CN205944037U - Plasma etching machine - Google Patents
Plasma etching machine Download PDFInfo
- Publication number
- CN205944037U CN205944037U CN201620952750.3U CN201620952750U CN205944037U CN 205944037 U CN205944037 U CN 205944037U CN 201620952750 U CN201620952750 U CN 201620952750U CN 205944037 U CN205944037 U CN 205944037U
- Authority
- CN
- China
- Prior art keywords
- pipeline
- box body
- box
- plasma etching
- cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Weting (AREA)
- ing And Chemical Polishing (AREA)
Abstract
The utility model discloses a plasma etching machine, the heat -radiating rainproof power distribution box comprises a housing and a separator plate, the baffle is divided into cavity and lower cavity with the inner chamber of box, the epicoele is indoor to have the box body through the support mounting, solution tank and air pump are installed respectively to the outside of box, and solution tank and air pump be connected through the pipeline with the box body, all install the solenoid valve on two pipelines, install the shower nozzle on the box body, install heating lamp on the support, the tray is installed to the upper end of baffle, the cavity of resorption indoor location has an album liquid case, and collection liquid case is connected through the pipeline with the tray, and installs the solenoid valve on the pipeline, the cavity of resorption indoor location has the vacuum pump, and the vacuum pump is connected through the pipeline with last cavity. The utility model discloses can carry out a certain sculpture work alone, play the dual -purpose benefit of a thing, sparingly purchase the cost of a machine.
Description
Technical field
This utility model is related to photovoltaic lithographic technique field, more particularly, to a kind of plasma etching machine.
Background technology
Wet etching is the technology corroded in corrosive liquid that is immersed in etachable material.In simple terms it is simply that middle school
The concept of chemical solution corrosion in class, it is a kind of pure chemistry etching, has excellent selectivity, has just etched current thin film
Can stop, without damaging the thin film of following one layer of other materials.Due to all of semiconductor wet etching all have each to
Property, so either oxide layer or the etching of metal level, the width of lateral etching is all close to the depth of vertical etch.So
One, will there is certain deviation in the pattern that the pattern of upper strata photoresist and subsurface material are etched out, also just cannot be high
Complete to quality figure transfer and the work replicating, therefore with the reduction of characteristic size, in figure transfer process substantially not
Reuse.At present, the wafer that wet etching is commonly used in before technological process prepares, cleans etc. to be not related to the ring of figure
Section, and dry etching has occupied leading position in figure transfer.But but do not have one kind can meet wet method and dry method on market
Etch the device simultaneously working, we release a kind of plasma etching machine to this.
Utility model content
The purpose of this utility model is to solve shortcoming present in prior art, and a kind of plasma etching proposing
Machine.
To achieve these goals, this utility model employs following technical scheme：
Design a kind of plasma etching machine, including casing and dividing plate, described dividing plate by the inner chamber of casing be divided into upper chamber and
Lower chambers, described epicoele interior is provided with box body by support, and the outside of described casing is separately installed with liquor box and air pump, and
Liquor box is connected by pipeline with box body with air pump, is mounted on electromagnetic valve, described box body is provided with two pipelines
Shower nozzle, described support is provided with heating lamp, and the upper end of described dividing plate is provided with pallet, and described bottom chamber is provided with liquid collecting
Case, catch box is connected by pipeline with pallet, and is provided with electromagnetic valve on pipeline, and described bottom chamber is provided with vacuum pump,
Vacuum pump is connected by pipeline with upper chamber, and the side of described upper chamber is provided with aerating mouth, and the outside of described casing is provided with
Radio-frequency power supply, the outside of described radio-frequency power supply is provided with radio frequency induction coil, is provided with electrostatic chuck in described pallet, and described
Radio-frequency power supply is electrically connected with radio frequency induction coil and electrostatic chuck respectively.
Preferably, described box body is provided with pressure gauge.
Preferably, the outside of described casing is provided with controller.
The utility model proposes a kind of plasma etching machine, have the beneficial effects that：This plasma etching machine, epicoele is indoor
For the etching work to photovoltaic panel, it is injected in photovoltaic panel to be etched in pallet by gas injection reaction solution, makes light
Volt plate contacts more completely with reaction solution, and etching effect more preferably, then is detached to the air of upper chamber by vacuum pump, makes
Within the chamber keeps the state of a drying and vacuum, and aerating mouth adds reacting gas, and unlatching radio-frequency power supply carries out etching again
Work, makes the effect of etching more preferably, and also can individually carry out the etching work of a certain kind, plays the benefit of dual-use material, saves
Purchase the cost of a machine.
Brief description
Fig. 1 be the utility model proposes a kind of plasma etching machine structural representation.
In figure：Casing 1, dividing plate 2, upper chamber 3, lower chambers 4, pallet 5, catch box 6, vacuum pump 7, electrostatic chuck 8, box body
9th, liquor box 10, air pump 11, heating lamp 12, support 13, shower nozzle 14, radio-frequency power supply 15, radio frequency induction coil 16, aerating mouth 17,
Controller 18.
Specific embodiment
Below in conjunction with the accompanying drawing in this utility model embodiment, the technical scheme in this utility model embodiment is carried out
Clearly and completely description is it is clear that described embodiment is only a part of embodiment of this utility model rather than whole
Embodiment.
With reference to Fig. 1, a kind of plasma etching machine, including casing 1 and dividing plate 2, the inner chamber of casing 1 is divided into epicoele by dividing plate 2
Room 3 and lower chambers 4, the indoor etching work being used for photovoltaic panel of epicoele, in upper chamber 3, box body 9, case are provided with by support 13
The outside of body 1 is separately installed with liquor box 10 and air pump 11, and liquor box 10 is connected by pipeline with box body 9 with air pump 11, and
It is mounted on electromagnetic valve on two pipelines.
Shower nozzle 14 is provided with box body 9, support 13 is provided with heating lamp 12, the upper end of dividing plate 2 is provided with pallet 5, under
Catch box 6 is installed in chamber 4, catch box 6 is connected by pipeline with pallet 5, pipeline is provided with electromagnetic valve, by air pump
11 insufflation gas make reaction solution be injected in photovoltaic panel to be etched in pallet 5, so that photovoltaic panel is contacted with reaction solution completeer
Entirely, more preferably, catch box 6 is used for being collected the solution in pallet 5 etching effect, and heating lamp 12 is used for photovoltaic panel and pallet
5 are dried, and are easy to etching work again.
Vacuum pump 7 is installed in lower chambers 4, vacuum pump 7 is connected by pipeline with upper chamber 3, and the side of upper chamber 3 sets
There is aerating mouth 17, the outside of casing 1 is provided with radio-frequency power supply 15, and the outside of radio-frequency power supply 15 is provided with radio frequency induction coil 16,
Electrostatic chuck 8 is installed in pallet 5, and radio-frequency power supply 15 is electrically connected with radio frequency induction coil 16 and electrostatic chuck 8 respectively.
Vacuum pump 7 detaches to the air of upper chamber 3, makes to keep the state of a drying and vacuum in upper chamber 3, plus
QI KOU 17 adds reacting gas, and unlatching radio-frequency power supply 15 carries out etching work again, makes the effect of etching more preferably, and also can be single
Solely carry out the etching work of a certain kind, play the benefit of dual-use material, save the cost purchasing a machine.
Further, box body 9 is provided with pressure gauge, for showing to the pressure of box body 9, using safer.
Further, the outside of casing 1 is provided with controller, for the parameter typing to this device body, makes etching work
Make easier, etching effect is more preferable.
Structural principle：Box body 9 in upper chamber 3 adds reaction solution by liquor box 10, then pours gas by air pump 11
Body, make solution formed vaporific be injected in photovoltaic panel to be etched in pallet 5, so that photovoltaic panel is contacted with reaction solution more complete,
Reaction solution in pallet 5 more preferably, is collected out by catch box 6, then is carried out photovoltaic panel by heating lamp 12 by etching effect
Drying, simultaneously vacuum pump 7 air of upper chamber 3 is detached, make in upper chamber 3, to keep the shape of a drying and vacuum
State, is adding reacting gas by aerating mouth 17, unlatching radio-frequency power supply 15 carries out etching work again, makes the effect of etching more
Well more complete.
The above, only this utility model preferably specific embodiment, but protection domain of the present utility model is not
Be confined to this, any those familiar with the art in the technical scope that this utility model discloses, according to this practicality
New technical scheme and its utility model design in addition equivalent or change, all should cover in protection model of the present utility model
Within enclosing.
Claims (3)
1. a kind of plasma etching machine, including casing（1）And dividing plate（2）, described dividing plate（2）By casing（1）Inner chamber be divided into
Chamber（3）And lower chambers（4）It is characterised in that described upper chamber（3）Interior by support（13）Box body is installed（9）, described case
Body（1）Outside be separately installed with liquor box（10）And air pump（11）, and liquor box（10）And air pump（11）With box body（9）Pass through
Pipeline is connected, and is mounted on electromagnetic valve, described box body on two pipelines（9）On shower nozzle is installed（14）, described support
（13）On heating lamp is installed（12）, described dividing plate（2）Upper end pallet is installed（5）, described lower chambers（4）Collection is inside installed
Liquid case（6）, catch box（6）With pallet（5）It is connected by pipeline, and on pipeline, electromagnetic valve is installed, described lower chambers（4）
Vacuum pump is inside installed（7）, vacuum pump（7）With upper chamber（3）It is connected by pipeline, described upper chamber（3）Side be provided with
Aerating mouth（17）, described casing（1）Outside radio-frequency power supply is installed（15）, described radio-frequency power supply（15）Outside be provided with and penetrate
Frequency inductance coil（16）, described pallet（5）Electrostatic chuck is inside installed（8）, and described radio-frequency power supply（15）Respectively with radio frequency electrical
Sense coil（16）And electrostatic chuck（8）Electrical connection.
2. a kind of plasma etching machine according to claim 1 is it is characterised in that described box body（9）On pressure is installed
Table.
3. a kind of plasma etching machine according to claim 1 is it is characterised in that described casing（1）Outside be provided with
Controller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620952750.3U CN205944037U (en) | 2016-08-25 | 2016-08-25 | Plasma etching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620952750.3U CN205944037U (en) | 2016-08-25 | 2016-08-25 | Plasma etching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205944037U true CN205944037U (en) | 2017-02-08 |
Family
ID=57953656
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620952750.3U Expired - Fee Related CN205944037U (en) | 2016-08-25 | 2016-08-25 | Plasma etching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205944037U (en) |
-
2016
- 2016-08-25 CN CN201620952750.3U patent/CN205944037U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170208 Termination date: 20200825 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |