CN111235531A - Double-vacuum-chamber high-power electron beam evaporation continuous coating device - Google Patents
Double-vacuum-chamber high-power electron beam evaporation continuous coating device Download PDFInfo
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- CN111235531A CN111235531A CN202010040956.XA CN202010040956A CN111235531A CN 111235531 A CN111235531 A CN 111235531A CN 202010040956 A CN202010040956 A CN 202010040956A CN 111235531 A CN111235531 A CN 111235531A
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- chamber
- electron beam
- beam evaporation
- vacuum
- double
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
Abstract
The invention provides a double-vacuum-chamber high-power electron beam evaporation continuous coating device which comprises a multifunctional chamber, an electron beam evaporation chamber, a vacuum pumping system and a control system, wherein the multifunctional chamber is communicated with the electron beam evaporation chamber, and the two chambers are isolated by a gate valve; the vacuum pumping system is used for vacuumizing the multifunctional chamber and the electron beam evaporation chamber, and the multifunctional chamber, the electron beam evaporation chamber and the vacuum pumping system are electrically connected with the control system. The double-vacuum-chamber high-power electron beam evaporation continuous coating device provided by the invention can ensure that the electron gun device and the crucible device are always in a vacuum environment, so that the metal material in a high-temperature molten state in the crucible is not oxidized by air, the time required by waiting for cooling the crucible and a large amount of air extraction time are reduced, and the production efficiency is greatly improved.
Description
Technical Field
The invention relates to the field of vacuum coating, in particular to a double-vacuum-chamber high-power electron beam evaporation continuous coating device.
Background
For the defects that the deposition speed is low and the film layer is thin in the film coating process by adopting film coating methods such as magnetron sputtering film coating or arc film coating and the like in the vacuum film coating process, the evaporation mode of high-power electron beam evaporation film coating can greatly improve the deposition rate of the film layer, so that the film layer obtained by the vacuum film coating process can partially replace the film layer obtained by electroplating. However, in the vacuum coating production process, the electron gun and the crucible are oxidized by air when the vacuum chamber is deflated, and the coating machine needs to heat and cool the evaporation crucible frequently in the production process, so that a large amount of preparation time before coating is needed, and the production efficiency is low.
Disclosure of Invention
In order to solve at least one of the technical problems, the invention adopts the technical scheme that a double-vacuum-chamber high-power electron beam evaporation continuous coating device is provided to solve the problems of oxidation of an electron gun and a crucible during vacuum chamber deflation and low vacuum coating production efficiency in the vacuum coating production process.
In order to at least achieve one of the above purposes, the invention adopts the technical scheme that:
the invention provides a double-vacuum-chamber high-power electron beam evaporation continuous coating device which comprises a multifunctional chamber, an electron beam evaporation chamber, a vacuum pumping system and a control system, wherein the multifunctional chamber is communicated with the electron beam evaporation chamber, and the two chambers are isolated by a gate valve; the vacuum pumping system is used for vacuumizing the multifunctional chamber and the electron beam evaporation chamber, and the multifunctional chamber, the electron beam evaporation chamber and the vacuum pumping system are electrically connected with the control system.
Furthermore, the multifunctional chamber comprises a transmission device, a gas supply device, a heating device, a heat insulation device, a first multi-arc ion plating device and a first air release valve.
Further, transmission includes transmission shaft, rotation sealing device and rotatory work piece pole, transmission passes multi-functional room lateral wall department is provided with rotation sealing device, rotatory work piece pole is used for fixed work piece.
Further, still include the motor, the motor sets up in the outside of multi-functional room, the motor actuates the rotatory work piece pole and carries out axial motion and rotation along the horizontal axis.
Further, the heat insulation device comprises a gear set, a bearing set, a support and a movable baffle; the movable baffle is arranged on the supporting piece, and the gear set and the bearing set actuate the movable baffle to turn.
Furthermore, the electron beam evaporation chamber comprises an electron gun device, a crucible device, a second multi-arc ion plating device and a second air release valve.
Further, the crucible device comprises a copper crucible, a non-metal crucible lining and a crucible cooling water pipe.
Further, the gate valve can allow the rotary workpiece rod and the workpiece to move between the multifunctional chamber and the electron beam evaporation chamber after being opened.
Further, the vacuum pumping system is provided as a set.
Further, the vacuum pumping system comprises a high-vacuum oil diffusion pump, a rotary vane vacuum pump and a roots pump.
Compared with the prior art, the double-vacuum-chamber high-power electron beam evaporation continuous coating device provided by the invention has the beneficial effects that:
(1) by adopting the structure of double vacuum chambers, a good vacuum environment can be always provided for the electron gun device and the crucible device in the whole pulse production period, the metal material in a high-temperature molten state in the crucible is protected from being oxidized by air, the time required by waiting for the cooling of the crucible is reduced, and the production efficiency is improved;
(2) in the traditional vacuum evaporation chamber, because metal evaporated by a crucible is not completely deposited on the surface of a workpiece to be plated, part of metal is deposited on the inner wall of the vacuum evaporation chamber, a large amount of air can be adsorbed after the vacuum evaporation chamber is exposed to the atmosphere, a large amount of gas can be slowly released in the next air suction process, the air suction time is prolonged, and the coating chamber is always in a vacuum environment by adopting a double-vacuum-chamber structure, so that a large amount of air suction time can be reduced, and the production efficiency is improved;
(3) the workpiece is moved and rotated between the multifunctional chamber and the electron beam evaporation chamber by adopting a rotating workpiece rod, so that the whole structure of the device is simple;
(4) the multifunctional chamber and the electron beam evaporation chamber can be respectively vacuumized by adopting a set of vacuum system, so that the redundant design of the device is reduced, and the production cost is reduced;
(5) the coating of the composite film layer of various materials can be finished by adopting the design of double vacuum chambers.
In a word, the invention provides the double-vacuum-chamber high-power electron beam evaporation continuous coating device which has the advantages of simple structure, high production efficiency, low manufacturing cost and strong practicability, and has wide application prospect.
Drawings
FIG. 1 is a schematic structural diagram of a double-vacuum-chamber high-power electron beam evaporation continuous coating device of the invention;
wherein the reference numerals are as follows:
the device comprises a multifunctional chamber 1, an electron beam evaporation chamber 2, a gate valve 3, a vacuum pumping system 4, a transmission device 5, a gas supply device 6, a heating device 7, a heat insulation device 8, a first multi-arc ion plating device 9, a first 10 air release valve, an electron gun device 11, a crucible device 12, a second 13 multi-arc ion plating device, a second 14 air release valve and a motor 15.
Detailed Description
In order to make the technical solutions of the present invention better understood by those skilled in the art, the present invention will be further described in detail with reference to specific examples. Note that the following described embodiments are illustrative only for explaining the present invention, and are not to be construed as limiting the present invention. The examples, where specific techniques or conditions are not indicated, are to be construed according to the techniques or conditions described in the literature in the art or according to the product specifications.
In the description of the present invention, it is to be understood that the terms "first", "second" and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implying any number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
The following will explain the dual vacuum chamber high power electron beam evaporation continuous coating device provided by the invention in detail by specific embodiments:
as shown in figure 1, the double-vacuum-chamber high-power electron beam evaporation continuous coating device comprises a multifunctional chamber 1, an electron beam evaporation chamber 2, a vacuum pumping system 4 and a control system, wherein the multifunctional chamber 1 is communicated with the electron beam evaporation chamber 2, and the two chambers are isolated by a gate valve 3;
the multifunctional chamber 1 comprises a transmission device 5, an air supply device 6, a heating device 7, a heat insulation device 8, a multi-arc ion plating device I9 and a deflation valve I10;
the transmission device 5 comprises a transmission shaft, a rotary sealing device and a rotary workpiece rod, wherein the rotary sealing device is arranged at the position, penetrating through the side wall of the multifunctional chamber 1, of the transmission device 5, and the rotary workpiece rod is used for fixing a workpiece;
the continuous coating device further comprises a motor 15, wherein the motor 15 actuates the rotary workpiece rod to axially move and autorotate along the horizontal axis through the transmission shaft; the motor 15 is arranged outside the multifunctional chamber 1; the motor 15 actuates the rotating workpiece rod to rotate through the transmission shaft and enables the rotating workpiece rod to move from the multifunctional chamber 1 to the electron beam evaporation chamber 2 through the gate valve 3;
the heat insulation device 8 comprises a gear set, a bearing set, a supporting piece and a movable baffle; the movable baffle is arranged on the supporting piece, the gear set and the bearing set actuate the movable baffle to turn over, and the turning over of the movable baffle can enable the heating device 7 and the workpiece to be in an unshielded or isolated state;
the electron beam evaporation chamber 2 comprises an electron gun device 11, a crucible device 12, a second multi-arc ion plating device 13 and a second air release valve 14;
the crucible device 12 comprises a copper crucible, a non-metal crucible lining and a crucible cooling water pipe;
the gate valve 3 isolates the multifunctional chamber 1 from the electron beam evaporation chamber 2 after being closed; after the multifunctional chamber 1 and the electron beam evaporation chamber 2 are opened, the rotary workpiece rod and the workpiece can move between the multifunctional chamber and the electron beam evaporation chamber;
the vacuum pumping system 4 is used for vacuumizing the multifunctional chamber 1 and the electron beam evaporation chamber 2, the vacuum pumping system 4 is set as a set, the multifunctional chamber 1 and the electron beam evaporation chamber 2 share the vacuum pumping system 4, the vacuum pumping system 4 can respectively complete the pumping process from atmosphere to high vacuum for the multifunctional chamber 1 and the electron beam evaporation chamber 2, and the electron beam evaporation chamber 2 can always maintain the high vacuum state during film coating;
the vacuum pumping system 4 comprises a high vacuum oil diffusion pump, a rotary vane vacuum pump and a roots pump;
the multifunctional chamber 1, the electron beam evaporation chamber 2 and the vacuum pumping system 4 are electrically connected with a control system.
The working principle of the double-vacuum-chamber high-power electron beam evaporation continuous coating device is as follows:
firstly, opening a multifunctional chamber door, putting a workpiece into the multifunctional chamber, fixing the workpiece on a rotary workpiece rod, and closing the chamber door; at the moment, a gate valve between the multifunctional chamber and the electron beam evaporation chamber is in a closed state;
starting a vacuum pumping system, vacuumizing the multifunctional chamber and the electron beam evaporation chamber, and keeping the vacuum pumping system in a working state in the whole film coating process;
rotating a movable baffle of the heat insulation device to enable the heating device and the workpiece to be free of shielding, and starting the heating device to heat the workpiece; when the surface of the workpiece reaches the temperature required by the coating, closing the heating device to stop heating, and rotating the movable baffle again to enable the movable baffle to be positioned between the heating device and the workpiece; in the process, the transmission shaft is actuated by an external motor to drive the rotary workpiece rod and the workpiece to rotate and keep a rotation state;
starting a gas supply device of the multifunctional chamber and a first multi-arc ion plating device to coat the workpiece; in the process, the workpiece keeps a self-rotation state;
after the film coating is finished, closing the gas supply device and the first multi-arc ion plating device; opening the gate valve, controlling the transmission device to enable the rotary workpiece rod to axially move along the horizontal direction at the moment, driving the workpiece to move from the multifunctional chamber to the electron beam evaporation chamber through the gate valve, and stopping moving after the workpiece moves to a preset position;
then, starting the electron gun device, heating the crucible device through the electron beam output by the electron gun device, evaporating the metal material in the crucible device, and coating the film on the workpiece; in the process, the workpiece keeps a self-rotation state;
after the film coating is finished, rotating the workpiece rod to perform axial motion opposite to the previous direction, so that the workpiece moves from the electron beam evaporation chamber to the multi-functional chamber, and closing the gate valve;
and finally, after the workpiece is cooled, opening the first air release valve to enable the multifunctional chamber to release air, opening the door of the multifunctional chamber after the air pressure in the multifunctional chamber is balanced with the atmospheric pressure, taking out the workpiece, and finishing the continuous coating of the workpiece.
The double-vacuum-chamber high-power electron beam evaporation continuous coating device provided by the invention can ensure that the electron gun device and the crucible device are always in a vacuum environment, so that the metal material in a high-temperature molten state in the crucible is not oxidized by air, the time required by waiting for cooling the crucible and a large amount of air extraction time are reduced, and the production efficiency is greatly improved.
In a word, the invention provides the double-vacuum-chamber high-power electron beam evaporation continuous coating device which has the advantages of simple structure, high production efficiency, low manufacturing cost and strong practicability, and has wide application prospect.
In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
Claims (10)
1. A double-vacuum-chamber high-power electron beam evaporation continuous coating device is characterized by comprising a multifunctional chamber, an electron beam evaporation chamber, a vacuum pumping system and a control system, wherein the multifunctional chamber is communicated with the electron beam evaporation chamber, and the two chambers are isolated by a gate valve; the vacuum pumping system is used for vacuumizing the multifunctional chamber and the electron beam evaporation chamber, and the multifunctional chamber, the electron beam evaporation chamber and the vacuum pumping system are electrically connected with the control system.
2. The double-vacuum-chamber high-power electron beam evaporation continuous coating device of claim 1, wherein the multifunctional chamber comprises a transmission device, a gas supply device, a heating device, a heat insulation device, a first multi-arc ion plating device and a first air release valve.
3. The double-vacuum-chamber high-power electron beam evaporation continuous coating device of claim 2, wherein the transmission device comprises a transmission shaft, a rotary sealing device and a rotary workpiece rod, the transmission device is provided with the rotary sealing device through the side wall of the multifunctional chamber, and the rotary workpiece rod is used for fixing a workpiece.
4. The double-vacuum-chamber high-power electron beam evaporation continuous coating device as claimed in claim 3, further comprising a motor disposed outside the multifunctional chamber, wherein the motor actuates the rotary workpiece rod to perform axial movement and autorotation along the horizontal axis.
5. The double-vacuum-chamber high-power electron beam evaporation continuous coating device as claimed in claim 4, wherein the heat insulation device comprises a gear set, a bearing set, a support and a movable baffle; the movable baffle is arranged on the supporting piece, and the gear set and the bearing set actuate the movable baffle to turn.
6. The dual-vacuum-chamber high-power electron beam evaporation continuous coating device of claim 5, wherein the electron beam evaporation chamber comprises an electron gun device, a crucible device, a second multi-arc ion plating device and a second air release valve.
7. The double-vacuum-chamber high-power electron beam evaporation continuous coating device as claimed in claim 6, wherein the crucible device comprises a copper crucible, a non-metal crucible lining and a crucible cooling water pipe.
8. The apparatus of claim 7, wherein the gate valve is opened to allow the workpiece rod and workpiece to move between the multi-functional chamber and the electron beam evaporation chamber.
9. The double-vacuum-chamber high-power electron beam evaporation continuous coating device as claimed in claim 8, wherein the vacuum pumping system is provided as a set.
10. The double-vacuum-chamber high-power electron beam evaporation continuous coating device as claimed in claim 9, wherein the vacuum pumping system comprises a high-vacuum oil diffusion pump, a rotary-vane vacuum pump and a roots pump.
Priority Applications (1)
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CN202010040956.XA CN111235531A (en) | 2020-01-15 | 2020-01-15 | Double-vacuum-chamber high-power electron beam evaporation continuous coating device |
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CN202010040956.XA CN111235531A (en) | 2020-01-15 | 2020-01-15 | Double-vacuum-chamber high-power electron beam evaporation continuous coating device |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115064727A (en) * | 2022-07-19 | 2022-09-16 | 山东国创燃料电池技术创新中心有限公司 | Air supply system of fuel cell engine, control method and airplane |
CN115110040B (en) * | 2022-06-20 | 2024-05-14 | 北京维开科技有限公司 | Independent double-chamber electron beam evaporation coating equipment |
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CN106191787A (en) * | 2016-09-20 | 2016-12-07 | 深圳市东丽华科技有限公司 | The resistance-type evaporation coating machine of a kind of many vacuum chambers and operational approach thereof |
CN206069993U (en) * | 2016-09-20 | 2017-04-05 | 深圳市力沣实业有限公司 | A kind of resistance-type evaporation coating machine of many vacuum chambers |
CN108342699A (en) * | 2018-02-11 | 2018-07-31 | 中国科学院上海光学精密机械研究所 | Comprehensive deposition filming equipment and comprehensive film plating process |
CN209144244U (en) * | 2018-12-04 | 2019-07-23 | 攀枝花学院 | Electron beam coating system |
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2020
- 2020-01-15 CN CN202010040956.XA patent/CN111235531A/en active Pending
Patent Citations (4)
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CN106191787A (en) * | 2016-09-20 | 2016-12-07 | 深圳市东丽华科技有限公司 | The resistance-type evaporation coating machine of a kind of many vacuum chambers and operational approach thereof |
CN206069993U (en) * | 2016-09-20 | 2017-04-05 | 深圳市力沣实业有限公司 | A kind of resistance-type evaporation coating machine of many vacuum chambers |
CN108342699A (en) * | 2018-02-11 | 2018-07-31 | 中国科学院上海光学精密机械研究所 | Comprehensive deposition filming equipment and comprehensive film plating process |
CN209144244U (en) * | 2018-12-04 | 2019-07-23 | 攀枝花学院 | Electron beam coating system |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN115110040B (en) * | 2022-06-20 | 2024-05-14 | 北京维开科技有限公司 | Independent double-chamber electron beam evaporation coating equipment |
CN115064727A (en) * | 2022-07-19 | 2022-09-16 | 山东国创燃料电池技术创新中心有限公司 | Air supply system of fuel cell engine, control method and airplane |
CN115064727B (en) * | 2022-07-19 | 2023-12-22 | 山东国创燃料电池技术创新中心有限公司 | Air supply system of fuel cell engine, control method and aircraft |
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