CN207085819U - 罐以及药液调制装置 - Google Patents

罐以及药液调制装置 Download PDF

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Publication number
CN207085819U
CN207085819U CN201720285859.0U CN201720285859U CN207085819U CN 207085819 U CN207085819 U CN 207085819U CN 201720285859 U CN201720285859 U CN 201720285859U CN 207085819 U CN207085819 U CN 207085819U
Authority
CN
China
Prior art keywords
tank
preparation
storage tank
brewing
storage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201720285859.0U
Other languages
English (en)
Chinese (zh)
Inventor
中川俊元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hirama Rika Kenkyusho Ltd
Original Assignee
Hirama Rika Kenkyusho Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hirama Rika Kenkyusho Ltd filed Critical Hirama Rika Kenkyusho Ltd
Application granted granted Critical
Publication of CN207085819U publication Critical patent/CN207085819U/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/50—Mixing receptacles
    • B01F35/52—Receptacles with two or more compartments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • B01F35/82—Forming a predetermined ratio of the substances to be mixed by adding a material to be mixed to a mixture in response to a detected feature, e.g. density, radioactivity, consumed power or colour
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Alcoholic Beverages (AREA)
  • Accessories For Mixers (AREA)
  • Distillation Of Fermentation Liquor, Processing Of Alcohols, Vinegar And Beer (AREA)
CN201720285859.0U 2016-03-25 2017-03-22 罐以及药液调制装置 Expired - Fee Related CN207085819U (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016061536A JP2017170393A (ja) 2016-03-25 2016-03-25 タンク、及び薬液調製装置
JP2016-061536 2016-03-25

Publications (1)

Publication Number Publication Date
CN207085819U true CN207085819U (zh) 2018-03-13

Family

ID=59934469

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201720285859.0U Expired - Fee Related CN207085819U (zh) 2016-03-25 2017-03-22 罐以及药液调制装置
CN201710176182.1A Pending CN107224929A (zh) 2016-03-25 2017-03-22 罐以及药液调制装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201710176182.1A Pending CN107224929A (zh) 2016-03-25 2017-03-22 罐以及药液调制装置

Country Status (4)

Country Link
JP (1) JP2017170393A (enExample)
KR (1) KR20170113112A (enExample)
CN (2) CN207085819U (enExample)
TW (2) TW201738930A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107224929A (zh) * 2016-03-25 2017-10-03 株式会社平间理化研究所 罐以及药液调制装置
CN114797607A (zh) * 2022-03-18 2022-07-29 中国建筑第八工程局有限公司 便携式干湿同装的粉料罐及其施工方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52101764A (en) * 1976-02-24 1977-08-26 Riyouwa Eakon Kk Twooliquid mixer of quantity type
JPS6215194Y2 (enExample) * 1981-05-19 1987-04-17
JPS5939169B2 (ja) * 1982-06-21 1984-09-21 富士物産株式会社 増粘剤の溶解方法及びその装置
JPH0340788Y2 (enExample) * 1984-12-11 1991-08-27
JPH1081393A (ja) * 1996-07-15 1998-03-31 Morimatsu Sogo Kenkyusho:Kk タンク
JPH11256865A (ja) * 1998-03-06 1999-09-21 Nippon Steel Corp 既設タンクの周りにドーナツ状タンクを設置した二重タンク構造
JP2901584B1 (ja) * 1998-03-17 1999-06-07 株式会社森松総合研究所 タンク
TWI298423B (en) * 2001-02-06 2008-07-01 Nagase & Co Ltd Developer producing equipment and method
JP3610044B2 (ja) * 2001-02-06 2005-01-12 株式会社平間理化研究所 現像液製造装置及び現像液製造方法
JP3610045B2 (ja) * 2001-02-06 2005-01-12 株式会社平間理化研究所 精製現像液製造装置及び精製現像液製造方法
US6513964B1 (en) * 2001-08-04 2003-02-04 Dylon Industries, Inc. Mass balance proportioner
JP4451581B2 (ja) * 2001-09-28 2010-04-14 株式会社日本触媒 重合防止剤の作成供給装置および作成供給方法
EP2127734A1 (en) * 2008-05-28 2009-12-02 Nestec S.A. Mixing assembly comprising a mixing chamber and an overflow chamber and process for mixing
CN201526806U (zh) * 2009-11-13 2010-07-14 北京物资学院 一种连续供液装置
JP2011105375A (ja) * 2009-11-20 2011-06-02 Aura Tec:Kk 循環タンク及び液注入混合装置
CN203777977U (zh) * 2014-04-18 2014-08-20 福建明方堂生物科技有限公司 一种用于医药加工的配液罐
JP2017148766A (ja) * 2016-02-26 2017-08-31 住友重機械エンバイロメント株式会社 混合撹拌装置
JP2017170393A (ja) * 2016-03-25 2017-09-28 株式会社平間理化研究所 タンク、及び薬液調製装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107224929A (zh) * 2016-03-25 2017-10-03 株式会社平间理化研究所 罐以及药液调制装置
CN114797607A (zh) * 2022-03-18 2022-07-29 中国建筑第八工程局有限公司 便携式干湿同装的粉料罐及其施工方法
CN114797607B (zh) * 2022-03-18 2024-05-10 中国建筑第八工程局有限公司 便携式干湿同装的粉料罐及其施工方法

Also Published As

Publication number Publication date
JP2017170393A (ja) 2017-09-28
TWM551750U (zh) 2017-11-11
CN107224929A (zh) 2017-10-03
KR20170113112A (ko) 2017-10-12
TW201738930A (zh) 2017-11-01

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Date Code Title Description
GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20180313

Termination date: 20210322