CN207649802U - Elastomer strain film resistance - Google Patents
Elastomer strain film resistance Download PDFInfo
- Publication number
- CN207649802U CN207649802U CN201721807602.3U CN201721807602U CN207649802U CN 207649802 U CN207649802 U CN 207649802U CN 201721807602 U CN201721807602 U CN 201721807602U CN 207649802 U CN207649802 U CN 207649802U
- Authority
- CN
- China
- Prior art keywords
- resistance
- compensation
- pad
- grizzly bar
- grid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Measuring Fluid Pressure (AREA)
Abstract
Include two interior resistance grids being distributed positioned at center mirror image, two external resistance grid being distributed positioned at y direction marginal position mirror image, two compensation resistance grids being distributed positioned at X direction marginal position mirror image, four grizzly bar pads be distributed positioned at marginal position mirror image and four compensation pads form the utility model discloses a kind of elastomer strain film resistance.Above-mentioned resistance grid and pad are all made of ion beaming film sputtering technology and precision photolithography technology is fabricated, and are located at the surface of the flat diaphragm of steel bowl.Two interior resistance grids, two external resistance grid, four resistance can form Wheatstone bridge, when electric bridge is when offset output is not zero, the appropriate resistance value for selecting two compensation resistance grid, seals in the bridge arm of Wheatstone bridge, keeps the offset output of Wheatstone bridge small as possible.Sensor is easy with capacitance-resistance in this way, and sputtered film sensor excellent performance is protected.
Description
Technical field
The utility model is related to a kind of elastomer strain film resistance more particularly to a kind of elastomer steel bowl flat diaphragm to strain
The technological improvement of film resistor.
Background technology
Sputtered thin film pressure transducer is a kind of pressure sensor of function admirable, it has precision is high, stability is good etc.
Advantage is applied in many fields.But sputtered thin film pressure transducer mostly uses elastomer steel bowl to manufacture, in the flat of steel bowl
Four strain resistor grid are arranged on diaphragm, form Wheatstone bridge, and this mode manufactures electric bridge, four resistance discretenesses of bridge arm
Larger, sensor is difficult with resistance, and sensor zero point output is big, and sensor excellent performance cannot ensure.
Therefore, it is extremely heavy to develop a kind of elastomer strain film resistance convenient with resistance, that sensor zero point output is small as possible
It wants.
Under the premise of not influencing any performance of elastomer, increases by two compensation resistance grids, select compensation resistance appropriate
It seals in electric bridge, Wheatstone bridge offset output can be made small as possible, and improve production efficiency, solve the problems, such as above-mentioned.
Utility model content
The purpose of this utility model is to provide a kind of bands to compensate resistance grid, convenient with resistance, in view of the deficiencies of the prior art,
Realize pressure sensor elastomer thin film resistance offset output purpose small as possible.
In order to solve the above technical problems, the technical solution of the utility model is：Include being distributed positioned at center mirror image
Two interior resistance grids, positioned at y direction marginal position mirror image distribution two external resistance grid, be located at X direction marginal position
Two compensation resistance grids of mirror image distribution, four grizzly bar pads and four compensation pad groups positioned at the distribution of marginal position mirror image
At.
Two interior resistance grids, two external resistance grid, two compensation resistance grids, four grizzly bar pads and four compensation
Pad is fabricated using ion beaming film sputtering technology and precision photolithography technology, is located at the surface of the flat diaphragm of steel bowl.
Two interior resistance grids, two external resistance grid form Wheatstone bridge, when pressure acts on the flat diaphragm,
Balance, the output electric signal proportional to pressure are lost out positioned at the Wheatstone bridge of flat diaphragm.
When two interior resistance grids, two external resistance grid composition Wheatstone bridges, two compensation resistance grid is selected
It seals in Wheatstone bridge, keeps the offset output of the Wheatstone bridge small as possible.
Compared with prior art, it is had the beneficial effect that possessed by the utility model：Do not influencing any performance of elastomer
Under the premise of, increase by two and is easy the compensation resistance grid with resistance.In group bridge, compensation resistance appropriate is selected to seal in electric bridge, it can
Keep Wheatstone bridge offset output small as possible, and improve production efficiency, ensures the excellent performance of sputtered thin film pressure transducer.
Description of the drawings
Fig. 1 is the film resistor grid arrangement schematic diagram of the utility model.
Fig. 2 is the diagrammatic cross-section of the elastomer steel bowl of the utility model.
In figure：1, flat diaphragm；2, interior resistance grid；3, external resistance grid；4-1, grizzly bar pad 1；
4-2, grizzly bar pad 2；4-3, grizzly bar pad 3；4-4, grizzly bar pad 4；
4-5, compensation pad 1；4-6, compensation pad 2；4-7, compensation pad 3；
4-8, compensation pad 4；5, resistance grid is compensated；6, steel bowl.
Specific implementation mode
As shown in Figure 1, 2, a kind of elastomer strain film resistance includes electric in two that center mirror image is distributed
It hinders grid 2, divide positioned at two external resistance grid 3 of y direction marginal position mirror image distribution, positioned at X direction marginal position mirror image
Two compensation resistance grids 5 of cloth, four grizzly bar pad 4-1, grizzly bar pad 4-2, the grizzly bar weldering positioned at the distribution of marginal position mirror image
Disk 4-3, grizzly bar pad 4-4 and four compensation pad 4-5, compensation pad 4-6, compensation pad 4-7, compensation pad 4-8 compositions.
Above-mentioned resistance grid and pad are all made of ion beaming film sputtering technology and precision photolithography technology is fabricated, and are respectively positioned on steel bowl 6
The surface of flat diaphragm 1.
Two interior resistance grids, 2, two external resistance grid, 3 four resistance can form Wheatstone bridge, i.e., welded in grizzly bar
Disk 4-1, grizzly bar pad 4-2, grizzly bar pad 4-3, lead on grizzly bar pad 4-4, when diagonal grizzly bar pad 4-3, grizzly bar pad
When 4-4 lead input voltages, another diagonal grizzly bar pad 4-1, grizzly bar pad 4-2 leads have signal output.When electric bridge is zero
When point output is not zero, the appropriate resistance value of two compensation resistance grid 5 is selected, is sealed in the bridge arm of Wheatstone bridge, i.e.,
Compensate any one in pad 4-5, compensation pad 4-6, compensation pad 4-7, compensation pad 4-8 or two replacement grizzly bars
Pad 4-1 or/and grizzly bar pad 4-2, keeps the offset output of the Wheatstone bridge small as possible.
Operation principle：Two interior resistance grids, 2, two external resistance grid 3 seal in the compensation composition favour stone electricity of resistance grid 5
Bridge loses out balance when pressure acts on the flat diaphragm 1 positioned at the Wheatstone bridge of flat diaphragm 1, exports and is pressurized
The proportional electric signal of power exports electric signal by detection and can be obtained by the pressure size suffered by steel bowl.
The above is only the better embodiment of the utility model, is not construed as the limit to the scope of the utility model
System, and the right that the utility model is advocated is not limited thereto, all personages for being familiar with this field skill, according to
Technology contents disclosed by the utility model, can think easily and equivalence changes, the scope of protection of the utility model should all be fallen into
It is interior.
Claims (4)
1. a kind of elastomer strain film resistance, it is characterised in that：Include two interior resistance being distributed positioned at center mirror image
Grid (2) are located at two external resistance grid (3) of y direction marginal position mirror image distribution, are located at X direction marginal position mirror image
Two compensation resistance grids (5) of distribution, are located at four grizzly bar pads (4-1), the grizzly bar pad (4- of the distribution of marginal position mirror image
2), grizzly bar pad (4-3), grizzly bar pad (4-4) and four compensation pads (4-5), compensation pad (4-6), compensation pad (4-
7), compensation pad (4-8) forms.
2. elastomer strain film resistance as described in claim 1, it is characterised in that：Two interior resistance grids (2), two
External resistance grid (3), two compensation resistance grids (5), four grizzly bar pads (4-1), grizzly bar pad (4-2), grizzly bar pad (4-3),
Grizzly bar pad (4-4) and four compensation pads (4-5), compensation pad (4-6), compensation pad (4-7), compensation pad (4-8)
It is fabricated using ion beaming film sputtering technology and precision photolithography technology, is located at the surface of the flat diaphragm (1) of steel bowl (6).
3. elastomer strain film resistance as claimed in claim 2, it is characterised in that：Two interior resistance grids (2), two
External resistance grid (3) form Wheatstone bridge, when pressure acts on the flat diaphragm (1), be located at flat diaphragm (1) the favour this
Energization bridge loses out balance, the output electric signal proportional to pressure.
4. elastomer strain film resistance as claimed in claim 1 or 2, it is characterised in that：Two interior resistance grids (2),
When two external resistance grid (3) composition Wheatstone bridges, two compensation resistance grids (5) is selected to seal in Wheatstone bridge,
Make the offset output of the Wheatstone bridge close to zero.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721807602.3U CN207649802U (en) | 2017-12-22 | 2017-12-22 | Elastomer strain film resistance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721807602.3U CN207649802U (en) | 2017-12-22 | 2017-12-22 | Elastomer strain film resistance |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207649802U true CN207649802U (en) | 2018-07-24 |
Family
ID=62877983
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721807602.3U Active CN207649802U (en) | 2017-12-22 | 2017-12-22 | Elastomer strain film resistance |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207649802U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110895130A (en) * | 2019-12-28 | 2020-03-20 | 中航电测仪器股份有限公司 | Diaphragm type strain gauge and optimization method thereof |
| CN112484630A (en) * | 2020-12-09 | 2021-03-12 | 湖南启泰传感科技有限公司 | Thin film resistance strain pressure sensor and layout optimization method thereof |
| WO2022032580A1 (en) * | 2020-08-13 | 2022-02-17 | 欧菲光集团股份有限公司 | Thermocouple cold-junction compensation circuit, thermocouple assembly and temperature sensor |
-
2017
- 2017-12-22 CN CN201721807602.3U patent/CN207649802U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110895130A (en) * | 2019-12-28 | 2020-03-20 | 中航电测仪器股份有限公司 | Diaphragm type strain gauge and optimization method thereof |
| CN110895130B (en) * | 2019-12-28 | 2021-07-20 | 中航电测仪器股份有限公司 | Diaphragm type strain gauge and optimization method thereof |
| WO2022032580A1 (en) * | 2020-08-13 | 2022-02-17 | 欧菲光集团股份有限公司 | Thermocouple cold-junction compensation circuit, thermocouple assembly and temperature sensor |
| CN112484630A (en) * | 2020-12-09 | 2021-03-12 | 湖南启泰传感科技有限公司 | Thin film resistance strain pressure sensor and layout optimization method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN207649802U (en) | Elastomer strain film resistance | |
| CN102419227A (en) | Novel micro-pressure sensor chip | |
| CN202177668U (en) | Experiment instrument for directly measuring electrostatic field | |
| CN110243525B (en) | Six-dimensional force sensor | |
| CN105021341B (en) | Diaphragm pressure sensor | |
| CN102720876B (en) | Soft match grinding method for eliminating flow characteristic dead zone of electro-hydraulic servo valve | |
| CN102829747A (en) | Gap measurement method suitable for nonlinear steering system | |
| CN110146201A (en) | A kind of transducing signal conditioning system and temperature-compensation method with temperature-compensating | |
| CN104317135B (en) | Grating device, display device and its driving method | |
| CN108132115A (en) | A kind of diaphragm pressure sensor chip and manufacturing method | |
| CN204202717U (en) | Multichannel digital uneven loading error intelligence revises porous many beam types LOAD CELLS | |
| CN204758191U (en) | Three -dimensional power pressure sensor of contact parallel -plate | |
| CN203133019U (en) | Interference compensation device of electrochemical gas sensor | |
| CN204944731U (en) | High performance thin film pressure transducer | |
| CN104990663B (en) | Contact type parallel plate differential three-dimensional force pressure sensor | |
| Kahane | Radiative Corrections to π− e Scattering | |
| CN203163840U (en) | High precision column type weighing sensor | |
| CN205373870U (en) | Weighbridge management system that weighs | |
| CN205538063U (en) | Novel tension sensor | |
| CN109994596A (en) | A kind of high-performance wide-range band temperature sensitive type film chip varistor | |
| CN201488787U (en) | Force-measuring weighing sensor | |
| CN203324300U (en) | Double-cantilever-beam-type micro mechanical acceleration sensor | |
| CN108784447A (en) | A kind of voice prompt is recruited magazine | |
| CN202255704U (en) | Novel micro pressure sensor chip | |
| CN110221366A (en) | Optics cellular and resolving power test target |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20180918 Address after: 410331 A5, Changsha e center, No. 18, Xiang Tai Road, Liuyang, Hunan. Patentee after: Technology Co., Ltd. Address before: 102101 building 26, No. 8, Feng Gu Road, Badaling Development Zone, Yanqing, Beijing. Patentee before: BEIJING ZHONGHANG XINGSHENG MEASUREMENT AND CONTROL TECHNOLOGY CO., LTD. |
|
| TR01 | Transfer of patent right |