CN202626287U - Graphite plate and reaction chamber with same - Google Patents
Graphite plate and reaction chamber with same Download PDFInfo
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- CN202626287U CN202626287U CN 201220059120 CN201220059120U CN202626287U CN 202626287 U CN202626287 U CN 202626287U CN 201220059120 CN201220059120 CN 201220059120 CN 201220059120 U CN201220059120 U CN 201220059120U CN 202626287 U CN202626287 U CN 202626287U
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- graphite plate
- groove
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- support frame
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Abstract
The utility model aims to provide a graphite plate for a chemical vapor deposition process and a reaction chamber with the graphite plate. The graphite plate is provided with a groove for placing a substrate, and comprises a hole, wherein the hole is positioned in the graphite plate opposite to the edge of the substrate, and is used for reducing thermal radiation to the edge of the substrate. A temperature difference between the edge and the middle part of the substrate is reduced, the heating uniformity of the substrate is improved, the uniformity of the chemical vapor deposition process is improved, and the yield of an epitaxial chip is improved.
Description
Technical field
The utility model relates to the chemical vapor deposition (CVD) technical field, particularly the graphite plate of chemical vapor depsotition equipment, reaction chamber.
Background technology
MOCVD (Metal-Organic Chemical Vapor Deposition) is a kind of chemical gas phase epitaxial deposition process that on the basis of vapor phase epitaxial growth (VPE), grows up.It is with the source material as crystal growth such as hydrogenate of the organic cpds of III family, II family element and V, VI family element; On graphite plate, carry out depositing operation with the pyrolysis mode, the thin layer monocrystal material of grow various III-V family, group and their multivariate solid solution.
Principle in the face of existing chemical vapor deposition method describes down.Particularly, be example with MOCVD, please refer to the structural representation of existing chemical vapor deposition method equipment shown in Figure 1.
Be formed with the spray header 11 and graphite plate 12 that are oppositely arranged in the glove box 10.In the said spray header 11 a plurality of apertures can be set, said spray header 11 is used to provide reactant gases.Have a plurality of grooves in the said graphite plate 12, the corresponding a slice substrate 121 of placing in each groove, the material of said substrate 121 is generally expensive sapphire.The below of said graphite plate 12 also is formed with heating unit 13, and 13 pairs of graphite plates 12 of said heating unit heat, and graphite plate 12 intensification of being heated can be heated substrate 121 with thermal radiation and heat exchange pattern.Because substrate 121 is placed in the graphite plate 12, both contacts, so the heating of 12 pairs of substrates 121 of graphite plate is main with thermal conduction.
When carrying out MOCVD technology; Reactant gases gets into the conversion zone (near the position on the surface of substrate 121) of graphite plate 12 tops from the aperture of spray header 11; Said substrate 121 is owing to the thermal conduction heating of heating unit 13 has certain temperature; Thereby making, this temperature carries out chemical reaction between the reactant gases, thereby at substrate 121 surface deposition epitaxial material layers.
Find that in reality the homogeneity of existing chemical vapor deposition method is not high, the yield of extension chip is on the low side.
The utility model content
The problem that the utility model embodiment solves has provided a kind of graphite plate, has contained the reaction chamber of above-mentioned graphite plate; Improved homogeneity to the heating of substrate (substrate of distortion has especially taken place); Improve the homogeneity of chemical vapor deposition method, improved the yield of extension chip.
In order to address the above problem; The utility model provides a kind of graphite plate of chemical vapor deposition method, has the groove that is used to place substrate, comprising: hole; Be arranged in the graphite plate corresponding with the edge of said substrate, described hole is used to reduce the thermal radiation to edges of substrate.
Alternatively, described hole is connected with groove.
Alternatively, V-type is formed on the sidewall of said groove and bottom.
Alternatively, also comprise: bracing frame, be used for substrate is suspended, make substrate not contact with graphite plate.
Alternatively, the material of support frame as described above is one or more in quartz, graphite, SP 1, pottery or the zirconium white.
Alternatively, the top of support frame as described above is fixed on the graphite plate of groove both sides, and the bottom of support frame as described above is used to place substrate.
Alternatively, support frame as described above is Z type or notch cuttype.
Alternatively, the front of the front of the front of said substrate, graphite plate and bracing frame flushes.
Correspondingly, the utility model also provides a kind of reaction chamber of chemical vapor depsotition equipment, comprises described graphite plate.
Compared with prior art, the utlity model has following advantage:
The utility model reduces the thermal radiation to edges of substrate through in the graphite plate corresponding with the edge of said substrate, hole being set, the temperature difference between the edge that reduces substrate and the middle part of substrate, the homogeneity that the raising substrate is heated;
Further have optimally; The groove of the graphite plate that the utility model embodiment provides has corresponding with it bracing frame, utilizes this bracing frame that substrate is suspended, and makes substrate not contact with graphite plate; When carrying out chemical vapor deposition method; Graphite plate is as the thermal source (graphite plate heats up under the heating of heating unit, can heat be provided with thermal radiation and heat exchange pattern) of substrate, because substrate does not contact with graphite plate; Therefore utilize the described graphite plate of the utility model can realize that the heating to substrate is main with the thermal radiation mode; Eliminated prior art and utilized thermal conduction to heat the inhomogeneous influence that causes, improved homogeneity, the homogeneity of the epitaxial material layer that forms on the corresponding homogeneity of having improved chemical vapor deposition method and the substrate substrate heating to the heating of each point on the substrate;
Further optimally, the front of support frame as described above, the front of substrate flush with the front of graphite plate, can avoid because the air-flow skewness of substrate face;
Further optimally; Support frame as described above hangs on the graphite plate of said groove both sides; The top of support frame as described above is fixed on the graphite plate of both sides of said groove, and the bottom of support frame as described above is used to place substrate, the Z type that the is shaped as annulus of support frame as described above; When substrate need rotate along with graphite plate together, help guaranteeing the relatively stable of substrate and graphite plate.
Description of drawings
Fig. 1 is the structural representation of the MOCVD device of prior art;
Fig. 2 is the structural representation of the graphite plate of the utility model first embodiment;
Fig. 3 is the structural representation of the graphite plate of the utility model second embodiment;
Fig. 4 is the plan structure synoptic diagram of graphite plate shown in Figure 3;
Fig. 5 is the structural representation of the graphite plate of the utility model the 3rd embodiment;
Fig. 6 is the structural representation of the graphite plate of the utility model the 4th embodiment;
Fig. 7 is the structural representation of the graphite plate of the utility model the 5th embodiment;
Fig. 8 is the structural representation of the graphite plate of the utility model the 6th embodiment;
Fig. 9 is the structural representation of the graphite plate of the utility model the 7th embodiment;
Figure 10 is the bottom construction synoptic diagram of the bracing frame among Fig. 9;
Figure 11 is the structural representation of the graphite plate of the utility model the 8th embodiment;
Figure 12 is the structural representation of the graphite plate of the utility model the 9th embodiment.
Embodiment
The homogeneity of the chemical vapor deposition method of prior art is not high, and the yield of extension chip is on the low side.Discover that the epitaxial material layer that inhomogeneous (each point of substrate has the temperature difference) causes on substrate, forming after the chemical vapor deposition method because substrate is heated is inhomogeneous through the contriver.Because fringing effect influence, graphite plate are in the substrate heat-processed, the temperature of edges of substrate is higher than the temperature at substrate middle part.In order to reduce the temperature of edges of substrate, the present invention reduces thermal radiation or thermal conduction to edges of substrate through near the graphite plate edges of substrate hole being set.Particularly, this hole can be arranged in the graphite plate corresponding with the edge of substrate, such as, this hole can be arranged in the graphite plate of substrate both sides, and this hole can be connected with the sidewall of the groove of placing substrate or not be communicated with; This hole also can be arranged in the graphite plate of edges of substrate below, and this hole can be connected or not be communicated with (be not communicated with to be and have the graphite plate isolation between hole and the groove) with the bottom of groove.
Below in conjunction with embodiment the technical scheme of the utility model is carried out detailed explanation.For the technical scheme of the utility model is described better, please combine the structural representation of the graphite plate of the utility model shown in Figure 2 first embodiment.Facing up of graphite plate 20 has groove in the graphite plate 20, and said groove has bottom and sidewall.The sidewall of the described groove of the utility model is the both sides perpendicular to the front of graphite plate 20 of groove, and the graphite plate 20 of below is exposed in the bottom of said groove.The front of the described graphite plate of the utility model be graphite plate towards the surface of spray header (not shown) one side, more than definition is applicable in full explanation hereby.
The described hole of the utility model is positioned at the graphite plate 20 of substrate 22 both sides; And this hole top is coated with graphite plate 20; Directly being exposed to the spray header below with hole compares; Present embodiment can prevent in the hole chemical reaction to take place and form weighting material, and makes that the surface of substrate 22 both sides is an even curface, and the source gas that helps substrate 22 tops forms uniform distribution.
Please refer to the structural representation of the graphite plate of the utility model shown in Figure 3 second embodiment below.The structure identical with first embodiment adopts identical label to represent.The difference of the present embodiment and first embodiment is that the bottom of groove is provided with bracing frame 21, and this bracing frame 21 is around the sidewall and one week of bottom of groove, and substrate 22 is positioned at bracing frame 21 tops.As an embodiment, a groove is only arranged in the graphite plate 20 shown in Figure 3, in other embodiment, in the graphite plate a plurality of grooves can be arranged.
Support frame as described above 21 is used for substrate 22 is suspended, and makes substrate 22 not contact with graphite plate 20, thereby eliminates because substrate 22 contacts the thermal conduction that brings with graphite plate 20, makes being heated to be thermal radiation or being main with thermal radiation of 20 pairs of substrates 22 of graphite plate.
Please combine Fig. 4, be the schematic top plan view of graphite plate shown in Figure 3.Support frame as described above 21 be shaped as annular.This annular bracing frame 21 is around the sidewall and one week of bottom of groove, and substrate 22 is positioned at bracing frame 21 tops.
Please continue with reference to figure 3, as an optional embodiment of the utility model, bracing frame 21 is positioned at the below of substrate 22.The back side of substrate 22 does not contact with graphite plate 20.The height L of support frame as described above 21 should satisfy, and when substrate 22 presented bowl-shape distortion (being the deformation of bottom of the middle part of substrate 22 towards groove), the back side of substrate 22 did not still contact with graphite plate 20.As the another optional embodiment of the utility model, the thickness D sum of the height L of support frame as described above 21 and substrate 22 should equal the degree of depth of groove H.The thickness D of the described substrate 22 of the utility model is meant the front (towards the surface of the first side of spray) of the substrate that deformation does not take place and the vertical range between the back side (and positive facing surfaces).The height L of the described bracing frame of the utility model be meant bracing frame 21 front and the back side (with the front relatively and with the surface of a side of spray header furthest) distance.As an embodiment, the depth H scope of said groove is 300 microns～2 millimeters, and the thickness D scope of said substrate 22 is 300 microns～1.5 millimeters, and correspondingly, the height L scope of support frame as described above 21 is 290 microns～1.7 millimeters.
In the present embodiment; Though the side of substrate 22 still has part to contact with the sidewall of groove, through this part contact, graphite plate 20 can be passed to substrate 22 with the part heat with heat exchange pattern; But the heat of heat exchange pattern conduction is limited, and is little to the homogeneity of the being heated influence of substrate 22.In other embodiment, can between the both sides of substrate 22 and graphite plate 20, transparent thermal insulation layer be set, the material of this thermal insulation layer can be a kind of in quartz, SP 1, sapphire, pottery or the zirconium white or mixing wherein.
As an embodiment, the width of support frame as described above 21 should be as far as possible little, to reduce and the contacting of substrate 22.As preferred embodiment, the width range of support frame as described above 21 is placed radius 1/10～1/20 stable that substrate 22 is unsettled to guarantee of substrate for its top.
As an embodiment; The material of support frame as described above 21 is a graphite; It can with graphite plate 20 integrated processing, also can process separately, be fixed together through mechanical component such as screw and nut and graphite plate 20 then or be bonded as one through heat-resistant adhesive and graphite plate 20.
As preferred embodiment, the material of support frame as described above 21 should be transparent material, guarantees that like this heat of the graphite plate 20 of bracing frame 21 belows can transfer to substrate 22 through bracing frame 21.For example the material of support frame as described above 21 can be a kind of in quartz, SP 1, sapphire, pottery or the zirconium white or mixing wherein.In the present embodiment, the material of support frame as described above 21 is a sapphire.
Because graphite plate 20 may rotatablely move in technological process; Can stablize in graphite plate in order to guarantee substrate 22; Certain inclination can be arranged at the sidewall of said groove and bottom, and V-type is formed on lateral faces and bottom, and purpose is to make the diameter of bottom of groove greater than the diameter at the top of groove; Whole groove is round table-like, guarantees that substrate 22 is relatively stable with the position in the rotary course of graphite plate 20.
Request in person the structural representation of the graphite plate that combines the utility model the 3rd embodiment shown in Figure 5 down.The structure identical with last embodiment adopts identical label.The difference of present embodiment and last embodiment is to have hole in the graphite plate 20, and this hole is positioned at the sidewall of groove at the edge of substrate 22.The hole of the utility model embodiment is arranged on the front of graphite plate 20, also is the processing and fabricating for the ease of graphite plate 20.In other embodiment, described hole can be arranged in the graphite plate of the edge below of substrate, also can be arranged in the graphite plate of both sides at the edge of substrate; This hole can be connected with groove, perhaps can have the part graphite plate isolated between this hole and the groove.
Please refer to the structural representation of the graphite plate of the utility model shown in Figure 6 the 4th embodiment below.The structure identical with last embodiment adopts identical label to represent.The difference of present embodiment and last embodiment is that support frame as described above 21 hangs on the graphite plate 20 of said groove both sides, and the top of support frame as described above 21 is fixed on the graphite plate 20 of both sides of said groove, and the bottom of support frame as described above 21 is used to place substrate 22.
Support frame as described above 21 is a notch cuttype.That is, the top of bracing frame 21 contacts with the front of the graphite plate 20 of groove both sides, side graphite plate 20 contacts of bracing frame 21, and the bottom of support frame as described above 21 is suspended on the groove.The bottom of support frame as described above 21 is used to place substrate 22; The sidewall of bracing frame 21 is isolated the side and the graphite plate of substrate 22; Make substrate 22 not contact fully with graphite plate 20; Can reduce graphite plate 20 like this and heat is transferred to substrate 22, make that the heating of 20 pairs of substrates 22 of graphite plate is main with the thermal radiation mode, thereby further improve the homogeneity of being heated substrate 22 with heat exchange pattern.
As preferred embodiment; The front of the front of support frame as described above 21, substrate 22 flushes with the front of graphite plate 20; The gas that can prevent bracing frame 21 and 20 pairs of substrate 22 tops of graphite plate like this brings influence, improves the homogeneity of the air-flow distribution of substrate 22 tops.The front of the described bracing frame of the utility model be meant bracing frame towards the surface of spray header (not shown) one side, more than definition is applicable in full.
As an embodiment of the utility model, the bottom of the groove at the edge of substrate 22 has hole, and this hole is connected with groove, can be convenient to the processing and the making of graphite plate 20 utilizing same process step to make.
Request in person the structural representation of the graphite plate that combines the utility model the 5th embodiment shown in Figure 7 down, the parts identical with last embodiment adopt identical label to represent.The difference of present embodiment and last embodiment is; V-type is formed on the sidewall of groove and bottom; Correspondingly, the Z type that is shaped as of bracing frame 21, support frame as described above 21 hang on the graphite plate 20 of groove both sides; The top of support frame as described above 21 is fixed on the graphite plate 20 of both sides of groove, and the bottom of support frame as described above 21 is used to place substrate 22.The bracing frame 21 of the described Z type of employing present embodiment is stationary substrate 22 better, prevents that substrate 22 is along with being thrown out of in graphite plate 20 rotating process.In the present embodiment, hole is arranged in the graphite plate 20 of below at the edge of substrate 22.
Please refer to the structural representation of the graphite plate of the utility model shown in Figure 8 the 6th embodiment below, the structure identical with last embodiment adopts identical label to represent.The difference of present embodiment and last embodiment is that the front of the front of said substrate 22, bracing frame 21 and the front of graphite plate 20 flush, and helps improving the homogeneity of the gas distribution on substrate 22 surfaces like this.
Please refer to the structural representation of the graphite plate of the utility model shown in Figure 9 the 7th embodiment below, the structure identical with last embodiment adopts identical label to represent.The difference of present embodiment and last embodiment is that the sidewall at the edge of substrate 22 and bottom all are formed with hole, and this hole is connected with groove in the present embodiment.In other embodiment, can also there be the part graphite plate to isolate between described hole and the groove.In the present embodiment; Support frame as described above 21 be shaped as notch cuttype; The sidewall of this bracing frame 21 does not contact with the graphite plate 20 of groove both sides; Can prevent that like this graphite plate 20 from conducting heat to substrate 22 through the sidewall of bracing frame 21, prevent the edge of substrate 22 is heated the temperature that the lip temperature that too much causes substrate 22 is higher than the middle part of substrate 22, further improve the homogeneity of the temperature distribution of substrate 22.
In the present embodiment; The bottom of support frame as described above 21 does not contact with graphite plate 20; Can prevent that also graphite plate 20 from through the edge of bracing frame 21 with heat transferred substrate 22, reducing the temperature contrast at the edge and the middle part of substrate 22, further improve the homogeneity of distribution of the temperature of substrate 22.
Conduct heat in order further to reduce graphite plate through bracing frame to substrate; Improve the homogeneity of temperature distribution at edge and the middle part of substrate; As optional embodiment; Can also form hole in the part that contacts with substrate of bracing frame, so further reduce the contact area of bracing frame and substrate.Particularly, please refer to the structural representation of the bottom of the bracing frame among Fig. 9 shown in Figure 10.As an embodiment, the top of bracing frame (not shown) is positioned on the graphite plate, and the bottom of bracing frame (promptly being used to place the part of substrate) is the double-doughnut structure.Like figure, the bottom of this bracing frame specifically comprises outer shroud 211, interior ring 212 and is connected outer shroud 211 and the cross structure 213 of interior ring 212.Adopt the contact area of bracing frame and substrate of said double-doughnut structure few, reduced graphite plate through the heat conducting heat transmission of bracing frame to substrate.
Another embodiment as the utility model; The shape of support frame as described above can also be a plurality of pillar stiffeners (pin); Can be the pillar stiffener that equilateral triangle is arranged for three such as support frame as described above, being centered close to of the center of equilateral triangle and groove (bottom vertical of this vertical line and groove) on the same vertical line.Adopt support column arrangement that substrate is suspended in the groove, can further reduce the thermal conduction between substrate and the graphite plate.
Please refer to the structural representation of the graphite plate of the utility model shown in Figure 11 the 8th embodiment below.The structure identical with the 6th embodiment adopts identical label to represent.The difference of present embodiment and the 6th embodiment is that substrate 22 faces up and is positioned on the step-like bracing frame 21, and the front of the front of said substrate 22, bracing frame 21 and the front of graphite plate 20 flush.In other embodiments, can not adopt bracing frame and directly substrate is positioned in the groove of graphite plate.
The difference of present embodiment and the 6th embodiment is that the shape of hole is different with the position.The hole of present embodiment is positioned at the bottom at the edge of substrate 121, is connected with bottom portion of groove.The degree of depth of the hole of the utility model from the sidewall of groove below along substrate 121 radially to the reducing successively of the middle part of substrate 121 direction, whole hole is triangular shape.Adopt described hole can further eliminate the thermal radiation of edges of substrate.
Please refer to the structural representation of the graphite plate of the utility model shown in Figure 12 the 9th embodiment below.The structure identical with the 7th embodiment adopts identical label to represent.Be that with the difference of last embodiment bracing frame 21 is positioned at the middle part of groove, and support frame as described above 21 is made up of a plurality of pillar stiffeners.In the present embodiment, the number of said pillar stiffener is 3, and said pillar stiffener is equilateral triangle arranges, being centered close to of the center of equilateral triangle and groove (bottom vertical of this vertical line and groove) on the same vertical line.Adopt the support column arrangement of present embodiment that substrate is suspended in the groove, can further reduce the thermal conduction between substrate and the graphite plate.
To sum up; The utility model reduces the thermal radiation to edges of substrate through in the graphite plate corresponding with the edge of said substrate, hole being set, and reduces the thermal radiation to the edge of substrate; Reduce the temperature difference between the middle part of edge and substrate of substrate, improve the homogeneity that substrate is heated;
The groove of the graphite plate that the utility model embodiment provides has corresponding with it bracing frame; Utilize this bracing frame that substrate is suspended; Make substrate not contact with graphite plate, when carrying out chemical vapor deposition method, (graphite plate heats up under the heating of heating unit graphite plate as the thermal source of substrate; Can heat be provided with thermal radiation and heat exchange pattern); Because substrate does not contact with graphite plate, therefore utilize the described graphite plate of the utility model can realize that the heating to substrate is main with the thermal radiation mode, eliminated prior art and utilized thermal conduction to heat the inhomogeneous influence that causes to the heating of each point on the substrate; Improved homogeneity, the homogeneity of the epitaxial material layer that forms on the corresponding homogeneity of having improved chemical vapor deposition method and the substrate to substrate heating;
Further optimally, the front of support frame as described above, the front of substrate flush with the front of graphite plate, can avoid because the air-flow skewness of substrate face;
Further optimally; Support frame as described above hangs on the graphite plate of said groove both sides; The top of support frame as described above is fixed on the graphite plate of both sides of said groove, and the bottom of support frame as described above is used to place substrate, the Z type that the is shaped as annulus of support frame as described above; When substrate need rotate along with graphite plate together, help guaranteeing the relatively stable of substrate and graphite plate.
Though oneself discloses the utility model as above with preferred embodiment, the utility model is not to be defined in this.Any those skilled in the art in spirit that does not break away from the utility model and scope, all can do various changes and modification, so the protection domain of the utility model should be as the criterion with claim institute restricted portion.
Claims (8)
1. the graphite plate of a chemical vapor deposition method has the groove that is used to place substrate, it is characterized in that, comprising: hole, be arranged in the graphite plate corresponding with the edge of said substrate, and described hole is used to reduce the thermal radiation to the edge of substrate.
2. graphite plate as claimed in claim 1 is characterized in that described hole is connected with groove.
3. graphite plate as claimed in claim 1 is characterized in that, V-type is formed on the sidewall of said groove and bottom.
4. graphite plate as claimed in claim 1 is characterized in that, also comprises: the bracing frame corresponding with groove, be used for substrate is suspended, and make substrate not contact with graphite plate.
5. graphite plate as claimed in claim 4 is characterized in that, the top of support frame as described above is fixed on the graphite plate of groove both sides, and the bottom of support frame as described above is used to place substrate.
6. graphite plate as claimed in claim 5 is characterized in that, support frame as described above is Z type or notch cuttype.
7. graphite plate as claimed in claim 5 is characterized in that, the front of the front of said substrate, the front of graphite plate and bracing frame flushes.
8. the reaction chamber of a chemical vapor depsotition equipment is characterized in that, comprises graphite plate as claimed in claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220059120 CN202626287U (en) | 2012-02-22 | 2012-02-22 | Graphite plate and reaction chamber with same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220059120 CN202626287U (en) | 2012-02-22 | 2012-02-22 | Graphite plate and reaction chamber with same |
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| Publication Number | Publication Date |
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| CN202626287U true CN202626287U (en) | 2012-12-26 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 201220059120 Expired - Fee Related CN202626287U (en) | 2012-02-22 | 2012-02-22 | Graphite plate and reaction chamber with same |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103074607A (en) * | 2012-02-22 | 2013-05-01 | 光达光电设备科技（嘉兴）有限公司 | Graphite plate and reaction chamber with graphite plate |
| WO2013123859A1 (en) * | 2012-02-22 | 2013-08-29 | 光达光电设备科技（嘉兴）有限公司 | Graphite plate, reaction chamber having same, and method for heating substrate |
| CN103343333A (en) * | 2013-07-10 | 2013-10-09 | 合肥彩虹蓝光科技有限公司 | Graphite disk structure capable of avoiding wafer flying |
| CN109161873A (en) * | 2018-09-29 | 2019-01-08 | 华灿光电（浙江）有限公司 | A kind of graphite base |
-
2012
- 2012-02-22 CN CN 201220059120 patent/CN202626287U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103074607A (en) * | 2012-02-22 | 2013-05-01 | 光达光电设备科技（嘉兴）有限公司 | Graphite plate and reaction chamber with graphite plate |
| WO2013123859A1 (en) * | 2012-02-22 | 2013-08-29 | 光达光电设备科技（嘉兴）有限公司 | Graphite plate, reaction chamber having same, and method for heating substrate |
| CN103343333A (en) * | 2013-07-10 | 2013-10-09 | 合肥彩虹蓝光科技有限公司 | Graphite disk structure capable of avoiding wafer flying |
| CN109161873A (en) * | 2018-09-29 | 2019-01-08 | 华灿光电（浙江）有限公司 | A kind of graphite base |
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