CN102513916A - Micropore polishing method for ultraprecise optical element - Google Patents
Micropore polishing method for ultraprecise optical element Download PDFInfo
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- CN102513916A CN102513916A CN2011104295249A CN201110429524A CN102513916A CN 102513916 A CN102513916 A CN 102513916A CN 2011104295249 A CN2011104295249 A CN 2011104295249A CN 201110429524 A CN201110429524 A CN 201110429524A CN 102513916 A CN102513916 A CN 102513916A
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Abstract
The invention discloses a micropore polishing method for an ultraprecise optical element, which includes: 1 preparing polishing liquid by means of mixing, even stirring, cooling and ageing according to a polishing liquid formula (raw materials of the formula include 350-400ml of hydrofluoric acid, 300-350ml of concentrated sulfuric acid and 50-100ml of glycerol or glycol in terms of volume ratio); 2 cleaning up the pre-polishing optical element with organic solvents mixed with acetone and then drying the pre-polishing optical element; 3 shielding positions, needing no etching and polishing, of the cleaned optical element; and 4 placing the prepared polishing liquid into a thermostat water bath at the temperature of 25-50 DEG C, soaking the optical element into the polishing liquid, stirring the polishing liquid, taking out the optical element after 20-30 minutes, firstly rinsing the optical element with 3%-7% of caustic soda solution for 3-5 minutes, then washing the optical element with pure water and finally drying the optical element. The micropore polishing method is simple in process, easy in operation and free of undercutting, production cost is reduced, production cycle is shortened, and the surface quality of micropores of the ultraprecise optical element is improved.
Description
Technical field
The present invention relates to the polishing technology field, particularly a kind of micropore finishing method of ultraprecise optical element can be used for through hole, the blind hole of various ultra-smooth optical elements, the degree of precision polishing of step surface.
Background technology
At present, the normal dry/wet etch that adopts of glass micropore polishing.Dry etching often adopts the DRIE method, and its process is complicated, both expensive, and also working (machining) efficiency is low.Comparatively speaking, wet etching is simple, effective, but traditional wet etching polishing method efficient is low, protects complex procedures, etching technics is coarse, surface roughness is relatively poor, and breakthrough research report in this regard is very few.This wet etching polishing micropore has saved the polishing of conventional wet etching and has made the time and the equipment of mask layer and photoresist, and has improved the speed of etching polishing and the quality of polished surface, and wet etching polishing, micropore glossing are had certain directive significance.
Summary of the invention
The micropore finishing method that the purpose of this invention is to provide a kind of ultraprecise optical element, this method can shorten polishing time effectively, improves polishing efficiency, reduces production costs, and can improve the surface quality of micropore again.
To achieve these goals, the present invention adopts following technical scheme:
A kind of micropore finishing method of ultraprecise optical element may further comprise the steps:
1) take by weighing raw material by the polishing fluid prescription, mix, stir, cooling, ageing is mixed with polishing fluid;
2) organic solvent that the used for optical elements of pre-polish(ing) is mixed with acetone cleans up and is dry;
3) do not need the place of etching polishing to shield cleaned optical element;
4) polishing fluid for preparing in the step 1) is placed 25-50 ℃ thermostat water bath; Optical element immersed in the polishing fluid soak, agitating solution takes out optical element behind the 20-30min; Elder generation is with the sodium hydroxide solution rinsing of 3%-7%; Use flushing with clean water then, final drying is promptly accomplished the micropore polishing of ultraprecise optical element.
The volume proportion of the prescription of polishing fluid described in the step 1) is hydrofluoric acid 350-400ml, concentrated sulfuric acid 300-350ml, glycerine or spent glycol 50-100ml.
The volume proportion of the prescription of polishing fluid described in the step 1) is hydrofluoric acid 350-400ml, concentrated sulfuric acid 300-350ml and glycerine or spent glycol 50-100ml.
1. the said polishing fluid that is made into of step 1) slowly joins hydrofluoric acid in the concentrated sulfuric acid, stirs while mixing, and is cooled to room temperature until mixed solution, and ageing is spent the night;
2. in the mixed solution of step in 1., slowly add glycerine, and fully stir, be cooled to room temperature until mixed solution, ageing 4h, subsequent use.
Step 2) organic solvent that is mixed with acetone described in the solvent that to be alcohol mix according to arbitrary proportion with acetone.
Compared with prior art; The present invention has the following advantages: the inventive method employing chemical etching polishing method is polished the micropore of ultraprecise optical element; Surface roughness value Ra in the micropore is reduced to below the 200nm by the 763.8nm of traditional micropore finishing method, and polishing efficiency also is greatly enhanced.The method is simple, practical, has both saved time and the equipment of making mask layer and photoresist, has reduced cost, has also guaranteed the quality of micropore polishing.In sum, the inventive method has broken through traditional chemical polishing technical recipe, under equal conditions, has not only improved etching polishing efficiency and surface quality, and has reduced etching polishing cost.
The specific embodiment
Below in conjunction with specific embodiment the present invention is done and to describe in further detail.
Embodiment 1
1) 350mL hydrofluoric acid is slowly joined in the 300ml concentrated sulfuric acid, stir while mixing, be cooled to room temperature until mixed solution, ageing is spent the night;
2) slowly add 50ml glycerine in the mixed solution in step 1), and fully stir, be cooled to room temperature until mixed solution, ageing 4h, subsequent use;
3) with used for optical elements alcohol, the acetone mixed solvent ultrasonic cleaning 10min of pre-polish(ing), utilize compressed air to dry up;
4) do not need the place of etching polishing to shield optical element cleaned in the step 3);
5) with step 2) in the polishing fluid for preparing place 25 ℃ of thermostat water baths; The optical element that step 4) is protected immerses in the polishing fluid; Utilize magnetic agitation that solution is slowly flowed, take out optical element behind the 25min, earlier with 3% sodium hydroxide solution rinsing; Use flushing with clean water then, final drying.
Polishing effect is following:
Through Taylor Hobson contact contourgraph the micropore of the optical element that adopts the polishing of different micropore polishing technologies being carried out surface roughness detects; Adopt the optical element micropore surface roughness Ra=159.4nm of this instance polishing, the optical element micropore surface roughness Ra=763.8nm that traditional micropore finishing method is polished.
Embodiment 2
1) 380mL hydrofluoric acid is slowly joined in the 330m l concentrated sulfuric acid, stir while mixing, be cooled to room temperature until mixed solution, ageing is spent the night;
2) slowly add 65m l ethylene glycol in the mixed solution in step 1), and fully stir, be cooled to room temperature until mixed solution, ageing 4h, subsequent use;
3) with used for optical elements alcohol, the acetone mixed solvent ultrasonic cleaning 10min of pre-polish(ing), utilize compressed air to dry up;
4) do not need the place of etching polishing to shield optical element cleaned in the step 3;
5) with step 2) in the polishing fluid for preparing place 50 ℃ of thermostat water baths; The optical element that step 4) is protected immerses in the polishing fluid; Utilize magnetic agitation that solution is slowly flowed, take out optical element behind the 25min, earlier with 5% sodium hydroxide solution rinsing; Use flushing with clean water then, final drying.
Polishing effect is following:
Through Taylor Hobson contact contourgraph the micropore of the optical element that adopts the polishing of different micropore polishing technologies being carried out surface roughness detects; Adopt the optical element micropore surface roughness Ra=178.5nm of this instance polishing, the optical element micropore surface roughness Ra=763.8nm that traditional micropore finishing method is polished.
Embodiment 3
1) 400mL hydrofluoric acid is slowly joined in the 350m l concentrated sulfuric acid, stir while mixing, be cooled to room temperature until mixed solution, ageing is spent the night;
2) slowly add 100ml glycerine in the mixed solution in step 1), and fully stir, be cooled to room temperature until mixed solution, ageing 4h, subsequent use;
3) with used for optical elements alcohol, the acetone mixed solvent ultrasonic cleaning 10min of pre-polish(ing), utilize compressed air to dry up;
4) do not need the place of etching polishing to shield optical element cleaned in the step 3);
5) with step 2) in the polishing fluid for preparing place 40 ℃ of thermostat water baths; The optical element that step 4) is protected immerses in the polishing fluid; Utilize magnetic agitation that solution is slowly flowed, take out optical element behind the 20min, earlier with 7% sodium hydroxide solution rinsing; Use flushing with clean water then, final drying.
Polishing effect is following:
Through Taylor Hobson contact contourgraph the micropore of the optical element that adopts the polishing of different micropore polishing technologies being carried out surface roughness detects; Adopt the optical element micropore surface roughness Ra=132.6nm of this instance polishing, the optical element micropore surface roughness Ra=763.8nm that traditional micropore finishing method is polished.
Claims (4)
1. the micropore finishing method of a ultraprecise optical element is characterized in that, may further comprise the steps:
1) take by weighing raw material by prescription, mix, stir, cooling, ageing is made into polishing fluid;
2) organic solvent that the used for optical elements of pre-polish(ing) is mixed with acetone cleans 10min and dry;
3) do not need the place of etching polishing to shield cleaned optical element;
4) polishing fluid for preparing in the step 1) is placed 25-50 ℃ of thermostat water bath; Optical element immersed in the polishing fluid soak, agitating solution takes out optical element behind the 20-30min; Elder generation is with the sodium hydroxide solution rinsing of 3%-7%; Use flushing with clean water then, final drying is promptly accomplished the micropore polishing of ultraprecise optical element.
2. a kind of according to claim 1 micropore finishing method of ultraprecise optical element, it is characterized in that: the volume proportion of the prescription of polishing fluid described in the step 1) is hydrofluoric acid 350-400ml, concentrated sulfuric acid 300-350ml and glycerine or spent glycol 50-100ml.
3. a kind of according to claim 1 or claim 2 micropore finishing method of ultraprecise optical element; It is characterized in that: the said polishing fluid that is made into of step 1), 1. hydrofluoric acid is slowly joined in the concentrated sulfuric acid, stir while mixing; Be cooled to room temperature until mixed solution, ageing is spent the night;
2. in the mixed solution of step in 1., slowly add glycerine, and fully stir, be cooled to room temperature until mixed solution, ageing 4h, subsequent use.
4. a kind of according to claim 1 micropore finishing method of ultraprecise optical element is characterized in that: step 2) described in be mixed with acetone the organic solvent solvent that to be alcohol mix according to arbitrary proportion with acetone.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN2011104295249A CN102513916A (en) | 2011-12-15 | 2011-12-15 | Micropore polishing method for ultraprecise optical element |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2011104295249A CN102513916A (en) | 2011-12-15 | 2011-12-15 | Micropore polishing method for ultraprecise optical element |
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| CN102513916A true CN102513916A (en) | 2012-06-27 |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019006603A1 (en) * | 2017-07-03 | 2019-01-10 | 深圳市宏昌发科技有限公司 | Polishing agent, aluminum alloy part and polishing process therefor |
| CN109604968A (en) * | 2018-12-28 | 2019-04-12 | 临安泽诚金属制品有限公司 | A kind of efficient moulding process of precision element |
| CN111029230A (en) * | 2019-12-13 | 2020-04-17 | 山西长城微光器材股份有限公司 | Micro-channel plate in-channel polishing method |
| CN111155093A (en) * | 2019-12-28 | 2020-05-15 | 中国船舶重工集团公司第七一七研究所 | Chemical polishing method for improving uniformity of inner hole of cavity of laser gyroscope |
| WO2024207924A1 (en) * | 2023-04-04 | 2024-10-10 | 广东粤港澳大湾区硬科技创新研究院 | Substrate pretreatment method before micro-channel plate coating |
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| US3560281A (en) * | 1967-10-02 | 1971-02-02 | Owens Illinois Inc | Process for regenerating an acid bath |
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| CN102060446A (en) * | 2009-11-11 | 2011-05-18 | 刘长江 | Manufacturing method of high light transmitting patterned glass |
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2011
- 2011-12-15 CN CN2011104295249A patent/CN102513916A/en active Pending
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| GB1019522A (en) * | 1963-01-12 | 1966-02-09 | Saelzle Erich | Improvements in and relating to glass polishing processes |
| DE1496683A1 (en) * | 1963-01-29 | 1969-10-23 | Ver Flussspatgruben Gmbh | Process for polishing crystal glass |
| US3560281A (en) * | 1967-10-02 | 1971-02-02 | Owens Illinois Inc | Process for regenerating an acid bath |
| SU370271A1 (en) * | 1970-07-06 | 1973-02-15 | Н. П. Пекшева , Е. С. Воронцов Воронежский политехнический институт | METHOD OF ELECTROCHEMICAL POLISHING |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019006603A1 (en) * | 2017-07-03 | 2019-01-10 | 深圳市宏昌发科技有限公司 | Polishing agent, aluminum alloy part and polishing process therefor |
| CN109604968A (en) * | 2018-12-28 | 2019-04-12 | 临安泽诚金属制品有限公司 | A kind of efficient moulding process of precision element |
| CN111029230A (en) * | 2019-12-13 | 2020-04-17 | 山西长城微光器材股份有限公司 | Micro-channel plate in-channel polishing method |
| CN111029230B (en) * | 2019-12-13 | 2022-04-05 | 山西长城微光器材股份有限公司 | Micro-channel plate in-channel polishing method |
| CN111155093A (en) * | 2019-12-28 | 2020-05-15 | 中国船舶重工集团公司第七一七研究所 | Chemical polishing method for improving uniformity of inner hole of cavity of laser gyroscope |
| WO2024207924A1 (en) * | 2023-04-04 | 2024-10-10 | 广东粤港澳大湾区硬科技创新研究院 | Substrate pretreatment method before micro-channel plate coating |
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Application publication date: 20120627 |