CN208308693U - A kind of low radiation coated glass - Google Patents

Abstract

The utility model discloses a kind of low radiation coated glass, belong to environmental protection and energy-saving building Material Field, the low radiation coated glass includes glass substrate, is successively plated in glass substrate surface: the first titanium oxide layer, the second zinc oxide film, third silver film, the 4th nichrome film layer, the 5th zinc oxide film and the 6th silicon nitride film layer.Above-mentioned low radiation coated glass is by being arranged the film material and thicknesses of layers being coated in glass substrate, high rate thoroughly can be achieved simultaneously, make outdoor reflected colour, indoor reflection color, show high saturating colorless state through color, effectively overcome existing low radiation coated glass that can not meet high rate thoroughly and the colourless technical problem of each side's reflected colour simultaneously, to widening Low emissivity energy conservation coated glass sunshine is insufficient or the extensive use in the high area of daylighting requirement has and remarkably promotes meaning.

Description

A kind of low radiation coated glass

Technical field

The utility model belongs to environmental protection and energy-saving building Material Field, in particular to a kind of low radiation coated glass, the low spoke Penetrating glass has the characteristics that height is thoroughly pure, and appearance tactile impression is more preferably.

Background technique

With the development of society, exploitation of the people to the Nature, the consumption of the energy are increasing.The shortage of the energy, environment Destruction allowed it was recognized that energy-saving and emission-reduction significance, green building be nowadays construct energy-saving and emission-reducing society weight Want one of theory and mode.It, can be by solar heat radiation filtration at cold light source with low radiance in order to promote building energy conservation Low emissivity (Low Emissivity abbreviation Low-E) energy-saving glass, become the important application material for energy saving building.

Currently, low radiation coated glass type is more, appearance color diversification.The existing Low emissivity about neutral colored appearance Coated glass is mainly embodied in through on color, and patent CN20140607113.8 reports a kind of neutral Dan Yin for penetrating color Low-E glass does not explain the color of remaining two-dimensions；Patent CN201210430335.8, CN20140607063.3 The double-silver low-emissivity coated glass for describing muted color is mainly reflected in the feature that neutral ash is presented through color；Three silver coating glass Glass is since the number of plies of film layer is more, and in the case where ensure that outdoor reflected colour is in neutrality, the visible light transmittance of product is difficult to It is greatly improved, and most of three silver products show the disadvantage through color in yellow.

In general, existing muted color Low emissivity energy-saving glass is being protected due to being limited by film layer structure and thickness matching For card through in the case where color, indoor reflection color can then show purplish red or blue-green；When guaranteeing outdoor reflected colour is muted color, Reveal yellow green through color table, it is difficult to reach and make outdoor reflected colour, indoor reflection color, colourless, and transmitance is presented through color Close to the characteristic of float glass process original piece, outdoor environment can not be truly presented to indoor user.It is inadequate or adopt in some sunshines The demanding place of light, application market are very limited.

Utility model content

The purpose of the utility model is to overcome existing existing above-mentioned deficiencies, provide a kind of high pure Low emissivity plating Film glass is selected by the certain optimisation to the film on coated glass material and structure, makes the plated film glass of the specific film layer structure Glass, not only heat transfer coefficient is low, shading coefficient is low, thermal property is good, and energy-efficient performance is excellent；Moreover, the coated glass is also equipped with Visible light transmittance is high, and close to itself transmitance of the white glass of float glass process, lighting performance is good；Make outdoor reflected colour, indoor reflection color, penetrate Color shows colourless pure optical characteristics simultaneously.

In order to realize above-mentioned purpose of utility model, the utility model provides following technical scheme:

A kind of low radiation coated glass, including glass substrate are successively coated with: in glass substrate surface in glass substrate surface It is successively coated with: the first titanium oxide layer, the second zinc oxide film, third silver film, the 4th nichrome film layer, the 5th zinc oxide Film layer and the 6th silicon nitride film layer.

Further, the low radiation coated glass is prepared using high vacuum magnetron sputtering technique or Atomic layer deposition method.

Wherein, Atomic layer deposition method (also referred to as ALD Atomic layer deposition method) is that one kind can be by substance with monatomic film The method for being plated in substrate surface of form in layer.

Further, general substrate of glass, the preferably white glass of float glass process or ultra-clear glasses can be selected in the glass substrate.

Further, first titanium oxide layer is with a thickness of 15-26nm, preferably 20-22nm.

Second zinc oxide film is with a thickness of 17-27nm, preferably 19-25nm.

The third silver film is with a thickness of 6-10nm, preferably 8-9nm.

The 4th nichrome thicknesses of layers is 0.1-2nm, preferably 0.5-1.5nm.

5th zinc oxide film with a thickness of 4-9nm, preferably 5-6nm.

6th silicon nitride film layer with a thickness of 20-25nm, preferably 22-24nm.

Further, a kind of low radiation coated glass, including glass substrate, the glass substrate are the white glass basis piece of float glass process, and Successively be coated in the white glass substrate surface of the float glass process: the first titanium oxide layer of 20nm thickness, 16nm thickness the second zinc oxide film, The third silver film of 8nm thickness, the 4th nichrome film layer of 2.5nm thickness, the 5th zinc oxide film of 6nm thickness and 22nm are thick Layer 6 silicon nitride film layer.

Low emissivity glass is coated with using said sequence film layer, adjusts thicknesses of layers, thus it is possible to vary to visible light between film layer Transmission, absorption and reflection ratio.When the thin-film material combination of different-thickness known to optical principle, visible light can be made to pass through film After layer, reflected light interferes phenomenon.Chancing in manufacturing process is produced through utility model life, selects above-mentioned film layer material Material, and according to above-mentioned particular order plated film, within the scope of above-mentioned thicknesses of layers, the specific thickness of each film layer is adjusted, can be made each The natural light of wavelength period obtains suitable reflection, transmission, so that the coated glass be made to show high saturating rate, outdoor reflected colour, room Internal reflection color shows colourless excellent optical properties through color.

Compared with prior art, the utility model has the advantage that

1, the utility model low radiation coated glass, by common float glass substrate surface successively vacuum magnetic-control sputtering The first titanium oxide layer of plating, the second zinc oxide film, third silver film, the 4th nichrome film layer, the 5th zinc oxide film With the 6th silicon nitride film layer, selects specific film material and film layer structure to combine, make the Low emissivity for having the specific film layer structure Coated glass while having good thermal property, mechanical performance, shows high saturating rate, outdoor reflected colour, indoor reflection Color shows colourless excellent optical properties through color.Effectively overcome existing low radiation coated glass that can not meet height simultaneously Saturating rate and the colourless technical problem of each side's reflected colour remarkably promote meaning to widening low radiation coated glass application field and having.

2, low emissivity glass described in the utility model, it is seen that light transmission rate is high, and close to float glass process original piece transmitance, satisfaction is built Build the daylighting demand of object.Moreover, its glass surface, film surface, through colourless characteristic is presented, outdoor environment can be allowed really to be reflected to room Interior resident.

The monolithic coated glass prepared by low emissivity glass described in the utility model, optical property detection parameters such as table 1 It is shown: (a* and b* represent chromaticity coordinate, and wherein a* represents red-green axis, and b* represents the blue axis of Huang one)

Table 1

3, low emissivity glass described in the utility model, in the case where meeting high transmittance, thermal property also can Reach user demand: infrared reflectivity is high, and film layer radiance is much better than the standard of offline Low-E glass, and energy-saving effect is significant.

The hollow glass (6mm+12mmA+6mm) prepared by low emissivity glass described in the utility model, thermal property ginseng Number is as shown in table 2:

Table 2

4, low emissivity glass film layer structure described in the utility model, since outer surface silicon nitride film layer protective layer acts on, And the mutual bonding synergy between each film layer, to have good chemical stability, good mechanical stability.Its mechanicalness Energy detection parameters are as shown in table 3:

Table 3

5, low emissivity glass described in the utility model, film layer structure simple and stable, required sputtering target material is less, is easy to real Existing volume production, industrial utility value are high.

Detailed description of the invention:

Fig. 1 is the diagrammatic cross-section of high pure low emissivity glass thoroughly described in the utility model.

Marked in the figure: 1- float glass process white glass substrate, the first titanium oxide layer of 2-, the second zinc oxide film of 3-, 4- third silver Film layer, the 4th nichrome film layer of 5-, the 5th zinc oxide film of 6-, the 6th silicon nitride film layer of 7-.

Specific embodiment

The utility model is described in further detail below with reference to test example and specific embodiment.But it should not be by this The range for being interpreted as the above-mentioned theme of the utility model is only limitted to embodiment below, all to be realized based on the content of the present invention Technology belongs to the scope of the utility model.

Embodiment 1

It is successively plated from inside to outside using the offline magnetic-controlled sputtering coating equipment of vacuum in the white glass basis on piece of the common float glass process of 6mm The titanium oxide layer of 15nm thickness processed, the zinc oxide film of 17nm thickness, the silver film of 8.7nm thickness, 1.5nm thickness nichrome film The silicon nitride film layer of layer, the zinc oxide film of 6nm thickness and 22nm thickness.

Embodiment 2

It is successively plated from inside to outside using the offline magnetic-controlled sputtering coating equipment of vacuum in the white glass basis on piece of the common float glass process of 6mm System: the titanium oxide layer of 17nm, the zinc oxide film of 15nm thickness, the silver film of 9nm thickness, the nichrome film layer of 1nm thickness, 4nm The silicon nitride film layer of thick zinc oxide film, 25nm thickness.

Embodiment 3

It is successively coated with from inside to outside on the ultra-clear glasses substrate of 6mm using ALD atomic layer deposition apparatus: 19nm thickness Titanium oxide layer, the zinc oxide film of 27nm thickness, the silver film of 10nm thickness, the nichrome film layer of 0.5nm thickness, 9nm thickness oxygen Change the silicon nitride film layer of zinc film layer, 20nm thickness.

Embodiment 4

By the height being prepared in embodiment 1, hollow glass (6mm+12mmA+6mm) knot is made in pure low emissivity glass thoroughly Structure obtains high pure preparing low-emissivity coated hollow glass product thoroughly.

Comparative example 1 (by bottom titanium oxide layer, replaces with silicon nitride film layer, and the related thicknesses of layers of corresponding change)

It is successively plated from inside to outside using the offline magnetic-controlled sputtering coating equipment of vacuum in the white glass basis on piece of the common float glass process of 6mm System: the silicon nitride film layer of 30nm thickness, the zinc oxide film of 16nm thickness, the silver film of 4nm thickness, 4.5nm thickness nichrome film The silicon nitride film layer of layer, the zinc oxide film of 9nm thickness, 30nm thickness.

Comparative example 2 (omits the 5th zinc oxide film, and corresponding each thicknesses of layers value of change)

It is successively plated from inside to outside using the offline magnetic-controlled sputtering coating equipment of vacuum in the white glass basis on piece of the common float glass process of 6mm System: the titanium oxide layer of 26nm thickness, the zinc oxide film of 16nm thickness, the silver film of 13nm thickness, 4.5nm thickness nichrome film The silicon nitride film layer of layer, 30nm thickness.

Comparative example 3 (identical film material, but thicknesses of layers has change)

It is successively plated from inside to outside using the offline magnetic-controlled sputtering coating equipment of vacuum in the white glass basis on piece of the common float glass process of 6mm System: the titanium oxide layer of 26nm thickness, the zinc oxide film of 30nm thickness, the silver film of 13nm thickness, 4.5nm thickness nichrome film The silicon nitride film layer of layer, the zinc oxide film of 15nm thickness, 30nm thickness.

Performance test

After measuring low-radiating coated glass strengthened made from above-described embodiment and comparative example according to GB/T18915.2-2013 Optical parameter, compare, the results are shown in Table shown in 4-9: (wherein, L* representative luminance value, a* and b* represent chromaticity coordinate, Middle a* represents red-green axis, and b* represents the blue axis of Huang one)

The monolithic coated glass optical parameter prepared in 4 embodiment 1 of table

The monolithic coated glass optical parameter prepared in 5 embodiment 2 of table

The monolithic coated glass optical parameter prepared in 6 embodiment 3 of table

The monolithic coated glass optical parameter prepared in 7 comparative example 1 of table

The monolithic coated glass optical parameter prepared in 8 comparative example 2 of table

The monolithic coated glass optical parameter prepared in 9 comparative example 3 of table

From the testing result of table 4-10 it is found that specific film material described in the utility model and structure is only selected (to implement Example 1-3) preparation tempering after single layer coated glass, outdoor reflected colour, indoor reflection color could be shown simultaneously, through color Show colourless optical characteristics.Change film material or thicknesses of layers described in the utility model, the then list finally prepared Layer coated glass (such as comparative example 1-3) optical property changes, the outdoor reflected colour that reflects, indoor reflection color, through chroma color Value increases, and degree of purity significantly reduces, and shows partially yellow or partially grey neutral chromaticity, is unable to reach the saturating nothing of height described in the utility model Colour purity requires only.

Claims (10)

1. a kind of low radiation coated glass, including glass substrate, which is characterized in that be successively coated in glass substrate surface: first Titanium oxide layer, the second zinc oxide film, third silver film, the 4th nichrome film layer, the 5th zinc oxide film and the 6th nitrogen SiClx film layer.

2. a kind of low radiation coated glass according to claim 1, which is characterized in that the low radiation coated glass uses It is prepared by high vacuum magnetron sputtering technique or atomic layer deposition mode.

3. a kind of low radiation coated glass according to claim 1, which is characterized in that the glass substrate is the white glass of float glass process Or ultra-clear glasses.

4. a kind of low radiation coated glass according to claim 1, which is characterized in that the first titanium oxide layer thickness For 15-26nm.

5. a kind of low radiation coated glass according to claim 1, which is characterized in that the second zinc oxide film thickness For 17-27nm.

6. a kind of low radiation coated glass according to claim 1, which is characterized in that the third silver film is with a thickness of 6- 10nm。

7. a kind of low radiation coated glass according to claim 1, which is characterized in that the 4th nichrome film thickness Degree is 0.1-2nm.

8. a kind of low radiation coated glass according to claim 1, which is characterized in that the thickness of the 5th zinc oxide film Degree is 4-9nm.

9. a kind of low radiation coated glass according to claim 1, which is characterized in that the thickness of the 6th silicon nitride film layer Degree is 20-25nm.

10. a kind of low radiation coated glass according to claim 1, including glass substrate, which is characterized in that the glass Substrate is the white glass basis piece of float glass process, and is successively coated in the white glass substrate surface of the float glass process: the first titanium oxide layer of 20nm thickness, Second zinc oxide film of 16nm thickness, the third silver film of 8nm thickness, the 4th nichrome film layer of 2.5nm thickness, 6nm it is thick the 6th silicon nitride film layer of five zinc oxide films and 22nm thickness.