CN206731697U - A kind of ultrasonic wave solar silicon wafers cleaning machine - Google Patents

A kind of ultrasonic wave solar silicon wafers cleaning machine Download PDF

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Publication number
CN206731697U
CN206731697U CN201720434000.1U CN201720434000U CN206731697U CN 206731697 U CN206731697 U CN 206731697U CN 201720434000 U CN201720434000 U CN 201720434000U CN 206731697 U CN206731697 U CN 206731697U
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CN
China
Prior art keywords
plate
silicon wafers
guiding mechanism
solar silicon
foreboard
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201720434000.1U
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Chinese (zh)
Inventor
徐宏表
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xinchang County Mining Handicraft Co Ltd
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Xinchang County Mining Handicraft Co Ltd
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Filing date
Publication date
Application filed by Xinchang County Mining Handicraft Co Ltd filed Critical Xinchang County Mining Handicraft Co Ltd
Priority to CN201720434000.1U priority Critical patent/CN206731697U/en
Application granted granted Critical
Publication of CN206731697U publication Critical patent/CN206731697U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

It the utility model is related to solar silicon wafers cleaning field, more particularly to a kind of ultrasonic wave solar silicon wafers cleaning machine, including translating bracket, the end of translating bracket extends to the right and exceedes ultrasonic rinse tank, in translating bracket air-heater is fixed with beyond the part of ultrasonic rinse tank, and it is fixed with wind guiding mechanism below air-heater, wind guiding mechanism includes top plate, foreboard, back plate and right plate, top plate, foreboard, back plate and right plate are interconnected hollow structure, and the top surface of top plate is fixed on the lower section of air-heater, foreboard, some air vents are uniformly offered on the madial wall of back plate and right plate, hook is fixed with below the top plate of wind guiding mechanism;Manually hanging basket is hung on the hook in wind guiding mechanism, open air-heater and blow out hot blast, and blowed to by wind guiding mechanism in hanging basket, after a period of time, disconnect hot blast electromechanical source, manual cleaning is now carried out again, the drying of solar silicon wafers when so ensuring that blanking, reduces the mortality that solar silicon wafers clean.

Description

A kind of ultrasonic wave solar silicon wafers cleaning machine
Technical field
It the utility model is related to solar silicon wafers cleaning field, and in particular to a kind of ultrasonic wave solar silicon wafers cleaning machine.
Background technology
With the increasingly shortage of regenerative resource, new energy approach is found, has become the common objective of the mankind.The sun The inexhaustible regenerative resource of people can be made.Current whole world exploitation during using solar silicon wafers come power generation and heat supply Focus.Although our countries start late in solar silicon wafers application industry, just from the point of view of development speed in recent years, still It is quite surprising.But currently domestic solar silicon wafers manufacturer single groove also in common use or multi-groove type combination cleaning by hand;With The increase of product consumption, the raising of quality requirement and the increase of labour's production cost, the cleaning form of existing equipment is It can not meet to require.
In order to solve above-mentioned problem, disclosed in Chinese patent application prospectus, CN103887212A full-automatic Solar silicon wafers cleaning machine.The cleaning of solar silicon wafers is enabled to reduce labour, automaticity is high.But cleaning When closing to an end, after solar silicon wafers clean in ultrasonic rinse tank, complete to clean by artificial blanking, in blanking, too People's residual fraction liquid on positive energy silicon chip, if now blanking is accumulated, can to cause bacterium through moisture on solar silicon wafers Etc. microbial growth, so as to cause cleaning to fail.
Utility model content
The problem of existing for prior art, the utility model provide a kind of ultrasonic wave solar silicon wafers cleaning machine.
Concrete technical scheme is as follows:
A kind of ultrasonic wave solar silicon wafers cleaning machine, include immersion feeding groove, ultrasound thick washing trough, ultrasound successively from left to right Ripple rinse bath, soak acid-cleaning groove, ultrasonic alkaline tank, ultrasonic rinse tank and blanking bench, pass through pole above above-mentioned each groove Cross bar is fixed with, the cross bar lower section is connected with translating bracket, the translation branch by some electric lifting rods being vertically arranged Frame is by being linked with hanging basket;The end of the translating bracket extends to the right and exceedes the ultrasonic rinse tank, described flat Move support and be fixed with air-heater beyond the part of the ultrasonic rinse tank, and wind guiding mechanism is fixed with below the air-heater, institute The left side and bottom for stating wind guiding mechanism are open, and the wind guiding mechanism includes top plate, foreboard, back plate and right plate, the top Plate, the foreboard, the back plate and the right plate are interconnected hollow structure, and offer and pass through on the top plate Wear the top plate top surface and the ventilating opening of bottom surface, and the top surface of the top plate is fixed on the lower section of the air-heater, the foreboard, Some air vents are uniformly offered on the madial wall of the back plate and the right plate, on the top of the wind guiding mechanism The hook is fixed with the lower surface of plate.
Preferably, the hanging basket hanging is when on the hook on the top plate of the wind guiding mechanism, the top plate Height to the Hanging Basket bottom surface is less than the height of the wind guiding mechanism;
Preferably, the length of the right plate on the wind guiding mechanism is more than the width of the hanging basket, and the foreboard It is more than the length of the hanging basket with the length of the back plate;
Preferably, the height of the foreboard, the back plate and the right plate is identical;
Preferably, the foreboard is identical with the length of the back plate.
Beneficial effect:
When will clean finish that i.e. hanging basket rises from positioned at last ultrasonic rinse tank when, manually remove and hang from hook Basket, then hanging basket is hung on the hook on wind guiding mechanism top plate, manually open air-heater, at this moment air-heater blowout hot blast, And blowed to by wind guiding mechanism in hanging basket, after a period of time, hot blast electromechanical source is disconnected, at this moment the solar silicon wafers in hanging basket In dry state, manual cleaning is now carried out again.The drying of the solar silicon wafers in blanking is so ensured that, is reduced The mortality of solar silicon wafers cleaning.
Brief description of the drawings
, below will be to embodiment in order to illustrate more clearly of the utility model embodiment or technical scheme of the prior art Or the required accompanying drawing used is briefly described in description of the prior art, it should be apparent that, drawings in the following description are only It is some embodiments of the utility model, for those of ordinary skill in the art, is not paying the premise of creative work Under, other accompanying drawings can also be obtained according to these accompanying drawings.
Fig. 1:Structural representation of the present utility model;
Fig. 2:Air-heater and wind guiding mechanism of the present utility model are installed on the dimensional structure diagram of translating bracket end.
Reference is as follows:
1st, feeding groove is soaked, 2, the thick washing trough of ultrasound, 3, ultrasonic cleaner, 4, soak acid-cleaning groove, 5, ultrasonic alkaline tank, 6, Ultrasonic rinse tank, 7, blanking bench, 8, pole, 9, cross bar, 10, electric lifting rod, 11, translating bracket, 12, hook, 13, hanging basket, 14th, air-heater, 15, wind guiding mechanism, 16, top plate, 17, foreboard, 18, back plate, 19, right plate, 20, air vent.
Embodiment
It is real to the utility model below to make the purpose, technical scheme and advantage of the utility model embodiment clearer The technical scheme applied in example is clearly and completely described, it is clear that described embodiment is that the utility model part is implemented Example, rather than whole embodiments.Based on the embodiment in the utility model, those of ordinary skill in the art are not making wound The every other embodiment obtained under the premise of the property made work, belong to the scope of the utility model protection.
With reference to Fig. 2, referring to Fig. 1:A kind of ultrasonic wave solar silicon wafers cleaning machine, include immersion feeding groove successively from left to right 1st, ultrasound thick washing trough 2, ultrasonic cleaner 3, soak acid-cleaning groove 4, ultrasonic alkaline tank 5, ultrasonic rinse tank 6 and blanking bench 7, The top of above-mentioned each groove is fixed with cross bar 9 by pole 8, and the lower section of cross bar 9 is connected by some electric lifting rods 10 being vertically arranged Translating bracket 11 is connected to, translating bracket 11 is linked with hanging basket 13 by hook 12.
During work, the thick washing trough 2 of feeding groove 1, ultrasound, the interior injection running water of ultrasonic cleaner 3 will be soaked first, soaked Acidwash solution is injected in descaling bath 4, injects alkali wash water in ultrasonic alkaline tank 5, distilled water is injected in ultrasonic rinse tank 6, will Solar silicon wafers to be washed are placed in hanging basket 13, are placed into immersion feeding groove 1 and are soaked, and after reaching certain time, manually will Hanging basket 13 is hung on the hook 12 of translation hanger.When the drive hanging basket 13 of translating bracket 11 runs to ultrasonic thick 2 top of washing trough, electricity Dynamic elevating lever 10 drives translating bracket 11 to decline, and hanging basket 13 is immersed in ultrasonic thick washing trough 2, to after the specified reaction time, puts down The action for moving the repeated translation of support 11 and lifting passes sequentially through ultrasonic thick washing trough 2, ultrasonic cleaner 3, soak acid-cleaning groove 4, super Sound alkaline bath 5, ultrasonic rinse tank 6.
The end of translating bracket 11 extends to the right and exceedes ultrasonic rinse tank 6, exceeds ultrasonic rinse tank 6 in translating bracket 11 Part be fixed with air-heater 14, and the lower section of air-heater 14 is fixed with wind guiding mechanism 15, and the left side and bottom of wind guiding mechanism 15 are equal Opening, wind guiding mechanism 15 include top plate 16, foreboard 17, back plate 18 and right plate 19, top plate 16, foreboard 17, back plate 18 and Right plate 19 is interconnected hollow structure, and the ventilating opening through the top surface of top plate 16 and bottom surface is offered on top plate 16, It is uniform on the madial wall of foreboard 17, back plate 18 and right plate 19 and the top surface of top plate 16 is fixed on the lower section of air-heater 14 Some air vents 20 are offered, hook 12 is fixed with the lower surface of the top plate 16 of wind guiding mechanism 15.Hanging basket 13, which is hung, is leading When on the hook 12 on the top plate 16 of wind mechanism 15, the height of top plate 16 to Hanging Basket bottom surface is less than the height of wind guiding mechanism 15.Lead The length of right plate 19 in wind mechanism 15 is more than the width of hanging basket 13, and the length of foreboard 17 and back plate 18 is more than hanging basket 13 Length.The height of foreboard 17, back plate 18 and right plate 19 is identical.Foreboard 17 is identical with the length of back plate 18.
When will clean finish that i.e. hanging basket 13 rises from positioned at last ultrasonic rinse tank 6 when, manually from hook 12 Hanging basket 13 is removed, then hanging basket 13 is hung on the hook 12 on the top plate 16 of wind guiding mechanism 15, it is artificial to open air-heater 14, this When air-heater 14 blow out hot blast, and blowed to by wind guiding mechanism 15 in hanging basket 13, after a period of time, disconnect the power supply of air-heater 14, At this moment the solar silicon wafers being in hanging basket 13 are in dry state, now carry out manual cleaning again.So ensure that The drying of solar silicon wafers in blanking, reduce the mortality of solar silicon wafers cleaning.
Above example is only to illustrate the technical solution of the utility model, rather than its limitations;Although with reference to foregoing reality Example is applied the utility model is described in detail, it will be understood by those within the art that:It still can be to preceding State the technical scheme described in each embodiment to modify, or equivalent substitution is carried out to which part technical characteristic;And these Modification is replaced, and the essence of appropriate technical solution is departed from the spirit and model of various embodiments of the utility model technical scheme Enclose.

Claims (5)

1. a kind of ultrasonic wave solar silicon wafers cleaning machine, include immersion feeding groove, ultrasound thick washing trough, ultrasonic wave successively from left to right Rinse bath, soak acid-cleaning groove, ultrasonic alkaline tank, ultrasonic rinse tank and blanking bench, consolidated in the top of above-mentioned each groove by pole Surely there is cross bar, the cross bar lower section is connected with translating bracket, the translating bracket by some electric lifting rods being vertically arranged By being linked with hanging basket, it is characterised in that:The end of the translating bracket extends to the right and exceedes the ultrasonic rinse tank, Air-heater is fixed with beyond the part of the ultrasonic rinse tank in the translating bracket, and wind-guiding is fixed with below the air-heater Mechanism, the left side and bottom of the wind guiding mechanism are open, and the wind guiding mechanism includes top plate, foreboard, back plate and right plate, The top plate, the foreboard, the back plate and the right plate are interconnected hollow structure, and are opened on the top plate Provided with the ventilating opening through the top plate top surface and bottom surface, and the top surface of the top plate is fixed on the lower section of the air-heater, institute State and some air vents are uniformly offered on the madial wall of foreboard, the back plate and the right plate, in the wind guiding mechanism The top plate lower surface on be fixed with the hook.
2. ultrasonic wave solar silicon wafers cleaning machine as claimed in claim 1, it is characterised in that:The hanging basket hanging is led described When on the hook on the top plate of wind mechanism, the height of the top plate to the Hanging Basket bottom surface is less than the wind guiding mechanism Height.
3. ultrasonic wave solar silicon wafers cleaning machine as claimed in claim 1, it is characterised in that:It is described on the wind guiding mechanism The length of right plate is more than the width of the hanging basket, and the length of the foreboard and the back plate is more than the length of the hanging basket.
4. ultrasonic wave solar silicon wafers cleaning machine as claimed in claim 1, it is characterised in that:The foreboard, the back plate with And the height of the right plate is identical.
5. ultrasonic wave solar silicon wafers cleaning machine as claimed in claim 4, it is characterised in that:The foreboard and the back plate Length is identical.
CN201720434000.1U 2017-04-24 2017-04-24 A kind of ultrasonic wave solar silicon wafers cleaning machine Expired - Fee Related CN206731697U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201720434000.1U CN206731697U (en) 2017-04-24 2017-04-24 A kind of ultrasonic wave solar silicon wafers cleaning machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201720434000.1U CN206731697U (en) 2017-04-24 2017-04-24 A kind of ultrasonic wave solar silicon wafers cleaning machine

Publications (1)

Publication Number Publication Date
CN206731697U true CN206731697U (en) 2017-12-12

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201720434000.1U Expired - Fee Related CN206731697U (en) 2017-04-24 2017-04-24 A kind of ultrasonic wave solar silicon wafers cleaning machine

Country Status (1)

Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111804653A (en) * 2019-12-05 2020-10-23 苏州殷绿勒精密机械科技有限公司 Multi-groove type precision panel cleaning equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111804653A (en) * 2019-12-05 2020-10-23 苏州殷绿勒精密机械科技有限公司 Multi-groove type precision panel cleaning equipment

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GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20171212

Termination date: 20180424