CN205635849U - Top cap dismantled of epitaxial furnace reacting chamber - Google Patents
Top cap dismantled of epitaxial furnace reacting chamber Download PDFInfo
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- CN205635849U CN205635849U CN201620365709.6U CN201620365709U CN205635849U CN 205635849 U CN205635849 U CN 205635849U CN 201620365709 U CN201620365709 U CN 201620365709U CN 205635849 U CN205635849 U CN 205635849U
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CN201620365709.6U CN205635849U (en) | 2016-04-27 | 2016-04-27 | Top cap dismantled of epitaxial furnace reacting chamber |
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CN201620365709.6U CN205635849U (en) | 2016-04-27 | 2016-04-27 | Top cap dismantled of epitaxial furnace reacting chamber |
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CN205635849U true CN205635849U (en) | 2016-10-12 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107747525A (en) * | 2017-11-27 | 2018-03-02 | 湖北拓宇水电科技有限公司 | A kind of modified hydraulic turbine, water pump blade angle hydraulic isochronous controller |
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- 2016-04-27 CN CN201620365709.6U patent/CN205635849U/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107747525A (en) * | 2017-11-27 | 2018-03-02 | 湖北拓宇水电科技有限公司 | A kind of modified hydraulic turbine, water pump blade angle hydraulic isochronous controller |
CN107747525B (en) * | 2017-11-27 | 2024-02-13 | 湖北拓宇水电科技股份有限公司 | Improved hydraulic synchronous regulator for blade angle of water turbine and water pump |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP02 | Change in the address of a patent holder |
Address after: 361101 first floor, building B, Jianye Building, No. 96, Xiangxing Road, Xiamen Torch High tech Zone (Xiangjiao) Industrial Zone, Xiamen, Fujian Patentee after: EPIWORLD INTERNATIONAL CO.,LTD. Address before: 361101 room 803, qiangye building, No. 98, Xiangxing Road, Xiang'an District, Xiamen City, Fujian Province (Yucheng center, torch high tech Industrial Park) Patentee before: EPIWORLD INTERNATIONAL CO.,LTD. |
|
CP02 | Change in the address of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 361101 first floor, building B, Jianye Building, No. 96, Xiangxing Road, Xiamen Torch High tech Zone (Xiangjiao) Industrial Zone, Xiamen, Fujian Patentee after: Hantiantiancheng Electronic Technology (Xiamen) Co.,Ltd. Address before: 361101 first floor, building B, Jianye Building, No. 96, Xiangxing Road, Xiamen Torch High tech Zone (Xiangjiao) Industrial Zone, Xiamen, Fujian Patentee before: EPIWORLD INTERNATIONAL CO.,LTD. |
|
CP01 | Change in the name or title of a patent holder | ||
CP02 | Change in the address of a patent holder |
Address after: 1st Floor, Building B, Jianye Building, No. 96 Xiangxing Road, Xiang'an Industrial Zone, Xiamen Torch High tech Zone, Fujian Province, 361101 Patentee after: Hantiantiancheng Electronic Technology (Xiamen) Co.,Ltd. Address before: 361101 first floor, building B, Jianye Building, No. 96, Xiangxing Road, Xiamen Torch High tech Zone (Xiangjiao) Industrial Zone, Xiamen, Fujian Patentee before: Hantiantiancheng Electronic Technology (Xiamen) Co.,Ltd. |
|
CP02 | Change in the address of a patent holder |