CN107224929A - 罐以及药液调制装置 - Google Patents

罐以及药液调制装置 Download PDF

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Publication number
CN107224929A
CN107224929A CN201710176182.1A CN201710176182A CN107224929A CN 107224929 A CN107224929 A CN 107224929A CN 201710176182 A CN201710176182 A CN 201710176182A CN 107224929 A CN107224929 A CN 107224929A
Authority
CN
China
Prior art keywords
storagetank
preparation vessel
tank
decoction
preparation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710176182.1A
Other languages
English (en)
Chinese (zh)
Inventor
中川俊元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hirama Rika Kenkyusho Ltd
Hirama Laboratories Co Ltd
Original Assignee
Hirama Rika Kenkyusho Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hirama Rika Kenkyusho Ltd filed Critical Hirama Rika Kenkyusho Ltd
Publication of CN107224929A publication Critical patent/CN107224929A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/50—Mixing receptacles
    • B01F35/52—Receptacles with two or more compartments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • B01F35/82—Forming a predetermined ratio of the substances to be mixed by adding a material to be mixed to a mixture in response to a detected feature, e.g. density, radioactivity, consumed power or colour
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Alcoholic Beverages (AREA)
  • Distillation Of Fermentation Liquor, Processing Of Alcohols, Vinegar And Beer (AREA)
  • Accessories For Mixers (AREA)
CN201710176182.1A 2016-03-25 2017-03-22 罐以及药液调制装置 Pending CN107224929A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016061536A JP2017170393A (ja) 2016-03-25 2016-03-25 タンク、及び薬液調製装置
JP2016-061536 2016-03-25

Publications (1)

Publication Number Publication Date
CN107224929A true CN107224929A (zh) 2017-10-03

Family

ID=59934469

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201720285859.0U Expired - Fee Related CN207085819U (zh) 2016-03-25 2017-03-22 罐以及药液调制装置
CN201710176182.1A Pending CN107224929A (zh) 2016-03-25 2017-03-22 罐以及药液调制装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CN201720285859.0U Expired - Fee Related CN207085819U (zh) 2016-03-25 2017-03-22 罐以及药液调制装置

Country Status (4)

Country Link
JP (1) JP2017170393A (enExample)
KR (1) KR20170113112A (enExample)
CN (2) CN207085819U (enExample)
TW (2) TWM551750U (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017170393A (ja) * 2016-03-25 2017-09-28 株式会社平間理化研究所 タンク、及び薬液調製装置
CN114797607B (zh) * 2022-03-18 2024-05-10 中国建筑第八工程局有限公司 便携式干湿同装的粉料罐及其施工方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1373393A (zh) * 2001-02-06 2002-10-09 长濑产业株式会社 显影液制造装置及显影液制造方法
CN1408467A (zh) * 2001-09-28 2003-04-09 株式会社日本触媒 制备和供给阻聚剂的装置和方法
CN201526806U (zh) * 2009-11-13 2010-07-14 北京物资学院 一种连续供液装置
CN203777977U (zh) * 2014-04-18 2014-08-20 福建明方堂生物科技有限公司 一种用于医药加工的配液罐
CN207085819U (zh) * 2016-03-25 2018-03-13 株式会社平间理化研究所 罐以及药液调制装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52101764A (en) * 1976-02-24 1977-08-26 Riyouwa Eakon Kk Twooliquid mixer of quantity type
JPS6215194Y2 (enExample) * 1981-05-19 1987-04-17
JPS5939169B2 (ja) * 1982-06-21 1984-09-21 富士物産株式会社 増粘剤の溶解方法及びその装置
JPH0340788Y2 (enExample) * 1984-12-11 1991-08-27
JPH1081393A (ja) * 1996-07-15 1998-03-31 Morimatsu Sogo Kenkyusho:Kk タンク
JPH11256865A (ja) * 1998-03-06 1999-09-21 Nippon Steel Corp 既設タンクの周りにドーナツ状タンクを設置した二重タンク構造
JP2901584B1 (ja) * 1998-03-17 1999-06-07 株式会社森松総合研究所 タンク
JP3610045B2 (ja) * 2001-02-06 2005-01-12 株式会社平間理化研究所 精製現像液製造装置及び精製現像液製造方法
JP3610044B2 (ja) * 2001-02-06 2005-01-12 株式会社平間理化研究所 現像液製造装置及び現像液製造方法
US6513964B1 (en) * 2001-08-04 2003-02-04 Dylon Industries, Inc. Mass balance proportioner
EP2127734A1 (en) * 2008-05-28 2009-12-02 Nestec S.A. Mixing assembly comprising a mixing chamber and an overflow chamber and process for mixing
JP2011105375A (ja) * 2009-11-20 2011-06-02 Aura Tec:Kk 循環タンク及び液注入混合装置
JP2017148766A (ja) * 2016-02-26 2017-08-31 住友重機械エンバイロメント株式会社 混合撹拌装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1373393A (zh) * 2001-02-06 2002-10-09 长濑产业株式会社 显影液制造装置及显影液制造方法
CN1408467A (zh) * 2001-09-28 2003-04-09 株式会社日本触媒 制备和供给阻聚剂的装置和方法
CN201526806U (zh) * 2009-11-13 2010-07-14 北京物资学院 一种连续供液装置
CN203777977U (zh) * 2014-04-18 2014-08-20 福建明方堂生物科技有限公司 一种用于医药加工的配液罐
CN207085819U (zh) * 2016-03-25 2018-03-13 株式会社平间理化研究所 罐以及药液调制装置

Also Published As

Publication number Publication date
TW201738930A (zh) 2017-11-01
KR20170113112A (ko) 2017-10-12
CN207085819U (zh) 2018-03-13
JP2017170393A (ja) 2017-09-28
TWM551750U (zh) 2017-11-11

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Application publication date: 20171003