KR20170113112A - 탱크, 및 약액 조제 장치 - Google Patents
탱크, 및 약액 조제 장치 Download PDFInfo
- Publication number
- KR20170113112A KR20170113112A KR1020170031754A KR20170031754A KR20170113112A KR 20170113112 A KR20170113112 A KR 20170113112A KR 1020170031754 A KR1020170031754 A KR 1020170031754A KR 20170031754 A KR20170031754 A KR 20170031754A KR 20170113112 A KR20170113112 A KR 20170113112A
- Authority
- KR
- South Korea
- Prior art keywords
- tank
- storage tank
- preparation
- chemical liquid
- chemical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000000126 substance Substances 0.000 title claims abstract description 290
- 238000002360 preparation method Methods 0.000 title claims abstract description 258
- 239000007788 liquid Substances 0.000 title claims abstract description 245
- 238000003860 storage Methods 0.000 claims abstract description 354
- 238000005192 partition Methods 0.000 claims description 82
- 238000000034 method Methods 0.000 claims description 36
- 238000004891 communication Methods 0.000 claims description 26
- 239000002994 raw material Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 abstract description 75
- 238000009434 installation Methods 0.000 abstract description 61
- 239000000243 solution Substances 0.000 description 86
- 238000003756 stirring Methods 0.000 description 64
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 52
- 239000007789 gas Substances 0.000 description 36
- 239000007864 aqueous solution Substances 0.000 description 26
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 229910001873 dinitrogen Inorganic materials 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 230000008569 process Effects 0.000 description 15
- 230000000694 effects Effects 0.000 description 12
- 238000012986 modification Methods 0.000 description 10
- 230000004048 modification Effects 0.000 description 10
- 238000013019 agitation Methods 0.000 description 8
- 238000013461 design Methods 0.000 description 7
- 235000015073 liquid stocks Nutrition 0.000 description 7
- 238000005304 joining Methods 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000005086 pumping Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 241000219122 Cucurbita Species 0.000 description 3
- 235000009852 Cucurbita pepo Nutrition 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000011550 stock solution Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000011344 liquid material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 239000010779 crude oil Substances 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 239000011244 liquid electrolyte Substances 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/50—Mixing receptacles
- B01F35/52—Receptacles with two or more compartments
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/80—Forming a predetermined ratio of the substances to be mixed
- B01F35/82—Forming a predetermined ratio of the substances to be mixed by adding a material to be mixed to a mixture in response to a detected feature, e.g. density, radioactivity, consumed power or colour
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Alcoholic Beverages (AREA)
- Distillation Of Fermentation Liquor, Processing Of Alcohols, Vinegar And Beer (AREA)
- Accessories For Mixers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2016-061536 | 2016-03-25 | ||
| JP2016061536A JP2017170393A (ja) | 2016-03-25 | 2016-03-25 | タンク、及び薬液調製装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20170113112A true KR20170113112A (ko) | 2017-10-12 |
Family
ID=59934469
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020170031754A Ceased KR20170113112A (ko) | 2016-03-25 | 2017-03-14 | 탱크, 및 약액 조제 장치 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2017170393A (enExample) |
| KR (1) | KR20170113112A (enExample) |
| CN (2) | CN107224929A (enExample) |
| TW (2) | TW201738930A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017170393A (ja) * | 2016-03-25 | 2017-09-28 | 株式会社平間理化研究所 | タンク、及び薬液調製装置 |
| CN114797607B (zh) * | 2022-03-18 | 2024-05-10 | 中国建筑第八工程局有限公司 | 便携式干湿同装的粉料罐及其施工方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52101764A (en) * | 1976-02-24 | 1977-08-26 | Riyouwa Eakon Kk | Twooliquid mixer of quantity type |
| JPS6215194Y2 (enExample) * | 1981-05-19 | 1987-04-17 | ||
| JPS5939169B2 (ja) * | 1982-06-21 | 1984-09-21 | 富士物産株式会社 | 増粘剤の溶解方法及びその装置 |
| JPH0340788Y2 (enExample) * | 1984-12-11 | 1991-08-27 | ||
| JPH1081393A (ja) * | 1996-07-15 | 1998-03-31 | Morimatsu Sogo Kenkyusho:Kk | タンク |
| JPH11256865A (ja) * | 1998-03-06 | 1999-09-21 | Nippon Steel Corp | 既設タンクの周りにドーナツ状タンクを設置した二重タンク構造 |
| JP2901584B1 (ja) * | 1998-03-17 | 1999-06-07 | 株式会社森松総合研究所 | タンク |
| JP3610044B2 (ja) * | 2001-02-06 | 2005-01-12 | 株式会社平間理化研究所 | 現像液製造装置及び現像液製造方法 |
| TWI298423B (en) * | 2001-02-06 | 2008-07-01 | Nagase & Co Ltd | Developer producing equipment and method |
| JP3610045B2 (ja) * | 2001-02-06 | 2005-01-12 | 株式会社平間理化研究所 | 精製現像液製造装置及び精製現像液製造方法 |
| US6513964B1 (en) * | 2001-08-04 | 2003-02-04 | Dylon Industries, Inc. | Mass balance proportioner |
| JP4451581B2 (ja) * | 2001-09-28 | 2010-04-14 | 株式会社日本触媒 | 重合防止剤の作成供給装置および作成供給方法 |
| EP2127734A1 (en) * | 2008-05-28 | 2009-12-02 | Nestec S.A. | Mixing assembly comprising a mixing chamber and an overflow chamber and process for mixing |
| CN201526806U (zh) * | 2009-11-13 | 2010-07-14 | 北京物资学院 | 一种连续供液装置 |
| JP2011105375A (ja) * | 2009-11-20 | 2011-06-02 | Aura Tec:Kk | 循環タンク及び液注入混合装置 |
| CN203777977U (zh) * | 2014-04-18 | 2014-08-20 | 福建明方堂生物科技有限公司 | 一种用于医药加工的配液罐 |
| JP2017148766A (ja) * | 2016-02-26 | 2017-08-31 | 住友重機械エンバイロメント株式会社 | 混合撹拌装置 |
| JP2017170393A (ja) * | 2016-03-25 | 2017-09-28 | 株式会社平間理化研究所 | タンク、及び薬液調製装置 |
-
2016
- 2016-03-25 JP JP2016061536A patent/JP2017170393A/ja active Pending
-
2017
- 2017-03-14 KR KR1020170031754A patent/KR20170113112A/ko not_active Ceased
- 2017-03-22 CN CN201710176182.1A patent/CN107224929A/zh active Pending
- 2017-03-22 CN CN201720285859.0U patent/CN207085819U/zh not_active Expired - Fee Related
- 2017-03-24 TW TW106109871A patent/TW201738930A/zh unknown
- 2017-03-24 TW TW106204152U patent/TWM551750U/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CN107224929A (zh) | 2017-10-03 |
| TW201738930A (zh) | 2017-11-01 |
| JP2017170393A (ja) | 2017-09-28 |
| TWM551750U (zh) | 2017-11-11 |
| CN207085819U (zh) | 2018-03-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20170314 |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20191002 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20170314 Comment text: Patent Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20201216 Patent event code: PE09021S01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20210222 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20201216 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |