CN205009733U - A silk screen for screen printing - Google Patents
A silk screen for screen printing Download PDFInfo
- Publication number
- CN205009733U CN205009733U CN201520646309.8U CN201520646309U CN205009733U CN 205009733 U CN205009733 U CN 205009733U CN 201520646309 U CN201520646309 U CN 201520646309U CN 205009733 U CN205009733 U CN 205009733U
- Authority
- CN
- China
- Prior art keywords
- silk thread
- silk
- spacer region
- screen
- silk screen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007650 screen-printing Methods 0.000 title abstract description 4
- 125000006850 spacer group Chemical group 0.000 claims abstract description 41
- 229910001220 stainless steel Inorganic materials 0.000 claims description 4
- 239000010935 stainless steel Substances 0.000 claims description 4
- 238000001259 photo etching Methods 0.000 abstract description 11
- 238000002360 preparation method Methods 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 238000007639 printing Methods 0.000 abstract description 2
- 239000003292 glue Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000009941 weaving Methods 0.000 description 5
- 239000000839 emulsion Substances 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 239000002002 slurry Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000005611 electricity Effects 0.000 description 2
- 238000012800 visualization Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000009954 braiding Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Printing Plates And Materials Therefor (AREA)
Abstract
The utility model provides a silk screen for screen printing, including the silk thread of first direction and the silk thread of second direction, wherein, be equipped with a plurality of spacer regions and silk thread district on the first direction, set up according to one or more distances between the spacer region to be not equipped with the silk thread of first direction in the spacer region, the spacer region set up with interval separating of silk thread, and wherein, on the first direction, the spacer region width is greater than distance between the first direction silk thread district silk thread. The utility model discloses an it has the silk screen that sets up the spacer region of broad according to the predetermined distance to use among the printing screen in the preparation, in the time of just can realizing the photoetching, according to the distance and the position of this predetermined spacer region, can set up the mode of line of rabbet joint figure position in advance in the mask version, when the exposure, needs only and directly covers the mask version on the silk screen of the good photosensitive glue of coating, places the line of rabbet joint figure in the mask version on the silk screen corresponding to the position of corresponding spacer region, and the photoetching is carried out in implementation that just can be convenient.
Description
Technical field
The utility model relates to a kind of silk screen for serigraphy, particularly relates to a kind of can photoetching easily carrying out making the silk screen of the line of rabbet joint.
Background technology
In the manufacturing process of crystal silicon solar batteries, need to make grid line to collect the electric current that in silicon chip, opto-electronic conversion produces at silicon chip surface, prior art adopts following technique to make grid line: first on mask plate, make grid line figure, this figure is utilized to expose and photoetching is carried out in development the light-sensitive emulsion of coating on web plate, produce hollow wire casing, then be printed on silicon chip on by wire metals slurry (as silver is starched) through the line of rabbet joint of web plate by serigraphy, sintering makes grid line.Existing web plate comprises screen cloth and photosensitive glue-line, and photosensitive glue-line is coated on screen cloth, mutually intersects between the warp of web plate and parallel.On mask plate preparation have grid line figure, mask plate is close to one side web plate having photosensitive glue-line, with UV-irradiation, not by the part of mask plate grid line graph shealtering, solidifies under ultraviolet light conditions, and the part of blocking flushable fall, formed the line of rabbet joint.These line of rabbet joint formed, and between graticule and loose position relationship, intersect often, as depicted in figs. 1 and 2, a large amount of the appearing in the line of rabbet joint 20 in crosspoint 103 that silk screen 10 middle longitude 101 and parallel 102 are formed.
In order to improve the photoelectric transformation efficiency of cell piece, need the width reducing grid line on silicon chip as far as possible, to increase illuminating area, but, when grid line width is narrow, because the existence in these crosspoints 103, plain conductor slurry can be hindered to bite on silicon chip from the line of rabbet joint smoothly; Simultaneously during printing slurry, in the delta-shaped region that warp 101 and parallel 102 cross-point locations and the edge of the light-sensitive emulsion formed at the line of rabbet joint position when developing after ultraviolet light polymerization are formed, the slurry with certain viscosity can constantly be accumulated, the area causing metal paste effectively can penetrate through silk screen in the line of rabbet joint constantly reduces, therefore, cause and silicon chip conducts electricity grid line and occur low spot or breakpoint, thus cause the electric conductivity of grid line poor, have impact on the electricity conversion of crystal-silicon battery slice.
Chinese patent application CN204367550U before applicant discloses a kind of web plate manufactured for solar cell, and as shown in Figure 3 and Figure 4, its screen cloth 10 is made into by some warps 101 and parallel 102, and the line of rabbet joint 20 is between warp or parallel.Like this, the crosspoint 103 between warp and parallel there will not be in the line of rabbet joint 20, thus solves the problem that metal paste well can not penetrate through crosspoint delta-shaped region.
But state in the application process of the manufacturing of patent actually, applicant finds, because silk screen is in the manufacture process of braiding, and manufacture in web plate process, can not guarantee that warp and parallel are in desirable position completely, such as may occur tilting, the phenomenon such as bending, and be only micron order for the silk thread spacing of the silk screen in the web plate of solar cell manufacture, when tens or the up to a hundred line of rabbet joint will be set in so narrow space, computer is under the microscope needed to determine separately the position of each root line of rabbet joint one by one, appear in the line of rabbet joint to avoid crosspoint, manufacture process is consuming time longer, and, because of the position of silk screen middle longitude and parallel corresponding with on silicon chip required by grid line position because of each web plate different and different, like this, when large-scale production web plate, have to prepare a mask to each plate of throwing the net, manufacturing cost is increased.
For this reason, a kind of silk screen that the line of rabbet joint can be conveniently set still is needed.
Utility model content
In order to solve the problem arranging line of rabbet joint inconvenience in current screen printing process, the utility model provides a kind of silk screen for serigraphy newly.
Problem existing for making for current screen printing process sinual costa, the utility model provides a kind of for the silk screen of serigraphy and the preparation method of this silk screen.
First the utility model is to provide a kind of silk screen for serigraphy, comprises the silk thread of first direction and the silk thread of second direction; Wherein, first direction is provided with multiple spacer region and silk thread district, arranges, and be not provided with the silk thread of first direction in spacer region between multiple spacer region according to one or more distances; Spacer region and silk thread interval are every setting, and wherein, on first direction, spacer region width is greater than the spacing of first direction silk thread district silk thread.
Wherein, intersect between first direction and second direction, and shape at an angle, is more preferably first direction mutually vertical with second direction.
Wherein, can be identical or different between the width of described multiple spacer region, and preferably identical.
Wherein, between described silk thread district internal thread distance between centers of tracks and can be identical or different between each silk thread district silk thread spacing, and preferably identical, and the silk thread spacing being more preferably first direction silk thread district is identical.
Wherein, the silk thread spacing in first direction silk thread district and second direction silk thread spacing can be identical or different.
In a kind of preferred embodiment of the present utility model, between the width of described spacer region and first direction silk thread district silk thread, ratio of distances constant is preferably (1.2-5) ︰ 1, be more preferably that (1.3-4.7) ︰ 1, as 1.5 ︰ 1,1.8 ︰ 1,2.0 ︰ 1,2.2 ︰ 1,2.5 ︰ 1,2.7 ︰ 1,3.0 ︰ 1,2.3 ︰ 1,3.5 ︰ 1,4.0:1,4.5:1.4.7:1.
In a kind of preferred embodiment of the present utility model, the order number of described first direction silk thread district net is preferably 80-700 order (wherein, so-called " order number ", according to the custom of industry, refer to the radical of the silk thread in per inch silk screen), be more preferably 200-650 order, as 220 orders, 250 orders, 280 orders, 300 orders, 330 orders, 350 orders, 380 orders, 400 orders, 480 orders, 500 orders, 540 orders, 580 orders, 600 orders, 640 orders.
In a kind of preferred embodiment of the present utility model, in described first direction silk thread district, silk thread spacing is preferably 15-150 μm, be more preferably 20-120 μm, be more preferably 30-100 μm, as 40 μm, 45 μm, 50 μm, 55 μm, 60 μm, 65 μm, 70 μm, 75 μm, 80 μm, 85 μm, 90 μm, 95 μm.
In a kind of preferred embodiment of the present utility model, described wire diameter is preferably 10-30 μm, is more preferably 12-30 μm, is more preferably 13-25 μm, as 15 μm, 18 μm, 20 μm, 22 μm, 23 μm.
In more preferred embodiment of the present utility model, wire diameter × the b in the spacing × a+ first direction silk thread district of spacer region width=first direction silk thread district silk thread, wherein, a is preferably 1.2-5, be more preferably 1.2-4, be more preferably 1.3-3.7 as 1.5,1.8,2.0,2.2,2.5,2.7,3.0,2.3,3.5; Wherein b is preferably 0-4, is more preferably 0-2, is more preferably 1-2.
In a kind of preferred embodiment of the present utility model, wherein the spacing of any two adjacent spacer regions is 1.0mm-2.0mm.Be more preferably 1.2mm-1.8mm, be more preferably 1.3mm-1.7mm, as 1.35mm, 1.40mm, 1.47mm, 1.5mm, 1.62mm, 1.68mm.Multiple spacer region is more preferably spaced set.
Silk thread described in the utility model can be stainless steel silk thread, also can be other tinsels, but is preferably stainless steel silk thread.
In the utility model foregoing, second direction silk thread can be that spaced set may not be spaced set.And the silk thread spacing in second direction silk thread spacing and first direction silk thread district can be identical or different.
In the utility model foregoing, described silk thread spacing refers to the distance between silk thread opposite edges.
The silk screen that the utility model is above-mentioned, by arranging wider spacer region in silk screen district according to preset distance, before photoetching, according to this preset distance, the position of each line of rabbet joint figure can be set in advance on mask plate, before exposure, directly overlayed by mask plate on silk screen, photoetching is carried out and development treatment in the position making the line of rabbet joint on mask correspond to corresponding interval district on silk screen.Thus before solving photoetching, mask is arranged the problem of inconvenience during preparation vessel line graph position, significantly improve the efficiency making the line of rabbet joint in the web plate for fields such as solar cell manufactures, simultaneously, because preset the position of spacer region when silk screen is weaved, so just can the position of previously prepared line of rabbet joint figure on mask, just achieve the method that different web plate can use same mask, thus just reduce the manufacturing cost of web plate.
Accompanying drawing explanation
Fig. 1 is that in a kind of prior art, structural representation faced by web plate;
Fig. 2 is web plate side-looking structural representation described in Fig. 1;
Fig. 3 is that in another kind of prior art, structural representation faced by web plate;
Fig. 4 is web plate side-looking structural representation described in Fig. 3;
Fig. 5 is that in a kind of embodiment of the utility model, structural representation faced by silk screen;
Fig. 6 is that structural representation faced by the web plate containing the utility model silk screen.
Detailed description of the invention
With reference to Fig. 5-Fig. 6, the utility model is used for the silk screen 1 of serigraphy, and comprise warp 11 and parallel 12, warp 11 direction is mutually vertical with parallel 12 direction.
In warp 11 direction, be provided with spacer region 13 and silk screen district 14, wherein, spacer region 13 and interval, silk screen district 14 are arranged.Wherein, in spacer region 13, be not provided with any warp 11, only have parallel 12 to pass.
In the present embodiment, in warp direction silk screen district 14, silk thread is spaced apart 80 μm, and wire diameter is 20 μm, and spacer region width is 180 μm.
Embodiment 1
When weaving silk screen described in the utility model, first the location-plate processed is provided, weave location-plate used in silk screen process at present and be provided with strict perforation of equidistantly arranging in a row, the pitch of holes of this row of perforations determines the order number weaving the screen cloth come. and stainless steel silk thread is passed in perforation, after tension, forms warp 11.Then adopt weaving process to be interted by parallel 12 and wherein form silk screen.In the utility model, for Fig. 5, every three warps 11, vacate a perforation, do not penetrate silk thread, thus form wider spacer region 13, described three warps form silk thread district 14.Result in formation of the spacer region 13 and spaced silk thread district 14 that arrange according to fixed range.
In order to produce the line of rabbet joint 2 on web plate, before carrying out photoetching, light-sensitive emulsion is coated on silk screen, spacer region 13 manufactured by the utility model arranges according to fixed range, therefore, before the making line of rabbet joint 2, the position of the figure preparing the line of rabbet joint 2 can be pre-set according to this fixed range on mask plate.Before exposure, mask plate is covered on web plate, under microscopic visualization, place corresponding with corresponding spacer region 13 for the figure of one of them line of rabbet joint, the corresponding relation between multiple line of rabbet joint figure and spacer region on mask plate can be guaranteed.Then carry out photoetching and form the line of rabbet joint 2.
Embodiment 2
When weaving silk screen described in the utility model, first providing the location-plate processed, location-plate arranges perforation, comparatively large in precalculated position perforation spacings, other regional perforation spacing are less, passed by line in hole, form warp 11 after tension.The region that perforation pitch of holes is larger forms spacer region 13, and the region that perforation spacings is less forms silk thread district 14.Then adopt weaving process to be interted by parallel 12 and wherein form silk screen.
In order to produce the line of rabbet joint 2 on web plate, before carrying out photoetching, light-sensitive emulsion being coated on silk screen and making web plate.Because spacer region 13 is arranged according to precalculated position, therefore, corresponding, the graph position preparing the line of rabbet joint 2 can be produced in advance on mask plate according to this precalculated position, under microscopic visualization, mask plate is covered on web plate, place corresponding with corresponding spacer region 13 for the figure of one of them line of rabbet joint, the corresponding relation between multiple line of rabbet joint figure and spacer region on mask plate can be guaranteed.Then carry out photoetching and form the line of rabbet joint 2.
Be described in detail specific embodiment of the utility model above, but it is as example, the utility model is not restricted to specific embodiment described above.To those skilled in the art, any equivalent modifications that this utility model is carried out and substituting also all among category of the present utility model.Therefore, not departing from the equalization conversion and amendment done under spirit and scope of the present utility model, all should be encompassed in scope of the present utility model.
Claims (9)
1. for a silk screen for serigraphy, it is characterized in that, comprise the silk thread of first direction and the silk thread of second direction; Wherein, first direction is provided with multiple spacer region and silk thread district, arranges, and be not provided with the silk thread of first direction in spacer region between multiple spacer region according to one or more distances; Spacer region and silk thread interval are every setting, and wherein, on first direction, spacer region width is greater than the spacing of first direction silk thread district silk thread; The distance of adjacent two spacer regions is 1.0mm-2.0mm.
2. silk screen according to claim 1, is characterized in that, mutually vertical between first direction and second direction.
3. silk screen according to claim 1, is characterized in that, in described first direction silk thread district, silk thread spacing is 15-150 μm.
4. silk screen according to claim 1, is characterized in that, the order number of described first direction silk thread district net is 80-700 order.
5. according to the silk screen in claim 1-4 described in any one, it is characterized in that, between described spacer region width and first direction silk thread district silk thread, ratio of distances constant is (1.2-5) ︰ 1.
6. according to the silk screen in claim 1-4 described in any one, it is characterized in that, the silk screen spacing in described first direction silk thread district is identical.
7. silk screen according to claim 1, is characterized in that, the wire diameter × b in the spacing × a+ first direction silk thread district of spacer region width=first direction silk thread district silk thread, wherein, a is 1.2-5, and wherein b is 0-4.
8. the silk screen according to claim 1 or 7, is characterized in that, described wire diameter is 10-30 μm.
9. silk screen according to claim 1, is characterized in that, described silk thread is stainless steel silk thread.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520646309.8U CN205009733U (en) | 2015-08-25 | 2015-08-25 | A silk screen for screen printing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520646309.8U CN205009733U (en) | 2015-08-25 | 2015-08-25 | A silk screen for screen printing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205009733U true CN205009733U (en) | 2016-02-03 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520646309.8U Expired - Fee Related CN205009733U (en) | 2015-08-25 | 2015-08-25 | A silk screen for screen printing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205009733U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106476417A (en) * | 2015-08-25 | 2017-03-08 | 贾云涛 | A kind of silk screen for serigraphy and preparation method thereof |
| CN108608724A (en) * | 2016-12-09 | 2018-10-02 | 常州三立精图光电有限公司 | It is a kind of without net knot version design method |
-
2015
- 2015-08-25 CN CN201520646309.8U patent/CN205009733U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106476417A (en) * | 2015-08-25 | 2017-03-08 | 贾云涛 | A kind of silk screen for serigraphy and preparation method thereof |
| CN106476417B (en) * | 2015-08-25 | 2019-08-23 | 贾云涛 | A method of production is used for the silk screen of silk-screen printing |
| CN108608724A (en) * | 2016-12-09 | 2018-10-02 | 常州三立精图光电有限公司 | It is a kind of without net knot version design method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Changzhou Sanli JingTu Photoelectric Co., Ltd. Assignor: Jia Yuntao Contract record no.: 2016320000188 Denomination of utility model: A kind of silk screen for serigraphy and preparation method thereof Granted publication date: 20160203 License type: Exclusive License Record date: 20160913 |
|
| LICC | Enforcement, change and cancellation of record of contracts on the licence for exploitation of a patent or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20170306 Address after: 213164 Fengxiang Road, Wujin hi tech Industrial Development Zone, Jiangsu, China, No. 7, No. Patentee after: Changzhou Sanli JingTu Photoelectric Co., Ltd. Address before: 100085 Beijing, West Road, song Fu Park, building No. 3, building No. 4, No. 301, No. Patentee before: Jia Yuntao |
|
| TR01 | Transfer of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160203 Termination date: 20190825 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |