CN102520590B - Production method of light shield - Google Patents
Production method of light shield Download PDFInfo
- Publication number
- CN102520590B CN102520590B CN201110386632.2A CN201110386632A CN102520590B CN 102520590 B CN102520590 B CN 102520590B CN 201110386632 A CN201110386632 A CN 201110386632A CN 102520590 B CN102520590 B CN 102520590B
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- Prior art keywords
- exposure
- glass substrate
- baffle plate
- metallic diaphragm
- region
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Abstract
The invention discloses a production method of a light shield, which comprises the following steps that: a baffle plate is arranged on an exposure platform, and a position of an exposure area on a glass substrate is controlled by adjusting the position of the baffle plate so as to remove a membrane layer of an area which is required to pass light and to form a light shield pattern on the area to be shielded. A shield baffle plate is adopted, the baffle plate can move independently and can be precisely controlled independently, so the light of an exposure machine can be precisely positioned, and the light shield satisfying the standard can be produced. Moreover, no special light housing is necessary to design, so the design cost and the production cost of the light housing can be saved, and the production cost can be effectively saved, while the production precision is guaranteed.
Description
Technical field
The present invention relates to field of liquid crystal display, in particular, relate to a kind of method for making of shadow shield.
Background technology
At present in TFT-LCD industry, liquid crystal cell (CELL) processing procedure section need use ultraviolet shadow shield (UV glass) when carrying out frame adhesive curing, the light-shielding pattern on ultraviolet shadow shield (UV glass) is utilized to cover viewing area (AA) district alignment film (PI) and liquid crystal region, make it not by the affecting of UV-irradiation, frame glue position is exposed under UV-irradiation to reach the object of solidification simultaneously.The method for making of ultraviolet shadow shield (UV glass) has two kinds usually, one is design ultraviolet light-shielding pattern (UV mask), utilizes light shield to expose the ultraviolet shadow shield (UV glass) being formed and have ad-hoc location light-shielding pattern; Another kind method utilizes array base palte (Array) peripheral exposure machine to expose to the sun to the metallic diaphragm of frame glue position, thus form light-shielding pattern on glass substrate (glass).But these two kinds of methods exist following defect respectively: the mode adopting light shield exposure, because light shield is expensive, particularly advanced lines produces the large light shield of line, is unfavorable for reducing production cost; Adopt the mode of peripheral exposure machine not high due to precision, make result and often there is larger gap with the actual standard that will reach.
Summary of the invention
Technical matters to be solved by this invention is to provide the method for making of a kind of low cost, high-precision shadow shield.
The object of the invention is to be achieved through the following technical solutions:
A method for making for shadow shield, its step comprises:
A: arrange baffle plate on exposure desk, controls the position in the exposure region on glass substrate by the position of regulating fender, thus will the metallic diaphragm of transmission region be needed to remove, and forms light-shielding pattern in the region needing to cover.
Preferably, described baffle plate is the shade baffle plate that exposure bench carries.Adopt the shade baffle plate carried, without the need to additionally increasing investment, cost is lower.
Preferably, described steps A comprises:
A1: form lighttight metallic diaphragm on the glass substrate;
A2: arrange baffle plate on exposure desk, described glass substrate is formed reserve area pattern, and by exposure-processed, removes the metallic diaphragm of other parts of glass substrate; The pattern of reserve area identifies for the formation of the contraposition of exposure machine, the patterns such as glass numbering.
A3: form metallic diaphragm at glass substrate, be coated with photoresistance; Adopting baffle plate to carry out exposure-processed to needing the glue frame region of exposure, removing the metallic diaphragm in this region.
Preferably, described steps A 2 comprises:
A2.1: the metallic diaphragm first being disposed glass substrate surrounding glue frame corresponding region by exposure machine;
A2.2: form reserve area pattern on described glass substrate, and by exposure-processed, remove the metallic diaphragm of other parts of glass substrate.
Preferably, described steps A 3 comprises:
A3.1: form metallic diaphragm at glass substrate, be coated with photoresistance; Adopt baffle plate to cover each liquid crystal cell corresponding region, expose other region except liquid crystal cell corresponding region and carry out exposure-processed;
A3.2: sequentially carry out developing, etch, photoresistance peels off, retain the metallic diaphragm of light-shielding pattern and ultraviolet light shield alignment mark.
Present invention employs shade baffle plate, baffle plate can self-movement, accurately can control separately, therefore accurately can locate the light of exposure machine, produce standard compliant shadow shield.And prior art be on light shield by baffle plate around formation lightproof area, then above light shield, exposure forms light-shielding pattern, the present invention does not use light shield, baffle plate is directly utilized to form exposure area, remove metallic diaphragm after region beyond shading light part is directly exposed, thus save the designing and making cost of light shield; Compare with periphery light leak machine, the precision of exposure machine be high, wide coverage, by control baffle plate, can accurate exposure be realized completely, produce the shadow shield of high-quality.
Accompanying drawing explanation
Fig. 1 is embodiment of the present invention step one schematic diagram;
Fig. 2 is embodiment of the present invention step 2 schematic diagram;
Fig. 3 is embodiment of the present invention step 3 schematic diagram;
Wherein: 100, shadow shield; 110, loop strip of paper used for sealing; 120, reserve area pattern; 121, ultraviolet light shield alignment mark; 130, light-shielding pattern.
Embodiment
Below in conjunction with accompanying drawing and preferred embodiment, the invention will be further described.
At present in TFT-LCD industry, liquid crystal cell (CELL) processing procedure section need use ultraviolet shadow shield 100 (UV glass) when carrying out frame adhesive curing, the light-shielding pattern 130 on ultraviolet shadow shield 100 (UV glass) is utilized to cover viewing area (AA) district alignment film (PI) and liquid crystal region, make it not by the affecting of UV-irradiation, frame glue position is exposed under UV-irradiation to reach the object of solidification simultaneously.The present invention discloses a kind of low cost, high-precision shadow shield 100 method for making, and concrete steps are as described below:
Embodiment one: by adjustment Canon exposure machine shade baffle plate (mask blade) position, collocation simultaneously freely configures (free layout) and has exposed UV glass and make.
Step one: as shown in Figure 1, first lighttight metallic diaphragm is formed on the glass substrate, then utilize known method to complete normal glass substrate exposure process, and with peripheral exposure machine washing fall glass substrate periphery loop strip of paper used for sealing 110 (1oop seal) position metallic diaphragm---this step will form the pattern (pattern) comprising ultraviolet light shield alignment mark 121 (GE mask) on the glass substrate.
Step 2: as shown in Figure 2, do not use light shield, the baffle plate (blade) in mask platform (mask stage) is only utilized to cover large plate week crack approach sign (process mark) region, large plate after completing step one carries out re-expose, then complete development, etching, peel off photoresistance processing procedure---this step will form reserve area pattern 120, be specially ultraviolet light shield alignment mark 121 (mask alignment mark) and glass numbering pattern (Glass ID pattern), the metallic diaphragm in other regions all removed simultaneously.
Step 3: as shown in Figure 3, after completing steps two, again to large plate plated film (metallic diaphragm), painting photoresistance; Do not use light shield, mask platform (mask stage) overhead gage (blade) is only utilized to cover, expose needing exposure region, and fall the metallic diaphragm of glass substrate periphery loop strip of paper used for sealing 110 (1oop seal) position with peripheral exposure machine washing, and the metallic diaphragm of each liquid crystal cell periphery glue frame correspondence position; Then sequentially carry out developing, etch, photoresistance peels off, form light-shielding pattern corresponding to each liquid crystal cell 130.So far, shadow shield 100 completes.
Above content is in conjunction with concrete preferred implementation further description made for the present invention, can not assert that specific embodiment of the invention is confined to these explanations.The baffle plate that the present invention can adopt exposure machine to carry, the baffle plate that also can other be adopted separately controlled; Exposure machine is also not limited to Canon exposure machine, can also select the exposure machine of the brands such as Nikon, NSK, HHT.For general technical staff of the technical field of the invention, without departing from the inventive concept of the premise, some simple deduction or replace can also be made, all should be considered as belonging to protection scope of the present invention.
Claims (5)
1. a method for making for shadow shield, its step comprises:
A: arrange baffle plate on exposure desk, controls the position in the exposure region on glass substrate by the position of regulating fender, thus will the metallic diaphragm of transmission region be needed to remove, and forms light-shielding pattern in the region needing to cover; Described steps A comprises:
A1: form lighttight metallic diaphragm on the glass substrate;
A2: arrange baffle plate on exposure desk, described glass substrate is formed reserve area pattern, and by exposure-processed, removes the metallic diaphragm of other parts of glass substrate; Described reserve area pattern is ultraviolet light shield alignment mark;
A3: form metallic diaphragm at glass substrate, be coated with photoresistance; Adopting baffle plate to carry out exposure-processed to needing the glue frame region of exposure, removing the metallic diaphragm in this region.
2. the method for making of a kind of shadow shield as claimed in claim 1, is characterized in that, described baffle plate is the shade baffle plate that exposure bench carries.
3. the method for making of a kind of shadow shield as claimed in claim 1, is characterized in that, described steps A 2 comprises:
A2.1: the metallic diaphragm first being disposed glass substrate surrounding glue frame corresponding region by exposure machine;
A2.2: form reserve area pattern on described glass substrate, and by exposure-processed, remove the metallic diaphragm of other parts in glass substrate.
4. the method for making of a kind of shadow shield as claimed in claim 1, is characterized in that, described steps A 3 comprises:
A3.1: form metallic diaphragm at glass substrate, be coated with photoresistance; Adopt baffle plate to cover each liquid crystal cell corresponding region, expose other region except liquid crystal cell corresponding region and carry out exposure-processed;
A3.2: sequentially carry out developing, etch, photoresistance peels off, retain the metallic diaphragm of light-shielding pattern and reserve area pattern.
5. the method for making of a kind of shadow shield as claimed in claim 1, is characterized in that, described reserve area pattern is ultraviolet light shield alignment mark and glass numbering pattern.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110386632.2A CN102520590B (en) | 2011-11-29 | 2011-11-29 | Production method of light shield |
| PCT/CN2011/083428 WO2013078695A1 (en) | 2011-11-29 | 2011-12-04 | Method for manufacturing shading plate |
| US13/380,191 US8802359B2 (en) | 2011-11-29 | 2011-12-04 | UV glass production method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110386632.2A CN102520590B (en) | 2011-11-29 | 2011-11-29 | Production method of light shield |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102520590A CN102520590A (en) | 2012-06-27 |
| CN102520590B true CN102520590B (en) | 2015-05-20 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110386632.2A Active CN102520590B (en) | 2011-11-29 | 2011-11-29 | Production method of light shield |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102520590B (en) |
| WO (1) | WO2013078695A1 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103553362B (en) * | 2013-10-15 | 2015-07-29 | 深圳市华星光电技术有限公司 | The making method of solidification frame glue light shield |
| CN104503203A (en) * | 2015-01-15 | 2015-04-08 | 京东方科技集团股份有限公司 | Mask plate and production method thereof and display panel frame sealing adhesive curing method |
| CN104614948B (en) * | 2015-02-02 | 2018-01-23 | 京东方科技集团股份有限公司 | A kind of ultraviolet curing mask plate and preparation method thereof and display device |
| CN106338892B (en) * | 2016-11-01 | 2018-05-08 | 合肥京东方光电科技有限公司 | A kind of shift control method of exposure machine, the method for exposure and transparent contraposition part |
| CN112612178A (en) * | 2020-12-21 | 2021-04-06 | 上海华力微电子有限公司 | Mark for monitoring opening precision of photoetching machine shading sheet and use method thereof |
| CN113290316B (en) * | 2021-05-20 | 2023-07-21 | 安徽熙泰智能科技有限公司 | Film removal process for silicon-based OLED micro-display device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101196690A (en) * | 2006-12-05 | 2008-06-11 | 上海广电Nec液晶显示器有限公司 | Production method for shading mask plate and its application |
| CN101520599A (en) * | 2008-02-26 | 2009-09-02 | 上海天马微电子有限公司 | Mask, design method thereof, as well as method for manufacturing array substrates thereby |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR0144082B1 (en) * | 1994-04-01 | 1998-08-17 | 김주용 | Reticle and the setting method of blind using the same |
| JP3211079B2 (en) * | 1997-11-20 | 2001-09-25 | 株式会社オーク製作所 | Peripheral exposure apparatus and method |
| JP3056206B1 (en) * | 1999-03-18 | 2000-06-26 | 広島日本電気株式会社 | Dummy pattern forming method and semiconductor manufacturing method |
| US7362407B2 (en) * | 2002-02-01 | 2008-04-22 | Lg.Philips Lcd Co., Ltd. | Method of fabricating liquid crystal display device |
| JP2004310063A (en) * | 2003-03-25 | 2004-11-04 | Sharp Corp | Exposure mask, exposure apparatus, exposure method and method for manufacturing liquid crystal display |
| JP2006040915A (en) * | 2004-07-22 | 2006-02-09 | Seiko Epson Corp | Method and apparatus of manufacturing semiconductor device, and method of manufacturing electro-optical device |
| JP2009141263A (en) * | 2007-12-10 | 2009-06-25 | Toshiba Corp | Exposure method, photo mask and reticle stage |
| JP2010039360A (en) * | 2008-08-07 | 2010-02-18 | Fujinon Corp | Liquid crystal sealing apparatus |
| JP2010249963A (en) * | 2009-04-13 | 2010-11-04 | Ushio Inc | Substrate bonding device |
| CN101986206B (en) * | 2010-07-30 | 2012-08-08 | 南京中电熊猫液晶显示科技有限公司 | Method for utilizing functional mask board to manufacture mask substrate for solidifying sealing glue |
-
2011
- 2011-11-29 CN CN201110386632.2A patent/CN102520590B/en active Active
- 2011-12-04 WO PCT/CN2011/083428 patent/WO2013078695A1/en active Application Filing
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101196690A (en) * | 2006-12-05 | 2008-06-11 | 上海广电Nec液晶显示器有限公司 | Production method for shading mask plate and its application |
| CN101520599A (en) * | 2008-02-26 | 2009-09-02 | 上海天马微电子有限公司 | Mask, design method thereof, as well as method for manufacturing array substrates thereby |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102520590A (en) | 2012-06-27 |
| WO2013078695A1 (en) | 2013-06-06 |
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| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Production method of light shield Effective date of registration: 20190426 Granted publication date: 20150520 Pledgee: Bank of Beijing Limited by Share Ltd Shenzhen branch Pledgor: Shenzhen Huaxing Optoelectronic Technology Co., Ltd. Registration number: 2019440020032 |
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| PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
| PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20201016 Granted publication date: 20150520 Pledgee: Bank of Beijing Limited by Share Ltd. Shenzhen branch Pledgor: Shenzhen China Star Optoelectronics Technology Co.,Ltd. Registration number: 2019440020032 |