processing；Optical element after exposure is placed in developer solution and carries out photoresist developing；Optical element after cleaning development, is made graticle.The present invention on optical element by coating black glue or dark colour photoresist, and hollow out register guide is accurately made using laser plotter on a photoresist, motherboard can be achieved to fit with being accurately positioned for optical element, the qualification rate of graticle is improved, and manufacturing process is simple.
Description
Technical field
The present invention relates to graticle technical field, more particularly to a kind of manufacture method of graticle.
Background technology
Graticle is typically mounted on the right eyepiece focal plane of telescope, as shown in figure 4, the surface that it is one piece of pole book is carved
There is the thin glass of graduation mil line, because the thin glass of this block has also assisted in imaging theoretically, extend the focal length of object lens, can be right
The length of right eyepiece has more or less influence.Graticle is high to purity requirements, and any small dust all can be in observation
When produce very big stain；Meanwhile, the installation site required precision of graticle is high（The optical glass center of circle and pattern center deviation
±0.03mm）, therefore, dismounting of trying not, if dismounting, must restore as it is.
A kind of manufacture method of graticle is disclosed in Chinese patent literature CN102466891A, it includes motherboard and makes work
Skill and photocopying technique, mastering process comprise the following steps：According to the Element Design drawing draw calculation machine figure of client
The file of paper；Prepare motherboard substrate；Motherboard substrate is put into microscope alignment system；Open laser drawing instrument；Light source is set
Intensity.Photocopying technique comprises the following steps：Motherboard and optical element are cleaned with cleaning agent；Prepare ammonium liquid；Make photoresists；
Optical element is placed on precise clamp and is put into centrifuge；Toast glass components；Vacuum suction template and optical element are uniform
Bond and graticle optical element is processed using dynamic exposure；Optical element and motherboard precision are compound, are then exposed；By light
Learn part and be put into after stain in developer solution, clean up.In this patent document, optical element is with motherboard using vacuum suction
Pattern, the two does not have accurate positioning datum, therefore, and the precision and qualification rate for manufacturing product are not still very high, and are set
Standby Meteorological is relatively high.
Chinese patent literature CN101852985 discloses a kind of preparation method of substrate alignment mark, and it is in one piece of substrate
Surface on be formed with a depression, concave interior set photoresist layer；Exposure, development, so that light splitting resistance in the middle part of the photoresist layer
It is retained；Metal level is set around the part photoresistance；The part photoresistance is removed, the metal level is left, to form metal level
The alignment mark surrounded.Above-mentioned patent document needs multiple processes, complex process when depression alignment mark is made on substrate.
The content of the invention
In order to solve problem of the prior art, simplify process costs, improve Product Precision and qualification rate, the invention provides
A kind of manufacture method of graticle.
The technical scheme is as follows：
A kind of manufacture method of graticle, methods described comprises the following steps：
Step one, the uniform coating photoresist on optical element, and bake film forming；
Step 2, hollow out register guide is made using plotter on the photoresist on optical element；
Step 3, by microscope alignment system by the hollow out on motherboard and optical element with solid register guide pattern
Register guide carries out contraposition laminating, and the optical element after laminating is exposed into processing；
Step 4, the optical element after exposure is placed in developer solution and carries out photoresist developing；
Step 5, the optical element after cleaning development, is made graticle.
Photoresist in the step one is opaque light photoresist.
Photoresist thickness after described baking film forming is 1 micron~10 microns.
Plotter in the step 2 is laser plotter.
Hollow out contraposition in the step 2 is designated as cross, circular or star, the solid register guide on the motherboard with
Hollow out register guide shape on the optical element is consistent.
Make and made on multiple hollow out register guides, the motherboard in the step 3 on optical element in the step 2
Corresponding multiple solid register guides, it is by microscope alignment system that the motherboard with multiple solid register guide patterns and optics is first
Multiple hollow out register guides on part carry out contraposition laminating one by one.
Formed just after three register guides, three register guide lines of centres are made on the optical element and the motherboard
Triangular structure.
Make four register guides on the optical element and the motherboard, four register guide centers sequentially shape after line
Into square or rectangular structure.
Described developer solution is akaline liquid KOH or TMAH（TMAH）.
The development temperature of developer solution in the step 4 is 25 DEG C -35 DEG C, and developing time 3 minutes~10 minutes passes through
Immersion or backwashing manner carry out the development of graticle.The beneficial effect that technical scheme provided by the present invention is brought is：
A. the present invention by coating photoresist layer on optical element, by laser plotter on photoresist layer directly essence
Hollow out register guide is really made, technique is simple.
B. by the way that the solid register guide on motherboard is fitted with the hollow out register guide on optical element, you can realize the two
Exactitude position, improve producing efficiency, Product Precision and qualification rate, product qualification rate can reach more than 90%.
C. because the installation site required precision of graticle is higher, the drafting of hollow out register guide makes graticle on graticle
Install easier, easily restore as former state.
D. the present invention uses multiple spot alignment mode, significantly improves the aligning accuracy between motherboard and optical element.
Brief description of the drawings
Technical scheme in order to illustrate the embodiments of the present invention more clearly, makes required in being described below to embodiment
Accompanying drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the present invention, for
For those of ordinary skill in the art, on the premise of not paying creative work, other can also be obtained according to these accompanying drawings
Accompanying drawing.
Fig. 1 is graduation board fabrication method flow chart provided by the present invention；
Fig. 2 a are a kind of structural diagrams of hollow out register guide on photoresist；
Fig. 2 b are another structural diagrams of hollow out register guide on photoresist；
Fig. 3 a are a kind of structures that solid register guide pattern is fitted with the hollow out register guide contraposition on optical element on motherboard
Contraposition diagram；
Fig. 3 b are another knots that solid register guide pattern is fitted with the hollow out register guide contraposition on optical element on motherboard
Structure contraposition diagram；
Fig. 4 is the schematic diagram of graticle；
Fig. 5 is that solid register guide pattern is fitted with the hollow out register guide on optical element using 3 points of contrapositions on motherboard；
Fig. 6 is that solid register guide pattern is fitted with the hollow out register guide on optical element using 4 points of contrapositions on motherboard.
In figure：1- hollow out register guides；The solid register guides of 2-；3- graticles.
Embodiment
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with accompanying drawing to embodiment party of the present invention
Formula is described in further detail.
As shown in figure 1, the invention provides a kind of manufacture method of graticle, manufacture method therein includes following step
Suddenly：
Step one, the uniform coating photoresist on optical element, and bake film forming；Here the coating thickness of photoresist is 1
- 10 microns of micron, it is 1 micron~10 microns to bake the photoresist thickness after film forming；
Step 2, hollow out register guide is made using laser plotter on the photoresist on optical element；
Step 3, by microscope alignment system by the hollow out on motherboard and optical element with solid register guide pattern
Register guide carries out contraposition laminating, and the optical element after laminating is exposed into processing；
Step 4, the optical element after exposure is placed in developer solution and carries out photoresist developing；
Step 5, the optical element after cleaning development, is made graticle.
Photoresist used in the present invention is opaque light photoresist, can be commercially available opaque black photoresist, red
The dark photoresists such as coloured light photoresist, blue photoresist.
Hollow out contraposition wherein in step 2 is designated as cross, circle, star etc., solid register guide and optics on motherboard
Hollow out register guide shape on element is consistent.Solid register guide on hollow out register guide and motherboard therein can also use it
Its structure type, is just repeated no more here.
Present invention preferably employs multiple spot aligning structure mode, hollow out register guide therein can make three or four, motherboard
On solid register guide production quantity it is identical with the quantity of hollow out register guide, and keep multiple register guides to align laminating one by one.
Wherein Fig. 5 show 3 points of contraposition laminating types；Fig. 6 show 4 points of contraposition laminating types.Can also be using 5 points even more
The contraposition laminating type of multiple spot, is just no longer repeated one by one here.
Show that hollow out contraposition is designated as showing that hollow out contraposition is designated as circular knot in criss-cross structure, Fig. 2 b in Fig. 2 a
Structure.
The solid register guide respectively illustrated in Fig. 3 a and Fig. 3 b on motherboard is affixed with the hollow out register guide on optical element
The structural representation of conjunction.
Described developer solution is KOH or other alkaline solutions, or TMAH（TMAH）.
The embodiments of the present invention are for illustration only, and the quality of embodiment is not represented.
The foregoing is only presently preferred embodiments of the present invention, be not intended to limit the invention, it is all the present invention spirit and
Within principle, any modification, equivalent substitution and improvements made etc. should be included in the scope of the protection.
Claims (10)
1. a kind of manufacture method of graticle, it is characterised in that：Methods described comprises the following steps：
Step one, the uniform coating photoresist on optical element, and bake film forming；
Step 2, hollow out register guide is made using plotter on the photoresist on optical element；
Step 3, is aligned the hollow out on motherboard and optical element with solid register guide pattern by microscope alignment system
Mark carries out contraposition laminating, and the optical element after laminating is exposed into processing；
Step 4, the optical element after exposure is placed in developer solution and carries out photoresist developing；
Step 5, the optical element after cleaning development, is made graticle.
2. the manufacture method of graticle according to claim 1, it is characterised in that：
Photoresist in the step one is opaque light photoresist.
3. the manufacture method of graticle according to claim 2, it is characterised in that：
Photoresist thickness after described baking film forming is 1 micron~10 microns.
4. the manufacture method of graticle according to claim 1, it is characterised in that：
Plotter in the step 2 is laser plotter.
5. the manufacture method of graticle according to claim 4, it is characterised in that：
Hollow out contraposition in the step 2 is designated as cross, circular or star, the solid register guide on the motherboard with it is described
Hollow out register guide shape on optical element is consistent.
6. the manufacture method of graticle according to claim 5, it is characterised in that：
Made in the step 2 on optical element and make corresponding on multiple hollow out register guides, the motherboard in the step 3
Multiple solid register guides, by microscope alignment system by motherboard and optical element with multiple solid register guide patterns
Multiple hollow out register guides carry out one by one contraposition laminating.
7. the manufacture method of graticle according to claim 6, it is characterised in that：
Positive triangle is formed after three register guides, three register guide lines of centres are made on the optical element and the motherboard
Shape structure.
8. the manufacture method of graticle according to claim 6, it is characterised in that：
Make four register guides on the optical element and the motherboard, four register guide centers are sequentially formed just after line
Square or rectangle structure.
9. the manufacture method of graticle according to claim 1, it is characterised in that：
Described developer solution is akaline liquid KOH or TMAH（TMAH）.
10. the manufacture method of graticle according to claim 9, it is characterised in that：
The development temperature of developer solution in the step 4 is 25 DEG C -35 DEG C, and developing time 3 minutes~10 minutes passes through immersion
Or backwashing manner carries out the development of graticle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310684808.1A CN103777364B (en) | 2013-12-13 | 2013-12-13 | A kind of manufacture method of graticle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310684808.1A CN103777364B (en) | 2013-12-13 | 2013-12-13 | A kind of manufacture method of graticle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103777364A CN103777364A (en) | 2014-05-07 |
| CN103777364B true CN103777364B (en) | 2017-10-13 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310684808.1A Active CN103777364B (en) | 2013-12-13 | 2013-12-13 | A kind of manufacture method of graticle |
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Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104932113A (en) * | 2015-07-23 | 2015-09-23 | 合肥扬帆通信元器件有限公司 | Reticle with digital display screen function and manufacturing method thereof |
| CN107247340A (en) * | 2017-07-31 | 2017-10-13 | 合肥赛度电子科技有限公司 | A kind of manufacture method of the graticle with digital display screen function |
| CN111128963B (en) * | 2018-10-30 | 2022-04-26 | 成都京东方光电科技有限公司 | Display substrate mother board and manufacturing method thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19855629A1 (en) * | 1998-12-02 | 2000-06-08 | Leo Elektronenmikroskopie Gmbh | Particle-optical arrangement and method for the particle-optical production of microstructures |
| JP2002110537A (en) * | 2000-07-19 | 2002-04-12 | Nikon Corp | Electron beam exposure aligner for drawing mask |
| CN102445836A (en) * | 2010-10-13 | 2012-05-09 | 无锡华润上华半导体有限公司 | Reticle and exposure method of reticle |
| CN102466891A (en) * | 2010-11-16 | 2012-05-23 | 上海法雷光学科技有限公司 | Method for manufacturing reticle |
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| CN103777364A (en) | 2014-05-07 |
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Effective date of registration: 20181212 Address after: 065700 Lanyuan S3 Building, Peacock City, Bazhou, Langfang City, Hebei Province Patentee after: Bazhou Yungu Electronic Technology Co. Ltd. Address before: 100085 First Floor of Huanyang Building, No. 1 Shangdi East Road, Haidian District, Beijing Patentee before: Weixinnuo Science and Technology Co., Ltd., Beijing |