CN206820012U - Silicon chip lifts rinse bath slowly - Google Patents
Silicon chip lifts rinse bath slowly Download PDFInfo
- Publication number
- CN206820012U CN206820012U CN201720722949.1U CN201720722949U CN206820012U CN 206820012 U CN206820012 U CN 206820012U CN 201720722949 U CN201720722949 U CN 201720722949U CN 206820012 U CN206820012 U CN 206820012U
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- CN
- China
- Prior art keywords
- silicon chip
- tank
- hot blast
- rinse bath
- blast knife
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
It the utility model is related to solar battery sheet preparing technical field,Especially a kind of silicon chip lifts rinse bath slowly,Including the tank for cleaning silicon chip,There is the cleaning chamber of opening upwards on tank,The top of tank is respectively arranged with hot blast knife and deep bead positioned at the both sides of cleaning chamber opening,There is wind chamber in hot blast knife,The inner surface of hot blast knife offers some air-out ducts connected with wind chamber,The axis in air-out duct tilts down from outside to inside,The medial surface of deep bead is inclined upwardly from outside to inside,Silicon chip of the present utility model lifts rinse bath slowly has dehydrating effect good,Cleannes are high,The advantages that to silicon chip surface not damaged and being not easy to leave washmarking,After silicon chip carries out dewater treatment,Silicon chip surface will not leave behind washmarking,The setting of hot blast knife can effectively lift slow pull rate,Realize that rapid decrease is lifted,To coordinate different cleanings to require.
Description
Technical field
Solar battery sheet preparing technical field is the utility model is related to, especially a kind of silicon chip lifts rinse bath slowly.
Background technology
In solar battery sheet preparation process, silicon chip needs to remove silicon chip surface oxide through overpickling, then silicon chip
Washing need to be passed through, enter next process after then drying, existing silicon chip washing use single rinse bath, hoisting mechanism,
Tooling basket and bracket etc., simple lower section is carried out in cold water, when stopping one section after, come slow to lift gaily decorated basket realization by manipulator
It is dehydrated and is transferred to drying tank, because manipulator is when capturing the gaily decorated basket, gripper can be immersed in the water in tank, occasional hair
Life tool on hand jacquard weave basket when, the globule on manipulator is dropped onto so as to cause silicon chip to have water to do over again on the silicon chip of drying tank, this
The single rinse bath of kind, in order to ensure silicon chip is dehydrated, it is necessary to which manipulator slowly lifts the gaily decorated basket, it is clear that silicon can be had a strong impact on
The production efficiency of piece.
Utility model content
The technical problems to be solved in the utility model is:It is low and carrying slowly in order to solve silicon chip dewatering efficiency in the prior art
Easily there is the problem of globule is dropped on silicon chip during the gaily decorated basket, a kind of silicon chip is now provided and lifts rinse bath slowly.
Technical scheme is used by the utility model solves its technical problem:A kind of silicon chip lifts rinse bath slowly, including
For the tank of cleaning silicon chip, there is the cleaning chamber of opening upwards on the tank, the top of the tank is opened positioned at cleaning chamber
The both sides of mouth are respectively arranged with hot blast knife and deep bead, have wind chamber in the hot blast knife, the inner surface of the hot blast knife opens up
Have some air-out ducts connected with wind chamber, the axis in the air-out duct tilts down from outside to inside, the deep bead it is interior
Side is inclined upwardly from outside to inside.
Gaily decorated basket carrying silicon chip submerges cleaning in the cleaning chamber of tank in this programme, after cleaning, by the manipulator clamping gaily decorated basket
It is slow from tank to propose to be transferred to drying tank, wherein, the wind chamber of compressed air or source nitrogen connection hot blast knife, compressed air or nitrogen
Gas sprays air-flow by the air-out duct of wind chamber, and for manipulator in slow jacquard weave basket, air-flow can be the water of the adhesion on manipulator
Pearl is blown off, keeps remaining without the globule on manipulator, prevents the manipulator wind that the globule is dropped on silicon chip when drying tank is entered
Danger;The air-flow that hot blast knife sprays uniform flows the surface of silicon chip in the gaily decorated basket, because the axis in air-out duct is downward from outside to inside
Tilt, therefore have a downward active force to the globule, and cause tank upper half-space to keep drying, so can effectively carry
The speed of slow lifting manipulator is risen, so as to lift yield;Deep bead can be such that air-flow is blown in tank first half space reflection, raising
Stroke effect.
In order to improve the effect that hot blast knife air-flow brushes, further, the medial surface of the hot blast knife is inclined-plane, described oblique
Face is inclined upwardly from outside to inside.
In order to improve cleaning performance and lifting dewatering efficiency to silicon chip, further, the side of the tank is provided with
Hot water overflow launder, there is spout hole on the hot water overflow launder, the spout hole is connected with the cleaning chamber of tank, overflow by hot water
Chute keeps the temperature of water trough inner water, so as to improve silicon chip surface dehydrating effect, and realizes the replacing of water trough inner water, keeps water
Clean environment can be with continuous production in groove.
The beneficial effects of the utility model are:Silicon chip of the present utility model lifts rinse bath slowly has dehydrating effect good, clear
Cleanliness is high, to silicon chip surface not damaged and the advantages that be not easy to leave washmarking, and after silicon chip carries out dewater treatment, silicon chip surface will not stay
Lower washmarking, the setting of hot blast knife can effectively lift slow pull rate, realize that rapid decrease is lifted, to coordinate different scavengers
Skill requirement.
Brief description of the drawings
The utility model is further illustrated with reference to the accompanying drawings and examples.
Fig. 1 is the schematic diagram that the utility model silicon chip lifts rinse bath slowly;
Fig. 2 is the close-up schematic view of A in Fig. 1.
In figure:1st, tank, 1-1, cleaning chamber, 2, hot blast knife, 2-1, wind chamber, 2-2, air-out duct, 3, deep bead, 4, hot water
Overflow launder, 4-1, spout hole, 5, the gaily decorated basket.
Embodiment
The utility model is described in further detail presently in connection with accompanying drawing.These accompanying drawings are simplified schematic diagram,
Only illustrate basic structure of the present utility model in a schematic way, therefore it only shows the composition relevant with the utility model, direction
With can be only used for helping the description to the feature in accompanying drawing with reference to (for example, upper and lower, left and right, etc.).Therefore, not limiting
Detailed description below is used in property meaning processed, and is only asked by appended claims and its equivalents to limit
The scope of the theme of protection.
Embodiment 1
As illustrated in fig. 1 and 2, a kind of silicon chip lifts rinse bath, including the tank 1 for cleaning silicon chip slowly, has on tank 1
The cleaning chamber 1-1 of opening upwards, the top of tank 1 are respectively arranged with hot blast knife 2 and kept out the wind positioned at the both sides of cleaning chamber 1-1 openings
Plate 3, hot blast knife 2 is interior to have wind chamber 2-1, and the inner surface of hot blast knife 2 offers some air-out duct 2-2 connected with wind chamber 2-1,
Air-out duct 2-2 axis tilts down from outside to inside, and the medial surface of deep bead 3 is inclined upwardly from outside to inside.
The medial surface of hot blast knife 2 is inclined-plane, and inclined-plane is inclined upwardly from outside to inside.
The side of tank 1 is provided with hot water overflow launder 4, has spout hole 4-1, spout hole 4-1 and water on hot water overflow launder 4
Groove 1 is connected, and the temperature of water in tank 1 is kept by hot water overflow launder 4, so as to improve silicon chip surface dehydrating effect, and is realized
The replacing of water in tank 1, clean environment in tank 1 is kept to be pumped into pure water in hot water overflow launder 4, hot water overflows with continuous production
The heating of the heated device of water such as resistance wire in chute 4 maintains water temperature at 60 DEG C, and water level reaches spout hole in hot water overflow launder 4
Constantly it can be supplied water during 4-1 height into tank 1.
Compressed air or source nitrogen are pumped into the wind chamber 2-1 of hot blast knife 2, and compressed air or nitrogen pass through wind chamber 2-1 air-out
Duct 2-2 sprays air-flow, and the air-flow that there is heater to spray on hot blast knife 2 is maintained at certain temperature, manipulator to
When the upper slow lifting gaily decorated basket 5 realizes silicon chip dehydration, air-flow can blow the globule of the adhesion on manipulator off, keep nothing on manipulator
The globule remains, and prevents the manipulator risk that the globule is dropped on silicon chip when drying tank is entered;The air-flow that hot blast knife 2 sprays is equal
The even surface for flowing through silicon chip in the gaily decorated basket 5, because air-out duct 2-2 axis tilts down from outside to inside, therefore have to the globule
One downward active force, and cause the upper half-space of tank 1 to keep drying, it so can effectively lift slow lifting manipulator
Speed, so as to lift yield;Deep bead 3 can make air-flow brush effect in the first half space reflection of tank 1, raising.
It is above-mentioned according to desirable embodiment of the present utility model for enlightenment, pass through above-mentioned description, relevant staff
Various changes and amendments can be carried out in the range of without departing from this item utility model technological thought completely.This item is practical
New technical scope is not limited to the content on specification, it is necessary to determines that its is technical according to right
Scope.
Claims (3)
1. a kind of silicon chip lifts rinse bath slowly, it is characterised in that:Including the tank (1) for cleaning silicon chip, on the tank (1)
Cleaning chamber (1-1) with opening upwards, the top of the tank (1) are set respectively positioned at the both sides of cleaning chamber (1-1) opening
There are hot blast knife (2) and deep bead (3), there is wind chamber (2-1) in the hot blast knife (2), the inner surface of the hot blast knife (2) opens up
There are some air-out ducts (2-2) connected with wind chamber (2-1), the axis of the air-out duct (2-2) tilts down from outside to inside,
The medial surface of the deep bead (3) is inclined upwardly from outside to inside.
2. silicon chip according to claim 1 lifts rinse bath slowly, it is characterised in that:The medial surface of the hot blast knife (2) is
Inclined-plane, the inclined-plane are inclined upwardly from outside to inside.
3. silicon chip according to claim 1 lifts rinse bath slowly, it is characterised in that:The side of the tank (1) is provided with
Hot water overflow launder (4), has spout hole (4-1) on the hot water overflow launder (4), and the spout hole (4-1) is clear with tank (1)
Wash chamber (1-1) connection.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201720722949.1U CN206820012U (en) | 2017-06-20 | 2017-06-20 | Silicon chip lifts rinse bath slowly |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201720722949.1U CN206820012U (en) | 2017-06-20 | 2017-06-20 | Silicon chip lifts rinse bath slowly |
Publications (1)
Publication Number | Publication Date |
---|---|
CN206820012U true CN206820012U (en) | 2017-12-29 |
Family
ID=60761114
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201720722949.1U Active CN206820012U (en) | 2017-06-20 | 2017-06-20 | Silicon chip lifts rinse bath slowly |
Country Status (1)
Country | Link |
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CN (1) | CN206820012U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108109946A (en) * | 2018-01-16 | 2018-06-01 | 昆山成功环保科技有限公司 | A kind of etching apparatus |
-
2017
- 2017-06-20 CN CN201720722949.1U patent/CN206820012U/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108109946A (en) * | 2018-01-16 | 2018-06-01 | 昆山成功环保科技有限公司 | A kind of etching apparatus |
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