CN204011378U - A kind of rocker-arm silicon chip etching device - Google Patents
A kind of rocker-arm silicon chip etching device Download PDFInfo
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- CN204011378U CN204011378U CN201420450042.0U CN201420450042U CN204011378U CN 204011378 U CN204011378 U CN 204011378U CN 201420450042 U CN201420450042 U CN 201420450042U CN 204011378 U CN204011378 U CN 204011378U
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- decorated basket
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Abstract
A kind of rocker-arm silicon chip etching device of the present utility model, comprise etching bath and the acid-proof gaily decorated basket, etching bath top is fixed with stepping motor, stepping motor drives and is connected with horizontal Cam drive system, on Cam drive system, be rotatably connected to L shaped upper arm, upper arm bottom is provided with the draw-in groove of opening upwards; The acid-proof gaily decorated basket is removably connected with the suspension handle of n shape, hangs handle top frame and matches with draw-in groove; Cam drive system comprises inside and outside two relative spacing disks, and interior spacing disk inner side is provided with the main eccentric shaft being connected with the driving shaft of stepping motor, between interior spacing disk and outer spacing disk, is connected with secondary eccentric shaft.The beneficial effects of the utility model are: the utility model adopts stepping motor to drive Cam drive system to rotate, and then drive the acid-proof gaily decorated basket to move up and down in etching bath, in guarantee etching bath, mixed acid liquid temperature is even, thereby has removed operating personnel's the duplication of labour from, has saved manpower.
Description
Technical field
The utility model relates to a kind of rocker-arm silicon chip etching device.
Background technology
At present, microelectric technique has entered very lagre scale integrated circuit (VLSIC) and age of system integration, and microelectric technique has become mark and the basis of whole information age.In microelectric technique, an integrated circuit be manufactured, several procedures such as integrated circuit (IC) design, mask plate manufacture, original material manufacture, chip manufacture, encapsulation, test need to be passed through.In this process, semi-conductor silicon chip is carried out to etching, form technique groove, be crucial technology.
Conventional engraving method has wet etching and the large class of dry etching two, and wherein wet etching refers to and utilizes liquid chemical reagent or solution to carry out the method for etching by chemical reaction; Dry etching is mainly utilize ion or free radical (molecule, atom and various atomic radicals etc. in excitation state) and the material generation chemical reaction in the plasma that low pressure discharge produces or wait physical action to reach the object of etching by bombardment.Wherein, wet etching is the technology that silicon chip is immersed in chemical etchant or chemical etchant is sprayed to silicon chip surface and completes by chemical reaction etching and trench digging.The advantages such as wet etching is widely used so far as traditional lithographic method always, and it is simple and crude that this method has equipment requirement, and operation is simply easy to grasp, and has certain mass production capabilities, and cost effectiveness is good.The equipment that the method is used mainly contains one for holding the acid tank of mix acid liquor and one for separating the acid-proof gaily decorated basket that holds a collection of silicon chip, the inside of the acid-proof gaily decorated basket becomes barrier shape, its conventional method of operation is by (normally 25 of a collection of silicon chips, sometimes 50 of as many as), separate and be placed in an acid-proof gaily decorated basket made from NPP material, again this gaily decorated basket is placed on one trench digging acid tank in, with immersion mode carry out wet etching.In above-mentioned acid tank, be added with the nitration mixture of proper proportion, after filling the gaily decorated basket of silicon chip and putting in this acid tank, on silicon chip not by after the reagent generation oxidation reaction in the region of photoresist masking and acid tank, again with acid tank in hydrofluoric acid (HF) in nitration mixture there is complex reaction, after forming complex compound, peel off from silicon chip surface, thereby on the surface of silicon chip, form groove, complete trench digging process.And in its course of reaction (oxidation reaction), can emit a large amount of heat, local acid liquor temperature in acid tank is raise, and after local acid liquor temperature rising, the acid etching speed of this part part is accelerated, thereby the groove that can cause on whole silicon chip or form on silicon chip is by the gross inconsistent, thereby affect the performance of silicon chip, in the time that local acid liquor temperature rising is higher, on silicon chip, can be caused the adverse consequences such as etching or undercutting due to the cohesion inefficacy of photoresist by the region of photoresist masking in addition.
In order to address the above problem, conventionally in the time of wet etching, be all by the portable gaily decorated basket of operating personnel, make this gaily decorated basket double swerve in acid tank, the mixed acid liquid in acid tank is being followed rocking of the gaily decorated basket and constantly in acid tank, is being flowed, so that the temperature of the mixed acid liquid in whole acid tank is even, thereby make on whole silicon chip or the acid etching speed on silicon chip is consistent by the gross, and the groove forming on silicon chip on whole silicon chip or is by the gross also consistent.
By the portable gaily decorated basket of operating personnel, although the method for its double swerve in acid tank is used for many years above-mentioned, but still exist some problems: 1, due to long-time repetitive operation, labour intensity is large, operating personnel are easily tired, be difficult to the stability that maintenance is rocked, thereby be difficult to ensure the uniformity of acid liquor temperature in acid tank, cause ensureing on whole silicon chip or the consistency of the groove that forms on silicon chip by the gross; 2, due to the otherness between operating personnel, for a collection of silicon chip etching in different acid tanks, also can produce the inconsistency of the groove that forms on silicon chip, affect properties of product; 3, due to operating personnel ceaselessly the portable gaily decorated basket in acid tank, roll, the mixed acid liquid in acid tank in rapid flow easily splash go out outside acid tank, and splash with it operating personnel, the personnel that cause injure.Therefore the problem that, how to solve the mixed acid liquid temperature homogeneity in acid tank in wet etching process is the problem of the utility model research.
Summary of the invention
For solving above technical deficiency, it is a kind of time saving and energy saving that the utility model provides, the rocker-arm silicon chip etching device that etch effect is good.
The utility model is realized by following measures:
A kind of rocker-arm silicon chip etching device of the present utility model, comprise etching bath and the acid-proof gaily decorated basket, described etching bath top is fixed with stepping motor, described stepping motor drives and is connected with horizontal Cam drive system, on described Cam drive system, be rotatably connected to L shaped upper arm, described upper arm bottom is provided with the draw-in groove of opening upwards; The described acid-proof gaily decorated basket is removably connected with the suspension handle of n shape, and described suspension handle top frame matches with draw-in groove; Described Cam drive system comprises inside and outside two relative spacing disks, and interior spacing disk inner side is provided with the main eccentric shaft being connected with the driving shaft of stepping motor, between interior spacing disk and outer spacing disk, is connected with secondary eccentric shaft.
Top, above-mentioned acid-proof gaily decorated basket two side is provided with caulking groove, and described suspension handle two bottom sides is provided with the card article matching with caulking groove.
Above-mentioned upper arm top is provided with sleeve pipe, and described casing pipe sleeve is on secondary eccentric shaft.
The beneficial effects of the utility model are: the utility model adopts stepping motor to drive Cam drive system to rotate, and then drive the acid-proof gaily decorated basket to move up and down in etching bath, in guarantee etching bath, mixed acid liquid temperature is even, thereby remove operating personnel's the duplication of labour from, save manpower, also ensured on whole silicon chip or the consistency of the groove that forms on silicon chip by the gross, thereby ensured the performance of product, improved production efficiency.Avoided the hand-held gaily decorated basket of operating personnel to rock in etching bath, mixed acid liquid splash out causes the problem of personal injury.
Brief description of the drawings
Fig. 1 is structural representation of the present utility model.
Fig. 2 is the structural representation of the acid-proof gaily decorated basket of the present utility model.
Fig. 3 is the structural representation that hangs handle in the utility model.
Wherein: 1 etching bath, 2 stepping motors, 3 main eccentric shafts, 4 interior spacing disks, 5 outer spacing disks, 6 secondary eccentric shafts, 7 upper arms, 8 draw-in grooves, 9 sleeve pipes, the 10 acid-proof gailys decorated basket, 11 caulking grooves, 12 hang handle, 13 card articles.
Embodiment
Below in conjunction with accompanying drawing, the utility model is done to further detailed description:
As shown in Figure 1, a kind of rocker-arm silicon chip etching device of the present utility model, comprise etching bath 1 and the acid-proof gaily decorated basket 10, etching bath 1 top is fixed with stepping motor 2, stepping motor 2 drives and is connected with horizontal Cam drive system, Cam drive system comprises inside and outside two relative spacing disks, and interior spacing disk 4 inner sides are provided with the main eccentric shaft 3 being connected with the driving shaft of stepping motor 2, between interior spacing disk 4 and outer spacing disk 5, is connected with secondary eccentric shaft 6.On Cam drive system, be rotatably connected to L shaped upper arm 7, upper arm 7 bottoms are provided with the draw-in groove 8 of opening upwards.Upper arm 7 tops are provided with sleeve pipe 9, and sleeve pipe 9 is enclosed within on secondary eccentric shaft 6.
As shown in Figure 2,3, the acid-proof gaily decorated basket 10 is removably connected with the suspension handle 12 of n shape, hangs handle 12 top frames and matches with draw-in groove 8; The acid-proof gaily decorated basket 10 tops, two side are provided with caulking groove 11, hang handle 12 two bottom sides and are provided with the card article 13 matching with caulking groove 11.
When use, the card article 13 that hangs handle 12 is embedded in the caulking groove 11 at the acid-proof gaily decorated basket 10 tops, two side, thereby suspension handle 12 and the acid-proof gaily decorated basket 10 are connected as a single entity.Then the frame that hangs handle 12 tops is stuck in the draw-in groove 8 of upper arm 7, and the acid-proof gaily decorated basket 10 is put into etching bath 1.Stepping motor 2 starts, and drives main eccentric shaft 3 to rotate, thereby drives upper arm 7 to seesaw up and down, and simultaneously the acid-proof gaily decorated basket 10 seesaws up and down etching bath 1 is interior.Mixed acid liquid in etching bath 1 can constantly flow with respect to the acid-proof gaily decorated basket 10, so that the temperature of the mixed acid liquid in whole etching bath 1 is even, thereby make on whole silicon chip or the acid etching speed on silicon chip is consistent by the gross, and the groove forming on silicon chip on whole silicon chip or is by the gross also consistent.
The above is only the preferred implementation of this patent; it should be pointed out that for those skilled in the art, do not departing under the prerequisite of the art of this patent principle; can also make some improvement and replacement, these improvement and replacement also should be considered as the protection range of this patent.
Claims (3)
1. a rocker-arm silicon chip etching device, comprise etching bath and the acid-proof gaily decorated basket, it is characterized in that: described etching bath top is fixed with stepping motor, described stepping motor drives and is connected with horizontal Cam drive system, on described Cam drive system, be rotatably connected to L shaped upper arm, described upper arm bottom is provided with the draw-in groove of opening upwards; The described acid-proof gaily decorated basket is removably connected with the suspension handle of n shape, and described suspension handle top frame matches with draw-in groove; Described Cam drive system comprises inside and outside two relative spacing disks, and interior spacing disk inner side is provided with the main eccentric shaft being connected with the driving shaft of stepping motor, between interior spacing disk and outer spacing disk, is connected with secondary eccentric shaft.
2. rocker-arm silicon chip etching device according to claim 1, is characterized in that: top, described acid-proof gaily decorated basket two side is provided with caulking groove, described suspension handle two bottom sides is provided with the card article matching with caulking groove.
3. rocker-arm silicon chip etching device according to claim 1, is characterized in that: described upper arm top is provided with sleeve pipe, and described casing pipe sleeve is on secondary eccentric shaft.
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CN201420450042.0U CN204011378U (en) | 2014-08-11 | 2014-08-11 | A kind of rocker-arm silicon chip etching device |
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CN201420450042.0U CN204011378U (en) | 2014-08-11 | 2014-08-11 | A kind of rocker-arm silicon chip etching device |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106872246A (en) * | 2017-01-19 | 2017-06-20 | 中国石油大学(北京) | A kind of device and method for fission track chemical etching |
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2014
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106872246A (en) * | 2017-01-19 | 2017-06-20 | 中国石油大学(北京) | A kind of device and method for fission track chemical etching |
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Address after: 272100 Yanyan Road North (tianqimiao Village West), Yanzhou District, Jining City, Shandong Province Patentee after: SHANDONG XINNUO ELECTRONIC TECHNOLOGY CO.,LTD. Address before: North of Yanyan Road, Yanzhou District, Jining City, Shandong Province, 272100 Patentee before: SHANDONG XINNUO ELECTRONIC SCIENCE & TECHNOLOGY CO.,LTD. |