CN206069993U - A kind of resistance-type evaporation coating machine of many vacuum chambers - Google Patents
A kind of resistance-type evaporation coating machine of many vacuum chambers Download PDFInfo
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- CN206069993U CN206069993U CN201621065496.1U CN201621065496U CN206069993U CN 206069993 U CN206069993 U CN 206069993U CN 201621065496 U CN201621065496 U CN 201621065496U CN 206069993 U CN206069993 U CN 206069993U
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- plating material
- dress
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- resistance
- coating chamber
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- 239000011248 coating agent Substances 0.000 title claims abstract description 53
- 238000000576 coating method Methods 0.000 title claims abstract description 53
- 238000001704 evaporation Methods 0.000 title claims abstract description 26
- 230000008020 evaporation Effects 0.000 title claims abstract description 25
- 239000000463 material Substances 0.000 claims abstract description 76
- 238000007747 plating Methods 0.000 claims abstract description 57
- 238000009834 vaporization Methods 0.000 claims abstract description 22
- 230000008016 vaporization Effects 0.000 claims abstract description 22
- 238000010438 heat treatment Methods 0.000 claims abstract description 8
- 239000013078 crystal Substances 0.000 claims description 18
- 239000000523 sample Substances 0.000 claims description 11
- 238000012544 monitoring process Methods 0.000 claims description 6
- 230000010355 oscillation Effects 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims 1
- 239000012535 impurity Substances 0.000 abstract description 9
- 239000012528 membrane Substances 0.000 abstract description 4
- -1 steam Substances 0.000 abstract description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
This utility model is applied to coater field, there is provided a kind of resistance-type evaporation coating machine of many vacuum chambers, piece room is taken including dress, coating chamber and vaporization chamber, the dress is taken piece room and is connected with the coating chamber with vaporization chamber, and the dress takes to be provided between piece room and the coating chamber and controls its first valve for connecting and closing, control is provided between the vaporization chamber and the coating chamber, and which connects the second valve with closure, the dress takes the actuating device being additionally provided between piece room and the coating chamber for driving workpiece to pass in and out the coating chamber, the evaporation is indoor to have plating material component and the resistor disc for heating the plating material component, the plating material component is close on the resistor disc.The coater includes that dress takes piece room, coating chamber and vaporization chamber, make its coating chamber be constantly in vacuum state, without the need for vacuum breaker causes to adsorb the impurity such as steam because dress takes piece, when plating membrane stage, there is no the interference of the impurity such as steam, gas atmosphere is relatively stable, so as to improve plating film quality and stability.
Description
Technical field
This utility model belongs to coater field, more particularly to a kind of resistance-type evaporation coating machine of many vacuum chambers.
Background technology
Existing vacuum electric resistive evaporation coating machine, typically adopts a vacuum chamber, using electrical resistance heating by material to be plated
Material is close on resistor disc or resistance wire melting vaporization, and so as in hydatogenesis to substrate, and dress takes piece and evaporation plating per stove
Film is completed in the vacuum chamber.
As material to be plated heating can be melted as liquid, the downward gravity of liquid body affects, and material to be plated need to be located at resistor disc
Or above resistance wire, and evaporation side upward.Material to be plated is generally disposable material, needs to change once after the completion of every stove plated film.
It is complete in the vacuum room that the dress of existing single vacuum room resistance-type evaporation coating machine takes piece, evacuation, plated film
Into, per stove dress take piece when coating chamber all can vacuum breaker to atmospheric condition, plated film chamber interior walls can adsorb the impurity such as steam, plate it is membranaceous
During state, the impurity such as steam can affect to plate film quality and stability.
Utility model content
Technical problem to be solved in the utility model is the resistance-type evaporation coating machine for providing a kind of many vacuum chambers, it is intended to
Avoid plated film chamber interior walls from adsorbing the impurity such as steam, improve plating film quality and stability.
To solve above-mentioned technical problem, this utility model is achieved in that a kind of resistance-type evaporation plating of many vacuum chambers
Film machine, including dress takes piece room, coating chamber and vaporization chamber, the dress is taken piece room and is connected with the coating chamber with the vaporization chamber,
And it is described dress take be provided between piece room and the coating chamber control its connect with close the first valve, the vaporization chamber with it is described
Second valve of its connection of control and closure is provided between coating chamber, and the dress to take and use is additionally provided between piece room and the coating chamber
In the actuating device for driving workpiece to pass in and out the coating chamber, the evaporation is indoor to have plating material component and for heating the plating material
The resistor disc of component, the plating material component are close on the resistor disc.
Further, the plating material component includes plating material carrier and material to be plated, and the material to be plated is placed on the plating
In material carrier, one end of the plating material carrier has opening, and is close on the resistor disc, the opening one of the plating material carrier
End does not contact the resistor disc and towards the workpiece.
Further, the workpiece is vertical direction with the plating material carrier, and the opening of the plating material carrier is along level
Direction is towards the workpiece.
Further, also include for adsorbing the fluffy tinsel of the material to be plated in the plating material carrier.
Further, include in the plated film room that the work rest can be around wherein for carrying the work rest of the workpiece
Heart line rotates.
Further, the actuating device is connected with the work rest.
Further, the coater also includes crystal oscillator probe, crystal oscillator and film-thickness monitoring, the crystal oscillator probe
Electrically connect with the crystal oscillator and film-thickness monitoring, collectively constitute oscillation circuit, the crystal oscillator is popped one's head in the work rest
Rotate around its centrage together, and crystal oscillator probe is located at the same circumferential position of the work rest with the workpiece.
Compared with prior art, beneficial effect is this utility model：A kind of resistance of many vacuum chambers of the present utility model
Formula evaporation coating machine, which includes that dress takes piece room, coating chamber and vaporization chamber.Take piece interior and enter luggage in dress and take piece and evacuation；
Product processing is carried out in plated film room；Carry out plating the heating of material component in evaporation interior.So coating chamber can be constantly in vacuum shape
State, without the need for vacuum breaker causes to adsorb the impurity such as steam because dress takes piece, does not have the interference of the impurity such as steam, gas when plating membrane stage
Atmosphere is relatively stable, so as to improve plating film quality and stability.
Description of the drawings
Fig. 1 is the structural representation of the resistance-type evaporation coating machine of a kind of many vacuum chambers that this utility model embodiment is provided
Figure.
Specific embodiment
In order that the purpose of this utility model, technical scheme and advantage become more apparent, below in conjunction with accompanying drawing and enforcement
Example, is further elaborated to this utility model.It should be appreciated that specific embodiment described herein is only to explain
This utility model, is not used to limit this utility model.
As shown in figure 1, the resistance-type evaporation coating machine 100 of a kind of many vacuum chambers of this utility model embodiment offer, its
Piece room 1, coating chamber 2 and vaporization chamber 3 are taken including dress.The dress takes；The coating chamber 2
Product processing is carried out inside；Carry out plating the heating of material component in the vaporization chamber 3.The dress take piece room 1 and the vaporization chamber 3 with
The coating chamber 2 is connected, and the dress takes to be provided between piece room 1 and the coating chamber 2 and controls its first valve for connecting and closing
Door 4, control is provided between the vaporization chamber 3 and the coating chamber 2, and which connects the second valve 5 with closure.The dress takes piece room 1
The actuating device (not shown) for driving workpiece 6 to enter the coating chamber 2, the vaporization chamber 3 are additionally provided between the coating chamber 2
Interior to expect component 31 and resistor disc 32 with plating, the plating material component 31 is close on the resistor disc 32, and the resistor disc 32 adds
The heat plating material component 31.
The plating material component 31 includes plating material carrier 311 and material to be plated 312, and the material to be plated 312 is placed on described
In plating material carrier 311.In this utility model embodiment, the plating material carrier 311 containing material to be plated 312 is in vaporization chamber 3
Inside vertically it is close to the resistor disc 32.One end of the plating material carrier 311 has opening, and is close to the resistor disc
On 32.The open at one end of the plating material carrier 311 does not contact the resistor disc 32 and towards the workpiece 6, so as to it will vaporize after
312 plated film of material to be plated on the workpiece 6.
In this utility model embodiment, the workpiece 6 is vertical direction, the plating material with the plating material carrier 311
The opening of carrier 311 in the horizontal direction towards the workpiece 6, such that it is able to make the material to be plated 312 in the plating material carrier 311
Evaporate to workpiece 6 in the horizontal direction, compared to traditional mode for evaporating material to be plated from lower to upper, save material to be plated,
Stock utilization is high.
Also include in the plating material carrier 311 for adsorbing the fluffy tinsel (not shown) of the material to be plated, so as to
In the material to be plated 312 is adsorbed, the plating material carrier 311 after preventing its liquefaction, is flowed out.
Include in the coating chamber 2 that the work rest 21 can be around its centrage for carrying the work rest 21 of the workpiece 6
Rotation, the work rest in this utility model embodiment are vertical revolution frame or vertical public affairs from pivoted frame, naturally it is also possible to be other classes
The pivoted frame of type.The actuating device is connected with the work rest 21, for workpiece 6 is transported to the work rest 21.It is described
Workpiece 6 is fitted in the outer surface of the work rest 21, and the centrage along the work rest 21 rotates, can disposably to multiple works
Part 6 carries out plated film processing.
During specific works, workpiece to be plated 6 is taken piece room 1 in the dress carries out load, carries out evacuation, arrive after the completion of load
First valve 4 is opened up to after specified vacuum degree, the workpiece to be plated 6 reaches the coating chamber under the drive of actuating device
On 2 work rest 21.
The material to be plated 312 is low melting material, and the plating material carrier 311 is materials with high melting point, by material to be plated 312
It is added in the plating material carrier 311, then the plating material carrier 311 containing material to be plated 312 is interior vertically in vaporization chamber 3
It is close to the resistor disc 32, and the opening direction of the plating material carrier 311 towards the workpiece to be plated 6.
After specified vacuum degree is evacuated down in the vaporization chamber 3, second valve 5 is opened, by resistor disc 32 pairs
Plating material carrier 311 containing material to be plated 312 is heated, and material to be plated 312 is evaporated towards 6 place direction of workpiece to be plated,
So as to coated product processing is completed in the coating chamber 2.
After the completion of plated film, second valve 5 is closed, 3 vacuum breaker of vaporization chamber to atmospheric condition is changed containing material to be plated
312 plating material carrier 311.
The workpiece 6 of plated film under the drive of the actuating device reaches the dress from the work rest 21 and takes piece room
1, first valve 4 is closed, the dress takes 1 vacuum breaker of piece room to atmospheric condition, the workpiece 6 of plated film is taken out.
The coater 100 also includes crystal oscillator probe 7, crystal oscillator 8 and film-thickness monitoring 9, the crystal oscillator probe 7 with
The crystal oscillator 8 and film-thickness monitoring 9 are electrically connected, and collectively constitute oscillation circuit, and the crystal oscillator probe 7 is with the work rest
21 rotate around its centrage together, and crystal oscillator probe 7 is located at the same circumference position of the work rest 21 with the workpiece 6
Put, for the thicknesses of layers of the workpiece 6 is detected when membrane stage is plated.
A kind of resistance-type evaporation coating machine 100 of many vacuum chambers of this utility model embodiment, it include dress take piece room 1,
Coating chamber 2 and vaporization chamber 3.Take in dress and enter in piece room 1 luggage and take piece and evacuation；Product processing is carried out in coating chamber 2；Steaming
Sending out carries out the heating for plating material component in room 3.So coating chamber 2 can be constantly in vacuum state, without the need for the vacuum breaker because dress takes piece
Cause to adsorb the impurity such as steam, when plating membrane stage, there is no the interference of the impurity such as steam, gas atmosphere is relatively stable, so as to improve
Plating film quality and stability.
Preferred embodiment of the present utility model is the foregoing is only, it is not to limit this utility model, all at this
Any modification, equivalent and improvement made within the spirit and principle of utility model etc., should be included in this utility model
Protection domain within.
Claims (7)
1. the resistance-type evaporation coating machine of a kind of many vacuum chambers, it is characterised in that take piece room, coating chamber and vaporization chamber including dress,
The dress is taken piece room and is connected with the coating chamber with the vaporization chamber, and the dress takes
First valve of its connection and closure is controlled, control is provided between the vaporization chamber and the coating chamber, and which connect and for closing
Two valves, the dress take the transmission dress being additionally provided between piece room and the coating chamber for driving workpiece to pass in and out the coating chamber
Put, the evaporation is indoor to have plating material component and the resistor disc for heating the plating material component, and the plating material component is close to
On the resistor disc.
2. the resistance-type evaporation coating machine of many vacuum chambers as claimed in claim 1, it is characterised in that the plating material component includes
Plating material carrier and material to be plated, the material to be plated are placed in the plating material carrier, and one end of the plating material carrier has opens
Mouthful, and be close on the resistor disc, the open at one end of the plating material carrier does not contact the resistor disc and towards the workpiece.
3. the resistance-type evaporation coating machine of many vacuum chambers as claimed in claim 2, it is characterised in that the workpiece and the plating
Material carrier is vertical direction, and the opening of the plating material carrier is in the horizontal direction towards the workpiece.
4. the resistance-type evaporation coating machine of many vacuum chambers as claimed in claim 2, it is characterised in that in the plating material carrier also
Including for adsorbing the fluffy tinsel of the material to be plated.
5. the resistance-type evaporation coating machine of many vacuum chambers as claimed in claim 1, it is characterised in that include in the plated film room
For carrying the work rest of the workpiece, the work rest can be rotated around its centrage.
6. the resistance-type evaporation coating machine of many vacuum chambers as claimed in claim 5, it is characterised in that the actuating device and institute
State work rest connection.
7. the resistance-type evaporation coating machine of many vacuum chambers as claimed in claim 5, it is characterised in that the coater also includes
Crystal oscillator probe, crystal oscillator and film-thickness monitoring, the crystal oscillator probe are electrically connected with the crystal oscillator and film-thickness monitoring
Connect, collectively constitute oscillation circuit, the crystal oscillator probe is rotated around its centrage with the work rest, and crystal oscillator probe
The same circumferential position of the work rest is located at the workpiece.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621065496.1U CN206069993U (en) | 2016-09-20 | 2016-09-20 | A kind of resistance-type evaporation coating machine of many vacuum chambers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621065496.1U CN206069993U (en) | 2016-09-20 | 2016-09-20 | A kind of resistance-type evaporation coating machine of many vacuum chambers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206069993U true CN206069993U (en) | 2017-04-05 |
Family
ID=58438629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621065496.1U Active CN206069993U (en) | 2016-09-20 | 2016-09-20 | A kind of resistance-type evaporation coating machine of many vacuum chambers |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206069993U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106191787A (en) * | 2016-09-20 | 2016-12-07 | 深圳市东丽华科技有限公司 | The resistance-type evaporation coating machine of a kind of many vacuum chambers and operational approach thereof |
| CN111235531A (en) * | 2020-01-15 | 2020-06-05 | 长钛工程技术研究院(北京)有限公司 | Double-vacuum-chamber high-power electron beam evaporation continuous coating device |
-
2016
- 2016-09-20 CN CN201621065496.1U patent/CN206069993U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106191787A (en) * | 2016-09-20 | 2016-12-07 | 深圳市东丽华科技有限公司 | The resistance-type evaporation coating machine of a kind of many vacuum chambers and operational approach thereof |
| CN106191787B (en) * | 2016-09-20 | 2019-04-05 | 深圳市力沣实业有限公司 | A kind of the resistance-type evaporation coating machine and its operating method of more vacuum chambers |
| CN111235531A (en) * | 2020-01-15 | 2020-06-05 | 长钛工程技术研究院(北京)有限公司 | Double-vacuum-chamber high-power electron beam evaporation continuous coating device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20200103 Address after: 404100 No.78, Yunwu Road, Beibei District, Chongqing Patentee after: Xiameixi technology partnership (limited partnership) of Liangjiang New District, Chongqing Address before: 2, building 4, 518000, Baohua Industrial Park, 45 Hua Sheng Road, Longhua New District, Guangdong, Shenzhen Patentee before: Power Feng Industrial Co., Ltd. of Shenzhen |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20200818 Address after: No.5-138, Yunhan Avenue, Shuitu hi tech Industrial Park, Beibei District, Chongqing Patentee after: CHONGQING XINJING SPECIAL GLASS Co.,Ltd. Address before: 404100 No.78, Yunwu Road, Beibei District, Chongqing Patentee before: Xiameixi technology partnership (L.P.) of Liangjiang New District, Chongqing |