CN208201099U - A kind of vapor deposition uses correcting device - Google Patents
A kind of vapor deposition uses correcting device Download PDFInfo
- Publication number
- CN208201099U CN208201099U CN201820841931.8U CN201820841931U CN208201099U CN 208201099 U CN208201099 U CN 208201099U CN 201820841931 U CN201820841931 U CN 201820841931U CN 208201099 U CN208201099 U CN 208201099U
- Authority
- CN
- China
- Prior art keywords
- shutter
- carrier
- vapor deposition
- crucible
- correcting device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
A kind of vapor deposition correcting device, passes through transverse shifting cross support arm, it is ensured that shutter and carrier and crucible are coaxial, mobile to pass through II locking of locking system afterwards in place.By mobile casing, it can be made to adjust height along column, to meet shutter with respect to the adjustable purpose of carrier relative altitude, pass through I locking of locking system after being adjusted in place.There are multiple trimming holes due to peripherally disposed on shutter, trimming hole is sector structure, it is open small close to center location, its outer openings is big, to when heating evaporation material evaporates in crucible, it evaporates flow and flow rate of the material after passing through trimming hole close to center location and is less than the flow and flow rate for passing through trimming hole outside left, to drive carrier rotation to make when motor II, laser on carrier can satisfy the inside and outside effect being uniformly deposited, so that evaporative mass is can satisfy consistency, improves yield rate.
Description
Technical field
The utility model relates to semiconductor laser package technical fields, and in particular to a kind of vapor deposition uses correcting device.
Background technique
In semiconductor laser encapsulation process, need to carry out laser plated film to improve light extraction efficiency and protection laser
Effect, evaporation source is generally comprised inside existing electron beam evaporation technique evaporation cavity, is set to and is used to carry quilt above evaporation source
The carrier of plating piece.It is critical issue that the consistency of product is controlled in batch production process, but in practice, same heat evaporation
The problem of different evaporating qualities are presented in the different product in position, substantially reduces homogeneity of product, influences product quality.
In order to solve problem above, process is deposited in analysis reason discovery, and it is dense that the carrier of crucible overcentre receives evaporation
Degree is high, and it is high to receive evaporative concn than the carrier of separate crucible overcentre.
Increase revision board in plated film although having in the prior art to improve the mechanism of evaporation effect, existing amendment
Plate structure generally fixed using biasing, interior outside is uniform when can not still make the laser plated film on carrier well
The consistent problem of property.
Summary of the invention
The utility model provides a kind of improvement evaporating quality consistency to overcome the shortcomings of the above technology, improve at
The vapor deposition correcting device of product rate.
The utility model overcomes the technical solution used by its technical problem to be:
A kind of vapor deposition correcting device, the crucible being set in evaporated device and horizontally disposed above crucible
For placing the carrier of laser, further includes:
Motor II, is installed in evaporated device, and output shaft is connected to carrier；
The pedestal being set in evaporated device is vertically arranged with column on pedestal；
Casing, sliding sleeve loaded on column, fixed by locking system I with respect to column locking by casing；
Horizontal branch pipe, is horizontally installed on casing, is axially inside provided with slide opening；
Cross support arm, level are plugged in the slide opening of horizontal branch pipe, and cross support arm is solid by the relatively horizontal branch pipe locking of locking system II
It is fixed；
Circular shutter is horizontally placed on the head end of cross support arm, and shutter is between carrier and crucible, shutter
It is arranged with carrier and crucible same axis, shutter is circumferentially spaced to be provided with N number of fan-shaped trimming hole, the amendment
Hole is open in outward direction by the center of circle and is become larger.
Further, above-mentioned locking system I includes several jacks I being arranged along column axially spaced-apart and is set to set
The location hole I that Guan Shangyu jack I matches is inserted into jack I and location hole using pin shaft I after a jack I is with I same axis of location hole
In I.
Further, above-mentioned locking system II includes several jacks II being arranged along cross support arm axially spaced-apart and is set to
The location hole II to match on horizontal branch pipe with jack II is inserted into jack using pin shaft II after a jack II is with II same axis of location hole
II with location hole II in.
Preferably, N is the positive integer more than or equal to 3.
It further include the motor I for being installed on cross support arm head end to further increase the uniformity of vapor deposition, the motor I
Output shaft is connected with shutter.
Preferably, the diameter of above-mentioned shutter is the half of carrier diameter.
The beneficial effects of the utility model are: passing through transverse shifting cross support arm, it is ensured that shutter and carrier and crucible are same
Axis, it is mobile to pass through II locking of locking system afterwards in place.By mobile casing, it can be made to adjust height along column, to meet
Shutter passes through I locking of locking system with respect to the adjustable purpose of carrier relative altitude after being adjusted in place.Due to shutter
Above peripherally disposed to have multiple trimming holes, trimming hole is sector structure, close to small, the outer openings of center location opening
Greatly, thus when heating evaporation material evaporates in crucible, flow and stream of the evaporation material after passing through trimming hole close to center location
Speed is less than the flow and flow rate by trimming hole outside left, thus when motor II drives carrier rotation to make, on carrier
Laser can satisfy the inside and outside effect being uniformly deposited, and so that evaporative mass is can satisfy consistency, improves yield rate.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the utility model；
Fig. 2 is the present invention looks up structural representation of the shutter of the utility model；
In figure, 1. pedestal, 2. column, 3. jack, I 4. casing, 5. 7. jack of horizontal 6. cross support arm of branch pipe, II 8. pin shaft II
9. II 13. carrier of motor I 10. shutter, 11. crucible, 12. motor, 14. trimming hole.
Specific embodiment
With reference to the accompanying drawing 1, attached drawing 2 is described further the utility model.
A kind of vapor deposition correcting device, the crucible 11 and the level above crucible 11 being set in evaporated device are set
That sets is used to place the carrier 13 of laser, further includes: motor II 12 is installed in evaporated device, and output shaft is connected to
Carrier 13；The pedestal 1 being set in evaporated device is vertically arranged with column 2 on pedestal 1；Casing 4, sliding sleeve are loaded on column 2
On, casing 4 is fixed by locking system I with respect to 2 locking of column；Horizontal branch pipe 5, is horizontally installed on casing 4, inside along axis
To being provided with slide opening；Cross support arm 6, level are plugged in the slide opening of horizontal branch pipe 5, and cross support arm 6 passes through the relatively horizontal branch of locking system II
5 locking of pipe is fixed；Circular shutter 10, is horizontally placed on the head end of cross support arm 6, and shutter 10 is located at carrier 13 and crucible
Between 11, shutter 10 and carrier 13 and 11 same axis of crucible are arranged, and shutter 10 is circumferentially spaced to be provided with and N number of be in
Fan-shaped trimming hole 14, trimming hole 14 are open in outward direction by the center of circle and are become larger.Pass through transverse shifting cross support arm 6, it is ensured that
Shutter 10 and carrier 13 and crucible 11 are coaxial, mobile to pass through II locking of locking system afterwards in place.It, can by mobile casing 4
So that it adjusts height along column 2, to meet shutter 10 with respect to the adjustable purpose of 13 relative altitude of carrier, adjustment
Pass through I locking of locking system afterwards in place.There are multiple trimming holes 14 due to peripherally disposed on shutter 10, trimming hole 14 is
Sector structure is open small close to center location, and outer openings are big, to steam when heating evaporation material evaporates in crucible 11
It sends out flow and flow rate of the material after passing through trimming hole 14 close to center location and is less than the flow for passing through 14 outside left of trimming hole
And flow velocity, so that the laser on carrier 13 can satisfy inside and outside when motor II 12 drives the rotation of carrier 13 to make
The effect being uniformly deposited, makes evaporative mass can satisfy consistency, improves yield rate.And traditional evaporated device is due to crucible
11 with the position of carrier 13 be relatively-stationary, while shutter 10 and carrier 13 and crucible 11 are not also coaxial configuration,
Therefore when its evaporation, flow velocity and the flow for flowing into 13 centre of carrier are high, and 13 periphery of carrier is due to incidence angle
The problem of spending, evaporation material enter 13 perimeter of carrier flow velocity and flow it is relatively low, so that it is low to evaporate comparison of coherence.
Embodiment 1:
Locking system I includes several jacks I 3 being arranged along 2 axially spaced-apart of column and is set on casing 4 and inserts
The location hole I that hole I 3 matches is inserted into jack I 3 and location hole I using pin shaft I after a jack I 3 is with I same axis of location hole
In.By adjusting the height of casing 4, when reach proper height and jack I 3 with location hole I with overlapping of axles after be inserted into pin shaft I and be
Can locking, it is easy to operate.
Embodiment 2:
Above-mentioned locking system II includes several jacks II 7 being arranged along 6 axially spaced-apart of cross support arm and is set to horizontal branch pipe
The location hole II to match on 5 with jack II 7 is inserted into using pin shaft II 8 after a jack II 7 is with II same axis of location hole and is inserted
In hole II 7 and location hole II.The position of logical horizontal adjustment cross support arm 6, after being adjusted in place and jack II 7 and location hole II are coaxial
After coincidence be inserted into pin shaft II 8 can locking, it is easy to operate.
Embodiment 3:
Preferred N is the positive integer more than or equal to 3, and 3 or more trimming holes 14 can preferably be realized to evaporant
The water conservancy diversion of matter further improves uniformity when vapor deposition.
Embodiment 4:
It further include the motor I 9 for being installed on 6 head end of cross support arm, the output shaft of motor I 9 is connected with shutter 10.Motor I
9 can drive shutter 10 to rotate, and carrier 13 and shutter 10 rotate the office that can be further avoided on carrier 13 simultaneously
Laser vapor deposition and the other positions of portion position generate relatively large deviation, further improve the uniformity of vapor deposition.
Embodiment 5:
The diameter of upper shutter 10 is the half of 13 diameter of carrier.
Claims (6)
1. a kind of vapor deposition correcting device, the level for being set to the crucible in evaporated device (11) and being located above crucible (11)
What is be arranged is used to place the carrier (13) of laser, which is characterized in that further include:
Motor II (12), is installed in evaporated device, and output shaft is connected to carrier (13)；
The pedestal (1) being set in evaporated device is vertically arranged with column (2) on pedestal (1)；
Casing (4), sliding sleeve loaded on column (2), fixed by locking system I with respect to column (2) locking by casing (4)；
Horizontal branch pipe (5), is horizontally installed on casing (4), is axially inside provided with slide opening；
Cross support arm (6), level are plugged in the slide opening of horizontal branch pipe (5), and cross support arm (6) passes through the relatively horizontal branch pipe of locking system II
(5) locking is fixed；
Circular shutter (10), is horizontally placed on the head end of cross support arm (6), and shutter (10) is located at carrier (13) and crucible
(11) between, shutter (10) and carrier (13) and crucible (11) same axis are arranged, and shutter (10) is circumferentially spaced
It is provided with N number of fan-shaped trimming hole (14), the trimming hole (14) is open in outward direction by the center of circle to be become larger.
2. vapor deposition correcting device according to claim 1, it is characterised in that: the locking system I includes along column (2)
Axially spaced-apart setting several jacks I (3) and be set on casing (4) with jack I (3) match location hole I, when one insert
It is inserted into jack I (3) and location hole I behind hole I (3) and I same axis of location hole using pin shaft I.
3. vapor deposition correcting device according to claim 1, it is characterised in that: the locking system II includes along cross support arm
(6) several jacks II (7) and be set to the location hole II to match on horizontal branch pipe (5) with jack II (7) that axially spaced-apart is arranged,
Using in pin shaft II (8) insertion jack II (7) and location hole II after a jack II (7) and II same axis of location hole.
4. vapor deposition correcting device according to claim 1, it is characterised in that: N is the positive integer more than or equal to 3.
5. vapor deposition correcting device as claimed in any of claims 1 to 4, it is characterised in that: further include being installed on
The output shaft of the motor I (9) of cross support arm (6) head end, the motor I (9) is connected with shutter (10).
6. vapor deposition correcting device according to claim 5, it is characterised in that: the diameter of the shutter (10) is carrying
The half of frame (13) diameter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820841931.8U CN208201099U (en) | 2018-06-01 | 2018-06-01 | A kind of vapor deposition uses correcting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820841931.8U CN208201099U (en) | 2018-06-01 | 2018-06-01 | A kind of vapor deposition uses correcting device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208201099U true CN208201099U (en) | 2018-12-07 |
Family
ID=64516892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820841931.8U Active CN208201099U (en) | 2018-06-01 | 2018-06-01 | A kind of vapor deposition uses correcting device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208201099U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109023260A (en) * | 2018-10-09 | 2018-12-18 | 京东方科技集团股份有限公司 | Evaporation source, evaporation coating device |
| CN109733955A (en) * | 2019-02-25 | 2019-05-10 | 张家港锦亿化纤有限公司 | Dacron thread filar guide |
| CN110042346A (en) * | 2019-05-17 | 2019-07-23 | 济南市半导体元件实验所 | It is a kind of to improve the device of the evaporation of aluminum uniformity, device and method |
| CN110551981A (en) * | 2018-06-01 | 2019-12-10 | 潍坊华光光电子有限公司 | Correction device and correction method for evaporation |
| CN111744717A (en) * | 2020-06-30 | 2020-10-09 | 茂联橡胶制品（深圳）有限公司 | Automatic spraying chamber |
-
2018
- 2018-06-01 CN CN201820841931.8U patent/CN208201099U/en active Active
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110551981A (en) * | 2018-06-01 | 2019-12-10 | 潍坊华光光电子有限公司 | Correction device and correction method for evaporation |
| CN110551981B (en) * | 2018-06-01 | 2021-10-01 | 潍坊华光光电子有限公司 | Correction device and correction method for evaporation |
| CN109023260A (en) * | 2018-10-09 | 2018-12-18 | 京东方科技集团股份有限公司 | Evaporation source, evaporation coating device |
| CN109733955A (en) * | 2019-02-25 | 2019-05-10 | 张家港锦亿化纤有限公司 | Dacron thread filar guide |
| CN110042346A (en) * | 2019-05-17 | 2019-07-23 | 济南市半导体元件实验所 | It is a kind of to improve the device of the evaporation of aluminum uniformity, device and method |
| CN110042346B (en) * | 2019-05-17 | 2020-02-04 | 济南市半导体元件实验所 | Device, equipment and method for improving aluminum steaming uniformity |
| CN111744717A (en) * | 2020-06-30 | 2020-10-09 | 茂联橡胶制品（深圳）有限公司 | Automatic spraying chamber |
| CN111744717B (en) * | 2020-06-30 | 2021-11-23 | 茂联橡胶制品（深圳）有限公司 | Automatic spraying chamber |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN208201099U (en) | A kind of vapor deposition uses correcting device | |
| CN106252520B (en) | A kind of multithread drying air knife and the method for preparing perovskite thin film in perovskite solar cell using the air knife | |
| CN110551981B (en) | Correction device and correction method for evaporation | |
| CN103305803A (en) | Temperature control system-based evaporation temperature control method for OLED (Organic Light Emitting Diode) organic layer | |
| CN104769151B (en) | Film deposition device | |
| CN105439212A (en) | Preparation method for cell grade cobalt hydroxide | |
| CN206599606U (en) | A kind of evaporation coating machine for realizing five face plated films | |
| CN107142456B (en) | A kind of symmetrical large scale high uniformity line style magnetic control target filming equipment of dual function column | |
| CN204982037U (en) | Rotation type coating machine | |
| CN205420534U (en) | Improve device of pulsed laser deposition uniformity of film | |
| CN110499492A (en) | A kind of evaporation coating device and its evaporation coating method | |
| CN204369970U (en) | One can magnetron sputtered vacuum deposition system | |
| CN105200518A (en) | Method for preparing lead selenide polycrystalline film on basis of oxygen ion beam assisted deposition | |
| CN205999473U (en) | Evaporated device and the part flow arrangement being installed in evaporated device | |
| CN106939409A (en) | A kind of device and method of multi-ion source sputtering production film | |
| CN113265622A (en) | Correction plate system of vacuum evaporation machine | |
| CN209798082U (en) | Automatic switching type correcting mechanism | |
| CN208378979U (en) | A kind of adjustable structure evaporating source position | |
| KR101760257B1 (en) | Glass product vacuum evaporation coating apparatus using electron beam and vacuum evaporation coating method | |
| CN114540784A (en) | Wide window of observation angle | |
| CN205999476U (en) | A kind of uniformity baffle of evaporation coating | |
| CN209039579U (en) | Prepare the magnetron sputtering film production line of back electrode of solar cell | |
| CN209508393U (en) | A kind of continuous organic material evaporating-plating equipment in 24 sources | |
| CN110230034A (en) | Optical coating multi-angle umbrella stand and coating machine comprising the umbrella stand | |
| CN113943931B (en) | Rotary slide glass device of vacuum coating machine |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |