CN204118089U

CN204118089U - A kind of solar cell

Info

Publication number: CN204118089U
Application number: CN201420271193.XU
Authority: CN
Inventors: 徐伟; 沈启群
Original assignee: WUXI ZHONGNENG JINGKE NEW ENERGY TECHNOLOGY Co Ltd
Current assignee: WUXI ZHONGNENG JINGKE NEW ENERGY TECHNOLOGY Co Ltd
Priority date: 2014-05-26
Filing date: 2014-05-26
Publication date: 2015-01-21
Anticipated expiration: 2024-05-26

Abstract

The utility model discloses a kind of solar cell, this solar cell comprises glass substrate (1), and the n+/p+ type a-Si:H emission layer (2) that substrate superposes successively, p-/n-type polycrystalline Si absorbed layer (3) and p+/n+ type a-Si:H are by surface field (4); P-/n-type polycrystalline Si absorbed layer (3) and p+/n+ type a-Si:H are covered n+/p+ type a-Si:H emission layer (2) part surface by surface field (4), leave and launch groove (5).This solar cell has inexpensive glass substrate, and energy transformation ratio is high, and preparation technology is simple, and film thickness reduces further, is suitable for large-scale commercial and produces and application.

Description

A kind of solar cell

Technical field

The utility model belongs to solar energy and utilizes technical field, particularly a kind of solar cell.

Background technology

Energy shortage and environmental pollution are two significant problems that the century mankind face, and become the bottleneck of international community's economic development.Solar energy provides as the regenerative resource of cleanliness without any pollution the preferred embodiments solving this two problems.At present, how to develop that photoelectric conversion efficiency is high, the life-span is long, stable performance and solar cell with low cost caused global extensive concern.Therefore, based on the needs of era development, solar cell has wide development space.

Solar energy power generating market is just flourish, and in the past between 10 years, solar cell market increases rapidly with the ratio of 40% every year, and wherein crystal-silicon solar cell occupies the market share of solar cell nearly 90%.In crystalline silicon solar cell modules, the cost of silicon wafer accounts for 50% of solar cell total cost, even if production technology constantly progresses greatly and development! The preparation cost significantly reducing crystal-silicon solar cell further also reaches capacity; Therefore, filming or thin layer Main Means and the development trend becoming reduction solar cell cost.Thin film solar cell (TFSC) comparatively crystal-silicon solar cell, has low light level function admirable, raw materials consumption and significantly reduces and the advantage such as cost is low.Further, TFSC also can be prepared on flexible substrates, has good toughness, collapsible, rollable and can the advantage such as large area production, can be applicable to the surfaces such as clothes, vehicle glass, aircraft and building future.

But there is the lower problem of energy conversion efficiency in traditional thin film solar cell, and complicated process of preparation, film thickness need further compression.

The energy conversion efficiency of the polysilicon thin-film solar battery prepared in current laboratory reaches 19%, but really to realize the extensive industrialization of the polysilicon thin-film solar battery of high-efficiency and low-cost, also need the polysilicon membrane prepared must be thin as far as possible and adopt cheap substrate.

Utility model content

Problem to be solved in the utility model is to provide a kind of solar cell with inexpensive glass substrate, and this solar cell energy transformation ratio is high, and preparation technology is simple, and film thickness reduces further.

Disclosed in the utility model, a kind of solar cell, comprises substrate, superposes n+/p+ type a-Si:H emission layer, p-/n-type polycrystalline Si absorbed layer and p+/n+ type a-Si:H over the substrate successively by surface field; P-/n-type polycrystalline Si absorbed layer and p+/n+ type a-Si:H are covered n+/p+ type a-Si:H emission layer part surface by surface field, leave transmitting groove.

As the further improvement of technique scheme, described substrate is glass substrate.

The preparation method of described solar cell comprises the following steps:

1) glass making herbs into wool; Glass making herbs into wool adds the effective light path of light in polysilicon membrane, so that the absorption of polysilicon membrane to light is enhanced.

2) deposition of barrier layer and anti-reflection layer; Barrier layer can be used to stop that substrate impurity enters polysilicon membrane active coating, effectively can reduce grain boundary and reduce impurity defect; Anti-reflection layer can reduce reflection when light incides polysilicon membrane, increases film to the absorption of light.

3) deposition of a-Si layer;

4) preparation of polysilicon membrane, utilizes electron beam evaporation crystallization a-Si layer to obtain polysilicon membrane, or utilizes PEVCD direct deposition of polycrystalline silicon film in the glass substrate covering barrier layer;

5) rapid thermal annealing or laser annealing and hydrogen passivation, short annealing or laser annealing could reduce the defect of grain boundary density and space charge region in a large number, and hydrogen passivation can the effectively various boundary surfaces defect of passivation and volume defect! To obtain higher-quality polysilicon membrane.

6) some optical confinement; In order to reduce compound and the series resistance of back surface charge carrier, utilizing PEVCD and aluminium inductive technology etc. at upper surface deposition back surface electric field layer, and carrying out in-situ doped in deposition process.

7) electricity restriction; In order to reduce the resistance of electrode before and after solar cell, photoetching, twine printing, electron beam evaporation and electronics plating etc. is utilized to prepare the front and back electrode with ohmic contact.

8) passivation, namely carries out passivation to solar cell device surface.

Solar cell of the present utility model has the following advantages:

1, the material used is minimum.Comparatively other polysilicon thin-film solar batteries, solar cell of the present utility model

Without the need to nesa coating, the effective light technology that falls into can make polysilicon membrane thin as far as possible;

2, preparation technology is very simple;

3, larger active-matrix display screen can be further developed into;

4, battery performance promotes and is increased dramatically, and energy conversion efficiency is high, can reach 12% ~ 13%, is suitable for large-scale commercial applications application.

Accompanying drawing explanation

Fig. 1 is solar battery structure schematic diagram of the present utility model.

Embodiment

Below in conjunction with accompanying drawing, the solar cell that the utility model proposes is described in detail.

As shown in Figure 1, solar cell disclosed in the utility model, comprises glass substrate 1, and described glass substrate 1 superposes n successively ⁺/ p ⁺type a-Si:H emission layer 2, p ^-/ n ^-type polycrystalline Si absorbed layer 3 and p ⁺/ n ⁺type a-Si:H is by surface field 4; p ^-/ n ^-type polycrystalline Si absorbed layer 3 and p ⁺/ n ⁺type a-Si:H is covered n by surface field 4 ⁺/ p ⁺type a-Si:H emission layer 2 part surface, leaves and launches groove 5.

The preparation method of solar cell described in the utility model, comprises the following steps:

1) glass making herbs into wool;

2) deposition of barrier layer and anti-reflection layer;

3) deposition of a-Si layer;

4) preparation of polysilicon membrane, utilizes electron beam evaporation crystallization a-Si layer to obtain polysilicon membrane, or utilizes PEVCD(plasma reinforced chemical vapour deposition) direct deposition of polycrystalline silicon film in the glass substrate covering barrier layer;

5) rapid thermal annealing or laser annealing and hydrogen passivation;

6) some optical confinement, utilizes PEVCD and aluminium inductive technology etc. at upper surface deposition back surface electric field layer, and carries out in-situ doped in deposition process;

7) electricity restriction; Photoetching, twine printing, electron beam evaporation and electronics plating etc. is utilized to prepare the front and back electrode with ohmic contact

8) passivation.

Claims

1. a solar cell, is characterized in that: comprise substrate, superposes n successively over the substrate ⁺/ p ⁺type a-Si:H emission layer (2), p ^-/ n ^-type polycrystalline Si absorbed layer (3) and p ⁺/ n ⁺type a-Si:H is by surface field (4); p ^-/ n ^-type polycrystalline Si absorbed layer (3) and p ⁺/ n ⁺type a-Si:H is covered n by surface field (4) ⁺/ p ⁺type a-Si:H emission layer (2) part surface, leaves and launches groove (5).

2. solar cell according to claim 1, is characterized in that: described substrate is glass substrate (1).