CN204414536U - 一种微纳多层复合产品制备装置 - Google Patents
一种微纳多层复合产品制备装置 Download PDFInfo
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- CN204414536U CN204414536U CN201420055079.3U CN201420055079U CN204414536U CN 204414536 U CN204414536 U CN 204414536U CN 201420055079 U CN201420055079 U CN 201420055079U CN 204414536 U CN204414536 U CN 204414536U
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CN201420055079.3U CN204414536U (zh) | 2014-01-27 | 2014-01-27 | 一种微纳多层复合产品制备装置 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN106353841A (zh) * | 2016-11-16 | 2017-01-25 | 北京化工大学 | 熔体微积分模内层叠制备光子晶体的方法 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN106353841A (zh) * | 2016-11-16 | 2017-01-25 | 北京化工大学 | 熔体微积分模内层叠制备光子晶体的方法 |
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Address after: 100075 Beijing city Fengtai District South Sanhuan Road Sheng B room 703 days Patentee after: AILIWENSEN (BEIJING) Co.,Ltd. Address before: 100075 A318 building, building 78, Shazikou Road, Chongwen District, Beijing, China Patentee before: AILIWENSEN (BEIJING) Co.,Ltd. |
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C41 | Transfer of patent application or patent right or utility model | ||
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Effective date of registration: 20160527 Address after: 100000 Beijing city Fengtai District South Sanhuan Road Tianchuang mansion 8 unit 102 room Patentee after: Yang Wenshuang Address before: 100075 Beijing city Fengtai District South Sanhuan Road Sheng B room 703 days Patentee before: AILIWENSEN (BEIJING) Co.,Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150624 Termination date: 20220127 |
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CF01 | Termination of patent right due to non-payment of annual fee |