CN206541807U - Wet method etching groove and wet-method etching equipment - Google Patents
Wet method etching groove and wet-method etching equipment Download PDFInfo
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- CN206541807U CN206541807U CN201720109655.1U CN201720109655U CN206541807U CN 206541807 U CN206541807 U CN 206541807U CN 201720109655 U CN201720109655 U CN 201720109655U CN 206541807 U CN206541807 U CN 206541807U
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Abstract
The utility model is related to field of display, disclose a kind of wet method etching groove and wet-method etching equipment, the wet method etching groove (1) includes the cell body (10) with import (100) and outlet (101) and is arranged on the gas curtain (11) in the exit, transmission has the glass substrate of sprinkling decoction between the import and the outlet, the gas curtain includes being formed at the passage inside the gas curtain, the two ends of the passage are respectively formed with the air inlet that is communicated with source of the gas and can be to the gas outlets of the glass substrate blow gas, and the wet method etching groove includes feed unit, the feed unit can provide medium to pass through passage described in the medium washes by the air inlet.The passage of the inside of gas curtain in the wet method etching groove can be rinsed, so as to prevent the gas curtain to be blocked.Due to being provided with the wet method etching groove in the wet-method etching equipment, so that gas can smoothly be discharged by stable, etching efficiency is improved.
Description
Technical field
The utility model is related to display technology field, in particular it relates to which a kind of wet method etching groove and wet etching are set
It is standby.
Background technology
Thin Film Transistor-LCD (Thin Film Transistor-Liquid Crystal Display, referred to as
TFT-LCD) technology is, using the technology that microelectronics retrofit is carried out on silicon (si), to be transplanted in large-area glass substrate
The processing of tft array is carried out, then by the array base palte and another substrate with color filter film, using mature with industry
LCD technology, forms a liquid crystal cell and is combined, then the process such as pastes through process such as polaroid later, eventually forms liquid crystal display
Device.
In tft array (Array) process for making, plated film, photoetching, quarter on clean glass substrate are related generally to
The technique such as lose, remove photoresist, wherein etching technics is broadly divided into dry etching and wet etching.Wet etching is a pure chemistry
Course of reaction, refers to remove the part that not masked membrane material is sheltered using the chemical reaction between solution and pre-embossed corrosion material
And reach etching purpose.Because wet etching has, good, the reproducible, production efficiency of selectivity is high, equipment is simple, cost is low
Advantage, is widely used.
During wet etching, it will usually be used as medicine liquid spray to glass from the good acid solution (such as oxalic acid) of corrosivity
On glass substrate, it in order to which the glass substrate for preventing decoction from being gone out etching groove is taken out of, can select that gas is installed in the outlet of etching groove substantially
Curtain, and gas curtain is installed to prevent acid gas from leaking in the outlet of etching groove and/or entrance, in addition, can also etching groove entrance
Gas curtain is installed, as shown in fig. 1, the gas curtain 11 includes the air inlet communicated with source of the gas and the outlet communicated with the air inlet
Mouthful, the decoction carried on glass substrate can be blown back etching groove by the gas blown out from the gas outlet, so as to reach that decoction is circulated
The purpose utilized.
However, because some decoctions such as oxalic acid is easily crystallized, it is easy at the gas outlet of gas curtain, especially in blow gas
In the presence of, it is easier to crystallize.After crystalline solid is produced, gas curtain is blocked, and then results in decoction and is largely carried outside, is made
Into the increase of decoction cost；The serious film layer that can also cause Array is damaged, causes signal wire open circuit.
Utility model content
The purpose of this utility model is to provide a kind of wet method etching groove, the passage of the inside of the gas curtain in the wet method etching groove
It can be rinsed, so as to prevent the gas curtain to be blocked.
To achieve these goals, the utility model provides a kind of wet method etching groove, the wet method etching groove include having into
Mouth and the cell body of outlet and the gas curtain for being arranged on the exit, transmission has sprinkling decoction between the import and the outlet
Glass substrate, the gas curtain includes being formed at passage inside the gas curtain, and the two ends of the passage are respectively formed with and gas
Air inlet that source is communicated and can be to the gas outlet of the glass substrate blow gas, and the wet method etching groove includes supplying
To unit, the feed unit can provide medium to pass through passage described in the medium washes by the air inlet.
Preferably, the feed unit includes connecting air inlet and the first pipeline of medium source and the setting of the gas curtain
The first control valve on first pipeline；The air inlet of the gas curtain and the source of the gas are connected by the second pipeline, described
The second control valve is provided with second pipeline.
Preferably, the wet method etching groove rinses the clear of the gas curtain outer surface including being arranged on being used in the cell body
Wash part.
Preferably, the cleaning part is located at the top of the gas curtain, and the cleaning part includes and the length along the gas curtain
The supervisor of direction setting and the spout being opened on the supervisor, the feed unit are also provided to the supervisor and given an account of
Matter.
Preferably, the feed unit is connected by the 3rd pipeline is provided with the on the cleaning part, the 3rd pipeline
Three control valves.
Preferably, the wet method etching groove includes being arranged in the cell body and can spray medicine to the glass substrate
The spraying pack unit of liquid, the spraying pack unit includes jet pipe and is installed on the jet pipe and the nozzle communicated with the jet pipe.
Preferably, the import and the exit are at least provided with glass inductor.
In the above-mentioned technical solutions, by the way that the air inlet of the gas curtain is connected with providing the feed unit of medium, energy
Enough solid matter such as crystalline solid that medium is passed into the passage positioned at the inside of the gas curtain to be pointed in the passage enter
Row rinse, it is ensured that the passage of the gas curtain it is unobstructed so that carry out wet etching operation when, gas can be stablized smooth
Discharge, so that when the glass substrate will be communicated off the outlet, decoction can be blown back to the wet etching
In groove, this just greatly reduces decoction cost, while improving the operating efficiency of wet etching.
Another object of the present utility model is to provide a kind of wet-method etching equipment, and this practicality of the wet-method etching equipment bag is new
Wet method etching groove and the dipper to wet method etching groove offer decoction that type is provided.Due to being set in the wet etching
Wet method etching groove provided by the utility model is provided with standby, so as to utilize the logical of the inside of gas curtain described in medium washes
Road, such as crystalline solid of the solid matter in the passage is rinsed out, therefore when carrying out wet etching operation, gas can
Smoothly discharged by stable.
Preferably, the wet method etching groove includes being arranged in the cell body and can spray decoction to the glass substrate
Spraying pack unit, the spraying pack unit include the jet pipe that is communicated with the dipper and be installed on the jet pipe and with the jet pipe phase
Logical nozzle, booster pump is provided between the jet pipe and the dipper.
Preferably, the import of the cell body and the exit are at least provided with glass inductor；The supply
Unit includes first for connecting the air inlet of the gas curtain and the first pipeline of medium source and being arranged on first pipeline
Control valve；The air inlet of the gas curtain and the source of the gas are connected by the second pipeline, and the second control is provided with second pipeline
Valve processed；The wet method etching groove includes being arranged on the cleaning part for being used in the cell body rinsing the gas curtain outer surface, described
Feed unit is connected by the 3rd pipeline and is provided with the 3rd control valve on the cleaning part, the 3rd pipeline；
The wet-method etching equipment includes supervising device, and the supervising device includes control unit, and described control unit is set
Be set to when the glass inductor has sensed the glass substrate, described control unit control first control valve and
3rd control valve is closed and controls second control valve to open.
Preferably, the supervising device includes being connected with described control unit and for detecting that the dipper Chinese medicine liquid is dense
The concentration detecting unit of degree, the feed unit is connected by the 4th pipeline and is provided with the dipper, the 4th pipeline
4th control valve；
The liquor strength that described control unit is set to detect in the dipper exceeds the upper of default fluctuation range
Limit value and when the glass inductor does not sense the glass substrate, described control unit controls second control valve to close
Close and control first control valve and/or the 3rd control valve open to rinse the gas curtain；When detecting the decoction
Liquor strength in groove exceeds the higher limit of the default fluctuation range and the glass inductor has sensed the glass base
During plate, described control unit control first control valve and the 3rd control valve close and control second control valve with
And the 4th control valve is opened.
Other features and advantages of the utility model will be described in detail in subsequent embodiment part.
Brief description of the drawings
Accompanying drawing is to be further understood for providing to of the present utility model, and constitutes a part for specification, and following
Embodiment be used to explain the utility model together, but do not constitute to limitation of the present utility model.In the accompanying drawings：
Fig. 1 is the overall structure diagram for the gas curtain that prior art is provided；
Fig. 2 is the overall structure diagram of the wet-method etching equipment provided according to the utility model preferred embodiment；
Fig. 3 is the gas curtain and cleaning part and water source and the connection knot of medium source in the wet-method etching equipment shown in Fig. 2
The close-up schematic view of structure；
Fig. 4 is the default fluctuation range figure of the liquor strength in the dipper of the wet-method etching equipment shown in Fig. 2.
Description of reference numerals
The jet pipe of 1 wet method etching groove 160
The nozzle of 10 cell body 161
The glass inductor of 100 import 17
101 2 dippers of outlet
The supervising device of 11 gas curtain 3
The control valve of 12 first control valve 4 the 4th
The booster pump of 13 second control valve 5
The pipeline of 14 cleaning part 60 first
140 61 the 3rd pipelines of supervisor
The pipeline of 141 spout 62 second
The pipeline of 15 the 3rd control valve 63 the 4th
16 spraying pack units
Embodiment
Embodiment of the present utility model is described in detail below in conjunction with accompanying drawing.It should be appreciated that herein
Described embodiment is merely to illustrate and explained the utility model, is not limited to the utility model.
In the utility model, in the case where not making opposite explanation, the noun of locality used such as " upper and lower, left and right " is generally
Refer to combine the direction shown in application direction or accompanying drawing in practice to understand.
Fig. 1 shows the structural representation of gas curtain of the prior art.Gas curtain 11 include air inlet and with the air inlet
The gas outlet communicated, gas curtain 11 is internally formed the passage for connecting the air inlet and the gas outlet, it is preferable that it is described go out
Length direction extension of the gas port along gas curtain 11 is formed as slit-shaped, and the gas being passed through by the air inlet passes through the inside of gas curtain 11
Passage then be ejected in the gas outlet, as illustrated by the arrows in fig. 1, the gas being ejected shape at the gas outlet
Into gas curtain shape, in addition, gas curtain 11 is preferably elongated.Gas curtain 11 is installed in wet method etching groove 1, wet method quarter is usually mounted to
Lose the inwall of groove 1 and parallel to glass substrate, the gas being then ejected can blow back the decoction on glass substrate wet method quarter
Lose in groove 1.
The utility model provides a kind of wet method etching groove, and the wet method etching groove 1 includes having import 100 and outlet 101
Cell body 10 and be arranged on outlet 101 at gas curtain 11, import 100 and outlet 101 between transmission have sprinkling decoction glass
Substrate, gas curtain 11 includes being formed at passage inside gas curtain 11, and the two ends of the passage are respectively formed with entering of being communicated with source of the gas
Gas port and can be to the gas outlet of the glass substrate blow gas, and the wet method etching groove 1 includes feed unit, institute
Medium can be provided with by passage described in the medium washes by the air inlet by stating feed unit.By by gas curtain 11
Air inlet is connected with providing the feed unit of medium, and medium can be passed into the passage inside gas curtain 11 to be pointed to
Solid matter such as crystalline solid in the passage is rinsed, it is ensured that the passage of gas curtain 11 it is unobstructed so that carry out wet method
When etching operation, gas can smoothly be discharged by stable, so as to will be communicated off outlet 101 in the glass substrate
When, decoction can be blown back in wet method etching groove 1, this just greatly reduces decoction cost, while improving the work of wet etching
Industry efficiency.Wherein, the specific species of medium can be selected according to the solid matter to be rinsed, such as when wet etching when institute
When the decoction of selection is acid such as oxalic acid, optional water is rinsed.In addition, the species of used gas also not by
To specific limitation, as long as the decoction on glass substrate is blown away, such as preferable air, especially compressed air are to carry
The dynamics for the gas that the high gas outlet by gas curtain 11 is blown out is so as to the decoction of glass substrate is blown away.Need it is to be noted that
The air inlet of gas curtain 11 be capable of selectivity with source of the gas or providing the medium source of medium and being connected, that is to say, that when needing glass
When decoction on glass substrate is blown back in cell body 10 so that air inlet is communicated with source of the gas, and when needing to rinse gas curtain 11 so that enter
Gas port is communicated with providing the medium source of medium, and this selection course can select automatic mode, and its specific selection course will be
More detailed description is carried out in following content, is no longer repeated one by one herein.
Wherein, the species of the feed unit can be a variety of, such as described feed unit may include the chamber for accommodating medium
The air inlet of body, the cavity and gas curtain 11, which is mutually passed to, is passed into medium in gas curtain 11.Preferably, as shown in Figure 2, it is described to supply
Include the air inlet of connection gas curtain 11 and the first pipeline 60 of medium source and be arranged on the first pipeline 60 first to unit
Control valve 12.It should be noted that the medium source can be provided into the passage of gas curtain 11 for rinsing solid matter such as knot
The medium of crystal, wherein, the medium source can exist in any rational form, such as when needing from water as medium
When, the medium source can be water source.When needing to be passed through medium into the passage of gas curtain 11, the first control valve 12, which is just opened, to be caused
Medium is passed into the passage of gas curtain 11.In addition, can be set between the air inlet and the source of the gas of gas curtain 11 has the second pipeline
62 cause the air inlet and the source of the gas of gas curtain 11 to be connected by the second pipeline 62, and set second to control on the second pipeline 62
Valve 13 processed is to control gas to be passed through, and when needing to blow back the decoction on the glass substrate in wet method etching groove 1, second controls
Valve 13 processed is opened, and the gas provided by source of the gas is passed through in the passage of gas curtain 11 by the second pipeline 62.It is understood that on
The first pipeline 60 and the second pipeline 62 that are communicated with the air inlet of gas curtain 11 and the first control valve 12 on pipeline and
The specific arrangement of two control valves 13 can be arranged according to demand completely, for example, the two ends of the first pipeline 60 are respectively with being given an account of
Matter source is connected with the air inlet of gas curtain 11, the air inlet phase of the two ends of second pipeline 62 respectively with the source of the gas and gas curtain 11
Connect, wherein, the pipeline being located between the air inlet and the first control valve 12 of the first pipeline 60 and being located at for the second pipeline 62
Pipeline between the air inlet and the second control valve 13 is same pipeline, that is to say, that this section of pipeline is shared pipeline, both may be used
So that the medium that must be used to rinse solid matter passes through it is also possible that gas passes through, so as to simplify pipeline so that pipeline knot
Structure is simple.
In order to rinse the outer surface of gas curtain 11, cleaning part 14 can be installed in cell body 10, so, just being capable of cleaning position
Solid matter such as crystalline solid in the surface of gas curtain 11, prevents solid matter such as crystalline solid to be gathered in the outside of gas curtain 11 to block
Gas curtain 11, due to the setting of cleaning part 14, further increases the cleannes of gas curtain 11 so that gas smooth can be discharged, from
And further increase the reliability and stability of wet etching operation.
Orientation as shown in Figure 2, cleaning part 14 is preferably disposed on the top of gas curtain 11 more thoroughly to clean gas curtain 11
Outer surface.In addition, as shown in Figure 3, cleaning part 14 may include the supervisor 140 set along the length direction of gas curtain 11 and open
Spout 141 that is on supervisor 140 and being communicated with supervisor 140, the feed unit can provide medium to supervisor 140.By
After the medium that the medium source is provided is passed into supervisor 140, then by spout 141 spray to rinse the outer surface of gas curtain 11.
Need it is to be noted that spout 141 can also exist in the form of nozzle, while being also not limited to both above-mentioned forms, only
Required medium can be sprayed, in addition, rinsing the medium on the surface of gas curtain 11 with rinsing the passage inside gas curtain 11
Medium can be same medium, that is to say, that the medium source for communicating and being communicated with the air inlet of gas curtain 11 with cleaning part 14 is equal
For same medium source.The medium wherein provided on the medium source and by the medium source has been carried in foregoing teachings
Arrive, here is omitted.
Further, as shown in Figure 2, the 3rd pipeline 61 can be set to cause between the feed unit and cleaning part 14
Cleaning part 14 can be communicated with the medium source, and set the 3rd control valve 15 to control medium to lead on the 3rd pipeline 61
Enter.It is understood that the two ends of the 3rd pipeline 61 be connected to cleaning part 14 (for accurate, the supervisor of cleaning part 14
140) with the medium source, when needing to rinse the surface of gas curtain 11, the 3rd control valve 15 is opened.For more specifically, with institute
The setting for stating the 3rd pipeline 61 and the first pipeline 60 that medium source is communicated can be arranged according to the actual requirements, wherein, the 3rd pipe
Road 61 be located at pipeline between the 3rd control valve 15 and the medium source and the first pipeline 60 be located at the He of the first control valve 12
Pipeline between the medium source is same pipeline, that is to say, that this section of pipeline is shared pipeline, and this greatly simplifies pipe
Road so that the structure of whole device is simpler.
In order to which on the glass substrate, medicine liquid spray can also be installed into spraying pack unit 16 in cell body 10, wherein spraying pack unit 16 is wrapped
Include jet pipe 160 and be installed on jet pipe 160 and the nozzle 161 communicated with jet pipe 160.When being passed through decoction into jet pipe 160, medicine
Liquid is sprayed by nozzle 161.In addition, the nozzle 161 communicated with jet pipe 160 can also exist with the formation of spout, not office certainly
It is limited to above two form, as long as decoction can be sprayed.
In addition, glass inductor 17 at least can be set at import 100 and outlet 101, so as to be sensed with glass
The connected device of device 17 obtain in cell body 10 whether with the presence of glass substrate information, to control the folding of each control valve, have
Body control process will be described in the following, here is omitted.
The utility model additionally provides a kind of wet-method etching equipment, and the wet-method etching equipment is provided including the utility model
Wet method etching groove 1 and to wet method etching groove 1 provide decoction dipper 2.Due to being set in the wet-method etching equipment
Wet method etching groove 1 provided by the utility model, so as to which using the passage inside medium washes gas curtain 11, institute will be located at
Such as crystalline solid of the solid matter in passage is stated to rinse out, therefore when carrying out wet etching operation, gas can be stablized smooth
Discharge.Wherein it has been mentioned, has no longer been repeated one by one herein in foregoing teachings on used medium.
As shown in fig. 1, can be installed in the cell body 10 of wet method etching groove 1 can spray decoction to the glass substrate
Spraying pack unit 16, spraying pack unit 16 includes the jet pipe 160 that is communicated with dipper 2 and is installed on jet pipe 160 and is communicated with jet pipe 160
Nozzle 161.In addition, be also provided with booster pump 5 between jet pipe 160 and dipper 2, to cause what decoction stablized to be pumped into spray
In pipe 160, then sprayed by nozzle 161.
In addition, wet method etching groove 1 can also be set as follows：At least it can be set at the import 100 and outlet 101 of cell body 10
Glass inductor 17 is put, be whether there is with sensing glass substrate in cell body 10；Connection gas curtain 11 is set in the feed unit
Air inlet and the first pipeline 60 of medium source the air inlet and medium source of gas curtain 11 are communicated, and on the first pipeline 60
The first control valve 12 is set to control medium to be passed through；The second pipeline 62 is set to make between the air inlet and the source of the gas of gas curtain 11
Obtain air inlet to communicate with the source of the gas, and set the second control valve 13 to control gas to be passed through on the second pipeline 62；Wet
Cleaning part 14 for rinsing the outer surface of gas curtain 11 can be also installed, the feed unit passes through in the cell body 10 of method etching groove 1
Three pipelines 61 connection cleaning part 14 causes cleaning part 14 to be communicated with the medium source, and sets the 3rd to control on the 3rd pipeline 61
Valve 15 processed is to control medium to be passed through.Meanwhile, supervising device 3, wherein supervising device 3 are additionally provided with the wet-method etching equipment
Including control unit, described control unit is set to when glass inductor 17 has sensed the glass substrate, the control
Unit controls the first control valve 12 and the 3rd control valve 15 to close and control the second control valve 13 to open.That is, when sensing
When having glass substrate into cell body 10, it is impossible to clean gas curtain 11, to avoid the medium such as water influence etching quality sprayed.On
Medium and medium source have been mentioned in foregoing teachings, and here is omitted.
In addition, the feed unit can connect dipper 2 by the 4th pipeline 63 causes dipper 2 and the medium source phase
It is logical, and set the 4th control valve 4 to control medium to be passed through, it is necessary to illustrate on the 4th pipeline 63, communicated with dipper 2
Medium source with rinse gas curtain 11 medium source can be same medium source, it is to be understood that be preferably able to dissolve decoction in
The medium of solute, is so easy to recycling for decoction.In order to the liquor strength in monitoring dipper 2 in time, monitoring dress
3 concentration detecting units for also including being connected with described control unit are put, when the concentration for monitoring such as oxalic acid of the decoction in dipper 2
When excessive, the just timely moisturizing into dipper 2, by the concentration control of the decoction in dipper 2 in default fluctuation range, i.e.,
Concentration C as shown in Figure 41And C2Between.Described control unit is set to when the liquor strength detected in dipper 2 exceeds
The higher limit of the default fluctuation range and when the glass inductor 17 does not sense the glass substrate, the control list
The second control valve 13 of member control is closed and controls the first control valve 12 and/or the 3rd control valve 15 to open to rinse gas curtain 11；When
Detect higher limit (the namely concentration C of liquor strength in dipper 2 beyond the default fluctuation range2) and glass sensing
When device 17 has sensed the glass substrate, described control unit controls the first control valve 12 and the 3rd control valve 15 to close and control
Make the second control valve 13 and the 4th control valve 4 opened, that is to say, that when the concentration of such as oxalic acid of the decoction in dipper 2 is excessive,
And when glass substrate is not present in cell body 10, just can rinse passage and/or the outer surface of the inside of gas curtain 11；When dipper 2
In decoction such as oxalic acid concentration it is excessive, and in cell body 10 again when having glass substrate, it is impossible to which gas curtain 11 is rinsed, but
It is passed through gas to blow back the decoction on glass substrate in wet method etching groove 1, while also needing to be passed through medium into dipper 2
By the concentration range control of decoction in default fluctuation range.
Preferred embodiment of the present utility model is described in detail above in association with accompanying drawing, still, the utility model is not limited
Detail in above-mentioned embodiment, can be to skill of the present utility model in range of the technology design of the present utility model
Art scheme carries out a variety of simple variants, and these simple variants belong to protection domain of the present utility model.
It is further to note that each particular technique feature described in above-mentioned embodiment, in not lance
In the case of shield, it can be combined by any suitable means.In order to avoid unnecessary repetition, the utility model is to each
Possible combination is planted no longer separately to illustrate.
In addition, can also be combined between a variety of embodiments of the present utility model, as long as it is not disobeyed
Thought of the present utility model is carried on the back, it should equally be considered as content disclosed in the utility model.
Claims (11)
1. a kind of wet method etching groove, it is characterised in that the wet method etching groove (1) includes with import (100) and exported (101)
Cell body (10) and the gas curtain (11) for being arranged on described outlet (101) place, between the import (100) and the outlet (101)
Transmission has the glass substrate of sprinkling decoction, and the gas curtain (11) includes being formed at the internal passage of the gas curtain (11), described logical
The two ends in road be respectively formed with the air inlet that is communicated with source of the gas and can to the gas outlet of the glass substrate blow gas, and
And the wet method etching groove includes feed unit, the feed unit can provide medium with by described by the air inlet
Passage described in medium washes.
2. wet method etching groove according to claim 1, it is characterised in that the feed unit includes connecting the gas curtain
(11) air inlet and the first pipeline (60) of medium source and the first control valve being arranged on first pipeline (60)
(12)；The air inlet and the source of the gas of the gas curtain (11) are connected by the second pipeline (62), are set on second pipeline (62)
It is equipped with the second control valve (13).
3. wet method etching groove according to claim 1, it is characterised in that the wet method etching groove (1) includes being arranged on institute
State the cleaning part (14) for rinsing the gas curtain (11) outer surface in cell body (10).
4. wet method etching groove according to claim 3, it is characterised in that the cleaning part (14) is located at the gas curtain (11)
Top, the cleaning part (14) include with along the gas curtain (11) length direction setting supervisor (140) and be opened in
Spout (141) on the supervisor (140), the feed unit also provides the medium to the supervisor (140).
5. wet method etching groove according to claim 4, it is characterised in that the feed unit is connected by the 3rd pipeline (61)
Connect and be provided with the 3rd control valve (15) on the cleaning part (14), the 3rd pipeline (61).
6. wet method etching groove according to claim 1, it is characterised in that the wet method etching groove includes being arranged on the groove
In body (10) and can to the glass substrate spray decoction spraying pack unit (16), the spraying pack unit (16) include jet pipe (160)
And it is installed on the jet pipe (160) and the nozzle (161) communicated with the jet pipe (160).
7. the wet method etching groove according to any one in claim 1-6, it is characterised in that at least in the import
(100) and it is described outlet (101) place be provided with glass inductor (17).
8. a kind of wet-method etching equipment, it is characterised in that the wet-method etching equipment includes the wet method etching groove described in claim 1
(1) and to the wet method etching groove (1) dipper (2) of decoction is provided.
9. wet-method etching equipment according to claim 8, it is characterised in that the wet method etching groove (1) includes being arranged on
In the cell body (10) and can to the glass substrate spray decoction spraying pack unit (16), the spraying pack unit (16) include and institute
State jet pipe (160) and be installed on the jet pipe (160) and the nozzle communicated with the jet pipe (160) that dipper (2) communicates
(161), it is provided with booster pump (5) between the jet pipe (160) and the dipper (2).
10. wet-method etching equipment according to claim 8, it is characterised in that at least entering described in the cell body (10)
Mouth (100) and described outlet (101) place are provided with glass inductor (17)；The feed unit includes connecting the gas curtain (11)
Air inlet and medium source the first pipeline (60) and the first control valve (12) for being arranged on first pipeline (60)；Institute
The air inlet and the source of the gas for stating gas curtain (11) are connected by the second pipeline (62), and second is provided with second pipeline (62)
Control valve (13)；The wet method etching groove (1) rinses the gas curtain (11) outside including being arranged on being used in the cell body (10)
The cleaning part (14) on surface, the feed unit connects the cleaning part (14), the 3rd pipeline by the 3rd pipeline (61)
(61) the 3rd control valve (15) is provided with；
The wet-method etching equipment includes supervising device (3), and the supervising device (3) includes control unit, described control unit
It is set to when the glass inductor (17) has sensed the glass substrate, described control unit control first control
Valve (12) and the 3rd control valve (15) are closed and control second control valve (13) to open.
11. wet-method etching equipment according to claim 10, it is characterised in that the supervising device (3) include with it is described
Control unit is connected and for detecting the concentration detecting unit of the dipper (2) Chinese medicine liquid concentration, and the feed unit passes through
4th pipeline (63) connects and is provided with the 4th control valve (4) on the dipper (2), the 4th pipeline (63)；
Described control unit is set to when the upper limit for detecting the liquor strength in the dipper (2) beyond default fluctuation range
Value and when the glass inductor (17) does not sense the glass substrate, described control unit controls second control valve
(13) close and control first control valve (12) and/or the 3rd control valve (15) open to rinse the gas curtain
(11)；When detect the liquor strength in the dipper (2) beyond the default fluctuation range higher limit and the glass
When inductor (17) has sensed the glass substrate, described control unit controls first control valve (12) and the described 3rd
Control valve (15) is closed and controls second control valve (13) and the 4th control valve (4) opening.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720109655.1U CN206541807U (en) | 2017-02-06 | 2017-02-06 | Wet method etching groove and wet-method etching equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720109655.1U CN206541807U (en) | 2017-02-06 | 2017-02-06 | Wet method etching groove and wet-method etching equipment |
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| CN206541807U true CN206541807U (en) | 2017-10-03 |
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| CN201720109655.1U Active CN206541807U (en) | 2017-02-06 | 2017-02-06 | Wet method etching groove and wet-method etching equipment |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109212793A (en) * | 2018-09-30 | 2019-01-15 | 惠科股份有限公司 | A kind of manufacturing equipment and cleaning method for display panel |
| CN111883467A (en) * | 2020-08-06 | 2020-11-03 | 京东方科技集团股份有限公司 | Etching groove |
| CN112071957A (en) * | 2020-09-18 | 2020-12-11 | 北京智创芯源科技有限公司 | Focal plane chip dielectric film stripping device and focal plane chip dielectric film stripping method |
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2017
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109212793A (en) * | 2018-09-30 | 2019-01-15 | 惠科股份有限公司 | A kind of manufacturing equipment and cleaning method for display panel |
| WO2020062365A1 (en) * | 2018-09-30 | 2020-04-02 | 惠科股份有限公司 | Manufacturing device of display panel and cleaning method therefor |
| US20210231987A1 (en) * | 2018-09-30 | 2021-07-29 | HKC Corporation Limited | Display panel manufacturing device and cleaning method |
| US11513378B2 (en) * | 2018-09-30 | 2022-11-29 | HKC Corporation | Display panel manufacturing device and cleaning method |
| CN111883467A (en) * | 2020-08-06 | 2020-11-03 | 京东方科技集团股份有限公司 | Etching groove |
| CN111883467B (en) * | 2020-08-06 | 2024-03-12 | 京东方科技集团股份有限公司 | Etching groove |
| CN112071957A (en) * | 2020-09-18 | 2020-12-11 | 北京智创芯源科技有限公司 | Focal plane chip dielectric film stripping device and focal plane chip dielectric film stripping method |
| CN112071957B (en) * | 2020-09-18 | 2021-04-20 | 北京智创芯源科技有限公司 | Focal plane chip dielectric film stripping device and focal plane chip dielectric film stripping method |
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Effective date of registration: 20230602 Address after: 241000 No.36 weier'er Road, Wanchun street, Wuhu Economic and Technological Development Zone, Anhui Province Patentee after: WUHU TUNGHSU PHOTOELECTRIC SCIENCE AND TECHNOLOGY Co.,Ltd. Patentee after: TUNGHSU GROUP Co.,Ltd. Patentee after: TUNGHSU TECHNOLOGY GROUP Co.,Ltd. Address before: Room 1517, Building 1 (International Building), No. 167 Qianjin Middle Road, Development Zone, Kunshan City, Suzhou City, Jiangsu Province, 215300 Patentee before: DONGXU (KUNSHAN) DISPLAY MATERIAL Co.,Ltd. Patentee before: TUNGHSU GROUP Co.,Ltd. Patentee before: TUNGHSU TECHNOLOGY GROUP Co.,Ltd. |