CN208385415U - Mos功率半导体器件 - Google Patents
Mos功率半导体器件 Download PDFInfo
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- CN208385415U CN208385415U CN201821076633.0U CN201821076633U CN208385415U CN 208385415 U CN208385415 U CN 208385415U CN 201821076633 U CN201821076633 U CN 201821076633U CN 208385415 U CN208385415 U CN 208385415U
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- grid bus
- heavy doping
- grid
- type heavy
- polycrystalline silicon
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 18
- 239000010410 layer Substances 0.000 claims abstract description 96
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract description 39
- 239000011229 interlayer Substances 0.000 claims abstract description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 6
- 239000010703 silicon Substances 0.000 claims abstract description 6
- 230000008859 change Effects 0.000 claims description 2
- 229920005591 polysilicon Polymers 0.000 claims description 2
- 230000000694 effects Effects 0.000 description 4
- 239000012141 concentrate Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 238000000407 epitaxy Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
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- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201821076633.0U CN208385415U (zh) | 2018-07-09 | 2018-07-09 | Mos功率半导体器件 |
Applications Claiming Priority (1)
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CN201821076633.0U CN208385415U (zh) | 2018-07-09 | 2018-07-09 | Mos功率半导体器件 |
Publications (1)
Publication Number | Publication Date |
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CN208385415U true CN208385415U (zh) | 2019-01-15 |
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CN201821076633.0U Active CN208385415U (zh) | 2018-07-09 | 2018-07-09 | Mos功率半导体器件 |
Country Status (1)
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CN (1) | CN208385415U (zh) |
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2018
- 2018-07-09 CN CN201821076633.0U patent/CN208385415U/zh active Active
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Legal Events
Date | Code | Title | Description |
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GR01 | Patent grant | ||
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TR01 | Transfer of patent right |
Effective date of registration: 20240205 Address after: 518000 Room 201, building A, 1 front Bay Road, Shenzhen Qianhai cooperation zone, Shenzhen, Guangdong Patentee after: Shenzhen Hemeiyuan Technology Co.,Ltd. Country or region after: Zhong Guo Address before: Room 501, Building NW20, Suzhou Nano City, No. 99 Jinjihu Avenue, Industrial Park, Suzhou City, Jiangsu Province, 215126 Patentee before: SUZHOU SILIKRON SEMICONDUCTOR TECHNOLOGY CO.,LTD. Country or region before: Zhong Guo |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20240319 Address after: Room 306, Building 2, No.1 Qingshan Road, High tech Zone, Suzhou City, Jiangsu Province, 215100 Patentee after: New Silicon Microelectronics (Suzhou) Co.,Ltd. Country or region after: Zhong Guo Address before: 518000 Room 201, building A, 1 front Bay Road, Shenzhen Qianhai cooperation zone, Shenzhen, Guangdong Patentee before: Shenzhen Hemeiyuan Technology Co.,Ltd. Country or region before: Zhong Guo |
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TR01 | Transfer of patent right |