CN204353650U - Optical focus structure and laser process equipment - Google Patents
Optical focus structure and laser process equipment Download PDFInfo
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- CN204353650U CN204353650U CN201420770246.2U CN201420770246U CN204353650U CN 204353650 U CN204353650 U CN 204353650U CN 201420770246 U CN201420770246 U CN 201420770246U CN 204353650 U CN204353650 U CN 204353650U
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- 230000003287 optical effect Effects 0.000 title claims abstract description 44
- 238000000034 method Methods 0.000 title claims abstract description 21
- 230000008569 process Effects 0.000 title claims abstract description 21
- 230000005540 biological transmission Effects 0.000 claims abstract description 8
- 230000011514 reflex Effects 0.000 claims abstract description 5
- 230000007246 mechanism Effects 0.000 claims description 14
- 239000004606 Fillers/Extenders Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004447 accommodation reflex Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
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Abstract
The utility model relates to a kind of optical focus structure and laser process equipment.Described optical focus structure comprises the speculum that the transmission direction along laser beam sets gradually, paraboloidal mirror and ellipsoidal mirror, described speculum is arranged rotationally and the incident direction of relative laser bundle tilts, reflex on described paraboloidal mirror to make laser beam along the direction of the symmetry axis being parallel to described paraboloidal mirror, the contiguous described speculum of described paraboloidal mirror arranges and its opening deviates from described speculum, the outer surface of described paraboloidal mirror is the first reflecting surface, the inner surface of described ellipsoidal mirror is the second reflecting surface, described second reflecting surface is towards described speculum and described paraboloidal mirror, one of them focus of the elliptic contour of described ellipsoidal mirror overlaps with the focus of described paraboloidal mirror.By adopting described optical focus structure, the stability of layout of described laser process equipment is higher.
Description
Technical field
The utility model relates to a kind of optical texture, particularly relates to a kind of optical focus structure and adopts the laser process equipment of this optical focus structure.
Background technology
Laser, due to the advantage of its high brightness, high directivity, high monochromaticity and high coherence, has been widely used in the importance of the national products such as scientific research, national defence, industry.The light path system of general laser scanning manufacturing equipment mainly contains three kinds of modes: fixed light path, flight light path, half flight light path.The laser scanning manufacturing equipment of these three kinds of modes generally comprises: the laser instrument, collimator and extender mirror, miter angle speculum, two-dimensional scanning mirrors and the condenser lens (i.e. field flattening lens or telecentric lens) that set gradually along optical path direction.At present, generally laser instrument and collimator and extender mirror integrated to form LASER Light Source, the laser beam that laser instrument produces is expanded by collimator and extender mirror, reduce the angle of divergence with the diameter of expansion of laser light bundle simultaneously, thus obtain approximately parallel laser beam, then adopt a slice or multi-disc miter angle anti-mirror of establishing that laser beam reflection is entered two-dimensional scanning mirrors.Laser beam reflection is imported condenser lens and focuses on by two-dimensional scanning mirrors, thus by laser beam converge on material to be processed, carries out laser scanning manufacturing.Two-dimensional scanning mirrors can control the direction, translational speed etc. of laser beam, thus the focused spot controlling laser beam moves and scans on material to be processed.Laser beam is mobile fast makes surface portion generating gasification or the liquefaction of rapidoprint to scan material surface to be processed, then adopts certain way to gasify or liquefaction portion removing.
In use, the laser beam that produced by LASER Light Source is needed to overlap with the central axial alignment of two-dimensional scanning mirrors exactly.But the structure of LASER Light Source and two-dimensional scanning mirrors is all comparatively complicated, and size is comparatively large, and heavier-weight, so the optical axis adjustment being difficult to laser beam optical axis and the two-dimensional scanning mirrors sent by LASER Light Source overlaps.For this reason, generally need to arrange multi-disc miter angle speculum, cooperative mechanical five times regualting frame is to adjust the position of LASER Light Source and two bit scan galvanometers simultaneously.But the adjustment process of mechanical five times regualting frame is comparatively complicated, and its stability is not high.In addition, through the reflection of repeatedly miter angle speculum, the energy loss of laser beam is serious, also makes the portion of energy of miter angle mirror absorption laser beam cause the thermal deformation of self, thus affects light path resistance to overturning.
Utility model content
Based on this, be necessary the optical focus structure providing a kind of stability of layout higher and the laser process equipment adopting this optical focus structure.
A kind of optical focus structure, for in laser process equipment, comprise the speculum that the transmission direction along laser beam sets gradually, paraboloidal mirror and ellipsoidal mirror, described speculum is arranged rotationally and the incident direction of relative laser bundle tilts, reflex on described paraboloidal mirror to make laser beam along the direction of the symmetry axis being parallel to described paraboloidal mirror, the contiguous described speculum of described paraboloidal mirror arranges and its opening deviates from described speculum, the outer surface of described paraboloidal mirror is the first reflecting surface, the inner surface of described ellipsoidal mirror is the second reflecting surface, described second reflecting surface is towards described speculum and described paraboloidal mirror, one of them focus of the elliptic contour of described ellipsoidal mirror overlaps with the focus of described paraboloidal mirror.
Wherein in an embodiment, described paraboloidal mirror and described ellipsoidal mirror one-body molded, the major axis of the elliptic contour of described ellipsoidal mirror is parallel with the symmetry axis of described paraboloidal mirror or vertical.
Wherein in an embodiment, described paraboloidal mirror and described ellipsoidal mirror one-body molded, the major axis of the elliptic contour of described ellipsoidal mirror and the symmetry axis oblique of described paraboloidal mirror.
Wherein in an embodiment, the outer surface of described paraboloidal mirror is provided with reflective coating to form described first reflecting surface, and the inner surface of described ellipsoidal mirror is provided with reflective coating to form described second reflecting surface.
Wherein in an embodiment, described speculum is between two focuses of described ellipsoidal mirror.
A kind of laser process equipment, comprise laser instrument that the transmission direction along laser beam sets gradually, collimator and extender mirror, optical focus structure as above described in any one, and laser scanning mechanism, the laser beam transmitted by described collimator and extender mirror accepted by the speculum of described optical focus structure, described laser scanning mechanism is arranged between two focuses of described ellipsoidal mirror, makes laser beam converge in the position of presetting to carry out laser scanning manufacturing.
Wherein in an embodiment, described laser scanning mechanism is two-dimensional scanning mirrors, and it comprises X scanning galvanometer arranged in parallel and Y scanning galvanometer.
For above-mentioned laser process equipment, when incoming laser beam advances or retrogressing along incident direction relative to speculum, or when carrying out biased relative to its incident direction, all without the need to carrying out any adjustment to laser process equipment, the laser beam leaving ellipsoidal mirror just can be made to keep identical focal position, ensure that the stability of light path.
Accompanying drawing explanation
By the more specifically explanation of the preferred embodiment of the present utility model shown in accompanying drawing, above-mentioned and other object of the present utility model, Characteristics and advantages will become more clear.Reference numeral identical in whole accompanying drawing indicates identical part, and does not deliberately draw accompanying drawing by actual size equal proportion convergent-divergent, focuses on purport of the present utility model is shown.
Fig. 1 is the schematic diagram after the optical focus structure removing speculum in an embodiment;
Fig. 2 is for the structure of optical focus shown in Fig. 1 is along the sectional view of II-II line;
Fig. 3 is applied to the schematic diagram in laser process equipment for the structure of optical focus shown in Fig. 1;
Fig. 4 is the optical focus structural representation in another embodiment;
Fig. 5 is another view of the structure of optical focus shown in Fig. 4;
The view again that Fig. 6 is the structure of optical focus shown in Fig. 4;
Fig. 7 is again the optical focus structural representation in an embodiment.
Detailed description of the invention
For enabling above-mentioned purpose of the present utility model, feature and advantage become apparent more, are described in detail detailed description of the invention of the present utility model below in conjunction with accompanying drawing.Set forth a lot of detail in the following description so that fully understand the utility model.But the utility model can be much different from alternate manner described here to implement, those skilled in the art can when doing similar improvement without prejudice to when the utility model intension, and therefore the utility model is by the restriction of following public concrete enforcement.
Refer to Fig. 1 to Fig. 3, the laser process equipment of an embodiment, comprise laser instrument that the transmission direction along laser beam 105 sets gradually, collimator and extender mirror, optical focus structure 100 and laser scanning mechanism 200 (see Fig. 3).Laser instrument produces laser beam 105, expands laser beam 105 via collimator and extender mirror.After this laser beam 105 arrives at workpiece via after optical focus structure 100 and laser scanning mechanism 200, to carry out scanning machining to workpiece.Optical focus structure 100 pairs of laser beams 105 produce focussing force, and laser beam 105 is focused on workpiece.Laser scanning mechanism 200 controls the parameter such as direction, translational speed of laser beam 105, thus the focused spot controlling laser beam 105 is mobile to scan on workpiece.In the present embodiment, the wave-length coverage of incoming laser beam 105 is 200 ~ 12000 nanometers.
Optical focus structure 100 comprises speculum 10, paraboloidal mirror 30 and the ellipsoidal mirror 50 that the transmission direction along laser beam 105 sets gradually.Speculum 10 is accepted the laser beam 105 that transmits from collimator and extender mirror and is reflexed to paraboloidal mirror 30, and laser beam 105 reflexes on ellipsoidal mirror 50 by paraboloidal mirror 30, and then reflexes to laser scanning mechanism 200.
Speculum 10 is level crossing and the transmission direction of relative laser bundle 105 is tilted, to be reflexed on paraboloidal mirror 30 by laser beam 105.In the present embodiment, laser beam 105 arrives on speculum 10 vertically downward, and speculum 10 tilts upward setting.Paraboloidal mirror 30 near reflection mirror 10 is arranged, and its opening deviates from speculum 10.The symmetry axis 31 relative reflection mirror 10 of paraboloidal mirror 30 is obliquely installed, and is parallel to the laser beam 105 that speculum 10 reflects back.The outer surface 33 of paraboloidal mirror 30 is provided with high reverse--bias rete to form the first reflecting surface, for laser beam 105 is reflexed to ellipsoidal mirror 50.Ellipsoidal mirror 50 is towards speculum 10 and paraboloidal mirror 30, and its opening inner surface 51 is provided with high reverse--bias rete to form the second reflecting surface, for laser beam 105 is reflexed to laser scanning mechanism 200.The elliptic contour major axis 53 of ellipsoidal mirror 50 overlaps with the symmetry axis 31 of paraboloidal mirror 30, and the elliptic contour of ellipsoidal mirror 50 focus 55 overlaps with the focus 35 of paraboloidal mirror 30.Paraboloidal mirror 30 is one-body molded by metal material with ellipsoidal mirror 30.In the present embodiment, the opening direction of paraboloidal mirror 30 tilts upward, identical with the incline direction of speculum 10, and another focus 57 of the elliptic contour of ellipsoidal mirror 50 is in the side of speculum 10 away from paraboloidal mirror 30, namely speculum 10 is between two focuses 55,57 of the elliptic contour of ellipsoidal mirror 50.
According to the reflection law in paraboloidal characteristic and optics, be parallel to the laser beam 105 that symmetry axis 31 incides paraboloidal mirror 30, extension line after the outer surface 33 of paraboloidal mirror 30 reflects is inherently by the focus 35 of paraboloidal mirror 30, namely focus 35 is the virtual convergent point of the laser beam 105 after reflection, and the laser beam 105 after reflection sends as by focus 35.Simultaneously, according to the reflection law in the fundamental property of ellipsoid and optics, the laser beam 105 sent by the focus 55 (being also the focus 35 of paraboloidal mirror 30) of the elliptic contour of ellipsoidal mirror 50 simultaneously must converge at another focus 57 of the elliptic contour of ellipsoidal mirror 50 after ellipsoidal mirror 50 reflects.Namely laser beam 105 is via the focus 57 converging at ellipsoidal mirror 50 after the reflection of paraboloidal mirror 30 and ellipsoidal mirror 50.In the present embodiment, after laser beam 105 reflects via ellipsoidal mirror 50, its optical axis is perpendicular to the optical axis of the laser beam 105 be incident on speculum 10.
The contiguous ellipsoidal mirror 50 of laser scanning mechanism 200 is arranged, and is arranged between the focus 55 of ellipsoidal mirror 50 and focus 57.In the present embodiment, laser scanning mechanism 200 is two-dimensional scanning mirrors, and it comprises X scanning galvanometer arranged in parallel and Y scanning galvanometer.Laser scanning mechanism 200 makes laser beam 105 change direction, departs from the focus 57 of ellipsoidal mirror 50, thus converges at default position to carry out laser scanning manufacturing.
Refer to Fig. 4, the optical focus structure 100 ' of another embodiment, its structure is equivalent to optical focus structure 100 ' dextrorotation and turn 90 degrees, speculum 10 ' and incoming laser beam 105 is made to be positioned between paraboloidal mirror 30 ' and ellipsoidal mirror 50 ', incoming laser beam 105 is incident to speculum 10 ' vertically downward, after the reflection of paraboloidal mirror 30 ' and ellipsoidal mirror 50 ', laser beam 105 along direction vertically downward away from and ellipsoidal mirror 50 ', namely be incident to the laser beam 105 of speculum 10 ' and the laser beam 105 leaving ellipsoidal mirror 50 ', its optical axis is parallel.
Refer to Fig. 5 and Fig. 6, by accommodation reflex mirror 10 ', the laser beam 105 being incident to speculum 10 ' can be made contrary or vertical with the optical axis direction of the laser beam 105 leaving ellipsoidal mirror 50 '.
Refer to Fig. 7, in another embodiment, the elliptic contour major axis 71 of ellipsoidal mirror 70 is vertical with the symmetry axis 81 of paraboloidal mirror 80, and the elliptic contour of ellipsoidal mirror 70 focus 75 overlaps with the focus 85 of paraboloidal mirror 80.Paraboloidal mirror 80 is one-body molded by metal material with ellipsoidal mirror 70.
Laser process equipment of the present utility model, to advance relative to speculum 10 along the incident direction of laser beam 105 when incident laser source or retreat, or when carrying out biased to the incident direction of laser beam 105, all without the need to carrying out any adjustment to laser process equipment, the laser beam 105 leaving ellipsoidal mirror 50 just can be made to keep identical focal position, ensure that the stability of light path.In addition, when the incident direction of incoming laser beam 105 and position all change, only need the position and the angle that adjust speculum 10, laser beam 105 is made to be incident on paraboloidal mirror 30 along the direction parallel with symmetry axis 31, the laser beam 105 leaving ellipsoidal mirror 50 can be made to keep identical focal position, make the optical path adjusting of laser beam 105 comparatively easy, reduce maintenance cost.
This laser process equipment owing to have employed above-mentioned optical focus structure 100, can reduce the f-theta lens in order to focus on or telecentric lens, thus decrease its manufacturing cost.
Because paraboloidal mirror 30 and ellipsoidal mirror 50 adopt same material one-body molded, the installation and debugging of relative position and relative angle etc. between the two can be avoided, reduce manufacturing cost.
When optical focus structure 100 of the present utility model is applied in the laser process equipment of fixed light path, it can improve stability of layout, improves the stability of laser scanning manufacturing quality, improves light path debugging efficiency, reduce maintenance cost, be especially suitable for being applied in flight light path and half flight light path.Laser process equipment only need be constant in its direction of maintenance always maintaining incoming laser beam 105, do not need to maintain incoming laser beam 105 conllinear (namely maintain direction and position all constant) all the time, thus the optical focus structure solving other types needs to maintain a difficult problem for its direction conllinear all the time.
Be appreciated that, the elliptic contour major axis 53 of ellipsoidal mirror 50 might not be parallel or vertical with the symmetry axis 31 of paraboloidal mirror 30, to make the elliptic contour of ellipsoidal mirror 50 focus 55 overlap with the focus 35 of paraboloidal mirror 30, and ellipsoidal mirror 50 towards paraboloidal mirror 30 to accept the laser beam 105 that paraboloidal mirror 30 reflects back, namely ellipsoidal mirror 50 elliptic contour major axis 53 can with symmetry axis 31 oblique of paraboloidal mirror 30.
The above embodiment only have expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (7)
1. an optical focus structure, for in laser process equipment, it is characterized in that, comprise the speculum that the transmission direction along laser beam sets gradually, paraboloidal mirror and ellipsoidal mirror, described speculum is arranged rotationally and the incident direction of relative laser bundle tilts, reflex on described paraboloidal mirror to make laser beam along the direction of the symmetry axis being parallel to described paraboloidal mirror, the contiguous described speculum of described paraboloidal mirror arranges and its opening deviates from described speculum, the outer surface of described paraboloidal mirror is the first reflecting surface, the inner surface of described ellipsoidal mirror is the second reflecting surface, described second reflecting surface is towards described speculum and described paraboloidal mirror, one of them focus of the elliptic contour of described ellipsoidal mirror overlaps with the focus of described paraboloidal mirror.
2. optical focus structure as claimed in claim 1, is characterized in that, described paraboloidal mirror and described ellipsoidal mirror one-body molded, the major axis of the elliptic contour of described ellipsoidal mirror is parallel with the symmetry axis of described paraboloidal mirror or vertical.
3. optical focus structure as claimed in claim 1, is characterized in that, described paraboloidal mirror and described ellipsoidal mirror one-body molded, the major axis of the elliptic contour of described ellipsoidal mirror and the symmetry axis oblique of described paraboloidal mirror.
4. optical focus structure as claimed in claim 1, it is characterized in that, the outer surface of described paraboloidal mirror is provided with reflective coating to form described first reflecting surface, and the inner surface of described ellipsoidal mirror is provided with reflective coating to form described second reflecting surface.
5. optical focus structure as claimed in claim 1, is characterized in that: described speculum is between two focuses of described ellipsoidal mirror.
6. a laser process equipment, it is characterized in that, comprise laser instrument that the transmission direction along laser beam sets gradually, collimator and extender mirror, optical focus structure according to any one of Claims 1 to 5, and laser scanning mechanism, the laser beam transmitted by described collimator and extender mirror accepted by the speculum of described optical focus structure, described laser scanning mechanism is arranged between two focuses of described ellipsoidal mirror, makes laser beam converge in the position of presetting to carry out laser scanning manufacturing.
7. laser process equipment as claimed in claim 6, it is characterized in that, described laser scanning mechanism is two-dimensional scanning mirrors, and it comprises X scanning galvanometer arranged in parallel and Y scanning galvanometer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420770246.2U CN204353650U (en) | 2014-12-09 | 2014-12-09 | Optical focus structure and laser process equipment |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201420770246.2U CN204353650U (en) | 2014-12-09 | 2014-12-09 | Optical focus structure and laser process equipment |
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| CN204353650U true CN204353650U (en) | 2015-05-27 |
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| CN201420770246.2U Expired - Fee Related CN204353650U (en) | 2014-12-09 | 2014-12-09 | Optical focus structure and laser process equipment |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105022236A (en) * | 2015-08-07 | 2015-11-04 | 长沙青波光电科技有限公司 | Ultraviolet laser exposure system |
| CN105904087A (en) * | 2016-06-26 | 2016-08-31 | 上海嘉强自动化技术有限公司 | Reflection type high-power double-metal-galvanometer scanning system |
| CN111299820A (en) * | 2020-03-12 | 2020-06-19 | 中国航空制造技术研究院 | Reflection type laser shock peening head |
| CN116909014A (en) * | 2023-09-11 | 2023-10-20 | 之江实验室 | Elliptic surface-based galvanometer plane scanning device and scanning method |
-
2014
- 2014-12-09 CN CN201420770246.2U patent/CN204353650U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105022236A (en) * | 2015-08-07 | 2015-11-04 | 长沙青波光电科技有限公司 | Ultraviolet laser exposure system |
| CN105904087A (en) * | 2016-06-26 | 2016-08-31 | 上海嘉强自动化技术有限公司 | Reflection type high-power double-metal-galvanometer scanning system |
| CN111299820A (en) * | 2020-03-12 | 2020-06-19 | 中国航空制造技术研究院 | Reflection type laser shock peening head |
| CN111299820B (en) * | 2020-03-12 | 2021-09-10 | 中国航空制造技术研究院 | Reflection type laser shock peening head |
| CN116909014A (en) * | 2023-09-11 | 2023-10-20 | 之江实验室 | Elliptic surface-based galvanometer plane scanning device and scanning method |
| CN116909014B (en) * | 2023-09-11 | 2023-12-01 | 之江实验室 | Elliptic surface-based galvanometer plane scanning device and scanning method |
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| CF01 | Termination of patent right due to non-payment of annual fee |