CN204165736U - A kind of wave aberration high precision measuring device for object lens imaging system - Google Patents
A kind of wave aberration high precision measuring device for object lens imaging system Download PDFInfo
- Publication number
- CN204165736U CN204165736U CN201420518689.2U CN201420518689U CN204165736U CN 204165736 U CN204165736 U CN 204165736U CN 201420518689 U CN201420518689 U CN 201420518689U CN 204165736 U CN204165736 U CN 204165736U
- Authority
- CN
- China
- Prior art keywords
- imaging system
- object lens
- wave aberration
- lens imaging
- spectroscope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
The utility model discloses a kind of wave aberration high precision measuring device of object lens imaging system, mainly comprise light source 1, object lens imaging system 10 to be measured, auxiliary optical component 2 ~ 5, Wavefront sensor 6 control system 7 ~ 8 and data acquisition processing system 9.The light sent from light source 1 is successively after collimating mirror 2, spectroscope 3, focus lamp 4, object lens imaging system 10 to be measured, incide standard spherical reflector 5 to reflect and former road is back to spectroscope 3, a part is transmitted through in Wavefront sensor 6, measures the wave aberration W1 entrained by reflected light.Shifted out by determinand mirror system 10 by control module, the position of adjustment standard spherical reflector 5, measures the wave aberration W2 entrained by reflected light again.Calculated the size of the wave aberration of determinand mirror system by W1-W2, the calibration measurements of effective finishing device systematic error is also corrected, and improves wave aberration measuring accuracy.In the utility model, this device does not need high-precision standard sources, reduces cost, and system architecture is compact, has advantages such as being simply easy to realization.
Description
Technical field
The utility model relates to field of optical measuring technologies, a specifically wave aberration high precision measuring device for object lens imaging system, particularly a kind ofly can to change, can add as required in measurement mechanism the wave aberration high precision measuring device of secondary optics for light source.
Background technology
Wave aberration measurement is usually used in the field such as adaptive optics, optical detection evaluation.Especially, in the evaluation of optical system alignment and object lens image quality, the measurement of wave aberration is an important means.
Hartmann sensor or shearing interferometer is adopted to be a kind of widely used wave aberration measurement mechanisms.Traditional Hartmann wave front sensor is made up of microlens array, transfer lens, photodetector and data processing software.Incident light, by microlens array and transfer lens, makes light beam conversion imaging to photodetector, exports data to data processing software by photodetector, finally by the optical wavefront of certain algorithm reduction optical system.A kind of Hartmann wave front sensor as disclosed in Chinese patent application prospectus (application number 98112210.8, publication number CN1245904A).At present around the measuring accuracy how improving Wavefront sensor, it is also proposed many methods, as Chinese patent application prospectus (application number 02123756.5, publication number CN1212508C) a kind of dynamic range of proposing and the adjustable Hartmann wave front sensor of measuring accuracy, and a kind of wavefront measuring method based on Hartmann wave front sensor that Chinese patent application prospectus (application number 201210198965.7, publication number CN102735348A) proposes.But these methods are all the accuracy of detection around how improving Wavefront sensor itself, cannot eliminate systematic error in wavefront measurement system.
For the measurement of objective wave aberration, adopt wave aberration measured by Wavefront sensor be incident to Wavefront sensor before the wave aberration of whole optical system, this is wherein except the wave aberration of object lens, further comprises the auxiliary wave aberration of optical element and the wave aberration of transfer lens in the entrained wave aberration of light source itself, optical system.Due to the existence of these systematic errors, the precision of Wavefront sensor objective lens wave aberration is caused greatly to reduce.The utility model carries out objective wave aberration measurement for employing Wavefront sensor, there is provided a kind of and can carry out systematic error demarcation and the wave aberration measurement mechanism of error calibration process object lens imaging system easily, reduce the requirement of measuring system to light source and auxiliary optical component, thus can reduce the cost of detection system, and improve objective wave aberration measuring accuracy.
Summary of the invention
The purpose of this utility model be to provide a kind of device simple, debug easily non-interfering method to realize the high precision test of the wave aberration of object lens imaging system.This measurement mechanism does not require on theory of light sources, and general light source can meet the demands.Meanwhile, the systematic error measuring process of this measurement mechanism is simple, be easy to realize, and makes measuring accuracy can reach the limit of Wavefront sensor measuring accuracy.
In order to achieve the above object, the technical scheme that the utility model adopts is:
A kind of wave aberration pick-up unit of object lens imaging system, its feature is, comprise: light source, to send collimating mirror, spectroscope, focus lamp and standard spherical reflector that light direction places successively along this light source, and data processing unit, the Wavefront sensor be connected respectively with this data processing unit, first accurately adjusts platform and the second precision adjusts platform;
The light that described light source sends becomes after directional light through described collimating mirror and incides described spectroscope, spectroscope is back to by being incident to described standard spherical reflector Hou Yanyuan road through described focus lamp after dichroic mirror, the spectroscope of a part described in light transmission is received by described Wavefront sensor, by described data processing unit process;
Described first accurate adjustment platform has five and regulates degree of freedom, and for regulating position and the direction of object lens imaging system to be measured, the described second accurate adjustment platform has three and regulates degree of freedom, for regulating position and the direction of described standard spherical reflector.
The imaging system that described object lens imaging system to be measured is single imaging len or is combined by multiple optical device.
Described Wavefront sensor is the knockdown Hartmann sensor by microlens array and CCD, or based on the shearing interferometer of shear interference principle.
The face shape error of described standard spherical reflector will lower than the accuracy of detection of described Wavefront sensor.
The described spectroscopical reflected light side described in Wavefront sensor placement, and optical axis same with it
The utility model has the advantage of, do not need the pointolite of standard or spherical wave as a reference, the systematic error of measurement mechanism can be removed by the mode of demarcating, and scaling scheme is simple.By two minute adjustment platforms, position is controlled, make overall system architecture simple, debug conveniently, especially the little standard spherical reflector of adjustment one is only needed can to realize the high-precision calibrating of systematic error, can the wave aberration introduced of wave aberration, light source and detector measurement that effectively secondary optics produces in correcting measuring device, and the alignment error of light path system.On the basis of this system, auxiliary optical component can be added according to actual needs, not affect the measurement of wave aberration result.
Accompanying drawing explanation
Fig. 1 is object lens imaging system wave aberration measurement mechanism measurement pattern figure;
Fig. 2 is object lens imaging system wave aberration measurement mechanism systematic error calibration mode figure;
Fig. 3 is wavefront measurement skeleton diagram;
Wherein, 1, light source; 2, collimating mirror; 3, spectroscope; 4, focus lamp; 5, standard spherical reflector; 6, Wavefront sensor; 7, the first minute adjustment platform; 8, the second minute adjustment platform; 9, data processing unit; 10, object lens imaging system to be measured.
Embodiment
In order to better understand the object of the utility model embodiment, technical scheme and advantage, below in conjunction with drawings and Examples, the utility model being further described, but protection domain of the present utility model should not limited with this.
Shown in Fig. 1 is the imaging wave aberration measurement mechanism of object lens imaging system.The light that light source 1 sends becomes directional light after collimating mirror 2, to be reflexed to after focus lamp 4 and be converted into A1 by spectroscope 3 on the focal plane of focus lamp 4.Also namely, light source 1 and collimating mirror 2, form the formation assembly of directional light.Spectroscope 3, for the transmission of the light splitting of source of parallel light and the reflected light with wave aberration information, becomes the significant components in this device.Focus lamp 4 is auxiliary optical elements, and the wave aberration had for subsidiary under the image formation state of the imaging system of a pair conjugate points is measured, and can realize the convergence of directional light, form pointolite.
A pair conjugate points A1 of object lens imaging system 10 to be measured and A2, object point A1 converges to picture point A2 after object lens imaging system 10, and then disperses.Converge position at A2 and put into standard spherical reflector 5, make picture point A2 diverging light reflect Hou Yanyuan road through standard spherical reflector 5 and return, reflected light is back to spectroscope 3 along light path always.By the first minute adjustment platform 7 and the second minute adjustment platform 8, respectively the position of object lens 10 to be measured and standard spherical reflector 5 and direction are regulated, the measurement of described imaging wave aberration can complete the wave aberration met arbitrarily under the mutual conjugate condition in position and measure, and only need meet that object point A1 overlaps with the focus of focus lamp 4, picture point A2 overlaps with the centre of sphere of standard spherical reflector 5.
Be back to the reflected light of spectroscope 3 along former road, a part of light transmission is received by Wavefront sensor 6, is finally processed by data processing unit 9 and obtains wavefront information.As shown in Figure 3, Wavefront sensor 6 is made up of microlens array and CCD Wave-front measurement process.Directional light from spectroscope 3 incides on microlens array and carries out light splitting, corresponding positional information figure (Hartmann sensor) or interferogram (shearing interferometer) is gathered by CCD, deliver in data processing unit 9 and process, obtain the wave aberration information of light beam.
Be present in any one optical element in measurement mechanism, all can introduce wave aberration.And the wave aberration that Wavefront sensor 6 collection is measured is the wave aberration of whole light path system, not only contain the wave aberration of object lens imaging system 10 to be measured, further comprises the measuring error etc. that in light path, other optical elements are introduced as collimating mirror, spectroscope, light source error and detector itself.How to extract the wave aberration of object lens imaging system to be measured, subject matter is how to remove other system error.
The removing method of systematic error as shown in Figure 2.Main thought is shifted out object lens imaging system to be measured, then carry out the measurement of primary reflection aberration, completes the measurement of other optical modules in measurement mechanism, light source and detector error.By the first minute adjustment platform 7, object lens imaging system 10 to be measured is shifted out, standard spherical reflector 5 is moved to the position that its centre of sphere overlaps with the focus of focus lamp 4 by the second minute adjustment platform 8, Wavefront sensor 6 carries out the measurement of primary reflection aberration again, namely completes the demarcation of measurement mechanism systematic error.
The systematic error correction method of object lens imaging system wave aberration measurement mechanism, comprises following steps:
(1) object lens imaging system 10 to be measured is adjusted by the first minute adjustment platform 7, its object point A1 is overlapped with the focus of focus lamp 4, adjusted the position of standard spherical reflector by the second minute adjustment platform 8, its centre of sphere is overlapped with the picture point A2 of object lens imaging system 10 to be measured.Gather spectroscope 3 transmitted light by Wavefront sensor 6, obtained the wave aberration W1 under measuring state by data processing unit 9 process;
(2) by the first minute adjustment platform 7, object lens imaging system 10 to be measured is shifted out, adjusted the position of standard spherical reflector by the second minute adjustment platform 8, its centre of sphere is overlapped with the focus of focus lamp 4.Gather spectroscope 3 transmitted light by Wavefront sensor 6, obtained the wave aberration W2 under systematic error demarcation state by data processing unit 9 process;
(3) namely completed the correction of object lens imaging system wave aberration measurement mechanism systematic error by W1-W2, the wave aberration achieving object lens imaging system 10 to be measured is measured.
For object lens imaging system 10 to be measured, different imaging conjugate points, i.e. corresponding different numerical aperture (N.A).By changing the focus lamp 4 of different focal, can realize the coupling of the different conjugate imaging of same object lens, the wave aberration realizing different conjugate imaging is measured.
About the first minute adjustment platform 7 and the second minute adjustment platform 8, wherein require that the first minute adjustment platform 7 not only has three-dimensional adjustment, also need the two-dimensional adjustment in angle simultaneously, realize the optical axis alignment of object lens imaging system 10 to be measured, and object point A1 regulates with overlapping of focus lamp 4 focus.And for module 8 part, need the picture point A2 of the centre of sphere of standard spherical reflector 5 with object lens imaging system to be measured to overlap, because standard spherical reflector 5 itself has symmetry, therefore only need the three-dimensional of locus to adjust.
In sum, the utility model provides a kind of wave aberration high precision measuring device of object lens imaging system, and the systematic error of measurement mechanism can be removed by the mode of demarcating.Controlled by the first minute adjustment platform 7 and the second minute adjustment platform 8 pairs of positions, that system architecture is simple, debug conveniently, only need the position adjusting spherical reflector 5 can realize the high-precision calibrating of systematic error, the measuring error that the error introduce entrained error of the light source 1 in system light path itself, collimating mirror 2, spectroscope 3, focus lamp 4 and wave front detector 6 error cause.Reduce the requirement of measuring system to light source, improve the precision of measuring system.
Claims (5)
1. the wave aberration pick-up unit for object lens imaging system, it is characterized in that, comprise: light source (1), to send collimating mirror (2), spectroscope (3), focus lamp (4) and standard spherical reflector (5) that light direction places successively along this light source, and data processing unit (9), the Wavefront sensor (6) be connected respectively with this data processing unit (9), first accurately adjusts platform (7) and the second precision adjusts platform (8);
The light that described light source (1) sends incides described spectroscope (3) after described collimating mirror (2) becomes directional light, be incident to described standard spherical reflector (5) Hou Yanyuan road through described focus lamp (4) after being reflected by spectroscope (3) and be back to spectroscope (3), the spectroscope (3) of a part described in light transmission is received by described Wavefront sensor (6), is finally processed by described data processing unit (9);
Described first accurate adjustment platform (7) has five and regulates degree of freedom, for regulating position and the direction of object lens imaging system (10) to be measured, described second accurate adjustment platform (8) has three and regulates degree of freedom, for regulating position and the direction of described standard spherical reflector (5).
2. the wave aberration pick-up unit for object lens imaging system according to claim 1, is characterized in that, the imaging system that described object lens imaging system (10) to be measured is single imaging len or is combined by multiple optical device.
3. the wave aberration pick-up unit for object lens imaging system according to claim 1, it is characterized in that, described Wavefront sensor (6) is the knockdown Hartmann sensor by microlens array and CCD, or based on the shearing interferometer of shear interference principle.
4. the wave aberration pick-up unit for object lens imaging system according to claim 1, is characterized in that, the described spectroscopical reflected light side described in Wavefront sensor placement, and optical axis same with it.
5. the wave aberration pick-up unit for object lens imaging system according to claim 1, is characterized in that, the face shape error of described standard spherical reflector (5) will lower than the accuracy of detection of described Wavefront sensor (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420518689.2U CN204165736U (en) | 2014-09-10 | 2014-09-10 | A kind of wave aberration high precision measuring device for object lens imaging system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420518689.2U CN204165736U (en) | 2014-09-10 | 2014-09-10 | A kind of wave aberration high precision measuring device for object lens imaging system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204165736U true CN204165736U (en) | 2015-02-18 |
Family
ID=52539414
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420518689.2U Expired - Fee Related CN204165736U (en) | 2014-09-10 | 2014-09-10 | A kind of wave aberration high precision measuring device for object lens imaging system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204165736U (en) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104236856A (en) * | 2014-09-10 | 2014-12-24 | 中国科学院上海光学精密机械研究所 | Wave aberration detection device of objective lens imaging system and system error correction method of wave aberration detection device |
| CN105388000A (en) * | 2015-12-04 | 2016-03-09 | 中国科学院长春光学精密机械与物理研究所 | Measuring method for paraxial magnification of distance-limited imaging system |
| CN108957781A (en) * | 2018-07-23 | 2018-12-07 | 中国科学院苏州生物医学工程技术研究所 | Optical lens adjustment and detection system and method |
| CN109342028A (en) * | 2018-10-17 | 2019-02-15 | 深圳奥比中光科技有限公司 | Diffraction optical element detection method and system |
| CN109884050A (en) * | 2019-01-17 | 2019-06-14 | 哈尔滨工业大学 | Based on the anaberration harmonic wave microscopic measuring method focused at a distance |
| CN110285948A (en) * | 2019-06-10 | 2019-09-27 | 北京航天计量测试技术研究所 | A kind of regression reflecting ball optics centre of sphere sighting device and its method of sight |
| CN110455420A (en) * | 2019-07-11 | 2019-11-15 | 长春理工大学 | Wavefront measuring apparatus |
| CN111122439A (en) * | 2020-01-14 | 2020-05-08 | 仪锐实业有限公司 | Device and method for detecting quality of optical lens group |
| CN112161564A (en) * | 2020-10-27 | 2021-01-01 | 龚海 | Wavefront sensing three-dimensional microscope based on structured light illumination |
| CN112747904A (en) * | 2020-12-30 | 2021-05-04 | 中国科学院长春光学精密机械与物理研究所 | Method for assembling and adjusting infrared transfer function measuring instrument |
| CN114636545A (en) * | 2022-03-01 | 2022-06-17 | 上海精积微半导体技术有限公司 | Wide-spectrum objective lens vertical axis chromatic aberration detection system and method and semiconductor device |
| CN114739636A (en) * | 2022-03-01 | 2022-07-12 | 上海精积微半导体技术有限公司 | Optical objective axial chromatic aberration detection method and system and semiconductor equipment |
| CN114964523A (en) * | 2022-05-31 | 2022-08-30 | 无锡学院 | Wavefront sensor adjusting method for active optical correction system |
| WO2023070879A1 (en) * | 2021-10-29 | 2023-05-04 | 中国科学院深圳先进技术研究院 | Wave aberration measurement system and measurement method for full camera system |
-
2014
- 2014-09-10 CN CN201420518689.2U patent/CN204165736U/en not_active Expired - Fee Related
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104236856A (en) * | 2014-09-10 | 2014-12-24 | 中国科学院上海光学精密机械研究所 | Wave aberration detection device of objective lens imaging system and system error correction method of wave aberration detection device |
| CN104236856B (en) * | 2014-09-10 | 2017-01-18 | 中国科学院上海光学精密机械研究所 | Wave aberration detection device of objective lens imaging system and system error correction method of wave aberration detection device |
| CN105388000A (en) * | 2015-12-04 | 2016-03-09 | 中国科学院长春光学精密机械与物理研究所 | Measuring method for paraxial magnification of distance-limited imaging system |
| CN105388000B (en) * | 2015-12-04 | 2018-01-05 | 中国科学院长春光学精密机械与物理研究所 | There is the measuring method of the vertical axle magnifying power of range line imaging system |
| CN108957781A (en) * | 2018-07-23 | 2018-12-07 | 中国科学院苏州生物医学工程技术研究所 | Optical lens adjustment and detection system and method |
| CN109342028A (en) * | 2018-10-17 | 2019-02-15 | 深圳奥比中光科技有限公司 | Diffraction optical element detection method and system |
| CN109884050B (en) * | 2019-01-17 | 2021-08-31 | 哈尔滨工业大学 | Aberration-eliminating harmonic microscopic measurement method based on remote focusing |
| CN109884050A (en) * | 2019-01-17 | 2019-06-14 | 哈尔滨工业大学 | Based on the anaberration harmonic wave microscopic measuring method focused at a distance |
| CN110285948A (en) * | 2019-06-10 | 2019-09-27 | 北京航天计量测试技术研究所 | A kind of regression reflecting ball optics centre of sphere sighting device and its method of sight |
| CN110455420A (en) * | 2019-07-11 | 2019-11-15 | 长春理工大学 | Wavefront measuring apparatus |
| CN110455420B (en) * | 2019-07-11 | 2021-12-07 | 长春理工大学 | Wavefront measuring device |
| CN111122439A (en) * | 2020-01-14 | 2020-05-08 | 仪锐实业有限公司 | Device and method for detecting quality of optical lens group |
| CN112161564A (en) * | 2020-10-27 | 2021-01-01 | 龚海 | Wavefront sensing three-dimensional microscope based on structured light illumination |
| CN112747904A (en) * | 2020-12-30 | 2021-05-04 | 中国科学院长春光学精密机械与物理研究所 | Method for assembling and adjusting infrared transfer function measuring instrument |
| WO2023070879A1 (en) * | 2021-10-29 | 2023-05-04 | 中国科学院深圳先进技术研究院 | Wave aberration measurement system and measurement method for full camera system |
| CN114636545A (en) * | 2022-03-01 | 2022-06-17 | 上海精积微半导体技术有限公司 | Wide-spectrum objective lens vertical axis chromatic aberration detection system and method and semiconductor device |
| CN114739636A (en) * | 2022-03-01 | 2022-07-12 | 上海精积微半导体技术有限公司 | Optical objective axial chromatic aberration detection method and system and semiconductor equipment |
| CN114964523A (en) * | 2022-05-31 | 2022-08-30 | 无锡学院 | Wavefront sensor adjusting method for active optical correction system |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN204165736U (en) | A kind of wave aberration high precision measuring device for object lens imaging system | |
| CN104236856B (en) | Wave aberration detection device of objective lens imaging system and system error correction method of wave aberration detection device | |
| CN100589780C (en) | Reflection type artificial crystal aberration Hartmann measuring instrument | |
| CN110186653B (en) | Optical axis consistency calibration and split image fixed focus adjustment device and method for non-imaging system | |
| CN104101487B (en) | Wave aberration measuring device and measuring method of optical system | |
| CN109556531B (en) | Accurate calibration system and method for point diffraction interferometer light path based on image information | |
| CN100573080C (en) | Hartmann wavefront sensor for realizing alignment function by using light splitting device and detection method thereof | |
| CN103969787A (en) | Initial assembly positioning method for four off-axis lenses | |
| KR101493451B1 (en) | Multi Optical Axies Arrange Inspection Device and Axies Arranging Method thereof | |
| CN103017681B (en) | Real time detecting method for rotary shaft symmetrically concave aspheric surfaces approximate to paraboloids | |
| CN106780391B (en) | Distortion correction algorithm for optical system of full-view three-dimensional measuring instrument | |
| CN102937421B (en) | Real-time detection method of symmetrical optical non-spherical face of rotary shaft | |
| CN105353516B (en) | Double-beam synthesis sensor for regional imaging of pupil optical axis by single detector | |
| CN104142129A (en) | Off-axis three-mirror aspheric system convex aspheric secondary mirror surface shape splicing detection method | |
| CN102607461A (en) | Method and device for measuring surface shape error of optical element at high precision | |
| CN105116515A (en) | Off-axis tri-reflector zooming optical system adjusting method | |
| CN104317030A (en) | Optical device capable of achieving quick centering assistance by means of axial chromatic aberration | |
| CN103226243B (en) | A kind of method and system correcting ADAPTIVE OPTICS SYSTEMS non-co-path error | |
| CN103234480A (en) | Rapid surface shape detection method for circular convex aspheric surfaces | |
| CN104406770A (en) | Distortion measuring apparatus of wave aberration measuring module, and distortion correction method | |
| CN108955904B (en) | Multifunctional wavefront detection device considering point-surface target | |
| CN103487929B (en) | The method of adjustment of grenz ray and the compound telescope optic axis of extreme ultraviolet and focal plane | |
| CN103134443B (en) | Large-caliber large-diameter-thickness ratio reflector surface shape auto-collimation detection device and method | |
| CN1971232B (en) | Hartmann wavefront sensor with active alignment function and detection method thereof | |
| CN104483757B (en) | Off-axis aspheric surface element precision axis fixation method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150218 Termination date: 20200910 |