CN206820012U - Silicon chip lifts rinse bath slowly - Google Patents

Silicon chip lifts rinse bath slowly Download PDF

Info

Publication number
CN206820012U
CN206820012U CN201720722949.1U CN201720722949U CN206820012U CN 206820012 U CN206820012 U CN 206820012U CN 201720722949 U CN201720722949 U CN 201720722949U CN 206820012 U CN206820012 U CN 206820012U
Authority
CN
China
Prior art keywords
silicon chip
tank
hot blast
rinse bath
blast knife
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201720722949.1U
Other languages
Chinese (zh)
Inventor
虞凯
孙铁囤
姚伟忠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changzhou EGing Photovoltaic Technology Co Ltd
Original Assignee
Changzhou EGing Photovoltaic Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changzhou EGing Photovoltaic Technology Co Ltd filed Critical Changzhou EGing Photovoltaic Technology Co Ltd
Priority to CN201720722949.1U priority Critical patent/CN206820012U/en
Application granted granted Critical
Publication of CN206820012U publication Critical patent/CN206820012U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)

Abstract

It the utility model is related to solar battery sheet preparing technical field,Especially a kind of silicon chip lifts rinse bath slowly,Including the tank for cleaning silicon chip,There is the cleaning chamber of opening upwards on tank,The top of tank is respectively arranged with hot blast knife and deep bead positioned at the both sides of cleaning chamber opening,There is wind chamber in hot blast knife,The inner surface of hot blast knife offers some air-out ducts connected with wind chamber,The axis in air-out duct tilts down from outside to inside,The medial surface of deep bead is inclined upwardly from outside to inside,Silicon chip of the present utility model lifts rinse bath slowly has dehydrating effect good,Cleannes are high,The advantages that to silicon chip surface not damaged and being not easy to leave washmarking,After silicon chip carries out dewater treatment,Silicon chip surface will not leave behind washmarking,The setting of hot blast knife can effectively lift slow pull rate,Realize that rapid decrease is lifted,To coordinate different cleanings to require.

Description

Silicon chip lifts rinse bath slowly
Technical field
Solar battery sheet preparing technical field is the utility model is related to, especially a kind of silicon chip lifts rinse bath slowly.
Background technology
In solar battery sheet preparation process, silicon chip needs to remove silicon chip surface oxide through overpickling, then silicon chip Washing need to be passed through, enter next process after then drying, existing silicon chip washing use single rinse bath, hoisting mechanism, Tooling basket and bracket etc., simple lower section is carried out in cold water, when stopping one section after, come slow to lift gaily decorated basket realization by manipulator It is dehydrated and is transferred to drying tank, because manipulator is when capturing the gaily decorated basket, gripper can be immersed in the water in tank, occasional hair Life tool on hand jacquard weave basket when, the globule on manipulator is dropped onto so as to cause silicon chip to have water to do over again on the silicon chip of drying tank, this The single rinse bath of kind, in order to ensure silicon chip is dehydrated, it is necessary to which manipulator slowly lifts the gaily decorated basket, it is clear that silicon can be had a strong impact on The production efficiency of piece.
Utility model content
The technical problems to be solved in the utility model is:It is low and carrying slowly in order to solve silicon chip dewatering efficiency in the prior art Easily there is the problem of globule is dropped on silicon chip during the gaily decorated basket, a kind of silicon chip is now provided and lifts rinse bath slowly.
Technical scheme is used by the utility model solves its technical problem:A kind of silicon chip lifts rinse bath slowly, including For the tank of cleaning silicon chip, there is the cleaning chamber of opening upwards on the tank, the top of the tank is opened positioned at cleaning chamber The both sides of mouth are respectively arranged with hot blast knife and deep bead, have wind chamber in the hot blast knife, the inner surface of the hot blast knife opens up Have some air-out ducts connected with wind chamber, the axis in the air-out duct tilts down from outside to inside, the deep bead it is interior Side is inclined upwardly from outside to inside.
Gaily decorated basket carrying silicon chip submerges cleaning in the cleaning chamber of tank in this programme, after cleaning, by the manipulator clamping gaily decorated basket It is slow from tank to propose to be transferred to drying tank, wherein, the wind chamber of compressed air or source nitrogen connection hot blast knife, compressed air or nitrogen Gas sprays air-flow by the air-out duct of wind chamber, and for manipulator in slow jacquard weave basket, air-flow can be the water of the adhesion on manipulator Pearl is blown off, keeps remaining without the globule on manipulator, prevents the manipulator wind that the globule is dropped on silicon chip when drying tank is entered Danger;The air-flow that hot blast knife sprays uniform flows the surface of silicon chip in the gaily decorated basket, because the axis in air-out duct is downward from outside to inside Tilt, therefore have a downward active force to the globule, and cause tank upper half-space to keep drying, so can effectively carry The speed of slow lifting manipulator is risen, so as to lift yield;Deep bead can be such that air-flow is blown in tank first half space reflection, raising Stroke effect.
In order to improve the effect that hot blast knife air-flow brushes, further, the medial surface of the hot blast knife is inclined-plane, described oblique Face is inclined upwardly from outside to inside.
In order to improve cleaning performance and lifting dewatering efficiency to silicon chip, further, the side of the tank is provided with Hot water overflow launder, there is spout hole on the hot water overflow launder, the spout hole is connected with the cleaning chamber of tank, overflow by hot water Chute keeps the temperature of water trough inner water, so as to improve silicon chip surface dehydrating effect, and realizes the replacing of water trough inner water, keeps water Clean environment can be with continuous production in groove.
The beneficial effects of the utility model are:Silicon chip of the present utility model lifts rinse bath slowly has dehydrating effect good, clear Cleanliness is high, to silicon chip surface not damaged and the advantages that be not easy to leave washmarking, and after silicon chip carries out dewater treatment, silicon chip surface will not stay Lower washmarking, the setting of hot blast knife can effectively lift slow pull rate, realize that rapid decrease is lifted, to coordinate different scavengers Skill requirement.
Brief description of the drawings
The utility model is further illustrated with reference to the accompanying drawings and examples.
Fig. 1 is the schematic diagram that the utility model silicon chip lifts rinse bath slowly;
Fig. 2 is the close-up schematic view of A in Fig. 1.
In figure:1st, tank, 1-1, cleaning chamber, 2, hot blast knife, 2-1, wind chamber, 2-2, air-out duct, 3, deep bead, 4, hot water Overflow launder, 4-1, spout hole, 5, the gaily decorated basket.
Embodiment
The utility model is described in further detail presently in connection with accompanying drawing.These accompanying drawings are simplified schematic diagram, Only illustrate basic structure of the present utility model in a schematic way, therefore it only shows the composition relevant with the utility model, direction With can be only used for helping the description to the feature in accompanying drawing with reference to (for example, upper and lower, left and right, etc.).Therefore, not limiting Detailed description below is used in property meaning processed, and is only asked by appended claims and its equivalents to limit The scope of the theme of protection.
Embodiment 1
As illustrated in fig. 1 and 2, a kind of silicon chip lifts rinse bath, including the tank 1 for cleaning silicon chip slowly, has on tank 1 The cleaning chamber 1-1 of opening upwards, the top of tank 1 are respectively arranged with hot blast knife 2 and kept out the wind positioned at the both sides of cleaning chamber 1-1 openings Plate 3, hot blast knife 2 is interior to have wind chamber 2-1, and the inner surface of hot blast knife 2 offers some air-out duct 2-2 connected with wind chamber 2-1, Air-out duct 2-2 axis tilts down from outside to inside, and the medial surface of deep bead 3 is inclined upwardly from outside to inside.
The medial surface of hot blast knife 2 is inclined-plane, and inclined-plane is inclined upwardly from outside to inside.
The side of tank 1 is provided with hot water overflow launder 4, has spout hole 4-1, spout hole 4-1 and water on hot water overflow launder 4 Groove 1 is connected, and the temperature of water in tank 1 is kept by hot water overflow launder 4, so as to improve silicon chip surface dehydrating effect, and is realized The replacing of water in tank 1, clean environment in tank 1 is kept to be pumped into pure water in hot water overflow launder 4, hot water overflows with continuous production The heating of the heated device of water such as resistance wire in chute 4 maintains water temperature at 60 DEG C, and water level reaches spout hole in hot water overflow launder 4 Constantly it can be supplied water during 4-1 height into tank 1.
Compressed air or source nitrogen are pumped into the wind chamber 2-1 of hot blast knife 2, and compressed air or nitrogen pass through wind chamber 2-1 air-out Duct 2-2 sprays air-flow, and the air-flow that there is heater to spray on hot blast knife 2 is maintained at certain temperature, manipulator to When the upper slow lifting gaily decorated basket 5 realizes silicon chip dehydration, air-flow can blow the globule of the adhesion on manipulator off, keep nothing on manipulator The globule remains, and prevents the manipulator risk that the globule is dropped on silicon chip when drying tank is entered;The air-flow that hot blast knife 2 sprays is equal The even surface for flowing through silicon chip in the gaily decorated basket 5, because air-out duct 2-2 axis tilts down from outside to inside, therefore have to the globule One downward active force, and cause the upper half-space of tank 1 to keep drying, it so can effectively lift slow lifting manipulator Speed, so as to lift yield;Deep bead 3 can make air-flow brush effect in the first half space reflection of tank 1, raising.
It is above-mentioned according to desirable embodiment of the present utility model for enlightenment, pass through above-mentioned description, relevant staff Various changes and amendments can be carried out in the range of without departing from this item utility model technological thought completely.This item is practical New technical scope is not limited to the content on specification, it is necessary to determines that its is technical according to right Scope.

Claims (3)

1. a kind of silicon chip lifts rinse bath slowly, it is characterised in that:Including the tank (1) for cleaning silicon chip, on the tank (1) Cleaning chamber (1-1) with opening upwards, the top of the tank (1) are set respectively positioned at the both sides of cleaning chamber (1-1) opening There are hot blast knife (2) and deep bead (3), there is wind chamber (2-1) in the hot blast knife (2), the inner surface of the hot blast knife (2) opens up There are some air-out ducts (2-2) connected with wind chamber (2-1), the axis of the air-out duct (2-2) tilts down from outside to inside, The medial surface of the deep bead (3) is inclined upwardly from outside to inside.
2. silicon chip according to claim 1 lifts rinse bath slowly, it is characterised in that:The medial surface of the hot blast knife (2) is Inclined-plane, the inclined-plane are inclined upwardly from outside to inside.
3. silicon chip according to claim 1 lifts rinse bath slowly, it is characterised in that:The side of the tank (1) is provided with Hot water overflow launder (4), has spout hole (4-1) on the hot water overflow launder (4), and the spout hole (4-1) is clear with tank (1) Wash chamber (1-1) connection.
CN201720722949.1U 2017-06-20 2017-06-20 Silicon chip lifts rinse bath slowly Active CN206820012U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201720722949.1U CN206820012U (en) 2017-06-20 2017-06-20 Silicon chip lifts rinse bath slowly

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201720722949.1U CN206820012U (en) 2017-06-20 2017-06-20 Silicon chip lifts rinse bath slowly

Publications (1)

Publication Number Publication Date
CN206820012U true CN206820012U (en) 2017-12-29

Family

ID=60761114

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201720722949.1U Active CN206820012U (en) 2017-06-20 2017-06-20 Silicon chip lifts rinse bath slowly

Country Status (1)

Country Link
CN (1) CN206820012U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108109946A (en) * 2018-01-16 2018-06-01 昆山成功环保科技有限公司 A kind of etching apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108109946A (en) * 2018-01-16 2018-06-01 昆山成功环保科技有限公司 A kind of etching apparatus

Similar Documents

Publication Publication Date Title
CN214767421U (en) Automatic crucible cleaning machine
CN202150481U (en) Automatic efficient solar energy battery slice etching and pickling connected device
CN206820012U (en) Silicon chip lifts rinse bath slowly
CN204307874U (en) A kind of roller linear continuous cleaner
CN212512168U (en) High-efficient drying system of slot type
CN207154265U (en) Automated optical lens mold cleaning equipment
CN207343350U (en) A kind of glass washing device for being suitable for plating mirror production line
CN213468902U (en) Lens belt cleaning device
CN114887975A (en) Automatic copper ball adding and cleaning device
CN207067571U (en) Spectacle frame cleaning machine
CN209715877U (en) A kind of full-automatic inserted sheet cleaning all-in-one machine
CN206051841U (en) A kind of toughened glass production line
CN214865729U (en) Automatic cleaning line for electroplating circuit board
CN207877860U (en) A kind of automatic blunting line system of hanging-gate style
CN206731697U (en) A kind of ultrasonic wave solar silicon wafers cleaning machine
CN211814613U (en) Hot galvanizing treatment device
CN111928592A (en) High-efficient drying system of slot type
CN204657015U (en) Diode automatic flushing device
CN207709461U (en) A kind of aquatic products cleaning system
CN207839610U (en) A kind of adjustable melt material cleaning device
CN213713675U (en) Cooling water circulating device for photovoltaic glass production
CN214262949U (en) Wafer cleaning device for semiconductor production
CN215299182U (en) Slowly-lifting cleaning water tank
CN213747779U (en) Drying groove with liquid pumping function
CN221296964U (en) Quenching and tempering integrated circulating type anchor chain heat treatment equipment

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant