CN104236856A - Wave aberration detection device of objective lens imaging system and system error correction method of wave aberration detection device - Google Patents
Wave aberration detection device of objective lens imaging system and system error correction method of wave aberration detection device Download PDFInfo
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Abstract
The invention discloses a wave aberration detection device of an objective lens imaging system. The wave aberration detection device comprises a light source, a collimating mirror, a spectroscope, a focusing mirror, a standard spherical reflector, a data processing unit, a wave-front sensor, a first accurate adjustment table and a second accurate adjustment table, wherein the collimating mirror, the spectroscope, the focusing mirror and the standard spherical reflector are sequentially placed in the light emitting direction of the light source, and the wave-front sensor, the first accurate adjustment table and the second accurate adjustment table are connected with the data processing unit. In the wave aberration detection device, the measurement processes and the system error calibration process are switched by changing the position of the standard spherical reflector 5; in the two measurement processes, the standard spherical reflector 5 has the same adjustment accuracy, and therefore the calibration, measurement and correction of device and system errors can be effectively completed, and the wave aberration measurement accuracy is improved. No high-precision standard light source is needed, and cost is reduced; A system error calibration method of the wave aberration detection device is simple and compact in structure and has the advantages of being easy to obtain and the like, and the wave aberration detection of the objective lens imaging system to be detected can be completed through the simple system.
Description
Technical field
The present invention relates to field of optical measuring technologies, the specifically wave aberration pick-up unit of object lens imaging system and a bearing calibration for this apparatus system error, particularly can change, can add as required in pick-up unit the wave aberration measuring technique of secondary optics for light source.
Background technology
Wave aberration measurement is usually used in the field such as adaptive optics, optical detection evaluation.Especially, in the evaluation of optical system alignment and object lens image quality, the measurement of wave aberration is an important means.
Hartmann sensor or shearing interferometer is adopted to be a kind of widely used wave aberration pick-up units.Traditional Hartmann wave front sensor is made up of microlens array, transfer lens, photodetector and data processing software.Incident light, by microlens array and transfer lens, makes light beam conversion imaging to photodetector, exports data to data processing software by photodetector, finally by the optical wavefront of certain algorithm reduction optical system.A kind of Hartmann wave front sensor as disclosed in Chinese patent application prospectus (application number 98112210.8, publication number CN1245904A).At present around the measuring accuracy how improving Wavefront sensor, it is also proposed many methods, as Chinese patent application prospectus (application number 02123756.5, publication number CN1212508C) a kind of dynamic range of proposing and the adjustable Hartmann wave front sensor of measuring accuracy, and a kind of wavefront measuring method based on Hartmann wave front sensor that Chinese patent application prospectus (application number 201210198965.7, publication number CN102735348A) proposes.But these methods are all the accuracy of detection around how improving Wavefront sensor itself, cannot eliminate systematic error in wavefront measurement system.
For the measurement of objective wave aberration, adopt wave aberration measured by Wavefront sensor be incident to Wavefront sensor before the wave aberration of whole optical system, this is wherein except the wave aberration of object lens, further comprises the auxiliary wave aberration of optical element and the wave aberration of transfer lens in the entrained wave aberration of light source itself, optical system.Due to the existence of these systematic errors, the precision of Wavefront sensor objective lens wave aberration is caused greatly to reduce.The present invention is directed to and adopt Wavefront sensor to carry out objective wave aberration measurement, there is provided a kind of and can carry out systematic error demarcation and the wave aberration pick-up unit of error calibration process object lens imaging system easily, reduce the requirement of measuring system to light source and auxiliary optical component, thus can reduce the cost of detection system, and improve objective wave aberration measuring accuracy.
Summary of the invention
The object of this invention is to provide a kind of device simple, debug easily non-interfering method to realize the high precision test of the wave aberration of object lens imaging system.This pick-up unit does not require on theory of light sources, and general light source can meet the demands.Meanwhile, the systematic error measuring process of this pick-up unit is simple, be easy to realize, and makes measuring accuracy can reach the limit of Wavefront sensor measuring accuracy.
In order to achieve the above object, the technical solution adopted in the present invention is:
A kind of wave aberration pick-up unit of object lens imaging system, its feature is, comprise: light source, to send collimating mirror, spectroscope, focus lamp and standard spherical reflector that light direction places successively along this light source, and data processing unit, the Wavefront sensor be connected respectively with this data processing unit, first accurately adjusts platform and the second precision adjusts platform;
The light that described light source sends becomes after directional light through described collimating mirror and incides described spectroscope, spectroscope is back to by being incident to described standard spherical reflector Hou Yanyuan road through described focus lamp after dichroic mirror, the spectroscope of a part described in light transmission is received by described Wavefront sensor, by described data processing unit process;
Described first accurate adjustment platform has five and regulates degree of freedom, and for regulating position and the direction of object lens imaging system to be measured, the described second accurate adjustment platform has three and regulates degree of freedom, for regulating position and the direction of described standard spherical reflector.
The imaging system that described object lens imaging system to be measured is single imaging len or is combined by multiple optical device.
Described Wavefront sensor is the knockdown Hartmann sensor by microlens array and CCD, or based on the shearing interferometer of shear interference principle.
The face shape error of described standard spherical reflector will lower than the accuracy of detection of described Wavefront sensor.
Utilize a systematic error correction method for the wave aberration pick-up unit of described objective system, its feature is, the method is completed by following steps:
1. position and the direction of object lens imaging system to be measured is adjusted by the first minute adjustment platform, the object point of object lens imaging system to be measured is overlapped with the focus of focus lamp, by the position of the second minute adjustment platform adjustment standard spherical reflector, the centre of sphere of standard spherical reflector is overlapped with the picture point of object lens imaging system to be measured;
Wavefront sensor gathers spectroscopical transmitted light information, and is transferred to data processing unit, by the wave aberration W1 obtained after data processing unit process under measuring state;
2. by the first minute adjustment platform, object lens imaging system to be measured is shifted out, by the position of the second minute adjustment platform adjustment standard spherical reflector, the centre of sphere of standard spherical reflector is overlapped with the focus of focus lamp;
Wavefront sensor gathers spectroscopical transmitted light information, and is transferred to data processing unit, by obtaining the wave aberration W2 under systematic error demarcation state after data processing unit process;
3. calculate W1-W2, namely complete the correction of object lens imaging system wave aberration pick-up unit systematic error, the wave aberration achieving object lens imaging system to be measured is measured.
The error that described systematic error comprises the entrained error of light source itself, collimating mirror, spectroscope, focus lamp are introduced and the measuring error that wave front detector error causes.
The invention has the advantages that, do not need the pointolite of standard or spherical wave as a reference, the systematic error of pick-up unit can be removed by the mode of demarcating, and scaling scheme is simple.By two minute adjustment platforms, position is controlled, make overall system architecture simple, debug conveniently, especially the little standard spherical reflector of adjustment one is only needed can to realize the high-precision calibrating of systematic error, can the wave aberration introduced of wave aberration, light source and detector measurement that effectively secondary optics produces in correct detection device, and the alignment error of light path system.On the basis of this system, auxiliary optical component can be added according to actual needs, not affect the measurement of wave aberration result.
Accompanying drawing explanation
Fig. 1 is object lens imaging system wave aberration pick-up unit measurement pattern figure;
Fig. 2 is object lens imaging system wave aberration pick-up unit systematic error calibration mode figure;
Fig. 3 is wavefront measurement skeleton diagram;
Wherein, 1, light source; 2, collimating mirror; 3, spectroscope; 4, focus lamp; 5, standard spherical reflector; 6, Wavefront sensor; 7, the first minute adjustment platform; 8, the second minute adjustment platform; 9, data processing unit; 10, object lens imaging system to be measured.
Embodiment
The object of embodiment, technical scheme and advantage for a better understanding of the present invention, below in conjunction with drawings and Examples, the present invention is further illustrated, but should not limit the scope of the invention with this.
Shown in Fig. 1 is the imaging wave aberration pick-up unit of object lens imaging system.The light that light source 1 sends becomes directional light after collimating mirror 2, on the focal plane of focus lamp 4 is converted into A1 after reflexing to focus lamp 4 by spectroscope 3.Also namely, light source 1 and collimating mirror 2, form the formation assembly of directional light.Spectroscope 3, for the transmission of the light splitting of source of parallel light and the reflected light with wave aberration information, becomes the significant components in this device.Focus lamp 4 is auxiliary optical elements, and the wave aberration had for subsidiary under the image formation state of the imaging system of a pair conjugate points is measured, and can realize the convergence of directional light, form pointolite.
A pair conjugate points A1 of object lens imaging system 10 to be measured and A2, object point A1 converges to picture point A2 after object lens imaging system 10, and then disperses.Converge position at picture point A2 and put into standard spherical reflector 5, make picture point A2 diverging light reflect Hou Yanyuan road through standard spherical reflector 5 and return, reflected light is back to spectroscope 3 along light path always.By the first minute adjustment platform 7 and the second minute adjustment platform 8, respectively the position of object lens 10 to be measured and standard spherical reflector 5 and direction are regulated, the measurement of described imaging wave aberration can complete the wave aberration met arbitrarily under the mutual conjugate condition in position and measure, and only need meet that object point A1 overlaps with the focus of focus lamp 4, picture point A2 overlaps with the centre of sphere of standard spherical reflector 5.
Be back to the reflected light of spectroscope 3 along former road, a part of light transmission is received by Wavefront sensor 6, is finally processed by data processing unit 9 and obtains wavefront information.As shown in Figure 3, Wavefront sensor 6 is made up of microlens array and CCD Wave-front measurement process.Directional light from spectroscope 3 incides on microlens array and carries out light splitting, corresponding positional information figure (Hartmann sensor) or interferogram (shearing interferometer) is gathered by CCD, deliver in data processing unit 9 and process, obtain the wave aberration information of light beam.
Be present in any one optical element in pick-up unit, all can introduce wave aberration.And the wave aberration that Wavefront sensor 6 collection is measured is the wave aberration of whole light path system, not only contain the wave aberration of object lens imaging system 10 to be measured, further comprises the measuring error etc. that in light path, other optical elements are introduced as collimating mirror, spectroscope, light source error and detector itself.How to extract the wave aberration of object lens imaging system to be measured, subject matter is how to remove other system error.
The removing method of systematic error as shown in Figure 2.Main thought is shifted out object lens imaging system to be measured, then carry out the measurement of primary reflection aberration, completes the measurement of other optical modules in pick-up unit, light source and detector error.By the first minute adjustment platform 7, object lens imaging system 10 to be measured is shifted out, standard spherical reflector 5 is moved to the position that its centre of sphere overlaps with the focus of focus lamp 4 by the second minute adjustment platform 8, Wavefront sensor 6 carries out the measurement of primary reflection aberration again, namely completes the demarcation of pick-up unit systematic error.
The systematic error correction method of object lens imaging system wave aberration pick-up unit, comprises following steps:
(1) object lens imaging system 10 to be measured is adjusted by the first minute adjustment platform 7, its object point A1 is overlapped with the focus of focus lamp 4, adjusted the position of standard spherical reflector by the second minute adjustment platform 8, its centre of sphere is overlapped with the picture point A2 of object lens imaging system 10 to be measured.Gather spectroscope 3 transmitted light by Wavefront sensor 6, obtained the wave aberration W1 under measuring state by data processing unit 9 process;
(2) by the first minute adjustment platform 7, object lens imaging system 10 to be measured is shifted out, adjusted the position of standard spherical reflector by the second minute adjustment platform 8, its centre of sphere is overlapped with the focus of focus lamp 4.Gather spectroscope 3 transmitted light by Wavefront sensor 6, obtained the wave aberration W2 under systematic error demarcation state by data processing unit 9 process;
(3) namely completed the correction of object lens imaging system wave aberration pick-up unit systematic error by W1-W2, the wave aberration achieving object lens imaging system 10 to be measured is measured.
For object lens imaging system 10 to be measured, different imaging conjugate points, i.e. corresponding different numerical aperture (N.A).By changing the focus lamp 4 of different focal, can realize the coupling of the different conjugate imaging of same object lens, the wave aberration realizing different conjugate imaging is measured.
About the first minute adjustment platform 7 and the second minute adjustment platform 8, wherein require that the first minute adjustment platform 7 not only has three-dimensional adjustment, also need the two-dimensional adjustment in angle simultaneously, realize the optical axis alignment of object lens imaging system 10 to be measured, and object point A1 regulates with overlapping of focus lamp 4 focus.And for module 8 part, need the picture point A2 of the centre of sphere of standard spherical reflector 5 with object lens imaging system to be measured to overlap, because standard spherical reflector 5 itself has symmetry, therefore only need the three-dimensional of locus to adjust.
In sum, the invention provides a kind of wave aberration pick-up unit of object lens imaging system, the systematic error of pick-up unit can be removed by the mode of demarcating.Controlled by the first minute adjustment platform 7 and the second minute adjustment platform 8 pairs of positions, that system architecture is simple, debug conveniently, only need the position adjusting spherical reflector 5 can realize the high-precision calibrating of systematic error, the measuring error that the error introduce entrained error of the light source 1 in system light path itself, collimating mirror 2, spectroscope 3, focus lamp 4 and wave front detector 6 error cause.Reduce the requirement of measuring system to light source 1, improve the precision of measuring system.
Claims (7)
1. the wave aberration pick-up unit of an object lens imaging system, it is characterized in that, comprise: light source (1), to send collimating mirror (2), spectroscope (3), focus lamp (4) and standard spherical reflector (5) that light direction places successively along this light source, and data processing unit (9), the Wavefront sensor (6) be connected respectively with this data processing unit (9), first accurately adjusts platform (7) and the second precision adjusts platform (8);
The light that described light source (1) sends incides described spectroscope (3) after described collimating mirror (2) becomes directional light, be incident to described standard spherical reflector (5) Hou Yanyuan road through described focus lamp (4) after being reflected by spectroscope (3) and be back to spectroscope (3), the spectroscope (3) of a part described in light transmission is received by described Wavefront sensor (6), is finally processed by described data processing unit (9);
Described first accurate adjustment platform (7) has five and regulates degree of freedom, for regulating position and the direction of object lens imaging system (10) to be measured, described second accurate adjustment platform (8) has three and regulates degree of freedom, for regulating position and the direction of described standard spherical reflector (5).
2. the wave aberration pick-up unit of object lens imaging system according to claim 1, is characterized in that, the imaging system that described object lens imaging system (10) to be measured is single imaging len or is combined by multiple optical device.
3. the wave aberration pick-up unit of object lens imaging system according to claim 1, it is characterized in that, described Wavefront sensor (6) is the knockdown Hartmann sensor by microlens array and CCD, or based on the shearing interferometer of shear interference principle.
4. the wave aberration pick-up unit of object lens imaging system according to claim 1, is characterized in that, the described spectroscopical reflected light side described in Wavefront sensor placement, and optical axis same with it.
5. the wave aberration pick-up unit of object lens imaging system according to claim 1, is characterized in that, the face shape error of described standard spherical reflector (5) will lower than the accuracy of detection of described Wavefront sensor (6).
6. utilize a systematic error correction method for the wave aberration pick-up unit of the objective system described in claim 1, it is characterized in that, the method is completed by following steps:
1. position and the direction of object lens imaging system (10) to be measured is adjusted by the first minute adjustment platform (7), the object point (A1) of object lens imaging system (10) to be measured is overlapped with the focus of focus lamp (4), by the position of the second minute adjustment platform (8) adjustment standard spherical reflector (5), the centre of sphere of standard spherical reflector (5) is overlapped with the picture point (A2) of object lens imaging system (10) to be measured;
Wavefront sensor (6) gathers the transmitted light information of spectroscope (3), and is transferred to data processing unit (9), obtains the wave aberration W1 under measuring state by data processing unit (9) after being processed;
2. by the first minute adjustment platform (7), object lens imaging system (10) to be measured is shifted out, by the position of the second minute adjustment platform (8) adjustment standard spherical reflector (5), the centre of sphere of standard spherical reflector (5) is overlapped with the focus of focus lamp (4);
Wavefront sensor (6) gathers the transmitted light information of spectroscope (3), and is transferred to data processing unit (9), by obtaining the wave aberration W2 under systematic error demarcation state after data processing unit (9) process;
3. calculate W1-W2, namely complete the correction of object lens imaging system wave aberration pick-up unit systematic error, the wave aberration achieving object lens imaging system (10) to be measured is measured.
7. the bearing calibration of object lens imaging system wave aberration pick-up unit systematic error according to claim 6, it is characterized in that, described systematic error comprises the entrained error of light source (1) itself, error that collimating mirror (2), spectroscope (3), focus lamp (4) are introduced and the measuring error that wave front detector (6) error causes.
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