CN108037594B - Assembly method and device of full-field lens - Google Patents
Assembly method and device of full-field lens Download PDFInfo
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- CN108037594B CN108037594B CN201810002994.9A CN201810002994A CN108037594B CN 108037594 B CN108037594 B CN 108037594B CN 201810002994 A CN201810002994 A CN 201810002994A CN 108037594 B CN108037594 B CN 108037594B
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
Abstract
The invention provides an assembly method of a full-field lens, which comprises the following steps: measuring the wave fronts at different positions of the full view field of the measured lens; processing the information of the wave fronts at different positions to obtain various aberrations; and synthesizing the obtained aberration, and adjusting the assembly position of the measured lens according to the synthesis result. The invention also provides an assembly device of the full-field lens for realizing the method, which comprises a light source, a reticle, a telescope system and a wavefront sensor; the wavefront sensor is used for receiving wavefront formed by parallel beams emitted by the telescope system, measuring actual wavefront information, wherein the wavefront comprises on-axis wavefront and off-axis wavefront, comprehensively considering the wavefront condition of the full field of view, and adjusting the measured lens during assembly. The invention uses the assembly mode of wavefront measurement to replace the traditional assembly mode based on MTF, improves the assembly precision and efficiency and realizes the large-scale production of high-performance lenses.
Description
Technical Field
The invention relates to an assembly technology of an optical device, in particular to an assembly method and an assembly device of a full-field lens.
Background
In recent years, with the vigorous development of the mobile phone industry, the quantity of optical lenses on mobile phones is gradually increased year by year, and the requirements of the market on the performance of the lenses are higher and higher. The traditional lens assembly takes the MTF as an evaluation standard, requires detection of MTF values of different fields of view, and a measurement schematic diagram during assembly is shown in fig. 1. The adjusting principle during assembly is that the difference between the measured MTF value and the designed value is large when the lens in the lens is eccentric or inclined, and the lens can be guided to be adjusted according to the comparison between the measured MTF value and the designed value until the MTF value meets the requirement.
The assembly device taking the MTF as the evaluation standard has certain limitation, firstly, the assembly precision of the lens mainly depends on the measurement precision of the MTF, the aberration requirement of the lens is not considered, and the high-performance requirement of the lens cannot be met; secondly, the MTF measuring method cannot meet the requirement of large-scale production of lenses in a factory, the MTF measuring method needs to calculate the MTF value of each view field, and the real-time performance is insufficient.
Through the retrieval, chinese utility model patent 201620615626.8 discloses an optical lens optical axis aligning device, including the projection subassembly, the drive camera lens that are used for projecting image to camera lens be in projection subassembly below swing so that the camera lens with projection subassembly just right swing platform, be used for driving an image sensor and be in the camera lens below is along X, Y, Z axle removal so that image sensor with camera lens just right moving platform, and with swing platform reaches the moving platform electricity is connected and the two main control unit who coordinates the motion of control. However, the patent only realizes the arbitrary change of the relative position of the lens and the image sensor through the two platforms, thereby realizing the assembly, and cannot solve the problems.
The chinese invention application with application number 201710312378.9 discloses an accurate assembly method and an assembly system for an optical display module, wherein the moving distance m of an image generation unit of the optical display module is adjusted by the distance difference between the ideal imaging distance L of an optical lens of the optical display module and the actual imaging distance L' of the optical lens, the assembly process hardly needs manual intervention, the image generation unit is directly controlled by an execution mechanism to adjust the position, and the degree of automation is high. The patent technology also fails to solve the above-mentioned technical problems.
Disclosure of Invention
Aiming at the defects in the prior art, the invention aims to provide an assembly method and device of a full-field lens, which replace the traditional assembly mode based on MTF with the assembly mode of wavefront measurement, improve the assembly precision and efficiency and realize the large-scale production of high-performance lenses.
According to an aspect of the present invention, there is provided a method of assembling a full-field lens, comprising:
measuring wave fronts at least two different positions of the full field of view of the measured lens;
processing the information of the wave fronts at different positions to obtain various aberrations;
and synthesizing the obtained aberration, and adjusting the assembly position of the measured lens according to the synthesis result.
Preferably, the measuring of the wave fronts at different positions of the full field of view of the measured lens is: and measuring the wave fronts of the zero-degree view field and at least one non-zero-degree view field of the measured lens to form the wave fronts at different positions of the full view field of the measured lens.
Preferably, the processing of the information of the wavefront at different positions to obtain each aberration means: fitting the wavefront information at different positions of the full field of view of the measured lens by using Zernike polynomials respectively to decompose various aberrations.
Preferably, the wavefronts at least two different positions of the full field of view of the measured lens are formed by the following method:
adopting a plurality of point light sources for generating the same incident light beams at different view field positions of the tested lens; the point light source emits a light beam with a fixed divergence angle from the focal plane of the measured lens, enters the measured lens and is emitted into a parallel light beam through the measured lens;
and expanding the parallel beams emitted by the tested lens to form wave fronts at different positions of the whole view field of the tested lens.
Preferably, the measured lens is divided into two parts, the first part is a fixed part, the second part is an adjustable part, and the point light source generates a light beam with a fixed divergence angle and emits the light beam after passing through the first part and the second part in sequence.
Preferably, said integrating said obtained aberrations means: the method comprises the steps of giving different weights to various aberrations obtained by wavefront processing at different positions, superposing the various aberrations together to obtain a comprehensive aberration, enabling the second part of the tested lens to have a total field of view comprehensive aberration minimum at a certain position relative to the first part, wherein the minimum comprehensive aberration is a comprehensive result, and adjusting the position of the second part of the tested lens according to the minimum comprehensive aberration to realize that the first part and the second part are assembled into the optical lens.
According to a second aspect of the present invention, there is provided an assembling apparatus for a full field of view lens, comprising:
the point light sources are used for generating the same incident light beams at different view field positions of the tested lens; the point light source emits a light beam with a fixed divergence angle from the focal plane of the measured lens, enters the measured lens and is emitted into a parallel light beam through the measured lens;
the telescope system is used for expanding the parallel light beams emitted by the measured lens;
the wavefront measuring component is used for receiving a wavefront formed by parallel beams emitted by the telescope system, measuring actual wavefront information, wherein the wavefront comprises a zero-degree view field of the measured lens and a wavefront of at least one non-zero-degree view field, and the wavefront information of a full view field is synthesized and used for adjusting the measured lens during assembly.
Preferably, the plurality of point light sources includes:
a light source for generating a light beam having a fixed divergence angle;
the reticle is provided with a plurality of holes which are arranged, and the light beam with a fixed divergence angle of the light source illuminates the reticle to form a plurality of point light sources which are arranged.
Preferably, when measuring the wavefront of the zero degree field of view of the test lens, the point light source (the light source, the reticle), the test lens, the telescope system and the wavefront measuring means are located on the same optical path and on the same optical axis.
Preferably, when measuring the wavefront of the nonzero field of view of the measured lens, the point light source (the light source), the reticle) and the measured lens are located on a first optical axis, the telescope system and the wavefront measuring component are located on a second optical axis, and an included angle is formed between the first optical axis and the second optical axis, wherein the first optical axis refers to the optical axis of the measured lens, and the second optical axis refers to the optical axis of the telescope system.
Preferably, the measured lens comprises a first portion and a second portion, wherein: the first part is a fixed part, the second part is an adjustable part, and light beams of the point light source sequentially pass through the first part and the second part and enter the telescope system after passing through the second part.
More preferably, the wavefront information measured by the wavefront measuring component is transmitted to a subsequent processor, the processor fits the wavefront information by using a zernike polynomial to decompose each aberration, different weights are given to each aberration, the resultant aberrations are obtained by superposing the aberrations together, the total field of view resultant aberration existing at a certain position of the measured lens (the second part of the measured lens) to be adjusted is minimum, and the position of the second part of the measured lens is directly controlled and adjusted according to the minimum total aberration.
Preferably, the device further comprises a rotating platform, wherein the rotating platform is used for bearing the telescope system and the wavefront measuring component and can rotate around a self rotating shaft or move back and forth along an optical axis; the rotating shaft is perpendicular to the optical axis.
More preferably, the initial position of the rotating platform keeps the telescope system and the wavefront measuring component on the optical axis, and the rotating platform is used for measuring the wavefront of the zero-degree field of view of the tested lens; when the nonzero field wavefront of the measured lens is measured, the position of the rotating platform is changed, so that the light beam outside the optical axis vertically enters the telescope system.
More preferably, the wavefront measuring component adopts a wavefront sensor, preferably a shack hartmann wavefront sensor, and the shack hartmann wavefront sensor has high precision and strong measurement real-time performance.
Compared with the prior art, the invention has the following beneficial effects:
the assembling device has simple and reasonable structure, obtains the wavefront information through the coordination work of all optical devices, has higher measurement precision, can directly calculate the aberration of the lens through measuring different wavefront information of a view field, and meets the high-performance requirement of the lens. The invention uses the assembly device of wavefront measurement to replace the traditional assembly device based on MTF, improves the assembly precision and efficiency and realizes the large-scale production of high-performance lenses.
Furthermore, the device provided by the invention adopts the shack Hartmann wavefront sensor with high precision, the wavefront measurement precision can reach 1/20 wavelengths, the measurement real-time performance is strong, the lens assembly speed is high, the working efficiency is high, and the requirement on the working environment is low. The wavefront of the full field of view of the lens can be measured, and the off-axis measurement requirement of the lens is met.
In addition, the assembly method breaks through the conventional design idea, adopts a wavefront measurement method to replace an assembly method taking MTF as an evaluation standard, has strong real-time performance and quicker response, is convenient to apply to production lines, and realizes large-scale production.
The device and the method have wide application range, are suitable for small lenses such as mobile phone lenses, security lenses and the like, can realize all automatic control, can be applied to large production lines in factories, and realize large-scale automatic assembly of the lenses.
Drawings
Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments with reference to the following drawings:
fig. 1 is a schematic diagram of a conventional lens MTF measurement;
FIG. 2 is a schematic diagram of an assembling apparatus for an optical lens according to an embodiment of the present invention;
FIG. 3 is a schematic view of the surface of a reticle in accordance with one embodiment of the present invention;
FIG. 4 is a schematic diagram of the operation of an apparatus according to an embodiment of the present invention;
in the figure: 1 is LED area source, 2 is the reticle, and 3 are measurand lens first part, and 4 are measurand lens second part, and 5 are rotating platform, and 6 are telescope systems, and 7 are shack hartmann wavefront sensor.
Detailed Description
The present invention will be described in detail with reference to specific examples. The following examples will assist those skilled in the art in further understanding the invention, but are not intended to limit the invention in any way. It should be noted that variations and modifications can be made by persons skilled in the art without departing from the spirit of the invention. All falling within the scope of the present invention.
As shown in fig. 1, a schematic diagram of MTF measurement of a conventional lens is shown, that is: MTF (modulation transfer function) is adopted as an evaluation standard, and MTF values of different fields of view are required to be detected. The adjusting principle during assembly is that the difference between the measured MTF value and the designed value is large when the lens in the lens is eccentric or inclined, and the lens can be guided to be adjusted according to the comparison between the measured MTF value and the designed value until the MTF value meets the requirement.
Before describing the embodiments of the present invention, the following explanation is made on related terms, and specifically includes:
aberration: the difference between ideal imaging and actual imaging by the optical system.
Wave front: the surface of the equiphase surface where the wave propagates to a certain position is called a wavefront.
A wavefront sensor: and a detector for measuring the wave front error and converting the wave front information into a control signal.
Shack-Hartmann wavefront sensor (Shack-Hartmann): the shack Hartmann wavefront sensor is a wavefront measuring instrument developed on the basis of a classical shack Hartmann measuring method. The shack Hartmann wavefront sensor mainly comprises a micro-lens array and a high-speed CCD, wherein a detection wavefront is split by the micro-lens array and focused on a CCD focal plane, and the detection wavefront can be obtained through centroid calculation and a wavefront reconstruction algorithm.
Modulation Transfer Function (MTF): the amount of the thread which can be present within 1mm is expressed in lp/mm.
Modulation Transfer Function (MTF) contrast curve: the horizontal axis MTF and the vertical axis contrast.
Zernike polynomials: one typically describes the aberrations of an optical system using a form of power series expansion. Since the zernike polynomials are consistent with the form of the aberration polynomial observed in optical inspection, it is often used to describe wavefront characteristics.
In the following embodiments, the on-axis and off-axis are both relative to the optical axis, which is the rotational symmetry axis of the measured lens, and the optical path of the light beam propagating along the optical axis is not changed. The on-axis wavefront is the wavefront of the zero-degree view field of the tested lens, and the off-axis wavefront is the wavefront of the non-zero-degree view field of the tested lens.
As shown in fig. 2 and 4, a schematic structural diagram of a mounting apparatus for a full field lens according to a preferred embodiment of the present invention includes: the device comprises an LED area light source 1, a reticle 2, a first part 3 of a tested lens, a second part 4 of the tested lens, a telescope system 6 and a shack Hartmann wavefront sensor 7.
The device measures the on-axis wavefront and off-axis wavefront information by skillfully designing the light path, and further adjusts the position of the second part 4 of the measured lens through the information to finish assembly. Wherein:
an LED surface light source 1 for generating a light beam having a fixed divergence angle;
a reticle 2 having regularly arranged holes, which is illuminated by the LED surface light source 1, and corresponds to an arrangement of point light sources, as shown in fig. 3; the reticle 2 is positioned on the focal plane of the measured lens, and a light beam with a fixed divergence angle emitted from the focal plane enters the measured lens and is emitted into a parallel light beam through the measured lens; the point light source is used for generating the same incident light beams at different view field positions of the measured lens;
the measured lens comprises a first part 3 and a second part 4, wherein the first part 3 is a fixed part, the second part 4 is an adjustable part, and light beams of the point light source sequentially pass through the first part 3 and the second part 4 and enter the telescope system 6 after passing through the second part;
the telescope system 6 is used for expanding the parallel light beams emitted by the measured lens;
the shack Hartmann wavefront sensor 7 is used for receiving wavefronts formed by parallel beams emitted by the telescope system 6 and measuring actual wavefront information, wherein the wavefronts comprise on-axis wavefronts and off-axis wavefronts, the on-axis wavefronts and the off-axis wavefronts form wavefronts at different positions of the full view field of the measured lens, the wavefront condition of the full view field is comprehensively considered, and the wavefront sensor is used for adjusting the measured lens during assembly.
In another preferred embodiment, the apparatus may further include: and the rotating platform 5 is used for bearing the telescope system 6 and the shack Hartmann wavefront sensor 7, and can rotate around a shaft (a mechanical shaft of the rotating platform) or move back and forth along an optical axis (the same optical axis of the telescope system 6 and the shack Hartmann wavefront sensor 7).
In the embodiment that the rotating platform 5 is adopted, the initial position of the rotating platform 5 keeps the telescope system 6 and the shack hartmann wavefront sensor 7 on the same optical axis, and at this time, the LED surface light source 1, the reticle 2, the measured lens first part 3, the measured lens second part 4, the telescope system 6 and the shack hartmann wavefront sensor 7 are all on the same optical axis and are used for measuring the on-axis wavefront.
When the off-axis wavefront is measured, the position of the rotating platform 5 is changed, the telescope system 6 and the shack Hartmann wavefront sensor 7 are on the same optical axis, the LED surface light source 1, the reticle 2, the measured lens first part 3 and the measured lens second part 4 are on the other optical axis, and an included angle is formed between the two optical axes.
The on-axis and off-axis wavefronts form wavefronts at different positions of the full field of view of the tested lens, and during assembly, the wavefront condition of the full field of view is comprehensively considered to adjust the position of the second part 4 of the tested lens to complete assembly.
In the measured lens, the first part 2 and the second part 3 are both lenses, and usually one lens is an optical system, and the optical system is divided into two parts, wherein the first part can comprise most lenses and the second part is usually one or two lenses. The two parts are assembled together to form the entire optical lens. The tested lens comprises a first part 1 and a second part 2 which form a whole body of the lens to be assembled and is placed on a five-dimensional adjusting table.
As shown in fig. 2, when measuring the on-axis wavefront, the LED surface light source 1, the reticle 2, the measured lens, the telescope system 6, and the shack hartmann wavefront sensor 7 are located on the same optical path and on the same optical axis; the initial position of the rotating platform 5 maintains the telescope system 6 and shack hartmann wavefront sensor 7 on the optical axis for measuring the on-axis wavefront. At this time, the LED surface light source 1 has a light beam with a fixed divergence angle at a certain incident angle, and the light beam passes through the regularly arranged holes of the reticle 2, and the holes can be regarded as regularly arranged and identical point light sources. The reticle 2 is located on the focal plane of the measured lens, the light beam with a fixed divergence angle emitted from the focal plane enters the measured lens, and the light beam with a fixed divergence angle is converted into a collimated light beam through the measured lens. The collimated beam is expanded (matched and amplified) by the telescope system 6 and is incident on the shack hartmann wavefront sensor 7. The wavefront detected by the shack hartmann wavefront sensor 7 can be fitted with zernike polynomials to resolve various aberrations.
The first part 3 of the measured lens is fixed, the second part 4 of the measured lens is placed on a five-dimensional adjusting table, the five-dimensional adjusting table can move along a light path, and five dimensions in the five-dimensional adjusting table refer to X, Y and Z three-dimensional translation and X and Y two-dimensional rotation; general orientation definition: and in a right-hand coordinate system, the optical axis direction is a Z axis, XY can be defined as an X upward direction, and Y is a direction vertical to the paper surface.
As shown in fig. 4, when measuring off-axis wavefront, the LED surface light source 1, the reticle 2, and the measured lens are located on a first optical axis, and the telescope system 6 and the shack hartmann wavefront sensor 7 are located on a second optical axis, and an included angle is formed between the first optical axis and the second optical axis. At this point, the position of the rotating platform 5 can be changed so that the off-axis beam is incident perpendicularly to the telescopic system 6.
The on-axis and off-axis wave fronts form wave fronts at different positions of the full field of view of the measured lens, the shack Hartmann wave front sensor 7 detects the wave fronts, the Zernike polynomial is used for fitting, various aberrations are resolved, and the wave front condition of the full field of view is comprehensively considered to adjust the second part of the measured lens.
In the above embodiment of the present invention, for the wavefront comprehensively considering the full field of view, the following manner may be adopted: and giving different weights to the aberrations calculated by the wave fronts at different field positions, superposing the weights together to obtain a comprehensive aberration, adjusting the second part of the tested lens, judging that the optimal position is adjusted when the comprehensive aberration reaches the minimum value, and finishing the adjustment, thereby realizing the assembly of the first part and the second part.
The assembling device in the embodiment of the invention has simple and reasonable structure, obtains on-axis and off-axis wavefront information through the coordinated work of all optical devices, has higher measurement precision, can directly calculate the aberration of the lens through the measured wavefront information, and meets the high-performance requirement of the lens.
The invention uses the assembly device of wavefront measurement to replace the traditional assembly device based on MTF, improves the assembly precision and efficiency and realizes the large-scale production of high-performance lenses.
The invention can adopt a shack Hartmann wave-front sensor which has high precision, high measuring real-time performance, high lens assembling speed, high working efficiency and low requirement on working environment, and the wave-front measuring precision can reach 1/20 wavelengths. In addition, in other embodiments, other wavefront sensors may be used, and are not limited to the shack hartmann wavefront sensor 7.
The above is an embodiment of the apparatus of the present invention, and of course, in other embodiments, the apparatus may further comprise a processor, which is configured to process the wavefront detected by the shack hartmann wavefront sensor 7, and may be configured to fit a zernike polynomial to resolve various aberrations, and directly adjust the second portion 3 of the lens under test, thereby completing the assembly.
In other embodiments, the LED surface light source 1 may be replaced by other replacement light sources, such as a mercury lamp light source. The point light source may be formed in other ways, and is not limited to the above method.
In another embodiment of the present invention, a method for assembling a full-field lens is provided, where the method includes: measuring the wave fronts at different positions of the full view field of the measured lens; processing the information of the wave fronts at different positions to obtain various aberrations; and synthesizing the obtained aberration, and adjusting the assembly position of the measured lens according to the synthesis result.
Specifically, with reference to the device structure of the foregoing embodiment, a specific implementation process of the assembling method for a full-field lens includes:
s1: a reticle 2 is adopted, holes are arranged on the reticle 2, and the reticle 2 is positioned on the focal plane of a measured lens;
s2: illuminating the reticle 2 with a light beam having a fixed divergence angle to form an array of point light sources; a light beam with a fixed divergence angle emitted from the reticle positioned on the focal plane of the measured lens enters the measured lens and is emitted into a parallel light beam through the measured lens;
s3: matching and amplifying the parallel light beams emitted by the tested lens by adopting a telescope system 6;
s4: the method comprises the steps of receiving a wavefront formed by parallel beams emitted by a telescope system 6 by using a shack Hartmann wavefront sensor 7, measuring actual wavefront information, wherein the wavefront comprises an on-axis wavefront and an off-axis wavefront, the on-axis wavefront and the off-axis wavefront form wavefronts at different positions of a full view field of a measured lens, comprehensively considering the wavefront condition of the full view field, and adjusting the measured lens during assembly.
In the above method, the measured lens, wherein the adjustable second part 4 is placed on a five-dimensional adjusting stage, the five-dimensional adjusting stage is moved along the optical path.
In the above method, as shown in fig. 2, when measuring an on-axis wavefront, the LED surface light source 1, the reticle 2, the test lens, the telescope system 6, and the wavefront sensor 7 are located on the same optical path and on the same optical axis;
in the above method, as shown in fig. 4, when measuring the off-axis wavefront, the LED surface light source 1, the reticle 2 and the measured lens are located on a first optical axis, and the telescope system 6 and the shack hartmann wavefront sensor 7 are located on a second optical axis, and an included angle is formed between the first optical axis and the second optical axis.
In the above method, the test lens comprises a first portion 3 and a second portion 4, wherein: the first part 3 is a fixed part, the second part 4 is an adjustable part, and light beams of the point light source sequentially pass through the first part 3 and the second part 4 and enter the telescope system after passing through the second part 4; the on-axis and off-axis wavefronts form wavefronts at different positions of the full field of view of the measured lens, and the wavefront condition of the full field of view is comprehensively considered to adjust the second part 4 of the measured lens.
In the method, the wavefront information detected by the shack Hartmann wavefront sensor 7 is transmitted to a processor, the processor fits the wavefront information by using a Zernike polynomial to decompose various aberrations, and the measured lens second part 4 is directly controlled and adjusted according to the various aberrations. The processor may implement the processing of the wavefront information through corresponding software, and of course, in other embodiments, the processing of the wavefront information may also be implemented in other manners to obtain various aberrations.
The assembly method breaks through the conventional design idea, adopts the wavefront measurement method to replace the assembly method taking MTF as the evaluation standard, has strong real-time performance and quicker response, is convenient to apply to production lines, and realizes large-scale production.
The device and the method have wide application range, can be used for small lenses such as mobile phone lenses, security lenses and the like, and can realize all automatic control, thereby being applied to large-scale production lines in factories and realizing large-scale automatic assembly of the lenses.
The above method of on-axis and off-axis wavefront formation is only a preferred way, and in other method embodiments, the on-axis and off-axis wavefront formation may also be performed in other ways, and is not limited to the above device, as long as the on-axis and off-axis wavefront information can be measured, and the purpose of the present invention can be achieved.
It should be noted that, the steps in the method provided by the present invention may be implemented by using corresponding components or components in the apparatus, and those skilled in the art may refer to the technical solution of the apparatus to implement the step flow of the method, that is, the embodiment in the system may be understood as a preferred example for implementing the method, and will not be described herein again.
The foregoing description of specific embodiments of the present invention has been presented. It is to be understood that the present invention is not limited to the specific embodiments described above, and that various changes and modifications may be made by one skilled in the art within the scope of the appended claims without departing from the spirit of the invention.
Claims (8)
1. A method of assembling a full field of view lens, comprising:
measuring wave fronts at least two different positions of the full field of view of the measured lens;
processing the information of the wave fronts at different positions to obtain various aberrations;
synthesizing the obtained aberration, and adjusting the assembly position of the measured lens according to the synthesis result;
the wavefront at least two different positions of the full field of view of the measured lens is formed by adopting the following method:
adopting a plurality of point light sources for generating the same incident light beams at different view field positions of the tested lens; the point light source emits a light beam with a fixed divergence angle from the focal plane of the measured lens, enters the measured lens and is emitted into a parallel light beam through the measured lens;
expanding the parallel light beams emitted by the tested lens to form wave fronts at different positions of the whole view field of the tested lens;
the measured lens is divided into two parts, the first part is a fixed part, the second part is an adjustable part, and the point light source generates a light beam with a fixed divergence angle and emits the light beam after passing through the first part and the second part in sequence;
the integration of the obtained aberrations means that: the method comprises the steps of giving different weights to various aberrations obtained by wavefront processing at different positions, superposing the various aberrations together to obtain a comprehensive aberration, enabling the second part of the tested lens to have a total field of view comprehensive aberration minimum at a certain position relative to the first part, wherein the minimum comprehensive aberration is a comprehensive result, and adjusting the position of the second part of the tested lens according to the minimum comprehensive aberration to realize that the first part and the second part are assembled into the optical lens.
2. The assembling method of the full-field lens according to claim 1, wherein the measuring of the wave fronts at least two different positions of the full field of view of the measured lens is: and measuring the wave fronts of the zero-degree view field and at least one non-zero-degree view field of the measured lens to form the wave fronts at different positions of the full view field of the measured lens.
3. The method for assembling a full-field lens according to claim 1, wherein the processing of the information of the wavefront at different positions to obtain various aberrations includes: fitting the wavefront information at different positions of the full field of view of the measured lens by using Zernike polynomials respectively to decompose various aberrations.
4. An assembly device for a full field of view lens, comprising:
the point light sources are used for generating the same incident light beams at different view field positions of the tested lens; the point light source emits a light beam with a fixed divergence angle from the focal plane of the measured lens, enters the measured lens and is emitted into a parallel light beam through the measured lens;
the telescope system is used for expanding the parallel light beams emitted by the measured lens;
the wavefront measuring component is used for receiving a wavefront formed by parallel beams emitted by the telescope system, measuring actual wavefront information, wherein the wavefront comprises a zero-degree view field of the measured lens and a wavefront of at least one non-zero-degree view field, and the wavefront information of a full view field is synthesized and used for adjusting the measured lens during assembly;
the measured lens comprises a first portion and a second portion, wherein: the first part is a fixed part, the second part is an adjustable part, and light beams of the point light source sequentially pass through the first part and the second part and enter the telescope system after passing through the second part;
the wavefront information detected by the wavefront measuring component is transmitted to a subsequent processor, the processor fits the wavefront information by using a Zernike polynomial to decompose various aberrations, different weights are given to the various aberrations, the various aberrations are superposed together to obtain a comprehensive aberration, the second part of the measured lens has the minimum comprehensive aberration in the full field of view at a certain position, and the position of the second part of the measured lens is directly controlled and adjusted according to the minimum comprehensive aberration.
5. The assembly apparatus of the full-field lens of claim 4, wherein the plurality of point light sources comprises:
a light source for generating a light beam having a fixed divergence angle;
the reticle is provided with a plurality of holes which are arranged, and the light beam with a fixed divergence angle of the light source illuminates the reticle to form a plurality of point light sources which are arranged.
6. The assembling apparatus of the full field lens according to claim 4, wherein the point light source, the test lens, the telescope system and the wavefront measuring means are located on the same optical path and on the same optical axis when measuring the wavefront of the zero degree field of view of the test lens;
when measuring the wavefront of the non-zero degree visual field of the test lens, the point light source the test lens is located on the first optical axis, the telescope system and the wavefront measurement component is located on the second optical axis, the first optical axis with an included angle is provided between the second optical axis, wherein the first optical axis refers to the optical axis of the test lens, and the second optical axis refers to the optical axis of the telescope system.
7. The mounting arrangement for a full field lens of any one of claims 4 to 6, wherein said arrangement further comprises a rotatable platform for carrying said telescope system and said wavefront measuring means, and being rotatable about its axis of rotation or movable back and forth along an optical axis, said axis of rotation being perpendicular to said optical axis.
8. The mounting apparatus for a full field lens of claim 7, wherein the rotary stage, in its initial position, holds the telescope system and the wavefront measuring device on the optical axis for measuring the zero field wavefront of the test lens; when the nonzero field of view wavefront of the measured lens is measured, the position of the rotating platform is changed, so that the measured lens emits light beams from the outside of the optical axis of the telescope system to vertically enter the telescope system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810002994.9A CN108037594B (en) | 2018-01-02 | 2018-01-02 | Assembly method and device of full-field lens |
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| CN113218630B (en) | 2018-12-03 | 2024-02-13 | 江苏慧光电子科技有限公司 | Optical detection method, optical detection system and optical device manufacturing system |
| CN109799672B (en) * | 2019-03-26 | 2021-07-09 | 华为终端有限公司 | Detection device and method for imperfect imaging lens |
| CN109883656B (en) * | 2019-03-26 | 2021-07-20 | 华为终端有限公司 | Detection device and method for imperfect imaging lens |
| CN110567681B (en) * | 2019-09-26 | 2021-02-12 | 中国科学院长春光学精密机械与物理研究所 | Device and method for detecting non-common view field auto-collimation optical system |
| CN110531532B (en) * | 2019-09-29 | 2020-11-06 | 中国科学院长春光学精密机械与物理研究所 | Optical system assembling and adjusting method and large-caliber large-view-field telescope assembling and adjusting method |
| CN111122439A (en) * | 2020-01-14 | 2020-05-08 | 仪锐实业有限公司 | Device and method for detecting quality of optical lens group |
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| CN106768882A (en) * | 2016-12-15 | 2017-05-31 | 中国科学院光电技术研究所 | A kind of optical system distortion measurement method based on Shack Hartmann wave front sensor |
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| CN101278867A (en) * | 2007-12-28 | 2008-10-08 | 中国科学院光电技术研究所 | Reflection type artificial crystal optical aberration hartmann measuring apparatus |
| CN106768882A (en) * | 2016-12-15 | 2017-05-31 | 中国科学院光电技术研究所 | A kind of optical system distortion measurement method based on Shack Hartmann wave front sensor |
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