CN208604205U - A kind of Parylene Horizontal internal circulating vacuum deposition apparatus - Google Patents
A kind of Parylene Horizontal internal circulating vacuum deposition apparatus Download PDFInfo
- Publication number
- CN208604205U CN208604205U CN201821044493.9U CN201821044493U CN208604205U CN 208604205 U CN208604205 U CN 208604205U CN 201821044493 U CN201821044493 U CN 201821044493U CN 208604205 U CN208604205 U CN 208604205U
- Authority
- CN
- China
- Prior art keywords
- parylene
- deposition apparatus
- internal circulating
- vacuum deposition
- horizontal internal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses a kind of Parylene Horizontal internal circulating vacuum deposition apparatus, it is related to electroplating technology, which is characterized in that including closing drum, the closing drum center passes through hollow axis, and part of the hollow axis in closing drum is equipped at least four gas vent.The utility model breaches the limitation of previous small-bore deposition cage, gas-phase activity monomer in hollow logical axial closing drum directly by spreading, the Parylene film coating of workpiece is realized by way of chemical vapor deposition, so that the utilization rate of Parylene solid material from 30% improve 70%, cost greatly reduces, there is good marketing space.
Description
Technical field
The utility model relates to electroplating technologies more particularly to a kind of Parylene Horizontal internal circulating vacuum deposition to fill
It sets.
Background technique
Parylene uses a kind of unique chemical vapor deposition (CVD) technique, and CVD technique is applied earliest in semiconductor work
The epitaxial growth of industry, whole process are vapor reactions, and are carried out under vacuum conditions, thus can obtain highly uniform painting
Layer, reaches the isomorphism that other methods are difficult to realize.Parylene film coating preparation process is generally divided into three steps: (1) vacuum
Solid feed is sublimed into gaseous state under the conditions of state and 120 degree;(2) 650 degree of gaseous feeds are cracked into the work with response characteristic
Property monomer;(3) activated monomer deposits and polymerize at room temperature.
Gaseous active monomer enters deposition chambers, spreads in workpiece surface first, starts to gather after being adsorbed onto each surface
It closes and crystallizes, directly formation solid, avoid the appearance of liquid phase, remove the defects of uneven and coating of thickness.It is this
The thin film coating thicknesses obtained by way of vapor deposition at room temperature only have 0.1-100 microns, and dense uniform without
Pin hole, it is transparent it is unstressed, not disfiguring workpiece, have excellent protective and electrical insulating property, be the present age it is most effective it is moisture-proof, mould proof,
The coating material of anti-corrosion, salt spray proof, be widely used in aerospace, circuit board, magnetic material, sensor, silicon rubber, sealing element,
The fields such as medical instrument, rare cultural relics.
Often gas-phase activity monomer is deposited in cage by deposition cage extroversion when traditional Parylene film deposition apparatus deposits
Diffusion, to realize the coating to workpiece in deposition cage.But ecto-entad deposits, so that gas-phase activity monomer is in exterior space
Unnecessary diffusional deposition is done, causes largely to waste, so that Parylene solid material utilization rate only has 30%.It is heavy to improve
The space utilization rate of product closing drum, the Chinese patent of ZL201120447708.3 disclose that " a kind of Parylene is horizontal heavy
The product new tool structure of system ", deposition closing drum is interior to be equipped with circular cylindrical deposition frame, deposits and is uniformly provided with deposition cage on frame.It should
Patent is filled up deposition closing drum using deposition cage, although improving the space utilization rate of deposition closing drum, in order to
Prevent workpiece from leaking out from deposition cage gap, deposition cage is made of the processing of punching web plate, and punching net panel aperture is small, to workpiece into
When row deposition plating, it is easy to block mesh, on the one hand reduce deposition efficiency, increase economic cost, on the other hand need
Deposition cage is often replaced, demoulding, increases time cost.
Utility model content
The utility model provides one kind that a kind of Parylene film depositing homogeneous, deposition efficiency are high, effectively reduce cost
Parylene Horizontal internal circulating vacuum deposition apparatus.The technical solution of the utility model is as follows:
A kind of Parylene Horizontal internal circulating vacuum deposition apparatus, which is characterized in that including closing drum, the closing rolling
Bucket center passes through hollow axis, and part of the hollow axis in closing drum is equipped at least four gas vent.
The working method of the utility model is as follows:
Workpiece to be coated is placed in closing drum, and the gas-phase activity monomer after cracking room cracks is via hollow axis
Gas vent diffuse to closing drum, at the same time driving gear drive driven gear operating, driven gear drive closing rolling
Bucket uniform rotation, gas-phase activity monomer is rapidly and uniformly deposited on workpiece surface under vacuum cooled environment.
By using above technical scheme, the utility model institute is attainable to be had the beneficial effect that
1, hollow axis is located at closing drum center, and the gas-phase activity monomer after cracking is by the diffusion of hollow axis full of entire
Drum is closed, gear drives closing drum uniform rotation, makes 360 ° of workpiece uniform fast deposition Parylene films, keeps coating complete
Uniformly, and utilization rate is high.
2, the utility model breach small-bore deposition cage limitation, gas-phase activity monomer by hollow axis gas vent
It directing out and diffuses to closing drum, the useful space full of entire closing drum not will cause unnecessary waste, so that
The utilization rate of Parylene solid material greatly improves, and is promoted to 70% by original 30%, cost greatly reduces.
3, since the gas outlet face product on hollow axis is larger, it is not easy to which film deposition occur causes gas vent stifled
The phenomenon that plug, a hollow axis can be used for a long time, and reduce the trouble of replacement, cleaning.
4, since entire deposition process is carried out under the conditions of vacuum cooled, gas phase quick sedimentation will not be excessive, avoids
Parylene small molecule enters vacuum cooling system, damages instrument.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the utility model;
Fig. 2 is the structural schematic diagram of hollow axis;
In figure, 1, cracking tube outlet, 2, hollow axis, 3, closing drum, 4, driven gear, 5, driving gear, 6, charging
Mouthful, 7, cooling tube, 8, vacuum cooling system connecting tube, 9, vacuum casting, 10, support system, 11, gas vent.
Specific embodiment
As shown in Figure 1 and Figure 2, a kind of Parylene Horizontal internal circulating vacuum deposition apparatus, which is characterized in that including closing
Drum 3,3 center of closing drum pass through hollow axis 2, and part of the hollow axis 2 in closing drum 3 is equipped at least
4 gas vents 11.
The respective surface area of gas vent 11 of the utility model is at least 20cm2。
The closing drum 3 of the utility model is externally provided with the driven gear 4 that driving closing drum 3 rotates, the driven gear 4
It is connected with driving gear 5.
The closing drum 3 of the utility model is covered with vacuum casting 9, and the driving gear 5 is fixed on vacuum casting 9.
2 one end of hollow axis of the utility model is connected with feed pipe 6, and the other end is connected with cooling tube 7.
The feed pipe 6 of the utility model is connect with cracking tube outlet 1.
The cooling tube 7 of the utility model is connected with vacuum cooling system connecting tube 8.
2 both ends of hollow axis of the utility model are respectively equipped with support system 10.
The closing drum 3 of the utility model uses one of plastic barrel or stainless steel barrel.
Workpiece to be coated is placed in closing drum 3, and the gas-phase activity monomer after cracking room cracks is via hollow logical
The gas vent 11 of axis 2 diffuses to closing drum 3, and driving gear 5 drives driven gear 4 to operate, and driven gear 4 drives closing rolling
3 uniform rotation of bucket, gas-phase activity monomer is evenly and rapidly deposited on workpiece surface under vacuum cooled environment, avoids gas-phase activity
Monomer is excessive, is effectively protected vacuum cooling system.
The utility model breaches the limitation of previous small-bore deposition cage, and gas-phase activity monomer is directly from hollow axis to envelope
Diffusion in drum is closed, so that cost greatly reduces from the 70% of 30% raising in the utilization rate of Parylene solid material.
Claims (9)
1. a kind of Parylene Horizontal internal circulating vacuum deposition apparatus, which is characterized in that including closing drum (3), the closing
Drum (3) center passes through hollow axis (2), and part of the hollow axis (2) in closing drum (3) is equipped at least four gas
Body exports (11).
2. Parylene Horizontal internal circulating vacuum deposition apparatus according to claim 1, which is characterized in that the gas goes out
Mouth (11) respective surface area is at least 20 cm2。
3. Parylene Horizontal internal circulating vacuum deposition apparatus according to claim 1, which is characterized in that the closing rolling
Bucket (3) is externally provided with the driven gear (4) of driving closing drum (3) rotation, and the driven gear (4) is connected with driving gear (5).
4. Parylene Horizontal internal circulating vacuum deposition apparatus according to claim 3, which is characterized in that the closing rolling
Bucket (3) is covered with vacuum casting (9), and the driving gear (5) is fixed on vacuum casting (9).
5. Parylene Horizontal internal circulating vacuum deposition apparatus according to claim 1, which is characterized in that described hollow logical
Axis (2) one end is connected with feed pipe (6), and the other end is connected with cooling tube (7).
6. Parylene Horizontal internal circulating vacuum deposition apparatus according to claim 5, which is characterized in that the feed pipe
(6) it is connect with cracking tube outlet (1).
7. Parylene Horizontal internal circulating vacuum deposition apparatus according to claim 5, which is characterized in that the cooling tube
(7) vacuum cooling system connecting tube (8) are connected with.
8. Parylene Horizontal internal circulating vacuum deposition apparatus according to claim 1, which is characterized in that described hollow logical
Axis (2) both ends are respectively equipped with support system (10).
9. Parylene Horizontal internal circulating vacuum deposition apparatus according to claim 1, which is characterized in that the closing rolling
Bucket (3) uses one of plastic barrel or stainless steel barrel.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201821044493.9U CN208604205U (en) | 2018-06-29 | 2018-06-29 | A kind of Parylene Horizontal internal circulating vacuum deposition apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201821044493.9U CN208604205U (en) | 2018-06-29 | 2018-06-29 | A kind of Parylene Horizontal internal circulating vacuum deposition apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
CN208604205U true CN208604205U (en) | 2019-03-15 |
Family
ID=65667516
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201821044493.9U Active CN208604205U (en) | 2018-06-29 | 2018-06-29 | A kind of Parylene Horizontal internal circulating vacuum deposition apparatus |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN208604205U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109881179A (en) * | 2019-04-19 | 2019-06-14 | 江苏可润光电科技有限公司 | A kind of package Parylene coating process and coating apparatus entirely |
-
2018
- 2018-06-29 CN CN201821044493.9U patent/CN208604205U/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109881179A (en) * | 2019-04-19 | 2019-06-14 | 江苏可润光电科技有限公司 | A kind of package Parylene coating process and coating apparatus entirely |
CN109881179B (en) * | 2019-04-19 | 2023-07-25 | 江苏可润光电科技有限公司 | Full-wrapping parylene coating process and coating device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE102009012878B4 (en) | Shower head and substrate processing device | |
CN208604205U (en) | A kind of Parylene Horizontal internal circulating vacuum deposition apparatus | |
CN107099784B (en) | A kind of modularization spray head and device for space isolation atomic layer deposition | |
CN103055716B (en) | NaA molecular sieve membrane element internal membrane preparation method | |
CN103789806A (en) | Electroplating bath | |
CN104477995B (en) | A kind of MoO2the preparation method of nanometer sheet and MoO2nanometer sheet | |
CN106544646B (en) | A kind of atomic layer deposition apparatus | |
CN105339522A (en) | Vacuum coating device and vacuum coating method | |
CN206646159U (en) | Adjustable plane cathode mechanism and vacuum coater | |
CN203754797U (en) | Vacuum evaporation coating device | |
CN113019205B (en) | Strontium titanate superfine powder preparation equipment | |
CN106661725A (en) | Vacuum coating device | |
CN200954491Y (en) | Two-side spraying-disc type uniform low liquid-feeding machine | |
CN209989461U (en) | Deposition device for vacuum coating | |
CN103646651B (en) | A kind of nano silver/silver bromide polyimide composite film and preparation method and application | |
CN209816268U (en) | Vacuum coating machine | |
CN209260202U (en) | Chemical bath coating apparatus | |
CN209081976U (en) | A kind of tool section surface deposition plating apparatus | |
CN110923669B (en) | Gas spraying device and chemical vapor deposition method | |
CN202246856U (en) | Chemical vapor film depositing equipment | |
CN207418857U (en) | A kind of chemical deposition device with protection baffle | |
JP2005116391A (en) | Apparatus of manufacturing substrate for transparent electrode | |
CN218146906U (en) | Device structure for depositing nano titanium nitride film on inner wall of titanium tube by high pulse | |
CN208517526U (en) | A kind of atomic layer deposition apparatus | |
CN107805796A (en) | A kind of ALD novel reactions room |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant |