CN206040684U - LED chip of ITO thin film composition - Google Patents

LED chip of ITO thin film composition Download PDF

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Publication number
CN206040684U
CN206040684U CN201620925919.6U CN201620925919U CN206040684U CN 206040684 U CN206040684 U CN 206040684U CN 201620925919 U CN201620925919 U CN 201620925919U CN 206040684 U CN206040684 U CN 206040684U
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CN
China
Prior art keywords
layer
algainp
ito thin
patterning
thin film
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Expired - Fee Related
Application number
CN201620925919.6U
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Chinese (zh)
Inventor
张银桥
潘彬
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Nanchang Kaixun Photoelectric Co Ltd
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Nanchang Kaixun Photoelectric Co Ltd
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Priority to CN201620925919.6U priority Critical patent/CN206040684U/en
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Abstract

The utility model discloses a LED chip of ITO thin film composition, including the gaAs substrate, be equipped with the buffer layer in proper order on the gaAs substrate, N the alGaInP limiting layer, the MQW multi -quantum well active layer, P the alGaInP limiting layer, P gaP window layer and alGaInP alligatoring layer, be equipped with the ITO thin layer on the alGaInP of patterning alligatoring layer, be equipped with the ITO film contact layer of patterning on the ITO thin layer, contacting the layer, the ITO of patterning film be equipped with the metal electrode layer on, be equipped with the back electrode layer below the gaAs substrate, its characterized in that: the metal electrode layer includes central electrode and extended electrode, wherein: the central electrode is connected on the alGaInP of patterning alligatoring layer, and extended electrode connects on the ITO thin layer. The utility model provides the high adhesion and the integrality on whole metal electrode layer has ensured that emitting diode's operating voltage is stable, has improved the bonding wire reliability and the luminous efficacy of product, has greatly promoted the quality and the yield of product.

Description

A kind of LED chip of ito thin film structure
Technical field
This utility model is related to semiconductor light-emitting-diode field, more particularly, to a kind of LED core of ito thin film structure Piece.
Background technology
Light emitting diode(LED)With advantages such as specular removal, low energy consumption, long-life, high security, high-environmentals, it is a kind of There is the lighting system of broad prospect of application, paid attention to by more and more national, current LED is widely used to High Efficiency Solid-State photograph In bright field, such as display screen, lamps for vehicle, backlight, traffic light, Landscape Lighting etc..
As shown in figure 1, routine AlGaInP light emitting diodes are limited comprising GaAs substrates 100, cushion 101, n-AIGaInP Preparative layer 102, MQW multiple quantum well active layers 103, p-AIGaInP limiting layers 104 and p-GaP Window layer 105, metal electrode layer 106 It is set directly in p-GaP Window layer 105,100 back side of GaAs substrates is provided with dorsum electrode layer 107.Due to conventional AlGaInP The photosphere that goes out of light emitting diode is p-GaP Window layer 105, while p-GaP Window layer 105 also plays ohmic contact layer and electric current expands The important function of exhibition, this will make electric current, and easily concentration is flow through from the underface region with electrode contact, i.e. area immediately below electrode The electric current density in domain increases, it is impossible to electric current is sufficiently extended, so as to reduce the luminous efficiency of LED.Ito thin film compares p- GaP Window layer 105 has good lateral current, while having transmitance height, good conductivity, wear-resistant, corrosion-resistant The advantages of, and it is good with the adhesiveness of p-GaP Window layer 105, therefore, ito thin film is normally used for as raising AlGaInP base cores The transparent electrode material of piece brightness.In actual applications, one layer of ito thin film, Ran Houzai is grown on p-GaP Window layer 105 Deposit metal electrodes layer 106, uses as bonding pad material, finds to be easy to ito thin film occur in the bonding wire test to pad Come off, metal electrode layer 106 comes off abnormal problem, causes its pad performance and chip to be severely impacted using reliability.
The content of the invention
The purpose of this utility model is to provide a kind of ito thin film be easy to and produce, luminous efficiency is high, bonding wire reliability is high The LED chip of structure.
What the purpose of this utility model was realized in:
A kind of LED chip of ito thin film structure, including GaAs substrates, be sequentially provided with above GaAs substrates cushion, N-AlGaInP limiting layers, MQW multiple quantum well active layers, p-AlGaInP limiting layers, p-GaP Window layer and AlGaInP roughened layers, AlGaInP roughened layers are the AlGaInP roughened layers of patterning, on the AlGaInP roughened layers of patterning are provided with ito thin film layer, The ito thin film contact layer of patterning is provided with ito thin film layer, on the ito thin film contact layer of patterning is provided with metal electrode Layer, below GaAs substrates is provided with dorsum electrode layer, is characterized in that:The metal electrode layer includes main electrode and expansion electrode, its In:Main electrode is connected on the AlGaInP roughened layers of patterning, and expansion electrode is connected on ito thin film layer.
This utility model is using the AlGaInP roughened layers for introducing patterning, and then adopts AlGaInP roughening solutions pair AlGaInP roughened layers carry out the roughening of controllable depth;Secondly made using evaporation mode on the ito thin film contact layer of patterning Metal electrode layer, metal electrode layer include main electrode and expansion electrode, wherein the main electrode as pad be connected directly between through On the AlGaInP roughened layers of roughening, ito thin film layer is caused to come off when bonding wire is tested so as to avoid, on the other hand, extension electricity Pole layer is connected on ito thin film layer, and expansion electrode serves the effect for reducing contact voltage, and this is anti-for main electrode is also played The effect of shield, while the characteristics of expansion electrode itself is because of its damascene structures, thus good stability, so as to improve whole gold The tack of category electrode layer and integrity, it is ensured that the stable operating voltage of light emitting diode, improve the bonding wire reliability of product Property and luminous efficiency, greatly improve quality and the yield of product.
Description of the drawings
Fig. 1 is the structural representation of existing conventional AlGaInP light emitting diodes;
Fig. 2 is structural representation of the present utility model.
Specific embodiment
With reference to embodiment and compare accompanying drawing this utility model is described in further detail.
A kind of LED chip of ito thin film structure, including GaAs substrates 100, is sequentially provided with above GaAs substrates 100 Cushion 101, n-AlGaInP limiting layers 102, MQW multiple quantum well active layers 103, p-AlGaInP limiting layers 104, p-GaP windows Mouth layer 105 and AlGaInP roughened layers 106, AlGaInP roughened layer of the AlGaInP roughened layers 106 for patterning, in patterning AlGaInP roughened layers 106 are provided with ito thin film layer 107, are provided with the ito thin film contact layer of patterning on ito thin film layer 107, Metal electrode layer 108 is provided with the ito thin film contact layer of patterning, dorsum electrode layer is provided with below GaAs substrates 100 201, the metal electrode layer 108 includes main electrode and expansion electrode, wherein:The AlGaInP that main electrode is connected to patterning is thick Change on layer 106, expansion electrode is connected on ito thin film layer 107.

Claims (1)

1. a kind of LED chip of ito thin film structure, including GaAs substrates, is sequentially provided with cushion, n- above GaAs substrates AlGaInP limiting layers, MQW multiple quantum well active layers, p-AlGaInP limiting layers, p-GaP Window layer and AlGaInP roughened layers, AlGaInP roughened layers are the AlGaInP roughened layers of patterning, on the AlGaInP roughened layers of patterning are provided with ito thin film layer, The ito thin film contact layer of patterning is provided with ito thin film layer, on the ito thin film contact layer of patterning is provided with metal electrode Layer, is provided with dorsum electrode layer below GaAs substrates, it is characterised in that:The metal electrode layer includes main electrode and extension electricity Pole, wherein:Main electrode is connected on the AlGaInP roughened layers of patterning, and expansion electrode is connected on ito thin film layer.
CN201620925919.6U 2016-08-24 2016-08-24 LED chip of ITO thin film composition Expired - Fee Related CN206040684U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201620925919.6U CN206040684U (en) 2016-08-24 2016-08-24 LED chip of ITO thin film composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201620925919.6U CN206040684U (en) 2016-08-24 2016-08-24 LED chip of ITO thin film composition

Publications (1)

Publication Number Publication Date
CN206040684U true CN206040684U (en) 2017-03-22

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Application Number Title Priority Date Filing Date
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Country Status (1)

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CN (1) CN206040684U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106129205A (en) * 2016-08-24 2016-11-16 南昌凯迅光电有限公司 A kind of LED chip of ito thin film structure and preparation method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106129205A (en) * 2016-08-24 2016-11-16 南昌凯迅光电有限公司 A kind of LED chip of ito thin film structure and preparation method thereof

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C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20170322

Termination date: 20190824